PLATINUM-BASED MATERIAL THIN WIRE AND METHOD FOR MANUFACTURING THE SAME
20200384517 ยท 2020-12-10
Assignee
Inventors
Cpc classification
B21C37/045
PERFORMING OPERATIONS; TRANSPORTING
C23C30/00
CHEMISTRY; METALLURGY
B21C1/003
PERFORMING OPERATIONS; TRANSPORTING
Y10T428/2958
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
B21C1/02
PERFORMING OPERATIONS; TRANSPORTING
International classification
B21C1/02
PERFORMING OPERATIONS; TRANSPORTING
B21C3/02
PERFORMING OPERATIONS; TRANSPORTING
Abstract
A platinum-based material element wire is coated with gold or gold alloy, and drawing-processed with a carbon-containing die. The thin wire manufactured in this manner is covered with gold or gold alloy, and the coverage of gold or gold alloy is 40% or more on an area basis. The thin wire formed of a platinum-based material is manufactured in a state of suppressing breakage in a drawing processing step, and has favorable performance in electric properties and the like. In addition, this manufacturing process is capable of efficiently manufacturing a platinum-based material thin wire while suppressing breakage when the thin wire is manufactured by drawing processing.
Claims
1. A platinum-based material thin wire having a wire diameter of 10 m or more and 100 m or less and formed of platinum or platinum alloy, wherein the thin wire is covered with gold or gold alloy, a coverage of the gold or gold alloy is 40% or more on an area basis, and a degree of circularity on a radial cross-section in an arbitrary longitudinal position is 0.90 or more.
2. (canceled)
3. The thin wire according to claim 1, wherein, when TCR.sup.c is a temperature coefficient of resistance of the thin wire, and TCR.sup.nc is a temperature coefficient of resistance of a thin wire which is identical to the thin wire in composition except gold and which is formed of platinum or platinum alloy that does not contain gold, a difference between the TCR.sup.c and the TCR.sup.nc is within 0.5%.
4. The thin wire according to claim 1, comprising gold in an amount of 200 ppm or more and 1000 ppm or less on a mass basis.
5. The thin wire according to claim 1, wherein the platinum alloy is an alloy of platinum and rhodium, palladium, iridium, tungsten or nickel, or reinforced platinum.
6. A method for manufacturing the thin wire formed of a platinum-based material according to claim 1, comprising a step of performing drawing processing by passing a platinum-based material element wire through a carbon-containing die at least once, the drawing processing including passing the element wire through the die at least once in a state of being coated with gold or gold alloy in an amount of 200 ppm or more and 1000 ppm or less based on mass of the element wire.
7. A method for manufacturing the thin wire formed of a platinum-based material according to claim 1, comprising a step of performing drawing processing by passing a platinum-based material element wire through a carbon-containing die at least once, the drawing processing including passing the element wire through the die at least once in a state of being coated with gold or gold alloy in an amount equivalent to a thickness of 40 nm or more and 100 nm or less.
8. The method for manufacturing the thin wire formed of a platinum-based material according to claim 6, wherein the carbon-containing die is one of a ceramic die, an ultrahard die and a diamond die.
9. The method for manufacturing the thin wire formed of a platinum-based material according to claim 6, wherein an element wire having a diameter of 300 m or more and 800 m or less is coated with gold or gold alloy, and drawing-processed.
10. The thin wire according to claim 3, comprising gold in an amount of 200 ppm or more and 1000 ppm or less on a mass basis.
11. The thin wire according to claim 3, wherein the platinum alloy is an alloy of platinum and rhodium, palladium, iridium, tungsten or nickel, or reinforced platinum.
12. The thin wire according to claim 4, wherein the platinum alloy is an alloy of platinum and rhodium, palladium, iridium, tungsten or nickel, or reinforced platinum.
13. A method for manufacturing the thin wire formed of a platinum-based material according to claim 3, comprising a step of performing drawing processing by passing a platinum-based material element wire through a carbon-containing die at least once, the drawing processing including passing the element wire through the die at least once in a state of being coated with gold or gold alloy in an amount of 200 ppm or more and 1000 ppm or less based on mass of the element wire.
14. A method for manufacturing the thin wire formed of a platinum-based material according to claim 4, comprising a step of performing drawing processing by passing a platinum-based material element wire through a carbon-containing die at least once, the drawing processing including passing the element wire through the die at least once in a state of being coated with gold or gold alloy in an amount of 200 ppm or more and 1000 ppm or less based on mass of the element wire.
15. A method for manufacturing the thin wire formed of a platinum-based material according to claim 5, comprising a step of performing drawing processing by passing a platinum-based material element wire through a carbon-containing die at least once, the drawing processing including passing the element wire through the die at least once in a state of being coated with gold or gold alloy in an amount of 200 ppm or more and 1000 ppm or less based on mass of the element wire.
16. A method for manufacturing the thin wire formed of a platinum-based material according to claim 3, comprising a step of performing drawing processing by passing a platinum-based material element wire through a carbon-containing die at least once, the drawing processing including passing the element wire through the die at least once in a state of being coated with gold or gold alloy in an amount equivalent to a thickness of 40 nm or more and 100 nm or less.
17. A method for manufacturing the thin wire formed of a platinum-based material according to claim 4, comprising a step of performing drawing processing by passing a platinum-based material element wire through a carbon-containing die at least once, the drawing processing including passing the element wire through the die at least once in a state of being coated with gold or gold alloy in an amount equivalent to a thickness of 40 nm or more and 100 nm or less.
18. A method for manufacturing the thin wire formed of a platinum-based material according to claim 5, comprising a step of performing drawing processing by passing a platinum-based material element wire through a carbon-containing die at least once, the drawing processing including passing the element wire through the die at least once in a state of being coated with gold or gold alloy in an amount equivalent to a thickness of 40 nm or more and 100 nm or less.
19. The method for manufacturing the thin wire formed of a platinum-based material according to claim 7, wherein the carbon-containing die is one of a ceramic die, an ultrahard die and a diamond die.
20. The method for manufacturing the thin wire formed of a platinum-based material according to claim 7, wherein an element wire having a diameter of 300 m or more and 800 m or less is coated with gold or gold alloy, and drawing-processed.
21. The method for manufacturing the thin wire formed of a platinum-based material according to claim 8, wherein an element wire having a diameter of 300 m or more and 800 m or less is coated with gold or gold alloy, and drawing-processed.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
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DESCRIPTION OF EMBODIMENTS
[0057] Embodiments of the present invention will be described below for promoting better understanding of the present invention. In the embodiments, first, processability was evaluated as a preliminary test based on factors other than coating with gold or gold alloy, such as difference in thin wire material, existence or non-existence of a lubricant and processing conditions. Thereafter, thin wire processing and product evaluation were performed as embodiments for examining usefulness of gold coating.
[0058] In the preliminary test below, the wire diameter of an element wire was set to 0.5 mm, and the wire diameter of a target thin wire was set to 0.02 mm. A diamond die made of sintered diamond (manufactured by A.L.M.T. Corp.) and having a hole diameter of 20 m. The number of processing (i.e. the number of passages of the element wire through the die) was set to 1, and the element wire was continuously drawn. The temperature of the processing atmosphere was normal temperature, and a lubricant was used. The lubricant was supplied by pouring the lubricant to the die with a circulation pump. For evaluation of processing results, a relationship between a drawing distance and a die wear amount was evaluated. Here, the wire diameter after processing over a predetermined drawing distance was measured, and the die wear amount was calculated on the basis of the wire diameter in an early stage of processing (drawing distance: 10 m).
[0059] Preliminary test: First, element wires of a platinum-based material and a non-platinum-based material were drawing-processed, and uniqueness of die wear in processing of the platinum-based material was examined. Here, an element wire of pure platinum with a purity of 99.99% by mass and an element wire of silver alloy (AgCuNi alloy: XP-3) manufactured by Tanaka Kikinzoku Kogyo were prepared, and drawing-processed. Here, a silver alloy element wire to be compared has a tensile strength higher by about 400 MPa than that of the pure silver wire and a Vickers hardness higher by about 200 than that of the pure platinum wire.
[0060]
[0061] Next, existence or non-existence of an effect of protecting the die by use of a lubricant was examined for the platinum element wire. Under the above-described processing conditions, drawing processing was performed on platinum element wires with no lubricant, with water and with a commercially available surfactant-based water-soluble oil. The die wear amount was determined from the wire diameter after the reaching of a drawing distance of 10,000 m.
[0062] From
[0063] Further, effects of the drawing speed on die wear was examined for the platinum element wire.
First Embodiment
[0064] On the basis of the results of the above preliminary test, a platinum element wire coated with gold was drawing-processed. In this embodiment, a platinum element wire having a wire diameter of 500 m (0.5 mm) was coated with gold by a plating method. The coating amount was such that 450 g of the element wire was coated with 0.22 g of gold in terms of a mass (about 488 ppm, equivalent to a thickness of 68 nm). In this embodiment, the same diamond die as in the preliminary test (die hole diameter: 20 m (0.02 mm)) was used. In this embodiment, an attempt was made to process a thin wire whose target wire diameter was 20 m. The temperature of the processing atmosphere was normal temperature, and a lubricant (type: surfactant-based water-soluble oil) was used. The drawing speed was set to 50 m/min. As a comparative example, an element wire which was not coated with gold was processed. Continuous drawing was performed, and the wire diameter of the manufactured thin wire was measured at predetermined intervals. The electric resistance value was measured together with the wire diameter.
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[0068] The above test results showed that by coating an element wire formed of a platinum-based material with gold, a high-quality thin wire with a small change in wire diameter was manufactured while die wear was suppressed.
[0069] Next, the gold coverage on the thin wire was measured for the platinum thin wire manufactured in this embodiment. The measurement of the gold coverage was based on cyclic voltammetry analysis with a platinum thin wire as an electrode. Measurement of a cyclic voltammogram was performed in the following manner. A working electrode, a counter electrode and a reference electrode were connected to a measuring apparatus (trade name: HZ-5000 manufactured by Hokuto Denko Corporation). The platinum thin wire manufactured in this embodiment was used for the working electrode, and a platinum electrode and a reversible hydrogen electrode (RHE) were used for the counter electrode and the reference electrode, respectively. In addition, a 0.1 M-HClO.sub.4 solution was used as an electrolytic solution. In advance, the electrolytic solution was bubbled with nitrogen gas for 30 minutes. Cyclic voltammetry was performed at a sweeping rate of 10 mV/sec from 0.05 V to 1.7 V.
[0070]
[0071] The gold coverage based on the cyclic voltammogram is calculated in the following manner. First, the amounts of electricity (Q.sub.Pt and Q.sub.Au) at the peaks (platinum and gold) in the cyclic voltammogram are determined. The amount of electricity is calculated by time integration of current values at the peaks, and the calculation can be performed with general spreadsheet software or analysis software. Next, from the obtained amounts of electricity (Q.sub.Pt and Q.sub.Au) and the electric capacitances for oxide layer reduction with platinum and gold (Q.sub.Pt-O(red): 420 C/cm.sup.2 and Q.sub.Au-O(red): 390 C/cm.sup.2), the areas of platinum and gold (SA.sub.Pt and SA.sub.Au) are calculated. The area ratio (SA.sub.Au/(SA.sub.Pt+SA.sub.Au)) calculated from the respective areas is defined as a gold coverage. The gold coverage on the platinum thin wire having a diameter of 20 m of this embodiment, based on the cyclic voltammogram of
[0072] Further, the temperature coefficient of resistance (TCR) was measured for the platinum thin wire manufactured in this embodiment. In this embodiment, the reference temperature and the test temperature were set 0 C. and 100 C., respectively, the resistance values at these temperatures (R.sub.100 and R.sub.0) were measured, and TCR in this embodiment with gold coating and TCR.sup.nc in the comparative example without gold coating were measured.
[0073] The results of measuring the TCRs showed that TCR (TCR.sup.c) of the thin wire of this embodiment was 1.3857 (ppm/ C.), whereas TCR (TCR.sup.nc) of the thin wire of the comparative example was 1.3888 (ppm/ C.). In the thin wire of this embodiment, the thin wire is covered with gold, and therefore the TCR value is slightly lower than that of the thin wire of the comparative example without gold (the thin wire of the comparative example is identical in composition to the thin wire of this embodiment except that gold is not present). However, there is an extremely small difference of 0.22% between TCR.sup.c and TCR.sup.nc. It is considered that the platinum thin wire of this embodiment is a practically acceptable level of TCR, and can be used as such for the above-described purposes. Comparison between the resistance values in this embodiment and the comparative example at a drawing distance of about 0 m, with reference to
Second Embodiment
[0074] Here, various platinum thin wires were manufactured while the coating amount of gold on an element wire and the final hole diameter of a die were changed. The element wire to be processed is the same platinum element wire (500 m) as in the first embodiment. In addition, the coating amount of gold was 320 ppm in terms of an element wire mass ratio and was equivalent to a thickness of 44 nm. As the die, a diamond die was used (drawing distance: 500 m) for each of the thin wired.
[0075] Regarding the manufactured thin wire, the actual wire diameter was measured, and the cyclic voltammogram was measured in the same manner as in the first embodiment to determine the gold coverage. Table 1 shows the manufacturing conditions and the measured values for the manufactured thin wires for the platinum thin wires manufactured in this embodiment.
TABLE-US-00001 TABLE 1 Manufacturing conditions Gold coating amount Thin wire measured values Pt element Mass Thickness Die hole Wire diameter No. wire diameter ratio equivalent diameter (actual size) Au coverage 1 500 m 320 ppm 44 nm 72 m 72 m 47.3% 2 46.5 m 47 m 58.5% 3 30 m 30 m 57.5% 4 11.1 m 11 m 51.7%
[0076] As shown in Table 1, the platinum thin wires manufactured in the second embodiment each had a small deviation in wire diameter with respect to the target wire diameter (i.e. die hole diameter). In any of the thin wires, breakage did not occur during processing. The gold coverage (i.e. area ratio) on each thin wire was 40% or more.
[0077] TCR.sup.cs (R.sub.100 and R.sub.0) of the thin wires of the second embodiment were measured, and the results showed that for all the thin wires, the difference was within the range of 0.5% with respect to the value (1.3888 (ppm/ C.)) for the thin wire without gold coating in the comparative example in the first embodiment.
Third Embodiment
[0078] In this embodiment, effects of the gold coating amount on drawing processing were examined. In this regard, a platinum element wire processed to a wire diameter of 800 m was coated with gold in an amount of 400 ppm (equivalent to a thickness of 44 nm) or 200 ppm (equivalent to a thickness of 88 nm) to manufacture a platinum thin wire. In addition, an element wire not coated with gold was processed by thin wire processing. The drawing speed was set to 50 m/min. A relationship between a drawing distance and a die wear amount was examined.
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Fourth Embodiment
[0080] In this embodiment, effects of gold coating on drawing processing of platinum alloy. An element wire having a diameter of 500 m of platinum-tungsten alloy (Pt-8% by mass W alloy) was coated with gold in an amount of 410 ppm in terms of an element wire mass ratio (equivalent to a thickness of 57 nm) to manufacture a thin wire. The drawing speed was set to 50 m/min. A relationship between a drawing distance and a die wear amount was examined. For determining the gold coverage on the platinum alloy thin wire, the cyclic voltammogram was measured in the same manner as in the first embodiment.
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[0082] Further, TCR's (R.sub.100 and R.sub.0) of the platinum-tungsten alloy thin wire of this embodiment were measured, and the results showed that the difference was within the range of 0.5% with respect to a platinum-tungsten alloy thin wire of the same composition which was manufactured from an element wire without coating.
Fifth Embodiment
[0083] In this embodiment, platinum alloy was drawing-processed. In this regard, element wires having a diameter of 500 m of platinum-nickel alloy (Pt-7% by mass Ni alloy) and platinum-iridium alloy (Pt-10% by mass Ir alloy) were coated with gold in an amount of 420 ppm in terms of an element wire mass ratio (equivalent to a thickness of 58 nm) to manufacture a thin wire. The drawing speed was set to 50 m/min.
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INDUSTRIAL APPLICABILITY
[0085] As described above, according to the present invention, a product of high quality can be manufactured while breakage during processing is suppressed in manufacturing of a platinum-based material thin wire by drawing processing. The present invention can adapt to reduction of the wire diameter of a thin wire, so that a thin wire having a wire diameter of 10 m can be efficiently produced. The thin wire according to the present invention can be used for sensors such as hydrogen gas sensors, and other various articles such as medical equipment and devices, various electrodes, heaters and probe pins.