High Speed And Low Power Sense Amplifier
20180005701 · 2018-01-04
Assignee
Inventors
- Xiao Yan Pi (Shanghai, CN)
- Xiaozhou Qian (Shanghai, CN)
- Kai Man Yue (Shanghai, CN)
- Yao Zhou (Shanghai, CN)
- Yaohua Zhu (Shanghai, CN)
Cpc classification
G11C7/062
PHYSICS
G11C16/28
PHYSICS
G11C7/12
PHYSICS
International classification
G11C16/28
PHYSICS
G11C7/06
PHYSICS
G11C29/02
PHYSICS
G11C7/12
PHYSICS
Abstract
An improved sensing circuit is disclosed that utilizes a bit line in an unused memory array to provide reference values to compare against selected cells in another memory array. A circuit that can perform a self-test for identifying bit lines with leakage currents about an acceptable threshold also is disclosed.
Claims
1. A system for detecting leakage current associated with a bit line in a memory system, comprising a first circuit for generating a reference current; a second circuit that generates leakage current associated with the bit line; a first node coupled to the first circuit and second circuit; a second node that exhibits a constant voltage; a comparator that comprises the first node as an input and the second node as an input, wherein an output of the comparator indicates if the leakage current exceeds the reference current.
2. The system of claim 1, wherein the reference current is a level of acceptable leakage current for the bit line.
3. The system of claim 1, further comprising a controller.
4. The system of claim 3, wherein the controller is configured to store an identifier of the bit line.
5. A method of detecting leakage current associated with a bit line in a memory system, comprising: generating a reference current at a first node; generating a leakage current associated with the bit line at the first node; generating a constant voltage at a second node; comparing a voltage of the first node and a voltage of the second node and generating an output voltage that indicates if the leakage current exceeds the reference current.
6. The method of claim 5, wherein the reference current is a level of acceptable leakage current for the bit line.
7. The method of claim 6, further comprising: generating an identifier for the bit line.
8. The method of claim 7, further comprising: storing in a controller an identifier of the bit line.
9. The method of claim 7, further comprising: substituting a second bit line for the bit line during operation of the memory system.
10. The method of claim 5, wherein the memory system comprises a first array of memory cells and a second array of memory cells.
11. The method of claim 10, wherein the bit line is within the first array of memory cells.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0013]
[0014]
[0015]
[0016]
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
[0017] An embodiment will now be described with reference to
[0018] As an example, during a read operation of a particular address in array 30, the appropriate word line X and bit line Y will be activated in array 30, and bit line multiplexer 50 will output word 95 from that location in array 30 as an input to comparator 70. Concurrently, all word lines for array 40 are off, because the read operation does not involve array 40. The same bit line Y that was activated in array 30 is activated in array 40, and bit line multiplexer 60 outputs a word 96 from bit line Y as an input to comparator 70. Because no word line was activated for array 40, word 96 will not constitute data stored in array 40, but rather, represents a pre-charge voltage stored within bit line multiplexer 60. This voltage is used as a reference voltage by comparator 70. Comparator 70 will compare word 95 and word 96. One of ordinary skill in the art will understand that word 95 comprises one or more bits, and word 96 comprises one or more bits. Comparator 70 comprises a comparator circuit for each bit within word 95 and within word 96. That is, if word 95 and word 96 are 8 bits each, comparator 70 will comprise 8 comparator circuits, where each comparator circuit will compare one bit from word 95 with one bit at the same location within word 96. Output line 90 contains the result of the comparison of each bit pair.
[0019] If a bit within word 95 is higher than corresponding bit in word 96, then it is interpreted as a “0,” and outline line 90 will contain a “0” at that location. If a bit within word 95 is equal to or lower than corresponding bit in word 96, then it is interpreted as a “1,” and output line 90 will contain a “1” at that location.
[0020] One of ordinary skill in the art will appreciate that the embodiment of
[0021] Another embodiment will now be described with reference to
[0022] Bit line Z can be a “dummy” line that is never used with any actual memory location in array 30 or array 40, or it can be a bit line that is used with actual memory locations in array 30 or array 40. As with the embodiment of
[0023] The comparator 70 of
[0024] PMOS transistor 210 is a current mirror from a reference cell (not shown), and therefore mirrors the current that exists in the reference cell. PMOS transistor 230 is a cascade device for PMOS transistor 210. The source of PMOS transistor 210 and the source of PMOS transistor 220 each are connected to VDD, which is a voltage source. In this embodiment, VDD generates a voltage of 1.8 volts, but one or ordinary skill in the art will understand that VDD can generate other voltages. The drain of PMOS transistor 210 connects to the source of PMOS transistor 230.
[0025] PMOS transistor 220 and PMOS transistor 240 together form a “dummy” device that serves to perform parasitic load balancing with PMOS transistor 210 and PMOS transistor 230.
[0026] Selected cell 330 is the cell within memory array 30 that is to be read. Selected cell 340 is the cell within memory array 40 that also is “read,” as described earlier for
[0027] PMOS transistor 250 and PMOS transistor 260 are controlled by the ATDb signal, which is the complement of the Address Transition Detect (ATD) signal. The ATD signal is asserted at the beginning of a read cycle and can be used (elsewhere) to latch a new address for a read operation. Thus, PMOS transistor 250 and PMOS transistor 260 are turned on at the beginning of a read operation. The source of PMOS transistor 250 and the source of transistor 260 are connected to VBL, which is a voltage used during the pre-charge operation. In this embodiment, VBL generates a voltage in the range of 0.5-1.0 volts, but one of ordinary skill in the art will appreciate that other voltages can be used for VBL. Node 310 and node 320 are pre-charged at the beginning of a read operation when PMOS transistor 250 and PMOS transistor 260 are turned on. During that time, PMOS transistor 280 and NMOS transistor 270 also are turned on, as their gates are controlled by the ATDb and ATD signals, respectively, and this will connect nodes 320 and 310 through PMOS transistor 280 and NMOS transistor 270.
[0028] When PMOS transistor 250 and PMOS transistor 260 are turned off, node 320 and node 320 will hold a pre-charge voltage, and the parasitic capacitance of node 320 and the parasitic capacitance of node 320 will maintain that pre-charge voltage. After PMOS transistor 250 and PMOS transistor 260 are turned off, PMOS transistor 210 and PMOS transistor 220 are turned on. If selected cell 330 is storing a “0,” then the voltage at node 320 will decrease from the pre-charge voltage to a voltage around 0 volts. If selected cell 330 is storing a “1,” then the voltage at node 320 will increase from the pre-charge voltage to a voltage around VDD.
[0029] Node 320 and node 310 are inputs to comparator 290. If node 310 is greater than or equal to node 320, then comparator 290 will output a “0,” which can be interpreted to mean that selected cell 330 is storing a “1.” If node 310 is less than node 320, then comparator 290 will output a “1,” which can be interpreted to mean that selected cell 330 is storing a “0.”
[0030] Thus, the system of
[0031] The system of
[0032] Another embodiment is depicted in
[0033] A self-test can be performed during manufacturing or operation in the field. In this mode, all memory cells are erased and all word lines are disabled. One bit line in each array is selected at a time, and the circuit of
[0034] In the circuit of
[0035] The DC bias current provided by PMOS transistor 360 is set to a level IREF, which can be set to be the maximum allowable level of leakage current for a selected bit line. The actual leakage of the selected bit line is current ILEAK. If there is no leakage in the selected bit line, then ILEAK will be 0 amps. During this self-test mode, PMOS transistor 210 and PMOS transistor 230 are turned off. The difference in current between IREF and ILEAK will charge or discharge node 320.
[0036] If ILEAK>IREF, then node 320 will discharge, and comparator 290 will then output a “1” at output 300, which indicates the presence of an unacceptable amount of leakage current. Controller 500 optionally is configured to record that particular bit line as an unusable bit line, and thereafter controller 400 would replace that bit line with another bit line, such as a redundant bit line, during operation.
[0037] If ILEAK<IREF, then node 330 will charge, and comparator 290 will output a “0” at output 300, which indicates the presence of an acceptable level of leakage current. Controller 400 optionally is configured to record that particular bit line as a usable bit line, and
[0038] In this manner, every bit line within a memory array can be tested, and bit lines with unacceptable levels of leakage can be identified and avoided thereafter.
[0039] References to the present invention herein are not intended to limit the scope of any claim or claim term, but instead merely make reference to one or more features that may be covered by one or more of the claims. Materials, processes and numerical examples described above are exemplary only, and should not be deemed to limit the claims. It should be noted that, as used herein, the terms “over” and “on” both inclusively include “directly on” (no intermediate materials, elements or space disposed there between) and “indirectly on” (intermediate materials, elements or space disposed there between). Likewise, the term “adjacent” includes “directly adjacent” (no intermediate materials, elements or space disposed there between) and “indirectly adjacent” (intermediate materials, elements or space disposed there between). For example, forming an element “over a substrate” can include forming the element directly on the substrate with no intermediate materials/elements there between, as well as forming the element indirectly on the substrate with one or more intermediate materials/elements there between.