III-V/SI HYBRID OPTOELECTRONIC DEVICE AND METHOD OF MANUFACTURE

Abstract

A method of manufacturing an electro-optically active device. The method comprising the steps of: etching a cavity on a silicon-on-insulator wafer; providing a sacrificial layer adjacent to a substrate of a lll-V semiconductor wafer; epitaxially growing an electro-optically active structure on the lll-V semiconductor wafer; etching the epitaxially grown optically active structure into an electro-optically active mesa; disposing the electro-optically active mesa in the cavity of the silicon-on-insulator wafer and bonding a surface of the electro-optically active mesa, which is distal to the sacrificial layer, to a bed of the cavity; and removing the sacrificial layer between the substrate of the lll-V semiconductor wafer and the electro-optically active mesa.

Claims

1. A method of manufacturing an electro-optically active device, comprising the steps of: etching a cavity on a silicon-on-insulator wafer; providing a sacrificial layer adjacent to a substrate of a III-V semiconductor wafer; epitaxially growing an electro-optically active structure on the III-V semiconductor wafer; etching the epitaxially grown electro-optically active structure into an electro-optically active mesa; disposing the electro-optically active mesa in the cavity of the silicon-on-insulator wafer and bonding a surface of the electro-optically active mesa, which is distal to the sacrificial layer, to a bed of the cavity; and removing the sacrificial layer between the substrate of the III-V semiconductor wafer and the electro-optically active mesa.

2. The method of claim 1, wherein the sacrificial layer is formed of indium gallium arsenide or silicon dioxide, and preferably formed of indium gallium arsenide.

3. The method of claim 1, wherein the substrate is formed of indium phosphide or silicon, and preferable formed of indium phosphide.

4. The method of claim 1, including the step of disposing a bonding layer on at least an uppermost exposed surface of the electro-optically active mesa.

5. The method of claim 4, wherein the bonding layer is formed from silicon dioxide.

6. The method of claim 1, wherein the step of disposing the electro-optically active mesa in the cavity includes a step of inverting the III-V semiconductor wafer, such that the electro-optically active mesa is the lowermost surface of the III-V semiconductor wafer.

7. The method of claim 1, wherein the sacrificial layer is at least 1000 nm thick as measured from an uppermost surface of the substrate to an uppermost surface of the sacrificial layer.

8. The method of claim 1, wherein the electro-optically active mesa is at least partially formed from any one or more of: indium phosphide, aluminium indium gallium arsenide, and indium gallium arsenide.

9. A method of manufacturing an electro-optically active device, comprising the steps of: providing a III-V semiconductor wafer, the wafer comprising: a substrate, a sacrificial layer, and an electro-optically active mesa; wherein the sacrificial layer is between the substrate and the electro-optically active mesa; providing a silicon-on-insulator wafer, including a cavity etched therein; disposing the electro-optically active mesa in the cavity of the silicon-on-insulator wafer, and bonding a surface of the electro-optically active mesa, which is distal to the sacrificial layer, to a bed of the cavity; and removing the sacrificial layer between the substrate of the III-V semiconductor wafer and the electro-optically active mesa.

10. The method of claim 9, wherein sacrificial layer is formed of indium gallium arsenide or silicon dioxide, and preferably formed from indium gallium arsenide.

11. The method of claim 9, wherein the substrate is formed of indium phosphide or silicon, and preferably formed from silicon.

12. The method of claim 9, wherein the electro-optically active mesa includes a bonding layer, located distal to the sacrificial layer.

13. The method of claim 12, wherein the bonding layer is formed from silicon dioxide.

14. The method of claim 9, wherein the step of disposing the electro-optically active mesa in the cavity includes a step of inverting the III-V semiconductor wafer, such that the electro-optically active mesa is the lowermost surface of the III-V semiconductor wafer.

15. The method of claim 9, wherein the sacrificial layer is at least 1000 nm thick as measured from an uppermost surface of the substrate to an uppermost surface of the sacrificial layer.

16. The method of claim 9, wherein the electro-optically active mesa is at least partially formed from any one or more of: indium phosphide, aluminium indium gallium arsenide, and indium gallium arsenide.

17. A pre-cursor electro-optically active device, formed on a III-V semiconductor wafer, the pre-cursor device comprising: a substrate; a sacrificial layer; and an electro-optically active mesa, suitable for disposing in a cavity of a silicon-on-insulator wafer; wherein the sacrificial layer is positioned between the substrate and the electro-optically active mesa.

18.-38. (canceled)

39. A method of manufacturing a pre-cursor electro-optically active device, comprising the steps of: providing a III-V semiconductor wafer, having a substrate; disposing a sacrificial layer on the substrate; epitaxially growing an electro-optically active structure on an opposing side of the sacrificial layer to the substrate; and etching the electro-optically active structure to provide an electro-optically active mesa.

40. A silicon based electro-optically active device comprising: a silicon-on-insulator, SOI, waveguide; an electro-optically active waveguide, including an electro-optically active stack within a cavity of the SOI waveguide; and a lined channel between the electro-optically active stack and the SOI waveguide, the lined channel comprising a liner, wherein the lined channel is filled with a filling material to thereby form a bridge-waveguide in the channel between the SOI waveguide and the electro-optically active stack, and there is an insulator layer located between the electro-optically active stack and a bed of the cavity of the SOI waveguide.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0079] Embodiments of the invention will now be described by way of example with reference to the accompanying drawings in which:

[0080] FIG. 1 shows a top-down view of a III-V on silicon hybrid electro-optically active device which is an embodiment of the invention and was manufactured using an embodiment of the invention;

[0081] FIGS. 2A-2D show cross-sections of FIG. 1 along the lines A-A′, B-B′, C-C′, and D-D′;

[0082] FIGS. 3(a)-3(x)(iii) show various manufacturing stages of the device in FIG. 1; and

[0083] FIGS. 4(a)-4(y) show variant manufacturing stages for an electro-optically active device according to embodiments of the present invention.

DETAILED DESCRIPTION AND FURTHER OPTIONAL FEATURES

[0084] Aspects and embodiments of the present invention will now be discussed with reference to the accompanying figures. Further aspects and embodiments will be apparent to those skilled in the art. All documents mentioned in this text are incorporated herein by reference

[0085] FIG. 1 shows a top down view of a III-V on silicon hybrid electro-optically active device 100 which is an embodiment of the invention. Broadly, the device includes a first silicon-on-insulator (SOI) waveguide 101, an electro-optically active waveguide 102 containing an electro-optically active stack, and a second SOI waveguide 103. The first SOI waveguide 101 and the electro-optically active waveguide 102 are connected via first bridge waveguide 106. The electro-optically active waveguide 102 and the second SOI waveguide 103 are connected via second bridge waveguide 107. The device also includes a first electrode 104 and a second electrode 105, which provide electrical connections to respective portions of the electro-optically active stack. All waveguides guide light generally along the x axis.

[0086] FIGS. 2A-2D shows cross-sections of FIG. 1 along the lines A-A′, B-B′, C-C′, and D-D′ respectively. FIG. 2A shows an upper cladding or passivation layer 206 which was omitted from FIG. 1 for the sake of clarity. The electrodes 104 and 105 extend through upper cladding layer. this As can also be seen, the device is provided on a silicon substrate 201, which includes a buried oxide layer 208 which functions as the lower cladding layer for the SOI waveguides 101 and 103. There is also a Si.sub.3N.sub.4 layer between the SOI waveguides and the upper cladding layer (also omitted from FIG. 1 for the sake of clarity).

[0087] FIG. 2A also shows the structure of the bridge waveguides 106 and 107 in more detail. Broadly, each bridge waveguide is formed of a silicon nitride (e.g. Si.sub.3N.sub.4) liner which extends down a sidewall of the respective SOI waveguide, along a bottom surface adjacent to the substrate (which is the bed of the cavity before the cavity is filled, as is discussed later), and up a corresponding sidewall of the electro-optically active stack. The gap between the silicon nitride sidewalls is filled with amorphous or a silicon (α-Si). The electro-optically active stack can be seen in more detail in FIG. 2A, and comprises, in order from the layer adjacent to the electrode downwards towards the substrate: an n doped indium phosphide (InP) layer; a III-V semiconductor multiple quantum well or bulk III-V layer; a p doped InP layer; and a p doped indium gallium arsenide (InGaAs) layer. Between the InGaAs layer and the substrate there is an insulator layer, formed of silicon dioxide (SiO.sub.2).

[0088] FIG. 2B shows the device along the cross-section B-B′, such that light is guided into/out of the plane of the figure. Of note, is that first electrode 104 extends up a sidewall of the device, so as to electrically contact the upper n doped InP layer. In contrast, the second electrode 105 extends through a via in the p doped InP layer so as to electrically contact the InGaAs layer. Accordingly, the electro-optically active stack can be used as a vertical junction electro-absorption modulator, in that an electric field can be applied from the first electrode to the second electrode in the y direction.

[0089] FIGS. 2C and 2D show a first SOI waveguide 101 and a bridge waveguide 206 respectively. The two are adjacent, such that light is guided from the SOI waveguide into the bridge waveguide 206 and through into the electro-optically active waveguide 102.

[0090] In some examples, the electro-optically active stack may be formed of the following layers:

TABLE-US-00001 Doping Layer Repeat n/u/p Material Thickness E.sub.g (nm) (×10.sup.18) Dopant 15 1 P InGaAs 400 1499.98 1 Zn 14 1 P InGaAsP 50 1302.91 1.5 Zn 13 1 P InP 1340 918.407 1 Zn 12 1 P InGaAsP 20 1302.91 1 Zn 11 1 P AlInGaAs 60 843.435 1 C 10 1 uid AlInGaAs 70 968.035 9 12x uid AlInGaAs 7 1127.14 8 12x Active AlInGaAs 9 1278.2 7 1 uid AlInGaAs 7 1127.14 6 1 uid InGaAsP 77 1100 5 1 N InP 80 918.407 0.2 Si 4 1 N InP 70 918.407 0.5 Si 3 1 N InP 920 918.407 0.8 Si 2 1 N InGaAs 1000 1499.98 1 Si 1 Substrate: semi-insulating and n doped InP

[0091] Layer 2 is termed the sacrificial layer, and is used in the bonding process. ‘uid’ refers to unintentionally doped layers, E.sub.g refers to the band gap energy of the layer. It should be noted that, once bonded, layer 15 becomes the layer closest to the bed of the cavity whereas layer 3 is the layer furthest from the bed of the cavity and connected to the first electrode.

[0092] Alternatively, the electro-optically active stack may be a SiGe multiple-quantum well (MQW) stack built on an SOI wafer with a thin device layer, and the buried oxide layer may be used as the sacrificial layer:

TABLE-US-00002 Thickness Doping Layer Repeat n/u/p Material (nm) (×10.sup.18) Dopant 10 1 N Si.sub.0.8Ge.sub.0.2 400 10 P 9 1 N Si.sub.0.18Ge.sub.0.82 400 1 P 8 1 uid Si.sub.0.18Ge.sub.0.82 15 7 8x uid Si.sub.0.33Ge.sub.0.67 7 6 8x Active Ge 10 5 1 uid Si.sub.0.33Ge.sub.0.67 12 4 1 uid Si.sub.0.18Ge.sub.0.82 15 3 1 P Si.sub.0.18Ge.sub.0.82 400 1 B 2 1 P Si.sub.0.8Ge.sub.0.2 400 1 B 1 P SOI layer (100-220 nm) BOX (Sacrificial layer) Substrate: (100) Si

[0093] In a further alternative, the electro-optically active stack may be formed of the following layers:

TABLE-US-00003 Thickness Doping Layer Repeat n/u/p Material (nm) E.sub.g (nm) (×10.sup.18) Dopant 9 1 P InGaAs 400 1499.98 1 Zn 8 1 P InGaAsP 50 1302.91 1.5 Zn 7 1 P InP 1340 918.407 1 Zn 6 1 uid InGaAsP 500 1260 5 1 N InP 80 918.407 0.2 Si 4 1 N InP 70 918.407 0.5 Si 3 1 N InP 920 918.407 0.8 Si 2 1 N InGaAs 1000 1499.98 1 Si 1 Substrate: semi-insulating and n doped InP

[0094] Layer 2 is termed the sacrificial layer, and is used in the bonding process. It should be noted that, once bonded, layer 9 becomes the layer closest to the bed of the cavity whereas layer 3 is the layer furthest from the bed of the cavity and connected to the first electrode.

[0095] FIGS. 3(a)-3(x)(iii) show various manufacturing steps of a method according to embodiments of the present invention. In a first step, shown in FIG. 3(a), a cavity is made within an SOI wafer which has been previously capped with silicon nitride (Si.sub.3N.sub.4). The cavity has a depth, as measured from the bottom of the cavity to the upper surface of the silicon nitride layer, which will mean that the optical mode of the SOI waveguide subsequently manufactured will be aligned with the optical mode of the III-V electro-optically active waveguide once fabricated and bonded to the cavity. The silicon nitride is silicon rich, with a refractive index of 2.7.

[0096] Subsequently, in parallel, or before to the steps shown previously, a III-V electro-optically active stack is grown (and preferably epitaxially grown) on an indium phosphide wafer as shown in FIG. 3(b). The stack may have the composition as discussed previously. A silicon dioxide layer is then disposed on the upper surface of the stack, as is a photoresist. The stack includes a sacrificial layer, in this example formed of n doped InGaAs. The silicon dioxide layer has a thickness of around 500 nm. The result of this is shown in FIG. 3(c).

[0097] After the photoresist is provided, an etch is performed partially into the sacrificial layer. The etch removes any facets, and provides a clean sidewall. This etch also forms the electro-optically active mesa referred to above. The etch is performed such that a gap will exist between the sacrificial layer and the top surface of the silicon nitride layer in the SOI wafer in FIG. 3(a). This is to ensure that after bonding an etchant can be provided to the sacrificial layer.

[0098] After the etch in FIG. 3(d) has been performed, a silicon dioxide coating is provided over the device and then partially removed as indicated in the figure. The silicon dioxide coating is between 20 nm and 50 nm thick. The silicon dioxide either side of the mesa is removed, leaving a portion which extends from the mesa along an upper surface of the sacrificial layer.

[0099] After the silicon dioxide has been provided and partially removed, a flip-chip bonding process is performed. The electro-optically active mesa is provided within the cavity of the SOI wafer (as shown in FIG. 3(f)). The silicon dioxide layer is then bonded to the bed of the cavity. Of note, is that the Si.sub.3N.sub.4 top surface on the SOI wafer has a height which is similar to that of the N-InP top surface (which was the bottom surface, before the indium phosphide wafer was inverted).

[0100] After bonding is complete, a wet etch is performed to remove the sacrificial layer. This allows the indium phosphide substrate to be retrieved and reused in growing subsequent electro-optically active mesas. The result of this wet etch is shown in FIG. 3(g). After the first wet etch, a further wet etch is performed to remove the silicon dioxide layer. This is shown in FIG. 3(h). The silicon dioxide layer which is between the stack and the cavity bed is retained.

[0101] Next, as shown in FIG. 3(i), a silicon nitride (and preferable silicon rich, e.g. Si.sub.3N.sub.4) layer is deposited across the exposed surfaces. This results in a silicon nitride layer on the bed of the cavity, along the sidewall of the first SOI waveguide within the cavity, along both side walls of the optically active stack, and along the sidewall of the second SOI waveguide. The silicon nitride layer on the sidewalls may be between 230 nm and 260 nm thick, and may have a refractive index of around 2.7. The silicon nitride layer on the bed, and the exposed upper surfaces, may be thicker than the silicon nitride layer on the sidewalls. The height of the silicon nitride layer on the bed of the cavity may be substantially equal the height of the lowermost surface of the buried oxide layer adjacent to the silicon nitride layer, or substantially equal the height of the uppermost surface of the buried oxide layer adjacent to the silicon nitride layer depending on the deposition ratio of sidewall over the bed.

[0102] After the silicon nitride layer is deposited, amorphous or α-Silicon is deposited within the remaining voids of the cavity (which may be, in this example, a trench extending around the electro-optically active stack). The amorphous silicon provides a bridge waveguide from each SOI waveguide (when formed, as discussed below) into the electro-optically active stack. The deposition of α-Silicon may be through blanket deposition.

[0103] After the α-Silicon has been provided, a mask may be provided over the regions of the α-Silicon fill which are within the cavity (and slightly around the cavity, as shown in FIG. 3(k)). The unmasked regions are then etched, which improves the uniformity of the chemical-mechanical polishing process used subsequently. The etch can also release any wafer stress. The mask is, in this example, silicon dioxide.

[0104] After the etching, a chemical-mechanical polishing process is used to provide a uniform upper surface. The result of this is shown in FIG. 3(l). Approximately 100 nm of silicon nitride is retained above the uppermost layer of the electro-optically active stack, as seen. A further dry etch is then performed, in order to make the uppermost surface of the α-Silicon layer level with the uppermost surface of the SOI waveguides on either side of the electro-optically active stack. The result of this etch is shown in FIG. 3(m).

[0105] In a next step, shown in FIG. 3(n), further silicon nitride is deposited to cover the trench and provide a thicker layer over the top of the electro-optically active stack. After this is provided, a further chemical-mechanical polish process is performed to remove the silicon nitride layer above the uppermost layer of the electro-optically active stack, and to level the uppermost surface of the device. Therefore, the silicon nitride layers either side of the electro-optically active stack (which extend from above the SOI waveguides and across the α-Silicon fill) have an uppermost surface which is level with the uppermost surface of the uppermost layer of the electro-optically active stack. The result of this is shown in FIG. 3(o).

[0106] Next, as shown in FIGS. 3(p)(i) and (ii), which are cross-sections taken through the structure of FIG. 3(o) at 90° to that view, a further silicon dioxide layer and silicon nitride layer (in that order) are deposited over the structure. Subsequently, a photoresist is provided across a width of the structure. The photoresist extends in direction ‘x’ as shown in FIGS. 3(p)(i) and (ii) so as to define a longitudinal direction of the subsequently formed waveguide. The photoresist's width also defines the width of the subsequently formed waveguide.

[0107] After the photoresist is provided, an etch is performed to expose a doped layer of the electro-optically active stack as shown in FIG. 3(q)(i). The etch extends partially into the p doped InP layer in this example. The etch depth is not as extensive through the other regions of the structure. The electro-optically active stack can now be considered as including a ridge region (central most) which is taller than adjacent slab regions (located on either side of the ridge region, and in this example formed of the p doped InGaAs and p doped InP layers). As shown in FIG. 3(q)(ii), the etch extends only through the uppermost silicon nitride layer and uppermost silicon dioxide layer. The next silicon nitride layer is not etched. Therefore there is a difference in step through the structure.

[0108] After the etch, a further silicon dioxide layer is provided over the now formed waveguide in the electro-optically active stack. A further photo resist is then provided over the electro-optically active stack region only. This is shown in FIGS. 3(r)(i) and (ii), where photoresist is provided over the InP region but not over the SOI regions. After the photoresist has been provided, the silicon dioxide layer above the SOI region is etched as shown in FIG. 3(s)(ii). Notably, the silicon dioxide layer above the electro-optically active stack remains, as shown in FIG. 3(s)(i).

[0109] After the etching step discussed above, a further etch is performed to provide a waveguide from in the SOI regions (forming the SOI waveguides), the silicon nitride region, and the α-Silicon region. The result of this etching step is shown in FIGS. 3(t)(i) and (ii). The structure now contains two SOI waveguides, one either side of the electro-optically active waveguide enkindling the electro-optically active stack. The SOI waveguides are connected to the electro-optically active waveguides through a pair of bridge-waveguides, formed of the silicon nitride sidewalls and the α-Silicon fill.

[0110] Next the uppermost silicon dioxide layer is removed, and redeposited. The silicon dioxide layer functions as a cladding layer for the waveguide, and may be referred to as an upper cladding layer. An etch is then performed on one lateral side (i.e. in a direction perpendicular to the guiding direction) of the waveguide through the layers of the electro-optically active stack that are contained in the slab portion (i.e. that region which was not etched in the step shown in FIG. 3(q)(i)). The etch extends down to the silicon dioxide layer immediately between the electro-optically active stack and the bed of the cavity. This etch is to provide a clear pad area for the first electrode discussed previously. The result of the etch is shown in FIG. 3(u)(i). With reference to FIG. 3(q)(ii), the newly deposited silicon dioxide layer can be seen on the sidewalls of the SOI waveguide and along an upper surface of the remaining SOI/device layer.

[0111] Further silicon dioxide is deposited, to line the pad area etched in the electro-optically active stack. This electrically insulates the subsequently formed electrode from the lower layers of the electro-optically active stack. A further etch is also performed, which extends only partially through the slab portion. This allows a layer in the electro-optically active stack (in this example, the lowermost layer which is the p doped InGaAs layer) to subsequently be connected to the second electrode 105 discussed above. The results of this step are shown in FIGS. 3(v)(i) and (ii).

[0112] Next, as shown in FIG. 3(w)(i) and (ii), silicon dioxide is deposited on the sidewalls of the trench formed by the previous etch. This means the subsequently provided electrode is electrically insulated from the p doped InP layer of the electro-optically active stack. A via is also etched in the uppermost portion of the silicon dioxide cladding layer to expose an uppermost surface of the n doped InP layer (e.g. the uppermost layer of the electro-optically active stack).

[0113] In the next, and final, step, a metallization process is performed to provide the first and second electrodes 104 and 105 discussed previously. The first electrode 104 extends from the electrode pad provided on one side of the electro-optically active rib (the portion of the electro-optically active stack not etched previously), up a sidewall of the rib and through the via to contact the uppermost doped layer. The second electrode 105 extends through the etched trench to contact the lowermost doped layer. The results of this step are shown in FIGS. 3(x)(i)-(iii).

[0114] FIGS. 4(a)-4(y) show various manufacturing steps of a variant method according to embodiments of the present invention, and which result in a variant device according to embodiments of the present invention.

[0115] In a first step, shown in FIG. 4(a), a cavity is made within an SOI wafer which has across an uppermost surface of the device/SOI layer a silicon dioxide layer. The device layer is 3 μm in thickness (as measured from an uppermost surface of the buried oxide layer to an uppermost surface of the device layer). Next, as shown in FIG. 4(b), a 20-50 nm thick silicon dioxide layer is deposited over all exposed surfaces. This results in a 20-50 nm thick SiO.sub.2 layer on the sidewalls and bed of the cavity formed in FIG. 4(a).

[0116] Next, in a step performed sequentially, in parallel, or before the preceding steps, a III-V electro-optically active stack is grown (and preferably epitaxially grown) on an indium phosphide substrate. The stack is shown in FIG. 4(c). The electro-optically active stack may have the following composition:

TABLE-US-00004 Thickness Doping Layer R n/u/p Material (nm) E.sub.g (nm) (×10.sup.18) 5 1 uid InP 200 918.407 — 4 1 uid InGaAsP(or AlInGaAs) 2800 1260 — 3 1 uid InP 400 918.407 — 2 1 uid InGaAs 1000 1499.98 — 1 Substrate: semi-insulating and n doped InP

[0117] Layer 2 may be termed the sacrificial layer.

[0118] After the electro-optically active stack has been formed, it is patterned for etching in the manner discussed previously. A photoresist is provided over a portion of the stack as shown in FIG. 4(d). Next, an etch is performed which extends at least to (if not partially through) the InGaAs sacrificial layer at the bottom of the electro-optically active stack. This etch removes any facets, and provides a clean sidewall. This etch also forms the electro-optically active mesa referred to above. The result of the etch is shown in FIG. 4(e).

[0119] After the etch has been performed, a silicon dioxide coating is provided over the device and then partially removed as indicated in FIG. 4(f). The silicon dioxide coating is between 520 nm and 550 nm thick on top of the mesa (as a result of adding to the existing silicon dioxide layer), whereas the coating on the sidewalls and on top of the sacrificial layer is between 20 nm and 50 nm thick. The silicon dioxide either side of the mesa is removed, leaving a portion which extends from the mesa along an upper surface of the sacrificial layer.

[0120] After the silicon dioxide has been provided and partially removed, a flip-chip bonding process is performed. The electro-optically active mesa is provided within the cavity of the SOI wafer (as shown in FIG. 4(g)). The silicon dioxide layer is then bonded to the bed of the cavity.

[0121] After the bonding is complete, a wet etch is performed to remove the sacrificial layer. This allows the indium phosphide substrate to be retrieved and reused in growing subsequent electro-optically active mesas. The result of this wet etch is shown in FIG. 4(h). After the wet etch, a dry etch is performed to remove some of the uppermost (previously lowermost, before flip-chip bonding) layer in the electro-optically active mesa. This etch is performed to bring an uppermost surface of the electro-optically active stack/mesa into alignment with an uppermost surface of the adjacent SOI layers. In this example, the etch is performed until around 200 nm of InP remains as the uppermost layer of the electro-optically active stack. The result of this etch is shown in FIG. 4(i). A further wet etch then removes the silicon dioxide (asides from the silicon dioxide between electro-optically active stack and the bed of the cavity). The result of this further wet etch is shown in FIG. 4(j).

[0122] Next, as shown in FIG. 4(k), a silicon rich silicon nitride (e.g. Si.sub.3N.sub.4) layer is deposited on all exposed surfaces. This results in the silicon nitride liner discussed previously along the sidewalls of the cavity, the bed of the cavity, and the sidewalls of the electro-optically active stack. Silicon nitride is also present along the uppermost surfaces of the electro-optically active stack and the SOI layers. After the liner has been provided, amorphous or α-Silicon is deposited within the remaining voids of the cavity which may be, in this example, a trench extending around the electro-optically active stack). The amorphous silicon provides a bridge waveguide from each SOI waveguide (when formed, as discussed below) into the electro-optically active stack. The deposition of α-Silicon may be through blanket deposition.

[0123] After the α-Silicon has been provided, a mask may be provided over the regions of the α-Silicon fill which are within the cavity (and slightly around the cavity, as shown in FIG. 4(m)). The unmasked regions are then etched, which improves the uniformity of the chemical-mechanical polishing process used subsequently. The etch can also release any wafer stress. The mask is, in this example, silicon dioxide.

[0124] After the etching, a chemical-mechanical polishing process is used to provide a uniform upper surface. The result of this is shown in FIG. 4(n). A layer of silicon nitride may be retained (not shown in subsequent figures), having a thickness of between 20 nm and 30 nm. After the CMP process, a silicon dioxide hard mask is provided for use in subsequent waveguide fabrication. This is shown in FIG. 4(o).

[0125] In a next step, shown in FIGS. 4(p)(i) and (ii) (which are cross-sections taken through the structure of FIG. 4(o) at 90° to that view), a photoresist is provided across a width of the structure. The photoresist extends in the direction ‘x’ as indicated in the figures, so as to define a longitudinal direction of the subsequently formed waveguide. The photoresist's width also defines the width of the subsequently formed waveguide.

[0126] After the photoresist has been applied, an etch is performed which extends through the electro-optically active stack to a point at least partially through (if not entirely through) an undoped middle layer of the electro-optically active stack. In the example shown in FIG. 4(q)(i), the etch extends through the upper silicon dioxide layer, through the upper InP layer, and almost completely through the central III-V layer. A small portion of the III-V layer is retained, either side of the now formed waveguide ridge. The etch also removes, as shown in FIG. 4(q)(ii) the silicon dioxide layer and a portion of the SOI layer either side of the cavity so as to provide the SOI waveguides discussed previously.

[0127] After etching, a further silicon dioxide hard mask is applied, having a thickness of between 20 nm and 50 nm. This is shown in FIG. 4(r). After this hard mask is applied, a photoresist is provided over most of the exposed upper surface of the structure. A gap is left, which exposes one side of the waveguide ridge and a portion of the slab immediately adjacent to the exposed ridge. Dopants are then implanted in the exposed sidewall of the ridge and slab, as shown in FIG. 4(s). The dopants are implanted at an angle, and are in this example silicon ion dopants. This results in an n doped region which extends up a sidewall of the ridge, as well as along a portion of the slab adjacent to the ridge. The photoresist is then removed.

[0128] After the n doped region has been provided, a further photoresist is provided over most of the exposed upper surface of the structure. Again, a gap is left, which exposes an opposite side of the waveguide ridge and an opposite portion of the slab to the sidewall and slab doped previously. Dopants are then implanted in the exposed sidewall of the ridge and slab, as shown in FIG. 4(t). The dopants are implanted at an angle, and are in this example, beryllium or zinc ions. This results in a p doped region which extends up a sidewall of the ridge opposite to the n doped region, as well as along a portion of the slab adjacent to the p doped sidewall. The photoresist is then removed.

[0129] Next, a photoresist is again applied to the uppermost surface of the structure. A gap is left above a portion of the slab containing n dopants from the previous doping steps. After this photoresist is provided, further dopants are implanted through the gap left in the photoresist. This is shown in FIG. 4(u). The result is a portion of the slab which is more heavily doped (n+) than the adjacent portion and the sidewall of the ridge. The dopants may be silicon ions. The photoresist is then removed.

[0130] A further photoresist is again applied over the uppermost surface of the structure. A gap is again left, but this time over a portion of the slab containing p dopants from the previous doping steps. After this photoresist is provided, further dopants are implanted through the gap left in the photoresist. This is shown in FIG. 4(v). The result is a portion of the slab which is more heavily doped (p+) than the adjacent portion and the sidewall of the ridge. The dopants may be beryllium ions. The photoresist is then removed.

[0131] After all doping processes have been performed a silicon dioxide layer is deposited over the upper surface of the structure. The SiO.sub.2 layer has a thickness of around 500 nm. After this layer has been deposited, the device is annealed through a rapid thermal anneal process at between 700° C. and 850° C. The structure for annealing is shown in FIG. 4(w).

[0132] After the device has been annealed, contact vias are opened in the silicon dioxide layer directly above the heavily doped regions. This is shown in FIG. 4(x). Subsequently, a metallization process is used to provide first and second electrodes which respectively contact the heavily doped n+ and p+ regions.

[0133] While the invention has been described in conjunction with the exemplary embodiments described above, many equivalent modifications and variations will be apparent to those skilled in the art when given this disclosure. Accordingly, the exemplary embodiments of the invention set forth above are considered to be illustrative and not limiting. Various changes to the described embodiments may be made without departing from the spirit and scope of the invention.

[0134] All references referred to above are hereby incorporated by reference.