LIQUID-CRYSTAL MEDIUM

Abstract

Liquid-crystalline (LC) media having positive dielectric anisotropy and liquid-crystal displays (LCDs) containing these media, especially displays addressed by an active matrix and in particular LC displays of the TN, PS-TN, STN, TN-TFT, OCB, IPS, PS-IPS, FFS, HB-FFS PS-FFS, SA-HB-FFS, polymer stabilised SA-HB-FFS, positive VA or positive PS-VA type.

Claims

1. A liquid-crystal medium comprising: one or more compounds of formula I ##STR00483## in which R.sup.11 and R.sup.12 identically or differently, denote H, an alkyl or alkoxy radical having 1 to 15 C atoms, in which one or more CH.sub.2 groups in these radicals are optionally replaced, independently of one another, by CC, CF.sub.2O, OCF.sub.2, CHCH, O, ##STR00484## O, COOor OCO in such a way that O atoms are not linked directly to one another, and in which one or more H atoms may be replaced by halogen, and one or more compounds selected from the group of compounds of the formulae II and III ##STR00485## in which R.sup.2 and R.sup.3 independently of each other, denote alkyl, alkoxy, fluorinated alkyl or fluorinated alkoxy with 1 to 7 C-atoms, alkenyl, alkenyloxy, alkoxyalkyl or fluorinated alkenyl with 2 to 7 C-atoms, ##STR00486## to ##STR00487## are independently of each other ##STR00488## L.sup.21, L.sup.22, L.sup.31 and L.sup.32 independently of each other, denote H or F, Y.sup.2, Y.sup.3 identically or differently, denote H or CH.sub.3, X.sup.2 and X.sup.3 independently of each other, denote halogen, halogenated alkyl or alkoxy with 1 to 3 C-atoms or halogenated alkenyl or alkenyloxy with 2 or 3 C-atoms, Z.sup.3 denotes CH.sub.2CH.sub.2, CF.sub.2CF.sub.2, COO, trans- CHCH, trans-CFCF, CH.sub.2O or a single bond, and l, m, n and o are, independently of each other, 0 or 1.

2. The liquid-crystal medium according to claim 1, wherein the medium comprises one or more compounds of formula II selected from the group of compounds of formulae II-1, II-2 and II-3 ##STR00489## in which L.sup.23 and L.sup.24, identically or differently, denote H or F and the other occurring groups have the meanings defined in claim 1.

3. The liquid-crystal medium according to claim 1, wherein the medium comprises one or more compounds of formula III selected from the group of compounds of the formulae III-1 and III-2 ##STR00490## in which the occurring groups and parameters have the meanings given in claim 1.

4. The liquid-crystal medium according to claim 1, wherein the medium comprises one or more compounds selected from the group of compounds of the formulae II-1a to II-1h ##STR00491## in which L.sup.23 and L.sup.24, identically or differently, denote H or F and the other occurring groups have the meanings given in claim 1.

5. The liquid-crystal medium according to claim 1, wherein the medium comprises one or more compounds selected from the group of compounds of the formulae Y and B ##STR00492## in which ##STR00493## and ##STR00494## identically or differently, denote ##STR00495## R.sup.1, R.sup.2 identically or differently, denote a straight-chain, branched or cyclic alkyl or alkoxy radical that is unsubstituted or halogenated and has 1 to 15 C atoms, where, in addition, one or more CH.sub.2 groups in these radicals may each be replaced, independently of one another, by CC, CF.sub.2O, CHCH, ##STR00496## O, COOor OCO in such a way that O atoms are not linked directly to one another, Z.sup.x, Z.sup.y identically or differently, denote CH.sub.2CH.sub.2, CHCH, CF.sub.2O, OCF.sub.2, CH.sub.2O, OCH.sub.2, COO, OCO, C.sub.2F.sub.4, CFCF, CHCHCH.sub.2O, or a single bond, W denotes O or S, L.sup.1, L.sup.2 identically or differently, denote H, F or Cl, L.sup.3, L.sup.4 identically or differently, denote H, F or Cl, x, y identically or differently, are 0, 1 or 2, with x+y3, wherein the compounds of formula Y contain at least one substituent L.sup.1-4 that is F or Cl.

6. The liquid-crystal medium according to claim 5, wherein the medium comprises one or more compounds selected from the group of compounds of the formulae Y1, Y2 and LY ##STR00497## in which R.sup.1, R.sup.2, Z.sup.x, Z.sup.y, L.sup.1, L.sup.2 have the meanings given in claim 5 for formula Y, a, b and x identically or differently, are 1 or 2, ##STR00498## denotes ##STR00499## in which L.sup.3 and L.sup.4 , identically or differently, denote F or Cl, ##STR00500## denotes ##STR00501## and in case x is 2 one group ##STR00502## alternatively denotes ##STR00503##

7. The liquid-crystal medium according to claim 1, wherein the medium additionally comprises one or more compounds of formula IV ##STR00504## in which R.sup.41 and R.sup.42 independently of each other, denote alkyl, alkoxy, fluorinated alkyl or fluorinated alkoxy with 1 to 7 C-atoms, or alkenyl, alkenyloxy, alkoxyalkyl or fluorinated alkenyl with 2 to 7 C-atoms, ##STR00505## and ##STR00506## on each occurrence, identically or differently, denote ##STR00507## Z.sup.41, Z.sup.42 on each occurrence, identically or differently, denote CH.sub.2CH.sub.2, COO, trans- CHCH, trans- CFCF, CH.sub.2O, CF.sub.2O, CC or a single bond, and p is 0, 1 or 2.

8. The liquid-crystal medium according to claim 1, wherein the medium additionally comprises one or more compounds of formula IV-1 and one or more compounds of formula IV-4 ##STR00508## in which R.sup.41 and R.sup.42 independently of each other, denote alkyl, alkoxy, fluorinated alkyl or fluorinated alkoxy with 1 to 7 C-atoms, or alkenyl, alkenyloxy, alkoxyalkyl or fluorinated alkenyl with 2 to 7 C-atoms.

9. The liquid-crystal medium according to claim 1, wherein the medium comprises one or more compounds selected from the group of compounds of formulae III-2a to III-2I ##STR00509## ##STR00510## in which L.sup.33, L.sup.34, L.sup.35 and L.sup.36, independently of one another, denote H or F and the other occurring groups have the meanings given in claim 1 .

10. The liquid-crystal medium according to claim 1, wherein the medium has a dielectric anisotropy in the range of from +2.0 to +5.0.

11. A process for the preparation of the liquid-crystalline medium according to claim 1, comprising mixing one or more compounds of the formula I with one or more compounds of the formula II or one or more compounds of the formulae III.

12. An electro-optical device comprising the liquid-crystalline medium according to claim 1 .

13. An electro-optical device according to claim 12, wherein the device is a shutter glass, an LC window, a 3D application, or a TN, PS-TN, STN, TN-TFT, OCB, IPS, PS-IPS, FFS, HB-FFS, PS-HB-FFS, SA-HB-FFS, polymer stabilised SA-HB-FFS, positive VA or positive PS-VA display.

14. A liquid-crystal display containing a liquid-crystal medium according to claim 1.

15. The liquid-crystal display according to claim 14, wherein the display is a TN, PS-TN, STN, TN-TFT, OCB, IPS, PS-IPS, FFS, HB-FFS, PS-HB-FFS, SA-HB-FFS, polymer stabilised SA-HB-FFS, positive VA or positive PS-VA display.

16. A process for the preparation of the liquid-crystalline medium according to claim 5, comprising mixing one or more compounds of the formula I with one or more compounds of the formula II and/or one or more compounds of the formulae III and with one or more compounds of the formula Y and/or one or more compounds of the formulae B.

Description

EXAMPLES

[0336] The nematic mixtures N-1 to N-48 are prepared as follows:

TABLE-US-00009 Mixture N-1 APUQU-3-F 8.0% Clearing point [ C.]: 79.0 PGUQU-3-F 6.0% n (589 nm, 20 C.): 0.0989 PGUQU-5-F 5.0% n.sub.e (589 nm, 20 C.): 1.5818 PPGU-3-F 0.5% (1 kHz, 20 C.): 4.3 CCP-V-1 6.5% .sub. (1 kHz, 20 C.): 3.9 CLP-3-T 1.0% K.sub.1 [pN], (20 C.): 13.9 COB(S)-2-O4 11.0% K.sub.3 [pN], (20 C.): 15.4 CC-3-V 52.0% .sub.1 [mPa .Math. s] (20 C.): 62 CC-3-V1 7.0% PP-1-2V1 3.0% 100.0% VHR (60 C., 1 Hz, 1 V, on polyimide SE-6414) = 93.3%

TABLE-US-00010 Mixture N-2 DGUQU-4-F 2.0% Clearing point [ C.]: 79.5 PPGU-3-F 0.5% n (589 nm, 20 C.): 0.0998 CCP-V-1 10.5% n.sub.e (589 nm, 20 C.): 1.5857 CCY-3-O2 8.0% (1 kHz, 20 C.): 2.2 PGP-2-2V 5.5% .sub. (1 kHz, 20 C.): 4.1 PGU-2-F 7.0% K.sub.1 [pN], (20 C.): 13.3 PUQU-2-F 5.0% K.sub.3 [pN], (20 C.): 15.4 CC-3-V 50.0% .sub.1 [mPa .Math. s] (20 C.): 57 CC-3-V1 3.5% LTS.sub.bulk (20 C.) [h]: 336 COB(S)-2-O4 8.0% 100.0% VHR (60 C., 1 Hz, 1 V, on polyimide SE-6414) = 95.3% VHR (60 C., 1 Hz, 1 V, on polyimide RB-001) = 99.1%

TABLE-US-00011 Mixture N-3 CC-3-V 33.5% Clearing point [ C.]: 87.5 CC-3-V1 8.0% n (589 nm, 20 C.): 0.0998 CC-3-2V1 11.0% n.sub.e (589 nm, 20 C.): 1.5857 CCP-V-1 10.0% (1 kHz, 20 C.): 2.7 CCP-V2-1 5.0% .sub. (1 kHz, 20 C.): 3.6 APUQU-2-F 5.0% K.sub.1 [pN], (20 C.): 17.2 APUQU-3-F 5.0% K.sub.3 [pN], (20 C.): 17.5 PP-1-2V1 9.0% .sub.1 [mPa .Math. s] (20 C.): 70 PPGU-3-F 0.5% LTS.sub.bulk (20 C.) [h]: 984 COB(S)-2-O4 8.0% CDUQU-3-F 3.0% COB(S)-2-O5 2.0% 100.0%

TABLE-US-00012 Mixture N-4 CC-3-V 33.5% Clearing point [ C.]: 88.0 CC-3-V1 8.0% n (589 nm, 20 C.): 0.1008 CC-3-2V1 9.0% n.sub.e (589 nm, 20 C.): 1.5868 CCP-V-1 9.5% (1 kHz, 20 C.): 3.4 CCP-V2-1 5.0% .sub. (1 kHz, 20 C.): 3.7 APUQU-2-F 5.0% K.sub.1 [pN], (20 C.): 17.1 APUQU-3-F 5.0% K.sub.3 [pN], (20 C.): 17.3 PP-1-2V1 9.0% .sub.1 [mPa .Math. s] (20 C.): 74 PPGU-3-F 0.5% COB(S)-2-O4 8.0% CDUQU-3-F 5.5% COB(S)-2-O5 2.0% 100.0%

TABLE-US-00013 Mixture N-5 CC-3-V 33.5% Clearing point [ C.]: 87.0 CC-3-V1 8.5% n (589 nm, 20 C.): 0.1003 CC-3-2V1 10.0% n.sub.e (589 nm, 20 C.): 1.5845 CCP-V-1 4.0% (1 kHz, 20 C.): 3.6 CCP-V2-1 5.0% .sub. (1 kHz, 20 C.): 3.7 APUQU-2-F 4.0% K.sub.1 [pN], (20 C.): 18.4 APUQU-3-F 4.5% K.sub.3 [pN], (20 C.): 14.9 PP-1-2V1 9.0% .sub.1 [mPa .Math. s] (20 C.): 76 PPGU-3-F 0.5% COB(S)-2-O4 8.0% CDUQU-3-F 6.0% COB(S)-2-O5 2.0% CLP-3-T 5.0% 100.0%

TABLE-US-00014 Mixture N-6 CC-3-V 37.0% Clearing point [ C.]: 81.0 CC-3-V1 8.5% n (589 nm, 20 C.): 0.1003 CC-3-2V1 9.0% n.sub.e (589 nm, 20 C.): 1.5840 CCP-V-1 1.0% (1 kHz, 20 C.): 3.5 CCP-V2-1 3.5% .sub. (1 kHz, 20 C.): 3.7 APUQU-2-F 4.0% K.sub.1 [pN], (20 C.): 17.6 APUQU-3-F 5.5% K.sub.3 [pN], (20 C.): 16.7 PP-1-2V1 11.0% .sub.1 [mPa .Math. s] (20 C.): 67 PPGU-3-F 0.5% LTS.sub.bulk (20 C.) [h]: 192 COB(S)-2-O4 8.0% CDUQU-3-F 5.0% COB(S)-2-O5 2.0% CLP-3-T 5.0% 100.0%

TABLE-US-00015 Mixture N-7 APUQU-3-F 5.0% Clearing point [ C.]: 80.0 PGUQU-3-F 7.0% n (589 nm, 20 C.): 0.1018 PGUQU-5-F 7.0% n.sub.e (589 nm, 20 C.): 1.5874 PPGU-3-F 0.5% (1 kHz, 20 C.): 4.6 CCP-V-1 14.0% .sub. (1 kHz, 20 C.): 3.5 CLP-3-T 1.0% K.sub.1 [pN], (20 C.): 13.6 COB(S)-2-O4 7.0% K.sub.3 [pN], (20 C.): 15.4 CC-3-V 52.0% .sub.1 [mPa .Math. s] (20 C.): 60 CC-3-V1 1.5% LTS.sub.bulk (20 C.) [h]: 1000 PP-1-2V1 5.0% 100.0%

TABLE-US-00016 Mixture N-8 APUQU-3-F 6.0% Clearing point [ C.]: 80.0 PGUQU-3-F 6.0% n (589 nm, 20 C.): 0.0984 PGUQU-5-F 6.0% n.sub.e (589 nm, 20 C.): 1.5828 PPGU-3-F 0.5% (1 kHz, 20 C.): 4.1 CCP-V-1 11.0% .sub. (1 kHz, 20 C.): 3.7 CLP-3-T 1.0% K.sub.1 [pN], (20 C.): 13.4 COB(S)-2-O4 10.0% K.sub.3 [pN], (20 C.): 14.9 CC-3-V 56.5% .sub.1 [mPa .Math. s] (20 C.): 60 PP-1-2V1 3.0% 100.0%

TABLE-US-00017 Mixture N-9 CC-3-V 49.5% Clearing point [ C.]: 80.5 CCP-V-1 6.0% n (589 nm, 20 C.): 0.0993 PGP-2-2V 4.0% n.sub.e (589 nm, 20 C.): 1.5836 PUQU-3-F 11.0% (1 kHz, 20 C.): 2.4 CCGU-3-F 6.0% .sub. (1 kHz, 20 C.): 4.1 PPGU-3-F 0.5% K.sub.1 [pN], (20 C.): 13.4 CPY-3-O2 9.0% K.sub.3 [pN], (20 C.): 14.8 COB(S)-2-O4 8.0% .sub.1 [mPa .Math. s] (20 C.): 61 CC-3-V1 6.0% 100.0%

TABLE-US-00018 Mixture N-10 DGUQU-4-F 2.0% Clearing point [ C.]: 79.5 PPGU-3-F 0.5% n (589 nm, 20 C.): 0.0998 CCP-V-1 10.5% n.sub.e (589 nm, 20 C.): 1.5849 CCY-3-O2 8.0% (1 kHz, 20 C.): 2.4 PGP-2-2V 5.5% .sub. (1 kHz, 20 C.): 4.3 PGU-2-F 7.0% K.sub.1 [pN], (20 C.): 13.3 PUQU-2-F 5.0% K.sub.3 [pN], (20 C.): 14.4 CC-3-V 50.0% .sub.1 [mPa .Math. s] (20 C.): 57 CC-3-V1 3.5% LTS.sub.bulk (20 C.) [h]: 336 COB(S)-2-O4 8.0% 100.0%

TABLE-US-00019 Mixture N-11 DGUQU-4-F 3.0% Clearing point [ C.]: 79.5 PPGU-3-F 0.5% n (589 nm, 20 C.): 0.0993 CCP-V-1 8.5% n.sub.e (589 nm, 20 C.): 1.5849 CCY-3-O2 9.5% (1 kHz, 20 C.): 2.4 PGP-2-2V 4.5% .sub. (1 kHz, 20 C.): 4.3 PGU-2-F 7.0% K.sub.1 [pN], (20 C.): 13.2 PUQU-2-F 5.0% K.sub.3 [pN], (20 C.): 14.2 CC-3-V 50.0% .sub.1 [mPa .Math. s] (20 C.): 61 CC-3-V1 3.5% COB(S)-2-O4 8.5% 100.0%

TABLE-US-00020 Mixture N-12 CC-3-V 34.0% Clearing point [ C.]: 91.5 CC-3-V1 12.0% n (589 nm, 20 C.): 0.0990 CC-3-2V1 8.0% n.sub.e (589 nm, 20 C.): 1.5835 CCP-V-1 10.0% (1 kHz, 20 C.): 4.1 CCP-V2-1 5.0% .sub. (1 kHz, 20 C.): 3.5 PGP-2-2V 3.0% K.sub.1 [pN], (20 C.): 16.8 APUQU-2-F 7.5% K.sub.3 [pN], (20 C.): 17.9 APUQU-3-F 7.0% .sub.1 [mPa .Math. s] (20 C.): 72 PP-1-2V1 3.5% LTS.sub.bulk (20 C.) [h]: 504 PPGU-3-F 0.5% COB(S)-2-O4 7.0% CDUQU-3-F 2.5% 100.0%

TABLE-US-00021 Mixture N-13 CC-3-V 33.5% Clearing point [ C.]: 86 CC-3-V1 8.0% n (589 nm, 20 C.): 0.0993 CC-3-2V1 11.0% n.sub.e (589 nm, 20 C.): 1.5843 CCP-V-1 10.0% (1 kHz, 20 C.): 3.7 CCP-V2-1 5.0% .sub. (1 kHz, 20 C.): 3.4 APUQU-2-F 6.0% K.sub.1 [pN], (20 C.): 16.7 APUQU-3-F 7.0% K.sub.3 [pN], (20 C.): 17.4 PP-1-2V1 9.0% .sub.1 [mPa .Math. s] (20 C.): 68 PPGU-3-F 0.5% LTS.sub.bulk (20 C.) [h]: 912 COB(S)-2-O4 7.0% CDUQU-3-F 3.0% 100.0%

TABLE-US-00022 Mixture N-14 CC-3-V 33.5% Clearing point [ C.]: 90 CC-3-V1 8.0% n (589 nm, 20 C.): 0.0968 CC-3-2V1 11.0% n.sub.e (589 nm, 20 C.): 1.5805 CCP-V-1 10.0% (1 kHz, 20 C.): 4.0 CCP-V2-1 5.0% .sub. (1 kHz, 20 C.): 3.4 APUQU-2-F 6.0% K.sub.1 [pN], (20 C.): 18.0 APUQU-3-F 7.0% K.sub.3 [pN], (20 C.): 18.5 PP-1-2V1 9.0% .sub.1 [mPa .Math. s] (20 C.): 73 PPGU-3-F 0.5% LTS.sub.bulk (20 C.) [h]: 1000 COB(S)-2-O4 7.0% CDUQU-3-F 3.0% CLP-3-T 5.0% 100.0%

TABLE-US-00023 Mixture N-15 CC-3-V 33.5% Clearing point [ C.]: 90 CC-3-V1 8.0% n (589 nm, 20 C.): 0.0984 CC-3-2V1 11.0% n.sub.e (589 nm, 20 C.): 1.5825 CCP-V-1 10.5% (1 kHz, 20 C.): 4.0 APUQU-2-F 6.0% .sub. (1 kHz, 20 C.): 3.4 APUQU-3-F 6.0% K.sub.1 [pN], (20 C.): 18.2 PP-1-2V1 6.0% K.sub.3 [pN], (20 C.): 18.3 PPGU-3-F 0.5% .sub.1 [mPa .Math. s] (20 C.): 73 COB(S)-2-O4 7.0% LTS.sub.bulk (20 C.) [h]: 1000 CDUQU-3-F 3.0% CLP-3-T 5.0% CLP-V-1 3.5% 100.0%

TABLE-US-00024 Mixture N-16 DGUQU-4-F 3.0% Clearing point [ C.]: 79 PPGU-3-F 0.5% n (589 nm, 20 C.): 0.0994 CCP-V-1 9.5% n.sub.e (589 nm, 20 C.): 1.5854 CLY-2-O4 3.0% (1 kHz, 20 C.): 2.5 CLY-3-O2 4.0% .sub. (1 kHz, 20 C.): 4.2 CLY-3-O3 4.0% K.sub.1 [pN], (20 C.): 13.4 PGP-2-2V 4.0% K.sub.3 [pN], (20 C.): 14.2 PGU-2-F 7.0% .sub.1 [mPa .Math. s] (20 C.): 61 PUQU-2-F 5.0% CC-3-V 49.5% CC-3-V1 3.5% COB(S)-2-O4 7.0% 100.0%

TABLE-US-00025 Mixture N-17 CDUQU-3-F 6.0 Clearing point [ C.]: 79.6 PGUQU-3-F 5.0 n [589 nm, 20 C.]: 0.1010 PGUQU-4-F 4.0 n.sub.e [589 nm, 20 C.]: 1.5863 PPGU-3-F 0.5 n.sub.o [589 nm, 20 C.]: 1.4853 CC-3-V 44.0 [1 kHz, 20 C.]: 2.3 CCP-V-1 12.5 .sub. [1 kHz, 20 C.]: 7.6 CCVC-3-V 2.0 .sub. [1 kHz, 20 C.]: 5.3 PP-1-2V1 3.0 K.sub.1 [pN] (20 C.): 13.3 COB(S)-2-O4 10.0 K.sub.3 [pN] (20 C.): 15.2 B(S)-2O-O4 4.0 CY-3-O2 9.0 100.0

TABLE-US-00026 Mixture N-18 CDUQU-3-F 5.5 Clearing point [ C.]: 79.4 PGUQU-3-F 5.0 n [589 nm, 20 C.]: 0.1007 PGUQU-4-F 4.0 n.sub.e [589 nm, 20 C.]: 1.5860 PPGU-3-F 0.5 n.sub.o [589 nm, 20 C.]: 1.4853 CC-3-V 43.0 [1 kHz, 20 C.]: 2.3 CCP-V-1 13.5 .sub. [1 kHz, 20 C.]: 7.4 CCVC-3-V 4.0 .sub. [1 kHz, 20 C.]: 5.2 COB(S)-2-O4 10.0 K.sub.1 [pN] (20 C.): 12.9 PY-3-O2 10.0 K.sub.3 [pN] (20 C.): 15.1 CY-3-O2 4.5 100.0

TABLE-US-00027 Mixture N-19 APUQU-3-F 8.0 Clearing point [ C.]: 79 PGUQU-3-F 6.0 n [589 nm, 20 C.]: 0.0989 PGUQU-5-F 5.0 n.sub.e [589 nm, 20 C.]: 1.5818 PPGU-3-F 0.5 n.sub.o [589 nm, 20 C.]: 1.4829 CCP-V-1 6.5 [1 kHz, 20 C.]: 4.3 CLP-3-T 1.0 .sub. [1 kHz, 20 C.]: 8.2 COB(S)-2-O4 11.0 .sub. [1 kHz, 20 C.]: 3.9 CC-3-V 52.0 .sub.1 [mPa s] (20 C.): 62 CC-3-V1 7.0 K.sub.1 [pN] (20 C.): 13.9 PP-1-2V1 3.0 K.sub.3 [pN] (20 C.): 15.4 100.0

TABLE-US-00028 Mixture N-20 CC-3-V 49.5 Clearing point [ C.]: 80 CCP-V-1 4.0 n [589 nm, 20 C.]: 0.0992 PGP-2-2V 3.0 n.sub.e [589 nm, 20 C.]: 1.5828 PUQU-3-F 11.0 n.sub.o [589 nm, 20 C.]: 1.4836 CCGU-3-F 6.0 [1 kHz, 20 C.]: 2.3 PPGU-3-F 0.5 .sub. [1 kHz, 20 C.]: 6.5 CPY-2-O2 3.0 .sub. [1 kHz, 20 C.]: 4.3 CPY-3-O2 10.0 .sub.1 [mPa s] (20 C.): 63 COB(S)-2-O4 7.0 K.sub.1 [pN] (20 C.): 13.3 CC-3-V1 6.0 K.sub.3 [pN] (20 C.): 14.7 100.0

TABLE-US-00029 Mixture N-21 CC-3-V 49.5 Clearing point [ C.]: 77.5 CCP-V-1 5.5 n [589 nm, 20 C.]: 0.0994 PGP-2-2V 1.5 n.sub.e [589 nm, 20 C.]: 1.5828 PUQU-3-F 9.0 n.sub.o [589 nm, 20 C.]: 1.4834 CDUQU-3-F 6.5 [1 kHz, 20 C.]: 2.0 PPGU-3-F 0.5 .sub. [1 kHz, 20 C.]: 7.4 CPY-2-O2 3.0 .sub. [1 kHz, 20 C.]: 5.5 CPY-3-O2 10.0 .sub.1 [mPa s] (20 C.): 67 COB(S)-2-O4 12.5 K.sub.1 [pN] (20 C.): 12.9 Y-4O-O4 2.0 K.sub.3 [pN] (20 C.): 13.9 100.0

TABLE-US-00030 Mixture N-22 APUQU-2-F 5.0 Clearing point [ C.]: 85 APUQU-3-F 5.0 n [589 nm, 20 C.]: 0.1243 PGUQU-3-F 4.5 n.sub.e [589 nm, 20 C.]: 1.6138 PGUQU-4-F 4.0 n.sub.o [589 nm, 20 C.]: 1.4895 PGUQU-5-F 3.0 [1 kHz, 20 C.]: 5.7 PPGU-3-F 0.5 .sub. [1 kHz, 20 C.]: 9.4 CCP-V-1 3.5 .sub. [1 kHz, 20 C.]: 3.7 PGP-1-2V 5.0 .sub.1 [mPa s] (20 C.): 69 PGP-2-2V 7.0 K.sub.1 [pN] (20 C.): 14.8 PGP-3-2V 2.0 K.sub.3 [pN] (20 C.): 14.9 CC-3-V 43.0 CC-3-V1 8.0 PP-1-2V1 3.0 COB(S)-2-O4 6.5 100.0

TABLE-US-00031 Mixture N-23 CC-3-V 40.0 Clearing point [ C.]: 79.5 CCP-V-1 15.0 n [589 nm, 20 C.]: 0.0986 COB(S)-2-O4 12.0 n.sub.e [589 nm, 20 C.]: 1.5835 CPY-3-O2 8.5 n.sub.o [589 nm, 20 C.]: 1.4849 CY-3-O2 11.0 [1 kHz, 20 C.]: 1.9 DGUQU-2-F 5.0 .sub. [1 kHz, 20 C.]: 7.9 DGUQU-4-F 3.5 .sub. [1 kHz, 20 C.]: 6.0 PPGU-3-F 0.5 PUQU-3-F 4.5 100.0

TABLE-US-00032 Mixture N-24 DGUQU-2-F 1.5 Clearing point [ C.]: 84.5 DGUQU-4-F 4.0 n [589 nm, 20 C.]: 0.1242 DPGU-4-F 4.0 n.sub.e [589 nm, 20 C.]: 1.6142 PGUQU-3-F 3.0 n.sub.o [589 nm, 20 C.]: 1.4900 PGUQU-4-F 3.0 [1 kHz, 20 C.]: 5.3 PGUQU-5-F 2.0 .sub. [1 kHz, 20 C.]: 9.0 PPGU-3-F 0.5 .sub. [1 kHz, 20 C.]: 3.8 PGP-1-2V 7.0 .sub.1 [mPa s] (20 C.): 67 PGP-2-2V 7.0 K.sub.1 [pN] (20 C.): 15.0 PGP-3-2V 4.0 K.sub.3 [pN] (20 C.): 13.7 CC-3-V 50.0 PP-1-2V1 2.0 CCS-3-T 6.0 COB(S)-2-O4 6.0 100.0

TABLE-US-00033 Mixture N-25 CC-3-V 46.5 Clearing point [ C.]: 77.5 COB(S)-2-O4 12.0 n [589 nm, 20 C.]: 0.0998 CPY-3-O2 12.0 n.sub.e [589 nm, 20 C.]: 1.5818 CY-3-O2 9.0 n.sub.o [589 nm, 20 C.]: 1.4820 DGUQU-2-F 4.0 [1 kHz, 20 C.]: 1.9 DGUQU-4-F 6.0 .sub. [1 kHz, 20 C.]: 7.9 PPGU-3-F 0.5 .sub. [1 kHz, 20 C.]: 6.0 CLP-3-T 8.0 .sub.1 [mPa s] (20 C.): 90 PP-1-2V1 2.0 K.sub.1 [pN] (20 C.): 13.8 100.0 K.sub.3 [pN] (20 C.): 15.2

TABLE-US-00034 Mixture N-26 CC-3-V 49.5 Clearing point [ C.]: 80.5 CCP-V-1 6.0 n [589 nm, 20 C.]: 0.0996 PGP-2-2V 1.0 n.sub.e [589 nm, 20 C.]: 1.5829 PUQU-3-F 9.0 n.sub.o [589 nm, 20 C.]: 1.4833 CDUQU-3-F 7.5 [1 kHz, 20 C.]: 2.3 PPGU-3-F 0.5 .sub. [1 kHz, 20 C.]: 7.7 CPY-2-O2 3.0 .sub. [1 kHz, 20 C.]: 5.3 CPY-3-O2 10.0 .sub.1 [mPa s] (20 C.): 70 COB(S)-2-O4 12.5 K.sub.1 [pN] (20 C.): 13.3 Y-4O-O4 1.0 K.sub.3 [pN] (20 C.): 14.2 100.0

TABLE-US-00035 Mixture N-27 CC-3-V 52.0 Clearing point [ C.]: 80 CCP-V-1 3.0 n [589 nm, 20 C.]: 0.0993 PGP-2-2V 1.0 n.sub.e [589 nm, 20 C.]: 1.5821 PUQU-3-F 9.5 n.sub.o [589 nm, 20 C.]: 1.4828 CDUQU-3-F 7.5 [1 kHz, 20 C.]: 2.4 PPGU-3-F 0.5 .sub. [1 kHz, 20 C.]: 7.7 CPY-2-O2 3.0 .sub. [1 kHz, 20 C.]: 5.3 CPY-3-O2 10.0 .sub.1 [mPa s] (20 C.): 70 COB(S)-2-O4 13.5 K.sub.1 [pN] (20 C.): 13.3 100.0 K.sub.3 [pN] (20 C.): 14.1

TABLE-US-00036 Mixture N-28 DGUQU-2-F 1.5 Clearing point [ C.]: 84.5 DGUQU-4-F 4.0 n [589 nm, 20 C.]: 0.1254 DPGU-4-F 4.0 n.sub.e [589 nm, 20 C.]: 1.6160 PGUQU-3-F 3.0 n.sub.o [589 nm, 20 C.]: 1.4906 PGUQU-4-F 3.5 [1 kHz, 20 C.]: 5.7 PGUQU-5-F 2.0 .sub. [1 kHz, 20 C.]: 9.0 PPGU-3-F 0.5 .sub. [1 kHz, 20 C.]: 3.4 CCVC-3-V 3.5 .sub.1 [mPa s] (20 C.): 65 PGP-1-2V 6.5 K.sub.1 [pN] (20 C.): 15.2 PGP-2-2V 7.0 K.sub.3 [pN] (20 C.): 14.5 PGP-3-2V 3.5 COB(S)-2-O4 2.5 CC-3-V 47.0 PP-1-2V1 6.0 CCS-3-T 5.5 100.0

TABLE-US-00037 Mixture N-29 CC-3-V 49.5 Clearing point [ C.]: 80 CCP-V-1 6.0 n [589 nm, 20 C.]: 0.0991 PGP-2-2V 1.0 n.sub.e [589 nm, 20 C.]: 1.5824 PUQU-3-F 9.0 n.sub.o [589 nm, 20 C.]: 1.4833 CDUQU-3-F 7.5 [1 kHz, 20 C.]: 2.4 PPGU-3-F 0.5 .sub. [1 kHz, 20 C.]: 7.7 CPY-2-O2 3.0 .sub. [1 kHz, 20 C.]: 5.3 CPY-3-O2 10.0 .sub.1 [mPa s] (20 C.): 71 COB(S)-2-O4 6.5 K.sub.1 [pN] (20 C.): 13.4 COB(S)-2-O5 6.0 K.sub.3 [pN] (20 C.): 14.3 Y-4O-O4 1.0 100.0

TABLE-US-00038 Mixture N-30 CC-3-V 49.5 Clearing point [ C.]: 81 CCP-V-1 6.0 n [589 nm, 20 C.]: 0.1001 PGP-2-2V 1.0 n.sub.e [589 nm, 20 C.]: 1.5836 PUQU-3-F 9.0 n.sub.o [589 nm, 20 C.]: 1.4835 CDUQU-3-F 7.5 [1 kHz, 20 C.]: 2.3 PPGU-3-F 0.5 .sub. [1 kHz, 20 C.]: 7.7 CPY-2-O2 3.0 .sub. [1 kHz, 20 C.]: 5.4 CPY-3-O2 10.0 .sub.1 [mPa s] (20 C.): 70 COB(S)-2-O4 6.5 K.sub.1 [pN] (20 C.): 13.4 COB(S)-V-O4 6.0 K.sub.3 [pN] (20 C.): 14.4 Y-4O-O4 1.0 100.0

TABLE-US-00039 Mixture N-31 CC-3-V 49.5 Clearing point [ C.]: 79 CCP-V-1 6.0 n [589 nm, 20 C.]: 0.0995 PGP-2-2V 1.0 n.sub.e [589 nm, 20 C.]: 1.5834 PUQU-3-F 9.0 n.sub.o [589 nm, 20 C.]: 1.4839 CDUQU-3-F 7.5 [1 kHz, 20 C.]: 2.5 PPGU-3-F 0.5 .sub. [1 kHz, 20 C.]: 7.6 CPY-2-O2 3.0 .sub. [1 kHz, 20 C.]: 5.2 CPY-3-O2 10.0 .sub.1 [mPa s] (20 C.): 69 COB(S)-2-O4 6.5 K.sub.1 [pN] (20 C.): 13.3 C0B(S)-2-1 6.0 K.sub.3 [pN] (20 C.): 14.1 Y-4O-O4 1.0 100.0

TABLE-US-00040 Mixture N-32 CC-3-V 50.0 Clearing point [ C.]: 78.5 CCP-V-1 7.5 n [589 nm, 20 C.]: 0.0996 PGP-2-2V 3.0 n.sub.e [589 nm, 20 C.]: 1.5842 PUQU-3-F 9.0 n.sub.o [589 nm, 20 C.]: 1.4846 CDUQU-3-F 7.0 [1 kHz, 20 C.]: 2.2 PPGU-3-F 0.5 .sub. [1 kHz, 20 C.]: 7.6 CPY-3-O2 1.5 .sub. [1 kHz, 20 C.]: 5.4 COB(S)-2-O4 10.0 .sub.1 [mPa s] (20 C.): 69 COB(S)-2-O5 10.0 K.sub.1 [pN] (20 C.): 13.4 Y-4O-O4 1.5 K.sub.3 [pN] (20 C.): 13.3 100.0

TABLE-US-00041 Mixture N-33 CC-3-V 50.0 Clearing point [ C.]: 78 CCP-V-1 8.5 n [589 nm, 20 C.]: 0.0999 PGP-2-2V 3.5 n.sub.e [589 nm, 20 C.]: 1.5848 PUQU-3-F 9.0 n.sub.o [589 nm, 20 C.]: 1.4849 CDUQU-3-F 7.0 [1 kHz, 20 C.]: 2.2 PPGU-3-F 0.5 .sub. [1 kHz, 20 C.]: 7.6 COB(S)-2-O4 10.0 .sub. [1 kHz, 20 C.]: 5.4 COB(S)-V-O4 9.5 .sub.1 [mPa s] (20 C.): 65 Y-4O-O4 2.0 K.sub.1 [pN] (20 C.): 13.3 100.0 K.sub.3 [pN] (20 C.): 13.4

TABLE-US-00042 Mixture N-34 DGUQU-4-F 3.0 Clearing point [ C.]: 79 PPGU-3-F 0.5 n [589 nm, 20 C.]: 0.0994 CCP-V-1 9.5 n.sub.e [589 nm, 20 C.]: 1.5854 CLY-2-O4 3.0 n.sub.o [589 nm, 20 C.]: 1.4860 CLY-3-O2 4.0 [1 kHz, 20 C.]: 2.5 CLY-3-O3 4.0 .sub. [1 kHz, 20 C.]: 6.7 PGP-2-2V 4.0 .sub. [1 kHz, 20 C.]: 4.2 PGU-2-F 7.0 .sub.1 [mPa s] (20 C.): 61 PUQU-2-F 5.0 K.sub.1 [pN] (20 C.): 13.4 CC-3-V 49.5 K.sub.3 [pN] (20 C.): 14.2 CC-3-V1 3.5 COB(S)-2-O4 7.0 100.0

TABLE-US-00043 Mixture N-35 CC-3-V 49.5 Clearing point [ C.]: 81 CCP-V-1 8.0 n [589 nm, 20 C.]: 0.1004 PGP-2-2V 4.0 n.sub.e [589 nm, 20 C.]: 1.5850 PUQU-3-F 7.0 n.sub.o [589 nm, 20 C.]: 1.4846 CDUQU-3-F 9.0 [1 kHz, 20 C.]: 2.4 PPGU-3-F 0.5 .sub. [1 kHz, 20 C.]: 7.6 CPY-3-O2 4.0 .sub. [1 kHz, 20 C.]: 5.3 COB(S)-2-O4 8.0 .sub.1 [mPa s] (20 C.): 67 COB(S)-V-O4 8.0 K.sub.1 [pN] (20 C.): 13.5 Y-4O-O4 2.0 K.sub.3 [pN] (20 C.): 13.9 100.0

TABLE-US-00044 Mixture N-36 CC-3-V 49.5 Clearing point [ C.]: 79.5 CCP-V-1 6.0 n [589 nm, 20 C.]: 0.0990 PUQU-3-F 9.0 n.sub.e [589 nm, 20 C.]: 1.5830 CDUQU-3-F 7.0 n.sub.o [589 nm, 20 C.]: 1.4840 PPGU-3-F 0.5 [1 kHz, 20 C.]: 2.3 CPY-2-O2 3.0 .sub. [1 kHz, 20 C.]: 7.5 CPY-3-O2 10.0 .sub. [1 kHz, 20 C.]: 5.3 COB(S)-2-O4 7.0 .sub.1 [mPa s] (20 C.): 72 C0B(S)-2-1 7.0 K.sub.1 [pN] (20 C.): 13.4 Y-4O-O4 1.0 K.sub.3 [pN] (20 C.): 13.9 100.0

TABLE-US-00045 Mixture N-37 CC-3-V 49.5 Clearing point [ C.]: 80.5 CCP-V-1 5.5 n [589 nm, 20 C.]: 0.0999 PGP-2-2V 1.5 n.sub.e [589 nm, 20 C.]: 1.5831 PUQU-3-F 8.5 n.sub.o [589 nm, 20 C.]: 1.4832 CDUQU-3-F 7.5 [1 kHz, 20 C.]: 2.2 PPGU-3-F 0.5 .sub. [1 kHz, 20 C.]: 7.5 CPY-2-O2 5.5 .sub. [1 kHz, 20 C.]: 5.3 CPY-3-O2 10.0 .sub.1 [mPa s] (20 C.): 70 COB(S)-2-O4 10.5 K.sub.1 [pN] (20 C.): 13.2 Y-4O-O4 1.0 K.sub.3 [pN] (20 C.): 14.3 100.0

TABLE-US-00046 Mixture N- 38 CC-3-V 51.0 Clearing point [ C.]: 81 CCP-V-1 2.5 n [589 nm, 20 C.]: 0.1006 PGP-2-2V 1.0 n.sub.e [589 nm, 20 C.]: 1.5835 PUQU-3-F 8.5 n.sub.o [589 nm, 20 C.]: 1.4829 CDUQU-3-F 8.0 [1 kHz, 20 C.]: 2.3 PPGU-3-F 0.5 .sub. [1 kHz, 20 C.]: 7.6 CPY-2-O2 8.0 .sub. [1 kHz, 20 C.]: 5.3 CPY-3-O2 10.0 .sub.1 [mPa s] (20 C.): 78 COB(S)-2-O4 10.5 K.sub.1 [pN] (20 C.): 13.3 100.0 K.sub.3 [pN] (20 C.): 14.5

TABLE-US-00047 Mixture N-39 B(S)-2O-O4 4.0 Clearing point [ C.]: 79.5 B(S)-2O-O5 4.0 n [589 nm, 20 C.]: 0.0991 CC-3-V 36.0 n.sub.e [589 nm, 20 C.]: 1.5831 CC-V-V1 20.0 n.sub.o [589 nm, 20 C.]: 1.4840 CCP-V-1 3.5 [1 kHz, 20 C.]: 2.1 CDUQU-3-F 5.5 .sub. [1 kHz, 20 C.]: 7.3 CLY-3-O2 5.0 .sub. [1 kHz, 20 C.]: 5.2 COB(S)-2-O4 4.0 .sub.1 [mPa s] (20 C.): 62 CPY-2-O2 8.5 K.sub.1 [pN] (20 C.): 12.7 DGUQU-4-F 3.5 K.sub.3 [pN] (20 C.): 15.1 PGUQU-4-F 5.5 Y-4O-O4 0.5 100.0

TABLE-US-00048 Mixture N-40 B(S)-2O-O4 4.0 Clearing point [ C.]: 82 B(S)-2O-O5 4.0 n [589 nm, 20 C.]: 0.1011 CC-3-V 36.0 n.sub.e [589 nm, 20 C.]: 1.5862 CC-V-V1 20.0 n.sub.o [589 nm, 20 C.]: 1.4851 CCP-V-1 5.0 [1 kHz, 20 C.]: 1.7 CDUQU-3-F 5.0 .sub. [1 kHz, 20 C.]: 7.2 CLY-3-O2 5.0 .sub. [1 kHz, 20 C.]: 5.6 COB(S)-2-O4 5.0 .sub.1 [mPa s] (20 C.): 73 CPY-2-O2 6.5 K.sub.1 [pN] (20 C.): 13.4 DGUQU-4-F 4.0 K.sub.3 [pN] (20 C.): 15.5 PGUQU-4-F 4.5 PY-3-O2 1.0 100.0

TABLE-US-00049 Mixture N-41 B(S)-2O-O4 4.0 Clearing point [ C.]: 70.5 B(S)-2O-O5 4.0 n [589 nm, 20 C.]: 0.0987 CC-2V-V2 20.0 n.sub.e [589 nm, 20 C.]: 1.5818 CC-3-V 38.0 n.sub.o [589 nm, 20 C.]: 1.4831 CCP-V-1 3.0 [1 kHz, 20 C.]: 1.8 CDUQU-3-F 7.5 .sub. [1 kHz, 20 C.]: 7.2 COB(S)-2-O4 5.5 .sub. [1 kHz, 20 C.]: 5.4 CPY-2-O2 4.0 .sub.1 [mPa s] (20 C.): 61 PGUQU-4-F 6.5 K.sub.1 [pN] (20 C.): 13.1 PY-3-O2 7.5 K.sub.3 [pN] (20 C.): 12.4 100.0

TABLE-US-00050 Mixture N-42 B(S)-2O-O4 3.0 Clearing point [ C.]: 80 B(S)-2O-O5 4.0 n [589 nm, 20 C.]: 0.0996 CC-3-V 36.5 n.sub.e [589 nm, 20 C.]: 1.5831 CC-V-V1 20.0 n.sub.o [589 nm, 20 C.]: 1.4835 CCP-V-1 2.5 [1 kHz, 20 C.]: 2.2 CDUQU-3-F 4.0 .sub. [1 kHz, 20 C.]: 7.6 CLY-3-O2 4.0 .sub. [1 kHz, 20 C.]: 5.4 COB(S)-2-O4 5.5 .sub.1 [mPa s] (20 C.): 71 DGUQU-4-F 4.0 K.sub.1 [pN] (20 C.): 13.2 PGUQU-4-F 6.5 K.sub.3 [pN] (20 C.): 15.6 CPY-3-02 8.0 CY-3-O2 2.0 100.0

TABLE-US-00051 Mixture N-43 APUQU-2-F 7.0 Clearing point [ C.]: 77 APUQU-3-F 8.0 n [589 nm, 20 C.]: 0.1007 PPGU-3-F 0.5 n.sub.e [589 nm, 20 C.]: 1.5871 CC-3-V 48.0 n.sub.o [589 nm, 20 C.]: 1.4864 CCP-V-1 12.0 [1 kHz, 20 C.]: 2.3 PP-1-2V1 0.5 .sub. [1 kHz, 20 C.]: 7.6 COB(S)-2-O4 14.0 .sub. [1 kHz, 20 C.]: 5.3 PY-3-O2 10.0 .sub.1 [mPa s, 20 C.]: 79 100.0 K.sub.1 [pN, 20 C.]: 13.1 K.sub.3 [pN, 20 C.]: 13.4

TABLE-US-00052 Mixture N-44 APUQU-2-F 6.5 Clearing point [ C.]: 78.3 APUQU-3-F 8.0 n [589 nm, 20 C.]: 0.1006 PPGU-3-F 0.5 n.sub.e [589 nm, 20 C.]: 1.5872 CC-3-V 40.0 n.sub.o [589 nm, 20 C.]: 1.4866 CCP-V-1 15.5 [1 kHz, 20 C.]: 2.1 CCVC-3-V 3.0 .sub. [1 kHz, 20 C.]: 7.4 PP-1-2V1 1.0 .sub. [1 kHz, 20 C.]: 5.3 COB(S)-2-O4 10.0 .sub.1 [mPa s, 20 C.]: 86 PY-3-O2 10.0 K.sub.1 [pN, 20 C.]: 12.8 CY-3-O2 5.5 K.sub.3 [pN, 20 C.]: 13.9 100.0

TABLE-US-00053 Mixture N-45 CC-3-V 47.0 Clearing point [ C.]: 89.4 CCP-V-1 18.0 n [589 nm, 20 C.]: 0.0998 PP-1-2V1 5.0 n.sub.e [589 nm, 20 C.]: 1.5866 PGP-2-2V 5.0 n.sub.o [589 nm, 20 C.]: 1.4868 CDUQU-3-F 6.0 [1 kHz, 20 C.]: 3.1 APUQU-3-F 8.0 .sub. [1 kHz, 20 C.]: 6.6 PPGU-3-F 0.5 .sub. [1 kHz, 20 C.]: 3.5 CPY-3-O2 2.5 .sub.1 [mPa s, 20 C.]: 72 CCY-5-O2 4.0 K.sub.1 [pN, 20 C.]: 14.7 COB(S)-2-O4 4.0 K.sub.3 [pN, 20 C.]: 17.3 100.0

TABLE-US-00054 Mixture N-46 CC-3-V 42.5 Clearing point [ C.]: 89.6 CC-3-V1 3.0 n [589 nm, 20 C.]: 0.0993 CCP-V-1 16.0 n.sub.e [589 nm, 20 C.]: 1.5865 CCP-V2-1 8.0 n.sub.o [589 nm, 20 C.]: 1.4872 PGP-2-4 4.5 [1 kHz, 20 C.]: 2.8 APUQU-3-F 7.5 .sub. [1 kHz, 20 C.]: 6.5 PGUQU-4-F 6.0 .sub. [1 kHz, 20 C.]: 3.7 PPGU-3-F 0.5 .sub.1 [mPa s, 20 C.]: 78 CY-5-O2 6.0 K.sub.1 [pN, 20 C.]: 14.3 COB(S)-2-O4 6.0 K.sub.3 [pN, 20 C.]: 16.1 100.0

TABLE-US-00055 Mixture N-47 CC-3-V 49.5 Clearing point [ C.]: 79.5 CCP-V-1 4.0 n [589 nm, 20 C.]: 0.0988 PGP-2-2V 3.0 n.sub.e [589 nm, 20 C.]: 1.5825 PUQU-3-F 11.0 n.sub.o [589 nm, 20 C.]: 1.4837 CCGU-3-F 5.0 [1 kHz, 20 C.]: 2.2 PPGU-3-F 0.5 .sub. [1 kHz, 20 C.]: 6.5 CPY-2-O2 3.0 .sub. [1 kHz, 20 C.]: 4.3 CPY-3-O2 10.0 .sub.1 [mPa s, 20 C.]: 64 COB(S)-2-O4 7.0 K.sub.1 [pN, 20 C.]: 13.4 CC-3-V1 6.0 K.sub.3 [pN, 20 C.]: 15.0 CLP-3-T 1.0 100.0

TABLE-US-00056 Mixture N-48 CC-4-V1 23.0 Clearing point [ C.]: 80.5 CC-3-V1 8.0 n [589 nm, 20 C.]: 0.1002 CC-3-2V1 9.0 n.sub.e [589 nm, 20 C.]: 1.5833 CCH-301 6.0 n.sub.o [589 nm, 20 C.]: 1.4831 CCP-3-1 8.0 [1 kHz, 20 C.]: 2.8 PGP-2-3 2.0 .sub. [1 kHz, 20 C.]: 7.2 PGU-2-F 6.5 .sub. [1 kHz, 20 C.]: 4.4 PGU-3-F 8.0 .sub.1 [mPa s, 20 C.]: 90 CCU-3-F 11.0 K.sub.1 [pN, 20 C.]: 16.7 CCY-3-O2 3.0 K.sub.3 [pN, 20 C.]: 14.6 CY-3-O4 10.5 COB(S)-2-O4 5.0 100.0

[0337] The entire disclosure[s] of all applications, patents and publications, cited herein and of corresponding EP Patent Application No. 18211358.9, filed Dec. 10, 2018, are incorporated by reference herein.

[0338] The preceding examples can be repeated with similar success by substituting the generically or specifically described reactants and/or operating conditions of this invention for those used in the preceding examples.

[0339] From the foregoing description, one skilled in the art can easily ascertain the essential characteristics of this invention and, without departing from the spirit and scope thereof, can make various changes and modifications of the invention to adapt it to various usages and conditions.