Coating Having Solar Control Properties for a Substrate, and Method and System for Depositing Said Coating on the Substrate
20230038481 · 2023-02-09
Inventors
- Mario Miki Yoshida (Chihuahua, MX)
- Patricia Amezaga Madrid (Chihuahua, MX)
- Wilber Antunez Florez (Chihuahua, MX)
- Miguel Arroyo Ortega (Guadalupe, MX)
- Sandra Viridiana Flores Arevalo (Monterrey, MX)
- Zoulfia Nagamedianova (San Pedro Garza Garcia, MX)
- Pedro Piza Ruiz (Chihuahua, MX)
- Rosa Elena Ramirez Garcia (San Nicolas de los Garza, MX)
- Oscar Vega Becerra (Apodaca, MX)
Cpc classification
C03C17/3681
CHEMISTRY; METALLURGY
C03C17/3642
CHEMISTRY; METALLURGY
C23C16/407
CHEMISTRY; METALLURGY
C23C16/4486
CHEMISTRY; METALLURGY
International classification
Abstract
The present invention relates to coating glass for architectural or automotive use, either monolithic or laminated, having solar control properties. The coating consists of several layers of different metal oxide semiconductors (TiO.sub.2, ZnO, ZrO.sub.2, SnO.sub.2, Al.sub.2O.sub.3) and a layer of metallic nanoparticles, which when superimposed on a pre-established order give the glass solar control properties. In particular the use of protective layers of n-type semiconductors around the metallic nanoparticles layer. It also relates to the method for obtaining the coating by means of the aerosol-assisted chemical vapor deposition technique, using precursor solutions containing an organic or inorganic salt (acetates, acetylacetonates, halides, nitrates) of the applicable elements and an appropriate solvent (water, alcohol, acetone, acetylacetone, etc.). The synthesis is performed at a temperature between 100 and 600° C. depending on the material to be deposited. A nebulizer converts the precursor solution into an aerosol which is submitted with a gas to the substrate surface, where due to the temperature the thermal decomposition of the precursor occurs and the deposition of each layer of the coating occurs.
Claims
1. A system for depositing a solar control coating on a substrate comprising: a) a heating system configured to heat the substrate; b) a nebulizer coupled to the heating system, which includes an outlet nozzle of a precursor solution for depositing a precursor solution on the substrate surface; c) a nozzle drive system coupled to the outlet nozzle to move the outlet nozzle above the substrate configured to deposit the precursor solution uniformly over the entire substrate surface thereby forming a uniform coating; and d) a gas extraction system configured to avoid contamination of the deposited coating.
2. The system for depositing a solar control coating on a substrate according to claim 1, wherein the nebulizer is pneumatic, electrostatic, or ultrasonic type.
3. The system for depositing a solar control coating on a substrate according to claim 1, wherein the heating system is configured to heat the substrate to a temperature between 100° C. and 600° C.
4. The system for depositing a solar control coating on a substrate according to claim 1, wherein the nozzle drive system is configured enable the outlet nozzle to travel at a speed of from 0.1 to 5 cm/min thereby permitting varying the thickness of the coating.
5. The system for depositing a solar control coating on a substrate according to claim 1, wherein the nebulizer utilizes an aerosol-assisted chemical vapor deposition (AACVD) technique.
6. The system for depositing a solar control coating on a substrate according to claim 1, wherein the concentration of the precursor solution is from 0.001 to 0.2 mol.Math.dm.sup.−3.
7. The system for depositing a solar control coating on a substrate according to claim 1, wherein the nebulizer includes a flow controller and a pressure regulator for introducing a carrier gas mixed with the precursor solution.
8. The system for depositing a solar control coating on a substrate according to claim 7, wherein the carrier gas is air, argon, nitrogen, or a similar gas.
9. The system for depositing a solar control coating on a substrate according to claim 1, wherein the heating means comprises a heating plate.
10. The system for depositing a solar control coating on a substrate according to claim 1, wherein the heating means comprises a chamber.
11. The system for depositing a solar control coating on a substrate according to claim 1, wherein the precursor solution comprises organometallic precursors or inorganic compounds.
12. The system for depositing a solar control coating on a substrate according to claim 10, wherein the inorganic or organometallic precursors are acetates, acetylacetonates, chlorides, nitrates, or halides.
13. The system for depositing a solar control coating on a substrate according to claim 1, wherein the solar control coating comprises: i) a first active protective layer residing over one surface of the substrate; ii) a non-continuous metallic nanoparticle layer residing over said first active protective layer; iii) a second active protective layer residing over said metallic nanoparticle layer; and iv) a dielectric layer.
14. The system for depositing a solar control coating on a substrate according to claim 13, wherein the non-continuous metallic nanoparticle layer comprises metallic nanoparticles that are uniformly and homogeneously distributed in the first layer of the substrate.
15. The system for depositing a solar control coating on a substrate according to claim 13, wherein the non-continuous metallic metallic nanoparticle layer comprises gold (Au), silver (Ag), platinum (Pt) or palladium (Pd).
16. The system for depositing a solar control coating on a substrate according to claim 13, wherein the non-continuous metallic nanoparticle layer comprises metallic nanoparticles having a diameter of less than 30 nm.
17. The system for depositing a solar control coating on a substrate according to claim 13, wherein the dielectric layer comprises Al.sub.2O.sub.3.
18. The system for depositing a solar control coating on a substrate according to claim 13, wherein the first active protective layer or the second active protective layer has a thickness in a range between 10 and 70 nm.
19. The system for depositing a solar control coating on a substrate according to claim 13, wherein the first active protective layer and second active protective layer comprise a metal oxide.
20. The system for depositing a solar control coating on a substrate according to claim 19, wherein said metal oxide comprises titanium or zinc.
Description
BRIEF DESCRIPTION OF THE FIGURES
[0025]
[0026]
[0027]
[0028]
[0029]
[0030]
[0031]
DETAILED DESCRIPTION OF THE INVENTION
[0032] The present invention describes coatings with solar control properties deposited on glass for architectural or automotive use, either monolithic or laminated. Solar control refers to the ability to modify the amount of transmitted, reflected and absorbed solar radiation in the solar range comprised between 300 and 2500 nm. Generally low transmittance is pursued in the UV and IRC (near-IR) ranges, while transmittance in the VIS should be high (>70%) for automotive applications or low for architectural applications. The coating is composed of two or more layers of different semiconductor metal oxides (TiO.sub.2, ZnO, ZrO.sub.2, SnO.sub.2, or Al.sub.2O.sub.3) and one or more layers of metal nanoparticles selected from Gold (Au), Silver (Ag), platinum (Pt), and palladium (Pd), uniform, non-continuous and homogeneously distributed over the entire surface of the coated substrate. As exemplified in
[0033] Examples of CS solar control structures are shown in
[0034] The example illustrated in
[0035] These properly deposited structures, with the required thickness, confer to glass solar control properties, particularly IR blocking and adequate transmittance in the VIS. In particular the use of active n-type metal-semiconductor junctions, allows injection of negative charges from the semiconductor to the metal (Schottky junction) protecting it from oxidation and also preventing its agglomeration; this allows obtaining uniform layers of homogeneously distributed metal nanoparticles over a large portion of the solar control coating intermediate surface.
[0036] Additionally, it is intended that the developed product has high mechanical, thermal and chemical resistance, sufficient to support the manufacturing processes of tempered and/or laminated glass without making changes that impair the performance of solar control. The coated products were subjected to various tests to determine industrial tempering capability by means of fracture tests, laminating (Pummel tests and boiling under customer standards and ANSI/SAE Z26.1-1996 and chemical contact resistance of samples to acid solutions. Coated glasses successfully passed all of these tests, confirming the feasibility of integrating the developed product to tempering and laminating glass manufacturing processes.
Obtention of Glasses with Solar Control
[0037] The aerosol-assisted CVD method (AACVD) is an economical, efficient and useful process for obtaining relatively thin coatings, with maximum thickness of several micrometers. It consists in producing a cloud of micrometric drops, whose diameter is in the range of 1 to 20 mm, from a solution made up by organometallic precursors (acetates, acetylacetonates) or inorganic compounds (halides, nitrates), dissolved in a particular solvent for each type of compound (water, alcohol, acetone, acetylacetone, etc.). The aerosol can be generated by pneumatic, electrostatic or ultrasonic methods. Among the most effective are ultrasonic nebulizers which generate drops with size of a few micrometers and with a closed distribution of sizes (FWHM˜10%). In these nebulizers, a drop cloud is produced by vibration (a few MHz) of a piezoelectric crystal, whose ultrasonic waves are concentrated on the surface of the solution, which generates the micrometric drop cloud by means of cavitation. Droplet size depends primarily on the frequency of the piezoelectric (inversely), as well as on surface tension and density of the solution. Drop size and essentially its size distribution decisively influences the conditions (substrate temperature, carrier gas flow) of the tank and the quality of the obtained material. A widespread drop size distribution prevents optimizing synthesis conditions, because a large drop requires different conditions to those of a droplet; resulting in an inhomogeneous and shoddy coating. The precursor solution aerosol must be transported to the storage area by a carrier gas. In the deposition area, is the glass substrate, which is heated to a specific temperature depending on the material to be deposited. The substrate temperature is the key parameter controlling the deposition of material. The optimum temperature of the process depends on the precursors used, consequently on the material to be deposited, but in general it can be said that these are relatively low, between 373 K (100° C.) and 873 K (600° C.). In obtaining a coating, in addition to the thermodynamic conditions it is necessary to verify the kinetics of the process. Since growth of the film depends on: a) the process of transporting the reactant(s) to the vicinity of the substrate surface; whereas the cloud approaches the substrate it warms up initially causing solvent evaporation, melting, evaporation or eventually sublimation, or thermal decomposition of the precursor compound, and thereafter its diffusion towards the surface. b) Kinetic processes on the substrate surface, where the following processes are required in succession: reactant adsorption, diffusion and convergence on the substrate surface, chemical reaction, diffusion, and desorption off the surface of the chemical reaction products and disposal away from the surface, to avoid contamination of the deposited material.
Description of the Obtention System
[0038]
[0039] a) A heating plate or chamber (23) for elevating the temperature of the glass substrate to the deposition temperature between 100 and 600° C. The heating system comprises a temperature control (not shown in the figure) that allows keeping temperature constant throughout the deposition process. Moreover, heating shall be uniform throughout the glass surface.
[0040] b) A nebulizer (19) which may be of pneumatic, electrostatic or ultrasonic type. The carrier gas (16) with its pressure regulator (17) and flow controller (18) and finally the aerosol exit nozzle (20) towards the substrate surface (22).
[0041] c) The nozzle drive system (21) permits distributing the precursor solution over the entire surface of the substrate in order to obtain uniform coatings. The nozzle (20) is mounted on the nozzle drive system (21) having controlled movement (0.1 to 5 cm) allowing even distribution of the precursor solution over the whole substrate surface, in order to obtain uniform coatings.
[0042] The gas extraction system (24) to prevent contamination of the deposited coating.
Preparation of the Precursor Solution
[0043] The precursors are mainly organometalic salts of the elements of interest and as solvent, one suited to each salt was used, preferably aqueous or alcoholic solutions were used due to their advantageous features for aspersion (methanol, ethanol, and triple distilled water), concentrations used were from 0.001 to 0.2 mol/dm.sup.3 Precursors for introducing dopants were also organometallic salts. Dopant concentration will range from 1% atomic up to the solubility limit of the dopant relative to the base material, which may be up to 10-40% atomic. Complete dissolution of the precursor used by means of suitable stirring, heating and/or ultrasound shall be ensured.
Application Method
[0044] The synthesis starts with the preparation of the precursor solution containing an organic or inorganic salt containing the element of interest, for example a chloride, nitrate, acetate or acetylacetonate, tin tetrachloride, zinc nitrate, zinc acetate, aluminum acetylacetonate, zirconium acetylacetonate; and a suitable solvent such as methanol, ethanol, acetone, water, or a mixture thereof. The concentration of the solution is in the range of 0.001 to 1.0 mol.dm.sup.−3.
[0045] The substrate (22) is fastened to the heating plate (23). The deposition temperature between 100 and 600° C. is set, and the substrate system (22) is turned on to stabilize substrate temperature. The remaining parts of the AACVD system are configured: nebulizer (19) and nozzle (20). The carrier gas (16) is connected. It is important that the couplings are tight to prevent leakage of aerosol. Additionally the nozzle motion speed (20) is set between 0.1 and 5 cm/min, which allows varying the thickness of the deposited coatings. Nozzle (20) total travel length is also set, depending on the portion of the substrate that is to be covered. The gas extraction system (24) is also turned on to stabilize the temperature in the entire system.
[0046] The introduction of carrier gas (which may be air but depending on the coating argon, nitrogen or other similar gas may be used) is also started. For thermal stabilization, the flow is set between 1 and 10 L min.sup.−1. The particular value of the flow of carrier gas and the deposition temperature depend on the material to be deposited.
[0047] Additionally, the precursor solution is introduced in the nebulizer (19). If necessary for long deposition times a larger amount of solution can be added during deposition, using a peristaltic pump (15). A commercial ultrasonic nebulizer (19), operating at 2.4 MHz high frequency was used in tests.
[0048] Upon reaching the thermal stability of the whole system, the process proceeds by turning on the nebulizer (19), generating the aerosol cloud of the precursor solution; simultaneously displacement of nozzle (20) via the nozzle drive system (21) is started. The generated cloud enters the nozzle (20). In the nozzle (20), the precursor solution and carrier gas mixture rises in temperature to between 50 and 150° C.; this preheating to a temperature lower than synthesis temperature ensures that the precursor reach the substrate surface (22) in the reaction zone at the temperature required for thermal decomposition and coating deposition is carried out in optimal conditions. In the substrate surface (22), physical transformations and precursor chemical decomposition are carried out by action of the temperature, yielding a well bonded, high purity coating on its surface. Forming of the thin film on the substrate surface (22) occurs after the thermal decomposition of the precursor, for this reason the surface temperature has a major role in obtaining the material of interest. Additionally, changing the nozzle travel speed allows obtaining thin films of different thicknesses.
[0049] Once the chemical reaction takes place and reaction gases are generated, they are evacuated by an extraction system (24), to avoid contamination of the deposited material and, thus, obtain high purity coatings. The process is repeated with each precursor to deposit all the different layers of the coating.
EXAMPLES OF COATED SUBSTRATES
Example 1
[0050] Using a 4 mm-thick clear glass (VC), five coating layers were deposited by the AACVD method with the following structure:
TABLE-US-00001 1 0 Material Thickness [nm] ZrO.sub.2 35 Al.sub.2O.sub.3 45 TiO.sub.2 75 Nano-Au TiO.sub.2 vc 4 mm
[0051] Optical properties in this coating solar range are summarized in the following table. Transmittances are presented in the ultraviolet (UV 300-380 nm), solar (SOL 300-2500 nm) and visible (VIS 380-780 nm) intervals.
TABLE-US-00002 % T UV SOL VIS 43 52 62
Example 2
[0052] Using a 4 mm-thick clear glass, seven coating layers were deposited by the AACVD method, with the following structure:
TABLE-US-00003 Material Thickness TiO.sub.2 134 Al.sub.2O.sub.3 106 TiO.sub.2 97 Nano-Au TiO.sub.2 Al.sub.2O.sub.3 101 . . . TiO.sub.2 68 V 4 mm
[0053] The transmittance values at ultraviolet (UV 300-380 nm), solar (SOL 300-2500 nm) and visible (VIS 380-780 nm) intervals of this coating are:
TABLE-US-00004 % T UV SOL VIS 36 42 56
[0054]
[0055] (% R), and absorbance (% A) of a typical solar control coating, with the structure of Example 2 (VC/TiO.sub.2/Al.sub.2O.sub.3/TiO.sub.2/Nano-Au/Al.sub.2O.sub.3/TiO.sub.2). A vertical arrow indicates the position of the absorption peak in the IRC around 1000 nm.
Example 3
[0056] Using a 4 mm thick clear glass, eight coating layers were deposited by the AACVD coating method under the following structure:
TABLE-US-00005 Material Thickness SnO.sub.2 66 Al.sub.2O.sub.3 249 TiO.sub.2 86 Nano-Ag TiO.sub.2 Al.sub.2O.sub.3 114 ZrO.sub.2 69 ZnO 54 VC 4 mm
[0057] The transmittances at ultraviolet (UV 300-380 nm), solar (SOL 300-2500 nm) and visible (VIS 380-780 nm) intervals of this coating are:
TABLE-US-00006 % T UV SOL VIS 31 52 63
[0058]
[0059] The coating applied to the 4 mm clear glass was subjected to bending and tempering process in an industrial tempering furnace in the range of maximum temperatures of
[0060] 680-700° C. and quenching by ambient temperature air, with no changes in visual aspect and solar control performance. Due to the tempering process applied to the samples, a surface compressive stress (8,300 to 10,100 lb/in.sup.2) and a tension stress at half the thickness of the sample (1,200 to 1,800 lb/in.sup.2) were generated, providing the tempering effect of safety glass. The stresses generated are within the range of automotive regulations with acceptable values of compression>8,000 lb/in.sup.2 for compression and <4,500 lb/in.sup.2 for tension stress. The fracture test applied to the tempered sample showed positive results with an acceptable pattern according to automotive standards confirming the feasibility of integrating the new product to tempering processes.
[0061] Moreover, the coating was deposited on a 2 mm-thick clear glass sample and was laminated with the coated face at the inside of the structure with another 2 mm-thick uncoated clear substrate with a sheet of polyvinyl butyral between both glass substrates, and subjected to the conditions of automotive laminating industrial process. A laminated product of high visual quality with no air bubbles was obtained. The laminate was subjected to adhesion testing which involves maintaining the product at temperatures below 0° C. for one hour, the test result was satisfactory. Additionally, a resistance test was conducted at high temperature and humidity according to the ANSI/SAE 226.1-1996 standard, the sample passed the test successfully. In conclusion, the developed product is resistant to the automotive laminating industrial processes.
[0062] Another very important test for outdoor use glass is the chemical resistance to contact with acidic solutions test. The specimens showed no visual change after contact with acid in the following conditions: [0063] a) 3.5% HCl for 15 min at 22° C.; [0064] b)3.7% HCl for 5 min at 22° C.
[0065] From the foregoing, a coating with solar control properties and a method for depositing said coating on glass substrates has been described, and it will be apparent to those skilled in the trade that other possible improvements can be made, which may be considered within the field determined by the following claims.