CERAMIC HEATER
20210212172 ยท 2021-07-08
Assignee
Inventors
Cpc classification
International classification
Abstract
A ceramic heater includes a ceramic plate in which inner circumferential side and outer circumferential side resistance heating elements are built in; and a cylindrical shaft joined to a rear surface of the ceramic plate. A long hole is provided along a direction deviated from the diameter direction of the ceramic plate, and extends from a start point of a shaft inside area to a terminal position of the outer circumferential portion of the ceramic plate. A portion of the long hole forms a long groove, the portion passing through the shaft inside area. Terminals of the resistance heating elements are collectively provided in one of two division areas which are in the shaft inside area and divided by an axial line of the long groove, the one being a first division area having a larger area.
Claims
1. A ceramic heater comprising: a disc-shaped ceramic plate having a wafer mounting surface; a cylindrical shaft connected to a rear surface of the ceramic plate, the rear surface being on an opposite side of the wafer mounting surface; an inner circumferential side resistance heating element which is embedded in an inner circumferential portion of the ceramic plate; an outer circumferential side resistance heating element which is embedded in an outer circumferential portion of the ceramic plate; a shaft inside area which is of the rear surface of the ceramic plate and inside of the cylindrical shaft; a long hole which is provided along a direction deviated from a diameter direction of the ceramic plate and extends from the shaft inside area to a predetermined position of the outer circumferential portion of the ceramic plate; and attached components which are provided in the shaft inside area and include a pair of terminals of the inner circumferential side resistance heating element and a pair of terminals of the outer circumferential side resistance heating element, wherein a portion of the long hole forms a long groove, the portion passing through the shaft inside area, and the attached components are collectively provided in one of two division areas which are in the shaft inside area and divided by an axial line of the long groove, the one having a larger area.
2. The ceramic heater according to claim 1, wherein of the attached components, any attached components other than the terminals of the inner circumferential side and outer circumferential side resistance heating elements is not present in an area surrounded by the terminals of the inner circumferential side and outer circumferential side resistance heating elements.
3. The ceramic heater according to claim 1, wherein the long hole is a thermocouple insertion long hole in which a thermocouple is inserted.
4. The ceramic heater according to claim 1, wherein the long groove is used to arrange a cylindrical thermocouple guide having a curved portion configured to change a direction from a vertical direction to a horizontal direction with respect to the wafer mounting surface.
5. The ceramic heater according to claim 4, wherein a length of the long groove is defined to be longer than or equal to a length of a leading end portion of the curved portion of the thermocouple guide, the leading end portion being disposed in the long groove.
6. The ceramic heater according to claim 5, wherein an outer diameter of the curved portion of the thermocouple guide is smaller than an outer diameter of the vertical portion.
7. The ceramic heater according to claim 4, further comprising the thermocouple guide arranged in the long groove.
8. The ceramic heater according to claim 7, further comprising a thermocouple inserted in the thermocouple guide and the long hole.
9. The ceramic heater according to claim 8, wherein a temperature sensing part of the thermocouple guide is arranged to fall within a width of the outer circumferential side resistance heating element when the ceramic plate is viewed from the rear surface.
10. The ceramic heater according to claim 1, wherein a gap between the long groove and each of the attached components is 2 mm or greater.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
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DETAILED DESCRIPTION OF THE INVENTION
[0035] A preferred embodiment of the present invention will be described below with reference to the drawings.
[0036] The ceramic heater 10 is used to heat a wafer which undergoes processing such as etching and CVD, and is installed in a vacuum chamber which is not illustrated. The ceramic heater 10 includes a disc-shaped ceramic plate 20 having a wafer mounting surface 20a, and a cylindrical shaft 40 joined to the surface (rear surface) 20b on the opposite side of the wafer mounting surface 20a of the ceramic plate 20.
[0037] The ceramic plate 20 is a disc-shaped plate comprised of a ceramic material represented by aluminum nitride or alumina. The diameter of the ceramic plate 20 is not particularly limited, and is approximately 300 mm, for instance. The ceramic plate 20 is divided into a small circular inner circumferential side zone Z1 and a circular ring-shaped outer circumferential side zone Z2 by a virtual boundary 20c (see
[0038] Like the ceramic plate 20, the cylindrical shaft 40 is comprised of ceramics such as aluminum nitride or alumina. The upper end of the cylindrical shaft 40 is diffusion bonded to the ceramic plate 20.
[0039] As illustrated in
[0040] As illustrated in
[0041] As illustrated in
[0042] Here, the arrangement positions of the terminals 22a, 22b, 24a, 24b will be described using
[0043] As illustrated in
[0044] As illustrated in
[0045] Next, an example of use of the ceramic heater 10 will be described. First, the ceramic heater 10 is installed in a vacuum chamber which is not illustrated, and a wafer W is mounted on the wafer mounting surface 20a of the ceramic heater 10. The electric power supplied to the inner circumferential side resistance heating element 22 is adjusted so that the temperature detected by the inner circumferential side thermocouple 48 becomes a predetermined target inner circumferential side temperature, and the electric power supplied to the outer circumferential side resistance heating element 24 is adjusted so that the temperature detected by the outer circumferential side thermocouple 50 becomes a predetermined target outer circumferential side temperature. Thereby, the temperature of the wafer W is controlled at a desired temperature. The inside of the vacuum chamber is set to a vacuum atmosphere or a reduced-pressure atmosphere to generate plasma in the vacuum chamber, and CVD film formation is performed or etching is performed on the wafer W utilizing the plasma.
[0046] In the ceramic heater 10 of the present embodiment described above, the first and second division areas 20d1, 20d2 are divided by the axial line L (which is the same as the axial line of the long hole 26) of the long groove 26a. The axial line L is a line in a direction deviated from the diameter direction of the ceramic plate 20. Therefore, the first division area 20d1 which is one division area is larger in area than the second division area 20d2 which is the other. Here, the terminals 22a, 22b, 24a, 24b are collectively provided in the first division area 20d1 having a larger area. Consequently, in a multi-zone heater to which the thermocouple guide 32 can be attached, it is possible to collectively arrange the attached components including the multiple terminals 22a, 22b, 24a, 24b and increase the degree of freedom of the arrangement. It is to be noted that wires from the terminals 22a, 22b, 24a, 24b to an external device are easily bundled by collectively providing the terminals 22a, 22b, 24a, 24b. In this case, the attached components, such as the inner side thermocouple 48, other than the terminals 22a, 22b, 24a, 24b which supply electrical power to the resistance heating elements 22, 24 is not present in the area surrounded by the terminals 22a, 22b, 24a, 24b.
[0047] Also, at the time of manufacturing the ceramic heater 10, when a procedure is adopted, in which the power feeding rods 42a, 42b, 44a, 44b are respectively connected to the terminals 22a, 22b, 24a, 24b exposed to the rear surface 20b of the ceramic plate 20 to connect the cylindrical shaft 40 to the rear surface 20b, then the thermocouple guide 32 is mounted, the thermocouple guide 32 does not need to be passed between the power feeding rods, thus the mounting is easy.
[0048] In addition, since the attached components such as the terminals 22a, 22b, 24a, 24b are collectively provided in the first division area 20d1 having a larger area, these attached components can be easily arranged at positions where an electrical insulating property can be maintained.
[0049] Furthermore, the length of the long groove 26a serving as the entrance portion of the long hole 26 is set to be longer than or equal to the length of the leading portion, arranged in the long groove 26a, of the curved portion 34 of the thermocouple guide 32. Therefore, the thermocouple guide 32 can be set more easily.
[0050] The outer diameter of the curved portion 34 of the thermocouple guide 32 is made less than the outer diameter of the vertical portion 33, thus the width of the long groove 26a can be decreased.
[0051] The present invention is not limited to the embodiment described above, and needless to say, the present invention can be implemented in various manners as long as not departing from the technical scope of the present invention.
[0052] For instance, in the above-described embodiment, as illustrated in
[0053] In the embodiment described above, as illustrated in
[0054] In the above-described embodiment, both the resistance heating elements 22, 24 are coil-shaped, but are not particularly limited to coil-shaped, and may be, for instance, a print pattern, and may be in a ribbon shape or a mesh shape.
[0055] In the above-described embodiment, an electrostatic electrode or an RF electrode may be built in by adding the resistance heating elements 22, 24 to the ceramic plate 20. When an electrostatic electrode is built in, the first division area 20d1 of the ceramic plate 20 is provided with the terminal (one of the attached components) of the electrostatic electrode. When an RF electrode is built in, the first division area 20d1 of the ceramic plate 20 is provided with the terminal (one of attached components) of the RF electrode.
[0056] In the above-described embodiment, the vertical length of the thermocouple guide 32 is substantially the same as the height of the cylindrical shaft 40. However, the vertical length may be shorter or longer than the height of the cylindrical shaft 40.
[0057] In the above-described embodiment, the inner circumferential side zone Z1 may be divided into multiple inner circumferential side small zones, and a resistance heating element may be drawn through each of the inner circumferential side small zones in a traversable manner. Also, the outer circumferential side zone Z2 may be divided into multiple outer circumferential side small zones, and a resistance heating element may be drawn through each of the outer circumferential side small zones in a traversable manner. Although the number of terminals increased according to the number of small zones, these terminals are collectively provided in the first division area 20d1 having a larger area, thus can be relatively easily arranged even if the number of the terminals is increased.
[0058] In the embodiment described above, a procedure has been illustrated, in which the power feeding rods 42a, 42b, 44a, 44b are respectively connected to the terminals 22a, 22b, 24a, 24b of the ceramic plate 20 to connect the cylindrical shaft 40 to the rear surface 20b of the ceramic plate 20, then the thermocouple guide 32 is mounted. However, the mounting procedure is not limited to this. For instance, the cylindrical shaft 40 is connected to the rear surface 20b of the ceramic plate 20, the thermocouple guide 32 is mounted, then the power feeding rods 42a, 42b, 44a, 44b may be respectively connected to the terminals 22a, 22b, 24a, 24b.
[0059] In the above-described embodiment, as illustrated in
[0060] The present application claims priority from JP Patent Application No. 2018-238225 filed Dec. 20, 2018, the entire contents of which are incorporated herein by reference.