Plasma source

Abstract

The invention concerns a plasma source including a quarter wave antenna (204) located in a cylindrical enclosure (202) provided with an opening (208) opposite the end of the antenna (204). The diameter (d) of the antenna (204) is in the range from one third to one quarter of the inner diameter (d.sub.1) of the enclosure (202). The distance (l) between the end of the antenna (204) and the opening (208) is in the range from to 5/3 of the diameter (d) of the antenna (204).

Claims

1. A plasma source comprising a quarter wave antenna located in a cylindrical enclosure provided with an opening opposite the end of the antenna, wherein: the diameter (d) of the antenna is in the range from one third to one quarter of the inner diameter (d.sub.1) of the enclosure, the distance (l) between the end of the antenna and the opening is in the range from to 5/3 of the diameter (d) of the antenna.

2. The plasma source of claim 1, wherein the inner diameter (d.sub.1) of the enclosure is in the order of 10 mm.

3. The plasma source of claim 2, wherein the inner diameter (d.sub.1) of the enclosure is 10 mm, the diameter (d) of the antenna is in the range from 2.5 to 3.3 mm, and the distance (l) between the end of the antenna and the opening is in the range from 1.5 to 5.5 mm.

4. The plasma source of claim 3, wherein the opening is a circular opening having a diameter in the range from 1 m to the inner diameter (d.sub.1) of the enclosure.

5. The plasma source of claim 1, wherein the opening is a circular opening having a diameter in the range from 1 m to the inner diameter (d.sub.1) of the enclosure.

6. The plasma source of claim 1, wherein the opening is an extraction grid.

7. The plasma source of claim 1, wherein the excitation frequency of the antenna is 2.45 GHz.

8. An extensive plasma source comprising an assembly of plasma sources of claim 1 arranged side by side.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) The foregoing and other features and advantages will be discussed in detail in the following non-limiting description of specific embodiments in connection with the accompanying drawings, in which:

(2) FIG. 1, previously described, is a cross-section view of a plasma source and is a copy of FIG. 1 of patent application JPH09245658;

(3) FIGS. 2A to 2C show plasma chambers provided with antennas having different diameters;

(4) FIGS. 3A and 3B are diagrams showing the average energy E radiated by the antenna in various areas according to diameter d of the antenna; and

(5) FIG. 4 is a simplified front view of an embodiment of a plasma source.

DETAILED DESCRIPTION

(6) The same elements have been designated with the same reference numerals in the different drawings. For clarity, only those steps and elements which are useful to the understanding of the described embodiments have been shown and are detailed. In particular, the plasma source elements surrounding the plasma chamber, such as, in particular, a gas inlet, permanent magnets, connections of high-frequency signals and extraction electrodes, are not shown.

(7) The terms approximately, substantially, and in the order of are used herein to designate a tolerance of plus or minus 10%, preferably of plus or minus 5%, of the value in question

(8) FIGS. 2A to 2C are cross-section views of cylindrical plasma chambers 100, all identical, having quarter wave antennas 102 of different diameters arranged therein. Quarter wave antenna means an antenna having a length approximately equal to one quarter of the wavelength of the excitation signal of the antenna.

(9) The antennas of FIGS. 2A, 2B, and 2C have respective diameters of 1, 3, and 6 mm. Each plasma chamber 100 comprises an opening or extraction grid 104 through which ions of the plasma may be extracted.

(10) In each enclosure 100, a surface 105 delimits a plasma-forming region. Such a plasma-forming region corresponds to the area surrounding the antenna where the electromagnetic field has a sufficiently high value to enable to form the plasma. This value may for example be in the order of 10.sup.4 V/m.

(11) The inventors consider a first region 106 in each plasma-forming region. Region 106 is located on the side of opening or extraction grid 104. Region 106, here called useful region, contains a plasma which will be called useful plasma, that is, the plasma from which ions can be extracted to form an ion source.

(12) The inventors further consider a second region 108 in each plasma forming region. Region 108 is located around antenna 102 along at least part of its length. Region 108, here called useless region, contains a plasma which will be called useless plasma. The useless plasma cannot be extracted from the plasma source, and thus has no useful role but appears to be the cause of the degradation of antenna 102 described in patent application JPH09245658.

(13) The inventors have thus attempted to maximize the useful plasma volume while decreasing the useless plasma volume. To achieve this, the inventors have studied the incidence of the diameter of antenna 102 of a plasma chamber 100 on such useful and useless plasma regions.

(14) In FIGS. 2A or 2C, as well as in the following drawings, plasma chambers 100 having an inner diameter equal to 10 mm are considered as an example.

(15) In FIG. 2A, antenna 102 has a 1-mm diameter. This corresponds to the dimensions of the antenna and of the plasma chamber illustrated in the above-mentioned Japanese patent application.

(16) In FIG. 2B, antenna 102 has a 3-mm diameter. Useless region 108 has a smaller volume than in the case of FIG. 2A, which results in a decreased degradation. Useless region 106 however keeps a similar volume.

(17) In FIG. 2C, antenna 102 has a 6-mm diameter. Useless region 108 has a further decreased volume. However, the volume of useless region 106 is also decreased.

(18) FIGS. 3A and 3B are diagrams respectively showing the energy E stored in useful region 106 and in useless region 108, according to diameter d of antenna 102, for a same radiated power having a 5-W intensity at a 2.45-GHz frequency.

(19) In FIG. 3A, is can be observed that the energy E stored in useful region 106, for diameters d of antenna 102 in the range from 1 to 3 mm, is approximately constant, and close to 6.10.sup.11 J. It can also be observed that, for diameters d in the range from 3 to 6 mm, the energy E stored in useful region 106 markedly decreases to reach a substantially half value, close to 3.10.sup.11 J for a diameter d of the antenna 102 of 6 mm.

(20) In FIG. 3B, it can be observed that the energy E stored in useless region 108 decreases by a factor substantially equal to 3, from 2.10.sup.9 J to 6, 4.10.sup.10 J, when the diameter of antenna 102 increases from 1 to 6 mm.

(21) As shown in FIG. 3B, an increase in the diameter of the antenna causes a decrease in the volume of useless region 108, that is, a decrease in the quantity of useless plasma likely to deteriorate antenna 102. Further, as shown in FIG. 3A, useless region 106 contains a substantially constant quantity of useful plasma for diameters of antenna 102 approximately in the range from 1 to 3 mm.

(22) An advantageous diameter of antenna 102 thus is a diameter which enables to keep as large a volume as possible of useful region 106 while reducing as much as possible the volume of useless region 108.

(23) The inventors have thus determined that an advantageous diameter of the antenna is approximately 3 mm, for example, in the range from 2.5 to 3.3 mm, for an inner diameter of plasma chamber 100 of 10 mm. This corresponds to a diameter of a plasma source in the range from one quarter to one third of the inner diameter of the plasma chamber.

(24) FIG. 4 is a simplified cross-section view of an embodiment of a plasma chamber 200. Plasma chamber 200 comprises a cylindrical enclosure 202. A quarter wave antenna 204 is arranged in enclosure 202. The base of antenna 204 is isolated from the enclosure by an isolator 206. Enclosure 202 comprises an opening 208 opposite the end of antenna 204. Opening 208 is, in this example, a circular opening. Opening 208 may also be an extraction grid. The inner diameter d.sub.1 of the enclosure is 10 mm in this example. As previously determined, an optimal value of diameter d of antenna 204 is in the range from one quarter to one third of inner diameter d.sub.1 of the enclosure, that is, approximately from 2.5 to 3.3 mm. Distance l between the end of antenna 204 and opening 208 has a value for example in the range from to 5/3 of the diameter of antenna 204, that is, here in the range from 1.5 to 5.5 mm. Similarly, diameter d.sub.2 of opening 208 in the example of FIG. 4 has a diameter approximately equal to diameter d of antenna 208, for example, in the range from to 6/5 of diameter d of antenna 204.

(25) Specific embodiments have been described. Various alterations, modifications, and improvements will readily occur to those skilled in the art. In particular, the inner diameter d.sub.1 of the plasma chamber is here described as having a 10-mm value. This diameter may be selected differently.

(26) Further, the diameter of opening 208 may vary between 1 m and inner diameter d.sub.1 of the enclosure.

(27) Such plasma sources may be associated to form an extended plasma source.