FLUID-ASSISTED THERMAL MANAGEMENT OF EVAPORATION SOURCES

Abstract

In various embodiments, evaporation sources for deposition systems are heated and/or cooled via a fluid-based thermal management system.

Claims

1. A deposition system comprising: a deposition chamber having an interior enclosed by one or more chamber walls; an evaporation source comprising (i) a vacuum shell defining a hollow source body having a first reservoir therein for containing a feedstock material for evaporation thereof, and (ii) an evaporation port for fluidly coupling the source body with the interior of the deposition chamber, (iii) a plurality of fluid inlets, and (iv) a plurality of fluid outlets, wherein the evaporation source is configured to establish and monitor a vacuum within the first reservoir and the deposition chamber; a feedstock material disposed within the source body; and a thermal management system comprising: a second reservoir for containing heat-transfer fluid, a conduit for thermally coupling the second reservoir with the evaporation source, wherein a first portion of the conduit extends between the second reservoir and one of the plurality of fluid inlets of the evaporation source, wherein the conduit includes a plurality of second portions disposed within the source body so as to directly contact the feedstock material disposed therein, wherein one of the second portions extends between the fluid inlet to which the first portion of the conduit is attached and one of the fluid outlets, wherein at least one of the plurality of second portions extends between two fluid outlets, wherein the conduit includes a plurality of third portions disposed outside of the source body, and wherein each third portion extends between fluid outlets to which second portions of the conduit are attached, such that the third portions fluidly connect adjacent ones of the second portions, a fluid pump fluidly connected within the first portion of the conduit, a temperature-regulation mechanism for heating and/or cooling heat-transfer fluid within the second reservoir, and a controller for controlling flow of heated and/or cooled heat-transfer fluid through the conduit between the evaporation source and the second reservoir to thereby control a temperature of the evaporation source, whereby heating of the evaporation source at least in part via flow of heated heat-transfer fluid through the conduit results in vaporization of feedstock material in the source body and flow of vaporized the feedstock material into the deposition chamber via the evaporation port.

2. The deposition system of claim 1, wherein the temperature-regulation mechanism comprises at least one of a heater, a heat exchanger, or a resistive heater.

3. The deposition system of claim 1, wherein the feedstock material comprises at least one of phosphorous, sulfur, arsenic, tellurium, or selenium.

4. The deposition system of claim 1, wherein the thermal management system comprises a second heater for heating the evaporation source in tandem with flow of heated heat-transfer fluid through the conduit.

5. The deposition system of claim 4, wherein the second heater comprises at least one of a resistive heater, an electron beam source, a laser source, a thermoelectric heater, or a heat exchanger.

6. The deposition system of claim 1, wherein the thermal management system comprises a cooler for cooling the evaporation source in tandem with flow of cooled heat-transfer fluid through the conduit.

7. The deposition system of claim 6, wherein the cooler comprises a source of gas, a heat exchanger, or a thermoelectric cooler.

8. The deposition system of claim 1, wherein the controller is configured to control the temperature of the evaporation source via flow of heated and/or cooled heat-transfer fluid through the conduit over only a portion of an operating temperature range of the evaporation source.

9. The deposition system of claim 1, further comprising heat-transfer fluid disposed within the reservoir.

10. The deposition system of claim 9, wherein the heat-transfer fluid comprises at least one of water, a glycol, a silicone, a dielectric fluid, a fluorocarbon, polyalphaolefin, or a hydrocarbon oil.

11. The deposition system of claim 1, wherein the source body comprises at least one of a refractory metal, a ceramic material, or a nickel-containing alloy.

12. The deposition system of claim 1, wherein one or more surfaces of the source body are lined and/or coated with a lining material.

13. The deposition system of claim 12, wherein the lining material comprises a ceramic material.

14. The deposition system of claim 1, wherein the evaporation source comprises one or more fill ports for introduction of feedstock material therethrough into the source body.

15. The deposition system of claim 14, further comprising a removable cover for covering at least one of the fill ports.

16. A deposition system comprising: a deposition chamber having an interior enclosed by one or more chamber walls; an evaporation source comprising (i) a vacuum shell defining a hollow source body having a first reservoir therein for containing a feedstock material for evaporation thereof, and (ii) an evaporation port for fluidly coupling the source body with the interior of the deposition chamber, (iii) a plurality of fluid inlets, and (iv) a plurality of fluid outlets, wherein the evaporation source is configured to establish and monitor a vacuum within the first reservoir and the deposition chamber; a feedstock material disposed within the source body; and a thermal management system comprising: a second reservoir having heat-transfer fluid disposed therein, a conduit for thermally coupling the second reservoir with the evaporation source, wherein a first portion of the conduit extends between the second reservoir and one of the plurality of fluid inlets of the evaporation source, wherein the conduit includes a plurality of second portions disposed within the source body so as to directly contact the feedstock material disposed therein, wherein one of the second portions extends between the fluid inlet to which the first portion of the conduit is attached and one of the fluid outlets, wherein at least one of the plurality of second portions extends between two fluid outlets, wherein the conduit includes a plurality of third portions disposed outside of the source body, and wherein each third portion extends between fluid outlets to which second portions of the conduit are attached, such that the third portions fluidly connect adjacent ones of the second portions, a fluid pump fluidly connected within the first portion of the conduit, a temperature-regulation mechanism for heating and/or cooling heat-transfer fluid within the second reservoir, a cooler, and a controller for controlling flow of heated and/or cooled heat-transfer fluid through the conduit between the evaporation source and the second reservoir to thereby control a temperature of the evaporation source, whereby heating of the evaporation source at least in part via flow of heated heat-transfer fluid through the conduit results in vaporization of feedstock material in the source body and flow of vaporized the feedstock material into the deposition chamber via the evaporation port, wherein the cooler cools the evaporation source in tandem with flow of cooled heat-transfer fluid through the conduit.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0031] In the drawings, like reference characters generally refer to the same parts throughout the different views. Also, the drawings are not necessarily to scale, emphasis instead generally being placed upon illustrating the principles of the invention. In the following description, various embodiments of the present invention are described with reference to the following drawings, in which:

[0032] FIG. 1 is a graph of vapor pressure as a function of temperature for several different elements;

[0033] FIG. 2 is a schematic diagram of a deposition system in accordance with various embodiments of the invention;

[0034] FIG. 3A is a schematic diagram of an evaporation source utilizing a fluid-based thermal management system in accordance with various embodiments of the invention;

[0035] FIG. 3B is a schematic diagram of an evaporation source utilizing a fluid-based thermal management system in accordance with various embodiments of the invention;

[0036] FIG. 4A is a perspective view of an evaporation source in accordance with various embodiments of the invention;

[0037] FIG. 4B is a top view of the evaporation source of FIG. 4A; and

[0038] FIG. 4C is a side view of the evaporation source of FIG. 4A.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT

[0039] FIG. 2 is a schematic diagram of an exemplary deposition system 200 in accordance with embodiments of the present invention. As shown, the system 200 features a thermal evaporation source 205 incorporating a reservoir 210 for feedstock material to be evaporated. The reservoir 210 is at least partially surrounded by a vacuum shell 215 that enables the establishment and maintenance of very low pressures (i.e., very high vacuums) in the deposition system 200. The source reservoir 210 has an evaporation port 220 through which the evaporant leaves the source 205 and enters a deposition chamber 225 for, e.g., deposition on one or more substrates. While only one evaporation source 205 is depicted in FIG. 2 for simplicity, embodiments of the present invention utilize two or more evaporation sources (e.g., for evaporation of different materials). Multiple evaporation sources may share a single fluid-based thermal management system, or each evaporation source may utilize its own dedicated fluid-based thermal management system. In various embodiments, the source 205 may be positioned partially or entirely inside the deposition chamber 225 rather than primarily outside of the deposition chamber as depicted in FIG. 2.

[0040] The source reservoir 210 is typically a hollow container for containing the feedstock material during evaporation thereof. The source reservoir 210 may include, consist essentially of, or consist of, for example, one or more refractory metals (e.g., tantalum, tungsten, and/or molybdenum) and/or one or more ceramic materials such as alumina and/or boron nitride and/or one or more corrosion-resistant metal alloys such as nickel-based alloys containing one or more alloying elements (e.g., molybdenum, chromium, cobalt, iron, copper, manganese, titanium, zirconium, aluminum, carbon, and/or tungsten), for example, one or more Hastelloy alloys available from Haynes International Inc. of Kokomo, Ind. In various embodiments, one or more surfaces of the source body (e.g., the surfaces facing and/or in contact with the feedstock material) may be coated or lined with a lining material, e.g., a ceramic material such as alumina and/or boron nitride. The source reservoir 210 and any insulation material therearound may be heated by one or more heaters disposed proximate or around the evaporation source. The one or more heaters may include or consist essentially of, for example, a furnace in which the source is disposed or one or more resistive heaters disposed around the source. Exemplary feedstock materials used in various embodiments of the present invention include P, S, As, Se, and/or Te.

[0041] FIG. 2 depicts the evaporation source 205 having its evaporation port 220 facing sideways toward deposition chamber 225, but other orientations of the port 220 are possible. For example, the port 220 may be oriented to allow evaporant release upward or even downward. Moreover, insulation may be disposed around one or more sides of the source reservoir 210. In addition, while the evaporation port 220 is depicted in FIG. 2 as being a substantially straight regular cylinder, in various embodiments the evaporation port 220 has a width or diameter that tapers (wider or narrower) as a function of distance from the source reservoir 210. In various embodiments, the evaporation port 220 may include or consist essentially of a manifold port or a shower-head port, variants known to those of skill in the art.

[0042] As shown in FIG. 2, a fluid-based thermal management system 230 is connected by one or more conduits 235 (e.g., pipes) to the source 205 via, for example, one or more vacuum feedthroughs 240 that seal around the conduit(s) 235 to maintain vacuum within the deposition system 200. The fluid-based thermal management system 230 may be fluidly connected to a source 245 of process chilled water (PCW) for, e.g., cooling of the heat-transfer fluid heated by exposure to the evaporation source. The fluid-based thermal management system 230 may be fluidly connected to the source 245 via one or more conduits 250 (e.g., pipes). The source 245 may include or consist essentially of, e.g., a reservoir of water or other fluid. Electric or combustion fuel or heat exchange heating of the heat-transfer fluid may also be present as part of the fluid-based thermal management system. Additional means of heating the evaporant—e.g., resistive electrical heating elements coupled to and/or disposed around and/or in the source reservoir 210—may be present simultaneously to the heat-transfer fluid-based loop.

[0043] FIG. 3A is a schematic diagram of an exemplary fluid-based thermal management system 230 in accordance with embodiments of the present invention. As shown, the thermal management system 230 features two different reservoirs for heat-transfer fluid. A reservoir 300 contains heat-transfer fluid and heats the fluid by, e.g., resistive heaters 305 thermally coupled to the reservoir 300. The heated heat-transfer fluid is channeled to the evaporation source 205 by one or more pumps 308 via a series of conduits 310 (e.g., pipes) and valves 315, as shown. A reservoir 320 also contains heat-transfer fluid (which may be the same or different from the fluid within the heated reservoir 300) and cools the fluid by, e.g., a heat exchanger 325 and recirculation of chilled water from PCW source 245 for thermal exchange. The cooled heat-transfer fluid is also channeled to and from the evaporation source 205 by one or more pumps 308 via a series of conduits 310 and valves 315, as shown.

[0044] While two different reservoirs 300, 320 are depicted in FIG. 3, embodiments of the invention utilize a single reservoir of heat-transfer fluid that is heated or cooled on demand, depending on the desired temperature regulation of the evaporation source 205. For example, FIG. 3B is a schematic diagram of another exemplary fluid-based thermal management system 230 in accordance with embodiments of the present invention. As shown, the thermal management system 230 features a single reservoir 360 for heat-transfer fluid, which is heated by, e.g., resistive heaters 305, and/or cooled by, e.g., heat exchanger 325 and recirculation of chilled water from PCW source 245 for thermal exchange.

[0045] The conduits 310 connecting the reservoirs 300, 320, 360 to the evaporation source 205 typically form a closed loop, and extend within the source 205 (e.g., on a sinuous path) to maximize thermal contact between the heat-transfer fluid and the feedstock in the evaporation source 205. As shown in FIGS. 3A and 3B, recirculation pumps 330 may be utilized to recirculate the heat-transfer fluid within the reservoirs, via conduits 335, to thereby maintain the heat-transfer fluid within each reservoir 300, 320, 360 at a substantially constant temperature.

[0046] The operation of reservoirs 300, 320, 360 and the resulting flow of heat-transfer fluid to and from the evaporation source 205 may be responsive to a computer-based control system so that the temperature of the source 205 may be controlled before, during, and/or after deposition processes that take place at elevated temperatures. For example, as shown in FIGS. 3A and 3B, in various embodiments of the present invention, a control system 340 may be electrically connected and/or mechanically connected to the reservoirs 300, 320, 360, valves 315, 330, and/or pumps 308 and thus control various operations of the fluid-based thermal management system 230.

[0047] The computer-based control system (or “controller”) 340 in accordance with embodiments of the present invention may include or consist essentially of a general-purpose computing device in the form of a computer including a processing unit (or “computer processor”) 345, a system memory 350, and a system bus 355 that couples various system components including the system memory 350 to the processing unit 345. Computers typically include a variety of computer-readable media that can form part of the system memory 350 and be read by the processing unit 345. By way of example, and not limitation, computer readable media may include computer storage media and/or communication media. The system memory 350 may include computer storage media in the form of volatile and/or nonvolatile memory such as read only memory (ROM) and random access memory (RAM). A basic input/output system (BIOS), containing the basic routines that help to transfer information between elements, such as during start-up, is typically stored in ROM. RAM typically contains data and/or program modules that are immediately accessible to and/or presently being operated on by processing unit 345. The data or program modules may include an operating system, application programs, other program modules, and program data. The operating system may be or include a variety of operating systems such as Microsoft WINDOWS operating system, the Unix operating system, the Linux operating system, the Xenix operating system, the IBM AIX operating system, the Hewlett Packard UX operating system, the Novell NETWARE operating system, the Sun Microsystems SOLARIS operating system, the OS/2 operating system, the BeOS operating system, the MACINTOSH operating system, the APACHE operating system, an OPENSTEP operating system or another operating system of platform. In various embodiments, the controller 340 and/or one or more components thereof may include or consist essentially of a programmable logic controller operating in accordance with, e.g., a set of pre-compiled instructions and/or programs.

[0048] Any suitable programming language may be used to implement without undue experimentation the functions described herein. Illustratively, the programming language used may include assembly language, Ada, APL, Basic, C, C++, C*, COBOL, dBase, Forth, FORTRAN, Java, Modula-2, Pascal, Prolog, Python, REXX, and/or JavaScript for example. Further, it is not necessary that a single type of instruction or programming language be utilized in conjunction with the operation of systems and techniques of the invention. Rather, any number of different programming languages may be utilized as is necessary or desirable.

[0049] The computing environment may also include other removable/nonremovable, volatile/nonvolatile computer storage media. For example, a hard disk drive may read or write to nonremovable, nonvolatile magnetic media. A magnetic disk drive may read from or writes to a removable, nonvolatile magnetic disk, and an optical disk drive may read from or write to a removable, nonvolatile optical disk such as a CD-ROM or other optical media. Other removable/nonremovable, volatile/nonvolatile computer storage media that can be used in the exemplary operating environment include, but are not limited to, magnetic tape cassettes, flash memory cards, digital versatile disks, digital video tape, solid state RAM, solid state ROM, and the like. The storage media are typically connected to the system bus through a removable or non-removable memory interface.

[0050] The processing unit 345 that executes commands and instructions may be a general-purpose computer processor, but may utilize any of a wide variety of other technologies including special-purpose hardware, a microcomputer, mini-computer, mainframe computer, programmed micro-processor, micro-controller, peripheral integrated circuit element, a CSIC (Customer Specific Integrated Circuit), ASIC (Application Specific Integrated Circuit), a logic circuit, a digital signal processor, a programmable logic device such as an FPGA (Field Programmable Gate Array), PLD (Programmable Logic Device), PLA (Programmable Logic Array), RFID processor, smart chip, or any other device or arrangement of devices that is capable of implementing the steps of the processes of embodiments of the invention. For example, the memory 350 may store therewithin one or deposition (e.g., thermal-evaporation) recipes including instructions (e.g., desired thermal profiles, heating times, etc.) utilized by the controller 340 to control the various components and systems of the deposition system, e.g., valves, interlocks, pumps, heating systems, reservoirs 300, 320, etc. The recipes may include indications before, during, and/or after evaporation processes for the controller 340 to cool and/or heat evaporation source 205 and the feedstock therewithin in order to, e.g., improve throughput. The controller 340 may include one or more user interfaces and/or input/output devices (e.g., keyboard, display, mouse or other pointing device, etc.) for accepting user commands and/or for the inputting of recipe information.

[0051] FIGS. 4A-4C depict an exemplary thermal evaporation source 205 usable in accordance with embodiments of the present invention. The exemplary source 205 may have one or more fill ports 400 through which the feedstock material to be evaporated may be introduced into the source 205. As shown, the fill ports 400 may each be occluded by a cover after filling and during evaporation. The source 205 may be evacuated and/or vented before and/or after operation via a valve 405. The heated feedstock exits the source 205 via the evaporation port 220, as detailed herein. Heat-transfer fluid for heating and/or cooling the feedstock material within the source 205 is introduced via one or more fluid inlets 410, flows through one or more conduits 415 fluidically coupled to the inlets 410 (and fluidically isolated from but thermally coupled to the feedstock material itself), and exits the source via one or more fluid outlets 420. Additional means of heating the feedstock material—e.g., resistive electrical heating elements thermally coupled to the reservoir 210 of the source 205—may be present simultaneously to this heat-transfer fluid-based loop. For example, resistive heaters and/or other auxiliary heaters or coolers may be inserted into source 205 via one or more channels 425 for thermal coupling to the feedstock material within source 205.

[0052] The terms and expressions employed herein are used as terms and expressions of description and not of limitation, and there is no intention, in the use of such terms and expressions, of excluding any equivalents of the features shown and described or portions thereof. In addition, having described certain embodiments of the invention, it will be apparent to those of ordinary skill in the art that other embodiments incorporating the concepts disclosed herein may be used without departing from the spirit and scope of the invention. Accordingly, the described embodiments are to be considered in all respects as only illustrative and not restrictive.