Matrix-embedded metamaterial coating, coated article having matrix-embedded metamaterial coating, and/or method of making the same

Abstract

Certain example embodiments of this invention relate to coated articles having a metamaterial-inclusive layer, coatings having a metamaterial-inclusive layer, and/or methods of making the same. Metamaterial-inclusive coatings may be used, for example, in low-emissivity applications, providing for more true color rendering, low angular color dependence, and/or high light-to-solar gain. The metamaterial material may be a noble metal or other material, and the layer may be made to self-assemble by virtue of surface tensions associated with the noble metal or other material, and the material selected for use as a matrix. An Ag-based metamaterial layer may be provided below a plurality (e.g., 2, 3, or more) continuous and uninterrupted layers comprising Ag in certain example embodiments. In certain example embodiments, barrier layers comprising TiZrOx may be provided between adjacent layers comprising Ag, as a lower-most layer in a low-E coating, and/or as an upper-most layer in a low-E coating.

Claims

1. A method of making a coated article comprising a low-E coating supported by a glass substrate, the method comprising: forming a first matrix layer comprising a matrix material, directly or indirectly on the substrate; forming a donor layer comprising Ag over and contacting the first matrix layer; following formation of the donor layer, forming a second matrix layer comprising the matrix material over and contacting the donor layer, wherein the first and second matrix layers have thicknesses differing from one another by no more than 20%; heat treating the coated article with at least the first and second matrix layers and the donor layer thereon to cause the Ag in the donor layer to self-assemble into a discontinuous collection of formations distributed in the matrix material in forming a metamaterial inclusive layer that emits resonances in a desired wavelength range based at least in part on the formations located therein; and incorporating the metamaterial inclusive layer into the low-E coating.

2. The method of claim 1, wherein the heat treating is performed for 15-30 minutes.

3. The method of claim 2, wherein the heat treating is performed at 600-675 degrees C.

4. The method of claim 1, wherein the heat treating is performed at 600-675 degrees C.

5. The method of claim 1, wherein the first and second matrix layers each have an as-deposited thickness of 30-70 nm.

6. The method of claim 1, wherein the matrix material comprises Nb and/or Si.

7. The method of claim 6, wherein the matrix material comprises niobium oxide.

8. The method of claim 1, wherein the donor layer has an as-deposited thickness of 5-10 nm.

9. The method of claim 1, wherein the formations are formed to have an interparticle spacing of 5-75 nm and diameters or major distances of 20-140 nm.

10. The method of claim 9, wherein the formations are formed to have 10-50 nm thicknesses.

11. The method of claim 1, wherein the formations are substantially ellipsoidal.

12. The method of claim 1, wherein the donor layer is formed by sputter deposition performed at a power level of 10-50 kW and at a line speed of 5-15 m/min.

13. The method of claim 1, further comprising forming a plurality of continuous and uninterrupted IR reflecting layers, each IR reflecting layer comprising Ag.

14. The method of claim 13, further comprising forming a plurality of barrier layers comprising TiZrOx.

15. The method of claim 13, wherein the IR reflecting layers are formed over the metamaterial inclusive layer on a side of the metamaterial inclusive layer opposite the substrate.

16. The method of claim 13, wherein the heat treating is performed following formation of the IR reflecting layers.

17. A method of making a coated article comprising a low-E coating supported by a glass substrate, the method comprising: forming a first matrix layer comprising a matrix material, directly or indirectly on the substrate; forming a continuous and uninterrupted donor layer over and contacting the first matrix layer, the donor layer comprising one or more source material(s) selected from the group consisting of: Ag, Al, Au, AZO, Be, C, Cr, Cu, ITO, Ni, Pd, Pt, RuO.sub.2, Ti, and W; and following formation of the donor layer, forming a second matrix layer comprising the matrix material over and contacting the donor layer, wherein the first and second matrix layers have thicknesses differing from one another by no more than 20%; wherein the coated article with at least the first and second matrix layers and the donor layer thereon are heat treatable to cause the source material(s) in the donor layer to self-assemble into a synthetic layer comprising a discontinuous collection of formations distributed in the matrix material, the formations having a major distance no larger than 300 nm, the synthetic layer having resonance in a frequency range suitable for the low-E coating.

18. The method of claim 17, wherein the first and second matrix layers each have an as-deposited thickness of 30-70 nm.

19. The method of claim 17, wherein the matrix material comprises an oxide of Nb and/or Si.

20. The method of claim 17, wherein the donor layer has an as-deposited thickness of 5-10 nm.

21. The method of claim 17, wherein the heat treating is performable at a time and at a temperature sufficient to cause the formations to have an interparticle spacing of 5-75 nm and diameters or major distances of 20-140 nm.

22. The method of claim 21, wherein the heat treating is performable at a time and at a temperature sufficient to cause the formations to have 10-50 nm thicknesses.

23. The method of claim 17, wherein the donor layer is formed by sputter deposition performed at a power level of 10-50 kW and at a line speed of 5-15 m/min.

24. The method of claim 17, further comprising forming a plurality of continuous and uninterrupted IR reflecting layers, each IR reflecting layer comprising Ag.

25. The method of claim 24, further comprising forming a plurality of barrier layers comprising TiZrOx.

26. The method of claim 24, wherein the IR reflecting layers are formed over the synthetic layer on a side of the synthetic layer opposite the substrate, following heat treatment.

27. The method of claim 24, wherein the IR reflecting layers are formed over the second matrix layer, prior to heat treatment.

28. A method of making a coated article comprising a low-E coating supported by a glass substrate, the method comprising: having a plurality of layers formed on the substrate, the layers including: (a) a first matrix layer comprising a matrix material, directly or indirectly on the substrate, (b) a donor layer comprising Ag over and contacting the first matrix layer, and (c) a second matrix layer comprising the matrix material over and contacting the donor layer, wherein the first and second matrix layers have thicknesses differing from one another by no more than 20%; and heat treating the coated article with at least the first and second matrix layers and the donor layer thereon to cause the Ag in the donor layer to self-assemble into a discontinuous collection of formations distributed in the matrix material in forming a metamaterial inclusive layer, the metamaterial inclusive layer having resonance in a selected frequency range suitable for the low-E coating.

29. The method of claim 28, wherein the heat treating is performed for 15-30 minutes.

30. The method of claim 29, wherein the heat treating is performed at 600-675 degrees C.

31. The method of claim 28, wherein the heat treating is performed at 600-675 degrees C.

32. The method of claim 28, wherein the first and second matrix layers each have an as-deposited thickness of 30-70 nm.

33. The method of claim 28, wherein the matrix material comprises an oxide of Nb and/or Si.

34. The method of claim 28, wherein the heat treating is performed at a time and at a temperature sufficient to cause the formations to have an interparticle spacing of 5-75 nm and diameters or major distances of 20-140 nm.

35. The method of claim 34, wherein the heat treating is performed at a time and at a temperature sufficient to cause the formations to have 10-50 nm thicknesses.

36. The method of claim 28, further comprising forming a plurality of continuous and uninterrupted IR reflecting layers, each IR reflecting layer comprising Ag.

37. The method of claim 36, further comprising forming a plurality of barrier layers comprising TiZrOx.

38. The method of claim 36, wherein the IR reflecting layers are formed over the metamaterial inclusive layer on a side of the metamaterial inclusive layer opposite the substrate, following heat treatment.

39. The method of claim 36, wherein the IR reflecting layers are formed over the second matrix layer, prior to heat treatment.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) These and other features and advantages may be better and more completely understood by reference to the following detailed description of exemplary illustrative embodiments in conjunction with the drawings, of which:

(2) FIG. 1 is a cross-sectional view of an example layer stack having three Ag-inclusive layers and one metamaterial-inclusive layer, in accordance with certain example embodiments;

(3) FIG. 2a is a graph plotting the transmission, film-side reflectance, and glass-side reflectance against wavelength for the FIG. 1 example coated article;

(4) FIG. 2b is a graph plotting glass-side a* and b* values against viewing angle for the FIG. 1 example coated article;

(5) FIGS. 3a-3c are cross-sectional views of example triple silver low-E coatings that have been tuned to provide improved angular coloration and high LSG;

(6) FIG. 4 is a graph plotting C vs. LSG values for the example coated articles shown in and described in connection with FIGS. 1 and 3a-3c;

(7) FIG. 5a is a graph plotting the transmission, film-side reflectance, and glass-side reflectance against wavelength for a sample including a single metamaterial-inclusive layer on a glass substrate, and FIG. 5b plots the glass-side a* and b* values against angle for that sample;

(8) FIG. 6a is a graph plotting the transmission, film-side reflectance, and glass-side reflectance against wavelength for a sample including a single Ag-inclusive layer (a layer comprising or consisting essentially of Ag) on a glass substrate, and FIG. 6b plots the glass-side a* and b* values against angle for that sample;

(9) FIG. 7a is a graph plotting the transmission, film-side reflectance, and glass-side reflectance against wavelength for a sample including a single Ag-inclusive layer (a layer comprising or consisting essentially of Ag) supported by a single metamaterial layer on a glass substrate, and FIG. 7b plots the glass-side a* and b* values against angle for that sample;

(10) FIGS. 8a and 8b correspond to FIGS. 6a and 6b, except that additional dielectric layers are provided for optical tuning;

(11) FIGS. 9a and 9b correspond to FIGS. 7a and 7b, except that additional dielectric layers are provided for optical tuning;

(12) FIGS. 10a-10b show the resonance intensity and resonance wavelength for different radius, thickness, and interparticle distance combinations for columnar Ag metamaterial formations in a silicon oxide matrix;

(13) FIG. 11 shows the resonance wavelength for different radius, thickness, and interparticle distance combinations for columnar Ag metamaterial formations in a niobium oxide matrix;

(14) FIGS. 12a-12b show the resonance intensity and resonance wavelength for different radius, thickness, and interparticle distance combinations for columnar Au metamaterial formations in a silicon oxide matrix;

(15) FIGS. 13a-13b show the resonance intensity and resonance wavelength for different radius, thickness, and interparticle distance combinations for columnar Cu metamaterial formations in a silicon oxide matrix;

(16) FIGS. 14a-14b show the resonance intensity and resonance wavelength for different radius, thickness, and interparticle distance combinations for columnar TiN metamaterial formations in a silicon oxide matrix;

(17) FIG. 15 shows the resonance wavelength for different radius, thickness, and interparticle distance combinations for ellipsoidal Ag metamaterial formations in a silicon oxide matrix;

(18) FIG. 16 is a graph showing the plasmon resonance observed in the calculated absorption from optical measurements for different heat treatment temperature and times for a first layer stack;

(19) FIGS. 17a-17c are TEM images showing the evolution of a metamaterial-inclusive layer for the first layer stack, when heat treated at 650 degrees C.;

(20) FIG. 18 is a graph showing the plasmon resonance observed in the calculated absorption from optical measurements for different heat treatment temperature and times for a second layer stack; and

(21) FIGS. 19a-19c are TEM images showing the evolution of a metamaterial-inclusive layer for the second layer stack, when heat treated at 650 degrees C.

DETAILED DESCRIPTION

(22) Certain example embodiments relate to coated articles having a metamaterial-inclusive layer, coatings having a metamaterial-inclusive layer, and/or methods of making the same. Metamaterial-inclusive coatings may be used, for example, in low-emissivity applications, providing for more true color rendering, low angular color dependence, and/or high light-to-solar gain. As indicated above, it would be desirable in many instances to have transmitted color rendering that is true, e.g., such that incident external light is not perceived as having been modified by the film and/or substrate of the window. It is possible to obtain this performance with the FIG. 1 coated article, in certain example embodiments. That is, FIG. 1 is a cross-sectional view of an example layer stack 102 supported by a glass substrate 100 and having three Ag-inclusive layers 112a-112c and one metamaterial-inclusive layer 106, in accordance with certain example embodiments. As shown in FIG. 1, the metamaterial-inclusive layer 106 is the lowest Ag-containing layer in the triple-silver layer stack. That is, the metamaterial-inclusive layer 106 is closer to the substrate 100 than is each of Ag-inclusive layers 112a-112c. In different example embodiments, however, the metamaterial-inclusive layer 106 may be provided elsewhere. For instance, it may be provided between or above a given Ag-containing sub-stack.

(23) A first barrier layer 104 is provided between the glass substrate 100 and the metamaterial-inclusive layer 106. This barrier layer 104 may include titanium oxide and/or zirconium in certain example embodiments. The inclusion of a barrier layer 104 or the like may be advantageous in terms of reducing the likelihood of sodium migration from the substrate into the layer stack 102 (e.g., where it could damage layers including the Ag-inclusive layers 112a-112c, the metamaterial-inclusive layer 106, etc.), especially because the high temperatures that may be used in the formation of the metamaterial-inclusive layer 106 (e.g., as set forth in greater detail below), heat treatment (including heat strengthening and/or thermal tempering), etc., may be likely to promote such sodium migration.

(24) One or more dielectric layers (not shown) also may be interposed between the substrate 100 and the metamaterial-inclusive layer 106. These dielectric layers may be silicon-inclusive layers (e.g., layers comprising silicon oxide, silicon nitride, silicon oxynitride, etc.) that optionally may also include aluminum, layers comprising titanium oxide, layers comprising tin oxide, etc.

(25) FIG. 1 may be thought of as including sub-layer stacks above the metamaterial-inclusive layer 106, with a single sub-layer stack repeating once for each silver-inclusive layer in the overall stack 102. As will be appreciated from FIG. 1, each sub-layer stack includes a barrier layer, a lower contact layer, a layer comprising Ag, and an upper contact layer. In the FIG. 1 example embodiment, the barrier layers 108a-108c comprising titanium and/or zirconium, and may be oxided. Thus, as shown in FIG. 1, the barrier layers 108a-108c each comprise TiZrOx (although TiOx, ZrOx, and/or the like may be used in different example embodiments). In the FIG. 1 example embodiment, the lower contact layers 110a-110c comprising zinc oxide. The lower contact layers 110a-110c may further include tin and/or aluminum in certain example embodiments, and they may provide smooth layers on which the respective layers comprising Ag 112a-112c can grow directly. In the FIG. 1 example embodiment, the upper contact layers 114a-114c are in direct contact with the layers comprising Ag 112a-112c and may include, for example, Ni, Cr, Ti, and/or an oxide thereof. For instance, as shown in FIG. 1, the upper contact layers 114a-114c each comprise NiTiNbO (although NiCrOx, NiTiOx, and/or the like may be used in different example embodiments). An overcoat layer 116 may be provided to help protect the layer stack. The overcoat layer 116 may include zirconium in certain example embodiments. Optionally, certain example embodiments may include additional overcoat layers including, for example, layers comprising silicon (e.g., silicon oxide, silicon nitride, or silicon oxynitride), etc. In certain example embodiments, the barrier layer 104 and the overcoat layer 116 may be formed from the same or different materials.

(26) In certain example embodiments, the thicknesses of the some or all of the contact layers 110a-110c may be substantially the same (e.g., varying by no more than 15% of one another, more preferably varying by no more than 10% of one another). In certain example embodiments, the thicknesses of the some or all of the layers comprising Ag 112a-112c may be substantially the same (e.g., varying by no more than 15% of one another, more preferably varying by no more than 10% of one another). In certain example embodiments, the thicknesses of the innermost and outermost layers may be substantially the same (e.g., varying by no more than 15% of one another, more preferably varying by no more than 10% of one another).

(27) The following table provides information about the layers in the FIG. 1 example coated article.

(28) TABLE-US-00001 More Preferred Preferred Example Layer Thickness Thickness Thickness Glass (100) (nm) (nm) (nm) TiZrOx (104) 20-100 30-50 39 Metamaterial (106) 5-25 5-15 13 TiZrOx (108a) 10-120 30-100 64 ZnO (110a) 1-20 3-15 4 Ag (112a) 5-50 10-25 15 NiTiNbO (114a) 1-20 1-10 3 TiZrOx (108b) 10-120 30-100 60 ZnO (110b) 1-20 3-15 4 Ag (112b) 5-50 10-25 16 NiTiNbO (114b) 10-120 30-100 47 TiZrOx (108c) 1-20 3-15 8 ZnO (110c) 1-20 3-15 4 Ag (112c) 5-50 10-25 17 NiTiNbO (114c) 1-20 1-10 3 TiZrOx (116) 20-100 30-50 31

(29) Optical properties of the FIG. 1 example coated article are provided in FIG. 2a. That is, FIG. 2a is a graph plotting the transmission, film-side reflectance, and glass-side reflectance against wavelength for the FIG. 1 example coated article. The following table summarizes these and other optical properties, as well as thermal performance.

(30) TABLE-US-00002 Monolithic Optics T Y (%) 76.8 (Ill. C, 2 deg obs) a* 5.00 b* 1.34 Rg Y (%) 2.7 a* 1.06 b* 0.58 Rf Y (%) 2.0 a* 4.04 b* 0.55 A[vis] (100-TT-Rf) 21.2 Double Glazing/IGU Optics T Y (%) 69.5 (Ill. C, 2 deg obs) a* 5.47 b* 1.17 Rg Y (%) 7.5 a* 3.45 b* 1.45 Rf Y (%) 9.8 a* 0.77 b* 0.66 Normal Emissivity (EN) 0.02 Double Glazing/IGU Tvis (%) 69.5 NFRC-2001 Thermal Tsol (%) 25.4 Performance Rsol (%) 46.1 Asol (%) 28.5 Uval 0.253 SHGC 27.5 LSG(25) 2.53
In these samples, the IG units included two 3 mm substrates that were 12 mm apart from one another. All samples were on clear glass.

(31) The small a* and b* values are indicative of an excellent transmitted color and, as can be seen, the LSG is still high. With respect to a* and b*, the coloration is generally neutral and, in any event, different from the yellow-green color shift that oftentimes accompanies solar control coatings. It thus can be seen that certain example embodiments advantageously provide for excellent, neutral transmitted color, which maintaining a high LSG, in connection with a layer stack that has three Ag-inclusive layers and one metamaterial layer. The transmitted color rendering thus is true. In some instances, it is possible to avoid any yellow-green color shift, even though other color shifts might occur.

(32) Also as indicated above, it would be desirable in many instances to reduce the severity of or possibly even completely eliminate the tradeoff between angular coloration and LSG. That is, it would be desirable to avoid having to sacrifice angular coloration in order to obtain high LSG values. It also is possible to obtain this performance with the FIG. 1 coated article, in certain example embodiments.

(33) FIG. 2b is a graph plotting glass-side a* and b* values against viewing angle for the FIG. 1 example coated article. As can be seen from FIG. 2b, the glass-side a* and b* values are fairly uniform over the entire range from 0-90 degrees. Preferably, the glass-side a* and b* values vary by no more than 2 over this range, more preferably no more than 1.75, still more preferably no more than 1.5, and sometimes no more than 1.0. In certain example embodiments, the glass-side a* and b* values are between 0 and 2 for substantially all angles between 0 and 90 degrees. It also can be seen from the FIG. 2b graph that glass-side a* and b* values each are very uniform in the 30-90 degree range and in each of the 30-60 and 60-90 degree ranges.

(34) Performance of the FIG. 1 example coated article has been tested against other more conventional triple silver low-E coatings that have been tuned. In this regard, FIGS. 3a-3c are cross-sectional views of example triple silver low-E coatings that have been tuned to provide improved angular coloration and high LSG. The following tables provide information about the layers in the example coated articles shown in FIGS. 3a-3c.

(35) The FIG. 3a layer stack 302a, somewhat similar to the FIG. 1 layer stack 102, includes a sub-layer stack for each silver-inclusive layer in the overall stack 102. As will be appreciated from FIG. 1, each sub-layer stack includes a barrier layer, a lower contact layer, a layer comprising Ag, and an upper contact layer. Furthermore, like the FIG. 1 example, the lower contact layers 110a-110c each may comprise zinc oxide, and the upper contact layers 114a-114 each may comprise, for example, Ni, Cr, Ti, and/or an oxide thereof. For instance, as shown in FIG. 3a, the upper contact layers 114a-114c each comprise NiTiNbO. The lower contact layers 110a-110c and the upper contact layers 114a-114c sandwich the layers comprising silver 112a-112c. The barrier layers differ as between the FIG. 1 and FIG. 3a examples. In FIG. 3a, the barrier layers 308a-308c, provided below the lower contact layers 110a-110c, each comprise ZnSnO (although SnO may be used in certain example instances). The FIG. 3a example also includes an overcoat layer 316 comprising zinc oxide.

(36) The following table provides information about the layers in the FIG. 3a example coated article.

(37) TABLE-US-00003 More Preferred Preferred Example Layer Thickness Thickness Thickness Glass (100) (nm) (nm) (nm) ZnSnO (308a) 10-120 20-100 20 ZnO (110a) 1-20 3-15 4 Ag (112a) 5-50 10-25 11 NiTiNbO (114a) 1-20 1-10 3 ZnSnO (308b) 10-120 30-100 62 ZnO (110b) 1-20 3-15 4 Ag (112b) 5-50 10-25 14 NiTiNbO (114b) 1-20 1-10 3 ZnSnO (308c) 10-120 30-100 67 ZnO (110c) 1-20 3-15 4 Ag (112c) 5-50 10-25 17 NiTiNbO (114c) 1-20 1-10 3 ZnO (316) 20-100 30-50 38

(38) The layer stack 302b shown in FIG. 3b is similar to the layer stack 302a shown in FIG. 3a. However, the overcoat layer 316 comprising zinc oxide from FIG. 3a is replaced with a two-layer overcoat including a layer comprising ZnSnO 318 and a silicon-inclusive layer 320 (which in the FIG. 3b example includes silicon oxide, but which may instead include silicon nitride or silicon oxynitride).

(39) The following table provides information about the layers in the FIG. 3b example coated article.

(40) TABLE-US-00004 More Preferred Preferred Example Layer Thickness Thickness Thickness Glass (100) (nm) (nm) (nm) ZnSnO (308a) 10-120 20-100 34 ZnO (110a) 1-20 3-15 4 Ag (112a) 5-50 10-25 11 NiTiNbO (114a) 1-20 1-10 3 ZnSnO (308b) 10-120 30-100 58 ZnO (110b) 1-20 3-15 4 Ag (112b) 5-50 10-25 13 NiTiNbO (114b) 1-20 1-10 3 ZnSnO (308c) 10-120 30-100 54 ZnO (110c) 1-20 3-15 4 Ag (112c) 5-50 10-25 12 NiTiNbO (114c) 1-20 1-10 3 ZnSnO (318) 1-20 3-15 5 SiOx (320) 20-100 30-50 40

(41) The layer stack 302c shown in FIG. 3c is similar to the layer stack 302b shown in FIG. 3b, and may be regarded as being the closest to FIG. 1 (at least when compared to the other examples shown in and described in connection with FIGS. 3a-3b). Compared to FIG. 3b, however, the layer of the overcoat comprising ZnSnO 318 is replaced with a layer 324 comprising titanium and/or zirconium. In the FIG. 3c example, this layer 324 comprises TiZrOx. The same material is used for the barrier layers in the FIG. 3c example. That is, rather than having barrier layers 308a-308c comprising ZnSnO or the like as in FIG. 3b, FIG. 3c shows barrier layers 322a-322c comprising TiZrOx.

(42) The following table provides information about the layers in the FIG. 3c example coated article.

(43) TABLE-US-00005 More Preferred Preferred Example Layer Thickness Thickness Thickness Glass (100) (nm) (nm) (nm) TiZrOx (322a) 10-120 20-100 26 ZnO (110a) 1-20 3-15 4 Ag (112a) 5-50 10-25 12 NiTiNbO (114a) 1-20 1-10 3 TiZrOx (322b) 10-120 30-100 51 ZnO (110b) 1-20 3-15 4 Ag (112b) 5-50 10-25 12 NiTiNbO (114b) 1-20 1-10 3 TiZrOx (322c) 10-120 30-100 43 ZnO (110c) 1-20 3-15 4 Ag (112c) 5-50 10-25 12 NiTiNbO (114c) 1-20 1-10 3 TiZrOx (324) 1-20 3-15 4 SiOx (320) 20-100 30-50 36

(44) FIG. 4 is a graph plotting C vs. LSG values for the example coated articles shown in and described in connection with FIGS. 1 and 3a-3c. Here, C is color and C={square root over ((a*.sub.1a*.sub.2).sup.2+(b*.sub.1b*.sub.2).sup.2)}. As can be seen from FIG. 4, a triple silver low-E coating including a layer comprising ZnSnOx (corresponding to FIG. 3a) can be improved upon in terms of its C and LSG performance by using layers comprising silicon oxide and zinc stanate (corresponding to FIG. 3b), and that coating can be improved upon yet further by using layers comprising silicon oxide and TiZrOx (corresponding to FIG. 3c). However, none of these tuned layers provides the combination of C and LSG performance as the FIG. 1 example embodiments, which has a metamaterial-inclusive layer. In other words, triple silver stacks with one metamaterial layer can achieve superior LSG without compromising on angular color shift. It thus can be seen that certain example embodiments advantageously additionally provide for superior LSG without sacrificing angular coloration.

(45) From a perhaps more basic perspective, five samples were created and tested to compare and contrast the optical performance of metamaterial-inclusive layer stacks and more conventional Ag-inclusive low-E layer stacks. The samples were as follows: Sample 1: One 13 nm thick metamaterial layer on 3 mm thick clear float glass Sample 2: One 10.6 nm thick layer comprising Ag on 3 mm thick clear float glass Sample 3: 3 mm thick clear float glass/13 nm thick layer metamaterial layer/10.6 nm thick layer comprising Ag Sample 4: 3 mm thick clear float glass/first layer comprising silicon nitride (e.g., Si.sub.3N.sub.4) that was 35 nm thick/second layer comprising silicon nitride (e.g., Si.sub.3N.sub.4) that was 75.1 nm thick/10.6 nm thick layer comprising Ag/third layer comprising silicon nitride (e.g., Si.sub.3N.sub.4) that was 15.8 nm thick/layer comprising silicon oxide (e.g., SiO.sub.2) that was 51.4 nm thick Sample 5: 3 mm thick clear float glass/first layer comprising silicon nitride (e.g., Si.sub.3N.sub.4) that was 35 nm thick/13 nm thick layer metamaterial layer/second layer comprising silicon nitride (e.g., Si.sub.3N.sub.4) that was 75.1 nm thick/10.6 nm thick layer comprising Ag/third layer comprising silicon nitride (e.g., Si.sub.3N.sub.4) that was 15.8 nm thick/layer comprising silicon oxide (e.g., SiO.sub.2) that was 51.4 nm thick

(46) FIG. 5a plots the transmission, film-side reflectance, and glass-side reflectance against wavelength for sample 1, and FIG. 5b plots the glass-side a* and b* values against angle for sample 1. As can be seen from FIG. 5a, the metamaterial single layer example shows significant changes for transmission, film-side reflectance, and glass-side reflectance in the 800-900 nm spectra. However, as can be seen from FIG. 5b, the angular coloration is good but could be improved. That is, the glass-side a* and b* values are fairly high and change with viewing angle.

(47) FIG. 6a plots the transmission, film-side reflectance, and glass-side reflectance against wavelength for sample 2, and FIG. 6b plots the glass-side a* and b* values against angle for sample 2. As can be seen from FIG. 6a, there is a continuous change across the whole visible spectrum and into the NIR region. However, as can be seen from FIG. 6b, angular coloration is quite poor, particularly with respect to the glass-side a* value being very high and having a significant change from about 45 degrees to 90 degrees.

(48) FIG. 7a plots the transmission, film-side reflectance, and glass-side reflectance against wavelength for sample 3, and FIG. 7b plots the glass-side a* and b* values against angle for sample 3. As can be seen from FIG. 7a, the contribution from the metamaterial and the Ag thin film is combined, e.g., roughly as if the FIGS. 5a and 5b charts were combined. However, as can be seen from FIG. 7b, the angular color still is not good.

(49) As will be appreciated from the description of the samples above, samples 2-3 were improved by adding dielectric layers for optical tuning purposes. In this regard, FIGS. 8a-8b correspond to FIGS. 6a-6b, except that additional dielectric layers are provided for optical tuning in connection with sample 4. As will be appreciated from FIGS. 8a-8b, further tuning is possible through the inclusion of dielectric layers. That is, the transmission is higher in a wider visible wavelength range, and there is a marked improvement in coloration as reflected in FIG. 8b.

(50) FIGS. 9a-9b correspond to FIGS. 7a-7b, except that additional dielectric layers are provided for optical tuning in connection with sample 5. The addition of dielectric layers helps tune the response yet further, maintaining good transmittance over the visible wavelength range and also resulting in a much improved film-side reflectance in infrared spectra starting much earlier compared to FIG. 8a, etc. Moreover, as can be seen from FIG. 9b, angular coloration is excellent once dielectric spacers are provided. The glass-side a* and b* values are both close to each other and extremely close to 0 throughout the 0-90 degree viewing angle.

(51) The following table provides optical performance for samples 1-5.

(52) TABLE-US-00006 Sample 1 Sample 2 Sample 3 Sample 4 Sample 5 Monolithic T Y (%) 67.2 61.27 37.57 77.77 76.36 Optics a* 3.17 3.06 3.53 2.9 3.03 (III C, b* 5.25 6.67 13.84 1.05 2.47 2 deg obs) Rg Y (%) 12.2 27 39.5 14.5 4.7 a* 3.57 1.16 0.59 3.59 0.06 b* 9.29 21.28 21.08 4.75 1.39 Rf Y (%) 17.7 30.6 48.9 12.9 3 a* 4.1 2.46 1.63 5.84 3.45 b* 9.77 18 19.31 14.39 0.93 Tvis (%) 67.2 61.3 37.6 77.8 76.4 Tsol (%) 46.4 41.4 24.2 57.3 42.1 Rsol (%) 20.4 40.2 39.7 26.1 16 Asol 33.1 18.4 36.1 16.6 41.9 Uval 0.596 0.596 0.596 0.596 0.596 SHGC 51.23 43.93 29.45 59.59 48.35 LSG(25) 1.312 1.395 1.276 1.305 1.579
It can be seen from this table and the description provided above that optical color and transmission is not good until the dielectric layers were provided. Then, it was possible to achieve excellent coloration and LSG values, particularly where an Ag-inclusive layer and a metamaterial layer is provided (i.e., sample 5). It will be appreciated that further tuning using one or more dielectric layer(s) may be performed in order to realize yet further improvements in these and/or other regards.

(53) A metamaterial-inclusive layer may include a plurality of island-like or other growths on a substrates in a discontinuous, interrupted stratum or collection of material. The growths may have different shapes and sizes, and the configurations of the growths play a role in conditioning the oscillating electron cloud and, thus, controlling the resonance frequency. Geometric parameters that may be optimized include diameter or major distance (d); thickness (t); and interparticle distance (e), which represents the minimum distance between two adjacent particles. Resonance wavelength (in nm) is the wavelength for the minimum in transmittance, and the resonance intensity is the transmittance at the resonance wavelength.

(54) In a related regard, different materials may have different electronic densities and, thus, cause the resonance to occur at different wavelengths. For example, Ag, Cu, Al, AZO, Au, RuO.sub.2, ITO, Cr, Ti, and other materials are known to have different extension coefficients and solar spectral irradiances. Thus, it would be desirable to select a configuration for the growth that would be advantageous in terms of low-E performance and visible light transmission. These materials may be used in connection with, or in place of Ag, in certain example embodiments.

(55) Finite-Difference Time-Domain (FDTD) mappings were performed to investigate the effects of different metamaterial geometries and materials. As is known, FDTD is a numerical analysis technique used for modeling computational electrodynamics. FIGS. 10a-15b are graphs plotting FDTD mapping responses for different metamaterials and configurations. More particularly, FIGS. 10a-10b show the resonance intensity and resonance wavelength for different radius, thickness, and interparticle distance combinations for columnar Ag metamaterial formations in a silicon oxide matrix. The desired wavelength range here is the 960.0-1033.3 nm wavelength.

(56) FIG. 11 shows the resonance wavelength for different radius, thickness, and interparticle distance combinations for columnar Ag metamaterial formations in a niobium oxide matrix for columnar Ag metamaterial formations in a silicon oxide matrix. There is a matrix refractive index effect on the resonance wavelength. In this case, there is a clear redshift of the resonance when using the higher index NbOx matrix material, e.g., as annotated with the brace in FIG. 11. In a nutshell, it has been found that higher refractive index matrix materials shift the resonance towards higher wavelengths.

(57) FIGS. 12a-12b show the resonance intensity and resonance wavelength for different radius, thickness, and interparticle distance combinations for columnar Au metamaterial formations in a silicon oxide matrix. As will be appreciated from a comparison between FIGS. 10a-10b and FIGS. 12a-12b, the FDTD results are nearly identical as between Au and Ag in terms of both resonance wavelength and intensity.

(58) FIGS. 13a-13b show the resonance intensity and resonance wavelength for different radius, thickness, and interparticle distance combinations for columnar Cu metamaterial formations in a silicon oxide matrix. It will be appreciated that the Cu has a higher optical absorption in the visible spectrum, but excellent electronic density and conductivity. Thus, it might sometimes be desirable to use Cu instead of Au and/or Ag, e.g., in view of the more conductive properties of Cu.

(59) FIGS. 14a-14b show the resonance intensity and resonance wavelength for different radius, thickness, and interparticle distance combinations for columnar TiN metamaterial formations in a silicon oxide matrix. Here, the position of the resonances is similar to that of Ag and Au. However, the intensity of the resonance is considerably lower. The resonance is also broader. This suggests that TiN might not be as suitable as the above-described materials for low-E applications where there is a desire for high visible transmission, angular color independence, and high LSG, e.g., unless other modifications to a layer stack are made.

(60) FIG. 15 shows the resonance wavelength for different radius, thickness, and interparticle distance combinations for ellipsoidal Ag metamaterial formations in a silicon oxide matrix. In the FIG. 15 example, the radius corresponds to the radius along the major diameter, and the thickness corresponds to the entirety of the minor diameter. As will be appreciated from FIG. 15, there is a more progressive response when ellipsoids are used, as opposed to cylinders. This may be advantageous in certain example embodiments, as there is a broadening of resonance, e.g., instead of sharp changes as with cylinders. This could, in turn, open up broader processing windows, allow for more variation in radius, thickness, and/or interparticle distance parameters (which may be difficult to precisely control in some instances), etc.

(61) It will be appreciated that the silicon oxide inclusive matrix may comprise or consist essentially of SiO.sub.2 in certain example embodiments. In certain example embodiments, any silicon or niobium inclusive matrix may be used, and further details are provided below in this regard. As alluded to above, it will be appreciated that Ag, Cu, Al, AZO, Au, RuO.sub.2, ITO, and/or other metamaterials may be used in certain example embodiments.

(62) Semiconductor, transparent conductive oxide (TCO), and other materials may be used in different example embodiments. Thus, although certain example embodiments have been described in connection with Ag-inclusive metamaterial layers, it will be appreciated that other materials may be used in place of or together with Ag-based metal island layers. Other candidate materials that may be used in place of or together with Ag include so-called noble metals. In addition, materials such as Al, Au, AZO, Be, C, Cr, Cu, ITO, Ni, Pd, Pt, RuO.sub.2, Ti, and/or W may be used in certain example embodiments.

(63) Tests were performed to determine how metamaterial-inclusive layers could be self-assembled. In this regard, matrix materials were sputter deposited on a glass substrate above and below a sputter deposited layer of metal, and the intermediate article was heat treated. In a first set of experiments, self-assembled metamaterials were created by depositing a layer comprising Ag between two layers comprising NbOx deposited in the metallic state. The layer comprising Ag was deposited with a low line speed and high power, i.e., at a line speed of 8 m/min and at a power of 12 kW. The layers comprising NbOx were sputter deposited at 1.2 m/min. The coating was designed to have the same as-deposited thickness for the two layers comprising NbOx, namely, 30 nm thicknesses, and to have an 8 nm thickness for the layer comprising Ag. As shown in the FIG. 17a TEM images, however, the lower layer comprising NbOx, as deposited, was about 50 nm thick and the upper layer comprising NbOx, as deposited, was about 60 nm thick.

(64) FIG. 16 is a graph showing the plasmon resonance observed in the calculated absorption from optical measurements for different heat treatment temperature and times for this first set of experiments. As can be seen from FIG. 16, samples heat treated at the higher temperature (650 degrees C.) show better performance than those samples heat treated at the lower temperature (350 degrees C.), and samples heat treated for longer periods of time show better performance than those samples heat treated for shorter periods of time. With respect to the samples heat treated 650 degrees C., the sample heat treated for 8 minutes shows the beginnings of resonance in the NIR wavelength range while absorption in the visible wavelength range remains low; the sample heat treated for 10 minutes shows the broadening of the resonance; the sample heat treated for 16 minutes produces a more defined resonance, and the sample heat treated for 20 minutes shows a further intensification of the resonance.

(65) FIG. 17a is a TEM image showing the as-deposited layer stack, FIG. 17b is a TEM image showing the evolution of the layer stack after an 8 minute heat treatment at 650 degrees C., and FIG. 17c is a TEM image showing the further evolution of the layer stack after a 20 minute heat treatment at 650 degrees C. As can be seen from FIG. 17c, after this heat treatment regime and with this layer stack, the Ag coalesced and formed spheroidal-shaped particles that were self-assembled in the center layer of the stack. Some small, randomly-shaped particles also are visible. The self-assembly is believed to be facilitated by virtue of the mismatch in surface energy as between the major surfaces of the layer comprising Ag, the upper surface of the lower layer comprising NbOx, and the lower surface of the upper layer comprising NbOx.

(66) In a second set of experiments, self-assembled metamaterials were created by depositing a layer comprising Ag between two layers comprising NbOx deposited in the metallic state, but the speed and power of the deposition were changed. That is, the layer comprising Ag was deposited with a high line speed and lower power, i.e., at a line speed of 10 m/min. The layers comprising NbOx again were sputter deposited at 1.2 m/min.

(67) FIG. 18 is similar to FIG. 16, in that FIG. 18 is a graph showing the plasmon resonance observed in the calculated absorption from optical measurements for different heat treatment temperature and times for this second set of experiments. As above, samples in this set were heat treated at low and high temperatures (350 degrees C. and 650 degrees C., respectively), and for different lengths of time (namely, 8, 10, 16, and 20 minutes). However, as will be appreciated from FIG. 18, there is no real apparent resonance observed in any of the samples.

(68) The lack of apparent resonance likely was because the particle size was too small in this set of samples. The TEM images in FIGS. 19a-19c seem to confirm this view. That is, FIG. 19a is a TEM image showing the as-deposited layer stack, FIG. 19b is a TEM image showing the evolution of the layer stack after an 8 minute heat treatment at 650 degrees C., and FIG. 19c is a TEM image showing the further evolution of the layer stack after a 20 minute heat treatment at 650 degrees C. As can be seen from FIGS. 19a-19c, after this heat treatment regime and with this layer stack, the samples exhibited small, randomly distributed particles. Whereas the first set of examples showed good densification, possibly enabled from the low line speed/high power deposition technique, the non-uniformities in the second set of samples resulted in fluffy as-deposited layers and led to the distribution of small particles throughout a big, thick layer. In the latter case, this hampered the development of the ultimate metamaterial-inclusive layer. In general, when it comes to silver deposition for this purpose, power levels in the 10-100 kW range, more preferably 10-75 kW range, and still more preferably 10-50 kW range, may be used in connection with certain example embodiments. Line speeds less than 20 m/min. are preferable when it comes to silver deposition for this purpose, with speeds less than 15 m/min. being preferred and speeds in the 5-15 m/min. being more preferred.

(69) These results are interesting, as it was expected that there would be more adatom growth and that that would be a dominant growth regime. Surprisingly and unexpectedly, however, surface tensions seemed to have a significant influence on spherical agglomeration. Thus, in certain example embodiments, materials may be carefully selected so as to have surface tensions that work well with the silver or material used in the metamaterial creation. Oxides of Nb and/or Si have been found to be advantageous in this regard. It has been found that it is preferable to form the matrix holding the material by forming a first amount of matrix material, applying the silver or material used in the metamaterial creation, and applying a second amount of matrix material, and then subjecting this layer stack to heat treatment to trigger self-assembly of the metamaterial-inclusive layer. Preferably, the as-deposited thicknesses of the matrix material above and below application of the silver or material used in the metamaterial creation each are 10-300 nm and more preferably 10-100 nm, still more preferably 30-70 nm, with example thicknesses being in 30 nm, 50 nm, and 60 nm. Preferably, the as-deposited thicknesses of the matrix material before and after application of the silver or material used in the metamaterial creation are substantially equal. That is, the as-deposited thicknesses of the matrix material before and after application of the silver or material used in the metamaterial creation preferably differ from one another by no more than 20%, more preferably no more than 15%, and sometimes no more than 5-10%. The thickness of the silver or material used in the metamaterial creation may be from 1-20 nm, more preferably 1-15 nm, and still more preferably 5-10 nm, e.g., with an example of 8 nm. It will be appreciated that the latter of such thicknesses may be determined in connection with the interparticle spacing and diameters or major distance, e.g., as informed by the discussion above in connection with FIGS. 10a-15. In general, interparticle distances of 5-75 nm, diameters or major distances of 20-140 nm, and thicknesses of 5-50 nm or 10-50 nm may be used in different example embodiments.

(70) Heating involved in the self-assembly may be performed at a temperature of 580-700 degrees C., more preferably 600-675 degrees C., and still more preferably 625-650 degrees C. The heating may be performed for 1-60 minutes, more preferably 10-30 minutes, and still more preferably 15-30 or 15-25 minutes, with an example time being at least 20 minutes.

(71) It will be appreciated that the layers discussed herein may be formed in any suitable way. For example, a physical vapor deposition (PVD) technique such as sputtering or the like may be used to form the layers, as well as the metal or other islands that may be self-assembled into metamaterial inclusive layers in certain example embodiments. Metamaterials also may be formed via nano-imprinting, roll-to-roll transfers, evaporation on a micro-scale, etc.

(72) Certain example embodiments may have metal island layers or formations useful in the metamaterial-inclusive layers discussed herein may be formed in accordance with the techniques of U.S. application Ser. No. 15/051,900 and/or U.S. application Ser. No. 15/051,927, each filed on Feb. 24, 2016, the entire contents of each of which is hereby incorporated by reference herein.

(73) Furthermore, although certain example embodiments have been described as providing metamaterial-inclusive layers and/or layer stacks that provide substantially constant color as a function of angle, it will be appreciated that other optical and/or other behaviors may be provided in place of, or together with, substantially constant color vs. angle. For example, depending on the type of material selected, the size of the islands formed, etc., it may be possible to achieve desired color shifts (e.g., that are substantially constant across viewing angles) via large a* and/or b* changes; high conductivity or high resistivity; high reflection (e.g., for a mirror or mirror-like application); creation of colored transmission to simulate a tinted substrate (e.g., consistently across a wide range of viewing angles); creation of color or visual acuity enhancing effects such as might be used with sunglasses where particular visible ranges of wavelengths are selectively absorbed; etc.

(74) The terms heat treatment and heat treating as used herein mean heating the article to a temperature sufficient to achieve thermal tempering and/or heat strengthening of the glass inclusive article. This definition includes, for example, heating a coated article in an oven or furnace at a temperature of at least about 550 degrees C., more preferably at least about 580 degrees C., more preferably at least about 600 degrees C., more preferably at least about 620 degrees C., and most preferably at least about 650 degrees C. for a sufficient period to allow tempering and/or heat strengthening. This may be for at least about two minutes, or up to about 10 minutes, in certain example embodiments. These processes may be adapted to involve different times and/or temperatures, e.g., to work with the self-assembling approaches to metamaterial-inclusive layer formation described herein.

(75) As used herein, the terms on, supported by, and the like should not be interpreted to mean that two elements are directly adjacent to one another unless explicitly stated. In other words, a first layer may be said to be on or supported by a second layer, even if there are one or more layers therebetween.

(76) In certain example embodiments, a method of making a coated article comprising a low-E coating supported by a glass substrate is provided. The method comprises: forming a first matrix layer comprising a matrix material, directly or indirectly on the substrate; forming a donor layer comprising Ag over and contacting the first matrix layer; following formation of the donor layer, forming a second matrix layer comprising the matrix material over and contacting the donor layer, wherein the first and second matrix layers have thicknesses differing from one another by no more than 20%; heat treating the coated article with at least the first and second matrix layers and the donor layer thereon to cause the Ag in the donor layer to self-assemble into a discontinuous collection of formations distributed in the matrix material in forming a metamaterial inclusive layer that emits resonances in a desired wavelength range based at least in part on the formations located therein; and incorporating the metamaterial inclusive layer into the low-E coating.

(77) In addition to the features of the previous paragraph, in certain example embodiments, the heat treating may be performed for 15-30 minutes and/or at 600-675 degrees C.

(78) In addition to the features of either of the two previous paragraphs, in certain example embodiments, the first and second matrix layers each may have an as-deposited thickness of 30-70 nm.

(79) In addition to the features of any of the three previous paragraphs, in certain example embodiments, the matrix material may comprise Nb and/or Si (e.g., the matrix material may comprise niobium oxide).

(80) In addition to the features of any of the four previous paragraphs, in certain example embodiments, the donor layer may have an as-deposited thickness of 5-10 nm.

(81) In addition to the features of any of the five previous paragraphs, in certain example embodiments, the formations may be formed to have an interparticle spacing of 5-75 nm and diameters or major distances of 20-140 nm.

(82) In addition to the features of any of the six previous paragraphs, in certain example embodiments, the formations may be formed to have 10-50 nm thicknesses.

(83) In addition to the features of any of the seven previous paragraphs, in certain example embodiments, the formations may be substantially ellipsoidal.

(84) In addition to the features of any of the eight previous paragraphs, in certain example embodiments, the donor layer may be formed by sputter deposition performed at a power level of 10-50 kW and at a line speed of 5-15 m/min.

(85) In addition to the features of any of the nine previous paragraphs, in certain example embodiments, a plurality of continuous and uninterrupted IR reflecting layers may be formed, with each IR reflecting layer comprising Ag.

(86) In addition to the features of the previous paragraph, in certain example embodiments, a plurality of barrier layers comprising TiZrOx may be formed.

(87) In addition to the features of either of the two previous paragraphs, in certain example embodiments, the IR reflecting layers may be formed over the metamaterial inclusive layer on a side of the metamaterial inclusive layer opposite the substrate.

(88) In addition to the features of any of the three previous paragraphs, in certain example embodiments, the heat treating may be performed following formation of the IR reflecting layers.

(89) In certain example embodiments, a method of making a coated article comprising a low-E coating supported by a glass substrate is provided. The method comprises: forming a first matrix layer comprising a matrix material, directly or indirectly on the substrate; forming a continuous and uninterrupted donor layer over and contacting the first matrix layer, with the donor layer comprising one or more source material(s) selected from the group consisting of: Ag, Al, Au, AZO, Be, C, Cr, Cu, ITO, Ni, Pd, Pt, RuO2, Ti, and W; and following formation of the donor layer, forming a second matrix layer comprising the matrix material over and contacting the donor layer, wherein the first and second matrix layers have thicknesses differing from one another by no more than 20%. The coated article with at least the first and second matrix layers and the donor layer thereon are heat treatable to cause the source material(s) in the donor layer to self-assemble into a synthetic layer comprising a discontinuous collection of formations distributed in the matrix material, with the formations having a major distance no larger than 300 nm, and with the synthetic layer having resonance in a frequency range suitable for the low-E coating.

(90) In addition to the features of the previous paragraph, in certain example embodiments, the first and second matrix layers each may have an as-deposited thickness of 30-70 nm.

(91) In addition to the features of either of the two previous paragraphs, in certain example embodiments, the matrix material may comprise an oxide of Nb and/or Si.

(92) In addition to the features of any of the three previous paragraphs, in certain example embodiments, the donor layer may have an as-deposited thickness of 5-10 nm.

(93) In addition to the features of any of the four previous paragraphs, in certain example embodiments, the heat treating may be performable at a time and at a temperature sufficient to cause the formations to have an interparticle spacing of 5-75 nm and diameters or major distances of 20-140 nm.

(94) In addition to the features of any of the five previous paragraphs, in certain example embodiments, the heat treating may be performable at a time and at a temperature sufficient to cause the formations to have 10-50 nm thicknesses.

(95) In addition to the features of any of the six previous paragraphs, in certain example embodiments, the donor layer may be formed by sputter deposition performed at a power level of 10-50 kW and at a line speed of 5-15 m/min.

(96) In addition to the features of any of the seven previous paragraphs, in certain example embodiments, a plurality of continuous and uninterrupted IR reflecting layers may be formed, with each IR reflecting layer comprising Ag.

(97) In addition to the features of the previous paragraph, in certain example embodiments, a plurality of barrier layers comprising TiZrOx may be formed.

(98) In addition to the features of either of the two previous paragraphs, in certain example embodiments, the IR reflecting layers may be formed over the synthetic layer on a side of the synthetic layer opposite the substrate, following heat treatment.

(99) In addition to the features of any of the three previous paragraphs, in certain example embodiments, the IR reflecting layers are formed over the second matrix layer, prior to heat treatment.

(100) In certain example embodiments, a method of making a coated article comprising a low-E coating supported by a glass substrate is provided. The method comprises: having a plurality of layers formed on the substrate, the layers including: (a) a first matrix layer comprising a matrix material, directly or indirectly on the substrate, (b) a donor layer comprising Ag over and contacting the first matrix layer, and (c) a second matrix layer comprising the matrix material over and contacting the donor layer, wherein the first and second matrix layers have thicknesses differing from one another by no more than 20%; and heat treating the coated article with at least the first and second matrix layers and the donor layer thereon to cause the Ag in the donor layer to self-assemble into a discontinuous collection of formations distributed in the matrix material in forming a metamaterial inclusive layer, with the metamaterial inclusive layer having resonance in a selected frequency range suitable for the low-E coating.

(101) In addition to the features of the previous paragraph, in certain example embodiments, the heat treating may be performed for 15-30 minutes and/or at 600-675 degrees C.

(102) In addition to the features of either of the two previous paragraphs, in certain example embodiments, the first and second matrix layers each may have an as-deposited thickness of 30-70 nm.

(103) In addition to the features of any of the three previous paragraphs, in certain example embodiments, the matrix material may comprise an oxide of Nb and/or Si.

(104) In addition to the features of any of the four previous paragraphs, in certain example embodiments, the heat treating may be performed at a time and at a temperature sufficient to cause the formations to have an interparticle spacing of 5-75 nm and diameters or major distances of 20-140 nm.

(105) In addition to the features of any of the five previous paragraphs, in certain example embodiments, the heat treating may be performed at a time and at a temperature sufficient to cause the formations to have 10-50 nm thicknesses.

(106) In addition to the features of any of the six previous paragraphs, in certain example embodiments, a plurality of continuous and uninterrupted IR reflecting layers may be formed, with each IR reflecting layer comprising Ag.

(107) In addition to the features of the previous paragraph, in certain example embodiments, a plurality of barrier layers comprising TiZrOx may be formed.

(108) In addition to the features of either of the two previous paragraphs, in certain example embodiments, the IR reflecting layers may be formed over the metamaterial inclusive layer on a side of the metamaterial inclusive layer opposite the substrate, following heat treatment.

(109) In addition to the features of any of the three previous paragraphs, in certain example embodiments, the IR reflecting layers may be formed over the second matrix layer, prior to heat treatment.

(110) In certain example embodiments, there is provided an intermediate article, comprising a glass substrate. A first matrix layer comprising a matrix material is located directly or indirectly on the substrate. A donor layer comprising Ag is located over and contacting the first matrix layer. A second matrix layer comprising the matrix material is located over and contacting the donor layer. The first and second matrix layers have thicknesses differing from one another by no more than 20%. The intermediate article is heat treatable with at least the first and second matrix layers and the donor layer thereon to cause the Ag in the donor layer to self-assemble into a discontinuous collection of formations distributed in the matrix material in forming a metamaterial inclusive layer that emits resonances in a desired wavelength range based at least in part on the formations located therein.

(111) In addition to the features of the previous paragraph, in certain example embodiments, the first and second matrix layers each may have an as-deposited thickness of 30-70 nm.

(112) In addition to the features of either of the two previous paragraphs, in certain example embodiments, the matrix material may comprise Nb and/or Si (e.g., the matrix material may comprise niobium oxide).

(113) In addition to the features of any of the three previous paragraphs, in certain example embodiments, the donor layer may have an as-deposited thickness of 5-10 nm.

(114) In addition to the features of any of the four previous paragraphs, in certain example embodiments, the heat treating may be performable at a time and temperature sufficient to cause the formations to have an interparticle spacing of 5-75 nm and diameters or major distances of 20-140 nm.

(115) In addition to the features of any of the five previous paragraphs, in certain example embodiments, the heat treating may be performable at a time and temperature sufficient to cause the formations to have 10-50 nm thicknesses.

(116) In addition to the features of any of the six previous paragraphs, in certain example embodiments, a plurality of continuous and uninterrupted IR reflecting layers may be provided, with each IR reflecting layer comprising Ag.

(117) In addition to the features of the previous paragraph, in certain example embodiments, a plurality of barrier layers comprising TiZrOx may be provided.

(118) In addition to the features of either of the two previous paragraphs, in certain example embodiments, the IR reflecting layers may be formed over the metamaterial inclusive layer on a side of the metamaterial inclusive layer opposite the substrate.

(119) While the invention has been described in connection with what is presently considered to be the most practical and preferred embodiment, it is to be understood that the invention is not to be limited to the disclosed embodiment, but on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the appended claims.