Multilayer diamond display system and method
10897028 ยท 2021-01-19
Inventors
Cpc classification
H01L31/0232
ELECTRICITY
H10K50/86
ELECTRICITY
H01L21/02115
ELECTRICITY
Y02E10/549
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
International classification
H01L21/02
ELECTRICITY
H01L31/0232
ELECTRICITY
Abstract
Disclosed herein is a transparent glass system that includes an optical grade silicon substrate, a transparent substrate layer; a titanium dioxide transparent layer, the transparent layer having an index of refraction of 2.35 or greater; and a polycrystalline diamond layer, wherein the transparent layer is between the substrate layer and the polycrystalline diamond layer.
Claims
1. A multilayer diamond display system, comprising: a transparent substrate layer; a titanium dioxide transparent layer, the titanium dioxide transparent layer having an index of refraction of 2.35 or greater; a fused silica and titanium dioxide layer between the transparent substrate layer and the titanium dioxide transparent layer; and a polycrystalline diamond layer, wherein the titanium dioxide transparent layer is between the transparent substrate layer and the polycrystalline diamond layer.
2. The system of claim 1, wherein the transparent substrate layer is fused silica.
3. The system of claim 1, wherein the transparent substrate layer is a transparent metal.
4. The system of claim 1, wherein the titanium dioxide transparent layer is crystalline rutile.
5. The system of claim 1, wherein the titanium dioxide transparent layer is deposited using ion deposition.
6. The system of claim 1, wherein the polycrystalline diamond layer is nanocrystalline diamond.
7. The system of claim 1, wherein the polycrystalline diamond layer is formed using a chemical vapor deposition with wafer stage cooling.
8. The system of claim 1, where the fused silica and titanium dioxide layer is formed using a sputtered physical vapor deposition.
9. The system of claim 1, wherein the transparent substrate layer is aluminosilicate glass.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1) It is to be understood that the drawings are solely for purpose of illustration. Furthermore, the components in the figures are not necessarily to scale, emphasis instead being placed upon illustrating the principles of the system disclosed herein. In the figures, like reference numerals designate corresponding parts throughout the different views.
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DETAILED DESCRIPTION
(10) The following detailed description, which references to and incorporates the drawings, describes and illustrates one or more specific embodiments. These embodiments, offered not to limit but only to exemplify and teach, are shown and described in sufficient detail to enable those skilled in the art to practice what is claimed. Thus, for the sake of brevity, the description may omit certain information known to those of skill in the art.
(11) The system and method provided herein allow for a novel diamond based multilayer antireflective coating system and a novel method for infrared optical windows.
(12) The thin film composite layer 104 may include a transparent material with an index of refraction of 2.35 or greater. In one embodiment, titanium dioxide may be deposited on the substrate layer 102 via, for example, but not limited to, physical vapor deposition (PVD) sputtering or reactive ion deposition. In some embodiments, the first thin film layer may have an index of refraction ranging from 2.6 to 2.8. Crystalline titanium dioxide may be used in forming thin film composite layer 104. The thin film layer 104 may include lower refractive index transparent materials to favor transmission at blue, green, and red wavelength ranges. The thin film composite layer 104 may use materials optimized for operating wavelengths for blue light between 440 and 470 nm, green light between 510 and 550 nm, and red light between 600 and 640 nm wavelengths.
(13) The diamond layer 106 may be fabricated by processes including seeding with a nanocrystalline diamond solution mixture. Fabrication of the diamond layer 106 may include acid cleaning, for example, via piranha and ionic clean methods. Fabrication of the diamond layer 106 may include ultrasonic roughening to facilitate more uniform and strong cohesion of growth diamond material. Fabrication of the diamond layer 106 may include chemical vapor deposition techniques, such as, but not limited to Hot Filament and Microwave Plasma methods. In one embodiment, nanocrystalline diamond materials may be formed under vacuum conditions using Methane, Hydrogen, and Argon gas.
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(15) Method 200 may include a step 204 of depositing a thin film layer, such as, but not limited to thin film composite layer 104. Method 200 may include a step 206 of cleaning a seeding where the surface of the substrate may be acid cleaned, for example, via piranha and ionic clean methods, and ultrasonically roughened to facilitate more uniform and strong cohesion of growth diamond material. In step 206, the substrate may be seeded with a nanocrystalline diamond solution mixture.
(16) Method 200 may include a step 208 of exposing the substrate to gas. Step 208 may include a cooled substrate wafer stage to maintain temperatures at or below 500 degrees Celsius allowing multilayer integration without exceeding stress, softening, and strain limitations of the underlying material layers. The diamond growth process energy is substantially derived from thermally activated filament sources or microwave activated plasma sources. Method 200 may include a step 210 of finishing a multiplayer diamond display system. Step 210 may include surface treatment, surface polishing, and packaging.
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(18) The first thin film composite layer 304 may include fused silica and titanium dioxide producing a refractive index of about 1.75. The titanium dioxide layer 308 may have a refractive index values in the range of 2.6 to 2.8, but with a minimum value of 2.35. The diamond top layer 310 may be formed as described in regard to diamond layer 106.
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(23) The multilayer diamond display system described, and method 200, may incorporate systems and methods previously disclosed and described in U.S. Patent Publication No. 2013/0026492, by Adam Khan, published on Jan. 31, 2013; U.S. Pat. No. 8,354,290, issued to Anirudha Sumant, et al, on Jan. 15, 2013; U.S. Pat. No. 8,933,462, issued to Adam Khan on Jan. 13, 2015; U.S. Patent Publication No. 2015/0206749, by Adam Khan, published on Jul. 23, 2015; and U.S. Patent Publication No. 2015/0295134, by Adam Khan, et al, published on Oct. 15, 2015, all of which are fully incorporated herein by reference.
(24) This disclosure provides several preferred embodiments of fabrication, however, the performance characteristics and materials characteristics described in this application are not necessarily performance bounds or limitations of the invention. These disclosures merely demonstrate some aspects of the invention that have presently been tested.
(25) The word exemplary is used herein to mean serving as an example, instance, or illustration. Any embodiment or variant described herein as exemplary is not necessarily to be construed as preferred or advantageous over other embodiments or variants. All of the embodiments and variants described in this description are exemplary embodiments and variants provided to enable persons skilled in the art to make and use the invention, and not necessarily to limit the scope of legal protection afforded the appended claims.
(26) The above description of the disclosed embodiments is provided to enable any person skilled in the art to make or use that which is defined by the appended claims. The following claims are not intended to be limited to the disclosed embodiments. Other embodiments and modifications will readily occur to those of ordinary skill in the art in view of these teachings. Therefore, the following claims are intended to cover all such embodiments and modifications when viewed in conjunction with the above specification and accompanying drawings.