STAMP REPLICATION DEVICE AND METHOD FOR PRODUCING A HOLDING MEANS FOR A STAMP REPLICATION DEVICE AS WELL AS A STAMP

Abstract

A stamp replication device for producing stamps for the production of at least one of microstructured and nanostructured components has a platform, a cover that is positionable on the platform and a holding device for a stamp carrier, wherein the holding device is provided on the cover or on the platform and includes a carrier as well as a microstructured vacuum surface on the carrier for holding the stamp carrier. In addition, a method for producing a holding device for a stamp replication device as well as a method for producing a stamp are specified.

Claims

1: A stamp replication device for producing stamps for the production of at least one of microstructured and nanostructured components comprising a platform, a cover that is positionable on the platform and a holding device for a stamp carrier, wherein the holding device is provided on the cover or on the platform and comprises a carrier as well as a microstructured vacuum surface on the carrier for holding the stamp carrier.

2: The stamp replication device according to claim 1, wherein the individual structures of the microstructured vacuum surface have a feature size of no greater than 50 m

3: The stamp replication device according to claim 1, wherein the microstructured vacuum surface comprise a statistical structuring.

4: The stamp replication device according to claim 1, wherein the microstructured vacuum surface comprises micro-vacuum channels that extend over the surface of the holding device.

5: The stamp replication device according to claim 4, wherein at least one of the depth and the width of the micro-vacuum channels are in each case smaller than 50 m.

6: The stamp replication device according to claim 4, wherein the micro-vacuum channels run radially on the holding device seen in top view.

7: The stamp replication device according to claim 4, wherein the micro-vacuum channels run in a lattice shape on the holding device seen in top view.

8: The stamp replication device according to claim 4, wherein the micro-vacuum channels are provided at regular intervals, wherein a web is provided between two micro-vacuum channels in each case.

9: The stamp replication device according to claim 8, wherein the pitch of the microstructured vacuum surface being the width of one of said micro-vacuum channels and the adjacent web is less than or equal to 50 m.

10: The stamp replication device according to claim 8, wherein a width of the micro-vacuum channels is a maximum of 90% of the pitch.

11: The stamp replication device according to claim 10, wherein a depth of the micro-vacuum channels is no greater than ten times the width of the micro-vacuum channels.

12: The stamp replication device according to claim 1, wherein the holding device comprises a macroscopic vacuum channel, wherein the vacuum surface is fluidly connected to the vacuum channel.

13: The stamp replication device according to claim 1, wherein the holding device comprises a macroscopic vacuum channel, wherein the vacuum channel completely surrounds the microstructured vacuum surface.

14: The stamp replication device according to claim 1, wherein the stamp replication device comprises a spacing adjustment device for adjusting the spacing between the cover and the platform and a measuring device for measuring the spacing between the cover and the platform, wherein the spacing adjustment device and the measuring device are provided separately from each other.

15: The stamp replication device according to claim 1, wherein three support regions are provided on the platform for supporting the cover, wherein at least one of one of the support regions provides five degrees of freedom, another of the support regions provides four degrees of freedom and a further support region provides three degrees of freedom.

16: The stamp replication device according to claim 1, wherein the holding device is made of glass or quartz, wherein the holding device is transparent to light.

17: The stamp replication device according to claim 1, wherein the holding device is a plate that is installed in the cover.

18: The stamp replication device according to claim 1, wherein stamp replication device comprises an irradiation source for the purpose of exposing a liquid stamp material to light, wherein the irradiation source comprises at least one of a flood lamp and a collimator.

19: A method for producing a holding device for stamp replication device comprising the following steps: provision of a carrier of the holding device, and generation of a microstructured vacuum surface by at least one of applying a statistical structuring and by introducing micro-vacuum channels.

20: A method for producing a stamp for a replication device for the production of at least one of microstructured and nanostructured components in a stamp replication device, the stamp replication device comprising a platform, a cover that is positionable on the platform and a holding device for a stamp carrier, wherein the holding device is provided on the cover or on the platform and comprises a carrier as well as a microstructured vacuum surface on the carrier for holding the stamp carrier, the method comprising the following steps: positioning the stamp carrier and a molding part in the stamp replication device, applying a vacuum on the microstructured vacuum surface for the purpose of holding the stamp carrier, applying the liquid stamp material on the molding part or on the stamp carrier, positioning the cover on the platform, and curing the stamp material by exposing the stamp material to UV light.

Description

DESCRIPTION OF THE DRAWINGS

[0056] Additional advantages and features of the disclosure can be found in the following description and in the attached drawings to which reference is made. In the drawings:

[0057] FIG. 1 shows a stamp replication device according to the disclosure schematically,

[0058] FIG. 2 shows the stamp replication device from FIG. 1 in a top view,

[0059] FIG. 3 shows the stamp replication device from FIGS. 1 and 2 in a closed state,

[0060] FIG. 4 shows the cover for the stamp replication device,

[0061] FIG. 5 shows the cover according to a second embodiment of the stamp replication device,

[0062] FIG. 6 shows a section through the holding means for a stamp replication device comprising micro-vacuum channels,

[0063] FIGS. 7a to 7c show various steps in the production of a holding means for the stamp replication device,

[0064] FIG. 8 shows the cover according to a third embodiment of the stamp replication device, and

[0065] FIG. 9 shows the production of a holding means according to the third embodiment.

DETAILED DESCRIPTION

[0066] Lists having a plurality of alternatives connected by and/or, for example A, B and/or C are to be understood to disclose an arbitrary combination of the alternatives, i.e. the lists are to be read as A and/or B and/or C. The same holds true for listings with more than two items.

[0067] FIGS. 1, 2 and 3 show a stamp replication device 10 for producing stamps for the production of nanostructured and/or microstructured components schematically. The stamp replication device 10 comprises a cover 12 and a platform 14.

[0068] The cover is mounted on the platform 14 pivotably by means of hinges 16 and can be placed on the platform 14, as shown in FIG. 3.

[0069] The stamp replication device 10 comprises a spacing adjustment device 18 in order to set a defined spacing from the cover 12 to the platform 14 when the stamp replication device 10 is in a closed state. The spacing adjustment device 18 comprises, for example, three micrometer screws 20 that are preferably rounded on their ends which are directed towards the platform 14.

[0070] Three support regions 22a, 22b, 22c are provided on the platform 14 for supporting the cover 12 accordingly, in particular in each case one support region 22a, 22b, 22c for one micrometer screw 20. Thus, one of the support regions 22a provides five degrees of freedom, another of the support regions 22b provides four degrees of freedom and a further support region 22c provides three degrees of freedom.

[0071] The support regions are illustrated in FIG. 2 by dotted lines. The support region 22a is formed by a conical depression. The support region 22b is formed by a V-shaped depression. The support region 22c is formed by an area.

[0072] In addition, the stamp replication device 10 comprises a measuring device 24 for measuring the spacing between the cover 12 and the platform 14. The measuring device 24 is provided separately from the spacing adjustment device 18. Thus, the amendments in the spacing between the cover 12 and the platform 14 can be detected which are not caused by the operation of the spacing adjustment device 18. In this way, the spacing between the cover 12 and the platform 14 can be set particularly precisely.

[0073] The measuring device 24 comprises for example at least a dial indicator 25, preferably in each case one dial indicator 25 per micrometer screw 20. Each dial indicator 25 is assigned to one micrometer screw 20, but configured separately from it.

[0074] Moreover, the stamp replication device 10 comprises an irradiation source 30 for exposing a liquid stamp material to light, in particular UV light. Such an irradiation source 30 is illustrated in FIG. 3. A stamp material present in the stamp replication device 10 can be cured by exposure to light.

[0075] The irradiation source 30 can comprise a flood lamp and/or a collimator for this purpose. A stamp material can be irradiated particularly uniformly using a flood lamp and/or a collimator, which substantially impacts the quality of the finished stamp.

[0076] The cover 12 is, for example, at least partially transparent to light, in particular UV light, in order to enable the irradiation of the stamp material.

[0077] A molding part 26 employed in the stamp replication device 10 is illustrated in FIGS. 1 and 2. The molding part 26 represents the form of the stamp to be produced as a negative. The molding part 26 can be exchangeable so that different molding parts 26 can be employed for the production of different stamp geometries.

[0078] Moreover, a stamp carrier 28 employed in the stamp replication device 10 is illustrated in FIGS. 1 and 2, said stamp carrier 28 being connected to the stamp material permanently during the production of the stamp.

[0079] Both the molding part 26 and the stamp carrier 28 are held in place on the platform 14 and the cover 12 by means of a vacuum in the stamp production. This is necessary so that the stamp carrier 28 or the finished stamp do not fall out unintentionally when pivoting the cover 12 into position and so that the molding part 26 remains on the platform 14 when opening the cover 12 and does not remain stuck to the stamp.

[0080] In order to hold the stamp carrier in place, the stamp replication device 10 comprises a holding means 32 for holding the stamp carrier 28 that is provided on the cover 12 in the shown embodiment. This is shown in FIG. 2. It is however conceivable that the holding means 32 is located on the platform 14.

[0081] The holding means 32 comprises in particular a carrier 33 and a microstructured vacuum surface configured on the carrier 33.

[0082] The holding means 32, in particular the carrier 33, is for example a plate 36 that can be installed in the cover 12. Alternatively, the carrier 33 can form the cover 12 or a part of the cover 12.

[0083] In the shown embodiment, the carrier 33 is enclosed by frame 38, as can be seen in FIG. 2, wherein the frame 38 and the carrier 33 collectively form the cover 12. The frame 38 is optional, it imparts particularly good stability to the carrier 33 and the cover 12.

[0084] The carrier 33 can be made of glass or quartz, as a result of which the holding means 32 is transparent to light, in particular UV light, in particular light with a wavelength of 250 nm to 450 nm.

[0085] The holder of the molding part 26 can be carried out in a known manner, in particular also by means of a vacuum. However, no microstructured vacuum surface 34 is necessary for holding the molding part 26 as the holder of the molding part 24 does not or does not appreciably impact the quality of the stamp.

[0086] The holding means 32 comprising the microstructured vacuum surface 34 is shown in a top view in FIG. 2. The vacuum surface 34 has, for example, the contour of the stamp carrier 28 so that the stamp carrier 28 completely covers the vacuum surface 34 if it is employed in the stamp replication device 10 as intended. The stamp carrier 28 is not shown in FIG. 2 in order to facilitate a view of the microstructured vacuum surface 34.

[0087] The individual structures of the microstructured vacuum surface 34 have, for example, a feature size of no greater than 50 m, preferably no greater than 10 m.

[0088] The holding means 32 comprises a macroscopic vacuum channel 40 in order to generate the vacuum on the microstructured vacuum surface 34. This macroscopic vacuum channel 40 is fluidly connected to the microstructured vacuum surface 34. In the shown embodiment, the macroscopic vacuum channel 40 completely surrounds the microstructured vacuum surface 34. It is however conceivable that the microstructured vacuum surface 34 is only connected to the macroscopic vacuum channel 40 at certain points.

[0089] The macroscopic vacuum channel 40 is connected to a vacuum source 44 of the stamp replication device 10 via a channel 42.

[0090] A cover 12 comprising a holding means 32 according to the first embodiment is shown in FIG. 4. For better illustrative purposes, a subregion of the microstructured vacuum surface 34 formed on the carrier 33 is shown enlarged.

[0091] The microstructured vacuum surface 34 shown in FIG. 4 comprises a multitude of micro-vacuum channels 46 that extend over the surface of the holding means 32, in particular over the surface of the carrier 33.

[0092] In a top view on the holding means 32, the micro-vacuum channels 46 run in a lattice shape, wherein the micro-vacuum channels 46 are arranged at regular intervals to each other.

[0093] In FIG. 5, a cover 12 comprising a holding means 32 according to the second embodiment is illustrated.

[0094] The microstructured vacuum surface 34 shown in FIG. 5 comprises a multitude of micro-vacuum channels 46. In contrast to the microstructured vacuum surface 34 shown in FIG. 4, the micro-vacuum channels 46 according to this embodiment run radially on the holding means 32.

[0095] In addition, several annular micro-vacuum channels 48 are present which interconnect the radial micro-vacuum channels 46.

[0096] In FIG. 6, the dimensions of the micro-vacuum channels 46 are illustrated by means of a section through the holding means 32 from FIG. 4. The section view is extremely enlarged and not true to scale in order to improve the visibility of the micro-vacuum channels 46.

[0097] Preferably, the depth t and/or the width b of the micro-vacuum channels 46 are in each case smaller than 50 m, in particular smaller than 10 m.

[0098] A web 50 is provided in each case between two micro-vacuum channels 46, in particular wherein the pitch p of the microstructured vacuum surface 34 as the combined width b of one of the micro-vacuum channels 46 and the adjacent web 50 is smaller than or equal to 50 m, preferably smaller than or equal to 10 m.

[0099] To this end, the width b of the micro-vacuum channels 46 is a maximum of 90% of the pitch.

[0100] The depth t of the micro-vacuum channels 46 is no greater than ten times the width b of the micro-vacuum channels 46. In the shown embodiment, the depth t amounts to about one third of the width b.

[0101] The dimensions of the micro-vacuum channels 46 in the case of radial configuration can be accordingly as large as in the case of a lattice configuration except for the pitch. The pitch is not constant in the case of radial layout, but rather increases from the center of the micro-structured vacuum surface 34 towards the edge.

[0102] A possible method for producing a holding means 32 for stamp replication device 10 is shown in the FIGS. 7a to 7c, in particular a holding means 32 according to FIGS. 4 and 5. More specifically, the production of micro-vacuum channels 46 on a carrier 33 of the holding means 32 is shown. For simplicity, only a small section of the carrier 33 is shown in the FIGS. 7a to 7c.

[0103] Initially, a carrier 33 of the holding means 32 is provided, in particular a carrier 33 without a microstructured vacuum surface 34.

[0104] Subsequently, the microstructured vacuum surface 34 is created through the introduction of micro-vacuum channels 46. This can be carried out by a lithographic method, a laser method or an erosion method.

[0105] A lithographic method is shown in the FIGS. 7a to 7c exemplarily. To this end, a mask 51 is initially positioned on the carrier 33, as shown in FIG. 7a.

[0106] Then, the surface 52 of the carrier 33 not covered by the mask 51 is exposed to an etching medium. As a result, the material of the carrier 33 is removed to a certain extent, thereby forming the micro-vacuum channels 46, as shown in the FIGS. 7b and 7c.

[0107] In FIG. 8, a cover 12 comprising a holding means 32 according to a third embodiment is illustrated.

[0108] In the embodiment shown in FIG. 8, the microstructured vacuum surface 34 comprises a statistical structuring, in particular a random structure. Even the statistical structuring only has structures in the micrometer range, in particular smaller than 50 m.

[0109] A method for producing such a holding means 32 for a stamp replication device 10 is shown in FIG. 9.

[0110] Even in this case, the carrier 33 of the holding means 32 is initially provided without a microstructured vacuum surface 34.

[0111] Subsequently, the microstructured vacuum surface 34 is generated by applying a statistical structuring. This can be carried out by means of sand blasting, sanding, milling or etching.

[0112] In FIG. 9, the structuring is shown by means of sand blasting exemplarily. To this end, a region that is not to be structured is covered by a mask 51.

[0113] In the following, a method is explained for producing a stamp for a replication device for the production of microstructured and/or nanostructured components in a stamp replication device 10 according to the FIGS. 1 to 3.

[0114] Initially, a stamp carrier 28 and a molding part 26 are positioned in the stamp replication device 10. The molding part 26 is positioned on the platform 14 and the stamp carrier 28 is positioned on the cover 12 in the stamp replication device 10 shown in FIGS. 1 to 3.

[0115] Subsequently, a vacuum is applied to the microstructured vacuum surface 34 for the purpose of holding the stamp carrier 28.

[0116] Before, during or after applying the vacuum, a liquid stamp material is applied to the molding part 26 or the stamp carrier 28. The stamp material is, for example, polydimethylsiloxane (PDMS), in particular s-PDMS or x-PDMS or Sylgard 184.

[0117] Afterwards, the cover 12 is positioned on the platform 14, in particular as a result of pivoting it into position. When the cover 12 is positioned on the platform 14, the liquid stamp material is distributed on the molding part 26, for example, through the weight of the cover 12, wherein the form of the molding part 26 is reproduced in the stamp material.

[0118] A fastening of the cover 12 is not necessary as the cover 12 is held in position by its own weight in the closed state of the stamp replication device 10.

[0119] Subsequently, the stamp material is cured by exposing the stamp material to UV light. The length of the curing is, for example, one to two minutes.

[0120] To this end, light emitted from the irradiation source 30 is broken and/or scattered in such a way on the microstructured vacuum surface 34 that the uniformity of the irradiation when exposing the stamp material is not affected negatively. In this way, stamps can be produced with a consistently high quality. In particular, what is referred to as the shadow effect can be avoided.

[0121] In contrast to previously conventional vacuum channels, a particularly uniform exposure of the stamp material can occur.

[0122] The irradiation angle in the exposure of the stamp material can thus be chosen depending on the pitch p of the microstructured vacuum area 34.

[0123] After the curing, the stamp material and the stamp carrier 28 are connected permanently to each other.

[0124] A stamp produced by means of a stamp replication device 10 as previously described has, for example, a thickness of 100 m to 1 mm.