AFTERTREATMENT ARRANGEMENT AND METHOD FOR THE AFTERTREATMENT OF AT LEAST GASES DOWNSTREAM OF A FLUID BED GASIFICATION SYSTEM, AND LOGIC UNIT AND USE

Abstract

The invention relates to an aftertreatment arrangement (1.0) for the aftertreatment of at least gases downstream of a fluidized bed gasification process, in particular downstream of an HTW gasifier (1) of a pressure-loaded fluidized bed gasification process, having a particle separation unit (2; 11) which can be arranged downstream of the fluidized bed gasification process and upstream of a gas cooler (3) that can be used for the further aftertreatment of the gases, wherein the aftertreatment arrangement comprises an intermediate cooling unit (12) which can be arranged downstream of the fluidized bed gasification process and upstream of the particle separation unit (11), having a return (B1) for gasification steam (B) that can be coupled to the fluidized bed gasification process. Furthermore, the invention relates to a method for the aftertreatment of at least gases downstream of a fluidized bed gasification process as well as the use of an intermediate cooling unit.

Claims

1. An aftertreatment arrangement (10) for the aftertreatment of at least gases downstream of a fluidized bed gasification process, particularly downstream of an HTW gasifier (1) of a pressure-loaded fluidized bed gasification process, having a particle separation unit (2; 11) which can be arranged downstream of the fluidized bed gasification process and upstream of a gas cooler (3) that can be used for the further aftertreatment of the gases; characterized in that the aftertreatment arrangement comprises an intermediate cooling unit (12) which can be arranged downstream of the fluidized bed gasification process and upstream of the particle separation unit (11), having a return (B1) for gasification steam (B) that can be coupled to the fluidized bed gasification process.

2. The aftertreatment arrangement according to claim 1, wherein the particle separation unit (11) is designed as a cyclone candle filter unit.

3. The aftertreatment arrangement according to claim 2, wherein the cyclone candle filter unit (11) has a dust return (A1) that can be coupled to the fluidized bed gasification process.

4. The aftertreatment arrangement according to claim 1, wherein the aftertreatment arrangement (10) comprises a bottom product oxidation chamber (13) that can be arranged on the discharge side of the fluidized bed gasification process, particularly one that can be coupled to the HTW gasifier.

5. The aftertreatment arrangement according to claim 1, wherein the aftertreatment arrangement (10) comprises a bottom product cooling unit (14) that can be arranged on the discharge side of the fluidized bed gasification process, particularly of the HTW gasifier (1), particularly one that can be arranged on the discharge side of the bottom product oxidation chamber (13).

6. The aftertreatment arrangement according to claim 1, wherein the particle separation unit (11) is combined with the cooling unit (12) into one unit.

7. A method for the aftertreatment of at least gases downstream of a fluidized bed gasification process, particularly downstream of an HTW gasifier (1) of a pressure-loaded fluidized bed gasification process, comprising a particle separation process (11) which can be arranged downstream of the fluidized bed gasification process and upstream of a gas cooler (3) that can be used for the further aftertreatment of the gases; characterized in that gas from the fluidized bed gasification process is subjected to intermediate cooling (12) upstream from the particle separation process (11), combined with a return of gasification steam (B) from the intermediate cooling back to the fluidized bed gasification process.

8. The method according to claim 7, wherein the intermediate cooling (12) occurs to 650° C., particularly from approx. 950° C.

9. The method according to claim 7, wherein particle separation (11) is carried out by means of a cyclone candle filter unit; and/or wherein dust (A1) is returned from the particle separation process (11) into the fluidized bed gasification process, particularly into the HTW gasifier (1).

10. The method according to claim 7, wherein an oxidation of the bottom product occurs on the discharge side of the fluidized bed gasification process; and/or wherein bottom product cooling (14) occurs on the discharge side of the fluidized bed gasification process, particularly on the discharge side of the oxidation (13) of the bottom product.

11. The method according to claim 7, wherein the gas downstream from the fluidized bed gasification process is subjected first to intermediate cooling (12), then particle separation (11) and then the gas cooling (3) in sequence.

12. The method according to claim 7, wherein synthesis gas (G) is produced by gas being guided out of the fluidized bed gasification process downstream of the gas cooling (3) through at least one water scrubbing unit (5), one shift unit (6) and one desulfurization unit (7).

13. The method according to claim 7, carried out by means of an aftertreatment arrangement (10) according to one of the preceding claims.

14. A logic unit (20) set up for controlling a method according to claim 7, wherein the logic unit is coupled to an intermediate cooling unit (12) and is set up for regulating the cooling of the gases, particularly in a range between 950° C. and 650° C., and is set up for regulating a gas supply to a particle separation unit or also to a bottom product oxidation chamber, particularly for regulating at least a volume flow.

15. (canceled)

Description

[0032] Additional features and advantages of the invention emerge from the description of at least one embodiment using drawings, as well as from the drawings themselves. In regard to reference signs that are not described explicitly in reference to an individual drawing, reference shall be made to the other drawings. Shown in a schematic depiction in each case are:

[0033] FIG. 1 an arrangement having an HTW gasifier, in which gas is discharged downstream into a return cyclone and into a bottom product cooling screw and

[0034] FIG. 2 an aftertreatment arrangement according to an embodiment integrated downstream or on the discharge side of an HTW gasifier.

[0035] FIG. 1 depicts a high-temperature Winkler (HTW) gasifier 1, a return cyclone (particle separator) 2 arranged downstream thereof on a first gas flow path, downstream from that a raw gas cooler 3, a warm gas filter 4, a water scrubbing process or water scrubbing unit 5, a shift process or a shift unit 6, a desulfurization process or desulfurization unit 7, as well as in each case downstream from the HTW gasifier 1, arranged on a second and third gas flow path respectively a transport device, particularly a screw 8, designed once as a cooling screw 8a for dust and designed once as a cooling screw 8b for bottom product further downstream from that in each case a discharge screw 8e, and lastly a fluidized bed chamber 9.

[0036] There is a dust return A1 of dust A from the particle separator 2 back to the HTW gasifier 1. The HTW gasifier 1 is supplied with gasification steam B as well as air, oxygen, CO2 (feed C) as well as fuel D. Carbon-containing bottom product E and carbon-containing dust F are supplied to the fluidized bed chamber 9. Synthesis gas G is discharged downstream from the desulfurization unit 7.

[0037] FIG. 2 depicts an aftertreatment arrangement 10 having a particle separation process or a particle separation unit 11, particularly constructed as a cyclone candle filter unit. Intermediate cooling or an intermediate cooling unit 12 is provided downstream from the HTW gasifier 1 and upstream from the cyclone candle filter unit 11.

[0038] There is a dust return A from the particle separator 11 back to the HTW gasifier 1. The HTW gasifier 1 is supplied with gasification steam B, said gasification steam B able to be returned from the intermediate cooling unit 12 via a return line B1. The HTW gasifier 1 is also supplied with air, oxygen, CO2 (feed C) as well as fuel D.

[0039] Downstream from the cyclone candle filter unit 11 arranged on a first gas flow path, there are arranged a raw gas cooler 3, a water scrubbing process or a water scrubbing unit 5, a shift process or a shift unit 6 as well as a desulfurization process or a desulfurization unit 7. Synthesis gas G is discharged downstream from the desulfurization unit 7. A warm gas filter (reference sign 4 in FIG. 1) is no longer needed. On account of the cyclone candle filter 11, a warm gas filter can be omitted.

[0040] Transport devices, particularly screws, are not provided. Instead, downstream from the HTW gasifier 1 on a second gas flow path, there is arranged a bottom product oxidation process or at least one oxidation chamber 13 for bottom product and a bottom product cooling process or at least a bottom product cooling unit 14. Ash H is discharged downstream from the bottom product cooling process 14.

[0041] A logic unit 20 is coupled at least to the HTW gasifier 1, to the particle separation unit 11, to the intermediate cooling unit 12, to the oxidation chamber 13 and/or the bottom product cooling unit 14.

LIST OF REFERENCE SIGNS

[0042] 1 Fluidized bed gasification process with high-temperature Winkler (HTW) gasifier [0043] 2 Return cyclone (particle separator) [0044] 3 (Raw) gas cooler or (raw) gas cooling [0045] 4 Warm gas filter [0046] 5 Water scrubbing process or water scrubbing unit [0047] 6 Shift process or shift unit [0048] 7 Desulfurization process or desulfurization unit [0049] 8 Transport device, particularly a screw [0050] 8a Cooling screw for dust [0051] 8b Cooling screw for bottom product [0052] 8c Discharge screw [0053] 9 Fluidized bed chamber [0054] A; A1 Dust or dust return [0055] B; B1 Gasification steam or return for gasification steam [0056] C Air, oxygen, CO2 [0057] D Fuel [0058] E C-containing bottom product [0059] F C-containing dust [0060] G Synthesis gas [0061] H Ash [0062] 10 Aftertreatment arrangement [0063] 11 Particle separation process or particle separation unit, particularly a cyclone cartridge [0064] filter unit [0065] 12 Intermediate cooling or intermediate cooling unit [0066] 13 Bottom product oxidation or oxidation chamber for bottom product [0067] 14 Bottom product cooling or bottom product cooling unit [0068] 20 Logic unit