Electroab sorption optical modulator

Abstract

An electro-absorption optical modulator capable of realizing optical coupling with a Si waveguide with high efficiency, improving modulation efficiency, reducing light absorption by an electrode layer and achieving low optical loss includes a substrate; a first silicon layer doped to exhibit a first type of conductivity and a second silicon layer doped to exhibit a second type of conductivity that are disposed parallel to the substrate; and a Ge.sub.1−xSi.sub.x (0<x<1)/Si stack in which a Ge.sub.1−xSi.sub.x layer and a Si layer are stacked on the first and second silicon layers in this order.

Claims

1. An electro-absorption optical modulator comprising: a substrate; a first silicon layer doped to exhibit a first type of conductivity and a second silicon layer doped to exhibit a second type of conductivity that are disposed parallel to the substrate; a Ge.sub.1−xSi.sub.x (0<x<1)/Si stack in which a Ge.sub.1−xSi.sub.x layer and a Si layer are stacked on the first and second silicon layers in this order; and a GeSi mixed crystal layer formed at an interface of the Ge.sub.1−xSi.sub.x/Si stack, wherein the Ge.sub.1−xSi.sub.x/Si stack is formed into a PIN junction structure, and a thickness and composition of the GeSi mixed crystal layer is configured by a deposition condition of the Ge.sub.1−xSi.sub.x/Si stack or a post-deposition heat treatment, so as to control an operating wavelength of the modulator.

2. The electro-absorption optical modulator according to claim 1, wherein a third Si layer composed of an intrinsic semiconductor is interposed between the first and second silicon layers.

3. The electro-absorption optical modulator according to claim 1, wherein the Ge.sub.1−xSi.sub.x/Si stack is embedded so that at least part of the Ge.sub.1−xSi.sub.x/Si stack is sandwiched between the first and second silicon layers.

4. The electro-absorption optical modulator according to claim 1, wherein a layer for giving lattice distortion to the Ge.sub.1−xSi.sub.x/Si stack is stacked on the Ge.sub.1−xSi.sub.x/Si stack.

5. The electro-absorption optical modulator according to claim 4, wherein the layer for giving lattice distortion to the Ge.sub.1−xSi.sub.x/Si stack is a layer that applies distortion in a <110> direction of the Ge.sub.1−xSi.sub.x/Si stack.

6. The electro-absorption optical modulator according to claim 1, wherein the Ge.sub.1−xSi.sub.x/Si stack is electrically connected via electrode layers doped to exhibit to first and second types of conductivity to the first and second silicon layers that exhibit same conductivity types, respectively.

7. The electro-absorption optical modulator according to claim 1, wherein the Ge concentration of the Ge.sub.1−xSi.sub.x layer in the Ge.sub.1−xSi.sub.x/Si stack is 80 atomic % or more.

8. An electro-optic modulation apparatus comprising: at least two units of the electro-absorption optical modulator according to claim 1 optically connected via a Si-based optical waveguide, an input port and an output port; and at least one pair of the electro-absorption optical modulators is driven by a differential drive circuit.

9. The electro-optic modulation apparatus according to claim 8, wherein the differential drive circuit performs waveform shaping on output waveforms by independently controlling DC bias voltages of the electro-absorption optical modulators to be paired.

10. The electro-optic modulation apparatus according to claim 8, wherein the widths of the Ge.sub.1−xSi.sub.x/Si stacks of the respective electro-absorption optical modulators to be paired are set to different widths.

11. An optical integrated circuit comprising: the electro-absorption optical modulator according to claim 1, wherein a plurality of optical modulation regions including the Ge.sub.1−xSi.sub.x/Si stack is provided on one substrate, and wherein the plurality of optical modulation regions is adjusted by a pattern width of the Ge.sub.1−xSi.sub.x/Si stack to function as an optical modulator and a light receiver.

12. An optical integrated circuit comprising: the electro-optic modulation apparatus according to claim 8, wherein a plurality of optical modulation regions including the Ge.sub.1−xSi.sub.x/Si stack is provided on one substrate, and wherein the plurality of optical modulation regions is adjusted by a pattern width of the Ge.sub.1−xSi.sub.x/Si stack to function as an optical modulator and a light receiver.

13. The electro-absorption optical modulator according to claim 1, wherein the GeSi mixed crystal layer has a gradient composition.

14. The electro-absorption optical modulator according to claim 1, wherein a concentration of Ge in the GeSi mixed crystal layer is a gradient towards the Si layer.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) FIG. 1 is a cross-sectional view of an electro-optic modulator including a PIN structure according to the background art;

(2) FIG. 2 is a cross-sectional view of an electro-optic modulator including an SIS structure according to the background art;

(3) FIG. 3 is a schematic cross-sectional view of a GeSi electro-absorption optical modulator including GeSi according to the background art;

(4) FIG. 4 is a schematic cross-sectional view of a structure example of an electro-absorption optical modulator including Ge.sub.1−xSi.sub.x/Si stack according to one example embodiment of the present invention;

(5) FIG. 5 is a schematic cross-sectional view of a structure example of an electro-absorption optical modulator including Ge.sub.1−xSi.sub.x/Si stack according to one example embodiment of the present invention;

(6) FIG. 6 is a schematic cross-sectional view of an electro-absorption optical modulator in which a layer giving lattice distortion is stacked on the Ge.sub.1−xSi.sub.x/Si stack according to one example embodiment of the present invention;

(7) FIG. 7 is a graph showing dependence of light intensity modulation operating wavelength when changing the thickness and composition of GeSi mixed crystal layer in an electro-absorption optical modulator including Ge.sub.1−xSi.sub.x/Si stack according to one example embodiment of the present invention;

(8) FIGS. 8A and 8B are graphs showing wavelength dependence of light transmittance when the width of the Ge.sub.1−xSi.sub.x/Si stack makes to 1.0 μm width FIG. 8A and 1.4 μm width FIG. 8B in an electro-absorption optical modulator including Ge.sub.1−xSi.sub.x/Si stack according to one example embodiment of the present invention;

(9) FIGS. 9A to 9L are cross-sectional views illustrating manufacturing processes of the electro-absorption optical modulator using Ge.sub.1−xSi.sub.x/Si stack according to one example embodiment of the present invention;

(10) FIG. 10 is a diagram showing a configuration example of a light modulation device according to one example embodiment of the present invention; and

(11) FIG. 11 is a configuration diagram illustrating an optical integrated circuit according to one example embodiment of the present invention.

EXAMPLE EMBODIMENT

(12) Hereinafter, the present invention will be described with example embodiments.

(13) FIG. 4 is a schematic cross-sectional view of a structure example of an electro-absorption optical modulator including Ge.sub.1−xSi.sub.x/Si stack according to one example embodiment of the present invention. In the electro-absorption optical modulator, as shown in FIG. 4, by forming first silicon (Si) layer 34 doped so as to exhibit a first type of conductivity (for example, p-type conductivity) and second silicon (Si) layer 35 doped so as to exhibit a second type of conductivity (for example, n-type conductivity), both being disposed parallel to support substrate 31 of an SOI substrate via buried oxide (BOX) layer 32 which constitutes a lower clad, stacking Ge.sub.1−xSi.sub.xlayer 51 and Si layer 52 on the first and second Si layers in this order to form Ge.sub.1−xSi.sub.x/Si stack. Further, the Ge.sub.1−xSi.sub.x/Si stack is subjected to p-type and n-type doping to form electrode layers 53 and 54, it is possible to reduce light absorption by the electrode layers. Note that support substrate 31 and BOX layer 32 may be simply collectively called a “substrate.” In addition, Si layer 52 is also doped into p-type and n-type to form a part of electrodes, but it is omitted in the figure.

(14) In this case, third Si layer 33 made up of an intrinsic semiconductor can be inserted between first Si layer 34 and second Si layer 35. That is, the insertion of third Si layer 33 made up of the intrinsic semiconductor improves light absorption by the first and second Si layers subjected to p-type and n-type doping as well as reducing parasitic capacitance.

(15) According to another example embodiment, as shown in FIG. 5, at least part of the Ge.sub.1−xSi.sub.x/Si stack is embedded in the Si layers (33 to 35) directly connected to the Si waveguide to have a butt coupling structure, the optical coupling length is made smaller than the conventional length, the Si layers (34, 35) adjacent to the Ge.sub.1−xSi.sub.x/Si stack are subjected to p-type and n-type doping to be used as electrode layers and light absorption by the electrode layers is thereby reduced. Furthermore, large tensile distortion is applied to the Ge.sub.1−xSi.sub.x/Si stack embedded in the Si layer due to a difference in thermal expansion coefficient between the Si layer and Ge.sub.1−xSi.sub.x/Si layer 51 to be embedded, and so a Franz-Keldysh effect is enhanced.

(16) In this case, by making first Si layer 34 and second Si layer 35 disposed parallel to support substrate 31 have a rib type waveguide structure, it is possible to attract an optical mode field toward the Si layer side and reduce optical loss in the Ge.sub.1−xSi.sub.x/Si stack in which the electrode is formed through p-type and n-type doping.

(17) As for the Ge.sub.1−xSi.sub.xlayer, x is greater than 0 and less than 1 (0 <x <1), and x is preferably 0.2 or less to become a Ge composition of 80% or more. This is because as the Si composition increases, the electro-optic effect decreases and the drive voltage also increases. Since a relatively large electro-optic effect is obtained with pure Ge, by applying distortion and reducing the band gap, light intensity modulation at 1600 nm which is a communication wavelength band is also possible. In addition, the long-distance optical communication requires to operate at C band of 1550 nm, and such an operation in the wavelength band of 1550 nm becomes possible by forming a GeSi mixed crystal layer with a large band gap in an interface of the Ge.sub.1−xSi.sub.x/Si stack.

(18) When driving is done using a CMOS driver, low voltage operation is realized by connecting two or more electro-absorption optical modulators via the optical waveguide and differentially driving them, and waveform symmetry can also be improved by independently controlling DC bias voltages to be applied to the two or more electro-absorption optical modulators. By controlling pattern widths of the two or more Ge.sub.1−xSi.sub.x/Si stacks so as to have different widths, the operation wavelength band can be broaden.

(19) Furthermore, as shown in FIG. 6, by stacking a layer (distortion applying layer 55) that gives lattice distortion to Ge.sub.1−xSi.sub.x/Si stack on the Ge.sub.1−xSi.sub.x/Si stack, the electro-absorption optical modulator is enabled to generate light intensity modulation at a lower voltage. In this case, band gap energy is reduced by applying biaxial distortion to the <110> crystal orientation of the Ge.sub.1−xSi.sub.x/Si stack, and light intensity modulation can be achieved with high efficiency.

(20) By forming a Ge.sub.1−xSi.sub.x layer subjected to p-type or n-type doping in the Ge.sub.1−xSi.sub.x/Si stack deposited on the first and second Si layers subjected to p-type or n-type doping, the width of Ge.sub.1−xSi.sub.x layer disposed between the p-type electrode layer and the n-type electrode layer is reduced and light intensity modulation can be generated at a lower voltage.

(21) Other constituents shown in FIGS. 4 to 6 include a first contact 36 doped with the first conductive type (p+) impurity at high concentration in the first Si layer 34, a second contact 37 doped with the second conductive type (n+) impurity at high concentration in the second Si layer 35, oxide clad 38, a first electrode 39 connected to the first contact 36, a second electrode 40 connected to the second contact 37, a first wiring 41 and a second wiring 42.

(22) FIG. 7 is a graph showing dependence of light intensity modulation operating wavelength when changing the thickness and composition of GeSi mixed crystal layer formed in the interface of the Ge.sub.1−xSi.sub.x/Si stack in an electro-absorption optical modulator including Ge.sub.1−xSi.sub.x/Si stack according to one example embodiment of the present invention. The thickness and composition of GeSi mixed crystal layer can be controlled by adjusting deposition temperature of Ge.sub.1−xSi.sub.x/Si stack or subjecting to a heat treatment at about 700 to 800° C. after forming Ge.sub.1−xSi.sub.x/Si stack. At this time, by increasing the Si composition in the GeSi mixed crystal layer, it was possible to control the operating wavelength to a shorter wavelength. Moreover, by increasing the thickness of the GeSi mixed crystal layer, it was possible to increase the overlap between an optical mode field and the GeSi mixed crystal layer so as to make the operating wavelength to a shorter wavelength.

(23) FIGS. 8A and 8B are graphs showing wavelength dependence of light transmittance when the width of the Ge.sub.1−xSi.sub.x/Si stack makes to 1.0 μm width FIG. 8A and 1.4 μm width FIG. 8B in an electro-absorption optical modulator including Ge.sub.1−xSi.sub.x/Si stack according to one example embodiment of the present invention. By decreasing the width of the stack, the light transmittance was changed by applying a voltage in a shorter wavelength and in a wide wavelength band. That is, it was possible to operating an optical intensity modulation in the wider wavelength band by decreasing the width of the Ge.sub.1−xSi.sub.x/Si stack.

(24) Since the GeSi mixed crystal layer is more likely to occur at the side wall portion of the Ge.sub.1−xSi.sub.x/Si stack, by reducing the width of the stack, the overlap between the optical mode field and the mixed crystal layer becomes large and the operating wavelength can be shortened. In other words, it is possible to broaden the operating wavelength in the electro-absorption optical modulator and to control the operating wavelength by controlling the width of the Ge.sub.1−xSi.sub.x/Si stack.

(25) Hereinafter, a method of manufacturing an electro-absorption optical modulator according to an embodiment of the present invention will be described.

(26) FIGS. 9A to 9L are cross-sectional views illustrating manufacturing processes of the electro-absorption optical modulator using Ge.sub.1−xSi.sub.x/Si stack according to one example embodiment of the present invention.

(27) FIG. 9A shows a cross-sectional view of a SOI substrate for manufacturing the electro-absorption optical modulator according to one example embodiment of the present invention. The SOI substrate has a stacked structure including a supporting substrate 31, a BOX layer 32 and a Si layer 33 having a thickness on the order of 100 to 1000 nm stacked on the BOX layer 32. The BOX layer having a thickness of 1000 nm or more is applied in order to reduce optical loss. Note that since Si layer 33 on BOX layer 32 is set so that the <110> crystal orientation is substantially parallel to a direction of an applied electric field by the electrode, a greater electric field absorption effect can be obtained at a low voltage.

(28) Next, as shown in FIG. 9B, the surface layer of Si layer 33 on BOX layer 32 is subjected to a doping process with P (phosphorus) or B (boron) by ion implantation exhibiting first and second conductive types, then given heat treatment, and an electrode layer made up of first Si layer 34 and second Si layer 35 is thereby formed. In this example embodiment, the non-doped Si layer 33 is left as a third Si layer between first Si layer 34 and second Si layer 35. Further, a stacked structure of an oxide film and a SiN.sub.x film is formed as a mask to form a rib waveguide and the stacked structure is patterned using UV lithography and a dry etching method or the like to form oxide film mask 61 and SiN.sub.x hard mask 62.

(29) As shown in FIG. 9C, first and second Si layers 34 and 35 are patterned using oxide film mask 61 and SiN.sub.x hard mask 62 as a mask to obtain the rib waveguide.

(30) As shown in FIG. 9D, some regions of first and second Si layers 34 and 35 that have the same height as the rib waveguide are doped with highly concentrated B ions and P ions using an ion implantation method to sequentially form first and second contact layers 36 and 37.

(31) Next, as shown in FIG. 9E, oxide clad 38a for selective epitaxial growth (called “selective epitaxy”) of the Ge.sub.1−xSi.sub.x/Si stack is stacked. In this case, applying a flattening process using a CMP (chemical mechanical polishing) method facilitates an opening process in the oxide clad for selective epitaxy of the Ge.sub.1−xSi.sub.x/Si stack. Note that the remaining SiN.sub.x hard mask 62 is removed by hot phosphoric acid treatment or the like.

(32) Next, as shown in FIG. 9F, opening 63 for selective epitaxy of the Ge.sub.1−xSi.sub.x/Si stack is formed in the oxide mask 61 on the lib waveguide by dry etching, fluoric acid treatment or the like.

(33) Next, as shown in FIG. 9G, a Si layer faced in the opening 63 is etched by dry etching to form recess 64 for selective epitaxy of the Ge.sub.1−xSi.sub.x/Si stack.

(34) Afterward, as shown in FIG. 9H, a stacked film is selectively epitaxially grown in the recess 64 in the order of the Ge.sub.1−xSi.sub.x layer 51 and the Si layer 52. At the time of stacking the Si layer 52 on the Ge.sub.1−xSi.sub.x layer 51, the Si layer is deposited at the temperature range of about 600 to 700° C. to control the thickness and composition of the GeSi mixed layer.

(35) Next, as shown in FIG. 9I, the Ge.sub.1−xSi.sub.x/Si stack thus epitaxially grown is doped with B ions and P ions to form a p-type electrode layer 53 and an n-type electrode layer 54 so that a PIN junction structure is formed.

(36) Next, as shown in FIG. 9J, an oxide having a thickness on the order of 1 μm is further stacked as oxide clad 38 and contact holes 65 to make electric contacts with first and second contact layers 36 and 37 are formed using a dry etching method or the like.

(37) Finally, as shown in FIG. 9K, a metal layer such as Ti/TiN/Al (Cu) or Ti/TiN/W is formed using a sputtering method or a CVD method, patterned by reactive etching to form first electrode 39 connected to first contact 36, second electrode 40 connected to second contact 37 and first wiring 41 and second wiring 42 as shown in FIGS. 4 to 6 so as to make connections with the drive circuit.

(38) In the electro-absorption optical modulator according to the example embodiment, at least two pairs of electro-absorption optical modulators 101A and 101B are connected in series via Si-based optical waveguide 102 as shown in FIG. 10 and input/output ports are set, to thereby constitute electro-optic modulation apparatus 100. Electro-optic modulation apparatus 100 can be driven by differential drive circuit 111 as shown in FIG. 11. Driving by differential drive circuit 111 makes it possible to generate light intensity modulation with higher efficiency. The number of electro-absorption optical modulators connected in series can be at least two, but is not limited. In this case, since electric signals with different polarities are applied from differential drive circuit 111, the electro-absorption optical modulators are arranged so that electric signals with different polarities and DC bias voltages are applied to the p-type electrode and the n-type electrode of the pair of electro-absorption optical modulators respectively.

(39) Electro-optic modulation apparatus 100 including at least a pair of electro-absorption optical modulators is enabled to broaden the operating wavelength band by making the element widths of respective Ge.sub.1−xSi.sub.x/Si stacks different width each other. As a result, output fluctuation with respect to temperature change can also be improved.

(40) In addition, the electro-absorption optical modulator or electro-optic modulation apparatus according to the example embodiment of the present invention can improve an optical absorption efficiency by DC bias voltage. In one example embodiment, it is possible to implement an optical integrated circuit that integrates a plurality of electro-absorption optical modulators on one substrate and by adjusting the functions as a modulator and a light receiver by pattern widths of respective Ge.sub.1−xSi.sub.x/Si stacks. For example, a portion in which the pattern width of the Ge.sub.1−xSi.sub.x/Si stack is less than 2 μm to form an optical modulator, and a portion in which the pattern width is 2 μm or more, are collectively formed on the same SOI platform. As a result, it is possible to realize an optical integrated circuit that integrates a GeSi electro-absorption optical modulator and a GeSi light receiver.

(41) Although the present invention has been described above referring to example embodiments, the present invention is not limited to the above-described example embodiments. Various changes that can be understood by one skilled in the art can be made to the configuration and details of the present invention within the scope of the present invention.

SUPPLEMENTARY NOTE

(42) The whole or part of the example embodiments disclosed above can be described as, but not limited to, the following supplementary notes:

Supplementary Note 1

(43) An electro-absorption optical modulator including a substrate; a first silicon layer doped to exhibit a first type of conductivity and a second silicon layer doped to exhibit a second type of conductivity that are disposed parallel to the substrate; and Ge.sub.1−Si.sub.x(0<x<1)/Si stack in which a Ge.sub.1−xSi.sub.x layer and a Si layer are stacked on the first and second silicon layers in this order.

Supplementary Note 2

(44) The electro-absorption optical modulator according to Supplementary Note 1, wherein a GeSi mixed layer is formed at an interface of the Ge.sub.1−xSi.sub.x/Si stack.

Supplementary Note 3

(45) The electro-absorption optical modulator according to Supplementary Note 2, wherein an operating wavelength is controllable by the thickness and composition of the GeSi mixed layer.

Supplementary Note 4

(46) The electro-absorption optical modulator according to Supplementary Note 3, wherein the thickness and composition of the GeSi mixed layer is controlled by a deposition condition of the Ge.sub.1−xSi.sub.x/Si stack or a heat treatment after the deposition.

Supplementary Note 5

(47) The electro-absorption optical modulator according to any one of Supplementary Notes 1 to 4, wherein a third Si layer composed of an intrinsic semiconductor is interposed between the first and second silicon layers.

Supplementary Note 6

(48) The electro-absorption optical modulator according to any one of Supplementary Notes 1 to 5, wherein the Ge.sub.1−xSi.sub.x/Si stack is embedded so that at least part of the Ge.sub.1−xSi.sub.x/Si stack is sandwiched between the first and second silicon layers.

Supplementary Note 7

(49) The electro-absorption optical modulator according to any one of Supplementary Notes 1 to 6, wherein a layer for giving lattice distortion to the Ge.sub.1−xSi.sub.x/Si stack is stacked on the Ge.sub.1−xSi.sub.x/Si stack.

Supplementary Note 8

(50) The electro-absorption optical modulator according to Supplementary Note 7, wherein the layer for giving lattice distortion to the Ge.sub.1−xSi.sub.x/Si stack is a layer that applies distortion in a 21 110> direction of the Ge.sub.1−xSi.sub.x/Si stack.

Supplementary Note 9

(51) The electro-absorption optical modulator according to any one of Supplementary Notes 1 to 8, wherein

(52) the Ge.sub.1−xSi.sub.x/Si stack is electrically connected via electrode layers doped to exhibit to first and second types of conductivity to the first and second silicon layers that exhibit same conductivity types, respectively.

Supplementary Note 10

(53) The electro-absorption optical modulator according to any one of Supplementary Notes 1 to 9, wherein

(54) the Ge concentration of the Ge.sub.1−xSi.sub.x layer in Ge.sub.1−xSi.sub.x/Si the stack is 80 atomic % or more.

Supplementary Note 11

(55) An electro-optic modulation apparatus comprising:

(56) at least two units of the electro-absorption optical modulator according to any one of the Supplementary notes 1-10 optically connected via a Si-based optical waveguide, an input port and an output port; and

(57) at least one pair of electro-absorption optical modulators is driven by a differential drive circuit.

Supplementary Note 12

(58) The electro-optic modulation apparatus according to Supplementary Note 11, wherein

(59) the differential drive circuit performs waveform shaping on output waveforms by independently controlling DC bias voltages of the electro-absorption optical modulators to be paired.

Supplementary Note 13

(60) The electro-optic modulation apparatus according to Supplementary Note 11 or 12, wherein

(61) the widths of the Ge.sub.1−xSi.sub.x/Si stacks of the respective elector-absorption optical modulators to be paired are set to different widths.

Supplementary Note 14

(62) An optical integrated circuit comprising:

(63) the electro-absorption optical modulator according to any one of Supplementary Notes 1-10,

(64) wherein a plurality of optical modulation regions including the Ge.sub.1−xSi.sub.x/Si stack are provided on one substrate, and

(65) wherein the plurality of optical modulation regions are adjusted by a pattern width of the Ge.sub.1−xSi.sub.x/Si stack to function as an optical modulator and a light receiver.

Supplementary Note 15

(66) An optical integrated circuit comprising:

(67) the electro-optic modulation apparatus according to any one of Supplementary Notes 11-13,

(68) wherein a plurality of optical modulation regions including the Ge.sub.1−xSi.sub.x/Si stack are provided on one substrate, and

(69) wherein the plurality of optical modulation regions are adjusted by a pattern width of the Ge.sub.1−xSi.sub.x/Si stack to function as an optical modulator and a light receiver.