Micromechanical sensor and method for manufacturing a micromechanical sensor

10900996 ยท 2021-01-26

Assignee

Inventors

Cpc classification

International classification

Abstract

A micromechanical sensor, including: a substrate; a movable mass element sensitive in three spatial directions; two x-lateral electrodes for detecting a lateral x-deflection of the movable mass element; two y-lateral electrodes for detecting a lateral y-deflection of the movable mass element; z-electrodes for detecting a z-deflection of the movable mass element; each lateral electrode being fastened on the substrate with the aid of a fastening element; the fastening elements of all electrodes being formed close to a connection element of the movable mass element to the substrate.

Claims

1. A micromechanical sensor, comprising: a substrate; a movable mass element sensitive in three spatial directions; two x-lateral electrodes for detecting deflection of the movable mass element due to acceleration in the x-direction; two y-lateral electrodes for detecting deflection of the movable mass element due to acceleration in the y-direction; and z-electrodes for detecting deflection of the movable mass element due to acceleration in the z-direction, wherein each of the electrodes is fastened on the substrate via fastening elements, and the fastening elements of all the electrodes are fastened on a central connection element of the movable mass element to the substrate; wherein each of the two x-lateral electrodes and each of the two y-lateral electrodes includes two fastening elements, wherein each of the two x-lateral electrodes and each of the two y-lateral electrodes includes a plurality of electrode fingers formed in a third functional layer, wherein half of the plurality of x-electrode fingers and half of the plurality of y-electrode fingers are situated on top of the fastening elements formed in a second functional layer, and wherein half of the plurality of x-electrode fingers and half of the plurality of y-electrode fingers are directly connected to each other in the third functional layer.

2. The micromechanical sensor as recited in claim 1, wherein lengths of electrode backings are one third of a half of a longitudinal dimension of the sensor.

3. The micromechanical sensor as recited in claim 1, further comprising: conduction elements for the electrodes, the conduction elements being formed in a first functional layer and in the second functional layer of the sensor.

4. The micromechanical sensor as recited in claim 3, wherein detection fingers and electrode backings of the electrodes are formed in the third functional layer of the sensor.

5. A method for manufacturing a micromechanical sensor, the method comprising: providing a substrate; providing a movable mass element that is sensitive and movable in three spatial directions; forming two x-lateral electrodes for detecting deflection of the movable mass element due to acceleration in the x-direction; forming two y-lateral electrodes for detecting deflection of the movable mass element due to acceleration in the y-direction; forming two z-electrodes for detecting deflection of the movable mass element due to acceleration in the z-direction; and fastening all of the electrodes to the substrate on a central connection element of the movable mass element; wherein each of the two x-lateral electrodes and each of the two y-lateral electrodes includes two fastening elements, wherein each of the two x-lateral electrodes and each of the two y-lateral electrodes includes a plurality of electrode fingers formed in a third functional layer, wherein half of the plurality of x-electrode fingers and half of the plurality of y-electrode fingers are situated on top of the fastening elements formed in a second functional layer, and wherein half of the plurality of x-electrode fingers and half of the plurality of y-electrode fingers are directly connected to each other in the third functional layer.

6. The method as recited in claim 5, further comprising: forming lengths of electrode backings of the electrodes a third as long as a half of a longitudinal dimension of the sensor.

7. The method as recited in claim 5, further comprising: forming conduction elements for the electrodes in a first functional layer and in the second functional layer of the sensor.

8. The method as recited in claim 7, wherein the detection fingers and the electrode backings of the electrodes are formed in the third functional layer of the sensor.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) FIG. 1 shows a movable mass element of a conventional micromechanical z-acceleration sensor.

(2) FIG. 2 shows a top view of one specific embodiment of a micromechanical sensor according to the present invention.

(3) FIG. 3 shows a top view of a lower-most layer of one specific embodiment of the micromechanical sensor according to the present invention.

(4) FIG. 4 shows a top view of one specific embodiment of the micromechanical sensor according to the present invention, which includes an additional functional layer.

(5) FIG. 5 shows a perspective view of one specific embodiment of the micromechanical sensor according to the present invention.

(6) FIG. 6 shows a sectional view along a section line A-A of FIG. 2.

(7) FIG. 7 shows a sectional view along a section line B-B of FIG. 2.

(8) FIG. 8 shows a sectional view along a section line C-C of FIG. 2.

(9) FIG. 9 shows a sectional view along a section line D-D of FIG. 2.

(10) FIG. 10 shows a top view of an alternative specific embodiment of the micromechanical sensor.

(11) FIG. 11 shows a top view of an additional, alternative specific embodiment of the micromechanical sensor.

(12) FIG. 12 shows a basic sequence of a method for manufacturing a micromechanical sensor according to the present invention.

DETAILED DESCRIPTION

(13) A basic concept of the present invention is to design and situate suspension structures and fastening structures for all electrodes of a micromechanical acceleration sensor preferably close to the center. In this way, substrate deformations are incorporated as little as possible in a sensing characteristic of the sensor, as a result of which an offset performance of the sensor may be significantly improved. All electrodes of the sensor are designed according to the fully differential principle known per se, in which capacitance changes due to the displaced movable mass may be detected and evaluated.

(14) A combination of a suitable spring-mass structure, which is sensitive to accelerations in all three spatial directions, and a specific fully differential configuration of the electrodes for x-detection, y-detection as well as z-detection, is described. In this case, at least two suspensions are provided for each polarity for the suspension and configuration of the lateral fixed electrodes both for the x-axis as well as for the y-axis. This allows for better symmetry conditions to be created between electrode suspension and mass suspension and for particular substrate deformations to be better compensated for. In addition, the carrier arms and the electron backings of the fixed electrodes are short in relation to a total length, so that any deformations occurring in the anchoring area or in the micromechanical layers themselves impact a change in the distances between movable and fixed electrodes to a significantly lesser degree than in the related art. This results overall in a significantly improved offset performance of the acceleration sensor.

(15) FIG. 1 shows a perspective view of a movable seismic mass element 10 in the form of a rocker, which is fastened to or connected on a substrate 1 with the aid of a central connection element 13. A seismic mass of the left rocker arm is larger than a mass of the right rocker arm and as a result implements a mass asymmetry of the movable mass element 10. A spring 11, which is oriented in the y-direction, is situated on connection element 13. Situated outside on spring 11 is mass element 10 in the form of a frame with an asymmetrically distributed mass. Detection fingers 12 for the detection of lateral acceleration in x-direction and y-direction are situated on both sides next to spring 11. A micromechanical functional layer (not depicted) situated below is used for a detection of the out-of-plane channel z.

(16) FIG. 2 shows a top view of one specific embodiment of micromechanical sensor 200 according to the present invention. Four section lines A-A, B-B, C-C and D-D are apparent, which are explained in greater detail in additional figures. It is apparent that x-electrode fastening elements 40, 50 and y-electrode fastening elements 60, 70 are situated on the central connection element 13 for movable mass element 10. Thus, for lateral x-electrodes and for lateral y-electrodes (in-plane electrodes), two fastening elements 40, 50 each, separated from one another, are situated on central connection element 13 for movable mass element 10. In addition, the two z-electrodes 33, 34 (out-of-plane electrodes) are also situated close to central connection element 13. As a result, all electrodes are thus centrally connected close to connection element 13 with substrate 1, whereby a compact design of micromechanical sensor 200 is advantageously implemented.

(17) FIG. 3 shows leads of conduction elements 80 . . . 130 for implementing electrical connections of the aforementioned electrodes. All aforementioned conduction elements 80 . . . 130 are formed in a first or lower-most micromechanical functional layer (formed preferably of polysilicon) of micromechanical sensor 200. Conduction elements 80, 90 and 100, 110 for the lateral x-electrodes and for the lateral y-electrodes in this case are each formed in duplicate.

(18) Conduction elements 80, 90 exhibit suitable electrical potentials, so that a movement of detection fingers 12 between lateral x-electrode fingers is detectable. Conduction elements 100, 110 exhibit suitable electrical potentials, so that a movement of detection fingers 12 between lateral y-electrode fingers is detectable. Conduction elements 120, 130 exhibit suitable electrical potentials for detecting a deflection of seismic mass element 10 in the z-direction.

(19) FIG. 4 shows the structure of micromechanical sensor 200, which includes an additional micromechanical functional layer in the area of conduction elements 80, 90, 100, 110, 120, 130. It is apparent that conduction elements 80, 90, 110 have an L-shaped design close to central connection element 13, so that an electrical connection of the lateral x-electrodes and lateral y-electrodes is thus implemented. The aforementioned L-shaped elements are formed in a second micromechanical functional layer (formed preferably of polysilicon) of micromechanical sensor 200, which is situated on the lower-most functional layer.

(20) FIG. 5 shows a perspective illustration of one specific embodiment of the described micromechanical sensor 200, including all micromechanical functional layers. For the detection of an acceleration in the x-direction, x-electrode fingers 21, 22 are apparent, which interact with one movable detection finger 12 each of mass element 10. It is apparent that two such structures are situated diagonally offset from one another with respect to central connection element 13. Also provided for the detection of the lateral y-deflection are y-electrode fingers 31, 32, which each interact with one moveable detection finger 12 of mass element 10. Lateral electrodes 20, 21, 22 and 30, 31, 32 are situated diagonally offset from one another with respect to central connection element 13.

(21) Two x-electrode backings 20 are apparent, on which x-electrode fingers 21, 22 are situated, one detection finger 12 of movable mass element 10 being situated between two x-electrode fingers 21, 22, respectively. Two y-electrode backings 30, on which y-electrode fingers 31, 32 are formed, are provided for a detection of a deflection of movable mass element 10 in the y-direction, two y-electrode fingers 31, 32 each interacting with one movable detection finger 12, respectively. The y-electrode structure may be suitably acted upon in terms of potential with the aid of conduction elements 100, 110, as may the x-electrode structure with the aid of conduction elements 80, 90. In such case, electrode backings 20, 30 may exhibit identical or different electrical potentials, depending on the specific application.

(22) One dimension of electrode backings 20, 30 is approximately one third of the half length of micromechanical sensor 200. The two z-electrodes 33, 34 each are situated between two lateral electrodes, so that a compact detection structure for micromechanical sensor 200 is thus implemented.

(23) FIG. 6 is a depiction of a sectional view through described micromechanical sensor 200 of FIG. 2 along section line A-A. It is apparent that z-electrodes 33, 34 are connected with conduction elements 130, 120 to the lower-most micromechanical functional layer of sensor 200. Also apparent here is the fully differential design of z-electrodes 33, 34, a conduction element 120 having the electrical potential of z-electrode 34 being formed below z-electrode 33. One detection finger 12 each of movable mass element 10 is situated between z-electrodes 33, 34 and conduction elements 120, 130.

(24) FIG. 7 shows a sectional view through described sensor 200 of FIG. 2 along section line B-B. Conduction elements 80, 90, 100, 110 are apparent for electrically connecting the lateral x-electrodes and lateral y-electrodes in the lower-most functional layer. It is further apparent that z-electrodes 33, 34, as well as lateral electrode backings 20, 30, are situated together with L-shaped fastening elements 40, 50, 60 and 70 close to central connection element 13 and spring 11.

(25) FIG. 8 shows a sectional view through the described structure of FIG. 2 along section line C-C. x-electrode fingers 21, 22 of the lateral x-electrode and y-electrode fingers 31, 32 of the lateral y-electrode are apparent, each of which are situated on an L-shaped fastening element 50 and 70, which are formed in the second functional layer.

(26) A sectional view of micromechanical sensor 200 along section line D-D is depicted in FIG. 9. Apparent, in addition to the elements of FIG. 8, are the detection fingers 12 of movable mass element 10. Also apparent here are conduction elements 120, 130 in the second micromechanical functional layer of sensor 200, conduction element 130 being provided for electrically connecting z-electrode 33 and conduction element 120 for electrically connecting z-electrode 34.

(27) FIG. 10 shows a top view of a first alternative of described micromechanical sensor 200. In this case, x-electrode backings 20, as well as y-electrode backings 30, are situated not diagonally, but opposite one another with respect to central connection element 13. Structurally, there is no difference compared to the configurations of FIGS. 5 through 9; here, however, one of electrode backings 30 exhibits the electrical potential of conduction element 100 and the other electrode backing 30 exhibits the electrical potential of conduction element 110. The two electrode backings 20 both exhibit the same electrical potential of conduction element 90.

(28) FIG. 11 shows a top view of a second alternative of micromechanical sensor 200 according to the present invention. In this case, the two L-shaped fastening elements 50 of the lateral x-electrodes are acted upon with the electrical potential of conduction elements 80 and the two L-shaped fastening elements 40 of the lateral x-electrodes are acted upon with the electrical potential of conduction elements 90. Fastening elements 60 of both lateral y-electrodes are acted upon with the electrical potential of conduction elements 100 and fastening elements 70 of both lateral y-electrodes are acted upon with the electrical potential of conduction elements 110.

(29) It is apparent from the variants of FIGS. 10 and 11 that an application of suitable electrical potentials of conduction elements 80 through 110 to electrode backings 20, 30 may be advantageously implemented in a simple manner.

(30) Which of the electrode configurations depicted in the FIGS. 5, 10, 11 has a particularly high insensitivity to substrate deformations depends ultimately on the type of substrate deformation, which may be different for various mounting positions of the sensor core in the chip and for various housing variants. Thus, the respectively optimal electrode configuration for a specific product may be selected as a function of the boundary conditions of the housing.

(31) FIG. 12 shows a basic sequence of the described method:

(32) A substrate 1 is provided in a step 300.

(33) A movable mass element 10, sensitive and movable in three spatial directions x, y, z is provided in a step 310.

(34) Two x-lateral electrodes 20, 21, 22 are formed in a step 320.

(35) Two y-lateral electrodes 30, 31, 32 are formed in a step 330.

(36) Two z-electrodes are formed in a step 340.

(37) All electrodes 20, 21, 22, 30, 31, 32, 33, 34 are fastened to substrate 1 close to a connection element 13 of movable mass element 10 in a step 350.

(38) The order of the steps here may also be changed.

(39) In summary, a micromechanical sensor manufacturable with the aid of a surface micromechanical method is provided with the present invention, which advantageously implements an optimized sensing behavior in that all detection-relevant elements are preferably situated close to a mass suspension. In this way, the substrate may warp in preferably the same manner as the moveable mass element. As a result, an insensitivity of the acceleration sensor to substrate deformations is thereby advantageously increased.

(40) As a result, therefore, an acceleration sensor is provided as a single mass oscillator, for which the detection of x-accelerations, y-accelerations and z-accelerations is made possible in a single core and which exhibits at the same time an excellent robustness with respect to substrate deformations, i.e. a good offset performance during the circuit board assembly and under thermomechanical stress in the sensor housing.

(41) Although the present invention has been described above with reference to specific application examples, those skilled in the art going forward may also implement undisclosed or only partially disclosed specific embodiments without departing from the core of the present invention.