R-T-B BASED PERMANENT MAGNET MATERIAL AND METHOD FOR PREPARING THE SAME

Abstract

The present invention relates to an R-T-B based permanent magnet material, having a composition of R.sub.xT.sub.yTm.sub.qB.sub.z (at. %), wherein 13≤x≤15.5, 0.5≤q≤3, 0.85≤z≤1, y=100−x−q−z; wherein R is LR.sub.aHR.sub.1-a, LR is one selected from the group consisting of Pr, Nd, PrNd, or a combination thereof, HR is one selected from the group consisting of Dy and Tb, or a combination thereof, and 0.95≤a≤1; wherein T is one selected from the group consisting of Fe and Co, or a combination thereof; and Tm is a transition metal. The advantage of the method is that: plating a heavy rare earth film on alloy flakes using a magnetron sputtering device, and the coercivity of the magnet is significantly increased simply by having a “core-shell” structure without long time diffusion heat treatment.

Claims

1. An R-T-B based permanent magnet material, having a composition of R.sub.xT.sub.yTm.sub.qB.sub.z (at. %), wherein 13≤x≤15.5, 0.5≤q≤3, 0.85≤z≤1, y=100−x−q−z; wherein R is LR.sub.aHR.sub.1-a, LR is one selected from the group consisting of Pr, Nd, PrNd, or a combination thereof, HR is one selected from the group consisting of Dy and Tb, or a combination thereof, and 0.95≤a≤1; wherein T is one selected from the group consisting of Fe and Co, or a combination thereof; and Tm is a transition metal.

2. The R-T-B based permanent magnet material according to claim 1, wherein Tm is one selected from the group consisting of Zr, Al, Cu, Ga, Sn, Si, or a combination thereof.

3. The R-T-B based permanent magnet material according to claim 1, wherein a main phase crystal grain of the R-T-B based permanent magnet material is a “core-shell” structure.

4. The R-T-B based permanent magnet material according to claim 3, wherein HR has higher concentration in the shell than in the core.

5. A method for preparing an R-T-B based permanent magnet material according to claim 1, comprising the steps of: Step S1, preparing raw materials according to R.sub.xT.sub.yTm.sub.qB.sub.z, wherein 13≤x≤15.5, 0.5≤q≤3, 0.85≤z≤1, y=100−x−q−z; Step S2, adding the raw materials to a vacuum smelting device for smelting and casting, so as to obtain first alloy flakes; Step S3, plating a heavy rare earth film on the first alloy flakes to obtain second alloy flakes; Step S4, coarsely crushing and grinding the second alloy flakes to obtain fine powder; Step S5, granulating the fine powder and performing compression molding, so as to obtain a green compact; and Step S6, performing diffusion sintering and multi-stage annealing on the green compact to obtain the R-T-B based permanent magnet material.

6. The method for preparing an R-T-B based permanent magnet material according to claim 5, wherein in Step S1, R is LR.sub.aHR.sub.1-a, LR is one selected from the group consisting of Pr, Nd, PrNd, or a combination thereof, HR is one selected from the group consisting of Dy and Tb, or a combination thereof; and 0.95≤a≤1.

7. The method for preparing an R-T-B based permanent magnet material according to claim 5, wherein Tm is a transition metal, and Tm is one selected from the group consisting of Zr, Al, Cu, Ga, Sn, Si, or a combination thereof.

8. The method for preparing a R-T-B based permanent magnet material according to claim 6, wherein in Step S2, the raw materials are smelted in an inert gas; the raw materials are casted at a temperature of 1400° C.-1500° C. after being subjected to the smelting process.

9. The method for preparing an R-T-B based permanent magnet material according to claim 8, wherein the inert gas is Ar or He.

10. The method for preparing an R-T-B based permanent magnet material according to claim 5, wherein the first alloy flakes have a thickness in a range from 200 μm to 300 μm.

11. The method for preparing an R-T-B based permanent magnet material according to claim 5, wherein in Step S3, the heavy rare earth film is made from a material selected from the group consisting of Dy and Tb, or a combination thereof.

12. The method for preparing an R-T-B based permanent magnet material according to claim 5, wherein in Step S3, the heavy rare earth film has a thickness in a range from 0 μm to 3 μm.

13. The method for preparing an R-T-B based permanent magnet material according to claim 5, wherein in Step S3, plating the heavy rare earth film on the first alloy flakes using a magnetron sputtering device.

14. The method for preparing an R-T-B based permanent magnet material according to claim 13, wherein in Step S3, a target material used in the magnetron sputtering device is one selected from the group consisting of Tb, Dy, and HRE-X alloy.

15. The method for preparing an R-T-B based permanent magnet material according to claim 14, wherein in the HRE-X alloy, HRE is one selected from the group consisting of Tb and Dy, or a combination thereof; X is one selected from the group consisting of Fe, Cu, or a combination thereof.

16. The method for preparing an R-T-B based permanent magnet material according to claim 6, wherein a main phase crystal grain of the R-T-B based permanent magnet material is a “core-shell” structure; HR has higher concentration in the shell than in the core.

17. The method for preparing an R-T-B based permanent magnet material according to claim 5, wherein in Step S4, the method further comprises: Step S41, coarsely crushing the second alloy flakes to obtain coarse powder, wherein the following conditions for coarse crushing should be met: the second alloy flakes are dehydrogenized at a temperature of 350° C.-500° C. after it is sufficiently reacted in a mixed gas of H.sub.2 and Ar; Step S42, grinding the coarse powder obtained in Step S41 to obtain the fine powder, wherein the following conditions for grinding should be met: high-speed grinding operation is performed in a mixed gas of N.sub.2 and O.sub.2, and the grain size of the fine powder is in a range from 1 μm to 4 μm.

18. The method for preparing an R-T-B based permanent magnet material according to claim 5, wherein in Step S5, the method further comprises: Step S51, mixing and stirring the fine powder and organic matter to obtain a mixture; and Step S52, placing the mixture obtained from Step S51 into N.sub.2, to perform magnetic field orientation molding, so as to obtain the green compact.

19. The method for preparing an R-T-B based permanent magnet material according to claim 5, wherein in Step S6, the following conditions for diffusion sintering should be met: the green compact is kept at 1000° C.-1055° C. for 6 hours to 10 hours.

20. The method for preparing an R-T-B based permanent magnet material according to claim 5, wherein in Step S6, the following conditions for multi-stage annealing should be met: the first stage of annealing: the green compact is kept at 850° C.-950° C. for 2 hours to 3 hours; and the second stage of annealing: the green compact is kept at 450° C.-580° C. for 1 hour to 5 hours.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0052] The accompanying drawings, together with the specification, illustrate exemplary embodiments of the present disclosure, and, together with the description, serve to explain the principles of the present invention.

[0053] FIG. 1 is flowchart illustrating a process for preparing an R-T-B based permanent magnet material according to an exemplary embodiment of the present invention.

[0054] FIG. 2 is a schematic view showing a magnetron sputtering device according to an exemplary embodiment of the present invention.

[0055] FIG. 3 is a backscattered electron image of an R-T-B based permanent magnet material according to an invention example 2 of the present invention.

[0056] FIG. 4 is a backscattered electron image of a permanent magnet material according to a comparative example 1 of the present invention.

[0057] Reference numerals in the drawings: 1. Cleaning chamber, 2. Film plating chamber, 3. Primary cooling chamber, 4. Secondary cooling chamber, 5. First alloy flake, 6. Heavy rare earth or its alloy target, 7. Transmission roller.

DETAILED DESCRIPTION

[0058] The present invention will now be described more fully hereinafter with reference to the accompanying drawings, in which exemplary embodiments of the invention are shown. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. Like reference numerals refer to like elements throughout.

[0059] The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the singular forms “a”, “an” and “the” are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms “comprises” and/or “comprising,” or “includes” and/or “including” or “has” and/or “having” when used herein, specify the presence of stated features, regions, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, regions, integers, steps, operations, elements, components, and/or groups thereof.

[0060] Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. It will be further understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the relevant art and the present disclosure, and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.

[0061] As used herein, “around”, “about” or “approximately” shall generally mean within 20 percent, preferably within 10 percent, and more preferably within 5 percent of a given value or range. Numerical quantities given herein are approximate, meaning that the term “around”, “about” or “approximately” can be inferred if not expressly stated.

[0062] As used herein, the term “plurality” means a number greater than one.

[0063] Hereinafter, certain exemplary embodiments according to the present disclosure will be described with reference to the accompanying drawings.

Example 1

[0064] As shown in FIG. 1, the present invention provides a method for preparing an R-T-B based permanent magnet material, comprising the steps of:

[0065] Step S1, preparing raw materials according to R.sub.xT.sub.yTm.sub.qB.sub.z, wherein 13≤x≤15.5, 0.5≤q≤3, 0.85≤z≤1, y=100−x−q−z;

[0066] Step S2, adding the raw materials to a vacuum smelting device for smelting and casting, so as to obtain first alloy flakes;

[0067] Step S3, plating a heavy rare earth film on the first alloy flakes to obtain second alloy flakes;

[0068] Step S4, coarsely crushing and grinding the second alloy flakes to obtain fine powder;

[0069] Step S5, granulating the fine powder and performing compression molding, so as to obtain a green compact; and

[0070] Step S6, performing diffusion sintering and multi-stage annealing on the green compact to obtain the R-T-B based permanent magnet material.

[0071] The steps described above are basic steps for obtaining the R-T-B based permanent magnet material.

[0072] Wherein, in Step S1, R is LR.sub.aHR.sub.1-a, LR is one selected from the group consisting of Pr, Nd, PrNd, or a combination thereof, HR is one selected from the group consisting of Dy and Tb, or a combination thereof; and 0.95≤a≤1.

[0073] Wherein, Tm is a transition metal, and Tm is one selected from the group consisting of Zr, Al, Cu, Ga, Sn, Si, or a combination thereof.

[0074] Furthermore, in Step S2, the raw materials are smelted under an inert gas.

[0075] Furthermore, the raw materials are casted at a temperature of 1400° C.-1500° C. after being subjected to the smelting process.

[0076] Furthermore, the inert gas is Ar or He.

[0077] Furthermore, the first alloy flakes have a thickness in a range from 200 μm to 300 μm.

[0078] Furthermore, in Step S3, the heavy rare earth film is made from a material selected from the group consisting of Dy and Tb, or a combination thereof.

[0079] Furthermore, in Step S3, the heavy rare earth film has a thickness in a range from 0 μm to 3 μm.

[0080] Furthermore, in Step S3, plating the heavy rare earth film on the first alloy flakes using a magnetron sputtering device.

[0081] Furthermore, in Step S3, a material used in the magnetron sputtering device is one selected from the group consisting of Tb, Dy, and HRE-X alloy, or a combination thereof.

[0082] Wherein, in the HRE-X alloy, HRE is one selected from the group consisting of Tb and Dy, or a combination thereof.

[0083] X is one selected from the group consisting of Fe, Cu, or a combination thereof.

[0084] Furthermore, a main phase crystal grain of the R-T-B based permanent magnet material is a “core-shell” structure.

[0085] Furthermore, as shown in FIG. 2, the magnetron sputtering device sequentially comprises a cleaning chamber 1, a film plating chamber 2, a primary cooling chamber 3 and a secondary cooling chamber 4, wherein heavy rare earth or its alloy target 6 is arranged above an interior of the film plating chamber 2 for plating the heavy rare earth on the first alloy flakes 5 in the film plating chamber 2. The cleaning chamber 1, the film plating chamber 2, the primary cooling chamber 3 and the secondary cooling chamber 4 are provided with transmission rollers 7 for conveying the first alloy flakes 5.

[0086] Furthermore, in Step S4, the method further comprises:

[0087] Step S41, coarsely crushing the second alloy flakes to obtain coarse powder, wherein the following conditions for coarse crushing should be met: the second alloy flakes are dehydrogenized at a temperature of 350° C.-500° C. after it is sufficiently reacted in a mixed gas of H.sub.2 and Ar;

[0088] Step S42, grinding the coarse powder obtained in Step S41 to obtain the fine powder, wherein the following conditions for grinding should be met: high-speed grinding operation is performed in a mixed gas of N.sub.2 and O.sub.2, and the grain size varies of the fine powder is in a range from 1 μm to 4 μm.

[0089] Furthermore, in Step S41, hydrogenation is performed in a mixed gas of H.sub.2 and Ar at a temperature of 200° C.-450° C.

[0090] Furthermore, in Step S41, dehydrogenation is performed at a temperature of 420° C.-500° C.

[0091] Furthermore, in Step S5, the method further comprises:

[0092] Step S51, mixing and stirring the fine powder and organic matter to obtain a mixture; and

[0093] Step S52, placing the mixture obtained from Step S51 into N.sub.2, to perform magnetic field orientation molding, so as to obtain the green compact.

[0094] Wherein, the organic matter acts to prevent oxidation of the fine powder.

[0095] Furthermore, in Step S52, the orientation magnetic field of the green compact is in a range from 1.5 T to 2 T, and the green compact has a density of 3.5-4.1 g/cm.sup.3.

[0096] Furthermore, in the orientation molding process, the pressure comes in a direction parallel to the direction of magnetic field, or the pressure comes in a direction perpendicular to the direction of magnetic field.

[0097] Furthermore, in Step S6, the following conditions for diffusion sintering should be met:

[0098] the green compact is kept at 1000° C.-1055° C. for 6 hours to 10 hours.

[0099] Furthermore, in Step S6, the following conditions for multi-stage annealing should be met:

[0100] the first stage of annealing: the green compact is kept at 850° C.-950° C. for 2 hours to 3 hours; and

[0101] the second stage of annealing: the green compact is kept at 450° C.-580° C. for 1 hour to 5 hours.

Example 2

[0102] This example is a specific embodiment of the R-T-B based permanent magnet material according to the present invention.

[0103] The preparation method for this embodiment is as follows:

[0104] In Step S1, raw materials are prepared in a ratio as shown in table 1.

TABLE-US-00001 TABLE 1 Table of Raw Material Ingredients (at. %) Pr Nd Dy Tb Al Cu Ga Zr Fe Co B Alloy 1 3.53 10.35 0.00 0.00 0.25 0.15 0.30 0.12 Bal. 1.00 5.40 Alloy 2 3.48 10.19 0.20 0.00 0.73 0.21 0.47 0.07 Bal. 1.11 5.50 Alloy 3 3.26 9.57 1.21 0.00 0.49 0.10 0.38 0.11 Bal. 1.12 5.42 Alloy 4 3.26 9.57 1.33 0.00 1.22 0.21 0.38 0.12 Bal. 1.12 5.42 Alloy 5 0.00 13.18 0.00 0.41 0.48 0.21 0.09 0.07 Bal. 0.55 5.68

[0105] In Step S2, the prepared raw materials are added to the vacuum smelting device for smelting and casting, so as to obtain first alloy flakes.

[0106] Wherein, the raw materials are smelted under an Ar or He atmosphere and cast onto a water-cooled copper roller having a linear velocity of 1 m/s at a temperature of 1460° C.-1470° C., to obtain the first alloy flakes having a thickness of about 300 μm.

[0107] In Step S3, plating the heavy rare earth film on the first alloy flakes according to the conditions shown in the following table 2, so as to obtain a second alloy plate.

TABLE-US-00002 TABLE 2 Conditions for Plating Heavy Rare Earth Film Film thickness Alloy Target material (μm) Example 1 Alloy 1 Dy 0.5 Example 2 Alloy 2 Dy 0.5 Example 3 Alloy 3 Dy 0.5 Example 4 Alloy 4 Dy 0.5 Example 5 Alloy 5 Dy 0.5 Example 6 Alloy 1 Dy.sub.85-Fe.sub.15 1.5 Example 7 Alloy 2 Dy.sub.85-Fe.sub.15 1.5 Example 8 Alloy 3 Dy.sub.85-Fe.sub.15 1.5 Example 9 Alloy 1 Tb 1 Example 10 Alloy 2 Tb 1 Example 11 Alloy 3 Tb 1 Example 12 Alloy 4 Tb 1 Example 13 Alloy 5 Tb 1 Example 14 Alloy 1 Tb.sub.75-Cu.sub.25 2 Example 15 Alloy 2 Tb.sub.75-Cu.sub.25 2

[0108] In Step S3, the specific process is as follows:

[0109] The first alloy flakes 5 are transmitted to the cleaning chamber 1 for performing ion cleaning on a surface of the first alloy flakes 5; the cleaned first alloy flakes 5 are transmitted into the film plating chamber 2 for plating the heavy rare earth film on the first alloy flakes 5 at a preset current of sputtering of the target material and a preset time; and the first alloy flakes 5 is sequentially transmitted into the primary cooling chamber 3 and the secondary cooling chamber 4 for cooling.

[0110] In Step S4, the second alloy flakes are coarsely crushed and grinded to obtain fine powder.

[0111] Wherein, the following conditions for coarse crushing should be met: the second alloy flakes are hydrogenized in a mixed gas of H.sub.2 and Ar at a temperature of 200° C.-450° C. and then is dehydrogenized at a temperature of 450° C., so as to obtain coarse powder with a grain size in a range from 200 μm to 500 μm.

[0112] Wherein, the grain size of the fine powder after grinding is shown in the following table 3.

TABLE-US-00003 TABLE 3 Grain Size for Fine Powder Grain size Example 1 2.8 Example 2 2.5 Example 3 2.6 Example 4 2.1 Example 5 2.2 Example 6 2.8 Example 7 2.5 Example 8 2.6 Example 9 2.8 Example 10 2.5 Example 11 2.6 Example 12 2.1 Example 13 2.2 Example 14 2.8 Example 15 2.5

[0113] In Step S5, granulating the fine powder and performing compression molding, so as to obtain a green compact.

[0114] In Step S6, performing diffusion sintering and multi-stage annealing on the green compact to obtain the R-T-B based permanent magnet material.

[0115] Specifically, conditions for diffusion sintering are shown in Table 4.

TABLE-US-00004 TABLE 4 Conditions for Diffusion Sintering Temperature Time (° C.) (h) Example 1 1055 8 Example 2 1050 8 Example 3 1045 8 Example 4 1000 8 Example 5 1010 8 Example 6 1045 8 Example 7 1040 8 Example 8 1035 8 Example 9 1055 8 Example 10 1050 8 Example 11 1045 8 Example 12 1040 8 Example 13 1055 8 Example 14 1045 8 Example 15 1040 8

[0116] During the diffusion sintering process, Dy or Tb migrated among crystal grains, and a displacement reaction occurs between Dy or Tb and Nd.sub.2Fe.sub.14B of the main phase in the permanent magnet material, wherein, the reaction formula is HRE+Nd.sub.2Fe.sub.14B.fwdarw.(Nd, HRE).sub.2Fe.sub.14B+Nd. Thus, the heavy rare earth may be uniformly distributed and form a “core-shell” structure as expected.

[0117] Furthermore, in this embodiment, the diffusion sintering process is a low temperature sintering process.

The multi-stage annealing is a secondary annealing, and the conditions are as follows:

[0118] the first stage of annealing: the green compact is kept at 900° C. for 2 hours; and

[0119] the second stage of annealing: the green compact is kept at 500° C. for 4 hours.

Example 3

[0120] This example is a comparative example of the R-T-B based permanent magnet material according to the present invention.

[0121] The preparation method for the comparative example is as follows:

[0122] In Step S1, raw materials are made from the alloy 2 and the alloy 5 in a ratio as shown in table 1.

[0123] In Step S2, the prepared raw materials are added to the vacuum smelting device for smelting and casting, so as to obtain first alloy flakes.

[0124] Wherein, the raw materials are smelted under an Ar or He atmosphere and cast onto a water-cooled copper roller having a linear velocity of 1 m/s at a temperature of 1460° C.-1470° C., to obtain the first alloy flakes having a thickness of about 300 μm.

[0125] Step S3 is omitted in the comparative example.

[0126] In Step S4, the second alloy flakes are coarsely crushed and grinded to obtain fine powder.

[0127] Wherein, the following conditions for coarse crushing should be met: the second alloy flakes are hydrogenized in a mixed gas of H.sub.2 and Ar at a temperature of 200° C.-450° C. and then is dehydrogenized at a temperature of 450° C., so as to obtain coarse powder having a grain size in a range from 200 μm to 500 μm.

[0128] Wherein, the grain size of the fine powder is shown in the following table 5.

TABLE-US-00005 TABLE 5 Grain Size for Fine Powder Grain size Comparative 2.6 example 1 Comparative 2.6 example 2

[0129] In Step S5, granulating the fine powder and performing compression molding, so as to obtain a green compact.

[0130] In Step S6, performing diffusion sintering and multi-stage annealing on the green compact to obtain the R-T-B based permanent magnet material.

[0131] Specifically, conditions for diffusion sintering are shown in Table 6.

TABLE-US-00006 TABLE 6 Conditions for Diffusion Sintering Temperature Time (° C.) (h) Comparative 1050 8 example 1 Comparative 1055 8 example 2

[0132] Furthermore, in this embodiment, the diffusion sintering process is a low temperature sintering process.

[0133] The multi-stage annealing is a secondary annealing, and the conditions are as follows:

[0134] the first stage of annealing: the green compact is kept at 900° C. for 2 hours; and

[0135] the second stage of annealing: the green compact is kept at 500° C. for 4 hours.

Example 4

[0136] This example relates to performance tests of experimental examples of the example 2 and comparative examples of the example 3.

[0137] Performance tests are performed on 15 experimental examples and 2 comparative examples using a hysteresis loop analyzer. Elemental analysis is performed on 15 experimental examples and 2 comparative examples using a plasma spectrometer. The test results are shown in Table 7.

TABLE-US-00007 TABLE 7 Test Results Br Alloy (kGs) Hcj (kOe) (BH) m ΔHRE(wt. %) Example 1 Alloy 1 14.15 19.36 49.35 0.19 Example 2 Alloy 2 14.02 21.74 48.66 0.20 Example 3 Alloy 3 13.18 26.43 41.59 0.19 Example 4 Alloy 4 12.45 30.15 38.58 0.17 Example 5 Alloy 5 13.95 22.73 49.25 0.18 Example 6 Alloy 1 14.05 21.91 48.76 0.43 Example 7 Alloy 2 13.92 23.56 49.34 0.42 Example 8 Alloy 3 13.02 28.76 40.57 0.41 Example 9 Alloy 1 14.09 24.72 49.02 0.36 Example 10 Alloy 2 13.94 26.38 49.56 0.38 Example 11 Alloy 3 13.08 31.67 42.39 0.36 Example 12 Alloy 4 12.34 35.64 39.21 0.37 Example 13 Alloy 5 13.90 27.28 47.68 0.39 Example 14 Alloy 1 14.01 27.38 46.75 0.72 Example 15 Alloy 2 13.91 27.96 44.89 0.67 Comparative Alloy 2 14.10 18.90 48.96 0.00 Example 1 Comparative Alloy 5 14.04 20.65 48.70 0.00 Example 2

[0138] It is known from table 7 that the coercivity of the permanent magnet material can be effectively improved, and the remanence drop may be within 0.2 kG by plating the heavy rare earth on the first alloy flakes.

[0139] Referring to alloy 2, for examples 2, 7, 10, 15 and comparative example 1, when 0.5 μm Dy is plated, the coercivity is increased by 2.84 kOe, and the remanence is decreased by 0.08 kGs; when Dy—Fe is plated, the coercivity is increased by 4.66 kOe, and the remanence is decreased by 0.18 kGs; when Tb is plated, the coercivity is increased by 7.48 kOe, and the remanence is decreased by 0.16 kGs; when Tb—Cu is plated, the coercivity is increased by 9.06 kOe, and the remanence is decreased by 0.19 kGs. As can be seen from the above examples, when the Tb target is used, the coercivity is increased significantly and the remanence drop is within 0.2 kGs.

[0140] Referring to alloy 5, for examples 5, 13 and comparative example 2, when Dy is plated, the coercivity is increased by 2.08 kOe, and the remanence is decreased by 0.09 kGs; when Tb is plated, the coercivity is increased by 6.63 kOe, and the remanence is decreased by 0.14 kGs.

[0141] Furthermore, when comparing the experimental example 1 and the comparative example 1, it is known that both the remanence and the coercivity of the magnet in the experimental example 1 are higher than those in the comparative example 1 in the case where the Dy content is similar both in these two examples, since after subjected to the film plating process and the diffusion sintering process, distribution of the heavy rare earth is changed, thus the remanence and the coercivity is improved.

[0142] FIGS. 3 and 4 are backscattered electron images of R-T-B based permanent magnet materials which belong to the experimental example 2 and the comparative example 1, respectively, wherein gray areas are 2-14-1 phase particles, and gray contrast is electron concentration. In FIG. 3, two kinds of gray contrasts may be observed, namely, light gray at positions indicated by +1 and dark gray at positions indicated by +2. Wherein, light gray represents a higher electron concentration, and dark gray represents a lower electron concentration, that is, the heavy rare earth is not uniformly distributed and shows a core-shell” structure. In FIG. 4, there is only one gray contrast, that is, the heavy rare earth is uniformly distributed. As can be seen in FIG. 3, the heavy rare earth is mainly distributed along the crystal grain boundary, in other words, the heavy rare earth has higher concentration in the shell than in the core, that is, the heavy rare earth is distributed in the “shell” of the “core-shell” structure. In this way, the magnetocrystalline anisotropy field at the crystal grain boundary is increased, the probability of demagnetization of the crystal grain boundary is reduced, thereby, the coercivity of the permanent magnet material is increased.

[0143] Based on the above-mentioned test results, the following conclusion can be made. In a method for preparing a R-T-B based permanent magnet material, plating a layer of heavy rare earth film on first alloy flakes using a magnetron sputtering device to obtain second alloy flakes; then performing coarse crushing on the second alloy flakes, such that the heavy rare earth may be uniformly distributed, and heavy rare earth elements diffuse from the exterior to the interior of powder grains during the diffusion sintering process; and the heavy rare earth elements form a shell layer rich in heavy rare earth along the peripheries of the main phase crystal grains of all Nd.sub.2Fe.sub.14B, such that a hard magnetic phase grain having a “core-shell” structure is formed. As a result, formation of a demagnetization core and entry of excessive heavy rare earth into the main phase may be avoided. Thereby, the coercivity of the R-T-B based permanent magnet material is significantly increased, and an R-T-B based permanent magnet material with a high energy product and a highcoercivity, may be obtained.

[0144] The above descriptions are only the preferred embodiments of the invention, not thus limiting the embodiments and scope of the invention. Those skilled in the art should be able to realize that the schemes obtained from the content of specification and drawings of the invention are within the scope of the invention.