Electrode plate and surface treatment method thereof

Abstract

The disclosure provides an electrode plate and a surface treatment method thereof. The surface treatment method firstly adopts a special annealing process to process the electrode plate to form a Mg film on the surface of the MgAl alloy material layer, and then make the Mg film chemically react with the fluoride ion to form a MgF.sub.2 film on the surface of the Mg film or the Mg film is converted into a MgF.sub.2 filmentirely. Due to the dense structure and chemical stability of MgF.sub.2 film, the fluoride ion corrosion resistance of the electrode plate is improved. The surface of the electrode plate of the disclosure includes a MgF.sub.2 film capable of being used as a protective layer to protect the MgAl alloy material layer. Therefore, the electrode plate has excellent corrosion resistance against fluoride ions and can improve the quality of film formation by chemical vapor deposition.

Claims

1. A surface treatment method of an electrode plate, comprising the following steps: step 1: providing an electrode plate, wherein the electrode plate comprises a magnesium-aluminum alloy material layer; annealing the electrode plate to make a part of a magnesium element be precipitated from the magnesium-aluminum alloy material layer to form a magnesium film on a surface of the magnesium-aluminum alloy material layer; step 2: arranging the electrode plate in a closed chamber, introducing a plasma containing fluorine ions into the closed chamber and the magnesium film on the surface of the electrode plate chemically reacts with fluorine ions and form a magnesium fluoride film on the surface of the electrode plate.

2. The surface treatment method of the electrode plate according to claim 1, wherein in the step 2, when the magnesium film completely reacts, the magnesium film is converted into the magnesium fluoride film entirely.

3. The surface treatment method of the electrode plate according to claim 1, wherein in the step 1, an annealing temperature of the electrode plate is from 500 C. to 700 C., and a heat preservation time is from 30 minutes to 2 hours.

4. The surface treatment method of the electrode plate according to claim 1, wherein a content of the magnesium element in the magnesium-aluminum alloy material layer is from 0.2 wt % to 2 wt %.

5. The surface treatment method of the electrode plate according to claim 1, wherein a thickness of the magnesium film obtained in the step 1 is from 5 to 10 m.

6. The surface treatment method of the electrode plate according to claim 1, wherein in the step 2, the plasma containing fluorine ion is a plasma of fluorine-containing gas; wherein the fluorine-containing gas comprises one or more of NF.sub.3 and SF.sub.6.

7. The surface treatment method of the electrode plate according to claim 6, wherein the electrode plate is an electrode plate configured to generate a radio frequency electric field in a PECVD apparatus, and a number of the electrode plates is two and the two electrode plates are oppositely arranged to each other; wherein a specific operation of the step 2 is as follows: introducing the fluorine-containing gas into the PECVD apparatus and energizing the two electrode plates oppositely arranged to each other to make the two electrode plates generate the radio frequency electric field, then the fluorine-containing gas dissociates into the plasma containing fluorine ions under an action of the radio frequency electric field, and the magnesium film on the surface of the two electrode plates chemically reacts with fluorine ions to form the magnesium fluoride film on the surface of the two electrode plates.

8. The surface treatment method of the electrode plate according to claim 1, wherein after the step 2, the electrode plate comprises the magnesium-aluminum alloy material layer, the magnesium fluoride film, and a magnesium film sandwiched between and in contact with the magnesium-aluminum alloy material layer and the magnesium fluoride film.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) The technical proposal of the disclosure and other advantageous effects will be apparent from the following detailed description of specific embodiments of the disclosure taken in conjunction with the accompanying drawings.

(2) In the drawings,

(3) FIG. 1 is a flow chart of a surface treatment method of an electrode plate according to the disclosure;

(4) FIGS. 2 and 3 are schematic diagram of step 1 of the surface treatment method of the electrode plate according to the disclosure;

(5) FIG. 4A is a schematic diagram of a first embodiment of the step 2 of the surface treatment method of the electrode plate and a schematic diagram of a structure of the first embodiment of the electrode plate according to the disclosure; and

(6) FIG. 4B is a schematic diagram of a second embodiment of the step 2 of the surface treatment method of the electrode plate and a schematic diagram of a structure of the second embodiment of the electrode plate according to the disclosure.

DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS

(7) To further illustrate the technical means adopted by the disclosure and the effects thereof, the following describes in detail the preferred embodiments of the disclosure and the accompanying drawings.

(8) Referring to FIG. 1, the disclosure provides a surface treatment method of an electrode plate, including the following steps:

(9) step 1: as shown in FIGS. 2 and 3, providing an electrode plate 10, and the electrode plate 10 includes a magnesium-aluminum (MgAl) alloy material layer 11;

(10) annealing the electrode plate 10 to make a part of the Mg element be precipitated from the MgAl alloy material layer to form a Mg film on the surface of the MgAl alloy material layer.

(11) Specifically, in the step 1, an annealing temperature of the electrode plate is from 500 C. to 700 C., and a heat preservation time is from 30 minutes to 2 hours, preferably 1 hour.

(12) Specifically, in the MgAl alloy material layer 11, the content of Mg element is 0.2 wt % to 2 wt %, and usually about 1 wt %.

(13) Specifically, the Mg film 12 obtained in the step 1 has a thickness of 5 to 10 m.

(14) Step 2: as shown in FIGS. 4A and 4B, arranging the electrode plate 10 in a closed chamber, introducing a plasma containing fluorine ions into the closed chamber and the Mg film 12 on the surface of the electrode plate 10 chemically reacts with fluorine ions and forms a magnesium fluoride (MgF.sub.2) film 13 on the surface of the electrode plate 10.

(15) Specifically, in the step 2, when the Mg film 12 completely reacts, the Mg film 12 is converted into the MgF.sub.2 film 13 entirely.

(16) The MgF.sub.2 film can be used as a protective layer to protect the MgAl alloy material layer; compared with the conventional Al.sub.2O.sub.3 protective layer on the surface of the electrode plate, the MgF.sub.2 film 13 has a denser structure and no pore structure, and since the chemical properties of MgF.sub.2 is more stable, MgF.sub.2 will not react with fluoride ions, thereby having a better corrosion resistance.

(17) Specifically, in the step 2, a plasma containing fluorine ion is a plasma of fluorine-containing gas, and the fluorine-containing gas includes one or more of NF.sub.3 and SF.sub.6.

(18) Specifically, the electrode plate 10 is an electrode plate configured to generate a radio frequency electric field in a PECVD apparatus, and a number of the electrode plates is two and the two electrode plates are oppositely arranged to each other;

(19) the specific operation of the step 2 is as follows: introducing a fluorine-containing gas into the PECVD apparatus and energizing the two electrode plates 10 oppositely arranged to each other to make the two electrode plates 10 generate the radio frequency electric field, then the fluorine-containing gas dissociates into a plasma containing fluorine ions under an action of the radio frequency electric field, and the Mg film 12 on surfaces of the two electrode plates 10 chemically reacts with fluorine ions to form a MgF.sub.2 film 13 on the surface of the two electrode plates 10.

(20) Referring to FIGS. 4A and 4B, based on the surface treatment method of the electrode plate, the disclosure further provides an electrode plate 10 including a surface of a MgF.sub.2 film 13 and a MgAl alloy material layer 11 under the MgF.sub.2 film 13.

(21) As shown in FIG. 4A, in the first embodiment of the electrode plate of the disclosure, the MgF.sub.2 film 13 is disposed on the surface of the MgAl alloy material layer 11, and the thickness of the MgF.sub.2 film 13 is from 5 to 10 m.

(22) As shown in FIG. 4B, in the first embodiment of the electrode plate of the disclosure, a Mg film 12 is further disposed between the MgAl alloy material layer 11 and the MgF.sub.2 film 13, and a total thickness of the Mg film 12 and the MgF.sub.2 film 13 is from 5 to 10 m.

(23) Specifically, the electrode plate 10 is an electrode plate configured to generate a radio frequency electric field in a PECVD apparatus.

(24) In summary, the disclosure provides an electrode plate and a surface treatment method thereof. The surface treatment method of the electrode plate of the disclosure firstly adopts a special annealing process to process the electrode plate to form a Mg film on the surface of the MgAl alloy material layer, and then make the Mg film chemically react with the fluoride ion to form a MgF.sub.2 film on the surface of the Mg film or the Mg film is converted into a MgF.sub.2 filmentirely, and the MgF.sub.2 film can be used as a protective layer to protect the MgAl alloy material layer; compared with the conventional Al.sub.2O.sub.3 protective layer on the surface of the electrode plate, the MgF.sub.2 film 13 has a denser structure and no pore structure, and since the chemical properties of MgF.sub.2 is more stable, MgF.sub.2 will not react with fluoride ions, so as to improve the fluoride ion corrosion resistance of the electrode plate and improve the quality of film formation by chemical vapor deposition. The surface of the electrode plate of the disclosure includes a MgF.sub.2 film and the MgF.sub.2 film can be used as a protective layer to protect the MgAl alloy material layer, and therefore, the electrode plate has excellent corrosion resistance against fluoride ions and can improve the quality of film formation by chemical vapor deposition.

(25) As described above, it will be apparent to those skilled in the art that various other changes and modifications may be made in accordance with the technical solutions and technical concepts of the disclosure, and all such changes and modifications are subject to be included in the scope of protection of the appended claims.