Gold nanostructures and processes for their preparation
10895013 ยท 2021-01-19
Assignee
Inventors
Cpc classification
C23C18/1608
CHEMISTRY; METALLURGY
C23C18/2086
CHEMISTRY; METALLURGY
C23C18/1803
CHEMISTRY; METALLURGY
C23C18/08
CHEMISTRY; METALLURGY
C23C18/1893
CHEMISTRY; METALLURGY
C23C18/1844
CHEMISTRY; METALLURGY
C23C18/2006
CHEMISTRY; METALLURGY
C23C18/54
CHEMISTRY; METALLURGY
Y10T428/249924
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10T442/109
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
International classification
C23C18/16
CHEMISTRY; METALLURGY
C23C18/08
CHEMISTRY; METALLURGY
Abstract
An electroless process for depositing gold (Au.sup.0) from a solution, comprising allowing gold (Au.sup.0) place from a solution of gold thiocyanate complex dissolved in a mixture of water-miscible organic solvent and water, or the deposition of gold (Au.sup.0) takes place on a deposition-directing layer comprising positively charged organic groups, said layer being provided on at least a portion of a surface of a substrate sought to be gold-coated.
Claims
1. An electroless process for depositing gold from a solution, comprising providing a solution of a source of of gold thiocyanate complex comprising M.sup.+[Au(SCN).sub.4].sup.1, or M.sub.+[Au(SCN).sub.2].sup.1, wherein M is a metal, and combinations thereof, and subjecting a substrate sought to be gold-plated to said solution to deposit Au.sup.0 from said solution, wherein said deposition is a spontaneous reduction of gold of said complex by thiocyanate carried out in the absence of an auxiliary reducing agent, further wherein 1) said solution is said gold thiocyanate complex dissolved in a mixture of water-miscible organic solvent and water, and said spontaneous reduction occurring upon evaporation of said solution, or 2) at least a portion of said surface comprises a deposition-directing layer comprising positively charged non-metallic groups.
2. A process according to claim 1, wherein said gold thiocyanate complex dissolved in a said mixture of water-miscible organic solvent and water is [Au(SCN).sub.4].sup.1, and wherein said process comprising crystallizing Au.sup.0 wires from said solution.
3. A process according to claim 2, wherein the crystallization is induced by gradually removing the solvent mixture.
4. A process according to claim 3, wherein the gradual solvent removal is achieved by allowing the solvent mixture to evaporate slowly.
5. A process according to claim 2, wherein the Au.sup.0 wires contain Au.sup.3+ compound.
6. A process according to claim 5, further comprising the step of subjecting the wires to a reductive environment, increasing the content of Au0 in the wires.
7. A process of claim 2, wherein the water-miscible organic solvent is aprotic solvent.
8. A process according to claim 7, wherein the solvent is dimethyl sulfoxide.
9. A process according to claim 1, wherein said Au.sup.0 deposition takes place onto said deposition-directing layer upon contacting said gold thiocyanate complex, with said deposition-directing layer.
10. A process according to claim 9, wherein the positively charged non-metallic groups are organic groups.
11. A process according to claim 10, wherein the positively charged organic groups include positively charged amine groups.
12. A process according to claim 9, wherein the substrate is either planar or curved, non-metallic substrate.
13. A process according to claim 9, further comprising a step of enhancing the electrical conductivity of the film.
14. A process according to claim 13, comprising one or more of the following steps: (i) subjecting the film to a reductive environment, thereby increasing the content of Au.sup.0 in the film; (ii) treating the film with a conductive polymer.
15. An electroless process for depositing gold from a solution comprising providing a solution of a source of gold thiocyanate complex selected from the group consisting of M.sup.+[Au(SCN).sub.4].sup.1, M.sup.+[Au(SCN).sub.2].sup.1, wherein M is a metal, and combinations thereof, and and subjecting a substrate sought to be gold-plated to said solution to deposit Au.sup. from said solution, wherein said deposition is a spontaneous reduction of gold of said complex by thiocyanate carried out in the absence of an auxiliary reducing agent, and further wherein said solution is said gold thiocyanate complex dissolved in a mixture of water-miscible organic solvent and water, and said spontaneous reduction occurring upon evaporation of said solution.
16. An electroless process for depositing gold from a solution onto a substrate, comprising providing a solution of of a source of gold thiocyanate complex selected from the group consisting of M.sup.+[Au(SCN).sub.4].sup.1, M.sup.+[Au(SCN).sub.2].sup.1, wherein M is a metal, and combinations thereof, and subjecting a substrate sought to be gold-plated to said solution to deposit Au.sup.0 from said solution, wherein said deposition is a spontaneous reduction of gold of said complex by thiocyanate carried out in the absence of an auxiliary reducing agent upon evaporation of said solution, and further wherein at least a portion of said surface comprises a deposition-directing layer comprising positively charged non-metallic groups upon evaporation of said solution.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1)
(2)
(3)
(4)
(5)
(6)
(7)
(8)
(9)
(10)
(11)
(12)
(13)
(14)
(15)
(16)
(17)
(18)
EXAMPLES
Methods
(19) Scanning Electron Microscopy (SEM):
(20) (i) For SEM images, gold nano-ribbons were grown on silicon, with thermal oxide layer of 100 nm, the wafer being modified with a 3-aminopropyltriethoxy silane self-assembled monolayer. SEM images were recorded using JEOL JSM-7400F Scanning Electron Microscope (JEOL LTD, Tokyo, Japan). (ii) For SEM images, 20 L of a 24 h incubated solution of KAu(SCN).sub.4 (24 mg mL.sup.1) was drop cast on a silicon piece (2.5*1.0 cm.sup.2) and the solvent was left to evaporate at room temperature. SEM images were recorded on a JEOL JSM-7400F Scanning Electron Microscope (JEOL LTD, Tokyo, Japan) at an acceleration voltage of 3 kV.
(21) High Resolution Transmission Electron Microscopy (HRTEM):
(22) samples were prepared as follows. Dodecylamine films, compressed to surface pressure of 25 mN/m, on a Langmuir trough at 20 C. were transferred horizontally onto 400 mesh copper formvar/carbon grids (Electron Microscope Sciences, Hatfield, Pa., USA). The grids were allowed to float on solution of Au(SCN).sub.2.sup.1 for 1 h after which the sample left to dry and were plasma cleaned prior to analysis. HRTEM images were recorded on a 200 kV JEOL JEM-2100F. SEM analysis of grid left for 24 hours in the same solution was done to confirm the formation of nanoribbons.
(23) Powder X-Ray Diffraction (XRD):
(24) XRD patterns were obtained using Panalytical Empyrean Powder Diffractometer equipped with a parabolic mirror on incident beam providing quasi-monochromatic Cu K radiation (=1.54059 ) and X'Celerator linear detector. Data were collected in the grazing geometry with constant incident beam angle equal to 1 in a 2 range of 10-80 with a step equal to 0.05.
(25) X-Ray Photoelectron Spectroscopy (XPS):
(26) XPS analysis was carried out using Thermo Fisher ESCALAB 250 instrument with a basic pressure of 2.Math.10.sup.9 mbar. The samples were irradiated in 2 different areas using monochromatic Al K, 1486.6 eV X-rays, using a beam size of 500 m. The high energy resolution measurements were performed with pass energy of 20 eV. The core level binding energies of the Au4f peaks were normalized by setting the binding energy for the C1s at 284.8 eV.
(27) Infrared Measurements:
(28) IR measurements were done in the following way: a solution of Au(SCN).sub.4.sup.1 was placed to incubate in 25 C. for 72 h to get oxidation of thiocyanate. After 72 h the solution was separated from the precipitation (solid gold) by filtration and solid Ba(NO.sub.3).sub.2 was added in excess to the solution for the formation of BaSO.sub.4. The solution was centrifuge and the precipitation was placed on a silicon wafer and left to dry in room temperature prior to analysis. Control samples were prepared by adding Ba(NO.sub.3).sub.2 to 2 M H.sub.2SO.sub.4 solution and 2 M KSCN solution. The solution with KSCN shows no precipitation. The H.sub.2SO.sub.4 with add Ba(NO.sub.3).sub.2 was centrifuge and the precipitation was placed on a silicon wafer and left to dry prior to analysis. The data was recorded by FTIR microscopy, Nicolet iN10.
(29) Atomic Force Microscopy (AFM):
(30) AFM measurements were performed at ambient conditions using a Digital Instrument Dimension3100 mounted on an active anti-vibration table. A scratch on the deposited gold was made and the height difference on the edge of the scratch was measured. A second scratch perpendicular to the first was done in order to check that the scratch removed only the gold thin film and did not harm the surface of the substrate.
(31) UV-vis spectra (i.e. Plasmon transmittance) were recorded using a JASCO V-550 UV-vis spectrophotometer.
(32) Conductivity measurements were conducted as follows: a 10 nm layer of chromium follow by a 90 nm of gold was deposited on glass surface with gold thin film, using thermal evaporation, in order to create electrodes. The evaporation was done selectively using a mask with desirable gaps (100 m). Room temperature electrical measurements were carried out in a two-probe configuration using a probe-station equipped with a Keithley 4200SCS semiconductor parameter analyzer.
Example 1
Preparation and Characterization of Gold Nanowires
(33) 1 mL of HAuCl.sub.4.3H.sub.2O dissolved in water (24 mg mL.sup.1) was added to mL aqueous solution of KSCN (60 mg mL.sup.1). The precipitate formed was separated by centrifugation at 4000 g for 10 min in order to separate the complex from the solution which contains KCl and excess of KSCN. The precipitate was dried and dissolved in 2 mL mixture of DMSO and water (4:1 v:v). The solution was left to incubate for 24 h after which 100 L, of solution was drop cast on a 1.0 cm*2.5 cm, ozone exposed glass slide, and left to evaporate at room temperature.
(34) The glass was inserted to a plasma cleaner, PDC-32G, Harrick Plasma, and the vacuum pump was turned on and work for 90 s. After 90 s the sample was exposed to plasma, at high RF (18 W), for 3 min, effectively reducing Au.sup.3+ to Au.sup.0.
(35) SEM image shown in
(36) The X-ray powder diffraction patterns of the wires, before and after the reduction step, are presented in
(37) The essentially metallic, glass-supported film consisting of gold nanowires was also tested to determine its optical and electrical properties.
(38) Optical transmittance: UV-Vis transmittance measurements in the range of 300-900 nm were conducted on a Carla 5000, Varian Analytical Instruments, Melbourne.
(39) Electrical conductivity: Cr and Au electrodes were thermally evaporated on glass substrate onto which the Au film was deposited. Each electrode consisted of 10 nm thick Cr layer, and on top of it 90 nm thick Au layer. The length and width of each Cr/Au electrode were 100 m100 m. In one experiment, the electrodes were spaced 100 m apart and in another experiment, the electrodes were spaced 1 mm apart, with the gold film being deposited in the spacing between the electrodes. Room temperature conductivity measurements were carried out in a two-probe configuration using a probe-station equipped with a Keithley 2400 SMU, and the current passing through the wires across the electrodes was measured. Data is presented in the form of current/voltage curves shown in
Example 2
Preparation of Gold Nanowires
(40) 14 mg KAu(SCN).sub.4 was dissolved in 2 mL of DMF and water (4:1 v:v). The solution was left to incubate for 24 h after which 20 L of solution was drop cast on a 1.0 cm*2.5 cm, ozone exposed glass slide, and left to evaporate at room temperature. SEM images were recorded on a JEOL JSM-7400F Scanning Electron Microscope (JEOL LTD, Tokyo, Japan) at an acceleration voltage of 3 kV. The SEM image shown in
Example 3
Self-Assembly of Gold Nanowires
(41) 14 mg KAu(SCN)4 was dissolved in 2 mL of THF and water (4:1 v:v). The solution was left to incubate for 24 h after which 20 L of solution was drop cast on a 1.0 cm*2.5 cm, ozone exposed glass slide, and left to evaporate at room temperature. SEM images were recorded on a JEOL JSM-7400F Scanning Electron Microscope (JEOL LTD, Tokyo, Japan) at an acceleration voltage of 3 kV. The SEM image shown in
Example 4
Self-Assembly of Gold Nano-Wires
(42) 14 mg KAu(SCN)4 was dissolved in 2 mL of ethylene glycol and water (4:1 v:v). The solution was left to incubate for 24 h after which 20 L of solution was drop cast on a 1.0 cm*2.5 cm, ozone exposed glass slide, and left to evaporate at room temperature. SEM images were recorded on a JEOL JSM-7400F Scanning Electron Microscope (JEOL LTD, Tokyo, Japan) at an acceleration voltage of 3 kV. The SEM image shown in
Example 5
Deposition of a Gold Film on Amino-Functionalized Substrate and Characterization of the Film
(43) Glass or silicon wafers with an amine terminal group deposition-directing layer were prepared as follows: The substrates were in a 70 C. piranha solution, 70% concentrated sulfuric acid and 30% hydrogen peroxide, for 30 min and another 30 min under sonication. The substrates were then rinsed with double distilled water and dried with compressed air stream. The dried substrates were immersed in a 1% (volume) of 3-aminopropyltriethoxy silane in heptane solution for 1 h which after the substrates were rinsed in cyclohexane and were left to dry prior to use. Silicon substrates were put in ozone oven for 30 min prior to the immersion in the amino silane solution. Patterned substrates were prepared by placing a mask on the substrate and exposing it to plasma for 1 min.
(44) Au(SCN).sub.4.sup.1 complex was prepared as follows: 1 mL of HAuCl.sub.4.3H.sub.2O in water (24 mg/mL) was added to a 1 mL solution of KSCN in water (60 mg/mL). The precipitation formed was separated by centrifuge (4000 g) for 10 min. X-ray photoelectron spectroscopy (XPS) analysis was done to confirm the existence of the complex.
(45) Thin gold films were prepared as follows: The Au(SCN).sub.4.sup.1 (gold complex was transferred to 40 mL of water and sonicated in a sonication bath for 30 minutes. At this stage, the Au(SCN).sub.2.sup.1 complex is spontaneously formed. The concentration of the Au(SCN).sub.2.sup.1 complex was 1.5 mM. The substrate was inserted to the solution for 60 hours at 4 C. The substrate was oriented perpendicular to the ground, in order to prevent the fall of pre-formed aggregates on the substrate surface due to gravity. After 60 hours, the samples were rinsed with water and left to dry at room temperature.
(46) The so formed gold film deposited on the amino-functionalized substrate was investigated and characterized as follows.
(47) The morphology of the surface-deposited pattern was examined by scanning electron microscopy (SEM).
(48) The SEM image of the resultant gold thin film in
(49) The thickness of the deposited gold was determined by AFM (
(50) To evaluate the gold species deposited upon the amine-displaying surface, we carried out x-ray photoelectron spectroscopy (XPS) experiments at different incubation times (
(51) TABLE-US-00001 TABLE 1 Au species over time (based on data of FIG. 11) Time (h) Au(I) Au(0) 1 0.27 0.73 2 0.19 0.81 4 0.24 0.76 60 0.24 0.76
(52) This result indicates that spontaneous reduction of the gold thiocyanate complex occurs rapidly following binding and crystallization at the amine-functionalized surface. In order to further confirm that a reduction/oxidation reaction had taken place during incubation, we analyzed the used gold thiocyanate solution following incubation for oxidation residue by treating the used solution with Ba(NO.sub.3).sub.2 and assaying for the formation of BaSO.sub.4. We found that the used gold thiocyanate solution had significantly higher levels of oxidation residue compared to controls, which, as expected, contained no oxidation residues (data not shown).
(53) As the XPS data point to rapid reduction of Au(I) to Au(0), one needs to determine whether the nano-ribbon gold structures (visualized in
(54) To analyze the molecular structures and crystallinity of the gold nanostructures we applied high resolution transmission electron microscopy (HRTEM,
(55)
(56)
(57) Both physical properties are related to the configuration of the gold structures. Specifically, the protruding orientation of the nano-ribbons and resultant large empty surface areas enables optical transparency. Similarly, conductivity depends upon the interface/contact between the individual gold nanostructures.
Example 6
Deposition of a Gold Film on Amino-Functionalized Substrate
(58) Transmission electron microscopy (TEM) grids (400 mesh copper formvar/carbon grids; Electron Microscope Sciences, Hatfield, Pa., USA) with amine-rich peptide deposition-directing layer were prepared as follows: A solution of proline-(lysine-phenylalanine).sub.5-lysine-proline (PKFKFKFKFKFKP) peptide in methanol/chloroform (1:9 v/v) was prepared at a concentration of approximately 0.1 mg/mL. An appropriate amount of the peptide solution was spread over a KCl (1 M) subphase in a Langmuir trough (KSV minitrough). Following evaporation of the methanol/chloroform solvent, the barriers of the trough were compressed at a rate of 4 mm/min. The surface pressure-area isotherm was recorded and was stopped at the required surface pressure. A monolayer of the peptides was transferred to the TEM grids at the desired surface pressure using the Langmuir-Schaefer method.
(59) Gold growth over the peptide-treated TEM grids: For gold crystallization over the peptides, the TEM grids were kept floating over an aqueous solution of K[Au(SCN).sub.2] (pH5.5). After the desired duration of incubation in the gold complex solution, the grids were taken out and floated over deionized water to remove the unbound moieties and unreacted reagents. Samples were analyzed after drying.
(60)
Example 7
Deposition of a Gold Film on Amino-Functionalized Substrate
(61) The above method of spontaneous gold thin film deposition may be conducted on a variety of substrates.
Example 8
Deposition of Gold Films on Amino-Functionalized Planar and Non-Planar Substrates and Characterization of the Films
(62) Planar PDMS samples were prepared as per the instructions provided by the supplier (Sylgard 184 kit, including monomer and curing agent, was purchased from Dow Corning). The monomer and curing agent were mixed in a ratio 10:1 and cured at 70 C. for 2 hours on a hydrophobic surface. After curing, samples were peeled off from the supporting surface.
(63) Wrinkled PDMS was made using a reported procedure [Lee et al., Adv. Mater 25, p. 2162 (2013)]. Briefly, PDMS films were initially prepared by mixing the elastomer and curing agent in a ratio of 20:1. These PDMS films were then mechanically pulled with uniaxial strain in a custom-made device and kept in an UVO oven for 40 minutes. Wrinkles were produced on the PDMS surface after releasing of the strain.
(64) Amine modification of the PDMS surfaces was carried out as follows. The PDMS surfaces were first treated in plasma for 3 min and subsequently immersed in a solution containing ethanol, water and 3-aminopropyl triethoxy silane (APTES) in a ratio of 200:20:1 (v/v/v) for 2 hours. Following this treatment, the substrates were washed consecutively with ethanol and water and then dried in flow of compressed air.
(65) KAu(SCN).sub.4 complex was prepared as described in the foregoing examples. 1 mL aqueous solution of HAuCl.sub.4.3H.sub.2O (24 mg.Math.mL.sup.1) was added to 1 mL solution of KSCN in water (60 mg.Math.mL.sup.1). The precipitate formed was separated by centrifugation at 4000 g for 10 min. The supernatant was decanted and the residue was dried in room temperature.
(66) Growth of Au films on PDMS substrates was accomplished as follows (the same procedure was used for gold film formation upon both the planar and wrinkled PDMS surfaces. Aqueous solutions of Au(SCN).sub.4.sup.1 (0.7 mg.Math.mL.sup.1) was prepared in slightly acidic water (pH5.5) and the amine-modified PDMS substrates were vertically immersed in the solution and kept at 4 C. for 3 days. After the gold growth was completed, the substrates were taken out of the growth solution and washed thoroughly with water for removing unreacted materials, and subsequently dried in room temperature.
(67) Au/PDMS samples were treated in plasma for 40 to ensure complete reduction of the gold layer. 50 L of a 1:2 v/v dispersion of poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) [PEDOT:PSS] in isopropanol was then dropped over the substrate and spin-coated for 1 minute at 1000 rpm.
(68) The so formed gold films were investigated and characterized as follows.
(69) The morphology of the surface-deposited pattern was examined by scanning electron microscopy (SEM). The SEM images in
(70) Chemical species and crystalline properties of the Au films grown at the PDMS surface was carried out through application of X-ray photoelectron spectroscopy (XPS) and powder x-ray diffraction (XRD) (
(71)
(72) To further test the feasibility of the process of the invention for achieving conductivity in flexible, bent surface configurations, we examined the effect of mechanical modification of surface curvature (