MULTI-BEAM X-RAY SOURCE AND METHOD FOR FORMING SAME

Abstract

An X-ray source device includes an anode and an electron beam cathode system arranged to emit a plurality of electron beams therefrom toward the anode. A deflector device is disposed adjacent to the electron beam cathode system to manipulate interaction of one or more of the electron beams emitted by the electron beam cathode system with the anode. An associated method of forming an X-ray source device is also provided.

Claims

1. An X-ray source device, comprising: an anode; an electron beam cathode system arranged to emit a plurality of electron beams therefrom toward the anode; and a deflector device disposed adjacent to the electron beam cathode system to manipulate interaction of one or more of the electron beams emitted by the electron beam cathode system with the anode.

2. The device of claim 1, wherein the deflector device is arranged to form an electric field or a magnetic field to manipulate the one or more of the electron beams emitted by the electron beam cathode system.

3. The device of claim 1, wherein the deflector device is arranged to physically manipulate the one or more of the electron beams emitted by the electron beam cathode system.

4. The device of claim 1, wherein the deflector device is arranged to form an electric field or a magnetic field, and to physically manipulate the electric field or magnetic field, to manipulate the one or more of the electron beams emitted by the electron beam cathode system.

5. The device of claim 1, wherein the electron beam cathode system comprises a plurality of adjacently-arranged cathode devices, each cathode device being arranged to emit one of the electron beams toward a corresponding one of a plurality of adjacently-arranged predetermined focal points on the anode.

6. The device of claim 5, wherein the deflector device defines a plurality of deflector portions corresponding to the plurality of cathode devices, each deflector portion being arranged to manipulate the electron beam emitted by a corresponding one of the cathode devices.

7. The device of claim 5, wherein the deflector device defines a plurality of deflector portions each corresponding to more than one of the plurality of cathode devices, each deflector portion being arranged to manipulate the electron beams collectively emitted by the corresponding more than one of the cathode devices.

8. The device of claim 5, wherein the deflector device is arranged to re-direct the electron beam emitted by one of the cathode devices to one of the predetermined focal points on the anode adjacent to the corresponding predetermined focal point for the one of the cathode devices.

9. The device of claim 5, wherein the deflector device is arranged to re-direct the electron beams emitted by each of the cathode devices to one of the predetermined focal points on the anode adjacent to the corresponding predetermined focal point for the each of the cathode devices.

10. The device of claim 5, wherein the deflector device is arranged to re-direct the electron beam emitted by one of the cathode devices to a new focal point on the anode, the new focal point being disposed between the corresponding predetermined focal point for the one of the cathode devices and one of the predetermined focal points adjacent thereto.

11. A method of forming an X-ray source device, comprising: arranging an electron beam cathode system to emit a plurality of electron beams therefrom toward an anode; and disposing a deflector device adjacent to the electron beam cathode system, the deflector device being arranged to manipulate interaction of one or more of the electron beams emitted by the electron beam cathode system with the anode.

12. The method of claim 11, comprising arranging the deflector device to form an electric field or a magnetic field to manipulate the one or more of the electron beams emitted by the electron beam cathode system.

13. The method of claim 11, comprising arranging the deflector device to physically manipulate the one or more of the electron beams emitted by the electron beam cathode system.

14. The method of claim 11, comprising arranging the deflector device to form an electric field or a magnetic field, and to physically manipulate the electric field or magnetic field, to manipulate the one or more of the electron beams emitted by the electron beam cathode system.

15. The method of claim 11, wherein the electron beam cathode system comprises a plurality of adjacently-arranged cathode devices, and wherein the method comprises arranging each cathode device to emit one of the electron beams toward a corresponding one of a plurality of adjacently-arranged predetermined focal points on the anode.

16. The method of claim 15, wherein the deflector device defines a plurality of deflector portions corresponding to the plurality of cathode devices, and wherein the method comprises arranging each deflector portion to manipulate the electron beam emitted by a corresponding one of the cathode devices.

17. The method of claim 15, wherein the deflector device defines a plurality of deflector portions each corresponding to more than one of the plurality of cathode devices, and wherein the method comprises arranging each deflector portion to manipulate the electron beams collectively emitted by the corresponding more than one of the cathode devices.

18. The method of claim 15, comprising arranging the deflector device to re-direct the electron beam emitted by one of the cathode devices to one of the predetermined focal points on the anode adjacent to the corresponding predetermined focal point for the one of the cathode devices.

19. The method of claim 15, comprising arranging the deflector device to re-direct the electron beams emitted by each of the cathode devices to one of the predetermined focal points on the anode adjacent to the corresponding predetermined focal point for the each of the cathode devices.

20. The method of claim 15, comprising arranging the deflector device to re-direct the electron beam emitted by one of the cathode devices to a new focal point on the anode, the new focal point being disposed between the corresponding predetermined focal point for the one of the cathode devices and one of the predetermined focal points adjacent thereto.

Description

BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWING(S)

[0033] Having thus described the disclosure in general terms, reference will now be made to the accompanying drawings, which are not necessarily drawn to scale, and wherein:

[0034] FIG. 1 schematically illustrates a prior art example of an X-ray tube structure including a single anode and a single cathode;

[0035] FIGS. 2A-2D schematically illustrates a prior art example of an X-ray tube structure including a single anode and a single cathode, with an electron beam deflector device capable of deflecting the electron beam emitted from the cathode by generating and applying an electric field and/or a magnetic field to manipulate the electron beam;

[0036] FIG. 3 schematically illustrates a prior art example of a multi-beam X-ray source with multiple cathodes formed in a linear array;

[0037] FIG. 4 schematically illustrates a prior art example of a multi-beam X-ray source with multiple cathodes formed in a linear array, demonstrating the electron beam generating effect of the array in instances of a malfunctioning cathode in the array, resulting in the loss of a corresponding focal spot/point on the anode;

[0038] FIG. 5 schematically illustrates a multi-beam X-ray source implementing an electron beam deflection device, according to one aspect of the present disclosure;

[0039] FIGS. 6A and 6B schematically illustrate one aspect of the present disclosure wherein an electron beam of one cathode device is directed by the deflector device to a focal spot/point of an adjacent cathode device to compensate for a malfunctioning/inoperable cathode device;

[0040] FIG. 7A schematically illustrates a multi-beam X-ray source according to another aspect of the present disclosure, implementing a deflector device applicable to the electron beams collectively from the plurality of cathode devices; and

[0041] FIG. 7B schematically illustrates a multi-beam X-ray source according to another aspect of the present disclosure, implementing a physically adjustable deflector device applicable to the electron beams collectively from the plurality of cathode devices.

DETAILED DESCRIPTION OF THE DISCLOSURE

[0042] The present disclosure now will be described more fully hereinafter with reference to the accompanying drawings, in which some, but not all aspects of the disclosure are shown. Indeed, the disclosure may be embodied in many different forms and should not be construed as limited to the aspects set forth herein; rather, these aspects are provided so that this disclosure will satisfy applicable legal requirements. Like numbers refer to like elements throughout.

[0043] FIG. 5 schematically illustrates a multi-beam X-ray source according to one aspect of the present disclosure. Such a multi-beam X-ray source includes an anode and an electron beam cathode system arranged to emit a plurality of electron beams therefrom toward the anode. A deflector device (e.g., an electron beam-deflecting electrode) is disposed adjacent to the electron beam cathode system to manipulate interaction of one or more of the electron beams emitted by the electron beam cathode system with the anode. In particular aspects, the deflector device is arranged to form an electric field and/or a magnetic field to manipulate the one or more of the electron beams emitted by the electron beam cathode system.

[0044] That is, in some aspects, the electron beam cathode system comprises a plurality of adjacently-arranged cathode devices, with each cathode device being arranged to emit one of the electron beams toward a corresponding one of a plurality of adjacently-arranged predetermined focal points on the anode. Each cathode device can comprise, for example, a hot filament emitter, a field emission emitter, or any other suitable electron emitter.

[0045] In some aspects, the deflector device defines a plurality of deflector portions corresponding to the plurality of cathode devices, wherein each deflector portion is arranged to manipulate the electron beam emitted by a corresponding one of the cathode devices. That is, the deflector device is configured such that a particular portion thereof corresponds to a single cathode device, and that portion is arranged to control/manipulate the electron beam only from that cathode device. For example, each portion of the deflector device can define an opening for allowing the electron beam from the corresponding cathode device to pass therethrough and, as such, the deflector device may be a series of such portions each defining an opening, or may be an integral element in the form of a mesh-like structure or a grill-like structure.

[0046] In other aspects, the deflector device defines a plurality of deflector portions each corresponding to more than one of the plurality of cathode devices, wherein each deflector portion is arranged to manipulate the electron beams collectively emitted by the corresponding more than one of the cathode devices. That is, the deflector device is configured such that a particular portion thereof corresponds to more than one cathode device (e.g., a group of two, three, four, or more adjacent cathode devices), and that portion is arranged to control/manipulate the collective electron beams from those more-than-one cathode devices. For example, each portion of the deflector device can define an opening for allowing the electron beams from the corresponding two or more cathode devices to pass therethrough and, as such, the deflector device may be a series of such portions each defining an opening, or may be an integral element in the form of a mesh-like structure or a grill-like structure.

[0047] In particular aspects, the deflector device, when energized to form the electric field and/or magnetic field, is arranged to re-direct each of the electron beams emitted by one or more of the cathode devices to one of the predetermined focal points on the anode adjacent to the corresponding predetermined focal point for each of the one or more cathode devices. That is, the implementation of a deflecting electrode (deflector device) for steering, controlling, or otherwise manipulating the electron beams emitted from the cathodes allows for each cathode to be capable of emitting the electron beam toward multiple X-ray focal spots/points on the anode. In doing do, the electron beam from one cathode device can be manipulated by the deflector device toward a predetermined focal spot/point on the anode corresponding to the electron beam emitted by an adjacent cathode device. In some particular aspects, the electron beam from one cathode device is manipulated by the deflector device to a predetermined focal spot/point on the anode corresponding to the electron beam emitted by an adjacent cathode device (see, e.g., FIGS. 6A and 6B). In this manner, the multi-beam X-ray source implementing a deflector device according to aspects of the disclosure can compensate for a malfunctioning or inoperable cathode device in the array (e.g., as shown in FIG. 4) with the electrode beam from an adjacent cathode device. This capability of compensating for malfunctioning/inoperable cathode devices will increase the production yield of such X-ray sources (e.g., at least the electrode emission cathode system thereof), possibly extend the X-ray source operational lifetime, and lower the cost of production and/or operation.

[0048] In other particular aspects, the deflector device is arranged and configured to be capable of re-directing the electron beams emitted by each of the cathode devices to or toward one of the predetermined focal points on the anode adjacent to the corresponding predetermined focal point for the each of the cathode devices (e.g., the deflector device is capable of deflecting the electron beam from each cathode device in the array). In still further aspects, the deflector device is arranged to re-direct the electron beam emitted by one of the cathode devices to a new focal point on the anode, the new focal point being disposed between the corresponding predetermined focal point for the one of the cathode devices and one of the predetermined focal points adjacent thereto (see, e.g., FIG. 5). In doing so, by application of the deflecting field produced by the deflector device, each cathode device in the array can thus be directed toward multiple focal spots/points on the anode. As such, the cathode devices and/or the deflector device can be arranged to re-direct the electron beams from the plurality of cathode devices, each at a relatively small angle, to increase the packing density of X-ray focal spots/points (e.g., the proximity of the focal spots/points with respect to each other) on the anode.

[0049] The configuration of the deflector device can vary. For example, as shown in FIG. 7A, instead of having an individual portion of the deflector device corresponding to each cathode device, the deflector device is configured/arranged to be applied to the electron beams collectively emitted by all of the cathode devices (e.g., a single deflecting electrode/deflector device applied to all electron beams emitted by the cathode devices). In such aspects, the operating parameters of the deflector device (e.g., electric/magnetic field strength, duration, etc.) may require adjustment for each focal spot/point on the anode.

[0050] In other aspects, the deflector device is arranged to physically manipulate the one or more of the electron beams emitted by the electron beam cathode system. That is, the deflector device may be physically adjustable to accomplish the particular deflection of the electron beam(s) as shown, for example, in FIG. 7B. In yet other aspects, the deflector device is arranged to form an electric field or a magnetic field, and to physically manipulate the electric field or magnetic field, to manipulate the one or more of the electron beams emitted by the electron beam cathode system (e.g., a combination of the physical adjustability of the deflector device, and the electric field and/or magnetic field applied via the deflector device).

[0051] Aspects of the present disclosure thus provide a multi-beam X-ray source, and a method of forming such a multi-beam X-ray source, wherein a high X-ray beam packing density can be achieved. In addition, such a multi-beam X-ray source provides the capability of compensating for malfunctioning/inoperable cathodes/electron beams so as to provide acceptable operability of the device, thereby increasing production yield of the X-ray source and decreasing production and/or operational costs.

[0052] Many modifications and other embodiments of the inventions set forth herein will come to mind to one skilled in the art to which these disclosed embodiments pertain having the benefit of the teachings presented in the foregoing descriptions and the associated drawings. Therefore, it is to be understood that embodiments of the invention are not to be limited to the specific embodiments disclosed and that modifications and other embodiments are intended to be included within the scope of the invention. Moreover, although the foregoing descriptions and the associated drawings describe example embodiments in the context of certain example combinations of elements and/or functions, it should be appreciated that different combinations of elements and/or functions may be provided by alternative embodiments without departing from the scope of the disclosure. In this regard, for example, different combinations of elements and/or functions than those explicitly described above are also contemplated within the scope of the disclosure. Although specific terms are employed herein, they are used in a generic and descriptive sense only and not for purposes of limitation.

[0053] It should be understood that although the terms first, second, etc. may be used herein to describe various steps or calculations, these steps or calculations should not be limited by these terms. These terms are only used to distinguish one operation or calculation from another. For example, a first calculation may be termed a second calculation, and, similarly, a second step may be termed a first step, without departing from the scope of this disclosure. As used herein, the term and/or and the I symbol includes any and all combinations of one or more of the associated listed items.

[0054] As used herein, the singular forms a, an and the are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms comprises, comprising, includes, and/or including, when used herein, specify the presence of stated features, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof. Therefore, the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting.