METHOD FOR MANUFACTURING CIRCULATORS WITH IMPROVED PERFORMANCE
20200287262 ยท 2020-09-10
Inventors
Cpc classification
H01P11/003
ELECTRICITY
H01L2223/6683
ELECTRICITY
H01L21/8213
ELECTRICITY
H01L2223/6627
ELECTRICITY
H01L21/8252
ELECTRICITY
International classification
H01P11/00
ELECTRICITY
H01L21/82
ELECTRICITY
Abstract
A method for manufacturing a self-biased circulator includes cooling a nanocomposite material to a magnetization temperature below 200 K, applying an external magnetic field to the nanocomposite material to form a magnetic nanocomposite material, providing the magnetic nanocomposite material in a semiconductor substrate, and providing one or more metal layers over the magnetic nanocomposite material to form a circulator. By cooling and then magnetizing the nanocomposite material, a performance of the circulator may be significantly improved.
Claims
1. A method comprising: cooling a self-biased material to a magnetization temperature below 200 K; applying an external magnetic field to the self-biased material to form a magnetic self-biased material; providing the magnetic self-biased material in a semiconductor substrate; and providing one or more metal layers over the magnetic self-biased material to form a circulator.
2. The method of claim 1 wherein the self-biased material is a nanocomposite material comprising a plurality of nanowires.
3. The method of claim 2 wherein the nanocomposite material is anodized aluminum oxide (AAO) that has been electroplated to form the plurality of nanowires.
4. The method of claim 3 wherein the plurality of nanowires comprise one of an iron-nickel alloy (FeNi) and an iron-cobalt alloy (FeCo).
5. The method of claim 2 wherein the external magnetic field has a strength greater than 1.0 Tesla.
6. The method of claim 5 wherein the external magnetic field has a strength greater than 2.0 Tesla.
7. The method of claim 2 wherein the one or more metal layers form a stripline Y-junction over the nanocomposite material.
8. The method of claim 7 wherein the one or more metal layers form a grounding plane opposite the stripline Y-junction.
9. The method of claim 8 wherein the magnetic nanocomposite material is provided in the semiconductor substrate such that: the grounding plane is on the nanocomposite material; and a layer of semiconductor material is provided between the nanocomposite material and the stripline Y-junction.
10. The method of claim 9 wherein the nanocomposite material is anodized aluminum oxide (AAO) that has been electroplated to form the plurality of nanowires.
11. The method of claim 10 wherein the plurality of nanowires comprise one of an iron-nickel alloy (FeNi) and an iron-cobalt alloy (FeCo).
12. The method of claim 11 wherein the semiconductor substrate comprises a first semiconductor material and the layer of semiconductor material comprises a second semiconductor material.
13. The method of claim 12 wherein the semiconductor substrate comprises silicon carbide (SiC) and the layer of semiconductor material comprises gallium nitride (GaN).
14. The method of claim 13 wherein the semiconductor substrate provides a monolithic microwave integrated circuit (MMIC).
15. The method of claim 2 wherein the semiconductor substrate provides a monolithic microwave integrated circuit (MMIC).
16. The method of claim 15 wherein providing the nanocomposite material in the semiconductor substrate comprises: etching a pocket in the semiconductor substrate; and providing the nanocomposite material in the pocket.
17. The method of claim 2 wherein providing the nanocomposite material in the semiconductor substrate comprises: etching a pocket in the semiconductor substrate; and providing the nanocomposite material in the pocket.
18. The method of claim 2 wherein the magnetization temperature is less than 100 K.
19. The method of claim 18 wherein the magnetization temperature is less than 50 K.
20. The method of claim 19 wherein the magnetization temperature is less than 10 K.
21. The method of claim 20 wherein the magnetization temperature is less than 5 K.
22. The method of claim 2 wherein the circulator is a radio frequency (RF) circulator.
Description
BRIEF DESCRIPTION OF THE DRAWING FIGURES
[0007] The accompanying drawing figures incorporated in and forming a part of this specification illustrate several aspects of the disclosure, and together with the description serve to explain the principles of the disclosure.
[0008]
[0009]
[0010]
[0011]
[0012]
DETAILED DESCRIPTION
[0013] The embodiments set forth below represent the necessary information to enable those skilled in the art to practice the embodiments and illustrate the best mode of practicing the embodiments. Upon reading the following description in light of the accompanying drawing figures, those skilled in the art will understand the concepts of the disclosure and will recognize applications of these concepts not particularly addressed herein. It should be understood that these concepts and applications fall within the scope of the disclosure and the accompanying claims.
[0014] It will be understood that, although the terms first, second, etc. may be used herein to describe various elements, these elements should not be limited by these terms. These terms are only used to distinguish one element from another. For example, a first element could be termed a second element, and, similarly, a second element could be termed a first element, without departing from the scope of the present disclosure. As used herein, the term and/or includes any and all combinations of one or more of the associated listed items.
[0015] It will be understood that when an element such as a layer, region, or substrate is referred to as being on or extending onto another element, it can be directly on or extend directly onto the other element or intervening elements may also be present. In contrast, when an element is referred to as being directly on or extending directly onto another element, there are no intervening elements present. Likewise, it will be understood that when an element such as a layer, region, or substrate is referred to as being over or extending over another element, it can be directly over or extend directly over the other element or intervening elements may also be present. In contrast, when an element is referred to as being directly over or extending directly over another element, there are no intervening elements present. It will also be understood that when an element is referred to as being connected or coupled to another element, it can be directly connected or coupled to the other element or intervening elements may be present. In contrast, when an element is referred to as being directly connected or directly coupled to another element, there are no intervening elements present.
[0016] Relative terms such as below or above or upper or lower or horizontal or vertical may be used herein to describe a relationship of one element, layer, or region to another element, layer, or region as illustrated in the Figures. It will be understood that these terms and those discussed above are intended to encompass different orientations of the device in addition to the orientation depicted in the Figures.
[0017] The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the disclosure. As used herein, the singular forms a, an, and the are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms comprises, comprising, includes, and/or including when used herein specify the presence of stated features, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof.
[0018] Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this disclosure belongs. It will be further understood that terms used herein should be interpreted as having a meaning that is consistent with their meaning in the context of this specification and the relevant art and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.
[0019]
[0020] The substrate 12 may be a semiconductor substrate. In one embodiment, the substrate 12 comprises silicon carbide (SiC). The semiconductor device layer 14 may be any suitable insulating or semi-insulating semiconductor material. In one embodiment, the semiconductor device layer 14 comprises gallium nitride (GaN). Notably, only the portion of the substrate 12 and the semiconductor device layer 14 in which the self-biased circulator 10 is formed are shown in
[0021]
[0022] An external magnetic field higher than the nanocomposite's magnetic saturation field is then applied to the nanocomposite material (step 108). The external magnetic field may have a strength greater than 1.0 T, greater than 1.5 T, and greater than 2.0 T in various embodiments. This provides a magnetic nanocomposite material with a high quality. A pocket is then etched into a MMIC substrate (step 110). This may be accomplished with standard semiconductor manufacturing techniques known in the art. As shown in
[0023] As discussed above, manufacturing a self-biased circulator in this manner results in significantly improved performance. Comparing a self-biased circulator provided using all of the above steps (referred to as the improved self-biased circulator) and one provided without steps 104-108 (referred to as the standard self-biased circulator), when these self-biased circulators operate at 5.7 GHz, the improved self-biased circulator experiences 0.5 dB less insertion loss (e.g., 2.8 dB vs. 3.3 dB). The improved self-biased circulator provides 8.4 dB of isolation while the standard self-biased circulator provides 8.3 dB. The improved self-biased circulator provides 15.8 dB return loss while the standard self-biased circulator provides 14.5 dB.
[0024] Notably, while the above is discussed primarily with respect to nanocomposite materials, the principles for low-temperature magnetization discussed herein may also provide significant performance benefits when used on other self-biased materials such as ferrites and the like. That is, the method discussed above with respect to
[0025]
[0026]
[0027] The MMIC substrate is then optionally provided in a vacuum environment (step 210). Providing the MMIC substrate in a vacuum environment may avoid moisture condensation in the following steps. The MMIC substrate is then cooled to a magnetization temperature (step 212). In various embodiments, the magnetization temperature is less than 200 K, more preferably less than 100 K, more preferably less than 50 K, more preferably less than 10 K, and most preferably less than 5 K. In one exemplary embodiment, the magnetization temperature is 4.2 K. Cooling the MMIC substrate to the magnetization temperature suppresses phonon modes in the nanocomposite material such that lattice vibrations are reduced to a very low level. This makes the following magnetization steps much more efficient so that the magnetic domains in the nanocomposite material can be better aligned with reduced dispersion and demagnetization. Accordingly, the performance of the self-biased circulator is greatly improved. An external magnetic field is then applied to the MMIC substrate (step 214). The external magnetic field higher than the nanocomposite's magnetic saturation filed may have a strength greater than 1.0 T, greater than 1.5 T, and greater than 2.0 T in various embodiments. This provides a magnetic nanocomposite material with a high quality.
[0028] Notably, the process described in
[0029]
[0030] Those skilled in the art will recognize improvements and modifications to the preferred embodiments of the present disclosure. All such improvements and modifications are considered within the scope of the concepts disclosed herein and the claims that follow.