Microelectromechanical displacement structure and method for controlling displacement

Abstract

The present disclosure provides a displacement amplification structure and a method for controlling displacement. In one aspect, the displacement amplification structure of the present disclosure includes a first beam and a second beam substantially parallel to the first beam, an end of the first beam coupled to a fixture site, and an end of the second beam coupled to a motion actuator; and a motion shutter coupled to an opposing end of the first and second beams. In response to a displacement of the motion actuator along an axis direction of the second beam, the motion shutter displaces a distance along a transversal direction substantially perpendicular to the axis direction.

Claims

1. A thermally actuated displacement amplification structure, comprising: a motion actuator having a first thermally actuated beam and a second thermally actuated beam that are coupled at an output portion of the motion actuator; a motion shutter coupled to a first shutter beam and a second shutter beam that are separated by a gap, a first end of the second shutter beam coupled to the motion actuator at the output portion and a first end of the first shutter beam coupled to a site; and wherein, in response to a displacement of the motion actuator along an axis direction of the second shutter beam, the motion shutter displaces along a displacement direction relative to the axis direction, the first shutter beam and the second shutter beam undergoing a relative differential motion to cause an amplified displacement of the motion shutter.

2. The structure of claim 1, wherein the displacement of the motion actuator along the axis direction ranges from about 25 to about 50 microns and the motion shutter displaces a distance along a transverse direction of between 500 microns and 1000 microns.

3. The structure of claim 1, wherein the first shutter beam and the second shutter beam have a strip shape and comprise an elastic material.

4. The structure of claim 1, wherein the motion shutter has a shape selected from one of a square, a rectangle, a circle, an oval, and a polygon.

5. The structure of claim 1, wherein the structure comprises a silicon on insulator (SOI) wafer.

6. The structure of claim 5, wherein the SOI wafer comprises a doped silicon layer on an insulating layer.

7. The structure of claim 1, further comprising a first electrode and a second electrode.

8. The structure of claim 7, further comprising a temperature coefficient component circuit that is electrically connected to the first electrode and the second electrode.

9. The structure of claim 1, wherein the structure comprises an optical attenuator.

10. The structure of claim 9, wherein the motion shutter is an opaque shutter.

11. The structure of claim 1, wherein the motion actuator comprises a v-beam structure.

12. The structure of claim 11 further comprising a plurality of v-beam structures.

13. The structure of claim 1, wherein the motion shutter is displaced at least 500 microns in response to movement of the motion actuator.

14. The structure of claim 1, further comprising a control circuit connected to the motion actuator to control actuation in response to a measured change in a motion actuator operation.

15. The structure of claim 1 wherein the motion actuator is coupled to a frame.

16. The structure of claim 15 wherein the site is on the frame.

17. The structure of claim 15 wherein the site comprises a fixture site on the frame.

18. The structure of claim 15 wherein the frame defines an actuating region and a response region, the motion shutter being displaced in the response region.

19. The structure of claim 1 wherein the first shutter beam comprises a silicon material of an SOI chip having a size less than 4 mm.

20. The structure of claim 1 wherein the second shutter beam is actuated to move on an axis extending to the motion shutter.

21. A thermally actuated displacement amplification structure, comprising: a motion actuator having a first thermally actuated beam and a second thermally actuated beam that are coupled at an output portion of the motion actuator to form a v-beam structure such that the first thermally actuated beam is positioned at an angle relative to the second thermally actuated beam; a motion shutter coupled to a first shutter beam and a second shutter beam that are separated by a gap, a first end of the second shutter beam coupled to the motion actuator at the output portion and a first end of the first shutter beam coupled to a site; and wherein, in response to a displacement of the motion actuator along an axis direction of the second shutter beam, the motion shutter displaces along a displacment direction relative to the axis direction, the first shutter beam and the second shutter beam undergoing a relative differential motion to cause an amplified displacement of the motion shutter.

22. The structure of claim 21, wherein the displacement of the motion actuator along the axis direction ranges from about 25 to about 50 microns and the motion shutter displaces a distance along a transverse direction of between 500 microns and 1000 microns.

23. The structure of claim 21, wherein the first shutter beam and the second shutter beam have a strip shape and comprise an elastic material.

24. The structure of claim 21, further comprising a first electrode and a second electrode.

25. The structure of claim 21, wherein the structure comprises an optical attenuator.

26. The structure of claim 21, further comprising a control circuit connected to the motion actuator to control actuation in response to a measured changed in a motion actuator operation.

27. The structure of claim 21, wherein the angle is in a range of 120 degrees and 180 degrees.

28. The structure of claim 21, wherein the motion shutter is displaced at least 500 microns in response to movement of the motion actuator.

29. The structure of claim 21 wherein the motion actuator is coupled to a frame.

30. The structure of claim 29 wherein the site is on the frame.

31. The structure of claim 30 wherein the site comprises a fixture site on the frame.

32. The structure of claim 29 wherein the frame comprises an SOI chip having a size of less than 4 mm, the frame having a first electrode and a second electrode to drive the motion actuator.

33. The structure of claim 21 wherein the first shutter beam comprises a silicon material.

34. The structure of claim 21 wherein the second shutter beam is actuated to move on an axis extending to the motion shutter.

35. The structure of claim 21 further comprising a plurality of v-beam structures.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) The present disclosure is to be read in conjunction with the accompanying drawings, in which:

(2) FIG. 1 illustrates a MEMS displacement amplification structure, in accordance with one embodiment of the present disclosure;

(3) FIG. 1a illustrates an embodiment of the MEMS displacement amplification structure of these teachings;

(4) FIG. 1b illustrates another view of the embodiment of FIG. 1a;

(5) FIGS. 2a and 2b respectively illustrate a plain view and a perspective view of a MEMS displacement amplification structure, in accordance with one embodiment of the present disclosure;

(6) FIG. 2c graphically illustrates the electrical current change after a step voltage input to one embodiment of the MEMS displacement amplification structure of these teachings;

(7) FIG. 3 illustrates a simulation result of a MEMS displacement amplification structure, in accordance with one embodiment of the present disclosure; and

(8) FIGS. 4-6 illustrate details of other embodiments of the MEMS displacement amplification structure of these teachings.

DETAILED DESCRIPTION

(9) The following detailed description is of the best currently contemplated modes of carrying out the present disclosure. The description is not to be taken in a limiting sense, but is made merely for the purpose of illustrating the general principles of the present disclosure, because the scope of the present disclosure is defined by the appended claims.

(10) As used herein, the singular forms a, an, and the include the plural reference unless the context clearly dictates otherwise.

(11) Except where otherwise indicated, all numbers expressing quantities of ingredients, reaction conditions, and so forth used in the specification and the claims are to be understood as being modified in all instances by the term about. Further, any quantity modified by the term about or the like should be understood as encompassing a range of 10% of that quantity.

(12) For the purposes of describing and defining the present disclosure, it is noted that the term substantially is utilized herein to represent the inherent degree of uncertainty that may be attributed to any quantitative comparison, value, measurement, or other representation. The term substantially is also utilized herein to represent the degree by which a quantitative representation may vary from a stated reference without resulting in a change in the basic function of the subject matter at issue.

(13) FIG. 1 illustrates a MEMS displacement amplification structure, in accordance with one embodiment of the present disclosure. As shown in FIG. 1, an displacement amplification structure 10 includes first and second beams 20 and 30 that are closely posed and substantially parallel to each other. In one embodiment, first and second beams 20 and 30 have a stripe shape, and comprise an elastic or flexible material, such as silicon. In one embodiment, first and second beams 20 and 30 are separated with each other by a gap of about 20 to 75 microns.

(14) As shown in FIG. 1, end 201 of first beam 20 is fixed to an immobilized fixture 50. End 301 of second beam 30 has a degree of freedom along an axis direction 32 of second beam 30. Ends 202 and 302 of beams 20 and 30 are connected to a motion shutter 40. In this particular embodiment, motion shutter 40 has a square shape. It is appreciated that motion shutter 40 may of other shapes, such as, but not limited to, rectangle, triangle, circle, oval, polygon, etc. In one embodiment, motion shutter 40 is made of an opaque material, such as silicon coated with gold.

(15) A small input displacement (e.g., 25 to 50 microns) along axis direction 32 of second beam 30 at end 301 bends first and second beams 20 and 30, and causes a differential axis motion between first and second beams 20 and 30. The differential motion transfers into a large displacement (e.g., 500 to 1,000 microns) for motion shutter 40 in a transversal direction 42. The input displacement can be generated by thermal expansion, magnetic force, electrostatic force, piezoelectricity, and other suitable actuation sources.

(16) FIGS. 2A and 2B respectively illustrate a plain view and a perspective view of a MEMS displacement amplification structure, in accordance with one embodiment of the present disclosure. As shown in FIGS. 2A and 2B, a MEMS large motion structure 10 includes a frame 9 defining a planar surface 8, first and second beams 2 and 3, a motion shutter 4, a motion actuator 5, and first and second electrodes 6 and 7. In one embodiment, all of these components are configured in the same planar surface 8.

(17) Frame 9 includes a fixture site 91 and further defines an actuating region 92 and a response region 94. First and second electrodes 6 and 7 are disposed in actuating region 92 and are mechanically coupled to frame 9. Motion actuator 5 is disposed in actuating region 92 and is electrically coupled to first and second electrodes 6 and 7.

(18) First and second beams 2 and 3 are disposed in response region 94. Second beam 3 is substantially parallel to first beam 2. End 21 of first beam 2 is connected to a central portion (or output portion) of the actuator 5. End 22 of first beam 2 is connected to motion shutter 4. End 31 of second beam 3 is coupled to and immobilized at fixture site 91. End 32 of second beam 3 is mechanically coupled to motion actuator 4. Motion shutter 4 is disposed in the response region and mechanically coupled to ends 22 and 32 of first and second beams 2 and 3.

(19) In one embodiment, an electric current or voltage (e.g., 3 Volts) is applied to motion actuator 5 through first and second electrodes 6 and 7, so as to cause a displacement (e.g., 500 microns) of second beam 2 along an axis direction 24 of second beam 2. In response to the displacement of motion actuator 5, motion shutter 4 displaces a distance along a transversal direction 42 substantially perpendicular to axis direction 24. In one embodiment, motion actuator 5 comprises an electrothermal material.

(20) In one embodiment, motion actuator 5 has a V-shape or an angled shape, which has a vertex portion 52 and an interior angle ranging from about 120 degrees to about 180 degrees. In some embodiments, motion actuator 5 may have other shapes and may include a plurality of V-beams. In one embodiment, end 21 of second beam 2 is mechanically coupled to vertex portion 52 of motion actuator 5.

(21) When an electric current/voltage is applied to motion actuator 5, a deformation along axis direction 24 is applied to first beam 2. Such deformation generates a differential motion along axis directions between first and second beams 2 and 3. Due to the constraint along axis direction, this differential axis motion leads to a very large transversal motion of first and second beams 2 and 3. As a result, motion shutter 5 also has a very large transversal motion. In certain embodiments, the transversal motion of motion shutter 5 can be more than 500-1,000 microns within a compact chip size of less than 4 mm. In one embodiment, MEMS structure 10 can be formed from a silicon-on-insulator (SOI) silicon wafer.

(22) FIG. 3 illustrates a simulation result of a MEMS displacement amplification structure, in accordance with one embodiment of the present disclosure.

(23) For the compact thermal actuated displacement amplification structure of FIG. 1a, for example, in embodiments using highly doped silicon, during the thermal equilibrium procedure of the device itself or environmental temperature change, the drift could be more than 1 dB. The increased resistance leads to a decreased input power to the actuator when the input voltage holds constant. The increased resistance can be at least partially corrected by a negative temperature coefficient component 41 configured to be electrically connected in series with the voltage source, V, as shown in FIG. 1a. The negative temperature coefficient component 41 can be electrically connected between the first electrode 32a and the voltage source, V, as shown in FIG. 1b, or between the voltage source, V, and the second electrode 32b, as shown in FIG. 1a. Although, for brevity, other embodiments are shown connected to either the first electrode 32a or to the second electrode 32b, both connections are within the scope of these teachings. In the embodiment shown in FIG. 1a, the negative temperature coefficient component 40 is a negative temperature coefficient thermistor, NTCT.

(24) FIG. 2c shows the electrical current change, in an embodiment of the MEMS displacement amplification structure of these teachings, after a step voltage input from the voltage source V, indicating that the resistance of the actuator increases during thermal equilibrium procedure with environment. Thus, with constant voltage applied from the voltage source V, the input power to the actuator decreases. FIG. 3 shows the variation of the resistance of the negative temperature coefficient component 41 as a function of temperature, in which the resistance decreases with temperature. This should be compared to the variation of the resistance of the MEMS displacement amplification structure of these teachings with temperature, in which the resistance of the micro-actuator in the displacement amplification structure of these teachings increases with temperature. Although, in one embodiment, the negative temperature coefficient component 40 can be selected to have, at room temperature, a resistance between about 2% to about 20% of the resistance at room temperature of the MEMS displacement amplification structure of these teachings, the variation of the resistance of the negative temperature coefficient component 41 can be selected so that the variation of the resistance of the negative temperature coefficient component 41 with temperature compensates for a significant portion of the variation of the resistance of the MEMS displacement amplification structure of these teachings with temperature. In one instance, the variation of the resistance of the negative temperature coefficient component 40 with temperature substantially compensates for the variation of the resistance of the MEMS displacement amplification structure of these teachings with temperature.

(25) Another embodiment of the negative temperature coefficient component 41 is used in the embodiment of the system shown in FIG. 4. Referring to FIG. 4, in the embodiment shown there in, the negative temperature coefficient component 41 includes a first negative temperature coefficient thermistor 46 electrically connected in parallel with a second negative temperature coefficient thermistor 50.

(26) A further embodiment of the negative temperature coefficient component 41 is used in the embodiment of the system shown in FIG. 5. Referring to FIG. 5, in the embodiment shown there in, the negative temperature coefficient component 41 includes a negative temperature coefficient thermistor 45 electrically connected in series to a resistor 55.

(27) Yet another embodiment of the negative temperature coefficient component 41 is used in the embodiment of the system shown in FIG. 6. Referring to FIG. 6, in the embodiment shown there in, the negative temperature coefficient component 41 includes a negative temperature coefficient thermistor 45 electrically connected in parallel to a resistor 65.

(28) During use of the system of these teachings, a negative temperature coefficient component is electrically connected in series with one of a first electrode or a second electrode of the variable optical attenuator of these teachings. The negative temperature coefficient component is configured to be electrically connected in series with a voltage source, the voltage source configured to be electrically connected in series in order to complete an electrical circuit between the first electrode and the second electrode. In that manner, at least a portion of the variation of the resistance of the variable optical attenuator with temperature is thermally compensated when the voltage source is energized.

(29) In summary, the microelectromechanical motion structure of the present disclosure generates a controlled transversal motion in response to a small deformation in an axis direction of a motion actuator comprising an electrothermal material. Axis motion of one beam causes a differential axis motion of two parallel neighboring beams. Those two beams, on one end, are connected with a motion shutter. The other end of one beam is connected to a V-beam thermal actuator, while the other end of the other beam is fixed at the substrate.

(30) Although the present disclosure has been described with respect to various embodiments, it should be understood that these teachings are also capable of a wide variety of further and other embodiments within the spirit and scope of the appended claims.