Abstract
A membrane plate assembly is disclosed for use with a cold atmospheric plasma applicator to expose a medium to plasma beams from the plasma applicator. The membrane plate assembly includes a membrane plate stack configured to receive the plasma beams from the plasma applicator. The membrane plate stack includes a plurality of membrane-covered structures facing each other in a generally parallel arrangement and being spaced apart to define a channel therebetween through which the plasma beams are directed. Each membrane-covered structure includes a structure and a membrane covering outer surfaces of the structure with a gap therebetween through which the medium is flowed.
Claims
1-29. (canceled)
30. A plasma deposition system, comprising: a microwave generator; and a plurality of interchangeable waveguide conduit apparatus, each configured to be separately coupled and used with the microwave generator, each of the waveguide conduit apparatus, comprising: a waveguide conduit that can be connected to and disconnected from the microwave generator, the waveguide conduit having a slot located at one side thereof; a primary plunger moveably positioned in the waveguide conduit for creating a primary standing microwave in the waveguide conduit; a secondary ejector apparatus on a side of the waveguide conduit opposite the slot on the one side of the waveguide conduit, the secondary ejector apparatus including (1) an electrically conductive sleeve extending partially into the waveguide conduit, (2) a secondary plunger located concentrically around the electrically conductive sleeve for creating a secondary standing microwave in the ejector apparatus, and (3) an electrically insulating pipe connected to a gas supply source and positioned concentrically within the electrically conductive sleeve, the electrically insulating pipe having a tapered distal tip extending through the slot for discharging plasma to be deposited on a surface; wherein in one of the plurality of waveguide conduit apparatus, the secondary ejector apparatus is circular-shaped and configured to discharge a narrow beam of plasma to be deposited on a spot of the surface; wherein in another one of the plurality of waveguide conduit apparatus, the secondary ejector apparatus is oblong-shaped and configured to discharge a flat beam of plasma to be deposited on an area of the surface; wherein another one of the plurality of waveguide conduit apparatus further comprises one or more additional secondary ejector apparatus configured to discharge multiple beams of plasma to be deposited on an area of the surface; and wherein in another one of the plurality of waveguide conduit apparatus, the waveguide conduit is flexible and can be bent to conform to a curved surface.
31. The system of claim 30, further comprising a plasma diffuser chamber receiving the plasma from the electrically insulating pipe of a waveguide conduit apparatus connected to the microwave generator, the plasma diffuser chamber generating a shower of plasma beams to be applied on the surface.
32. The system of claim 31, further comprising a membrane plate stack configured to receive the plasma beams from the plasma diffuser chamber, the membrane plate stack comprising a plurality of membrane-covered structures facing each other in a generally parallel arrangement and being spaced apart to define a channel therebetween exposed to the plasma beams, each membrane-covered structure comprising a structure and a membrane covering outer surfaces of the structure with a gap therebetween through which a medium intended to be injected into a tissue is flowed.
33. The system of claim 31, wherein the plasma is directed towards a liquid bath containing a medium.
34-41. (canceled)
42. A plasma deposition apparatus, comprising: a waveguide conduit coupled to a microwave generator, the waveguide conduit having a plurality of slots located at different sides of the waveguide conduit; a primary plunger moveably positioned in the waveguide conduit for creating a primary standing microwave in the waveguide conduit; a plurality of secondary ejector apparatus, each of the secondary ejector apparatus being located on a side of the waveguide conduit opposite a different one of the plurality of slots, each secondary ejector apparatus including (1) an electrically conductive sleeve extending partially into the waveguide conduit, (2) a secondary plunger located concentrically around the electrically conductive sleeve for creating a secondary standing microwave in the ejector apparatus, and (3) an electrically insulating pipe connected to a gas supply source and positioned concentrically within the electrically conductive sleeve, the electrically insulating pipe having a tapered distal tip extending through a respective slot for discharging plasma from the waveguide conduit.
43. The apparatus of claim 42, further comprising a controller for controlling operation of the apparatus.
44. The apparatus of claim 43, further comprising a sensor for detecting plasma output and transmitting data relating to the plasma output to the controller.
45. The apparatus of claim 43, further comprising an ignitor coil at the distal tip of each of the plurality of secondary ejector apparatus, wherein operation of each ignitor coil is controlled by the controller.
46. The apparatus of claim 43, wherein the controller is configured to control the composition of gas from the gas supply source entering each secondary ejector apparatus.
47. The apparatus of claim 43, wherein the controller is configured to control output of the microwave generator.
48. The apparatus of claim 43, further comprising one or more motors for adjusting the primary plunger and secondary plungers, wherein the one or more motors are controlled by the controller.
49. The apparatus of claim 43, wherein the controller is configured to adjust the position of each of the electrically insulating pipes relative to the waveguide conduit.
50-53. (canceled)
54. A membrane plate assembly for use with a cold atmospheric plasma applicator to expose a medium to plasma beams from the plasma applicator, the membrane plate assembly comprising a membrane plate stack configured to receive the plasma beams from the plasma applicator, the membrane plate stack comprising a plurality of membrane-covered structures facing each other in a generally parallel arrangement and being spaced apart to define a channel therebetween through which the plasma beams are directed, each membrane-covered structure comprising a structure and a membrane covering outer surfaces of the structure with a gap therebetween through which the medium is flowed.
55. The membrane plate assembly of claim 54, wherein the medium comprises water, saline, DMEM, BME, blood, or blood plasma.
56. The membrane plate assembly of claim 54, wherein the plasma applicator generates Reactive Oxygen and Nitrogen Species (RONS) plasma.
57. The membrane plate assembly of claim 56, wherein the RONS plasma diffuses through the membranes to activate the medium to kill pathogens in the medium.
58. The membrane plate assembly of claim 56, further comprising turbulators in the channels to enhance the diffusion of plasma species from the plasma beams through the membrane to more effectively transfer the RONS plasma to the medium.
59. The membrane plate assembly of claim 54, wherein the membrane comprises a super-hydrophobic micro-porous membrane.
60. The membrane plate assembly of claim 54, wherein the membrane comprises Polypropylene or Polyethylene.
61. The membrane plate assembly of claim 54, wherein the membrane plate stack is configured such that the medium is flowed in a counterflow direction to the plasma beams.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0041] FIG. 1 shows an exemplary waveguide assembly in accordance with one or more embodiments showing a secondary ejector equipped with a narrowed tip in the ceramic or glass pipe.
[0042] FIG. 2 is a cross sectional view of an exemplary waveguide assembly in accordance with one or more embodiments showing an array of secondary ejectors shown in FIG. 1 in a staggered alignment along a centerline of the waveguide conduit.
[0043] FIG. 3 illustrates an exemplary alternate waveguide assembly in accordance with one or more embodiments in which the secondary ejectors are located at alternating angles to the waveguide centerline and in which two sections of waveguide with their ejectors are connected through a bend section of waveguide, allowing for a more uniform surface treatment.
[0044] FIG. 4 illustrates an exemplary alternate waveguide assembly in accordance with one or more embodiments in which negative ions that are generated in the ECR plasma chamber are subsequently transported to a secondary plasma region.
[0045] FIG. 5 illustrates an exemplary alternate waveguide assembly in accordance with one or more embodiments in which an ignitor coil is provided near the plasma generating region of the ceramic pipe exiting the waveguide.
[0046] FIG. 6 illustrates an exemplary plasma applicator in accordance with one or more embodiments in which a number of plasma beams are directed towards a surface to provide disinfecting or healing properties of the plasma to the surface.
[0047] FIG. 7A shows the applicator of FIG. 6, wherein the number of plasma beams are directed towards a medium such as water, saline solution etc.
[0048] FIG. 7B shows the applicator of FIG. 7A, wherein the number of plasma beams are directed toward a set of hollow membrane plates containing a medium such as water, saline solution etc.
[0049] FIG. 7C shows a detail of the membrane plate assembly of FIG. 7B.
[0050] FIG. 8A shows an exemplary interchangeable plasma applicator in accordance with one or more embodiments with a single point beam.
[0051] FIG. 8B shows an exemplary interchangeable plasma applicator in accordance with one or more embodiments with a single ribbon shaped plasma beam from an oblong ejector.
[0052] FIG. 8C shows an exemplary interchangeable plasma applicator in accordance with one or more embodiments with multiple ribbon shaped plasma beams to treat a flat surface.
[0053] FIG. 8D shows an exemplary interchangeable plasma applicator in accordance with one or more embodiments with multiple ribbon shaped plasma beams on a flexible waveguide to treat a curved surface.
[0054] FIG. 9 shows an exemplary alternative embodiment of the secondary ejector with a side gas input port and controller for tuning the waveguide plungers, an ignitor coil, a Venturi nozzle, and a sensor to detect the proper dose of plasma to be applied to the surface, wherein a control system can be used for the plasma applicators in FIG. 7A-B and FIG. 8A-D.
[0055] FIG. 10 illustrates an exemplary alternate embodiment of the secondary plasma ejectors, wherein ejectors are alternatingly located on opposite sides of the waveguide, thereby allowing for ejection of plasma species on two side of the waveguide, such as for the creation of RONS for treatment and disinfection of air. The figure also shows a simplified control system for an interchangeable plasma applicator system,
[0056] FIG. 11 illustrates an exemplary control system and a set of motors in accordance with one or more embodiments to move the primary and secondary plungers as well as the metal sleeve. Also shown in the figure is an insulator in the gap between the metal sleeve and the waveguide wall to prevent or inhibit arcing.
[0057] FIG. 12 shows a three dimensional view an exemplary plasma applicator in accordance with one or more embodiments with a section removed to illustrate various waveguide concepts of FIGS. 1, 5, 9, and 10.
DETAILED DESCRIPTION
[0058] FIG. 1 shows a waveguide assembly 109, which contains a primary plunger 108 opposite to the microwave inlet 111. The waveguide assembly 109 contains one or more secondary ejectors comprising of ceramic or glass or some other suitably electrically insulating pipes 106, metal or some other suitably conductive sleeve 110, a secondary plunger 105, and conductive or coaxial housing 107, have been equipped with tapered tips 103 at the end of the ceramic or glass pipes 106. In some applications, such as medical plasma applications, it is desirable to operate the plasma source at low power levels, thereby creating a Cold Atmospheric Plasma (CAP). CAPs are useful in applications in atmosphere for treating skin surfaces and other parts of the body, where the plasma temperature has to be maintained close to room temperature. Lower power levels leave the bulk gas temperature near room temperature, but the electron temperature of the plasma stays much higher (also called a non-Thermal Plasma). At very low power levels the plasma column 104 can become unstable or extinguish. Adding a tapered end nozzle 103 to the pipe 106 creates a higher gas pressure in the pipe which then expands into the surrounding atmosphere resulting in a lower pressure and temperature plasma 102 which then reduces the bulk gas temperature adiabatically, while maintaining the high electron temperature.
[0059] FIG. 1 furthermore illustrates a cross sectional view with an outline of the ejected plasma 102. Gas 101 enters under pressure Pi, and temperature typically 300K (about room temperature). By adiabatic expansion through nozzle 103, the exiting plasma column 102 will have a much lower temperature, which will be increased by the power P.sub.w added into the plasma by the microwave. This will allow for significant cooling of the bulk plasma, allowing the plasma to operate at higher power levels than would otherwise be possible, thereby also generating higher quantities of reactive plasma species such as Reactive Oxygen and Nitrogen Species (known as RONS). RONS are known to be beneficial in the treatment of skin cancers, help in wound healing and can selectively kill bacteria and viruses on surfaces. Keeping a much lower bulk gas temperature in plasma column 102 will therefor allow for the treatment of surfaces that cannot be exposed to high temperature gases such as human skin.
[0060] FIG. 2 illustrates a cross sectional view of an alternate embodiment of the narrowed pipes 106 of FIG. 1 wherein the pipe outlet 201 comprises multiple outlets and wherein the secondary ejectors 203 are located in a staggered pattern along the waveguide. The cross-section shown in the figure is cut through one set of secondary ejectors, and not on the centerline of the waveguide 109. By using staggered ejectors and employing multiple outlets on the ceramic pipes 201, a plasma blanket can be created below the surface of the waveguide 109. The figure furthermore illustrates a screw adjuster 202 and microwave inlet flange 204, which are discussed in more detail in, for example, U.S. Pat. No. 10,861,667.
[0061] FIG. 3 illustrates an alternate embodiment of the secondary ejectors 305 similar to the oblong ejectors shown in U.S. Pat. No. 10,861,667. The ejectors in FIG. 3 have an oblong coaxial housing 302, a conductive sleeve 304 and an insulating oblong pipe 303. The ejectors 305 are located at alternating angles to the main waveguide centerline and wherein two sections 109 of waveguide with their ejectors 305 are connected through a U-shaped bend section 301 of waveguide, allowing for a more uniform surface treatment. It should be obvious that additional sections 301 and waveguide sections 109 can be added to create a plasma treatment system for larger surfaces. The figure also shows an optional ECR chamber 305, with magnets 307 installed on the walls of the ECR chamber and an extractor plate 306. Microwaves enter the inlet 308 are conducted through the first set of secondary ejectors 305, are conducted through the U-shaped connector 301 into a second set of secondary ejectors 309 and primary plunger 108 now helps created a standing microwave in both sections of the secondary ejectors.
[0062] FIG. 4 illustrates an alternative embodiment of FIG. 3. The plasma column 104 exiting from the secondary ejector region is used to create an ECR plasma 401 as discussed previously. The ECR plasma 401 is confined by magnets 307. This ECR plasma will contain a certain amount of negative ions 403, which can be extracted from the plasma by positively charging extractor plates 306 or by allowing negative ions 403 to drift through openings 402 in the ECR chamber 305. The negative ions 403 are directed towards a secondary plasma 404, which is generated by, for example, a radio frequency power source 406, similar to the plasma source described by Keller (U.S. Pat. No. 5,783,102). Keller however, generates the upper plasma 401 by using a Radio Frequency source, rather than a much higher intensity secondary standing wave as described here. Species generated in the secondary plasma 404 can be directed towards substrate 405, which is biased by the power supply 406. In this construction, a significantly higher amount of negative ions can be delivered to the substrate 405 or directed to an ion accelerator column instead of being directed to a substrate 405.
[0063] FIG. 5 shows a section of an alternative embodiment of the secondary ejectors in FIG. 3, with a small section of the waveguide wall 109 removed for clarity and wherein an ignitor coil 502 has been placed near the plasma generating region 503 of the ceramic pipes 303 exiting the waveguide 109. At low required power levels as described above, it may be difficult to sustain the plasma, but even more difficult to get it started. Coils can be installed as shown in Paranjpe (U.S. Pat. No. 5,389,153), but ignitor coils 502 can alternatively be located near the plasma region 503. The advantage of this arrangement over Paranjpe is that the coils 502 can be activated by an electronic pulse through the wire leads 501, thereby igniting the plasma, even at relatively low power levels. This also means that in some cases the metal sleeve 304 can be fixed in position, eliminating the need to adjust the gap between the metal sleeve 304 and the bottom of the waveguide 109, in the plasma generating region 503, thereby simplifying the system.
[0064] FIG. 6 illustrates a plasma applicator wherein a number of (RONS) plasma beam lets 604 are directed towards a surface 602 in order to provide disinfecting or healing properties of the plasma to the surface 602. As discussed above, RONS generated in plasma beams are known to have beneficial effects on skin cancers, selectively killing the cancer cells. RONS also kill viruses and bacteria on surfaces. In order to safely treat biological surfaces, the bulk plasma temperature needs to be kept low enough that such a treatment can be tolerated. FIG. 6 uses the nozzles from FIG. 1 to inject multiple plasma beams into an optional plasma diffuser chamber 601. Outlet holes in the diffuser 603 generate small plasma beam lets 604 from the diffuser 603, thereby allowing a surface 602 to be treated while maintaining a plasma temperature relatively close to room or body temperature. It should be clear that such a plasma applicator can be used as a “dry” method of disinfecting human hands, or skin because the RONS will selectively and rapidly kill any bacteria or viruses present on the surface 602.
[0065] FIG. 6 also shows that microwaves can be inserted into the waveguide 109 through a coupler 605, rather than through a flange 204 as shown in earlier figures. In low power (less than about 500 W) applications, a cable 606 can deliver the microwave power to the applicator. Microwave cables have practical limits on how much power can be transported from the power supply to the applicator, so for high power applications, a flange 204 to a microwave head such as a magnetron or klystron is more common.
[0066] FIG. 7A shows the applicator of FIG. 6, wherein the number of plasma beams 604 are directed towards a liquid medium 702 contained in a container 701. Such a medium can be deionized or regular or Milli-Q water, saline solution, cell growth medium Dulbecco's Modified Eagle Medium (DMEM), Basal Medium Eagle (BME), etc. The plasma generated RONS, or Reactive Oxygen Species (ROS) or Reactive Nitrogen Species (RNS) 604, are directed towards or bubbled into the medium 702, thereby creating reactive plasma species in the medium also known as Plasma Activated Media (PAM). PAMs can be injected into cancerous tumors or other tissues, where they retain the ability to selectively destroy cancer cells, kill viruses or bacteria etc. for a period of several hours.
[0067] FIG. 7B shows the applicator of FIG. 6, wherein the number of plasma beams 604 are directed toward a series of hollow membrane plates 704 containing a PAM medium such as water, saline solution, DMEM, BME, blood, blood plasma, etc. In many cases such as in the case of blood, direct exposure of the medium to air might bring in undesirable contamination or oxidation. By directing the plasma beams 604 in between the member plates 704, and by adding optional turbulators structures 709, the medium behind the membranes can be exposed to the plasma beams 604 without being directly exposed to air. Also the membrane plates 704 create a significantly larger exposure area for the plasma and the medium to interact thereby enhancing the amount of medium that absorbs the plasma species. Medium is directed into port 703, where it gets distributed to each of the membrane plates 704. In this example, the membrane plate stack is set up as a counterflow medium-to-plasma exchanger. Medium 705 flows horizontally 706 along the bottom inside the membrane plates 704 and is then directed vertical channels 707 inside the membrane plates 704. When the medium 705 reaches the top of the plates 704 it flows along horizontal channels 708 until it reaches the exit port 710.
[0068] FIG. 7C shows a detail of the membrane plate assembly of FIG. 7B, wherein a section of the membranes 714 of the first membrane plate 704 has been removed to show the medium 705 flow patterns inside the plate 704. Medium 705 enters through port 703 and flows through distribution bulkhead channel 711 into the individual membrane plates 704. Each hollow membrane plate 704 is typically constructed with a support frame 712 which defines flow channels for the medium 705. The frame 712 is typically covered on both sides with a membrane 714, which can be a superhydrophobic membrane or some other suitable membrane. Plasma beams 604 are typically directed 713 against the flow of the medium 705 inside the membrane plates 704. Optional turbulators 709 can create vortex flows thereby enhancing the interchange between the plasma 604 and the medium 705, but preventing direct exposure of the medium 705 to the plasma/air stream. RONS in the plasma beams 604 will diffuse through the membrane 714 into the medium 705, thereby activating the medium 705 and potentially killing pathogens in the medium 705 such as viruses and bacteria. If the medium 705 is blood or a blood plasma, or saline, the thus activated medium 705 could be injected into a patient, for example into a patient suffering from a blood cancer or sepsis.
[0069] FIGS. 8A through 8D show a cross sectional model of a set of interchangeable plasma applicators. FIG. 8A shows an applicator 801 with a single point beam 805. In some applications such as treating a small skin carcinoma, a small circular RONS plasma beam is easiest to use to treat a patient. Because the microwave connector 806 can be made common between all plasma applicators shown in these figures, it is possible to manufacture interchangeable plasma applicators that can be exchanged depending on the needs of the area to be treated. The microwave input 806 is kept at the same distance from the connector 806 to the first secondary ejector at ½ of the wavelength of the microwaves used and also is kept at the same distance to the waveguide wall 807. (typically ¼ of the wavelength of the microwaves used)). A variable power solid state microwave supply can typically deliver power between 2% and 100% of maximum power and therefore a wide range of applicators can share a single power supply.
[0070] FIG. 8B shows a cut-through of an alternate embodiment of an interchangeable plasma applicator 802 with a single ribbon shaped plasma beam 811 emanating from an oblong ejector comprising an electrically insulating pipe 808, a metal sleeve 810 and a housing 809 as described earlier in FIG. 3. A small single ribbon beam 811 can be used to treat larger areas than the point beam of FIG. 8A.
[0071] FIG. 8C shows a cut-through of an alternate embodiment of an interchangeable plasma applicator 803 with multiple ribbon shaped plasma beams 815 to treat a large flat surface, for example such as treating a wall, a floor or any flat surface The large oblong secondary ejectors comprise multiple insulating pipes 812, housings 813 and metal sleeves 814.
[0072] FIG. 8D shows a cut-through of an alternative embodiment of an interchangeable plasma applicator 804 with multiple ribbon shaped plasma beams 815 on a flexible waveguide 815 to treat a curved surface, such as for example a human leg, head or other curved surface.
[0073] It should be obvious that many different plasma applicators can be attached through a common microwave cable 606 and gas supply source. For example, it would be relatively easy to supply a dermatologist or hospital with a set of applicators for different skin surface areas as well as with a plasma activating medium applicator as was shown in FIG. 7A, FIG. 7B and FIG. 7C, thereby allowing for great treatment flexibility for both skin cancers as well of solid and blood cancers, all by using interchangeable plasma applicators and a common microwave power source and gas supply system, thereby significantly reducing capital costs.
[0074] FIG. 9 shows an alternative embodiment of the secondary ejectors shown in previous figures with a side gas input port 901 and a controller 902 for tuning the waveguide plungers 108 and 903 using motors 905 and 904, respectively. The controller 902 can also take sensor 906 data to compute a plasma dose to be applied to a substrate 908 so that the plasma beam 912 is properly covering the treatment area 909 and not needlessly treating the remaining area of substrate 908. Such a control system is convenient in the case where a RONS plasma is treating a larger cancerous area such as a melanoma or other surface cancer. The sensor 906 can be an optical sensor, a camera, a LIDAR (Light Detection and Ranging), RADAR (Radio Detection and Ranging), a spectrometer or any other convenient sensor that imparts surface density information and or plasma composition information to the controller 902. In the embodiment of FIG. 9, the secondary plunger 903 (e.g., secondary plunger 105 in FIG. 1) has been modified so that no ceramic pipe goes through the center of the secondary plunger thereby increasing the microwave reflecting area of the secondary plunger. Sleeve 910 has likewise been modified to allow for passage of gas pipe 911 into the plasma region 104. An ignitor coil 913 gives the controller 902 another means of starting the plasma 104. A Venturi nozzle 907 allows a small amount of air to be inserted into the plasma beam 912 thereby reducing the need for multiple gases or gas mixtures supplied through the gas pipe 901. The controller 902 thus has several means of controlling the dose of plasma to be applied to the treatment area 909: by moving the position of secondary or primary plungers a different plasma excitation mode or power level can be obtained. By controlling, or shutting of the gas supply to one or more ejectors, the plasma columns can be stopped temporarily and by using the ignitor coils 913 the local plasma beam 912 can be restarted when needed. The controller 902 can also change the gas mixture for example in a RONS mixture of 96% Argon, 2% Oxygen and 2% Nitrogen, the Oxygen or Nitrogen gas or both could be temporarily shut of thereby changing the RONS concentrations in a controlled fashion.
[0075] FIG. 10 illustrates an alternate embodiment of the system of FIG. 1, wherein alternating ejectors are located on opposite sides of the waveguide 109. By alternating the ejectors two separate RONS areas 1002 and 1003 can created on opposite sides of the waveguide. FIG. 10 also illustrates a simplified control system for the interchangeable, multi-ejector plasma applicator system shown in FIG. 7A through 7D, wherein the controller 902 can be used for the plasma applicators in FIG. 7A-B and FIG. 8A-D and simultaneously controls the microwave power supply 1001. Sensor 906 provides information to the controller 902 so that proper plasma dose can be applied to the treatment surface area. It should be clear that not all control elements of FIG. 10 are needed at all times. Several of the movable components may be fixedly located to reduce cost or complexity.
[0076] FIG. 11 illustrates a spark prevention solution, which can be useful in applications where the electrical field strength in the gap between the metal sleeve 110 and the waveguide wall 109, can result in arcing, such as under high output power conditions. The insulating insert 1101 has a higher dielectric coefficient than a normal air gap, thereby making it harder for arcing to occur. The figure also illustrates a set of motors to control the primary plunger 108 with motor 905, the secondary plunger 105 through motor 1102, and the metal sleeve 110, through motor 1103.
[0077] Having thus described several illustrative embodiments, it is to be appreciated that various alterations, modifications, and improvements will readily occur to those skilled in the art. Such alterations, modifications, and improvements are intended to form a part of this disclosure, and are intended to be within the spirit and scope of this disclosure. While some examples presented herein involve specific combinations of functions or structural elements, it should be understood that those functions and elements may be combined in other ways according to the present invention to accomplish the same or different objectives. In particular, acts, elements, and features discussed in connection with one embodiment are not intended to be excluded from similar or other roles in other embodiments. Accordingly, the foregoing description and attached drawings are by way of example only, and are not intended to be limiting.
REFERENCES
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