METHOD FOR PRODUCING A RADIATION-EMITTING COMPONENT, AND RADIATION-EMITTING COMPONENT

Abstract

The invention relates a method for producing a radiation-emitting component including a step A, in which a laser having an optical resonator and an output mirror is provided, wherein during the intended operation, laser radiation exits the optical resonator via the output mirror. In a step B), a photoresist layer is applied to the output mirror. In a step C), an optical structure is generated from the photoresist layer by means of a 3D lithography method, wherein the optical structure is designed to influence the beam path of the laser radiation by refraction and/or reflection.

Claims

1. A method for producing a radiation-emitting component, comprising the steps: A) providing a laser having an optical resonator and an output mirror, via which laser radiation from the optical resonator exits during the intended operation; B) applying a photoresist layer to the output mirror; C) generating an optical structure in the photoresist layer by 3D lithography process, wherein the optical structure is configured to influence the beam path of the laser radiation by refraction and/or reflection.

2. The method as claimed in claim 1, wherein the 3D lithography process is a two-photon lithography process or a multi-photon lithography process.

3. The method as claimed in claim 1, wherein the optical structure is produced at a distance of at least 1 m and not more than 50 m from the output mirror.

4. The method as claimed in claim 3, wherein before step B), at least one interface layer is applied to the output mirror so that the 3D photoresist layer is at a distance of at least 1 m from the output mirror, the interface layer has a different material composition than the photoresist layer.

5. The method as claimed in claim 1, wherein a plurality of optical structures are each produced by the 3D lithography process, the optical structures are arranged one behind the other in the beam direction of the laser radiation, an intermediate space is formed between two optical structures.

6. The method as claimed in claim 5, wherein the plurality of optical structures are produced from a single, contiguous photoresist layer.

7. The method as claimed in claim 5, wherein two optical structures are created from two photoresist layers applied consecutively and one behind the other in the beam direction, the photoresist layer applied further away from the output mirror is only applied after the optical structure has been created in the photoresist layer applied closer to the output mirror.

8. The method as claimed in claim 7, wherein an interface layer is applied between the consecutively applied photoresist layers, which has a different material composition than the photoresist layers.

9. The method as claimed in claim 1, wherein the laser is a laser diode, the output mirror is a facet of a semiconductor body.

10. The method as claimed in claim 1, wherein the optical structure is a lens for deflecting the laser radiation.

11. The method as claimed in claim 1, wherein the optical structure is a wavelength-selective optical element having a plurality of single layers arranged one behind another and intermediate spaces between the individual layers.

12. The method as claimed in claim 1, wherein in step A), a plurality of lasers are provided, each with a resonator and an output mirror, in step B) the photoresist layer is applied to the output mirrors of a plurality of lasers as a contiguous layer.

13. The method as claimed in claim 12, wherein in step C), a separate optical structure is inserted into the photoresist layer for each laser or for different groups of lasers.

14. A radiating-emitting component, comprising: a laser having an optical resonator and an output mirror, via which a laser radiation from the optical resonator exits during an intended operation, an optical structure on the output mirror, wherein the optical structure is designed to influence a beam path of the laser radiation emerging from the output mirror by refraction and/or reflection, the optical structure comprises a cured photoresist material.

15. The radiating-emitting component as claimed in claim 14, wherein the optical structure is a lens with a curved radiation entry surface and/or a curved radiation exit surface.

16. The radiating-emitting component as claimed in claim 14, wherein the optical structure is a wavelength-selective optical element having a plurality of single layers arranged one behind another, and intermediate spaces between the individual layers.

17. The radiating-emitting component as claimed in claim 14, wherein the optical structure is produced by means of a 3D lithography process.

18. The radiating-emitting component as claimed in claim 14, wherein the optical structure is surrounded in directions parallel to a main extension plane of the output mirror by a stabilization layer made of the cured photoresist material and is in direct contact with the stabilization layer.

19. The radiating-emitting component as claimed in claim 18, wherein between the optical structure and the stabilization layer one or more channels are arranged, which extend transverse or perpendicular to the main extension plane of the output mirror.

Description

[0065] In the drawings:

[0066] FIGS. 1A to 1C show different positions in an exemplary embodiment of the method for producing a radiation-emitting component,

[0067] FIGS. 2A to 5G show exemplary embodiments of a radiation-emitting component in side view and plan view.

[0068] FIG. 1A shows a first position in the method, in which a laser 1 is provided. The laser 1 comprises a resonator 10 and an output mirror 11. In the intended operation of the laser 1, laser radiation 11 exits from the resonator 10 via the output mirror.

[0069] A photoresist layer 2 is applied to the output mirror 11. The photoresist layer 2 comprises a polymer or an epoxy resin, for example.

[0070] FIG. 1B shows a second position of the method. A 3D lithography process is applied to the photoresist layer 2. It is apparent how the focal point of a laser beam 4 of a second laser reproduces a three-dimensional optical structure 3 within the photoresist layer 2. The incidence of the laser beam 4 alters the chemical structure of the photoresist layer 2. For example, in the present case a two-photon lithography process is used, in which a chemical alteration of the photoresist layer 2 occurs only in the area of the focal point of the laser beam 4. This allows areas inside the photoresist layer 2 to be exposed and chemically altered without any exposure or chemical change occurring along the laser beam 4 as a whole.

[0071] FIG. 1C shows a third position of the method. After the exposure of the photoresist layer 2 with the laser beam 4, the photoresist layer 2 has been developed. For this purpose, for example, a solvent was introduced into the photoresist layer 2. The non-exposed areas have been dissolved away by the solvent. Only the optical structure 3, which is reproduced by the focal point of the laser beam 4, remains.

[0072] In this case, optical structure 3 is a bi-convex lens, which covers part of the output mirror 11 and is arranged in the beam path of the laser radiation emerging from the laser 1 (dashed arrow). Both a radiation entry surface 32 and a radiation exit surface 33 have an end-to-end convex curvature.

[0073] FIG. 1C shows a finished radiation-emitting component 100.

[0074] FIG. 2A shows the radiation-emitting component 100 of FIG. 1C once again. A side view of the component 100 is shown on the left. On the right, the plan view of the output mirror 11 is shown. In the image on the right therefore, the laser radiation exits from the plane of the drawing.

[0075] As can be seen in the plan view of the right-hand picture of FIG. 2A, the optical structure 3 is completely surrounded laterally by a stabilization layer 34. The stabilization layer 34 consists of the cured material of the photoresist layer 2. The regions of the stabilization layer 34 have also been exposed, for example. The laser beam emitted from the laser 1 only passes through the optical structure 3, but not the stabilization layer 34. The stabilization layer 34 is in direct contact with the optical structure 3 and stabilizes the optical structure 3 on the output mirror 11. The stabilization layer 34 together with the optical structure 3 cover, for example, at least 75% of the output mirror 11.

[0076] Between the optical structure 3 and the stabilization layer 34, cavities 35 or channels 35 are formed, via which the solvent can also reach behind the optical structure 3 during the development process.

[0077] FIG. 2B shows another exemplary embodiment of a radiation-emitting component 100 in side view and plan view. In this case, the optical structure 3 is a plane-convex lens, wherein the radiation entry surface 32 is planar within the manufacturing tolerance and the radiation exit surface 33 has an end-to-end convex curvature. The radiation entry surface 32 is in direct contact with the output mirror 11.

[0078] FIG. 2C shows another exemplary embodiment of a radiation-emitting component 100 in side view and plan view. The manufacturing process described above is used to produce a plurality of optical structures 3, each in the form of a lens. The optical structures 3 are produced from a single, contiguous photoresist layer 2. The lenses 3 are arranged one behind the other along the beam direction, so that in the intended operation the laser radiation emerging from the resonator 10 passes through all lenses 3 in succession. The lenses 3 are spaced apart from each other by an intermediate space 30. For example, the intermediate space 30 is filled with air. The lenses 3 are connected together.

[0079] The first lens 3, viewed along the beam direction, is a plane-concave lens. The second lens 3 is a bi-convex lens. The third lens 3 is a plane-convex lens. The three lenses together form a micro-objective.

[0080] FIG. 3 shows a further exemplary embodiment of a radiation-emitting component 100 in side view, in which the optical structure 3, here a plane-convex lens, arranged closest to the output mirror 11 is separated from the output mirror 11 by an interface layer 20. The interface layer 20 is between 1 m and 20 m thick, for example. In particular, the interface layer 20 can be a passivation layer, for example made of aluminum oxide or silicon nitride. Because the optical structure 3 is separated from the output mirror 11, the intensity of the laser radiation incident on the material of the optical structure 3 is reduced, which reduces the risk of damage to the optical structure 3.

[0081] A covering layer 21 is applied to the side of the optical structure 3 facing away from the output mirror 11. The covering layer 21 completely covers the optical structure 3. The covering layer 21 can again be a passivation layer, for example, made of one of the above-mentioned materials, and can be used to protect the optical structure 3.

[0082] The covering layer 21 and the interface layer 20 preferably consist of a material transparent to the laser radiation of the laser 1.

[0083] FIG. 4 shows another exemplary embodiment of a radiation-emitting component 100 viewed from above the output mirror 11 or from above the radiation-emitting surface 33 of the optical structure 3. Again, it is apparent that the optical structure 3 is surrounded on all sides by the stabilization layer 34 formed by the cured photoresist. In addition, it is apparent that the laser 1 comprises a ridge 13 (so-called ridge-type laser). The ridge 13 is also covered by the stabilization layer 34. The radiation exit surface 33 is elliptical.

[0084] In each of FIGS. 5A to 5G, the laser 1 is either a laser diode or a semiconductor laser. The resonator 10 is formed by a semiconductor body 12. The laser 1 comprises two opposing output mirrors 11, which are each formed by facets or fracture surfaces of the semiconductor body 12. In all of the exemplary embodiments described above, the laser can be such a semiconductor laser.

[0085] The semiconductor body 12 comprises semiconductor layers 16, between which an active layer 17 is formed. During operation, the laser radiation is generated in the active layer 17. The semiconductor layers 16 act as waveguides. The semiconductor layers 16 and the active layer 17 are arranged on a substrate 18, such as a growth substrate. A first electrode 15 and a second electrode 19 are provided on the upper and lower sides of the semiconductor body 12 for electrically contacting the laser 1.

[0086] In the exemplary embodiment shown in FIG. 5A, an optical structure 3 in the form of a plane-convex lens is formed on a first output mirror 11. The plane-convex lens is arranged in the region of the active layer 17. In directions parallel to the main extension plane of the output mirror 11, the optical structure 3 is again surrounded by the stabilization layer 34.

[0087] FIG. 5B shows a further exemplary embodiment of a radiation-emitting component 100. The component 100 of FIG. 5B comprises the same elements as the component 100 of FIG. 5A. In addition, a covering layer 21 is provided on the optical structure 3. A covering layer 21 is also provided on the second output mirror 11 on the opposite side.

[0088] In FIG. 5C, in contrast to FIG. 5B, a further interface layer 20 is arranged between the optical structure 3 and the semiconductor body 12.

[0089] In the exemplary embodiment of FIG. 5D, two optical structures 3 are provided, arranged one behind the other in the direction of the beam. The optical structures 3 are manufactured from different photoresist layers 2. The optical structures 3 are separated from each other by an interface layer 20.

[0090] The exemplary embodiment of FIG. 5E comprises the same components as the component 100 of FIG. 5D. In addition, however, a further optical structure 3 made from a photoresist layer 2 is produced on the second output mirror 11. The optical structure 3 is a wavelength-selective optical element having a plurality of individual layers 31 of the photoresist material. The individual layers 31 are connected together and are formed from a single, contiguous photoresist layer 2. The individual layers 31 are separated from each other by gas-filled intermediate spaces 30. The optical structure 3 is, for example, a Bragg mirror for the laser radiation emitted from the laser 1 in the region of the second output mirror 11.

[0091] FIG. 5F shows an exemplary embodiment in which again a plurality of optical structures 3, each in the form of lenses, are formed on one of the output mirrors 11. The lenses 3 are formed from a single, contiguous photoresist layer 2. Between the lenses 3, gas-filled or air-filled intermediate spaces 30 are formed.

[0092] The exemplary embodiment of FIG. 5G corresponds essentially to the exemplary embodiment of FIG. 5F. Unlike in FIG. 5F, however, an interface layer 20 is provided between the optical structures 3 and the output mirror 11. A covering layer 21 is attached on a side of the optical structures 3 facing away from the output mirror 11. A further covering layer 21 is arranged on the second output mirror 11.

[0093] This patent application claims the priority of the German patent application 10 2017 128 824.4, the disclosed content of which is incorporated here by reference.

[0094] The invention is not limited to the embodiments by the fact that the description is based on them. Rather, the invention comprises each new feature, as well as any combination of features, which includes in particular every combination of features in the patent claims, even if these features or this combination itself is not explicitly specified in the patent claims or exemplary embodiments.

LIST OF REFERENCE SIGNS

[0095] 1 laser [0096] 2 3D lithography layer [0097] 3 optical structure [0098] 4 light beam [0099] 10 resonator [0100] 11 output mirror [0101] 12 semiconductor body [0102] 13 ridge [0103] 15 first electrode [0104] 16 semiconductor layer [0105] 17 active layer [0106] 18 substrate [0107] 19 second electrode [0108] 20 interface layer [0109] 21 covering layer [0110] 30 intermediate space [0111] 31 single layer [0112] 32 radiation entry surface [0113] 33 radiation exit surface [0114] 34 stabilizing layer [0115] 35 channel [0116] 100 radiation-emitting component