METHOD FOR IDENTIFYING A RELIEF PRECURSOR FOR PRODUCING A RELIEF STRUCTURE

Abstract

A method for identifying a relief precursor or a relief comprising a carrier and a relief-forming layer, having the steps: a) providing a relief precursor comprising a carrier and a relief-forming layer; b) providing data which identifies the type of relief precursor and, if appropriate, contains process-relevant data for processing it, in the form of at least one two-dimensional code; c) introducing the at least one two-dimensional code into the relief-forming layer as a relief.

Claims

1. A method for identifying a relief precursor or a relief comprising a carrier and a relief-forming layer, having the steps: a) providing a relief precursor comprising a carrier and a relief-forming layer; b) providing data which identifies the type of relief precursor or relief and contains process-relevant data for processing it, in the form of at least one two-dimensional code; c) introducing the at least one two-dimensional code into the relief-forming layer as a relief.

2. The method as claimed in claim 1, characterized in that the relief-forming layer is a layer that can be engraved, and in step c) the two-dimensional code is introduced into the relief-forming layer as a relief by a material-removing method.

3. The method as claimed in claim 1, characterized in that the relief-forming layer is a photosensitive layer, and in step c) the two-dimensional code is introduced into the relief-forming layer by means of direct image exposure and subsequent removal of either the exposed or the unexposed regions of the relief-forming layer.

4. The method as claimed in claim 1, characterized in that the relief-forming layer is a photopolymerizable layer, to which a mask layer that can be imaged is applied, and step c) comprises the following steps: ca) imaging the mask layer that can be imaged, the two-dimensional code being written into the mask layer, cb) exposing the photopolymerizable relief-forming layer with electromagnetic radiation through the formed mask; cc) removing the remainder of the mask that can be imaged and the unexposed, non-photopolymerizable parts of the photopolymerizable relief-forming layer.

5. The method as claimed in claim 1, characterized in that the at least one two-dimensional code is a bar code, data matrix code, QR code or dot code.

6. The method as claimed in claim 1, characterized in that two or more different codes for different process steps are introduced.

7. A method for producing a relief starting from a relief precursor comprising at least one carrier, a relief-forming layer and a mask layer, having the method steps: (A) providing the relief precursor; (B) providing data which identifies the type of relief precursor and/or contains process parameters for its processing; (C) imaging the mask layer, by which means a mask is formed; (D) exposing the imaged relief precursor with electromagnetic radiation through the formed mask; (E) removing the remainder of the mask layer that can be imaged and exposed or non-exposed regions of the relief-forming layer; (F) optionally re-treating the relief obtained; (G) optionally exposing the rear side of the relief precursor or the relief with electromagnetic radiation, optionally between the steps (B) and (C), (C) and (D) or (D) and (E); characterized in that the data which identifies the type of the relief precursor and/or contains process parameters for its processing in step (C) is written into the mask layer in the form of a two-dimensional code, and after step (C) the data contained in the code is read in order to control one or more of steps (D), (E), (F) and (G).

8. The method as claimed in claim 7, characterized in that the data contained in the code controls one or more of the steps (D), (E), (F) and (G) with regard to one or more of the following process parameters: (i) intensity and/or duration of the exposure in step (D); (ii) wavelength in step (D); (iii) development temperature and/or development time in step (E); (iv) temperature and/or treatment time in step (F); (v) intensity and/or exposure time in step (G); (vi) wavelength of the electromagnetic radiation in step (G); (vii) transport speed of the relief precursor or the relief as it passes through one or more of method steps (D) to (G).

9. A method for producing a relief starting from a relief precursor comprising at least one carrier and a photosensitive relief-forming layer, having the method steps: (A) providing the relief precursor; (B) providing data which identifies the type of relief precursor and/or contains process parameters for its processing; (C) directly exposing the relief precursor in accordance with an image; (D) removing the exposed or non-exposed regions of the relief-forming layer; (E) optionally re-treating the relief obtained; (F) optionally exposing the rear side of the relief precursor or the relief with electromagnetic radiation, optionally between steps (B) and (C) or (C) and (D); characterized in that the data which identifies the type of relief precursor and/or defines process parameters for its processing in step (C) is written into the relief-forming layer in the form of a two-dimensional code by means of direct exposure, and after step (C) the data contained in the code is read in order to control one or more of steps (D), (E) and (F).

10. The method as claimed in claim 9, characterized in that the data contained in the code controls one or more of steps (D), (E) and (F) with regard to one or more of the following process parameters: (i) development temperature and/or development duration in step (D); (ii) temperature and/or development time in step (E); (iii) intensity and/or exposure time in step (F); (iv) wavelength of the electromagnetic radiation in step (F); (v) transport speed of the relief precursor or the relief as it passes through one or more of method steps (D) to (F).

11. A method for producing a relief starting from a relief precursor comprising at least one carrier and a relief-forming layer that can be engraved, having the method steps: (A) providing the relief precursor; (B) providing data which identifies the type of relief precursor and/or contains process parameters for its processing; (C) optionally exposing or thermally treating the whole area of the relief precursor; (D) writing a three-dimensional relief into the relief-forming layer by material-removing methods; (E) optionally removing residues from the relief surface; (F) optionally re-treating the relief obtained; (G) optionally re-exposing the relief obtained with electromagnetic radiation; characterized in that the data which identifies the type of relief precursor and/or contains process parameters for its processing in step (D) is written into the relief-forming layer in the form of a two-dimensional code by laser engraving, and after step (D) the data contained in the code is read in order to control one or more of steps (E), (F) and (G).

12. The method as claimed in claim 11, characterized in that the data contained in the code controls one or more of the steps (E), (F) and (G) with regard to one or more of the following process parameters: (i) duration and/or temperature in step (E); (ii) positive or negative pressure in step (E); (iii) temperature and/or duration in step (F); (iv) intensity and/or exposure time in step in step (G); (v) wavelength of the electromagnetic radiation in step (G); (vi) transport speed of the relief as it passes through one or more of method steps (E) to (G).

13. The method as claimed in claim 1, characterized in that the data contained in the code is read without contact.

14. The method as claimed in claim 1, characterized in that the data contained in the code identifies the type of relief precursor, and associated process parameters are read from a database.

15. A relief structure with code, producible by the method as claimed in claim 1.

16. (canceled)

Description

EXAMPLES

[0138] In the examples, the information transmission was carried out by means of the control software CX Server-lite Version 2.2 from OMRON ELECTRONICS GmbH. To this end, the code was detected by means of an SR-G100 Scanner (Keyence, settings), changed to a CSV file (Excel) and transferred to the PLC controller of the devices via a 2.2 interface.

Example 1

[0139] nyloprint® WF-H 80 plates (Flint Group) with a PET carrier layer, a 50 μm thick relief layer and protective layer were exposed over the entire surface with a nyloprint® Exposure 96 X 120 ED (Flint Group) for 5 min, following removal of the protective layer. The plates were then engraved with a Kronos 7612 (SPGPrints Austria GmbH) equipped with a 750 W CO.sub.2 laser with a resolution of 2540 dpi. In the edge region, a code was produced as a relief with data (passage speed and drying temperature) for the subsequent cleaning and drying. The code was read with an SR-G100 Scanner (Keyence) and read into a nyloprint DWT 100. The plate was washed with water at 300 mm/min and dried at 60° C.

Example 2

[0140] nyloflex® Sprint 114 plates (Flint Group) with a PET carrier layer, a relief layer and protective layer were exposed over the entire rear side for 30 s with a nyloprint® Exposure 96 X 120 ED exposer. Following removal of the protective layer, they were exposed directly with a MultiDX! 220 (Lüscher Technologies AG), equipped with X!Direct software and with UV laser diodes, which produce light with a wavelength in the region of 405 nm, with a dose of 600 mJ/cm.sup.2. In the edge region, a code was produced as a relief with data relating to passage speed (170 mm/m), drying temperature (60° C.) and re-exposure with UVA. The plates were developed in a nyloprint flowline washer DWT 100 at a passage speed of 170 mm/min and by using water and dried at 60° C. and re-exposed for 2 min with UVA light, according to the data read in.

Example 3

[0141] nyloflex® FAC 284 plates (Flint Group) with a PET carrier layer, a relief layer and protective layer were exposed over the entire rear side with a nyloflex Exposure FV exposer (Flint Group). To control the exposer, by means of an SR-G100 scanner (Keyence) a data matrix code which comprised the exposure conditions (time) was read in. Following removal of the protective layer, the plates were exposed through an LADF 0175 dry film mask (Folex) by using a nyloflex Exposure FV (Flint Group) using LED light with a wavelength of 365 nm and an intensity of 20 mW/cm.sup.2 for 15 min. The mask contained a data matrix code with the additional information relating to the further process steps (main exposure 20 min, washing speed 190 mm/min, drying time 124 min at 60° C., re-exposure simultaneous UVA/UVC 12.5 min). The code was read with an SR-G100 scanner (Keyence) and read into a nyloflex Automated Plate Processor, by which means the plates were developed, dried and re-exposed according to the data read in.

Example 4

[0142] A nyloflex® FAC 284 D plate (Flint Group) provided with a mask layer, a PET carrier layer, a relief layer, a mask layer and a protective layer was used as a relief precursor, and the associated process data was changed into a data matrix code.

[0143] The plates were exposed over the entire area from the rear side for 100 s with a nyloflex NExT Exposure FV exposer (Flint Group) by means of fluorescent strip lamps. Following the removal of the protective layer, the data matrix code was produced in an edge region on the precursor by laser ablation, and the imaging of the mask layer was performed. The ablation was performed with a ThermoFlexX 80 D (Xeikon, Laser output 100 W), the software Multiplate (Version 5.0.0.276) and the following parameters: wavelength 1070 nm, mode 3. The data matrix code contained information relating to plate type, plate thickness, exposure conditions and development conditions, drying temperature and drying time and re-exposure conditions. By using an SR-G100 scanner (Keyence), the code on the mask layer was read and read into the following exposer.

[0144] The UV exposure was carried out with a nyloflex NExT Exposure FV (Flint Group) using LED light with a wavelength of 365 nm and according to the S4 setting.

[0145] By using an SR-G100 scanner (Keyence), the code on the mask layer was read and read into the following developer. The development was then carried out with solvent in an FII washer (Flint Group) at 35° C. by using nylosolv A (Flint Group) as development solution with a passage speed of 60 mm/min.

[0146] By using an SR-G100-Scanner (Keyence), the code on the relief structure was read and read into the following nyloflex Dryer FV dryer. The drying was carried out over 180 min at 60° C.

[0147] By using an SR-G100-Scanner (Keyence), the code on the relief structure was read and read into the following Combi Fill exposer (Flint Group). Re-exposure was carried out simultaneously with 15 min UVA and UVC.

Example 5

[0148] Example 4 was repeated but, following the ablation of the mask layer, the data (main exposure 20 min, washing speed 190 mm/min, drying time 124 min at 60° C., simultaneous re-exposure UVA/UVC, exposure 12.5 min) was read into a nyloflex Automated Plate Processor, by which means the plates were developed, dried and re-exposed according to the data read.

Example 6

[0149] Example 4 was repeated, but use was made of a code which, besides the article number, also contained the batch number. By using this data, the device (nyloflex Automated Plate Processor) searched for the associated data from a connected database and used said data for the processing.