METHOD FOR MANUFACTURING DISK-SHAPED GLASS SUBSTRATE, METHOD FOR MANUFACTURING THIN GLASS SUBSTRATE, METHOD FOR MANUFACTURING LIGHT-GUIDING PLATE, AND DISK-SHAPED GLASS SUBSTRATE
20200270174 ยท 2020-08-27
Inventors
Cpc classification
Y02P40/57
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
C03C19/00
CHEMISTRY; METALLURGY
G02B6/0076
PHYSICS
B24B9/00
PERFORMING OPERATIONS; TRANSPORTING
International classification
C03C19/00
CHEMISTRY; METALLURGY
B24B7/24
PERFORMING OPERATIONS; TRANSPORTING
Abstract
A method for manufacturing a disk-shaped glass substrate is a method for manufacturing a disk-shaped glass substrate for cutting out one or more thin glass substrates. The method for manufacturing a disk-shaped glass substrate includes preparing a disk-shaped glass blank, which is a glass blank having two circular main surfaces, chamfering an outer edge portion of each of the two main surfaces of the disk-shaped glass blank, grinding the two main surfaces of the chamfered disk-shaped glass blank, using a double-side grinding apparatus, and polishing the two main surfaces of the ground disk-shaped glass blank, using a double-side polishing apparatus.
Claims
1. A method for manufacturing a disk-shaped glass substrate for cutting out one or more thin glass substrates, the method comprising: preparing a disk-shaped glass blank, which is a glass blank having two circular main surfaces; chamfering an outer edge portion of each of the two main surfaces of the disk-shaped glass blank; grinding the two main surfaces of the chamfered disk-shaped glass blank, using a double-side grinding apparatus; and polishing the two main surfaces of the ground disk-shaped glass blank, using a double-side polishing apparatus.
2. The method for manufacturing a disk-shaped glass substrate according to claim 1, wherein, in the polishing, a disk-shaped glass substrate having a substrate thickness of 100 to 350 m is produced by polishing the two main surfaces of the ground disk-shaped glass blank.
3. The method for manufacturing a disk-shaped glass substrate according to claim 1, wherein, in the polishing, a disk-shaped glass substrate having a diameter of 70 to 210 mm is produced by polishing the two main surfaces of the ground disk-shaped glass blank.
4. The method for manufacturing a disk-shaped glass substrate according to claim 1, wherein, in the polishing, a disk-shaped glass substrate having a root mean square roughness Rq of 0.4 nm or less is produced by polishing the two main surfaces of the ground disk-shaped glass blank.
5. The method for manufacturing a disk-shaped glass substrate according to claim 1, wherein, in the polishing, a disk-shaped glass substrate having a parallelism of less than 1.0 m is produced by polishing the two main surfaces of the ground disk-shaped glass blank.
6. The method for manufacturing a disk-shaped glass substrate according to claim 5, wherein, in the polishing, a disk-shaped glass substrate having a parallelism of 0.05 to 0.95 m is produced by polishing the two main surfaces of the ground disk-shaped glass blank.
7. The method for manufacturing a disk-shaped glass substrate according to claim 1, wherein, when a substrate thickness of the chamfered disk-shaped glass blank, excluding an outer circumferential edge surface and chamfering surfaces of the chamfered disk-shaped glass blank, is t1 millimeters, a substrate thickness of the chamfered disk-shaped glass blank at the outer circumferential edge surface is t2 millimeters, and a substrate thickness of a disk-shaped glass substrate produced through the polishing, excluding an outer circumferential edge surface and chamfering surfaces of the disk-shaped glass substrate, is t3 millimeters, t10.15<t2<t10.4 and t30.5<t2 are satisfied.
8. The method for manufacturing a disk-shaped glass substrate according to claim 1, wherein, in the chamfering, a chamfering surface is formed by chamfering the outer edge portion through mechanical processing or chemical processing, and in the grinding and the polishing, the two main surfaces of the disk-shaped glass blank are ground and polished with a machining allowance in a range in which at least portions of the chamfering surfaces remain.
9. The method for manufacturing a disk-shaped glass substrate according to claim 1, wherein, in the polishing, a disk-shaped glass substrate that has a substrate thickness of 100 to 350 m and has a diameter of 70 to 210 mm and in which a parallelism between two main surfaces of the disk-shaped glass substrate is less than 1.0 m is produced by polishing, in multiple stages, the two main surfaces of the ground disk-shaped glass blank such that 20 mD<150 m is satisfied, where a machining allowance of the polishing is D.
10. The method for manufacturing a disk-shaped glass substrate according to claim 1, wherein the polishing includes performing first polishing for polishing the two main surfaces of the ground disk-shaped glass blank, using the double-side polishing apparatus, and performing second polishing for polishing the two main surfaces of the disk-shaped glass blank on which the first polishing has been performed, using the double-side polishing apparatus, and a combination of polishing pads and a polishing slurry that are applied to the double-side polishing apparatus differs between the first polishing and the second polishing.
11. A method for manufacturing a thin glass substrate, comprising: preparing a disk-shaped glass blank, which is a glass plate having two circular main surfaces; chamfering an outer edge portion of each of the two main surfaces of the disk-shaped glass blank; grinding the two main surfaces of the chamfered disk-shaped glass blank, using a double-side grinding apparatus; polishing the ground two main surfaces, using a double-side polishing apparatus; and cutting out a plurality of thin glass substrates from a disk-shaped glass substrate obtained through the polishing.
12. The method for manufacturing a thin glass substrate according to claim 11, wherein, in the cutting out the plurality of thin glass substrates, rectangular thin glass substrates are cut out.
13. The method for manufacturing a thin glass substrate according to claim 11, wherein, in the cutting out the plurality of thin glass substrates, thin glass substrates that each have a substrate thickness of 100 to 350 m and in which a parallelism between two main surfaces of each thin glass substrate is less than 1.0 m are cut out.
14. A method for manufacturing a light-guiding plate, comprising: preparing a disk-shaped glass blank, which is a glass plate having two circular main surfaces; chamfering an outer edge portion of each of the two main surfaces of the disk-shaped glass blank; grinding the two main surfaces of the chamfered disk-shaped glass blank, using a double-side grinding apparatus; polishing the ground two main surfaces, using a double-side polishing apparatus; and cutting out a plurality of thin glass substrates from a disk-shaped glass substrate obtained through the polishing.
15. The method for manufacturing a light-guiding plate according to claim 14, further comprising stacking the cutout thin glass substrates on each other.
16. A disk-shaped glass substrate for cutting out one or more thin glass substrates, the disk-shaped glass substrate comprising: two circular main surfaces; an outer circumferential edge surface; and chamfering surfaces that are respectively inclined between the two main surfaces and the outer circumferential edge surface and that respectively connect the two main surfaces and the outer circumferential edge surface, wherein a distance between the two main surfaces is 100 to 350 m, and a parallelism between the two main surfaces is less than 1.0 m.
17. The disk-shaped glass substrate according to claim 16, wherein the disk-shaped glass substrate has a refractive index of 1.60 or more and has a parallelism of 0.5 m or less.
18. The disk-shaped glass substrate according to claim 16, wherein the plurality of thin glass substrates are each a light-guiding plate.
19. The disk-shaped glass substrate according to claim 16, wherein the plurality of thin glass substrates are stacked on each other and used as a light-guiding plate.
20. The method for manufacturing a disk-shaped glass substrate according to claim 2, wherein, in the polishing, a disk-shaped glass substrate having a diameter of 70 to 210 mm is produced by polishing the two main surfaces of the ground disk-shaped glass blank.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0037]
[0038]
[0039]
[0040]
[0041]
[0042]
[0043]
[0044]
[0045]
[0046]
[0047]
DETAILED DESCRIPTION OF THE EMBODIMENTS
[0048] Hereinafter, one embodiment of the present invention will be described with reference to the drawings. The same elements are given the same reference numerals through out of the drawings. Although the terms up, down, front, rear, left, and right will be used in the description and drawings of embodiments of the present invention, these terms will be used to describe directions and are not intended to limit the present invention. Ratios of the sizes of portions are changed in the drawings as appropriate in order to facilitate understanding.
[0049] (Configuration of Disk-Shaped Glass Substrate 100)
[0050] A disk-shaped glass substrate 100 according to one embodiment of the present invention is a thin plate that has a disk shape and is made of glass, as shown in
[0051] A thin glass substrate hereinafter refers to a glass plate having a small plate thickness.
[0052] The disk-shaped glass substrate 100 is an intermediate for cutting out one or more thin glass substrates whose size is smaller than that of the disk-shaped glass substrate 100. A cutout thin glass substrate is used as a light-guiding plate, for example, alone, or by combining multiple cutout thin glass substrates as appropriate. If a plurality of cutout thin glass substrates are combined and used as a light-guiding plate, typically, the cutout thin glass substrates are stacked on each other and used as a light-guiding plate. A light-guiding body is applied to a display apparatus such as a head-mounted display, for example.
[0053] The disk-shaped glass substrate 100 has two main surfaces 101a and 101b, an outer circumferential edge surface 102a, and chamfering surfaces 103a and 103b.
[0054] The two main surfaces 101a and 101b are substantially circular flat surfaces that are arranged side-by-side in the up-down direction. The diameter of each of the two main surfaces 101a and 101b is 70 [mm (millimeters)] to 210 [mm], for example.
[0055] The length between the two main surfaces 101a and 101b in the up-down direction, that is, the substrate thickness of the disk-shaped glass substrate 100, excluding the outer circumferential edge surface 102a and the chamfering surfaces 103a and 103b, is 50 [m (micrometers)] to 500 [m], for example. Note that the substrate thickness of the disk-shaped glass substrate 100, excluding the outer circumferential edge surface 102a and the chamfering surfaces 103a and 103b, is preferably 100 [m] to 400 [m], and more preferably 100 [m] to 350 [m].
[0056] The parallelism between the two main surfaces 101a and 101b is less than 1.0 [m], for example, preferably 0.95 [m] or less, and more preferably 0.5 [m] or less. The parallelism between the two main surfaces 101a and 101b may be 0.05 [m] or more.
[0057] Here, the parallelism refers to a so-called value called TTV (Total Thickness Variation), and indicates the difference between the maximum value and the minimum value of the length of the entire disk-shaped glass substrate 100 measured in the substrate thickness direction (the up-down direction in this embodiment) using one of the main surfaces 101a and 101b as a reference plane.
[0058] The roughness (root mean square roughness) Rq of the two main surfaces 101a and 101b is 0.4 [nm] or less, for example.
[0059] The outer circumferential edge surface 102a is a surface forming an end of the disk-shaped glass substrate 100 in the radial direction thereof, and is a curved surface that slightly extends substantially in the up-down direction. Specifically, the outer circumferential edge surface 102a has a substantially circular shape when viewed from above or below, and has an extremely elongated rectangular shape that is short in the up-down direction when viewed from a side. Here, a side indicates a direction perpendicular to the up-down direction.
[0060] The chamfering surfaces 103a and 103b are surfaces that are respectively inclined between the two main surfaces 101a and 101b and the outer circumferential edge surface 102a and that respectively connect the two main surfaces 101a and 101b and the outer circumferential edge surface 102a, and each have an annular shape when viewed from above or below. That is, the upper chamfering surface 103a is an annular surface that is inclined between an outer edge portion 104a of the upper main surface 101a and an upper end portion 105a of the outer circumferential edge surface 102a and that connects the outer edge portion 104a and the upper end portion 105a. The lower chamfering surface 103b is an annular surface that is inclined between an outer edge portion 104b of the lower main surface 101b and a lower end portion 106a of the outer circumferential edge surface 102a and that connects the outer edge portion 104b and the upper end portion 106a.
[0061] The chamfering surfaces 103a and 103b each form a straight line when viewed from a side in this embodiment (see
[0062] The configuration of the disk-shaped glass substrate 100 according to this embodiment has been described above.
[0063] The disk-shaped glass substrate 100 according to this embodiment is an intermediate for cutting out one or more thin glass substrates. Also, the disk-shaped glass substrate 100 has high surface quality and a highly precise substrate thickness, whereby a portion excluding the outer circumferential edge surface 102a and the chamfering surfaces 103a and 103b has a substrate thickness of 100 [m] to 350 [m], and the parallelism between the two main surfaces 101a and 101b is less than 1.0 [m]. Thus, it is possible to cut out a thin glass substrate having high surface quality and a highly precise substrate thickness.
[0064] Also, the disk-shaped glass substrate 100 is provided with the chamfering surfaces 103a and 103b. Thus, the disk-shaped glass substrate 100 is unlikely to be damaged when a thin glass substrate is cut out, and it is possible to cut out thin glass substrates at a yield higher than in a case where no chamfering surfaces 103a and 103b are provided.
[0065] Also, the disk-shaped glass substrate 100 is not only provided with the chamfering surfaces 103a and 103b but also has a disk shape, and thus, as will be described later in detail, even relatively large and thin glass substrates having high surface quality and a highly precise substrate thickness can be stably manufactured at a high yield.
[0066] Thus, it is possible to stably mass produce thin glass substrates having high surface quality, a highly precise substrate thickness, and a desired shape.
[0067] Also, the disk-shaped glass substrate 100 may have a refractive index of 1.60 or more, and the parallelism between the two main surfaces 101a and 101b may be 0.5 [m] or less. Accordingly, due to the same reasons as above, it is possible to stably mass produce thin glass substrates having high surface quality, a highly precise substrate thickness, and a desired shape.
[0068] Also, a thin glass substrate that is cut out from the disk-shaped glass substrate 100 may be used alone as a light-guiding plate, or a plurality of thin glass substrates that are cut out therefrom may be combined together using a method such as stacking and the combined substrate may be used as a light-guiding plate, for example. Accordingly, due to the same reasons as above, it is possible to stably mass produce light-guiding plates having high surface quality, a highly precise substrate thickness, and a desired shape.
[0069] (Method for Manufacturing Disk-Shaped Glass Substrate 100)
[0070] Hereinafter, a method for manufacturing the disk-shaped glass substrate 100, which is an intermediate, will be described.
[0071] The method for manufacturing the disk-shaped glass substrate 100 is a method for manufacturing the disk-shaped glass substrate 100 and includes processes shown in the flowchart shown in
[0072] A disk-shaped glass blank 107a is prepared (step S1).
[0073] The disk-shaped glass blank 107a is a glass blank that has a disk shape and whose substrate thickness is larger than that of the disk-shaped glass substrate 100 manufactured as an intermediate. The disk-shaped glass blank 107a has a substrate thickness t1 of 0.5 [mm] to 1.0 [mm], for example. The disk-shaped glass blank 107a preferably has a refractive index of 1.60 or more. The accuracy of the substrate thickness and the surface quality of main surfaces 101c and 101d may be lower than those of the disk-shaped glass substrate 100.
[0074] The disk-shaped glass blank 107a has two main surfaces 101c and 101d, and an outer circumferential edge surface 102b, as shown in
[0075]
[0076] Such a disk-shaped glass blank 107a is preferably manufactured through appropriate forming processing.
[0077] Specifically, the disk-shaped glass blank 107a may be manufactured by cutting out a piece of round columnar glass from a prismatic glass mass formed of highly refractive glass and slicing the round columnar glass into a disk shape, for example. Also, the disk-shaped glass blank 107a may be manufactured by cutting a large glass plate formed using a float method or a downdraw method to a predetermined size, for example. Also, the disk-shaped glass blank 107a may be manufactured by press-molding molten glass, using a pair of molds, for example.
[0078] Here, chamfering need not be performed on the outer edge portions 104c and 104d forming outer edges of the main surfaces 101c and 101d of the disk-shaped glass blank 107a. That is, the main surfaces 101c and 101d of the disk-shaped glass blank 107a and the outer circumferential edge surface 102b intersect respectively at the outer edge portions 104c and 104d. In other words, the outer edge portions 104c and 104d are respectively substantially linear boundary portions between the main surfaces 101c and 101d of the disk-shaped glass blank 107a and the outer circumferential edge surface 102b, and each form a ridge. In this embodiment, the main surfaces 101c and 101d and the outer circumferential edge surface 102b intersect at substantially a right angle, when viewed from a side (see
[0079] Note that a configuration may be adopted in which the main surfaces 101c and 101d are curved or the outer circumferential edge surface 102b is curved in the up-down direction, when viewed from a side, for example, and thus the main surfaces 101c and 101d and the outer circumferential edge surface 102b intersect at a right angle.
[0080] Refer to
[0081] Chamfering is performed on the disk-shaped glass blank 107a (step S2). In the chamfering process (step S2), the outer edge portions 104c and 104d of the two main surfaces 101c and 101d of the disk-shaped glass blank 107a are chamfered.
[0082] The outer edge portions 104c and 104d, which are the boundaries between the main surfaces 101c and 101d of the disk-shaped glass blank 107a and the outer circumferential edge surface 102b, are removed as a result of the chamfering process (step S2) being performed. As shown in
[0083] Specifically, the upper chamfering surface 103c is an annular surface that is inclined between an outer edge portion 104e of the upper main surface 101e and an upper end portion 105b of the outer circumferential edge surface 102c and that connects the outer edge portion 104e and the upper end portion 105b. The lower chamfering surface 103d is an annular surface that is inclined between an outer edge portion 104f of the lower main surface 101d and a lower end portion 106b of the outer circumferential edge surface 102c and that connects the outer edge portion 104f and the lower end portion 106b.
[0084] As shown in
[0085] Such a chamfering process (step S2) is performed through mechanical processing such as grinding using a grindstone, for example. A grinding surface of the grindstone is preferably set to have an inclination angle of 30 to 60 degrees, and more preferably 45 degrees, with respect to each of the two main surfaces 101c and 101d. Accordingly, angles formed between the main surfaces 101e and 101f and the chamfering surfaces 103c and 103d when viewed from a side, and angles formed between the outer circumferential edge surface 102c and the chamfering surfaces 103c and 103d when viewed from a side are formed to be an obtuse angle of 120 to 150 degrees, and more preferably an obtuse angle of 135 degrees.
[0086] Here,
[0087] In
[0088] As described above, the enlarged views of the disk-shaped glass blanks 107a and 107b and the disk-shaped glass substrate 100 shown in
[0089] As can be seen from
[0090] Also, as shown in
[0091] Also, referring to
t10.15<t2<t10.4Equation (1)
[0092] Note that the chamfering process (step S2) is not limited to mechanical processing, and may be performed through chemical processing such as etching. The chamfering surfaces 103c and 103d forming curved lines when viewed from a side may be formed.
[0093] Refer to
[0094] Grinding is performed on the two main surfaces 101e and 101f of the chamfered disk-shaped glass blank 107b (step S3). The grinding process (step S3) is performed mainly in order to adjust the thickness of the disk-shaped glass blank 107b, and adjust the flatness of the two main surfaces 101e and 101f of the disk-shaped glass blank 107b and parallelism therebetween.
[0095] The machining allowance of the grinding process (step S3) is about 120 [m] to 400 [m], for example. Here, the machining allowance refers to the length of a portion in the up-down direction to be removed in this process.
[0096] In the grinding process (step S3), the two main surfaces 101e and 101f of the chamfered disk-shaped glass blank 107b are ground using a double-side grinding apparatus 108 shown in
[0097]
[0098] As shown in
[0099] A diamond sheet (not shown) is planarly attached to an upper surface of the lower surface plate 109 and a lower surface of the upper surface plate 110. The surface of the diamond sheet serves as a grinding surface. Fixed abrasive particles have a particle size of about 10 [m], for example.
[0100] The internal gear 111 is a substantially hollow annular member provided with a tooth profile on the inner surface thereof. The sun gear 112 is a substantially round columnar member disposed at the center of the internal gear 111, and is provided with a tooth profile on the outer circumferential surface thereof.
[0101] The carriers 113 are holding members for holding the disk-shaped glass blanks 107b in holding holes. Specifically, as shown in
[0102] Also, the outer circumferential surfaces of the carriers 113 are provided with teeth. The carriers 113 for holding the disk-shaped glass blanks 107b are disposed such that the teeth of the carriers 113 engage with the teeth of the internal gear 111 and the sun gear 112 therebetween.
[0103] Note that the number of carriers 113 disposed in the double-side grinding apparatus 108 is not limited to four, and may be 1, 2, 3, 5 or more. Also, the number of disk-shaped glass blanks 107b held by one carrier 113 is not limited to 1, and may be two or more.
[0104] The disk-shaped glass blanks 107b held by the carriers 113 are sandwiched between the lower surface plate 109 and the upper surface plate 110 at a predetermined pressure. Then, either one or both of the upper surface plate 110 and the lower surface plate 109 perform a moving operation. Accordingly, the disk-shaped glass blanks 107b and the surface plates 109 and 110 move relative to each other, and the two main surfaces 101e and 101f of each disk-shaped glass blank 107b are ground simultaneously by fixed abrasive particles included in the above-described diamond sheet.
[0105] Note that loose abrasive particles may be adopted instead of fixed abrasive particles. In this case, the disk-shaped glass blanks 107b can be ground using the same method as in the case of using the above-described fixed abrasive particles using grinding pads instead of the above-described diamond sheet and a grinding slurry containing loose abrasive particles instead of fixed abrasive particles.
[0106] Refer to
[0107] Polishing is performed on two main surfaces of the disk-shaped glass blank (not shown) on which the grinding process (step S3) has been performed, that is, the ground disk-shaped glass blank (step S4). The polishing process (step S4) is performed in order to remove blemishes and warping that occur in the grinding, and mirror-polish the glass blank.
[0108] The machining allowance of the polishing process (step S4) is about 10 [m] to 150 [m], for example, and preferably 20 [m] to 150 [m]. The polishing process (step S4) is desired to be performed in multiple stages as will be described later as well, and the disk-shaped glass substrate 100 described above with reference to
[0109] In the polishing process (step S4), polishing is performed on two main surfaces of the ground disk-shaped glass blank, using the double-side polishing apparatus, simultaneously, for example.
[0110] The double-side polishing apparatus may have a configuration that is substantially the same as that of the above-described double-side grinding apparatus 108, except that polishing pads are attached to the upper surface of the lower surface plate 109 and the lower surface of the upper surface plate 110, instead of the diamond sheet. The polishing pads are flat plate members having an annular shape overall, and are resin polishers, for example. Also, a polishing slurry containing loose abrasive particles is used in the polishing process (step S4).
[0111] Although the double-side polishing apparatus is not shown, for simplification, in the description relating to the following polishing process (step S4), constituent elements of the double-side polishing apparatus utilized in this process (step S4) are given reference numerals of the corresponding constituent elements of the double-side grinding apparatus 108 shown in
[0112] The carriers 113 hold the ground disk-shaped glass blanks in a manner similar to that of the above-described double-side grinding apparatus 108. The carriers 113 for holding the ground disk-shaped glass blanks are disposed such that the teeth of the carriers 113 engage with the teeth of the internal gear 111 and the sun gear 112 therebetween. The disk-shaped glass blanks held by the carriers 113 are sandwiched at a predetermined pressure between the lower surface plate 109 and the upper surface plate 110 provided with the polishing pads. Then, either one or both of the upper surface plate 110 and the lower surface plate 109 performs a moving operation while the polishing slurry is supplied. Accordingly, the ground disk-shaped glass blank and the surface plates 109 and 110 move relative to each other, and the two main surfaces of each disk-shaped glass blank are polished by loose abrasive particles included in the polishing slurry simultaneously.
[0113] As shown in
[0114] The first polishing process (step S41) is performed mainly in order to remove blemishes and warping remaining on the ground main surfaces, or adjust minute unevenness (microwaviness, roughness, and the like) of the ground main surfaces. In the first polishing process (step S41), as described above, polishing is performed using the double-side polishing apparatus on the two main surfaces of the disk-shaped glass blank on which the grinding process (step S3) has been performed. The machining allowance of the first polishing process (step S41) is about 10 [m] to 100 [m], for example.
[0115] In the first polishing process (step S41), a polishing slurry containing, as loose abrasive particles, cerium oxide abrasive particles, zirconia abrasive particles, or the like having a particle diameter of about 1 [m] to 2 [m] is used, for example.
[0116] Note that, in the first polishing process (step S41), it is preferable to perform polishing in multiple stages with at least one of the polishing pads and the polishing slurry being changed. That is, in this case, a combination of the polishing slurry and the polishing pads applied to the double-side polishing apparatus is preferably changed in the stages of the first polishing process (step S41). The parallelism of the disk-shaped glass blank can be adjusted in a range of 0.05 [m] to 0.95 [m] by performing the first polishing process (step S41) in multiple stages in this manner, and as a result, a disk-shaped glass substrate 100 having high surface quality and a highly precise substrate thickness can be obtained.
[0117] The second polishing process (step S42) is performed mainly in order to mirror-polish the main surfaces and reduce roughness thereof. In the second polishing process (step S42), as described above, polishing is performed using the double-side polishing apparatus on the two main surfaces of the disk-shaped glass blank on which the first polishing process (step S41) has been performed. The machining allowance of the second polishing process (step S42) is about 1 [m], for example.
[0118] The second polishing process (step S42) differs from the first polishing process (step S41) in the type and particle size of loose abrasive particles included in the polishing slurry, and the hardness of the resin polishers. In the second polishing process (step S42) according to this embodiment, microparticles having a particle diameter of about 10 [nm (nanometers)] to 50 [nm], such as colloidal silica suspended in a slurry, are used as loose abrasive particles, for example.
[0119] Note that it is sufficient that the second polishing process (step S42) differs from the first polishing process (step S41) in at least one of the type and particle size of loose abrasive particles included in the polishing slurry, and the polishing pads. That is, it is preferable that a combination of the polishing slurry and the hardness of the resin polishers applied to the double-side polishing apparatus differs between the first polishing process (step S41) and the second polishing process (step S42).
[0120] The roughness (root mean square roughness) Rq of the main surfaces can be set to 0.4 [nm] by carrying out the second polishing process (step S42). As a result, the disk-shaped glass substrate 100 having high surface quality can be produced, and thus a thin glass substrate having high surface quality can be produced by being cut out from the disk-shaped glass substrate 100.
[0121] The disk-shaped glass substrate 100 having a highly precise substrate thickness as that shown in
[0122] Also, the disk-shaped glass substrate 100 to be produced may have a large diameter of 70 to 210 [mm]. Also, the disk-shaped glass substrate 100 to be produced has high surface quality whereby the parallelism between the two main surfaces 101a and 101b thereof is less than 1.0 [m], and the parallelism therebetween is preferably 0.95 [m] or less, and more preferably 0.5 [m] or less. The parallelism between the two main surfaces 101a and 101b of the disk-shaped glass substrate 100 may be 0.05 [m] or more.
[0123] In the grinding process (step S3) and the polishing process (step S4), the main surfaces of the disk-shaped glass blank are ground and polished with a machining allowance in a range in which at least portions of the chamfering surfaces 103c and 103d formed in the chamfering process (step S2) remain after the processes of step S3 and S4 are performed. Accordingly, the chamfering surfaces 103a and 103b can be reliably provided on the disk-shaped glass substrate 100 to be produced through polishing (step S4).
[0124] Also, when the substrate thickness of the chamfered disk-shaped glass blank 107b at the outer circumferential edge surface 102c is t2 [mm] and the substrate thickness of the disk-shaped glass substrate 100 produced through polishing (step S4), excluding the outer circumferential edge surface 102a and the chamfering surfaces 103a and 103b, is t3 [mm] (see
t30.5<t2Equation (2)
[0125] Refer to
[0126] After the polishing processing (step S4), the disk-shaped glass substrate 100 is cleaned using a neutral detergent, pure water, IPA (isopropyl alcohol), or the like. Accordingly, the disk-shaped glass substrate 100 shown in
[0127] The method for manufacturing the disk-shaped glass substrate 100 according to this embodiment includes the chamfering process (step S2). Damage to the disk-shaped glass blank due to cracks or the like can be suppressed during the subsequent processing processes (steps S3 to S5) or before and after each of the processing processes (steps S3 to S5).
[0128] Also, the grinding process (step S3) and the polishing process (step S4) are performed after the chamfering process (step S2) and objects to be ground and polished have a disk shape, and thus no corner portions are provided. Accordingly, a frictional force applied to the main surfaces 101e and 101f of the disk-shaped glass blank 107b is likely to be uniform in steps S3 and S4. As a result, the disk-shaped glass blank 107b can be processed to have high surface quality and be thin with high accuracy.
[0129] Also, it is possible to produce the disk-shaped glass substrate 100 having high surface quality and a highly precise substrate thickness as described above with reference to
[0130] Furthermore, the chamfering surfaces 103a and 103b are also formed on the produced disk-shaped glass substrate 100 due to the chamfering process (step S2) being included. Accordingly, the disk-shaped glass substrate 100 is unlikely to be damaged when a thin glass substrate is cut out from the disk-shaped glass substrate 100, and it is possible to cut out thin glass substrates at a higher yield than in a case where no chamfering surfaces 103a and 103b are provided.
[0131] Thus, it is possible to stably mass produce thin glass substrates having high surface quality, a highly precise substrate thickness, and a desired shape.
[0132] Also, as described above, the grinding process (step S3) and the polishing process (step S4) are performed after the chamfering process (step S2) and objects to be ground and polished have a disk shape, and thus no corner portions are provided. Thus, it is possible to stably manufacture, at a high yield, the disk-shaped glass substrates 100 having a large diameter of 70 to 210 mm, and having high surface quality and a highly precise substrate thickness. Normally, more thin glass substrates can be cut out from a large disk-shaped glass substrate 100 than from a small disk-shaped glass substrate 100. Thus, stable mass production of thin glass substrates having high surface quality and a highly precise substrate thickness can be facilitated by cutting out thin glass substrates from a large disk-shaped glass substrate 100.
[0133] (Method for Manufacturing Thin Glass Substrate 114)
[0134] Hereinafter, a method for manufacturing a thin glass substrate 114 will be described.
[0135] The method for manufacturing the thin glass substrate 114 according to this embodiment is a method for manufacturing a plurality of thin glass substrates 114 from the disk-shaped glass substrate 100, which is an intermediate, and includes processes shown in the flowchart shown in
[0136] As shown in
[0137] Here, for simplification, the same processes as those of steps S1 to S5 in the method for manufacturing the disk-shaped glass substrate 100 are not shown in
[0138] Specifically, as shown in
[0139] According to the method for manufacturing the thin glass substrate 114, as described above, the disk-shaped glass substrate 100 having a uniform substrate thickness and uniform and high surface quality can be produced through the processes of steps S1 to S5. With such a disk-shaped glass substrate 100, a plurality of thin glass substrates 114 having high surface quality and a highly precise substrate thickness can be obtained regardless of portions from which the thin glass substrates 114 are cut out. Also, even in the case of a rectangular thin glass substrate 114 having corner portions, for example, the thin glass substrate 114 having high surface quality and a highly precise substrate thickness can be obtained.
[0140] Also, as described above, the disk-shaped glass substrate 100 is unlikely to be damaged when the thin glass substrates 114 are cut out from the disk-shaped glass substrate 100 due to this method including the chamfering process (step S2). Thus, even rectangular thin glass substrates 114 having corner portions as described as an example here can be obtained at a higher yield than in a case where no chamfering surfaces 103a and 103b are provided.
[0141] Thus, it is possible to stably mass produce thin glass substrates 114 having high surface quality, a highly precise substrate thickness, and corner portions.
[0142] Note that, although an example in which a plurality of rectangular thin glass substrates 114 are cut out in the cut-out processing (step S6) has been described, the number of thin glass substrates 114 to be cut out from the disk-shaped glass substrate 100 may be one. Also, in the cut-out processing (step S6), the shapes and sizes of one or more thin glass substrates 114 that are cut out from the disk-shaped glass substrate 100 may be changed as appropriate, and the thin glass substrates 114 may have a shape having no corner portions, for example. Accordingly, it is possible to stably mass produce thin glass substrates 114 having high surface quality, a highly precise substrate thickness, and a desired shape.
[0143] Note that a single thin glass substrate 114 manufactured using the method for manufacturing the thin glass substrate 114 described here may be utilized as a light-guiding plate. In this case, the method for manufacturing the thin glass substrate 114 described here is preferably adopted as a method for manufacturing a light-guiding plate. Accordingly, it is possible to stably mass produce light-guiding plates having high surface quality, a highly precise substrate thickness, and a desired shape.
[0144] (Method for Manufacturing Light-Guiding Plate)
[0145] Hereinafter, the method for manufacturing a light-guiding plate 115 will be described.
[0146] The method for manufacturing the light-guiding plate 115 according to this embodiment is a method for manufacturing the light-guiding plate 115 by combining a plurality of thin glass substrates 114, and includes processes shown in the flowchart shown in
[0147] As shown in
[0148] Here, for simplification, the same processes as those of steps S1 to S6 in the method for manufacturing the thin glass substrate 114 are not shown in
[0149] Specifically, in the stacking process (step S7), the thin glass substrates 114 are stacked on each other in the up-down direction with adjacent thin glass substrates 114 being fixed to each other, and thus the light-guiding plate 115 as shown in
[0150] Note that, although an example in which four thin glass substrates 114 are stacked on each other is shown in
[0151] According to the method for manufacturing the light-guiding plate 115, the light-guiding plate 115 can be produced by cutting out a plurality of thin glass substrates 114 having high surface quality and a highly precise substrate thickness and stacking the cutout thin glass substrates 114 on each other. As described above, it is possible to stably mass produce thin glass substrates 114 having high surface quality, a highly precise substrate thickness, and corner portions. Thus, it is possible to stably mass produce light-guiding plates 115 having high surface quality, a highly precise substrate thickness, and corner portions.
[0152] Note that, as described above, thin glass substrates 114 to be cut out from the disk-shaped glass substrate 100 in the cut-out processing (step S6) may have a desired shape and size. Accordingly, it is possible to stably mass produce light-guiding plates 115 having high surface quality, a highly precise substrate thickness, and a desired shape.
[0153] Although one embodiment and variations of the present invention have been described above, the present invention is not limited thereto. The present invention also includes modes in which the above-described embodiment and variations are combined as appropriate, and modes in which modifications are made thereto as appropriate, for example.
[0154] The present invention can be utilized for mass production of glass substrates with high surface quality and a small substrate thickness, such as glass substrates to be applied to display apparatuses such as head-mounted displays.