APPARATUS, METHOD AND COMPUTER PROGRAM PRODUCT FOR DEFECT DETECTION IN WORK PIECES

Abstract

An apparatus, a method and a computer program product for defect detection in work pieces is disclosed. At least one light source is provided and the light source generates an illumination light of a wavelength range at which the work piece is transparent. A camera images the light from at least one face of the work piece on a detector of the camera by means of a lens. A stage is used for moving the work piece and for imaging the at least one face of the semiconductor device completely with the camera. The computer program product is disposed on a non-transitory, computer readable medium for defect detection in work pieces. A computer is used to execute the various process steps and to control the various means of the apparatus.

Claims

1. An apparatus for defect detection in a work piece comprising: at least one light source for providing illumination, wherein the light source is configured to direct the illumination onto a first face of the work piece and transmit the illumination through the work piece, wherein at least a portion of the illumination transmitted through the work piece exits the work piece at a second face of the work piece opposite the first face, wherein an area of the first face and an area of the second face of the workpiece are smaller than an area of a third face and an area of a fourth face of the workpiece, wherein one or more defects block illumination from exiting the second face of the work piece; and a camera including a lens and a detector for collecting the illumination transmitted through the work piece and exiting from the second face of the work piece, wherein the camera is configured to image one or more defects within the work piece based on the collected illumination exited through the second face of work piece and the illumination blocked by the one or more defects.

2. The apparatus of claim 1, further comprising; a stage for moving the work piece, wherein the stage is configured to impart a relative motion between the work piece and the camera to form one or more images from the illumination transmitted through the work piece and exiting from the second face of the work piece.

3. The apparatus of claim 1, wherein the camera comprises a lens and a detector.

4. The apparatus of claim 1, wherein the at least one light source is configured to provide illumination of a wavelength range, wherein the workpiece is transparent to the illumination of the wavelength range.

5. The apparatus of claim 4, wherein the illumination comprises infrared illumination.

6. The apparatus of claim 4, wherein the illumination has a wavelength equal to or greater than 1200 nm.

7. The apparatus of claim 1, wherein the camera comprises a line scan sensor.

8. The apparatus of claim 1, wherein the work piece is a semiconductor wafer.

9. An apparatus for defect detection in a work piece comprising: at least one light source for providing illumination, wherein the light source is configured to direct the illumination onto a first side face of the work piece and transmit the illumination through the work piece, wherein at least a portion of the illumination transmitted through the work piece exits the work piece at a second side face of the work piece opposite the first side face, wherein one or more defects block illumination from exiting the second face of the work piece; and a camera for collecting the illumination transmitted through the work piece and exiting from the second face of the work piece, wherein the camera is configured to image one or more defects within the work piece based on the collected illumination exited through the second face of work piece and the illumination blocked by the one or more defects.

10. The apparatus of claim 9, further comprising; a stage for moving the work piece, wherein the stage is configured to impart a relative motion between the work piece and the camera to form one or more images from the illumination transmitted through the work piece and exiting from the second face of the work piece.

11. The apparatus of claim 9, wherein the camera comprises a lens and a detector.

12. The apparatus of claim 9, wherein the at least one light source is configured to provide illumination of a wavelength range, wherein the workpiece is transparent to the illumination of the wavelength range.

13. The apparatus of claim 12, wherein the illumination comprises infrared illumination.

14. The apparatus of claim 12, wherein the illumination has a wavelength equal to or greater than 1200 nm.

15. The apparatus of claim 9, wherein the camera comprises a line scan sensor.

16. The apparatus of claim 9, wherein the work piece is a semiconductor wafer.

17. An apparatus for defect detection in a work piece comprising: at least one light source for providing illumination, wherein the light source is configured to direct the illumination onto a first face of the work piece and transmit the illumination through the work piece, wherein at least a portion of the illumination transmitted through the work piece is internally reflected by at least one of a top surface or a bottom surface of the work piece before exiting the work piece at a second face of the work piece opposite the first face, wherein one or more defects block illumination from exiting the second face of the work piece; and a camera for collecting the illumination transmitted through the work piece and exiting from the second face of the work piece, wherein the camera is configured to image one or more defects within the work piece based on the collected illumination exited through the second face of work piece and the illumination blocked by the one or more defects.

18. The apparatus of claim 17, further comprising; a stage for moving the work piece, wherein the stage is configured to impart a relative motion between the work piece and the camera to form one or more images from the illumination transmitted through the work piece and exiting from the second face of the work piece.

19. The apparatus of claim 17, wherein the camera comprises a lens and a detector.

20. The apparatus of claim 17, wherein the at least one light source is configured to provide illumination of a wavelength range, wherein the workpiece is transparent to the illumination of the wavelength range.

21. The apparatus of claim 20, wherein the illumination comprises infrared illumination.

22. The apparatus of claim 20, wherein the illumination has a wavelength equal to or greater than 1200 nm.

23. The apparatus of claim 17, wherein the camera comprises a line scan sensor.

24. The apparatus of claim 17, wherein the work piece is a semiconductor wafer.

25. A method of defect detection in a work piece comprising: generating a beam of illumination; directing the beam of illumination onto a first face of the work piece and transmitting the illumination through the work piece, wherein at least a portion of the illumination transmitted through the work piece exits the work piece at a second face of the work piece opposite the first face, wherein an area of the first face and an area of the second face of the workpiece are smaller than an area of a third face and an area of a fourth face of the workpiece; collecting the illumination transmitted through the work piece and exiting from the second face of the work piece; and imaging, with a camera, one or more defects within the work piece based on the collected illumination exited through the second face of work piece and the illumination blocked by the one or more defects.

26. The method of claim 25, further comprising; securing the workpiece with a stage; and providing a relative motion between the work piece and the camera to form one or more images from the illumination transmitted through the work piece and exiting from the second face of the work piece.

27. The method of claim 25, wherein the generating a beam of illumination comprises: generating a beam of illumination including a wavelength range, wherein the workpiece is transparent to the illumination of the wavelength range.

28. The method of claim 27, wherein the illumination comprises infrared illumination.

29. The method of claim 27, wherein the illumination has a wavelength equal to or greater than 1200 nm.

30. The method of claim 25, wherein the imaging, with a camera, one or more defects within the work piece based on the collected illumination exited through the second face of work piece and the illumination blocked by the one or more defects comprises: imaging, with a line sensor of the camera, one or more defects within the work piece based on the collected illumination exited through the second face of work piece and the illumination blocked by the one or more defects

31. (canceled)

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0054] Below, the invention and its advantages will be further described with reference to the accompanying figures in which:

[0055] FIG. 1 is a prior art set-up for detecting interior defects by looking at the sides of a semiconductor device;

[0056] FIG. 2 is a schematic representation of an image obtained by the set-up shown in FIG. 1;

[0057] FIG. 3 is a prior art set-up for detecting interior defects by looking onto the top surface of a semiconductor device;

[0058] FIG. 4 is a schematic representation of an image obtained by the set-up shown in FIG. 3;

[0059] FIG. 5 is a schematic representation of an arrangement for carrying out inspection of the semiconductor device with IR illumination in side view with back-light illumination;

[0060] FIG. 6 is a schematic representation of an arrangement for carrying out inspection of the semiconductor device with IR illumination in side view with a dark field illumination;

[0061] FIG. 7 is a schematic representation of an arrangement for carrying out inspection of the semiconductor device with IR illumination in angular side view with back-light illumination;

[0062] FIG. 8 is a schematic representation of an arrangement for carrying out edge inspection of a semiconductor device with IR illumination in side view and a scanning motion of the semiconductor device;

[0063] FIG. 9 is a schematic representation of an arrangement for carrying out edge inspection of a semiconductor device with IR illumination in top view and a scanning motion of the semiconductor device;

[0064] FIG. 10 is an embodiment of an arrangement for carrying out the side view and the top view of the semiconductor device, simultaneously;

[0065] FIG. 11 is a perspective view of the arrangement for carrying out a side view of one side face of the semiconductor device;

[0066] FIG. 12 is a detailed view of an opto-mechanical integration of the side view and top view inspection of the semiconductor device;

[0067] FIG. 13A is a schematic representation of an embodiment of a linear and rotational scanning mode of the semiconductor device;

[0068] FIG. 13B is a schematic representation of an embodiment of a linear and rotational scanning mode of the semiconductor device;

[0069] FIG. 13C is a schematic representation of an embodiment of a linear and rotational scanning mode of the semiconductor device;

[0070] FIG. 13D is a schematic representation of an embodiment of a linear and rotational scanning mode of the semiconductor device;

[0071] FIG. 13E is a schematic representation of an embodiment of a linear and rotational scanning mode of the semiconductor device;

[0072] FIG. 14A is a schematic representation of an embodiment of a combined linear and rotational scanning motion of the semiconductor device;

[0073] FIG. 14B is a schematic representation of an embodiment of a combined linear and rotational scanning motion of the semiconductor device;

[0074] FIG. 14C is a schematic representation of an embodiment of a combined linear and rotational scanning motion of the semiconductor device;

[0075] FIG. 14D is a schematic representation of an embodiment of a combined linear and rotational scanning motion of the semiconductor device;

[0076] FIG. 14E is a schematic representation of an embodiment of a combined linear and rotational scanning motion of the semiconductor device; and

[0077] FIG. 14F is a schematic representation of an embodiment of a combined linear and rotational scanning motion of the semiconductor device.

DETAILED DESCRIPTION OF THE INVENTION

[0078] In the figures like reference numerals are used for like elements or elements of like function. Furthermore, for the sake of clarity, only those reference numerals are shown in the figures which are necessary for discussing the respective figure. The methods and apparatus described herein may be employed advantageously in conjunction with IR-light for defect inspection in semiconductor devices. Typically, one would use IR light to be able to penetrate through the silicon of the semiconductor device. In other embodiments of the invention the wavelength of the light source could change. The only prerequisite is that the material of the work piece (semiconductor device) under inspection must be transparent for the wavelength range used. The description below refers to semiconductor devices, which should not be understood as a limitation of the invention. As is clear for a skilled person, the principles and ideas of the present invention are applicable to any inspection of internal or side defects of work pieces. The application of the present invention to semiconductor devices should not be regarded as a limitation.

[0079] FIG. 5 shows a schematic representation of an arrangement 20 for carrying out inspection of the semiconductor device 2 with IR light 13. The arrangement 20 is in side view with back-light illumination. The IR light 13 generated by a light source 18 impinges perpendicularly on one selected side face 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 of the semiconductor device 2. It is also possible that the IR light 13 is not collimated and does not impinge perpendicularly on one selected side face 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 of the semiconductor device 2. With the arrangement 20 shown here it is possible to create images of the defects 9 by using IR light 13 that travels through the semiconductor device 2. The advantage of the use of IR light 13 is that one can find interior defects 9 and/or improve the signal to noise ratio for specific defects 9 of the semiconductor device 2.

[0080] The camera 6 looks with its lens 7 directly at one selected side face 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 of the semiconductor device 2. Because of the high refractive index of the silicon (n=3.5 for =1200 nm) and the rough side face 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 (edge) of the semiconductor device 2 device almost all the IR light 13 will enter the semiconductor device 2. While the rays of the IR light 13 will travel under small angles through the semiconductor device 2, they will exit at the opposite side face 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 as a diffuse ray 21 of light. In this way the semiconductor device 2 itself acts like a diffuse illuminator. However, when reaching an interior defect 9 or a side crack the normal light propagation is blocked resulting in a defective part in the diffuse illumination. The blocking of the IR light 13 is represented by a dashed arrow 22. The lens 7 and the camera 6 image the side face 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4, respectively and the interior defect 9 appears as a high contrast dark section in the camera image. The crack or the interior defect 9 is typically a disturbance in the silicon structure of the semiconductor device 2. At this disturbance the IR light 13 is reflected and does not propagate. Because of this, a detector 26 in the camera 6 will see no light coming through at the location of the interior defect 9.

[0081] Another embodiment of the arrangement 20 for carrying out inspection of the semiconductor device 2 with IR light 13 is shown in FIG. 6. Here, the inspection of the semiconductor device 2 is carried out with IR light 13 from the light source 18. The camera 6 with the lens 2 is arranged such that the camera 6 registers a dark field image of the respective side face 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 of the semiconductor device 2. At the second face 3.sub.2 a direction 23 of IR-light propagation is perpendicular to an optical axis 24 of the lens 7 of the camera 6.

[0082] A further embodiment of the inventive arrangement 20 is shown in FIG. 7. The IR light 13 is sent from the light source 18 to the top face 4 of the semiconductor device 2 and into the semiconductor device 2 under an angle . The IR-light 13 propagates through the semiconductor device 2 and is focused on one of the side faces 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 of the semiconductor device 2, respectively. The interior cracks or defects 9 block the IR-light 13 and change the normally diffuse illumination from one of the rough side faces 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 (see FIG. 5). The arrangement shown in FIG. 7 offers large resolution but still makes fast inspection of one of the side faces 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 of the semiconductor device 2 (here the fourth side face 3.sub.4 is inspected) possible. Every internal or side defect 9 appears bigger and higher in contrast in the image taken by camera 6 as such defects block normal internal light propagation. A diffuse IR-light 33 shining out the semiconductor device 2 has a reduced response to external contamination of semiconductor device 2 and hence increases the signal to noise ratio for the real defects 9.

[0083] As an advantageous alternative, one can move the focus of the IR-light 13 inside the semiconductor device 2, so that one can resolve interior defects 9 further away from the side faces 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 of the semiconductor device 2. Accordingly, one can even scan through the complete semiconductor device 2.

[0084] FIG. 8 shows a schematic representation of a further embodiment an arrangement 20 of the present invention. The camera 6 has a line sensor 36 and the lens 7 images a line 35 of one of the side face 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 on the line sensor 36. The camera 6 is configured as a line scan camera. The camera 6 is moved along a scan direction 37. The movement can be achieved by a relative motion between the respective side face 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 of the semiconductor device 2 and the camera 6 along the scan direction 37, which is perpendicular to the line 35 to be imaged on the line sensor 36. The relative motion between the respective side face 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 of the semiconductor device 2 and the camera 6 should not be regarded as a limitation of the invention. It is clear that also only the camera or only the semiconductor device can be moved.

[0085] The semiconductor device 2 is positioned on a X, Y, Theta-stage (not shown here). The X, Y, Theta-stage is moved such that images of all four side faces 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 are created with the line sensor 36 of the camera 6. In the embodiment shown here, the semiconductor device 2 is composed of a bulk semiconductor layer 40 (BSL), which isoptional, silicon substrate 41, a dielectric layer 42 and a metal layer 43. With the line scan camera setup high resolution images are possible which would be impossible with an area scan camera. For the side view (analog to the arrangement of FIG. 5) external IR-light 13 is shining from the light source 18 through the semiconductor device 2 (die). The IR-light 13 comes from one side face 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 of the semiconductor device 2 and is captured at the opposite side face 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 of the semiconductor device 2 by the line scan camera 6. A high-resolution image is created from each side face 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 of the semiconductor device 2. In order to shine through the semiconductor device 2, a wavelength range is used for which the semiconductor device 2 is transparent. For a typical semiconductor device 2 (or die) this will be IR light 13.

[0086] FIG. 9 shows is a schematic representation of an arrangement 20 for carrying out edge inspection of a semiconductor device 2 with IR illumination in side view and a scanning motion of the semiconductor device 2. Here the camera 6 has as well a line sensor 36 and the lens 7 images a line 35 of the top face 4 close to one of the side faces 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 on the line sensor 36. A beam splitter 27 directs the IR-light 13 from the light source 18 onto the top face 4 of the semiconductor device 2. Coaxial returning IR light 34 from the top face 4 of the semiconductor device 2 is captured by the line sensor 36 of the camera 6. Again, the movement of the semiconductor device 2 along the scan direction 37 is perpendicular to the line 35 which is imaged on the line sensor 36 of the camera 6. The movement of the semiconductor device 2 enables the creation of a top view of an edge portion 30 of the top face 4 of the semiconductor device 2 at one of the side faces 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4. In FIG. 4 the edge portion 30 of the top face 4 is adjacent to the fourth side face 3.sub.4 of the semiconductor device 2.

[0087] The embodiment shown in FIG. 10 shows an arrangement 20 for carrying out side view and top view inspection of the semiconductor device 2, simultaneously. A special optical setup 25 is provided which allows a simultaneous view on the top face 4 and one of the side faces 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 of the semiconductor device 2. This optical setup 25 also allows for illumination of the top face 4 (coaxial illumination) and for illumination of one of the side faces 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 (external illumination) of the semiconductor device 2. The two illumination modes (coaxial and external illumination) can have the same light source or individual light sources.

[0088] By combining the view on the top face 4 and one of the side faces 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 of the semiconductor device 2, the images of the top face 4 and the side faces 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 contain much more information in order to extract the exact location and origin of the defects. By integration on a moving stage setup, high speed inspection can still be obtained although with two high resolution views.

[0089] Through the arrangement 20 and the special optical setup 25, as shown in FIG. 10, it is possible to create a simultaneous view of the edge portion 30 (see FIG. 9) of the top face 4 and one side face 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 of the semiconductor device 2. Additionally, two individual line sensors 36 are provided. One is used for capturing the image of a portion of the top face 4 and the other is used to capture an image of one of the side faces 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 which is neighboring the top face 4.

[0090] According to the embodiment shown here, light guides 50 are used for transporting the IR-light 13. The light guides 50 are positioned as close as possible to the semiconductor device 2 in order to illuminate the edge portion 30 of the top face 4 and one of neighboring the side faces 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 with the IR-light 13.

[0091] FIG. 11 shows a perspective view of the apparatus for carrying out a side view of at least one of the side faces 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 of the semiconductor device 2. The semiconductor device 2 (not shown here) is placed on a hold with a chuck 45. The chuck 45 is mounted on a theta stage 38, which can be moved linearly at least in the X-coordinate direction X and the Y-coordinate direction Y. In addition, a tilt is possible as well. A linear movement in the Z-coordinate direction Z can be integrated as well. A light source 18 directs the illumination light 13 to the semiconductor device 2 on the chuck 45. In the embodiment shown here, the light source 18 is arranged such that one side face 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 of the semiconductor device 2 is illuminated. The arrangement of the light source 18 is called backlight arrangement.

[0092] Opposite the light source 18 the arrangement 20 with the optical setup 25 is arranged in order to receive the light exiting one side face 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 of the semiconductor device 2 which is opposite the illuminated side face 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 of the semiconductor device 2. The optical setup 25 is positioned at the front end 39 of the arrangement 20. The arrangement 20 is connected to a computer 32 which receives the image data from the arrangement 20. Additionally, the computer 32 is connected to a control 31 for moving the stage 38, so that the respective side face 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 is scanned by the arrangement 20.

[0093] A detailed view of the optical setup 25 of the arrangement 20 is shown in FIG. 12. The optical setup 25 allows a simultaneous side view and top view inspection of the semiconductor device 2. In the embodiment shown here the optical setup 25 generates simultaneously an image of a line of light exiting a side face 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 of the semiconductor device 2 and an image of a line of light from at least a portion of a top face 4 of the semiconductor device 2. As already previously described the line of light from a top face 4 is positioned adjacent to the line of light of the respective side face 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 of the semiconductor device 2. A front end 39 of the optical setup 25 carries a top mirror 51, a first bottom mirror 52, and a second bottom mirror 53. The top mirror 51 captures an image of the line of light from a portion of the top face 4 of the semiconductor device 2. The first bottom mirror 52 and the second bottom mirror 53 are arranged such at the front end 39 of the optical setup 25 that they can capture an image of a line of light exiting from a side face of the semiconductor device 2. The optical setup 25 is designed such that the image of a line of light, exiting from a side face 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 of the semiconductor device 2 and the image of a line of light from a top face 4 of the semiconductor device 2 are simultaneously in focus. The optical light coupling is in such a way that an optical path 54 via the top mirror 51 and an optical path 55 via first bottom mirror 52 and second bottom mirror 53 can be lighted separately.

[0094] The process to inspect the four side faces 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 and/or the edge portion 30 of the top face 4 is shown in FIGS. 13A to 13E. In case one inspects the four side faces 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 and the edge portion 30 of the top face 4 neighboring the respective side face 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 one gets a combined side and top view image. The stage 38 carries out a motion profile as described in the embodiment of FIG. 13A to 13E. In FIG. 13A the semiconductor device 2 is placed on the stage 38. As described above the semiconductor device 2 can be held as well by a chuck (not shown here), which itself is mounted on the stage 38 (theta stage).

[0095] In FIG. 13B the first side face 3.sub.1 is parallel to an image plane 44 of the camera 6. A linear, relative movement 46 is carried out between the stage 38 with the semiconductor device 2 and the camera 6. During the movement 46 the image plane 44 of the camera 6 remains parallel to the first side face 3.sub.1. After the scanning of the first side face 3.sub.1 is finalized, the stage 38 is rotated by 90 in the clockwise direction, so that the second side face 3.sub.2 of the semiconductor device 2 is parallel to the image plane 44 of the camera 6 (see FIG. 13C). As shown in FIG. 13C an opposite, linear, relative movement 46 is carried out between the stage 38 with the semiconductor device 2 and the camera 6. During the movement 46 the image plane 44 of the camera 6 is parallel to the second side face 3.sub.2. After the scanning of the second side face 3.sub.2 is finalized, the stage 38 is rotated by 90 so that the third side face 3.sub.3 of the semiconductor device 2 is parallel to the image plane 44 of the camera 6 (see FIG. 13D). As shown in FIG. 13D a linear, relative movement 46 is carried out between the stage 38 with the semiconductor device 2 and the camera 6. During the movement 46 the image plane 44 of the camera 6 is parallel to the third side face 3.sub.3. After the scanning of the third side face 3.sub.3 is finalized, the stage 38 is rotated by 90 so that the fourth side face 3.sub.4 of the semiconductor device 2 is parallel to the image plane 44 of the camera 6 (see FIG. 13E). As shown in FIG. 13E, an opposite, linear, relative movement 46 is carried out between the stage 38 with the semiconductor device 2 and the camera 6. During the movement 46 the image plane 44 of the camera 6 is parallel to the fourth side face 3.sub.4.

[0096] As described above, the arrangement 20 and special optical setup 25 enable as well image capture of an edge portion 30 of the top face 4 of the semiconductor device 2, wherein the edge portion 30 (see FIG. 9) of the top face 4 is adjacent the respective side face 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 of the semiconductor device 2.

[0097] An additional embodiment of the process for scanning at least the four side faces 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 of the semiconductor device 2 is shown in FIGS. 14A to 14F. The movement of the stage (not shown here) and the semiconductor device 2, respectively, is composed of a rotational movement 56 around the center 58 of the semiconductor device 2 and a linear movement 57 of the semiconductor device 2 in the X/Y-plane, defined by the X-coordinate direction X and the Y-coordinate direction Y. FIG. 14A shows the starting point of the process to scan the four side faces 3.sub.1, 3.sub.2, 3.sub.3 or 3.sub.4 of the semiconductor device 2. A focus point 59 of the camera (not shown here) is on the first side face 3.sub.1. FIG. 14B shows the beginning of the rotational movement 56. The center 58 of the semiconductor device 2 is subjected to the movement 57 in the X/Y-plane simultaneously, so that the focus point 59 remains on the first side face 3.sub.1 during the rotational movement 56. FIGS. 14C to 14E show various stages of the rotational movement 56 of the semiconductor device 2, wherein the focus point 59 remains on the second side face 3.sub.2 during the rotational movement 56. FIG. 14F shows the situation that the focus point 59 has reached the third side face 3.sub.3 and is kept on the third side face 3.sub.3 during the rotational movement 56 of the semiconductor device 2.

[0098] The computer 32, as shown in FIG. 11, coordinates the rotational movement 56 and the simultaneous movement 57 in the X/Y-plane, so that after a rotation of 360 of the semiconductor device 2 all four side faces 3.sub.1, 3.sub.2, 3.sub.3 and 3.sub.4 have been imaged by the arrangement 20. Furthermore, the computer 32 makes sure that the focus point 59 is maintained on all four side faces 3.sub.1, 3.sub.2, 3.sub.3 and 3.sub.4 during the full 360 rotation, so that a high-quality image of all four side faces 3.sub.1, 3.sub.2, 3.sub.3 and 3.sub.4 is obtained.

[0099] It is believed that the apparatus, the method and computer program of the present disclosure and many of its attendant advantages will be understood by the foregoing description, and it will be apparent that various changes may be made in the form, construction and arrangement of the components without departing from the disclosed subject matter or without sacrificing all of its material advantages. The form described is merely explanatory.

[0100] In the above description, numerous specific details are given to provide a thorough understanding of embodiments of the invention. However, the above description of illustrated embodiments of the invention is not intended to be exhaustive or to limit the invention to the precise forms disclosed. One skilled in the relevant art will recognize that the invention can be practiced without one or more of the specific details, or with other methods, components, etc. In other instances, well-known structures or operations are not shown or described in detail to avoid obscuring aspects of the invention. While specific embodiments of, and examples for, the invention are described herein for illustrative purposes, various equivalent modifications are possible within the scope of the invention, as those skilled in the relevant art will recognize.

[0101] These modifications can be made to the invention in light of the above detailed description. The terms used in the following claims should not be construed to limit the invention to the specific embodiments disclosed in the specification and the claims. Rather, the scope of the invention is to be determined by the following claims, which are to be construed in accordance with established doctrines of claim interpretation.

LIST OF REFERENCE NUMERALS

[0102] 2 work piece, semiconductor device [0103] 3.sub.1 first side face [0104] 3.sub.2 second side face [0105] 3.sub.3 third side face [0106] 3.sub.4 fourth side face [0107] 4 top face [0108] 5 bottom face [0109] 6 camera [0110] 7 lens [0111] 8 mirror [0112] 9 defect, interior defect [0113] 10 image [0114] 11 optical length [0115] 12 optical length [0116] 13 IR light, illumination light [0117] 14 optics [0118] 15 returning IR-light [0119] 16 schematic image [0120] 18 light source [0121] 19 defect [0122] 20 arrangement [0123] 21 diffuse ray [0124] 22 dashed arrow [0125] 23 direction of light propagation [0126] 24 optical axis [0127] 25 special optical setup [0128] 26 detector [0129] 27 beam splitter [0130] 30 edge portion [0131] 31 control [0132] 32 computer [0133] 33 diffuse IR-light [0134] 34 returning IR-light [0135] 35 line [0136] 36 line sensor [0137] 37 scan direction [0138] 38 stage, theta stage [0139] 39 front end [0140] 40 bulk semiconductor layer [0141] 41 silicon substrate [0142] 42 dielectric layer [0143] 43 metal layer [0144] 44 image plane [0145] 45 chuck [0146] 46 linear relative movement [0147] 50 light guide [0148] 51 top mirror [0149] 52 first bottom mirror [0150] 53 second bottom mirror [0151] 54 optical path [0152] 55 optical path [0153] 56 rotational movement (Vorsicht in FIG. 10) [0154] 57 movement [0155] 58 center [0156] 59 focus point [0157] X X-coordinate direction [0158] Y Y-coordinate direction [0159] Z Z-coordinate direction [0160] angle