Antireflection film and its use on a substrate
11029514 · 2021-06-08
Assignee
Inventors
- Zoltán Hórvölgyi (Budapest, HU)
- Emöke Albert (Budapest, HU)
- Lenke Kócs (Piliscaba, HU)
- Csaba Ferenc Major (Eger, HU)
- Jánosné Kabai (Budapest, HU)
Cpc classification
F21V3/10
MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
C03C2217/734
CHEMISTRY; METALLURGY
C08J2369/00
CHEMISTRY; METALLURGY
G02B27/00
PHYSICS
C03C2218/365
CHEMISTRY; METALLURGY
International classification
Abstract
This disclosure relates to an antireflection film, as well as its use on a substrate (3) to decrease a fracture of light striking the substrate (3) reflected by said substrate (3), wherein said coating is formed of a transparent first layer (1) applied on the substrate (3) and a transparent second layer (2) on said first layer (1). The essence of the solutions according to this disclosure is that thickness (d.sub.1) of the first layer (1) ranges from 10 to 70 nm and refractive index (n.sub.1) of said first layer (1) satisfies the relation 1.05<n.sub.1<1.35 within the wavelength range of 375 to 1000 nm, and wherein thickness (d.sub.2) of the second layer (2) ranges from 30 to 100 nm and refractive index (n.sub.2) of said second layer (2) satisfies the relation 1.25<n.sub.2<1.5 within the wavelength range of 375 to 1000 nm, and wherein n.sub.1<n.sub.2 also holds.
Claims
1. An antireflection coating comprising: a transparent first layer (1) applied on a substrate (3) of low refractive index (n.sub.substrate); and a transparent second layer (2) over the first layer (1), wherein thickness (d.sub.1) of the first layer (1) ranges from 10 to 70 nm and refractive index (n.sub.1) of said first layer (1) satisfies 1.05<n.sub.1<1.35 within an entire wavelength range of 375 to 1000 nm, and wherein thickness (d.sub.2) of the second layer (2) ranges from 30 to 100 nm and refractive index (n.sub.2) of said second layer (2) satisfies 1.25<n.sub.2<1.5 within the entire wavelength range of 375 to 1000 nm, and wherein n.sub.1<n.sub.2.
2. The antireflection coating according to claim 1, wherein the substrate (3) for the antireflection coating is transparent within the wavelength range of 375 to 1000 nm.
3. The antireflection coating according to claim 2, wherein the antireflection coating is formed on both side surfaces of the substrate (3).
4. The antireflection coating according to claim 2, wherein the substrate (3) forms an envelope or at least a part of an envelope of a light emitting device.
5. The antireflection coating according to claim 2, wherein the substrate (3) is an optical lens.
6. The antireflection coating according to claim 1, wherein the low refractive index (n.sub.substrate) of said substrate (3) satisfies n.sub.substrate<2.5.
7. The antireflection coating according to claim 1, wherein said substrate (3) is made of at least one substance chosen from the group consisting of glass, quartz glass and polycarbonate.
8. A method comprising using an antireflection coating on a substrate (3) to decrease a fraction of light striking the substrate (3) reflected by said substrate (3), wherein refractive index (n.sub.substrate) of the substrate (3) satisfies n.sub.substrate<2.5, and wherein said antireflection coating applied on said substrate (3) is formed of a first layer (1) and a second layer (2) over the first layer (1), wherein thickness (d.sub.1) of the first layer (1) ranges from 10 to 70 nm and refractive index (n.sub.1) of said first layer (1) satisfies 1.05<n.sub.1<1.35 within a wavelength range of 375 to 1000 nm, and wherein thickness (d.sub.2) of the second layer (2) ranges from 30 to 100 nm and refractive index (n.sub.2) of said second layer (2) satisfies 1.25<n.sub.2<1.5 within the wavelength range of 375 to 1000 nm, and wherein n.sub.1<n.sub.2.
9. The method according to claim 8, further comprising the antireflection coating decreasing the fraction of light striking the substrate reflected by said substrate (3) in a broad range of wavelengths.
10. The method according to claim 9, wherein said broad range of wavelengths ranges from about 400 nm to about 900 nm.
11. The method according to claim 8, further comprising the antireflection coating decreasing the fraction of light striking the substrate reflected by said substrate (3) in a broad range of angles of incidence.
12. The method according to claim 11, wherein said broad range of angles of incidence ranges from about 0° to about 70°.
13. The method of claim 8, wherein said substrate (3) is made of at least one substance chosen from the group consisting of glass, quartz glass and polycarbonate.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1) The invention is now discussed in detail with reference to the drawings, some preferred embodiment structures and measuring data obtained in measurements performed on these structures, wherein
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(13) In the drawings, identical layers are designated with the same reference numerals.
DETAILED DESCRIPTION
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(15) Such a two-layer antireflection coating can be formed on the substrate 3 through e.g. the so-called “sol-gel” technique known in literature, preferably by means of a dip coating technology and then by conditioning the obtained coating under suitable conditions; basic details of the procedure can be known from e.g. EP-2,939,987 A1, and Chapter 10 “Dip Coating” by C. Jeffrey Brinker included in the textbook of Chemical Solution Deposition of Functional Oxide Thin Films (editors: T. Schneller, R. Weser, M. Kosec, D. Payne; publisher: Springer Vienna; published in 2013; ISBN 978-3-211-99310-1).
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(23) According to our studies, it might also occur that the first layer 1 is formed by a combination of several sublayers, wherein the total thickness of said combination of sublayers corresponds to the thickness d.sub.1 of the first layer 1, the refractive indices of said sublayers of the combination preferably increase as progressing away from the substrate 3, and all the refractive indices of the sublayers are within the range of refractive indices set for the refractive index n.sub.1 of the first layer 1 in the above-referred first embodiment of the antireflection coating according to the invention.
(24) Alternatively, according to our studies, it might also occur that said second layer 2 is formed by a combination of several sublayers, wherein the total thickness of said combination of sublayers corresponds to the thickness d.sub.2 of the second layer 2, the refractive indices of said sublayers of the combination preferably increase as progressing away from the substrate 3, and all the refractive indices of the sublayers are within the range of refractive indices set for the refractive index n.sub.2 of the second layer 2 in the above-referred first embodiment of the antireflection coating according to the invention.
(25) The substrate 3, optionally, may form the envelope of a light emitting device or a part thereof. In such a case, the decrease in the amount of light being generated inside said envelope reflected by the internal surface of the envelope leads to an increase in the luminous efficiency. In a possible further case, the substrate 3 may form an optical lens, including all kinds of imaging and other non-imaging lenses as well. For a skilled artisan, advantages of the usage of an antireflection coating according to the present invention (such as e.g. higher light transmission rates, images with higher contrast, easier recordability due to the greater amount of light passed through, etc.) are evident.