ELECTRODE ARRAY FOR A DIELECTRICALLY IMPEDED PLASMA TREATMENT

Abstract

The invention relates to an electrode array for a dielectrically impeded plasma treatment of a surface of a body, comprising at least one flexible flat electrode (1) and one dielectric (2) consisting of a flat flexible first material which protects the electrode (1) from the surface to be treated, with a layer (3) impeding a direct current flow. The dielectric (2) can lie on the surface to be treated, above a structure (4) with projections (7), air spaces (5) being formed between the projections (7) for the creation of the plasma, which have a side open towards the surface to be treated, and a bottom-side closure as a result of the layer (3) impeding the direct current flow. The structure (4) comprises a plurality of spacer elements (6) consisting of a second material that has less flexibility than the first material, and the projections (7) of the structure (4) are partially or completely formed by the spacer elements (6).

Claims

1. An electrode arrangement for a dielectric barrier plasma treatment of a surface of a body, comprising: at least one flexible planar electrode; a dielectric material made of a planar flexible first material which includes a layer that shields the at least one flexible planar electrode from the surface of the body to be treated and prevents a direct current flow, wherein the dielectric material is configured to rest on the surface of the body to be treated via a structure having projections, wherein air spaces for formation of a plasma are between the projections, wherein the structure comprises a side open toward the surface of the body to be treated, a bottom-side termination by the layer of the dielectric material which prevents the direct current flow, and a plurality of spacer elements made of a second material, wherein a flexibility of the second material is less than the flexibility of the first material, wherein the projections of the structure are partially or completely formed by the spacer elements.

2. The electrode arrangement as claimed in claim 1, wherein the spacer elements are connected to one another via connecting sections which have a lower bending rigidity and/or a lower torsional rigidity than the spacer elements.

3. The electrode arrangement as claimed in claim 1 wherein the spacer elements are connected to one another by connecting webs, wherein the spacer elements and the connecting webs form a spacer grid.

4. The electrode arrangement as claimed in claim 3, wherein the spacer grid is integrally formed.

5. The electrode arrangement as claimed in claim 1 wherein the spacer elements are embedded in an interior of each of the projections so as to reinforce the projections.

6. The electrode arrangement as claimed in claim 1 wherein the projections of the structure are formed from the spacer elements and the dielectric material, wherein the spacer elements are embedded in the dielectric material and the dielectric material encloses the spacer elements.

7. The electrode arrangement as claimed in claim 6, wherein the dielectric material that encloses the spacer elements is integrally formed with the layer of the dielectric material that prevents the direct current flow.

8. The electrode arrangement as claimed in claim 1 wherein the projections of the structure are completely formed by the spacer elements, wherein the spacer elements are connected on a side of the structure facing toward the electrode to the layer of the dielectric material that prevents a direct current flow, and wherein the spacer elements form a contact surface on the surface of the body to be treated on the side of the structure facing toward the surface of the body to be treated.

9. The electrode arrangement as claimed in claim 1 wherein the structure is a grid structure made of adjoining walls forming the projections, which delimit numerous chambers that form the air spaces.

10. The electrode arrangement as claimed in claim 1 wherein the structure comprises protruding nubs that form the projections.

11. The electrode arrangement as claimed in claim 8, wherein the spacer elements have the form of protruding nubs.

12. The electrode arrangement as claimed in claim 10 wherein the protruding nubs are in a form of a circular-cylindrical, conical, or truncated cone.

13. The electrode arrangement as claimed in claim 1 wherein the spacer elements are each formed from a circumferential wall.

14. The electrode arrangement as claimed in claim 13, wherein the circumferential walls of the spacer elements each enclose an air space.

15. The electrode arrangement as claimed in claim 13 wherein the circumferential walls each have a quadrilateral, round, oval, or polygonal cross section.

16. The electrode arrangement as claimed in claim 1 wherein the spacer elements and/or the projections of the structure have a uniform height.

Description

[0070] The invention is to be explained in greater detail hereafter on the basis of the exemplary embodiments schematically illustrated in the appended drawings. In the figures:

[0071] FIG. 1a)shows a view of an upper side of a first embodiment of an electrode arrangement;

[0072] FIG. 1b)shows a vertical section along line A-A in FIG. 1a);

[0073] FIG. 1c)shows a detail view of the detail A in FIG. 1b);

[0074] FIG. 2a)shows a view of a contact side of the first embodiment of an electrode arrangement;

[0075] FIG. 2b)shows a vertical section along line B-B in FIG. 2a);

[0076] FIG. 3a)shows a horizontal section along line C-C in FIG. 1b);

[0077] FIG. 3b)shows a horizontal section along line D-D in FIG. 1b);

[0078] FIG. 4a)shows a view of an upper side of a second embodiment of an electrode arrangement;

[0079] FIG. 4b)shows a vertical section along line A-A in FIG. 4a);

[0080] FIG. 4c)shows a detail view of the detail A in FIG. 4b);

[0081] FIG. 5a)shows a view of a contact side of the second embodiment of an electrode arrangement;

[0082] FIG. 5b)shows a vertical section along line B-B in FIG. 5a);

[0083] FIG. 6a)shows a horizontal section along line C-C in FIG. 4b);

[0084] FIG. 6b)shows a horizontal section along line D-D in FIG. 4b);

[0085] FIG. 7a)shows a view of an upper side of a third embodiment of an electrode arrangement;

[0086] FIG. 7b)shows a vertical section along line A-A in FIG. 7a);

[0087] FIG. 7c)shows a detail view of the detail A in FIG. 7b);

[0088] FIG. 8a)shows a view of a contact side of the third embodiment of an electrode arrangement;

[0089] FIG. 8b)shows a vertical section along line B-B in FIG. 8a).

[0090] The exemplary embodiment illustrated in FIG. 1a) shows an upper side 8, i.e., a side facing away from the surface to be treated, of a first exemplary embodiment of an electrode arrangement for a dielectric barrier plasma treatment of a surface of a body. The upper side 8 of a dielectric material 2 having an essentially square cross section can be seen. On one side, the electrode arrangement extends in a web-shaped attachment 10. The dielectric material 2 comprises a plurality of through openings 11, which enable, for example, the discharge of a fluid, in particular a liquid, from the surface to be treated. The electrode arrangement additionally comprises multiple wing-shaped sections 12, which are particularly flexible having a low thickness and are formed adhesive on the lower side thereof, in order to enable the fastening of the electrode arrangement on the skin of a living being, possibly around a wound.

[0091] The dielectric material 2 is manufactured from a particularly flexible silicone, which has a low hardness of only 20 Shore. The dielectric material 2 thus only has a very low rigidity but can adapt its shape very well to the surface to be treated.

[0092] FIG. 1b) shows a vertical section through the electrode arrangement along line A-A in FIG. 1a). Details can be inferred from the detail view of the detail A in FIG. 1c). A flexible planar electrode 1, which is enclosed on all sides by the dielectric material 2, can be seen. The dielectric material 2 forms in particular a layer 3 preventing a direct or galvanic current flow, which extends along the entire surface of the electrode 1 and thus shields the electrode completely from the surface to be treated. A direct or galvanic current flow from the electrode 1 to the surface to be treated is thus prevented.

[0093] The dielectric material 2 can rest via a structure 4 having projections 7 on the surface to be treated and forms air spaces 5 for the formation of the plasma between the projections 7. The air spaces 5 have a bottom-side termination by the layer 3 of the dielectric material 2 preventing the direct current flow and a side open toward the surface to be treated and are thus open on a contact side 9 of the electrode arrangement.

[0094] It can furthermore be seen that not only the dielectric material 2 comprises through openings 11, but rather the electrode 1 also comprises through openings 13. The through openings 11 of the dielectric material are aligned with the through openings 13 of the electrode and the air spaces 5 between the projections 7 of the structure 4, so that the discharge of a fluid, in particular a liquid, from the surface to be treated is possible through the through openings 11, 13.

[0095] Furthermore, it may be seen from FIGS. 1b) and 1c) that the structure 4 comprises a plurality of spacer elements 6, which are manufactured in this exemplary embodiment from a stable plastic. The flexibility of this stable plastic is less than the flexibility of the silicone, from which the dielectric material 2 is manufactured.

[0096] The spacer elements 6 are each formed in this exemplary embodiment from a circumferential wall, which encloses an air space 5 in each case. The circumferential walls of the spacer elements 6 have a rectangular cross section.

[0097] Moreover, it may be seen from FIGS. 1b) and 1c) that the projections 7 of the structure 4 are partially formed by the spacer elements 6, namely from the spacer elements 6 and the dielectric material 2. The spacer elements 6 are completely embedded into the dielectric material 2 enclosing them and thus form a reinforcement of the projections 7. The dielectric material 2 enclosing the spacer elements 6 is integrally formed with the layer 3 of the dielectric material 2 preventing the direct current flow. This enables a particularly simple and cost-effective manufacturing of the dielectric material 2 in the casting method, wherein the spacer elements 6 are embedded in the dielectric material 2.

[0098] The spacer elements 6 are connected to one another via connecting sections 18, which have a lower bending rigidity and a lower torsional rigidity than the spacer elements 6. The connecting sections 18 between the spacer elements 6 are formed by the dielectric material 2, namely by the layer 3 of the dielectric material 2 preventing a direct current flow. Since the particularly flexible silicone of the dielectric material 2 has a greater flexibility than the stable plastic of the spacer elements 6, the connecting sections 18 can have a lower bending and torsional rigidity than the spacer elements 6 particularly simply in this way. The structure 4 thus has a significantly higher flexibility in the area than in the height.

[0099] The electrode arrangement rests during the treatment with the very soft and flexible dielectric material 2 on the skin surface to be treated

[0100] Both the spacer elements 6 and also the projections 7 of the structure 4 have a uniform height in this exemplary embodiment.

[0101] Moreover, it is clear that the electrode 1 extends into the web-shaped attachment 10. The dielectric material 2 has openings 15 in the region of the web-shaped attachment 10, via which the contacting of the electrode 1 can be performed to supply a high voltage required for the plasma generation, which is preferably used as an AC voltage.

[0102] FIG. 2a) shows the contact side 9 of the electrode arrangement of the first exemplary embodiment. It can be seen in particular that the structure 4 is formed as a grid structure made of walls adjoining one another, which form the projections 7, wherein the walls delimit numerous chambers 17 forming the air spaces 5. The walls of the grid structure here form, on the side thereof facing toward the surface to be treated, a contact surface on the surface to be treated.

[0103] The web-shaped attachment 10 comprises two openings 15 for the contacting in each case of one electrode 1 of the electrode arrangement, since the electrode arrangement comprises a total of two electrodes 1, as will be clear hereafter.

[0104] FIG. 2b) shows a vertical section through the electrode arrangement along line B-B in FIG. 2a). It can be seen that the electrode arrangement comprises two electrodes 1, which are enclosed on all sides by the dielectric material 2. The dielectric material 2 therefore comprises a middle region 16 in which the electrodes 1 do not extend.

[0105] The spacer elements 6 are embedded in the walls formed from the dielectric material 2, which form the projections 7.

[0106] Otherwise, the above statements on FIGS. 1a) to 1c) can be made with respect to FIGS. 2a) and 2b).

[0107] FIG. 3a) shows a horizontal section through the electrode arrangement of the first exemplary embodiment along line C-C in FIG. 1b). It can be seen that the structure 4 comprises a plurality of spacer elements 6, which form the projections 7 together with the dielectric material 2. The spacer elements 6 are each formed from a circumferential wall and each enclose an air space 5, which is formed in a chamber 17, which is delimited by the walls of the grid structure 4. The wall of the spacer elements 6 accordingly encloses the chamber 17 formed by the walls of the grid structure 4.

[0108] It can be seen clearly that each spacer element 6 respectively has a quadrilateral cross section.

[0109] FIG. 3b) shows a horizontal section through the electrode arrangement of the first exemplary embodiment along line D-D of FIG. 1b). It is recognizable that the electrode arrangement comprises two electrodes 1 and a middle region 16 of the dielectric material 2, in which the electrodes 1 do not extend. The electrodes 1 each extend in the web-shaped attachment 10 in order to enable the contacting thereof.

[0110] It can also be seen that the through openings 11 of the dielectric material 2 have a smaller diameter than the through openings 13 of the electrode 1. It can thus be ensured that the dielectric material 2 encloses the electrode 1 on all sides and thus shields the electrode 1 completely from the surface to be treated. The fact that the dielectric material 2 extends on its lateral edges beyond the area of the electrode 1 is used for the same purpose, so that the electrode 1 is also completely enclosed by the dielectric material 2 at the lateral edges of the electrode arrangement.

[0111] Otherwise, reference can be made to the statements on FIGS. 1 and 2 with respect to FIGS. 3a) and 3b).

[0112] FIGS. 4, 5, and 6 show a second exemplary embodiment of an electrode arrangement according to the invention in a form of illustration corresponding to FIGS. 1, 2, and 3, respectively.

[0113] This second exemplary embodiment of the electrode arrangement according to the invention differs, as can be seen in particular in FIGS. 4b), 4c), 5b), and 6a), from the first exemplary embodiment in that the spacer elements 6 are connected to one another by connecting webs 14. The spacer elements 6 form a spacer grid in this manner. A particularly high level of stability of the spacer elements 6 can thus be achieved, which ensures particularly reliably that the required distance between the surface to be treated and the layer 3 preventing a direct current flow is maintained during the treatment.

[0114] The spacer grid formed from the spacer elements 6 with the aid of the connecting webs 14 is integrally formed in this exemplary embodiment and therefore can be manufactured particularly simply in the casting method.

[0115] Otherwise, reference can be made to the statements on the first exemplary embodiment with respect to the second exemplary embodiment shown in FIGS. 4 to 6.

[0116] FIGS. 7 and 8 show a third exemplary embodiment of an electrode arrangement according to the invention in a form of illustration corresponding to FIGS. 1 and 2 and FIGS. 4 and 5, respectively.

[0117] This third exemplary embodiment of the electrode arrangement according to the invention differs, as can be seen in FIGS. 7b), 7c), 8a), and 8b), from the first and second exemplary embodiment in that the projections 7 of the structure 4 are formed solely by the spacer elements 6. The spacer elements 6 are connected on the side thereof facing toward the electrode 1 to the layer 3 of the dielectric material 2 preventing a direct current flow. On the opposite side of the spacer elements 6, which faces toward the surface to be treated, the spacer elements 6 form a contact surface on the surface to be treated. The spacer elements 6 have a uniform height, are formed for contact on the skin of a living being, and rest on the skin during the treatment.

[0118] In contrast to the first and second exemplary embodiment, the spacer elements 6 in the third exemplary embodiment shown in FIGS. 7 and 8 are thus not embedded in the projections 7, but rather the spacer elements 6 themselves form the complete projections 7. For this purpose, the spacer elements 6 and the layer 3 of the dielectric material 2 preventing a direct current flow are joined to one another by adhesive bonding, i.e., permanently connected to one another by a materially-bonded connection.

[0119] The spacer elements 6 are each formed from a circumferential wall, which has an essentially square cross section and encloses an air space 5. In addition, in contrast to the first and second exemplary embodiment, in this third exemplary embodiment, air spaces 5, in which the plasma can form, are also provided in the intermediate spaces between the various spacer elements 6.

[0120] In accordance with the second exemplary embodiment, the spacer elements 6 are also connected to one another by connecting webs 14 in the third exemplary embodiment. The spacer elements 6 form an integrally embodied spacer grid in this manner, which can be manufactured particularly simply in the casting method.

[0121] Otherwise, reference can be made to the statements on the first and second exemplary embodiment with respect to the third exemplary embodiment shown in FIGS. 7 and 8.