SEMITRANSPARENT THIN-FILM SOLAR MODULE
20200227578 ยท 2020-07-16
Inventors
- Andreas Heiss (Penzing, DE)
- Joerg Palm (Munich, DE)
- Helmut Vogt (Munich, DE)
- Robert Lechner (Munich, DE)
Cpc classification
H01L31/0463
ELECTRICITY
International classification
H01L31/0468
ELECTRICITY
Abstract
A thin-film solar module with a substrate and a layer structure applied thereon that comprises a rear electrode layer, a front electrode layer, and an absorber layer arranged between the back electrode layer and the front electrode layer. Serially connected solar cells are formed in the layer structure by patterning zones, wherein each patterning zone comprises a first patterning line for subdividing at least the rear electrode layer, a second patterning line for subdividing at least the absorber layer, and at least one third patterning line for subdividing at least the front electrode layer. At least one patterning zone has one or more optically transparent zones in a zone region reduced by the first patterning line, which are in each case rear-electrode-layer-free, wherein the one or more optically transparent zones are implemented such that the rear electrode layer is continuous in the zone region.
Claims
1.-15. (canceled)
16. A thin-film solar module, comprising: a substrate and a layer structure applied thereon, the layer structure comprising a rear electrode layer, a front electrode layer, and an absorber layer arranged between the rear electrode layer and the front electrode layer; and serially connected solar cells formed in the layer structure by patterning zones, each patterning zone comprising a first patterning line for subdividing at least the rear electrode layer, a second patterning line for subdividing at least the absorber layer, and at least one third patterning line for subdividing at least the front electrode layer, wherein at least one patterning zone has, in a reduced zone region reduced by the first patterning line, one or more rear-electrode layer-free optically transparent zones implemented such that the rear electrode layer is continuous in the reduced zone region.
17. The thin-film solar module according to claim 16, wherein the one or more optically transparent zones each comprise a front electrode layer section.
18. The thin-film solar module according to claim 16, wherein the one or more optically transparent zones are front-electrode-layer-free.
19. The thin-film solar module according to claim 16, wherein the one or more optically transparent zones are a plurality of linearly arranged optically transparent zones.
20. The thin-film solar module according to claim 16, wherein, in at least one patterning zone, the first patterning line and/or the third patterning line are provided with one or more bulges each having an optically transparent zone arranged therein.
21. The thin-film solar module according to claim 20, wherein the first patterning line and the at least one third patterning line of the patterning zone are provided with at least one bulge, and wherein at least one bulge of the first patterning line is arranged opposite a bulge of the third patterning line.
22. The thin-film solar module according to claim 16, wherein the reduced zone region around the first patterning line has at least one linear decoating region, by which the reduced zone region is subdivided into two zone region portions, each said at least one decoating region having an alternating sequence of optically transparent zones and electrode zones, each optically transparent zone being rear-electrode-layer-free, and each electrode zone being absorber-layer-free and having a rear electrode layer section, and wherein the two rear electrode layer sections of the zone region portions are areally connected to one another by the rear electrode layer section of at least one electrode zone.
23. The thin-film solar module according to claim 22, wherein at least one linear decorating region is arranged according to one or more of: i) between the first patterning line and the second patterning line; ii) between the second patterning line and the third patterning line; and iii) inside the second patterning line.
24. The thin-film solar module according to claim 22, wherein the second patterning line is formed by a linear decoating region.
25. The thin-film solar module according to claim 22, wherein at least one linear decoating region is arranged within or forms the third patterning line.
26. The thin-film solar module according to claim 16, wherein at least one optically transparent zone is surrounded by an immediately adjacent absorbent-layer-free edge zone having a rear electrode layer section.
27. A method for producing a thin-film solar module, comprising: providing a flat substrate; depositing a rear electrode layer on one side of the flat substrate; depositing an absorber layer over the rear electrode layer; depositing a front electrode layer over the absorber layer; patterning the rear electrode layer by first patterning lines; patterning the absorber layer by second patterning lines; patterning the front electrode layer by third patterning lines, wherein a patterning zone is formed by an immediate sequence of a first patterning line, a second patterning line and a third patterning line, patterning zones forming a monolithic serial connection circuit of solar cells; and forming one or more rear-electrode-layer-free optically transparent zones by section-wise removal of at least the rear electrode layer in a reduced zone region reduced by the first patterning line of at least one patterning zone such that the rear electrode layer is continuous in the reduced zone region.
28. The method according to claim 27, wherein at least one linear decoating region is formed in the reduced zone region, by which decoating region reduced the zone region is subdivided into two zone region portions, wherein the decoating region has an alternating sequence of at least two optically transparent zones and at least one electrode zone, wherein each electrode zone is absorber-layer-free, has a rear electrode layer section and is formed by section-wise removal at least of the absorber layer, and wherein the rear electrode layer section areally connects two rear electrode layer sections of the zone region portions to one another.
29. The method according to claim 27, further comprising forming the optically transparent zones by section-wise removal at least of the rear electrode layer prior to depositing the absorber layer.
30. The method according to claim 29, wherein forming the optically transparent zones comprises irradiation with a laser beam.
31. The method according to claim 29, further comprising: forming electrode zones and edge zones surrounding the optically transparent zones, after depositing the absorber layer and front electrode layer, and after forming the third patterning lines, by section-wise removal at least of the absorber layer and of the front electrode layer.
32. The method according to claim 31, wherein forming electrode zones and edge zones comprises mechanical material removal.
33. The method according to claim 31, wherein the optically transparent zones surrounded by edge zones are formed by: section-wise removal of at least the absorber layer, in processing zones that correspond to the optically transparent zone to be formed and surrounding edge zones, wherein the optically transparent zone is formed in an inner region and the edge zone is formed in an edge region of the processing zone, and removal at least of the rear electrode layer, in the inner region of the processing zones for forming the optically transparent zones, wherein the edge regions of the processing zones form the edge zones.
Description
[0066] The invention is now explained in detail using exemplary embodiments and referring to the accompanying figures. They depict, in simplified, not to scale representation:
[0067]
[0068]
[0069]
[0070]
[0071]
[0072]
[0073]
[0074]
DETAILED DESCRIPTION OF THE DRAWINGS
[0075]
[0076] The thin-film solar module 1 has a composite pane structure in substrate configuration, in other words, it has a first substrate 2 with a layer structure 3 made of thin films applied thereon, wherein the layer structure 3 is arranged on a light-entry side surface of the first substrate 2. Here, the first substrate 2 is implemented, for example, as a rigid glass plate with relatively high light transmittance, while other electrically insulating materials with desired stability and inert behavior relative to the process steps carried out can equally be used.
[0077] The layer structure 3 includes, arranged on the light-entry side surface of the first substrate 2, an opaque rear electrode layer 5, which is made, for example, from a light-impermeable metal such as molybdenum (Mo) and was applied on the first substrate 2 by vapor deposition or magnetron-enhanced cathodic sputtering (sputtering). The rear electrode layer 5 has, for example, a layer thickness in the range from 300 nm to 600 nm.
[0078] A photovoltaically active (opaque) absorber layer 6 that is made of a semiconductor doped with metal ions whose bandgap is capable of absorbing the greatest possible share of sunlight is applied on the rear electrode layer 5. The absorber layer 6 is made, for example, of a p-conductive chalcopyrite compound semiconductor, for example, a compound of the group Cu(In/Ga)(S/Se).sub.2, in particular sodium (Na)-doped Cu(In/Ga)(S/Se).sub.2. The preceding formulas are understood to mean that indium (In) or gallium (Ga) as well as sulfur (S) or selenium (Se) can be present alternatively or in combination. The absorber layer 6 has a layer thickness that is, for example, in the range from 1 to 5 m and is, in particular, approx. 2 m. Typically, for the production of the absorber layer 6, various material layers are applied, for example, by sputtering, and are subsequently thermally converted to form the compound semiconductor by heating in a furnace (RTP=rapid thermal processing), optionally, in an atmosphere containing S and/or Se. This manner of production of a compound semiconductor is well known to the person skilled in the art such that it need not be discussed in detail here.
[0079] Deposited on the absorber layer 6 is a buffer layer 7, which consists here, for example, of a single layer of cadmium sulfide (CdS) and a single layer of intrinsic zinc oxide (i-ZnO), not depicted in detail in
[0080] A front electrode layer 8 is applied on the buffer layer 7, for example, by sputtering. The front electrode layer 8 is transparent to radiation in the visible spectral range (window electrode) such that the incoming sunlight (depicted in
[0081] For the formation and serial connection of the solar cells 11, the layer structure 3 was patterned using suitable patterning technology, for example, laser lithography and/or mechanical removal. Typically, a plurality of immediate sequences of three patterning lines P1-P2-P3 in each case in the form of layer ditches are introduced into the layer structure 3 in this order. Here, at least the rear electrode 5 is subdivided by first patterning lines P1; at least the absorber layer, by second patterning lines P2; and at least the front electrode layer 8, by third patterning lines P3 by production of respective ditches. Via the second patterning lines P2, the front electrode layer 8 of one solar cell 11 is in each case electrically conductively connected to the rear electrode layer 5 of an adjacent solar cell 11, with the front electrode layer 8 directly contacting the rear electrode layer 5, for example. In the exemplary embodiment depicted, the ditches of the first patterning lines P1 are filled by material of the absorber layer 6. The ditches of the second patterning lines P2 are filled by material of the front electrode layer 8, and the ditches of the third patterning lines P3 are filled by the adhesive layer 9 mentioned in the following. Each immediate sequence of a first, second, and third patterning line P1-P2-P3 forms a patterning zone 14. In
[0082] In the exemplary embodiment depicted here, both the positive power connector (+) and the negative power connector () of the thin-film solar module 1 are routed via the rear electrode layer 5 and electrically contacted there. For this purpose, the layers of the layer structure 3 are removed all the way to the rear electrode layer 5 in the two peripheral connection sections 13 of the thin-film solar module 1.
[0083] For protection against environmental influences, a (plastic) adhesive layer 9 that serves to encapsulate the layer structure 3 is applied on the front electrode layer 8. Adhesively bonded with the adhesive layer 9 is a second substrate 10 transparent to sunlight that is implemented, for example, in the form of a glass sheet made of extra white glass with a low iron content, with the equally possible use of other electrically insulating materials with desired strength and inert behavior relative to the process steps carried out. The second substrate 10 serves for the sealing and for the mechanical protection of the layer structure 3. The thin-film solar module 1 can absorb light via the front-side module surface 4 of the second substrate 10 in order to produce an electrical voltage on the two power connectors (+,). A resulting current path is depicted in
[0084] The two substrates 2, 10 are fixedly bonded (laminated) to one another via the adhesive layer 9, with the adhesive layer 9 implemented here, for example, as a thermoplastic adhesive layer, which can be reshaped plastically by heating and which fixedly bonds the two substrates 2, 10 to one another during cooling. The adhesive layer 9 is made here, for example, of PVB. Together, the two substrates 2, 10 with the solar cells 11 embedded in the adhesive layer 9 form a laminated composite 12.
[0085] Reference is now made to
[0086] The patterning zones 14 are in each case arranged parallel to the module edge, here, for example, in x-direction, which can also be referred to as the width of the thin-film solar module 1. The y-direction perpendicular thereto can be referred to as the length of the thin-film solar module 1. The peripheral connection sections 13 depicted in
[0087] Situated on both sides adjacent a patterning zone 14 is, in each case, a layer region 16 that represents, in the context of the present invention, a solar cell 11 with an optically active zone. In the inner region of the thin-film solar module 1, each layer region 16 is arranged between two immediately adjacent patterning zones 14 and is delimited thereby. In the case of the two peripheral solar cells 11, the layer region 16 is, in each case, arranged between a patterning zone 14 and the adjacent connector section 13 shown in
[0088] The patterning zones 14 of
[0089] The structure of an optically transparent zone 18 and edge zone 21 is illustrated in
[0090] The optically transparent zone 18 is surrounded by an edge zone 21. In the edge zone 21, all layers are removed, with the exception of a rear electrode layer section 5-3. By means of the edge zone 21, short-circuit current paths on the edges of the decoated areas can advantageously be avoided. Advantageously, the ratio of the total area of the optically transparent zones 18 to the total area of the edge zones 21 is greater than 1, preferably greater than 10.
[0091] Reference is now made again to
[0092] In
[0093] In contrast thereto, in
[0094] In
[0095] The embodiment of the patterning zone 14 of
[0096] Reference is now made to
[0097] Each linear decoating region 19 is composed of a plurality of optically transparent zones 18 and a plurality of electrodes zones 20 in alternating sequence, in other words, one optically transparent zone 18 is situated between two electrodes zones 20 and/or one electrode zone 20 is situated between two optically transparent zones 18. The optically transparent zones 18 and electrode zones 20 have a structure as it has already been described in conjunction with
[0098] As illustrated in
[0099] In the thin-film solar module 1 according to the invention, the solar cells 11 are opaque and have transmittance for visible light of less than 5%. In contrast to this, the optically transparent zones 18 have transmittance for visible light of at least 85%. The ratio of the total area of all optically transparent zones 18 to the total area of the solar cells 11 is in the range from 5% to 50%. Thus, the optical transparency of the semitransparent thin-film solar module averaged over the total area of the thin-film solar module 1 is also in the range from 5% to 50% and is, in particular, 20%. The optically transparent zones 18 are arranged uniformly distributed along the linear decoating region 19, by which means a very smooth overall visual effect can be obtained.
[0100] In
[0101] In the two embodiments of
[0102] In
[0103] In the embodiment of
[0104] In the embodiment of
[0105] In the embodiment of
[0106]
[0107] In
[0108]
[0109] According to it, in step I, a substrate 2 with a layer structure 3 with patterning zones 14 introduced therein for the formation of serially connected solar cells 11 is provided.
[0110] In step II, the optically transparent zones 18 are produced by removal of all layers of the layer structure 3 all the way to the substrate 2 using a pulsed laser beam of a laser beam source. For this purpose, the layer structure 3 is irradiated with a pulsed laser beam, with pulses having a duration of less than 1 nanosecond. The layer structure 3 is preferably irradiated through the transparent substrate 2; however, direct irradiation of the layer structure 3 from the side facing away from the substrate 2 is also possible. Alternatively, the optically transparent zones 18 can be produced by mechanical material removal. The optically transparent zones 18 are respectively produced in the zone regions 22 reduced by the first patterning line P1 such that the rear electrode layer 5 in the zone regions 22 is in each case continuous.
[0111] In an optional step III, edge zones 21 are produced around the optically transparent zones 18. The edge zones 21 are produced by irradiation of the layer structure 3 with a pulsed laser beam, with the pulses having a duration of less than 1 nanosecond, and/or by mechanical material removal. When edge zones 21 are produced around the optically transparent zones 18, it is possible to also produce the optically transparent zones 18 by irradiation with a pulsed laser, whose pulses have a duration of at least 1 nanosecond.
[0112] The invention advantageously makes available a semitransparent thin-film solar module. The patterning zones of the solar cells have optically transparent zones and are, in particular, subdivided by linear decoating regions, wherein each linear decoating region has optically transparent zones and electrode zones in an alternating sequence. The patterning zones have, in a zone region reduced by the first patterning line (without first patterning line), a continuous rear electrode layer.
[0113] As is evident from the above description, the invention advantageously enables technically relatively uncomplicated, highly versatile, and economical production of the thin-film solar module, wherein a relatively large optically active area with comparatively high visible-light transmittance of the thin-film solar module can be obtained.
LIST OF REFERENCE CHARACTERS
[0114] 1 thin-film solar module [0115] 2 first substrate [0116] 3 layer structure [0117] 4 module surface [0118] 5 rear electrode layer [0119] 5-1,5-2,5-3 rear electrode layer section [0120] 6 absorber layer [0121] 7 buffer layer [0122] 8 front electrode layer [0123] 8-3 front electrode layer section [0124] 9 adhesive layer [0125] 10 second substrate [0126] 11 solar cell [0127] 12 composite [0128] 13 connection section [0129] 14 patterning zone [0130] 15 bulge [0131] 16 layer region [0132] 17 dead zone [0133] 18 optically transparent zone [0134] 19 decoating region [0135] 20 electrode zone [0136] 21 edge zone [0137] 22 zone region [0138] 22-1,22-2 zone region portion