METHOD FOR PREPARING ULTRAVIOLET (UV) CURING POLYMETHYL SILOXANE CONTAINING ACRYLATE STRUCTURE
20200299462 ยท 2020-09-24
Inventors
- Xiaoqiang XUE (Changzhou, Jiangsu, CN)
- Bibiao JIANG (Changzhou, Jiangsu, CN)
- Wenyan HUANG (Changzhou, Jiangsu, CN)
- Hongjun YANG (Changzhou, Jiangsu, CN)
- Qimin JIANG (Changzhou, Jiangsu, CN)
- Jiayue SUN (Changzhou, Jiangsu, CN)
Cpc classification
C08J2383/10
CHEMISTRY; METALLURGY
C08J2367/02
CHEMISTRY; METALLURGY
C08J2483/10
CHEMISTRY; METALLURGY
C08J7/0427
CHEMISTRY; METALLURGY
C08G77/38
CHEMISTRY; METALLURGY
International classification
Abstract
The present invention relates to a method for preparing an ultraviolet (UV) curing polymethyl siloxane containing an acrylate structure: performing a Michael addition reaction with an amino silicone oil by means of an asymmetric diene acrylate ethylene glycol methacrylate, the double bond of asymmetric diene having a large difference in activity, and the acrylate structure preferentially undergoing addition with an amino group; thus, a methacrylic structure is successfully linked to a side chain of the methyl silicone oil, and a methyl silicone oil having a controllable structure and having a side group containing the methacrylate structure is prepared, the reaction having a high grafting rate; the described method is a high-efficiency, mild and controllable preparation method; a conventional compound photoinitiator is selected, and is coated on a substrate for UV curing, quickly curing at room temperature to form a film, and having the features of being clean and pollution-free.
Claims
1. A method for preparing an ultraviolet (UV) curing polymethyl siloxane containing an acrylate structure, comprising: performing a Michael addition reaction with an amino silicone oil by means of an asymmetric diene-structured acrylate ethylene glycol methacrylate, the grafting rate of methacrylate reaching more than 95%; a reaction formula of the polymethyl siloxane being [1]: ##STR00007## or a reaction formula being [2]: ##STR00008##
2. The method for preparing an ultraviolet (UV) curing polymethyl siloxane containing an acrylate structure according to claim 1, wherein in the formula [1], m in the structure of the raw material A, amino-terminated silicone oil, is any integer, and may be set as m=15200, molecular weight being 100015000; raw material B is of an asymmetric diene structure, acrylate ethylene glycol methacrylate, and the use amount of the raw material B is hydrogen quantity in amino of amino silicone oil of equal molar weight.
3. The method for preparing an ultraviolet (UV) curing polymethyl siloxane containing an acrylate structure according to claim 1, wherein in the formula [2], m and n in the structure of raw material A, amino-terminated silicone oil, may be any integer, and may be set as m=20150, n=120, m:n=1:150:1, molecular weight being 100020000; raw material B is acrylate ethylene glycol methacrylate which is of an asymmetric diene structure, and the use amount of the raw material B is hydrogen quantity in amino of amino silicone oil of equal molar weight.
4. The method for preparing an ultraviolet (UV) curing polymethyl siloxane containing an acrylate structure according to claim 1, the ultraviolet (UV) curing polymethyl siloxane containing an acrylate structure being prepared by the following steps: (1) respectively adding amino silicone oil and solvent tetrahydrofuran to a reactor with a constant-pressure base solution funnel and a magnetic stirrer, dripping an acrylate ethylene glycol methacrylate-tetrahydrofuran solution to a reaction solution while stirring at normal temperature, lasting for 30 min, continuing to react for 5 h, and performing reduced pressure distillation after reaction is ended to obtain a solvent, so as to prepare polymethyl siloxane (PSi-MA) containing an acrylate structure; and (2) mixing PSi-MA with a compound photoinitiator to form a homogeneous phase, bubbling by selecting an inert gas to remove oxygen, performing roller coating to coat the solution to a PET film, and continuously performing ultraviolet irradiation for 15 seconds, to prepare a PSi-MA film.
5. The method for preparing an ultraviolet (UV) curing polymethyl siloxane containing an acrylate structure according to claim 4, wherein the reaction temperature in step (1) is 25 C. room temperature; and reaction time is 5 hours, PSi-MA is obtained by reduced pressure rotary evaporation, a solvent is recyclable, and the whole technological process is simple and controllable.
6. The method for preparing an ultraviolet (UV) curing polymethyl siloxane containing an acrylate structure according to claim 4, wherein the photoinitiator in step (2) is compounded by two or more than two photoinitiators out of 1-hydroxycyclohexyl phenyl ketone (184), 2-hydroxyl-4-(2-hydroxylethoxy)-2-methylpropiophenone, 2,4,6(trimethyl benzoyl)diphenylphosphine oxide, 2,4,6-ethyl trimethyl benzoyl phosphonate, 2-isopropylthioxanthone and 4-dimethylamino-ethyl benzoate.
7. The method for preparing an ultraviolet (UV) curing polymethyl siloxane containing an acrylate structure according to claim 4, wherein the use amount of the compound photoinitiator is the mass content of PSi-MA, which is 0.1%-2%, PSi-MA is mixed with the compound photoinitiator to form a homogeneous phase, and inert gas such as high-purity nitrogen (99.99%) or argon is selected as a protective gas to perform ultraviolet irradiation for 15 seconds, to prepare a PSi-MA film.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0022]
[0023]
[0024]
[0025]
[0026]
[0027]
[0028]
[0029]
[0030]
DESCRIPTION OF THE EMBODIMENTS
[0031] The following further describes the present invention with reference to embodiments:
Embodiment 1
[0032] Synthesis of a polymethyl siloxane material (PSi-MA) containing an acrylate-terminated structure. A synthesis reaction formula [1] being:
##STR00005##
[0033] wherein B is glycol methacrylate, is of an asymmetric diene structure, self-made, and has controllability for Michael addition reaction;
[0034] A is amino-terminated silicone oil, namely, amino-terminated polymethoxy siloxane, with a structure as shown in formula [1], self-made;
[0035] Respectively adding amino silicone oil (12.00 g, 0.01 mol) and solvent tetrahydrofuran (100 mL) to a 250 mL three-neck flask with a constant-pressure base solution funnel and a magnetic stirrer. Dripping an acrylate ethylene glycol methacrylate (7.36 g, 0.04 mol)-tetrahydrofuran solution (50 mL) to a reaction solution while stirring at normal temperature, lasting for 30 min, continuing to react for 5 h, and performing reduced pressure distillation after reaction is ended to obtain a solvent, so as to prepare a polymethyl siloxane material (PSi-MA) containing an acrylate-terminated structure.
Embodiment 2
[0036] Synthesis of a polymethyl siloxane material (PSi-MA) containing an acrylate-terminated structure. A synthesis reaction formula is the same as that in [1].
[0037] The difference from embodiment 1 is that the molecular weight of amino-terminated silicone oil in formula [1] is 2300, m=30.
[0038] Under the circumstance of not changing other conditions of embodiment 1, during preparation, masses of amino silicone oil and glycol methacrylate are respectively: 11.5 g and 3.68 g, the use amount of the solvent is unchanged, tetrahydrofuran can be replaced with ethyl acetate, methylbenzene, dimethylbenzene, butanone and so on, the operation process is unchanged, and it is verified by the nuclear magnetic map and infrared characterization that PSi-MA is successfully prepared, molecular weight being 3000, and grafting rate of methacrylate reaching 95%. Mark number is PSi-MA02.
Embodiment 3
[0039] Synthesis of a polymethyl siloxane material (PSi-MA) having a side group containing the methacrylate structure. A synthesis reaction formula is the same as that in [1].
[0040] The difference from embodiment 1 is that the molecular weight of amino-terminated silicone oil in formula [1] is 4500, m=60.
[0041] Under the circumstance of not changing other conditions of embodiment 1, masses of amino silicone oil and glycol methacrylate during preparation are respectively: 11.25 g and 1.84 g, the use amount of the solvent is unchanged, tetrahydrofuran can be replaced with ethyl acetate, methylbenzene, dimethylbenzene, butanone and so on, the operation process is unchanged, and it is verified by the nuclear magnetic map and infrared characterization that PSi-MA is successfully prepared, molecular weight being 5200, and grafting rate of methacrylate reaching 93%. Mark number is PSi-MA03.
Embodiment 4
[0042] Synthesis of a polymethyl siloxane material (PSi-MA) containing an acrylate-terminated structure. A synthesis reaction formula is the same as that in [1].
[0043] The difference from embodiment 1 is that the molecular weight of amino silicone oil in formula [1] is 8900, m=120.
[0044] Under the circumstance of not changing other conditions of embodiment 1, masses of amino silicone oil and glycol methacrylate during preparation are respectively: 8.9 g and 0.74 g, the use amount of the solvent is unchanged, tetrahydrofuran can be replaced with ethyl acetate, methylbenzene, dimethylbenzene, butanone and so on, the operation process is unchanged, and it is verified by the nuclear magnetic map and infrared characterization that PSi-MA is successfully prepared, molecular weight being 9600, and grafting rate of methacrylate reaching 90%. Mark number is PSi-MA04.
Embodiment 5
[0045] Ultraviolet curing reaction of a polymethyl siloxane material (PSi-MA) containing a methacrylate-terminated structure.
[0046] A compound photoinitiator: prepared from 1-hydroxycyclohexyl phenyl ketone (184) and 2-hydroxyl-4-(2-hydroxylethoxy)-2-methylpropiophenone which are mixed according to a mass ratio of 1:1.
[0047] Mixing PSi-MA synthesized in reaction formula [1] with the foregoing compound photoinitiator according to a mass ratio of 100:1 to form a homogeneous phase, bubbling by adopting an inert gas, such as high-purity nitrogen (99.99%) or argon, to remove oxygen, performing roller coating to coat the solution to a PET film in a nitrogen atmosphere, and continuously performing ultraviolet irradiation for 5 seconds, to prepare a PSi-MA film.
[0048] Curing PSi-MA prepared in embodiments 14 to form films, mark number being respectively PSi-MA01A, PSi-MA02A, PSi-MA03A, PSi-MA04A. Performing release performance test on the cured films.
TABLE-US-00001 TABLE 1 Release parameters of PSi-MA films Contact Release Residual Samples angle/ force/g/in adhesion rate/% Pure PET 70 PSi-MA01 88 11.5 91 PSi-MA02 89 9.2 95 PSi-MA03 87 10.1 90 PSi-MA04 87 9.2 89
indicates data missing or illegible when filed
[0049] Table 1 is release performance results of PSi-MA films of different structures in a condition with a same compound photoinitiator, indicating that the residual adhesion rate of PSi-MA02A is the highest, which is up to 95%, meanwhile, release force is 9.2 g/in, a contact angle is promoted to 89 from 70 before modification, as shown in
Embodiment 6
[0050] Ultraviolet curing reaction of a polymethyl siloxane material (PSi-MA) containing an acrylate-terminated structure.
[0051] The difference from embodiment 5 is a compound photoinitiator: prepared from 2,4,6(trimethyl benzoyl)diphenylphosphine oxide and 4-dimethylamino-ethyl benzoate which are mixed according to a mass ratio of 1:1.
[0052] Under the circumstance of not changing other conditions of embodiment 5, curing PSi-MA prepared in embodiments 1-4 to form films, mark number being respectively PSi-MA01B, PSi-MA02B, PSi-MA03B, PSi-MA04B. Performing release performance test on the cured films.
TABLE-US-00002 TABLE 2 Release parameters of PSi-MA films Contact Release Residual Samples angle/ force/g/in adhesion rate/% Pure PET 70 PSi-MA01 88 11.0 90 PSi-MA02 88 9.1 94 PSi-MA03 85 9.5 91 PSi-MA04 87 10.0 89
indicates data missing or illegible when filed
[0053] Table 2 is release performance results of PSi-MA films of different structures in a condition with a same compound photoinitiator, indicating that the residual adhesion rate of PSi-MA02B is the highest, which is up to 94%, meanwhile, release force is 9.1 g/in, a contact angle is promoted to 88 from 70 before modification, polymer films of other mark numbers also meet the requirements, while the preparation effect of PSi-MA02 is the best, molecular weight is 3000, and the structure is the most reasonable, and thus are the optimal reaction conditions.
Embodiment 7
[0054] The difference of ultraviolet curing reaction of a polymethyl siloxane material (PSi-MA) containing an acrylate-terminated structure from embodiment 5 is a compound photoinitiator: prepared from 2,4,6-ethyl trimethyl benzoyl phosphonate and 2-isopropylthioxanthone which are mixed according to a mass ratio of 1:1.
[0055] Under the circumstance of not changing other conditions of embodiment 5, curing PSi-MA prepared in embodiments 14 to form films, mark number being respectively PSi-MA01C, PSi-MA02C, PSi-MA03C, PSi-MA04C. Performing release performance test on the cured films.
TABLE-US-00003 TABLE 3 Release parameters of PSi-MA films Release Residual Samples force/g/in adhesion rate Pure PET PSi-MA01 10.7 90 PSi-MA02 9.6 95 PSi-MA03 10.0 88 PSi-MA04 12.2 86
indicates data missing or illegible when filed
[0056] Table 3 is release performance results of PSi-MA films of different structures in a condition with a same compound photoinitiator, indicating that the residual adhesion rate of PSi-MA02C is the highest, which is up to 95%, meanwhile, release force is 9.6 g/in, a contact angle is promoted to 88 from 70 before modification, polymer films of other mark numbers also meet the requirements, while the preparation effect of PSi-MA02 is the best, molecular weight is 3000, and the structure is the most reasonable, and thus are the optimal reaction conditions.
Embodiment 8
[0057] Under the circumstance of not changing other conditions of embodiment 5, preparing a PSi-MA film by adopting PSi-MA and a compound photoinitiator according to a mass ratio of 200:1, and testing release performances.
TABLE-US-00004 TABLE 4 Release parameters of PSi-MA films Contact Release Residual Samples angle/ force/g/in adhesion rate/% Pure PET 70 PSi-MA01 86 8.5 87 PSi-MA02 87 10.2 90 PSi-MA03 84 10.3 82 PSi-MA04 85 9.7 85
indicates data missing or illegible when filed
[0058] Table 4 is release performance results of PSi-MA films of different structures in a condition with a same compound photoinitiator, indicating that the residual adhesion rate of PSi-MA02D is the highest, which is up to 90%, meanwhile, release force is 10.2 g/in, a contact angle is promoted to 87 from 70 before modification, and in comparison with embodiment 5, the residual adhesion rate of PSi-MA02D is lower than that of PSi-MA02A, therefore, the optimum use amount of the initiator is greater than the mass of PSi-MA by 1%.
[0059] It is known from embodiment 5 and embodiments 6, 7 that PSi-MA can be effectively initiated by using all the compound photoinitiators described in the present invention, without obvious difference in effect, indicating that PSi-MA has better compatibility to initiators, is insensitive to the structure of initiators, and thus is favorable for popularization and application; the preparation effect of PSi-MA02 is the best, molecular weight is 3000, the structure is the most reasonable, and embodiment 1 is the optimal reaction condition. Moreover, by comparing embodiment 5 with embodiment 8, based on consideration on cost, the optimum use amount of the initiator is greater than the mass of PSi-MA by 1%.
[0060] The followings are embodiments of reaction formula [2]:
Embodiment 9
[0061] Synthesis of a polymethyl siloxane material (PSi-MA) having a side group containing the methacrylate structure. A synthesis reaction formula [2] being:
##STR00006##
[0062] wherein B is glycol methacrylate, is of an asymmetric diene structure, self-made, and has controllability for Michael addition reaction,
[0063]
[0064] A is amino silicone oil, namely, amino polymethoxy siloxane, with a structure as shown in formula [2], molecular weight being 8200, self-made;
[0065] Respectively adding amino silicone oil (10.00 g, 0.00125 mol) and solvent tetrahydrofuran (100 mL) to a 250 mL three-neck flask with a constant-pressure base solution funnel and a magnetic stirrer. Dripping an acrylate ethylene glycol methacrylate (3.50 g, 0.019 mol)-tetrahydrofuran solution (50 mL) to a reaction solution while stirring at normal temperature, lasting for 30 min, continuing to react for 5 h, and performing reduced pressure distillation after reaction is ended to obtain a solvent, so as to prepare a polymethyl siloxane material (PSi-MA) having a side group containing a methacrylate structure.
Embodiment 10
[0066] Synthesis of a polymethyl siloxane material (PSi-MA) having a side group containing the methacrylate structure. A synthesis reaction formula is the same as that in embodiment 9.
[0067] The difference from embodiment 9 is that the molecular weight of amino silicone oil is 8200, m=90, n=10, and the molar content of amino-containing methylsiloxane is 10%. Under the circumstance of not changing other conditions of embodiment 9, parts by weight of amino silicone oil and glycol methacrylate during preparation are respectively: 10 parts and 7 parts, the use amount of the solvent is unchanged, tetrahydrofuran can be replaced with ethyl acetate, methylbenzene, dimethylbenzene, butanone and so on, the operation process is unchanged, and it is verified by the nuclear magnetic map and infrared characterization that PSi-MA is successfully prepared, grafting rate of methacrylate reaching 95%. Mark number: PSi-MA02.
Embodiment 11
[0068] Synthesis of a polymethyl siloxane material (PSi-MA) having a side group containing the methacrylate structure. A synthesis reaction formula is the same as that in embodiment 9.
[0069] The difference from embodiment 9 is that the molecular weight of amino silicone oil is 8200, m=104, n=3, and the molar content of amino-containing methylsiloxane is 2.8%.
[0070] Under the circumstance of not changing other conditions of embodiment 9, parts by weight of amino silicone oil and glycol methacrylate during preparation are respectively: 10 parts and 2.5 parts, the use amount of the solvent is unchanged, tetrahydrofuran can be replaced with ethyl acetate, methylbenzene, dimethylbenzene, butanone and so on, the operation process is unchanged, and it is verified by the nuclear magnetic map and infrared characterization that PSi-MA is successfully prepared, grafting rate of methacrylate reaching 95%. Mark number: PSi-MA03.
Embodiment 12
[0071] Synthesis of a polymethyl siloxane material (PSi-MA) having a side group containing the methacrylate structure. A synthesis reaction formula is the same as that in embodiment 9.
[0072] The difference from embodiment 9 is that the molecular weight of amino silicone oil is 4100, m=50, n=3, and the molar content of amino-containing methylsiloxane is 5.7%.
[0073] Under the circumstance of not changing other conditions of embodiment 9, parts by weight of amino silicone oil and glycol methacrylate during preparation are respectively: 10 parts and 3.5 parts, the use amount of the solvent is unchanged, tetrahydrofuran can be replaced with ethyl acetate, methylbenzene, dimethylbenzene, butanone and so on, the operation process is unchanged, and it is verified by the nuclear magnetic map and infrared characterization that PSi-MA is successfully prepared, grafting rate of methacrylate reaching 92%. Mark number: PSi-MA04.
Embodiment 13
[0074] Ultraviolet curing reaction of a polymethyl siloxane material (PSi-MA) containing a methacrylate structure.
[0075] A compound photoinitiator: prepared from 1-hydroxycyclohexyl phenyl ketone (184) and 2-hydroxyl-4-(2-hydroxylethoxy)-2-methylpropiophenone which are mixed according to a mass ratio of 1:1.
[0076] Mixing PSi-MA of embodiment 9 with the foregoing compound photoinitiator according to a mass ratio of 100:1 to form a homogeneous phase, bubbling by adopting an inert gas, such as high-purity nitrogen (99.99%) or argon, to remove oxygen, performing roller coating to coat the solution to a PET film in a nitrogen atmosphere, and continuously performing ultraviolet irradiation for 5 seconds, to prepare a PSi-MA film.
[0077] Curing PSi-MA prepared in embodiments 1-4 to form films, mark number being respectively PSi-MA01A, PSi-MA02A, PSi-MA03A, PSi-MA04A. Performing release performance test on the cured films.
TABLE-US-00005 TABLE 5 Release parameters of PSi-MA films Contact Release Residual Samples angle/ force/g/in adhesion rate/% Pure PET 70 PSi-MA01 85 9.5 95 PSi-MA02 84 12.2 88 PSi-MA03 82 10.1 90 PSi-MA04 83 9.2 89
indicates data missing or illegible when filed
[0078] Table 5 is release performance results of PSi-MA films of different structures in a condition with a same compound photoinitiator, indicating that the residual adhesion rate of PSi-MA01A is the highest, which is up to 95%, meanwhile, release force is 9.5 g/in, a contact angle is promoted to 85 from 70 before modification, as shown in
Embodiment 14
[0079] Ultraviolet curing reaction of a polymethyl siloxane material (PSi-MA) containing a methacrylate structure.
[0080] The difference from embodiment 13 is a compound photoinitiator: prepared from 2,4,6(trimethyl benzoyl)diphenylphosphine oxide and 4-dimethylamino-ethyl benzoate which are mixed according to a mass ratio of 1:1.
[0081] Under the circumstance of not changing other conditions of embodiment 13, curing PSi-MA prepared in embodiments 9-12 to form films, mark number being respectively PSi-MA01B, PSi-MA02B, PSi-MA03B, PSi-MA04B. Performing release performance test on the cured films.
TABLE-US-00006 TABLE 6 Release parameters of PSi-MA films Contact Release Residual Samples angle/ force/g/in adhesion rate/% Pure PET 70 PSi-MA01 86 9.1 94 PSi-MA02 82 11.0 87 PSi-MA03 84 10.0 90 PSi-MA04 84 9.3 88
indicates data missing or illegible when filed
[0082] Table 6 is release performance results of PSi-MA films of different structures in a condition with a same compound photoinitiator, indicating that the residual adhesion rate of PSi-MA01B is the highest, which is up to 94%, meanwhile, release force is 9.1 g/in, a contact angle is promoted to 86 from 70 before modification, polymer films of other mark numbers also meet the requirements, while the preparation effect of PSi-MA01 is the best, and the structure is the most reasonable, and thus are the optimal reaction conditions.
Embodiment 15
[0083] Ultraviolet curing reaction of a polymethyl siloxane material (PSi-MA) containing a methacrylate structure.
[0084] The difference from embodiment 13 is a compound photoinitiator: prepared from 2,4,6-ethyl trimethyl benzoyl phosphonate and 2-isopropylthioxanthone which are mixed according to a mass ratio of 1:1.
[0085] Under the circumstance of not changing other conditions of embodiment 13, curing PSi-MA prepared in embodiments 9-12 to form films, mark number being respectively PSi-MA01C, PSi-MA02C, PSi-MA03C, PSi-MA04C. Performing release performance test on the cured films.
TABLE-US-00007 TABLE 7 Release parameters of PSi-MA films Contact Release Residual Samples angle/ force/g/in adhesion rate/% Pure PET 70 PSi-MA01 87 9.7 97 PSi-MA02 84 12.0 86 PSi-MA03 82 11.0 88 PSi-MA04 81 10.2 85
indicates data missing or illegible when filed
[0086] Table 7 is release performance results of PSi-MA films of different structures in a condition with a same compound photoinitiator, indicating that the residual adhesion rate of PSi-MA01C is the highest, which is up to 97%, meanwhile, release force is 9.7 g/in, a contact angle is promoted to 87 from 70 before modification, polymer films of other mark numbers also meet the requirements, while the preparation effect of PSi-MA01 is the best, and the structure is the most reasonable, and thus are the optimal reaction conditions.
Embodiment 16
[0087] Under the circumstance of not changing other conditions of embodiment 13, preparing a PSi-MA film by adopting PSi-MA and a compound photoinitiator according to a mass ratio of 200:1, and testing release performances.
TABLE-US-00008 TABLE 8 Release parameters of PSi-MA films Contact Release Residual Samples angle/ force/g/in adhesion rate/% Pure PET 70 PSi-MA01 86 7.5 90 PSi-MA02 85 12.2 85 PSi-MA03 81 10.1 84 PSi-MA04 82 9.2 83
indicates data missing or illegible when filed
[0088] Table 8 is release performance results of PSi-MA films of different structures in a condition with a same compound photoinitiator, indicating that the residual adhesion rate of PSi-MA01D is the highest, which is up to 90%, meanwhile, release force is 7.5 g/in, a contact angle is promoted to 86 from 70 before modification, and in comparison with embodiment 9, the residual adhesion rate of PSi-MA01D is lower than that of PSi-MA01A, therefore, the optimum use amount of the initiator is greater than the mass of PSi-MA by 1%.
[0089] It is known from embodiment 13 and embodiments 14, 15 that PSi-MA can be effectively initiated by using all the compound photoinitiators described in the present invention, without obvious difference in effect, indicating that PSi-MA has better compatibility to initiators, is insensitive to the structure of initiators, and thus is favorable for popularization and application; the preparation effect of PSi-MA01 is the best, the structure is the most reasonable, and embodiment 9 is the optimal reaction conditions. Moreover, by comparing embodiment 13 with embodiment 16, based on consideration on cost, the optimum use amount of the initiator is greater than the mass of PSi-MA by 1%.
[0090] The foregoing descriptions are merely preferred embodiments of the present invention but are not intended to limit the present invention, and a person skilled in the art may still make modifications on technical schemes recorded in the foregoing embodiments, or perform equivalent substitution on partial technical features thereof. Any modification, equivalent substitution and improvement made within the spirit and principle of the present invention should fall within the protection scope of the present invention.