Method for the bonding and debonding of substrates
11024530 · 2021-06-01
Assignee
Inventors
Cpc classification
B32B7/10
PERFORMING OPERATIONS; TRANSPORTING
Y10T156/1917
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
H01L2221/68381
ELECTRICITY
Y10T156/1158
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
H01L24/94
ELECTRICITY
H01L2221/68318
ELECTRICITY
B32B38/10
PERFORMING OPERATIONS; TRANSPORTING
H01L2224/98
ELECTRICITY
B32B7/12
PERFORMING OPERATIONS; TRANSPORTING
International classification
B32B43/00
PERFORMING OPERATIONS; TRANSPORTING
Abstract
A product-substrate-to-carrier-substrate bond with a product substrate, which is bonded to a carrier substrate via a connection layer, wherein a soluble layer is arranged between the connection layer and the product substrate, and wherein a) the soluble layer is soluble due to an interaction with an electromagnetic radiation of a radiation source, and b) the connection layer and the carrier substrate are both at least predominantly transparent to the electromagnetic radiation transmitted through the connection layer, wherein a material of the soluble layer and the electromagnetic radiation are chosen such that an increase of temperature of the soluble layer caused by the interaction with the electromagnetic radiation is less than 50° C.
Claims
1. A product-substrate-to-carrier-substrate bond with a product substrate, which is bonded to a carrier substrate via a connection layer, wherein a soluble layer is arranged between the connection layer and the product substrate, and wherein a) the soluble layer is soluble due to an interaction with an electromagnetic radiation of a radiation source, and b) the connection layer and the carrier substrate are both at least predominantly transparent to electromagnetic radiation transmitted through the connection layer, wherein a material of the soluble layer and the electromagnetic radiation are chosen such that an increase of temperature of the soluble layer caused by the interaction with the electromagnetic radiation is less than 50° C.
2. The product-substrate-to-carrier-substrate bond with a product substrate according to claim 1, wherein physical and/or chemical properties of the soluble layer, with respect to the electromagnetic radiation, are complement corresponding physical and/or chemical properties of the connection layer and/or the carrier substrate.
3. The product-substrate-to-carrier-substrate bond with a product substrate according to claim 1, wherein an absorption of photons of the electromagnetic radiation in the connection layer is less than 50%.
4. The product-substrate-to-carrier-substrate bond with a product substrate according to claim 1, wherein an absorption of photons of the electromagnetic radiation in the soluble layer is more than 50%.
5. The product-substrate-to-carrier-substrate bond with a product substrate according to claim 1, wherein a temperature of the connection layer increases by less than 50° C. during debonding.
6. The product-substrate-to-carrier-substrate bond with a product substrate according to claim 1, wherein the soluble layer is sublimated by the electromagnetic radiation.
7. The product-substrate-to-carrier-substrate bond with a product substrate according to claim 1, wherein the soluble layer is applied between the connection layer and the product substrate with a layer thickness less than 10 μm.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1)
(2)
(3)
(4)
(5)
(6)
(7)
(8) In the Figures identical components or functionally identical components have been marked with the same reference symbols.
DETAILED DESCRIPTION OF THE INVENTION
(9) All product substrates 2 shown can comprise functional units 6. Also feasible, however, are product substrates which in particular do not comprise any corresponding functional units 6. The functional units 6 may for example be microchips, storage modules, MEMs components etc. It is also feasible that the functional units 6 comprise raised structures 7 such as solder balls. These raised structures 7 may have different shapes, and coating them with the soluble layer 3 is therefore difficult and/or incomplete. When speaking of coating the product substrate 2, this includes the coating of functional units 6 and/or of raised structures 7.
(10)
(11)
(12) According to the invention interaction between the photons of the laser beam 10 and the soluble layer 3 is much higher than with the bonding adhesive, preferably maximal. The soluble layer 3 is, at least partially, preferably predominantly, more preferably completely, dissolved or destroyed. At the very least the adhesive strength between product substrate 2 and bonding adhesive is diminished.
(13) The laser 9 scans in particular the entire surface 3o of the soluble layer, in particular by a movement in x-direction and/or y-direction. It is also feasible to move the laser beam 10 in z-direction in order to ensure better focusing, insofar as the laser beam 10 could not be optimally parallelised.
(14)
(15)
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(17) The soluble layer 3 is applied to the periphery of the carrier substrate 5, wherein the soluble layer 3 is sensitive to the wavelength of the laser beam 10 used. The debonding operation is effected either due to the construction of the inventive embodiment shown in
(18)
(19) For clarity's sake only one local absorption minimum 12 is centrically shown in the absorption graph 11. The local absorption minimum 12 is part of an optimal absorption area 13, wherein the wavelength of the laser beam 10 of laser 9 to be used according to the invention is adjusted to match the wavelength range thereof.
(20) According to the invention the bonding adhesive used is chosen such that the wavelength of the used laser beam 10 lies within the optimal absorption area 13, preferably exactly matches the absorption minimum 12. In this way it is ensured that the bonding adhesive for the laser beam 10 has a maximum transparency according to the invention.
(21)
(22) The local absorption maximum 14 is part of an optimal absorption area 13′, wherein the wavelength of the laser beam 10 of laser 9 to be used should be adjusted to match the wavelength range thereof. According to the invention the soluble layer 3 is chosen such that the wavelength of the used laser beam 10 lies within the optimal absorption area 13′, preferably exactly matches the absorption maximum 14. In this way it is ensured that the absorption of the soluble layer for the laser beam 10 is at its maximum according to the invention.
(23) According to the invention it is above all of crucial importance that the soluble layer 3 is at all reached by the laser beam 10 to any noticeable extent. Insofar as the wavelength of the laser beam 10, of the bonding adhesive 4 and of the soluble layer 3 cannot be optimally adjusted relative to each other, one should preferably proceed in such a way that at least the wavelength of the laser beam 10 is tuned to match at least one or more absorption minima of the bonding adhesive, in order to allow the photons of the laser beam 10 to gain the most unhindered access possible to the soluble layer 3.
LIST OF REFERENCE SYMBOLS
(24) 1, 1′, 1″ substrate stack (product-substrate-to-carrier-substrate bond) 2 product substrate 3 soluble layer 3o surface of soluble layer 4 connection layer 5 carrier substrate 5o surface of carrier substrate 6 functional unit 7 raised structures 8 non-stick layer 8o surface of non-stick layer 9 laser 10 laser beam 11 absorption graph 12 absorption minimum 13 optimal absorption area 14 absorption maximum 15 dissolved soluble layer R rotary axis