MICROMECHANICAL DEVICE AND CORRESPONDING PRODUCTION METHOD

Abstract

A micromechanical apparatus and a corresponding production method are described. The micromechanical apparatus encompasses a base substrate having a front side and a rear side; and a cap substrate, at least one surrounding trench having non-flat side walls being embodied in the front side of the base substrate; the front side of the base substrate and the trench being coated with at least one metal layer; the non-flat side walls of the trench being covered nonconformingly with the metal so that they do not form an electrical current path in a direction extending perpendicularly to the front side; and a closure, in particular a seal-glass closure, being embodied in the region of the trench between the base substrate and the cap substrate.

Claims

1-8. (canceled)

9. A micromechanical apparatus, comprising: a base substrate having a front side and a rear side, the base substrate includes at least one surrounding trench having non-flat side walls embodied in the front side of the base substrate, the front side of the base substrate and the trench are coated with at least one metal layer, and the non-flat side walls of the trench are covered nonconformingly with metal of the metal layer so that the non-flat side walls of the trench do not form an electrical current path in a direction extending perpendicularly to the front side; and a cap substrate; and a seal-glass closure embodied in the region of the trench between the base substrate and the cap substrate.

10. The micromechanical apparatus as recited in claim 9, the metal layer encompasses at least one metal from the group consisting of aluminum, silver, and gold.

11. The micromechanical apparatus as recited in claim 9, wherein the front side of the base substrate and the trench are coated with two different metal layers.

12. The micromechanical apparatus as recited in claim 11, wherein the front side of the base substrate and the trench are coated with a metal layer made of silver, on which a metal layer made of aluminum is applied.

13. The micromechanical apparatus as recited in claim 9, wherein the trench has a width from 10 micrometers to 100 micrometers and a depth from 20 micrometers to 200 micrometers.

14. The micromechanical apparatus as recited in claim 9, wherein the non-flat side walls of the trench have a plurality of recesses.

15. The micromechanical apparatus as recited in claim 14, wherein each of the recesses has a depth from 1 micrometer to 10 micrometers.

16. The micromechanical apparatus as recited in claim 9, wherein the seal-glass closure completely covers the trench.

17. A method for producing a micromechanical apparatus, comprising the following steps: furnishing a base substrate having a front side and a rear side, the base substrate including at least one surrounding trench having non-flat side walls embodied in the front side of the base substrate, the front side of the base substrate and the trench being coated with at least one metal layer, the non-flat side walls of the trench being covered nonconformingly with metal of the metal layer so that the non-flat side walls do not form an electrical current path in a direction extending perpendicularly to the front side; furnishing a cap substrate; and providing a seal-glass closure in a region of the trench between the base substrate and the cap substrate.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0014] The present invention is explained in further detail below with reference to the exemplifying embodiments shown in the figures.

[0015] FIG. 1 is a schematic depiction, in cross section, to explain a micromechanical apparatus in accordance with a first embodiment of the present invention.

[0016] FIG. 2 is a schematic depiction, in a plan view, to explain a micromechanical apparatus in accordance with the first embodiment of the present invention, shown without a cap substrate.

[0017] FIG. 3 is a schematic flow chart to explain a method for producing a micromechanical apparatus in accordance with a second embodiment.

DETAILED DESCRIPTION OF EXAMPLE EMBODIMENTS

[0018] In the Figures, identical reference characters refer to identical or functionally identical elements.

[0019] FIG. 1 is a schematic depiction, in cross section, to explain a micromechanical apparatus in accordance with a first embodiment of the present invention.

[0020] In FIG. 1, the reference character 1 identifies the micromechanical apparatus, which has a base substrate 2 having a front side V and a rear side R. The reference character 2a identifies a cap substrate, 3 a surrounding trench, 3a non-flat side walls of trench 3, 4 a first metal layer and 4a a second metal layer, 5 a seal-glass closure, and 6 an interrupted current path along the non-flat side walls 3a as a result of a nonconforming embodiment of metal layers 4, 4a.

[0021] One conventional method for galvanically disconnecting a metal layer and/or several metal layers is selective removal of the metal in certain regions, i.e., patterning of the metal, for instance by lithography and subsequent etching.

[0022] The example embodiment of the present invention includes avoidance of a lithography and etching step of this kind, by the fact that even before first metal layer 4 and additional metal layer 4a are applied onto front side V of base substrate 2, surrounding trench 3 is embodied with non-flat side walls 3a, the non-flat side walls 3a being nonconformingly covered during subsequent deposition of first metal layer 4 and additional metal layer 4a. For instance, a trench 3 that is 35 micrometers wide and 90 micrometers deep is etched surroundingly in the region of front side V of base substrate into the silicon, by trenching or DRIE.

[0023] Side walls 3a of this trench 3 exhibit the recesses that are typical of this trenching process. First metal 4 and second metal 4a that are applied via a sputtering process into these local recesses are deposited nonconformingly, i.e., only onto the underside of the recesses. Current path 6 between the environment and the encapsulated interior is thereby interrupted, and a redox reaction that might cause intermetallic corrosion therefore cannot proceed in the interior.

[0024] The advantages of this pre-patterning of base substrate 2 are the elimination of the working steps necessary for production of a resist mask (such as application, exposure, development, in-process monitoring, heating), and elimination of the need for metal etching, which reduces process costs; as well as elimination of the working steps required for removal of the resist mask, e.g., combustion in oxygen plasma, special wet cleaning, in-process monitoring, or baking out. The result of omitting the aforementioned process steps is reduced stress on the metal layer. It is thereby possible to avoid contaminants, increased surface roughness, local surface etching, contamination, changes in optical properties, temperature stress, scratches, and changes in chemical properties resulting, for instance, from attack by oxygen radicals during combustion of the resist mask. Lithography is furthermore not possible in some process states of base substrate 2, and this need for metal patterning is thus completely eliminated.

[0025] A trench 3 produced by deep reactive ion etching (DRIE), or a trenching process, has on its side walls 3a the local micro-scale recesses that do not become occupied upon deposition of dissimilar metals 4 and 4a by cathodic atomization or sputtering. As a result, the current path between the two sides of trench 3 is interrupted or exhibits high resistance. Corresponding resistance measurements show an electrical resistance of approximately 600 kilohms for the trench structure, as opposed to 2 ohms without trench 3.

[0026] FIG. 2 is a schematic depiction, in a plan view, to explain a micromechanical apparatus in accordance with the first embodiment of the present invention, shown without a cap substrate.

[0027] The above-described functionality of trench 3 is utilized by the present invention to disconnect the current path between the external environment exposed to environmental influences, and the interior packaged in hermetically sealed fashion. For instance, contact between base substrate 2 and an electrolyte-containing medium, for example an NaCl solution, can cause intermetallic corrosion if a first metal was deposited as first metal layer 4 and a second metal as second metal layer 4a, as in the case of a silver/aluminum stack. Intermetallic corrosion thus can no longer take place in the interior, since the electron transfer necessary for it is interrupted. In terms of electrochemistry, corrosion principally involves redox reactions of metals under the influence of water, salt solutions, and acids, and between dissimilar metals.

[0028] Seal-glass closure 5, which becomes drawn into trench 3 by cohesive forces during the joining process and produces a moisture-tight closure, is used, for instance, to produce hermetic sealing of the interior with respect to the environment.

[0029] FIG. 3 is a schematic flow chart to explain a method for producing a micromechanical apparatus, having a microchip with decreased sensitivity to metal corrosion, in accordance with a second embodiment.

[0030] In a step S01, a base substrate 2 is furnished. In a step S02, at least one surrounding trench 3 having non-flat side walls 3a is embodied in this base substrate 2, and in a step S03, base substrate 2 and trench 3 are coated with a first metal layer 4 made, for example, of silver. In a step S04, further coating can occur with at least one further metal layer 4a that has a metal (e.g. aluminum) that is dissimilar to the metal of first metal 4; and in a step S05, seal-glass closure 5 is constituted in conventional fashion in the region of trench 3.

[0031] Although the present invention has been described with reference to preferred exemplifying embodiments, it is not limited thereto. In particular, the materials and topologies that are recited are merely examples and are not limited to the examples explained.

[0032] Particularly preferred further applications for the micromechanical apparatus according to the present invention are, for example, in applications involving increased environmental influences or chemically reactive atmospheres.