MEMS rotation rate sensor including combined driving and detection
10704909 ยท 2020-07-07
Assignee
Inventors
- Patrick Wellner (Walddorfhaeslach, DE)
- Burkhard Kuhlmann (Reutlingen, DE)
- Mirko Hattass (Stuttgart, DE)
Cpc classification
G01C19/5719
PHYSICS
International classification
Abstract
A rotation rate sensor including a substrate having a principal plane of extension, and a structure movable with respect to the substrate; the structure being excitable from a neutral position into an oscillation having a movement component substantially parallel to a driving direction, which is substantially parallel to the principal plane of extension. To induce the oscillation, the rotation rate sensor includes a comb electrode moved along with the structure and a comb electrode fixed in position relative to the substrate. The excitation is produced by applying a voltage to the moving comb electrode and/or to the stationary comb electrode. Due to a rotation rate of the rotation rate sensor about an axis running substantially perpendicularly to the driving direction and substantially perpendicularly to the detection direction, a force applied to the structure with a force component along a detection direction substantially perpendicular to the driving direction is detectable.
Claims
1. A rotation rate sensor, comprising: a substrate; at least one structure movable with respect to the substrate, the structure being excitable from a neutral position of the structure, into an oscillation having a movement component substantially parallel to a driving direction to induce the oscillation, the rotation rate sensor including at least one moving comb electrode moved along with the structure and at least one stationary comb electrode fixed in position relative to the substrate, the excitation being able to be effected by applying voltage to at least one of the moving comb electrode, and the stationary comb electrode, wherein the moving comb electrode and the stationary comb electrode are formed in such a manner that, due to a rotation rate of the rotation rate sensor about an axis running substantially perpendicularly to the driving direction and substantially perpendicularly to a detection direction, a force, which is applied to the structure and includes a force component along a detection direction substantially perpendicular to the driving direction, is detectable, wherein the moving comb electrode includes at least one first electrode, the stationary comb electrode including at least one second electrode and at least one third electrode; and at least one of: (i) a first change in capacitance between the first electrode and the second electrode, and (ii) a second change in capacitance between the first electrode and the third electrode are measurable in such a manner, that the force applied to the structure is detectable with the aid of at least one of the first change in capacitance and the second change in capacitance.
2. The rotation rate sensor as recited in claim 1, wherein the rotation rate sensor includes at least one suspension device fixed to the substrate for movably suspending the structure relative to the substrate in such a manner, that the structure is deflectable with at least one of: (i) a movement component substantially parallel to the driving direction, and (ii) a movement component substantially parallel to the detection direction.
3. The rotation rate sensor as recited in claim 2, wherein the at least one suspension device includes at least one spring deformable at least one of: (i) substantially in the driving direction, and (ii) substantially in the detection direction.
4. The rotation rate sensor as recited in claim 1, wherein at least one of: (i) a first potential may be applied to the moving comb electrode, and (ii) a second potential may be applied to the stationary comb electrode, in such a manner, that, with the aid of at least one of the first potential and the second potential, the structure may be excited from the neutral position into the oscillation.
5. The rotation rate sensor as recited in claim 1, wherein the structure includes at least one first substructure movable with respect to the substrate and at least one second substructure movable with respect to the substrate and with respect to the first substructure, the first substructure and the second substructure being excitable from respective neutral positions into an oscillation, which is substantially 180 degrees out of phase and has movement components substantially parallel to the driving direction, and wherein to induce the oscillation 180 degrees out of phase, the rotation rate sensor includes at least one comb electrode moved along with the first substructure and at least one comb electrode moved along with the second substructure for respective interaction with the stationary comb electrode, the inducement of the oscillation 180 degrees out of phase being able to be effected by applying voltage to at least one of: (i) the comb electrode moved along with the first substructure, and to the comb electrode moved along with the second substructure, and (ii) the stationary comb electrode, the comb electrode moved along with the first substructure and the comb electrode moved along with the second substructure and the stationary comb electrode being formed in such a manner, that, due to the rotation rate, a first additional force applied to the first substructure and a second additional force applied to the second substructure, which have force components substantially parallel to the detection direction that are substantially 180 degrees out of phase, are detectable.
6. The rotation rate sensor as recited in claim 5, wherein the rotation rate sensor includes a coupling structure for coupling the first substructure to the second substructure in such a manner, that at least one of: (i) the first substructure and the second substructure may be induced to oscillate 180 degrees out of phase, and (ii) the action of the first force and the action of the second force are detectable.
7. The rotation rate sensor as recited in claim 6, wherein the coupling structure includes at least one additional spring deformable substantially in the detection direction.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1)
(2)
(3)
DETAILED DESCRIPTION OF EXAMPLE EMBODIMENTS
(4) In the various figures, identical parts are denoted by the same reference symbols and are therefore named or mentioned only once.
(5) A schematic view of a rotation rate sensor 1 according to a first exemplary embodiment of the present invention is shown in
(6) This therefore provides a possible specific embodiment for a combined Coriolis and detection frame, and the multiple use of the electrodes. Comb fingers are attached to the combined Coriolis and detection frame, the comb fingers having their counterpart in stationary fingers, which are fixed to the substrate and may be controlled electrically in pairs, using a potential. These electrodes are used for both driving and detection.
(7) In
(8) For example, the different regions, in particular, the Coriolis and detection frames, of a rotation rate sensor are coupled mechanically by springs, which are flexible in one direction and relatively rigid in the other, as a function of the type of spring. For example, spring types A and B are flexible in the driving direction and highly rigid in the detection direction. An exemplary spring type C is highly rigid in the driving direction and flexible in the detection direction. This subdividing does have the advantage of separating driving and detection already in the mechanics, but requires the corresponding area. Typically, the pure drive train, including the typical comb fingers, takes up approximately of the core surface of a rotation rate sensor.
(9) By way of example, springs 27 are of a spring type D, which differs from the spring types A-C in that the spring of spring type D is deformable in 2 directions, that is, in the driving direction and detection direction.
(10) A schematic view of an enlarged subsection of a rotation rate sensor 1 according to a second exemplary embodiment of the present invention is represented in
(11) In addition, a first change in capacitance between adjacent first electrodes 17 and second electrodes 19 and/or a second change in capacitance between adjacent first electrodes 17 and third electrodes 21 are measurable in such a manner, that the force applied to structure 5 is detectable with the aid of the first change in capacitance and/or with the aid of the second change in capacitance. Therefore, during the driving, besides the applied DC voltage, a change in capacitance between electrodes CM.Math.C1 and CM.Math.C2 is measured. Through this, it is possible, during the driving, to use first electrodes 17, second electrodes 19 and third electrodes 21 for the detection, as well, thus, for example, for a deflection perpendicular to the electrode direction. Apart from the applied DC voltage, the measuring of the first change in capacitance and of the second change in capacitance during the driving is rendered possible, for example, using a temporally very brief superposition with respect to the applied DC signal or a multiplexing. In multiplexing, the voltage for driving is temporarily removed, in order to measure the changes in capacitance in detection direction 13, between the electrodes.
(12) A schematic view of a rotation rate sensor 1 according to a third exemplary embodiment of the present invention is shown in
(13) By way of example,
(14) The mechanically coupled and substantially specularly symmetric substructures 23, 25, i.e., coupled partial oscillators, which are represented in
(15) The moving comb electrode 9 and stationary comb electrode 11 depicted in
(16) By way of example, the exemplary embodiments represented here describe omega-z rotation rate sensors, which allow a considerable reduction in the core surface. However, the use of the features represented here is also intended for other rotation rate sensors.