DRIVE DEVICE, OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS

Abstract

A drive device comprises a drive unit, a source, a filter unit, and a determining unit.

Claims

1. A drive device configured to drive a capacitive actuator to actual an optical element of an optical system, the drive device comprising: a drive unit coupled to the capacitive actuator via a first node, the drive unit configured to apply a drive voltage to the capacitive actuator to set a position of the capacitive actuator; a source controllable by an excitation signal and coupled to the first node to feed a time-dependent AC current signal into the first node so that an AC voltage arises at the capacitive actuator due to a superposition of the drive voltage and an AC voltage corresponding to a product of the AC current signal and an impedance of the capacitive actuator; a filter unit connected to an output of the capacitive actuator and configured to filter an output signal of the capacitive actuator; and a determining unit coupled to an output of the filter unit and configured to determine an impedance behaviour of the capacitive actuator depending on the filtered output signal, the determining unit configured to output the excitation signal to drive the source.

2. The drive device of claim 1, wherein the source comprises: a signal generator controllable by the excitation signal; and a current or voltage source controllable by an output signal of the signal generator to output the time-dependent AC current signal.

3. The drive device of claim 2, wherein the determining unit is configured to determine: a transfer function of a section between the output of the signal generator and the output of the filter unit, wherein the section comprises the controlled current or voltage source, the first node, the capacitive actuator and the filter unit; an inverse of the transfer function; and the excitation signal based on the calculated inverse.

4. The drive device of claim 3, wherein the transfer function is a frequency-dependent signal transfer function of the excitation signal embodied as a time-dependent excitation voltage and of the filtered output signal embodied as a complex excitation response voltage.

5. The drive device of claim 1, wherein the filter unit is a high-pass filter to provide a high-pass-filtered output signal.

6. The drive device of claim 5, wherein: the drive device further comprises a peak-to-peak detector connected downstream of the high-pass filter and an output stage connected downstream of the peak-to-peak detector to provide at least one narrowband partial output signal; the determining unit is configured to perform a broadband determination of the impedance behaviour of the capacitive actuator on the basis of the high-pass-filtered output signal and/or to perform a narrowband determination of the impedance behaviour of the capacitive actuator on the basis of the at least one narrowband partial output signal.

7. The drive device of claim 1, wherein the determining unit is configured to generate the excitation signal depending on the determined impedance behaviour of the capacitive actuator so that the AC voltage arising at the capacitive actuator has an amplitude that is constant over the frequency.

8. The drive device of claim 7, wherein the drive device is configured to control, by open-loop or closed-loop control, the AC voltage arising at the capacitive actuator.

9. The drive device of claim 1, wherein the drive unit comprises a DC voltage source and an input resistance is connected between the DC voltage source and the first node.

10. The drive device of claim 1, wherein the source comprises a controllable voltage or current source and a coupling capacitance is connected between the voltage or current source and the first node.

11. The drive device of claim 1, wherein the drive device is configured to drive a plurality of capacitive actuators of the optical system, and an optical element of the optical system is assigned to a respective capacitive actuator.

12. The drive device of claim 11, wherein: for each respective capacitive actuator, the capacitive actuator is assigned at least one respective drive unit to apply a drive voltage to the capacitive actuator to set a position of the capacitive actuator and a respective filter unit connected to the output of the capacitive actuator to filter an output signal of the capacitive actuator; and the determining unit is coupled to the output of the respective filter unit and is configured to determine the impedance behaviour of the respective capacitive actuator depending on the respective filtered output signal and to output at its output the excitation signal for the respective capacitive actuator.

13. The drive device of claim 12, wherein: the respective first node is connectable to the source via a respective controllable switch; and the determining unit is configured, to determine the impedance behaviour of a specific capacitive actuator of the plurality of capacitive actuator, to drive the drive unit assigned to the specific capacitive actuator and the switch assigned to the specific capacitive actuator.

14. The drive device of claim 1, wherein: the source comprises: a signal generator controllable by the excitation signal; and a current or voltage source controllable by an output signal of the signal generator to output the time-dependent AC current signal; and the filter unit is a high-pass filter to provide a high-pass-filtered output signal.

15. The drive device of claim 1, wherein: the source comprises: a signal generator controllable by the excitation signal; and a current or voltage source controllable by an output signal of the signal generator to output the time-dependent AC current signal; and the determining unit is configured to generate the excitation signal depending on the determined impedance behaviour of the capacitive actuator so that the AC voltage arising at the capacitive actuator has an amplitude that is constant over the frequency.

16. The drive device of claim 1, wherein: the source comprises: a signal generator controllable by the excitation signal; and a current or voltage source controllable by an output signal of the signal generator to output the time-dependent AC current signal; and the drive unit comprises a DC voltage source and an input resistance is connected between the DC voltage source and the first node.

17. The drive device of claim 1, wherein: the source comprises: a signal generator controllable by the excitation signal; a current or voltage source controllable by an output signal of the signal generator to output the time-dependent AC current signal; and a controllable voltage or current source and a coupling capacitance is connected between the voltage or current source and the first node.

18. The drive device of claim 1, wherein: the source comprises: a signal generator controllable by the excitation signal; and a current or voltage source controllable by an output signal of the signal generator to output the time-dependent AC current signal; the drive device is configured to drive a plurality of capacitive actuators of the optical system; and an optical element of the optical system is assigned to a respective capacitive actuator.

19. An optical system, comprising: a plurality actuatable optical elements, wherein, for each actuatable optical element: the optical element is assigned a capacitive actuator; each capacitive actuator is assigned a drive device to drive the capacitive actuator; and the drive device is a drive device according to claim 1.

20. An apparatus, comprising: a plurality actuatable optical elements, wherein: the apparatus is a lithography apparatus; and for each actuatable optical element: the optical element is assigned a capacitive actuator; each capacitive actuator is assigned a drive device to drive the capacitive actuator; and the drive device is a drive device according to claim 1.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0048] FIG. 1 shows a schematic block diagram of an embodiment of a drive device for driving a capacitive actuator of an optical system;

[0049] FIG. 2 shows an equivalent circuit diagram to a first approximation of an actuator according to FIG. 1;

[0050] FIG. 3 shows a diagram for illustrating the control-voltage-dependent, electromechanical resonances of an actuator according to FIG. 1;

[0051] FIG. 4 shows a schematic block diagram of an embodiment of a drive device for driving capacitive actuators of an optical system;

[0052] FIG. 5 shows a diagram for illustrating a measurement voltage profile of the filtered output signal of an actuator according to FIG. 4;

[0053] FIG. 6 shows a diagram for illustrating a determined transfer function and the inverse thereof for generating the excitation signal according to FIG. 4;

[0054] FIG. 7 shows a diagram for illustrating an exemplary embodiment of a suitable phase profile for generating the excitation signal according to FIG. 4;

[0055] FIG. 8A shows a diagram for illustrating an exemplary embodiment of a suitable excitation signal and the AC component of the resulting response signal;

[0056] FIG. 8B shows a diagram for illustrating a further exemplary embodiment of a suitable excitation signal;

[0057] FIG. 9A shows a diagram for illustrating the theoretical impedance behaviour to be measured of an actuator according to FIG. 4 for a predefined drive voltage;

[0058] FIG. 9B shows a first diagram for illustrating an experimentally measured impedance behaviour of an actuator according to FIG. 4 for predefined drive voltages;

[0059] FIG. 9C shows a second diagram for illustrating the experimentally measured impedance behaviour of the actuator according to FIG. 4 for predefined drive voltages;

[0060] FIG. 10 shows a schematic block diagram of an embodiment of an optical system;

[0061] FIG. 11A shows a schematic view of an embodiment of an EUV lithography apparatus and

[0062] FIG. 11B shows a schematic view of an embodiment of a DUV lithography apparatus.

DETAILED DESCRIPTION

[0063] Identical elements or elements having an identical function have been provided with the same reference signs in the figures, unless indicated to the contrary. It should also be noted that the illustrations in the figures are not necessarily true to scale.

[0064] FIG. 1 shows a schematic block diagram of a first embodiment of a drive device 100 for driving a capacitive actuator 200 of an optical system 300. Examples of an optical system 300 are shown in FIGS. 10, 11A and 11B.

[0065] The actuator 200 can be, for example, a PMN actuator (PMN; lead magnesium niobate) or a PZT actuator (PZT; lead zirconate titanate). The actuator 200 is suitable for actuating an optical element 310, such as, for example, a lens element, a mirror or an adaptive mirror.

[0066] The first embodiment of the drive device 100 in accordance with FIG. 1 is also explained below with reference to FIGS. 2 and 3 and the further figures. In this case, FIG. 2 shows an equivalent circuit diagram of the actuator 200 according to FIG. 1, for example in the region of a resonance point, and FIG. 3 shows a diagram for illustrating the mechanical resonances of the actuator 200 according to FIG. 1.

[0067] The drive device 100 in FIG. 1 comprises a drive unit 110 for applying a drive voltage U.sub.DC to the actuator 200 for setting a specific position of the driven actuator 200. The drive unit 110 and the actuator 200 are coupled via a first node K1. In the example in FIG. 1, the drive unit 110 is a DC voltage source and the drive voltage U.sub.DC is a DC voltage. In this case, an input resistance R.sub.IN is connected between the DC voltage source 110 and the first node K1.

[0068] In accordance with the equivalent circuit diagram in FIG. 2, the actuator 200 can be regarded as a DC-voltage-independent RLC series circuit comprising Rs, Cs and Ls, wherein a further RLC series circuit comprising R.sub.x, C.sub.x and L.sub.x is connected in parallel with the reactive components C.sub.S and L.sub.S. In accordance with the equivalent circuit diagram in FIG. 2, L.sub.S and L.sub.x shall be lossless, ideal inductances in the simplified actuator equivalent circuit diagram in FIG. 2.

[0069] The text hereinafter demonstrates that the dynamic range of the impedance measurement and the measurement speed can be increased via the measurement architecture in FIG. 1 (and in FIG. 4) and a correspondingly chosen excitation signal s(t) (see FIG. 8A, for example).

[0070] The influence of the drive voltage U.sub.DC on the resonance points (see FIG. 3) will firstly be considered in a decoupled way, proceeding from the impedance behaviour IV to be measured (see FIG. 9) of the actuator 200. As a result of introducing the purely resistive influence—to be considered firstly in a virtual fashion—of the series resistance R.sub.s in accordance with FIG. 2 and the associated resonance manifestation, via the likewise virtual voltage-dependent series damping resistance R.sub.x it is possible to design the measurement architecture in accordance with FIG. 1, which can be used to carry out suitable impedance measurements of the actuator 200, for example in accordance with FIG. 9.

[0071] The drive device 100 in FIG. 1 furthermore has a source 120 controlled by an excitation signal s(t) and coupled to the first node K1, for feeding a time-dependent AC current signal I(t) into the first node K1 in such a way that a specific AC voltage arises at the actuator 200 as a result of the superposition of the drive voltage U.sub.DC and an AC voltage corresponding to a product of the AC current signal I(t) and the impedance Z of the actuator 200.

[0072] The source 120 in FIG. 1 comprises a signal generator 121 controlled by the excitation signal s(t), and a current or voltage source 122 controlled by the output signal AS of the controlled signal generator 121 for outputting the time-dependent AC current signal I(t). A coupling capacitance C.sub.IN for coupling to the first node K1 is connected between the current or voltage source 122 and the first node K1.

[0073] The drive device 100 in FIG. 1 further has a filter unit 130 connected to the output of the actuator 200 and serving for filtering the output signal A of the actuator 200.

[0074] A determining unit 140 is coupled to the output of the filter unit 130 and is configured to determine an impedance behaviour IV of the actuator 200 depending on the filtered output signal r(t) and to output at its output the excitation signal s(t) for driving the source 120.

[0075] For example, the determining unit 140 is configured to determine the transfer function H (see FIG. 6) of a section between the output of the signal generator 121 and the output of the filter unit 130, wherein the section comprises the controlled current or voltage source 122, the coupling capacitance C.sub.IN, the first node K1, the actuator 200 and the filter unit 130. Furthermore, the determining unit 140 is configured to determine an inverse I of the determined transfer function H (see FIG. 6). In this case, the determining unit 140 can be configured to generate the excitation signal s(t) using the calculated inverse I.

[0076] FIG. 4 shows a schematic block diagram of a second embodiment of a drive device 100 for driving capacitive actuators 200, 205 of an optical system 300.

[0077] The drive device 100 in FIG. 4 is suitable for driving a plurality N of capacitive actuators 200, 205 of the optical system 300, wherein an optical element 310 of the optical system is assigned to each actuator 200, 205 of the plurality N.

[0078] In FIG. 4, the reference sign 200 denotes the actuator i that is currently to be measured, wherein the reference sign 205 denotes the further (N-1) actuators that are currently not being measured with regard to their impedance behaviour. The actuator 200 that is respectively to be measured is selected via the switch S. A drive unit 110, a filter unit 130, a peak-to-peak detector 150 and an output stage 160 are provided for the actuator 200 to be measured.

[0079] Analogously to the reference sign 205 denoting the group of (N-1) actuators, the reference sign 115 denotes a group of drive units for the group 205 of (N-1) actuators. Correspondingly, the reference sign 135 denotes a group of filter units for the (N-1) actuators, the reference sign 155 denotes a group of peak-to-peak detectors for the (N-1) actuators 205, and the reference sign 165 denotes a group of output stages for the group of (N-1) actuators.

[0080] Therefore, the respective actuator 200, 205 is assigned a respective drive unit 110, 115 for applying a drive voltage U.sub.DC to the actuator 200, 205 for setting a specific position of the driven actuator 200, 205 and a respective filter unit 130, 135 connected to the output of the actuator 200, 205 and serving for filtering the output signal of the actuator 200, 205.

[0081] The determining unit 140 in FIG. 4 is coupled to the output of the respective filter unit 130, 135.

[0082] As already explained above, the impedance behaviour IV of the actuator i having the reference sign 200 is currently being measured in the case of the switch position of the switch S in FIG. 4.

[0083] In the example in FIG. 4, the filter unit 130 is embodied as a high-pass filter for providing a high-pass-filtered output signal r.sub.1(t). A peak-to-peak detector 150 and an output stage 160 connected downstream of the peak-to-peak detector 150 for providing at least one narrowband partial output signal r.sub.2(t) are connected downstream of the high-pass filter 130. In this case, the determining unit 140 is configured to carry out a broadband determination of the impedance behaviour IV of the actuator 200 on the basis of the high-pass-filtered output signal r.sub.1(t) and/or to carry out a narrowband determination of the impedance behaviour IV of the actuator 200 on the basis of the at least one narrowband partial output signal r.sub.2(t). In this case, the determining unit 140 samples the outputs of the high-pass filter 130 in order to obtain the signal r.sub.1(t) and the output of the output stage 160 in order to obtain the signal r.sub.2(t). Furthermore, the determining unit 140 controls the switches S, wherein the switches S assigned to the N-1 actuators 205 are not depicted in FIG. 4 for illustration reasons, and calculates the respective excitation signal s(t) for the source 120.

[0084] The determining unit 140 is embodied as an SPU (Signal Processing Unit), for example. To summarize, the determining unit 140 controls the switches S and the drive voltages U.sub.DC, calculates the excitation signals s(t) for the source 120 and samples the outputs of the high-pass filter 130 and of the output stage 160.

[0085] Overall, in the case of the drive device 100 in FIG. 4 for fast inline measurement of the impedance behaviour IV of the individual actuator 200, 205 the following measures are implemented:

[0086] 1. Dedicated inline impedance measurement with applied DC+AC voltage comprising drive voltage U.sub.DC and the AC voltage I(t)*Z. Application measurement frequencies of the order of magnitude of Hz to 100 kHz are covered here.

[0087] 2. A broadband, low-noise controllable current or voltage source 122 is used as part of the source 120.

[0088] 3. The measurement signal (amplitude response and phase response) of the current or voltage profile arising at the actuator impedance is coupled out at the outputs 130 and

[0089] 4. The measurement of the voltage dropped across the actuator 200 can be carried out either in a narrowband fashion by way of the signal r.sub.2(t) (also referred to as scanning mode, e.g. via the sinusoidal excitation signal) or else in a broadband fashion via the signal r.sub.1(t) (also referred to as IFT mode, e.g. via inverse Fourier transformation).

[0090] Referring to the equivalent circuit diagram in FIG. 2, the decoupling of the impedance alteration of the purely resistive influence—to be considered firstly in a virtual fashion—of the series resistance R.sub.s (=R.sub.S,0 in the zero voltage state) and the associated resonance manifestation is achieved via the likewise virtual control-voltage-dependent series damping resistance R.sub.x in that the actuator 200, as already explained above, is regarded as a DC-voltage-independent RLC series circuit (R.sub.s, C.sub.s and L.sub.s) (cf. FIG. 2) and the further RLC series circuit comprising R.sub.x, C.sub.x and L.sub.x is connected in parallel with the reactive components C.sub.s and L.sub.s.

[0091] Variation of R.sub.x thus simulates the DC voltage influence to a first approximation; if the resistance R.sub.x decreases (with higher U.sub.DC), the resonance is amplified; by contrast, if the resistance R.sub.x increases (with lower U.sub.DC), a lower manifestation of the resonance results. In this respect, FIG. 5 shows a diagram for illustrating a measurement voltage profile of the filtered output signal r.sub.2(t) of the actuator 200 according to FIG. 2.

[0092] The following can equivalently be formulated: An increase in the drive voltage U.sub.DC of the actuator 200 which results in a slight variation of the real R.sub.s accordingly causes a slight decrease in R.sub.x which in turn results in a strong manifestation of the resonances in the actuator 200. In this respect, FIG. 5 shows a peak value of the measurement voltage profile in the scanning mode: Amplitude measurement value in the settled state for actuator impedances without resonance (variation of the series resistance R.sub.s) in the case of a resonance (variation of the series damping resistance R.sub.x) measured at a chosen measurement frequency.

[0093] For a suitable design of the coupling capacitance C.sub.IN and of the input resistances R.sub.IN, the following may hold true:

C.sub.IN>>C.sub.s and R.sub.IN>>R.sub.s

[0094] One example in this respect: C.sub.IN≥10*C.sub.s and R.sub.IN≥N*R.sub.s for a number of N actuators, as shown in FIG. 4, in order to ensure a sufficient coupling of the excitation signal (sinusoidal or calculated by IFT).

[0095] A fast broadband image of the actuator resonances can be obtained via fast Fourier calculation (FFT; Fast Fourier Transformation) of the output signal r.sub.1(t). The maximum measurement frequency can be of the order of magnitude of MHz, such as approximately 100 kHz or less. In this case, the excitation signal s(t) is a sinusoidal signal or optionally an excitation signal calculated via inverse Fourier transformation. The IFT stimulus can be calculated from a predefined excitation frequency profile. In this case, via a suitably chosen profile, the sensitivity of the impedance measurement can be increased, for example by way of a frequency response chosen deliberately to be flat in the vicinity of a resonant frequency (cf. FIG. 3). A flat profile of the output r.sub.2(t) can be achieved e.g. by the excitation signal s(t) having an inverse excitation frequency profile with respect to the actuator impedance.

[0096] As explained above, the determining unit 140 in FIG. 4 is able to determine the impedance behaviour IV of the actuator 200 inline and rapidly, for example in real time. On the basis thereof, it is possible to implement active damping measures against the electromechanical disturbances (see FIG. 3) in the actuator resonances that arise as a result of the drive voltage U.sub.DC.

[0097] In this case, the determining unit 140 is configured for example to generate the excitation signal s(t) depending on the determined impedance behaviour IV of the actuator 200 in such a way that the AC voltage arising at the actuator 200 has an amplitude that is constant over the frequency. In this respect, FIG. 9A shows a diagram for illustrating the theoretical impedance behaviour to be measured of the actuator 200 according to FIG. 4 for a predefined drive voltage U.sub.DC. In detail, in FIG. 9A, the curve 901 shows the impedance of the actuator 200, the curve 902 shows the real resistance of the actuator and the curve 903 shows the capacitance (relative to a reference capacitance).

[0098] Thus, in order to carry out a faster measurement of all actuator resonances in the frequency range of interest, the impedance measurement architecture in accordance with FIG. 4 can be used. In this case, for example, a broadband excitation signal s(t) for each actuator of interest, here for example the actuator 200, is calculated via inverse Fourier transformation proceeding from an excitation frequency profile and is transferred to a sufficiently fast digital-to-analogue converter, accommodated in the signal generator 121, for example.

[0099] Via a fast Fourier transformation of the output signal r.sub.1(t), for each actuator with an applied drive voltage U.sub.DC in the frequency range of interest all resonance points are determined in real time:

[0100] An initial transfer function H of the section between the output of the signal generator 121 and the output of the high-pass filter 130 is determined, for example with a drive voltage U.sub.DC of 0 V or for R.sub.s=R.sub.s,0.

[0101] The inverse transfer function or inverse I (see FIG. 6) of the initial transfer function H is then calculated.

[0102] The excitation signal s(t) can then be calculated from the inverse Fourier transformation of the inverse transfer function I and a suitable phase profile Φ(f). In this respect, FIG. 7 shows an exemplary embodiment of a suitable phase profile Φ(f) for calculating the IFT excitation signal s(t).

[0103] In this respect, FIG. 8A shows a diagram for illustrating an exemplary embodiment of a suitable excitation signal s(t) and the AC component I(t)*Z(jΩ) of the resulting response signal r(t).

[0104] Moreover, FIG. 8B illustrates a diagram for illustrating a further exemplary embodiment of a suitable excitation signal s(t). FIG. 8B shows a different excitation signal s(t) by comparison with FIG. 8A. The excitation signal s(t) in FIG. 8B is based on a different phase function compared with the excitation signal s(t) in FIG. 8A. Comparison of FIGS. 8A and 8B shows that the energy in FIG. 8B is more distributed over time than in FIG. 8A. The excitation signal s(t) in FIG. 8B can also be regarded as a pseudo-noise signal and can also be used permanently during operation of the lithography apparatus.

[0105] Alternatively, it is also possible to use, instead of the inverse transfer function I with respect to the transfer function H, some other transformation of H that can cause the resonance points of the actuator 200. In this case, the phase profile Φ(f) can have any desired profile. It is also possible to use different frequency ranges for groups or subgroups of actuators 200, 205, both for excitation and for detection. Frequency-division multiplexing operation can be used for this purpose.

[0106] In this respect, FIG. 9B and FIG. 9C show diagrams for illustrating the experimentally measured impedance behaviour of the actuator 200 according to FIG. 4. As shown in FIG. 9A, the falling curve 901 represents a theoretical actuator impedance to be measured wherein the fall extends over three orders of magnitude (from 10 kΩ down to 10Ω in this exemplary embodiment). As can be gathered from the box showing an enlarged view in FIG. 9A, three very small resonance points of the actuator 200 can be seen for a drive voltage.

[0107] In this context, the impedance behaviour of an actuator 200 according to FIG. 4 was measured in an experiment for predefined drive voltages.

[0108] The measured impedance behaviour of the actuator 200 exhibits three resonance points RS1, RS2 and RS3 in FIG. 9B and in FIG. 9C. The first resonance point RS1 and the third resonance point RS3 arise for one and the same drive voltage, which can also be referred to as actuator DC voltage and is 75 volts, for example. The second resonance point RS2 at f/f.sub.REF=3.1 arises for three different drive voltages or actuator DC voltages of, for example, 50 volts, 75 volts and 100 volts. The box showing an enlarged view in FIG. 9B shows that three different peaks P1 (for a drive voltage of 100 volts), P2 (for a drive voltage of 75 volts) and P3 (for a drive voltage of 50 volts) are able to be differentiated at the resonance point RS2. The same is shown by the box showing the enlarged view in FIG. 9C and this emphasizes that at the first resonance point RS1 one peak is caused by a single actuator DC voltage and at the second resonance point RS2 three peaks P1, P2 and P3 are caused by three actuator DC voltages.

[0109] Overall, the experiment in accordance with FIG. 9B and in accordance with FIG. 9C shows how the impedance measurement values for an IFT excitation with a length of just under 50 milliseconds, for example, can be correctly mapped.

[0110] An example of a computation algorithm for the excitation signal s(t) is presented below:

[0111] U.sub.Stim(t):=s(t) shall be the output voltage of the high-pass filter 130—also the input voltage for the source 120;

[0112] U.sub.out (jω) shall be the complex excitation response voltage at the output of the high-pass filter 130;

[0113] H.sub.o (jω) shall be the frequency-dependent signal transfer function of U.sub.Stim(jω) with respect to the output signal of the high-pass filter 130;

[0114] Z.sub.Act shall be the actuator impedance;

[0115] Z.sub.o shall be a fixed, selected reference resistance (e.g. 10Ω or 50Ω);

[0116] α shall be a constant transfer factor and

[0117] U.sub.Stim,o shall be a voltage amplitude set by the SPU 140.

[0118] s(t):=U.sub.Stim(t) shall be the excitation signal. The following equations hold true in this exemplary embodiment:

[00001]$\begin{array}{cc}{U}_{\mathrm{Out}}\left(j\omega \right)=\alpha \frac{Z_{Act}\left(j\omega \right)}{Z_o}.Math.U_{\mathrm{Stim}}\left(j\omega \right),\mathrm{and}\mathrm{where}& \left(1\right)\end{array}$$\begin{array}{cc}{U}_{\mathrm{Stim}}\left(j\omega \right)=U_{\mathrm{Stim},o}.Math.H_{o1}\left(j\omega \right)\mathrm{there}\mathrm{follows}:& \left(2\right)\end{array}$$\begin{array}{cc}{U}_{\mathrm{Out}}\left(j\omega \right)=\alpha \frac{Z_o.Math.H_o\left(j\omega \right)}{Z_o}.Math.\left(U_{\mathrm{Stim},o}.Math.H_{o1}\left(j\omega \right)\right);\mathrm{and}\mathrm{where}& \left(3\right)\end{array}$$\begin{array}{cc}{H}_{o1}\left(j\omega \right)\approx H_o^{-1}\left(j\omega \right){.Math.}_{U_{DC}=0V};& \left(4\right)\end{array}$

[0119] This results in an, as shown in FIG. 9A, almost flat profile of the frequency response apart from the resonance points of the actuator 200 that are to be emphasized.

[0120] FIG. 10 shows a schematic block diagram of an embodiment of an optical system 300 comprising a plurality of actuatable optical elements 310. The optical system 300 is embodied here as a micromirror array, wherein the optical elements 310 are micromirrors. Each micromirror 310 is actuatable via an assigned actuator 200. By way of example, a respective micromirror 310 can be tilted about two axes and/or displaced in one, two, or three spatial axes via the assigned actuator 200. The reference signs only of the topmost row of these elements are depicted, for reasons of clarity.

[0121] The optical system 300 comprises a correction unit 320 configured for generating an input signal E for each of the micromirrors 310. By way of example, the optical system 300 is configured for correcting a wavefront of light in a lithography apparatus 600A, 600B (see FIGS. 6A, 6B), wherein the correction unit 320, for example, depending on a measured shape of the wavefront and a target shape of the wavefront, determines a target position of each of the micromirrors 310 and outputs a corresponding input signal E.

[0122] The respective input signal E is fed to a drive device 100 assigned to a respective actuator 200. The drive device 100 drives the respective actuator 200 for example with a filtered, amplified modulation signal fPWM. The drive device 100 has been described with reference to FIGS. 1 to 9, for example. A position of the respective micromirror 310 is thus set.

[0123] FIG. 11A shows a schematic view of an EUV lithography apparatus 600A comprising a beam-shaping and illumination system 602 and a projection system 604. In this case, EUV stands for “extreme ultraviolet” and denotes a wavelength of the working light of between 0.1 nm and 30 nm. The beam-shaping and illumination system 602 and the projection system 604 are respectively provided in a vacuum housing (not shown), wherein each vacuum housing is evacuated with the aid of an evacuation device (not shown). The vacuum housings are surrounded by a machine room (not shown), in which drive devices for mechanically moving or setting optical elements are provided. Moreover, electrical controllers and the like can also be provided in this machine room.

[0124] The EUV lithography apparatus 600A comprises an EUV light source 606A. A plasma source (or a synchrotron), which emits radiation 608A in the EUV range (extreme ultraviolet range), that is to say for example in the wavelength range of 5 nm to 20 nm, can for example be provided as the EUV light source 606A. In the beam-shaping and illumination system 602, the EUV radiation 608A is focused and the desired operating wavelength is filtered out from the EUV radiation 608A. The EUV radiation 608A generated by the EUV light source 606A has a relatively low transmissivity through air, for which reason the beam-guiding spaces in the beam-shaping and illumination system 602 and in the projection system 604 are evacuated.

[0125] The beam-shaping and illumination system 602 illustrated in FIG. 11A has five mirrors 610, 612, 614, 616, 618. After passing through the beam-shaping and illumination system 602, the EUV radiation 608A is guided onto a photomask (reticle) 620. The photomask 620 is likewise embodied as a reflective optical element and can be arranged outside the systems 602, 604. Furthermore, the EUV radiation 608 A can be directed onto the photomask 620 via a mirror 622. The photomask 620 has a structure which is imaged onto a wafer 624 or the like in a reduced fashion via the projection system 604.

[0126] The projection system 604 (also referred to as a projection lens) has five mirrors M1 to M5 for imaging the photomask 620 onto the wafer 624. In this case, individual mirrors M1 to M5 of the projection system 604 can be arranged symmetrically in relation to an optical axis 626 of the projection system 604. It should be noted that the number of mirrors M1 to M6 of the EUV lithography apparatus 600A is not restricted to the number represented. A greater or lesser number of mirrors M1 to M5 can also be provided. Furthermore, the mirrors M1 to M5 are generally curved at their front side for beam shaping.

[0127] Furthermore, the projection system 604 comprises an optical system 300 having a plurality of actuatable optical elements 310, for example the micromirror array described with reference to FIG. 10. The optical system 300 is configured for example for correcting dynamic imaging aberrations. The projection system 604 comprising the optical system 300 can be referred to as an adaptive optical unit. A resolution of the lithography apparatus 600A can thereby be increased. By way of example, depending on measured values of the wavefront of the projection light, a correction unit 320 generates an input signal E, which can comprise an individual signal for example for a respective micromirror 310. The input signal E is converted into an amplified, filtered modulation signal fPWM by the drive device 100 for a respective optical element 310, and output to the respective actuator 200 for actuating the optical element 310. The respective actuator 200 correspondingly actuates the assigned micromirror 310.

[0128] FIG. 11B shows a schematic view of a DUV lithography apparatus 600B, which comprises a beam-shaping and illumination system 602 and a projection system 604. In this case, DUV stands for “deep ultraviolet” and denotes a wavelength of the working light of between 30 nm and 250 nm. As has already been described with reference to FIG. 11A, the beam-shaping and illumination system 602 and the projection system 604 can be arranged in a vacuum housing and/or be surrounded by a machine room with corresponding drive devices.

[0129] The DUV lithography apparatus 600B has a DUV light source 606B. By way of example, an ArF excimer laser that emits radiation 608B in the DUV range at 193 nm, for example, can be provided as the DUV light source 606B.

[0130] The beam-shaping and illumination system 602 illustrated in FIG. 11B guides the DUV radiation 608B onto a photomask 620. The photomask 620 is embodied as a transmissive optical element and can be arranged outside the systems 602, 604. The photomask 620 has a structure which is imaged onto a wafer 624 or the like in a reduced fashion via the projection system 604.

[0131] The projection system 604 has a plurality of lens elements 628 and/or mirrors 630 for imaging the photomask 620 onto the wafer 624. In this case, individual lens elements 628 and/or mirrors 630 of the projection system 604 can be arranged symmetrically in relation to an optical axis 626 of the projection system 604. It should be noted that the number of lens elements 628 and mirrors 630 of the DUV lithography apparatus 600B is not restricted to the number represented. A greater or lesser number of lens elements 628 and/or mirrors 630 can also be provided. Furthermore, the mirrors 630 are generally curved at their front side for beam shaping.

[0132] Furthermore, the projection system 604 comprises an optical system 300 having a plurality of actuatable optical elements 310, for example a microlens element array, which can be constructed for example according to the micromirror array described with reference to FIG. 10, wherein microlens elements are used instead of the micromirrors. The optical system 300 is configured for example for correcting dynamic imaging aberrations. The projection system 604 comprising the optical system 300 can be referred to as an adaptive optical unit. A resolution of the lithography apparatus 600B can thereby be increased. In order to improve the imaging performance, in the present case an input signal E is predefined from outside. The input signal E comprises, for example, an individual signal for each of the microlens elements 310 of the optical system 300. The drive device 100 converts the signal contained in the input signal E for a respective microlens element 310 into an amplified, filtered modulation signal fPWM and outputs the latter to the respective actuator 200. The respective actuator 200 correspondingly actuates the assigned microlens element 310.

[0133] An air gap between the last lens element 628 and the wafer 624 may be replaced by a liquid medium 632 which has a refractive index of >1. The liquid medium 632 may be for example high-purity water. Such a construction is also referred to as immersion lithography and has an increased photolithographic resolution. The medium 632 can also be referred to as an immersion liquid.

[0134] Although the present disclosure has been described on the basis of exemplary embodiments, it is modifiable in diverse ways.

LIST OF REFERENCE SIGNS

[0135] 100 Drive device [0136] 110 Drive unit [0137] 115 Group of drive units [0138] 120 Source [0139] 121 Signal generator [0140] 122 Controlled current or voltage source [0141] 130 Filter unit [0142] 135 Group of filter units [0143] 140 Determining unit [0144] 150 Peak-to-peak detector [0145] 155 Group of peak-to-peak detectors [0146] 160 Output stage [0147] 165 Group of output stages [0148] 200 Actuator [0149] 205 Group of N-1 actuators [0150] 300 Optical system [0151] 310 Optical element [0152] 320 Correction unit [0153] 600A EUV lithography apparatus [0154] 600B DUV lithography apparatus [0155] 602 Beam-shaping and illumination system [0156] 604 Projection system [0157] 606A EUV light source [0158] 606B DUV light source [0159] 608A EUV radiation [0160] 608B DUV radiation [0161] 610 Mirror [0162] 612 Mirror [0163] 614 Mirror [0164] 616 Mirror [0165] 618 Mirror [0166] 620 Photomask [0167] 622 Mirror [0168] 624 Wafer [0169] 626 Optical axis [0170] 628 Lens element [0171] 630 Mirror [0172] 632 Medium [0173] 901 Curve [0174] 902 Curve [0175] 903 Curve [0176] A Output signal [0177] aPWM Amplified signal [0178] AS Output signal of the controlled signal generator [0179] C.sub.IN Coupling capacitance [0180] C.sub.s Capacitance [0181] C.sub.x Capacitance [0182] E Input signal [0183] f Frequency [0184] fPWM Filtered signal [0185] f.sub.REF Reference frequency [0186] H Transfer function [0187] I Inverse of the transfer function [0188] I(t) AC current signal [0189] IV Impedance behaviour [0190] K1 First node [0191] K2 Second node [0192] K3 Third node [0193] L.sub.s Inductance [0194] L.sub.x Inductance [0195] M1 Mirror [0196] M2 Mirror [0197] M3 Mirror [0198] M4 Mirror [0199] M5 Mirror [0200] P1 Peak [0201] P2 Peak [0202] P3 Peak [0203] r(t) Filtered output signal [0204] r.sub.1(t) High-pass-filtered output signal [0205] r.sub.2(t) Narrowband output signal [0206] R.sub.IN Input resistance [0207] R.sub.s Resistance [0208] R.sub.s,0 Resistance in the zero voltage state [0209] RS1 Resonance point [0210] RS2 Resonance point [0211] RS3 Resonance point [0212] R.sub.x Resistance [0213] S Switch [0214] s(t) Drive signal [0215] U.sub.DC Drive voltage [0216] U.sub.DC,1 Drive voltage [0217] U.sub.DC,2 Drive voltage [0218] U.sub.DC,3 Drive voltage [0219] Z Impedance of the actuator