METHOD FOR PRODUCING A TRANSMISSIVE OPTICS
20210260842 · 2021-08-26
Assignee
Inventors
- Axel von Wallfeld (Herzogenrath, DE)
- Reinhart Poprawe (Aachen, DE)
- Christian Fornaroli (Aachen, DE)
- Edgar Willenborg (Wuerselen, DE)
- Christian Weingarten (Aachen, DE)
- Uwe Clasen (Aachen, DE)
Cpc classification
B33Y10/00
PERFORMING OPERATIONS; TRANSPORTING
B23K2103/42
PERFORMING OPERATIONS; TRANSPORTING
B23K26/402
PERFORMING OPERATIONS; TRANSPORTING
B23K26/0624
PERFORMING OPERATIONS; TRANSPORTING
B29D11/00951
PERFORMING OPERATIONS; TRANSPORTING
B33Y80/00
PERFORMING OPERATIONS; TRANSPORTING
B29C45/77
PERFORMING OPERATIONS; TRANSPORTING
B23K26/082
PERFORMING OPERATIONS; TRANSPORTING
B23K26/034
PERFORMING OPERATIONS; TRANSPORTING
B29K2995/0018
PERFORMING OPERATIONS; TRANSPORTING
B29D11/00451
PERFORMING OPERATIONS; TRANSPORTING
B29D11/00932
PERFORMING OPERATIONS; TRANSPORTING
B29C45/16
PERFORMING OPERATIONS; TRANSPORTING
Y02P10/25
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
B23K26/3576
PERFORMING OPERATIONS; TRANSPORTING
International classification
B29D11/00
PERFORMING OPERATIONS; TRANSPORTING
B23K26/03
PERFORMING OPERATIONS; TRANSPORTING
B23K26/082
PERFORMING OPERATIONS; TRANSPORTING
B23K26/402
PERFORMING OPERATIONS; TRANSPORTING
B29C45/00
PERFORMING OPERATIONS; TRANSPORTING
B29C45/16
PERFORMING OPERATIONS; TRANSPORTING
B29C45/77
PERFORMING OPERATIONS; TRANSPORTING
B29D11/02
PERFORMING OPERATIONS; TRANSPORTING
Abstract
In a method for the manufacture of a transmissive optical system from a blank, material ablation is achieved on the blank with an ablative laser, and the pulse duration of the ablative laser is less than 1 ns, and preferably lies between 3 fs and 100 fs, or between 100 fs and 10 ps.
Claims
1-43. (canceled)
44: A method for the manufacture of a transmissive optical system (1) from a blank (2), wherein material ablation (4) is achieved on the blank (2) with an ablative laser (3), wherein, the pulse duration of the ablative laser (3) is less than 1 ns and preferably lies between 3 fs and 100 fs, or between 100 fs and 10 ps.
45: The method in accordance with claim 44, wherein the blank (2), initially treated with the ablative laser (3), is further processed with a polishing laser (20).
46: The method in accordance with claim 44, wherein a blank (40) with a circular cross-section is used, which has an optical density towards the center (41) that differs from that towards the edge (42).
47: The method in accordance with claim 44, wherein during processing, the process temperature is monitored and/or controlled with a pyrometer (7).
48: The method in accordance with claim 44, wherein the blank is symmetrically formed on one side, and on another side is processed asymmetrically or in a free-form manner.
49: The method in accordance with claim 44, wherein an eye of a patient is first measured and a data set is thereby generated, and the ablative laser and/or the polishing laser is subsequently controlled on the basis of the data of this data set.
50: The method in accordance with claim 44, wherein with the laser radiation the material of the blank is altered such that the finished lens has an optical density gradient.
51: The method in accordance with claim 44, wherein the optical system is an intraocular lens (IOL).
52: The method in accordance with claim 44, wherein the ablative laser is operated such that it effects a material ablation of of 0.02 μm to 5 μm and particularly of 0.02 μm to 0.5 μm.
53: The method in accordance with claim 44, wherein the ablative laser is operated with a laser wavelength of less than 400 nm, such as, in particular, between 193 nm and 370 nm.
54: The method in accordance with claim 44, wherein the focal diameter of the ablative laser lies between 5 and 50 μm, and preferably at approx. 20 μm.
55: The method in accordance with claim 44, wherein the scanning rate of the ablative laser lies between 500 and 5,000 mm/s, and preferably at approx. 1,000 mm/s.
56: The method in accordance with claim 44, wherein the pulse energy of the ablative laser lies between 0.1 μJ and 10 μJ, and preferably at approx. 1 μJ.
57: The method in accordance with claim 44, wherein the repetition rate of the ablative laser lies between 5 kHz and 5,000 kHz, and preferably between 50 kHz and 200 kHz.
58: The method in accordance with claim 44, wherein the polishing laser is operated with a laser wavelength between 1 and 12 μm, and particularly preferably between 9 μm and 11 μm.
59: The method in accordance with claim 44, wherein the polishing laser is operated continuously.
60: The method in accordance with claim 44, wherein the polishing laser is formed into a “quasi-line” by means of a scanning movement, with a scanning rate of 500 mm/s to 20,000 mm/s.
61: The method in accordance with claim 44, wherein with the polishing laser less than 30, and preferably 1 to 10, passes are carried out.
62: A lens manufactured in accordance with the method of claim 44, wherein the lens has a density that is at least 1% lower in one region than in another region of the lens.
Description
[0062] Inventive examples of embodiment are illustrated in the figures and are described in what follows. Here:
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[0092] After ablation, the blank 2 has the shape shown in
[0093] The blank is a plastic and in the present case is an acrylate 8. The said blank can also comprise other materials, such as other plastics, or glass. However, the surface of the blank to be reworked is made of plastic.
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[0095] By the arrangement of a plurality of craters of this type in close proximity to each other, a planar material ablation 4 is achieved. The resulting surface structure is rough as a result of the linking together of the craters. By minimising the depth of the crater, and minimising the distances between the craters, the roughness of the plastic surface can be reduced.
[0096] It is advantageous for the smoothing of the surface if the laser intensity is minimised, and/or the footprint of the laser on the surface to be processed is increased, so that material is only melted, and, as far as possible, no material evaporates. A polishing laser 20 is usually used for this purpose, which is scanned along the line 21 with a scanning rate (V.sub.scan) and a footprint width 22, 23 over the surface 24. The polishing laser 20 is moved forward at a feed rate (V.sub.feed) in the direction of the arrow 25, at right angles to the line 21.
[0097] As a consequence, as shown in
[0098] In the example of embodiment, the material surface shown in
[0099] During material ablation 4 with the ablative laser 3, care is taken to ensure that systematically localised material ablation is achieved by the action of ultra-short pulses of laser radiation of about 100 or 200 femtoseconds only at the point of impingement of the laser onto the surface, without any thermal damage to the surrounding material. In the example of embodiment, a laser wavelength of 343 nm is used, so that the laser radiation is absorbed near the surface as a result of the small optical penetration depth of this laser wavelength in the acrylate.
[0100] By comparing the initial shape and the target shape of the surface, the required ablation depth and thus the required number of laser pulses at each point on the surface are determined. In this manner the material ablation 4 can be determined by the number of laser pulses per unit surface area without altering the nature of the laser radiation. Here the laser beam 30 can be guided in a meandering manner over the surface to be processed, in particular for the laser material ablation. On the basis of the calculated number of laser pulses per unit surface area, the laser is switched on and off during its passage over the surface to be processed.
[0101] In the example of embodiment shown in
[0102] For the subsequent laser polishing, a laser with a wavelength of 10.6 μm is used, since this wavelength is also absorbed near the surface in the material. The laser is operated continuously and the laser power is in the range of 50 to 100 watts. As a consequence the material surface is melted by the action of the laser radiation during laser polishing, and is then smoothed by the surface tension before it solidifies once again.
[0103] In the example of embodiment shown in
[0104] The processing strategy for the iteration shown in
[0105] With a higher average laser power a higher feed rate is to be used, and with a lower average laser power the feed rate is reduced. This process can therefore be scaled. The dependence between feed rate 33 and average laser power 36 is shown in
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[0107] It is advantageous if the pulse energy is varied during ablation and/or polishing. To this end
[0108] The local intensity distribution of a pulse 60 on the spatial axes 61 and 63 is shown in an exemplary manner in
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[0110] In order to optimise this effect, it is proposed that the pulse energy distribution be varied transverse to the direction of radiation during processing.
[0111] In order to achieve homogeneous processing of a lenticular surface 80 of a lens 81, it is advantageous if the laser beam 82 is maintained essentially at right angles to a tangent 83 at the point of intersection 84 of the laser beam 82 and the lens 81. This can be achieved by varying the alignment of the laser beam during processing and maintaining the position of the lens 81 constant, or by altering the alignment of the lens 81 relative to the laser beam 82 by moving the lens 81 during processing. Needless to say, both the lens and laser can be moved so as to align the laser beam 82 as nearly at right angles as possible to the normal 83 on the surface of the lens. Moreover, instead of moving the laser, the laser beam can also be aligned with the aid of a mirror so that it impinges onto the lens surface as nearly at right angles as possible.
[0112] As in the example of the lens shown in
[0113] The arrangement of the ablation craters 100 on the surface 101 of a lens 102 is shown in
[0114] The lens 110 shown in
[0115] The inverted density distribution was implemented with the lens 120 shown in
[0116] In the plan view shown in
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[0120] In all the examples of embodiment shown, the optical density can migrate via a gradient into an altered optical density, and, alternatively, regions of different optical densities can lie clearly bounded next to each other. Here the varying optical density can be used to influence the refractive behaviour of the lens when a light beam passes through it, and its deflection. Alternatively or cumulatively, the reflection properties, especially at the boundary surface of the lens surface, can be influenced by way of its density and the hardness that usually accompanies the latter.