Polish remover formulations

Abstract

The present invention relates to a polish remover formulation. The present invention more specifically focuses on the use of a blend of glycerol ketals and/or acetals in polish remover formulations, notably for promoting the polish removing performances.

Claims

1. A method for promoting the polish removing performance of a polish remover formulation, comprising including a blend comprising at least two glycerol ketal derivatives of formula I below: ##STR00003## wherein: R1 and R2, independently from one another, are selected in the group consisting of: hydrogen or a linear or branched C1-C12 alkyl, a C4-C12 cycloalkyl or an aryl, and R3 is H, a linear or branched alkyl, a cycloalkyl or a C(O)R4 group, with R4 being a linear or branched C1-C4 alkyl or a C5-C6 cycloalkyl, as solvent in the polish remover formulation, wherein the formulation also comprises water.

2. A method according to claim 1, wherein R1 and R2, independently from one another, are selected in the group consisting of methyl, ethyl, isopropyl, n-propyl, isobutyl, n-butyl, tert-butyl, n-pentyl, cyclopentyl, cyclohexyl, and phenyl.

3. A method according to claim 1, wherein R3 is H or a C(O)R4 group, and R4 is methyl, ethyl, isopropyl, n-propyl, isobutyl, n-butyl, or tert-butyl.

4. A method according to claim 1, wherein the blend is a mixture of 2 or 3 glycerol ketal derivatives of formula I.

5. A method according to claim 1, wherein the blend is a mixture of 2 glycerol ketal derivatives selected in the group consisting of 2,2-dimethyl-1,3-dioxolane-4-methanol, 2,2-diisobutyl-1,3-dioxolane-4-methanol, 2-isobutyl-2-methyl-1,3-dioxolane-4-methanol, 2-isopropyl-1,3-dioxolane-4-methanol, 2-butyl-2-ethyl-1,3-dioxolane-4-methanol, 2-phenyl-1,3-dioxolane-4-methanol and 2-methyl-2-phenyl-1,3-dioxolane-4-methanol, 2,2-dimethyl-1,3-dioxolane-4-acetate, (2-(heptan-3-yl)-1,3-dioxolan-4-yl)methanol, and mixtures thereof.

6. A method according to claim 1, wherein the blend is a mixture of 2,2-dimethyl-1,3-dioxolane-4-methanol and 2-isobutyl-2-methyl-1,3-dioxolane-4-methanol.

Description

DETAILED DESCRIPTION OF THE INVENTION

(1) The present invention thus concerns the use of a blend comprising at least two glycerol ketal derivatives of formula I described above.

(2) In a preferred embodiment, R1 and R2, independently from one another, are selected in the group consisting of: methyl, ethyl, isopropyl, n-propyl, isobutyl, n-butyl, tert-butyl, n-pentyl, cyclopentyl, cyclohexyl or phenyl.

(3) Advantageously, in formula I above R3 is H or a C(O)R4 group, with R4 being methyl, ethyl, isopropyl, n-propyl, isobutyl, n-butyl or tert-butyl.

(4) One preferred embodiment is when R1 and R2 are methyl and R3 is H. In this case, the compound is commercially available, for example under the name Augeo Clean Multi, Augeo SL191 or Solketal. This compound can be synthesized by reaction between glycerol and acetone, under well-known classical conditions.

(5) In another embodiment, R1 is methyl, R2 is isobutyl and R3 is H. In this case, the compound is commercially available, for example under the name Augeo Clean Plus. This compound can be synthesized by reaction between glycerol and methyl-isobutyl ketone, under well-known classical conditions.

(6) In a third embodiment, R1 is methyl, R2 is phenyl and R3 is H. In this case, the compound is commercially available, for example under the name Augeo Film HB. This compound can be synthesized by reaction between glycerol and acetophenone, under well-known classical conditions.

(7) In a fourth embodiment, R1 is isopropyl and R2 and R3 are H. In this case, the compound is 2-isobutyl-2-methyl-1,3-dioxolane-4-methanol. This compound can be synthetized by reaction between glycerol and isobutyraldehyde, under well-known classical conditions.

(8) Another possibility is to have R1 and R2 are methyl and R3 is a C(O)R4 group, with R4 being methyl. In this case, the compound is commercially available, for example under the name Augeo ACT. This compound can be synthesized by transesterification of Solketal with an alkyl acetate under well-known classical conditions.

(9) Still another possibility is to have R1 is 2-ethylhexyl and R2 and R3 are H. In this case, the compound is (2-(heptan-3-yl)-1,3-dioxolan-4-yl)methanol. This compound can be synthetized by reaction between glycerol and 2-ethylhexanal, under well-known classical conditions.

(10) Glycerol can be obtained as a coproduct from biodiesel production during the transesterification of triglycerides.

(11) The compounds of formula I have very good performance in the application, low odor and no toxicity to humans or environment. In addition, their use induces no security issues because of their high flash point.

(12) Advantageously, the glycerol ketal derivative of formula I is chosen from the group comprising: 2,2-dimethyl-1,3-dioxolane-4-methanol, 2,2-diisobutyl-1,3-dioxolane-4-methanol, 2-isobutyl-2-methyl-1,3-dioxolane-4-methanol, 2-isopropyl-1,3-dioxolane-4-methanol, 2-butyl-2-ethyl-1,3-dioxolane-4-methanol, 2-phenyl-1,3-dioxolane-4-methanol and 2-methyl-2-phenyl-1,3-dioxolane-4-methanol, 2,2-dimethyl-1,3-dioxolane-4-acetate, (2-(heptan-3-yl)-1,3-dioxolan-4-yl)methanol and mixtures thereof.

(13) According to a preferred embodiment, the blend can comprise from 15 to 95% by weight, preferably from 40 to 85% by weight of Augeo Clean Multi (2,2-dimethyl-1,3-dioxolane-4-methanol) based on the total weight of the blend.

(14) Advantageously, the blend comprise from 5 to 85% by weight, preferably from 15 to 60% by weight of Augeo Clean Plus (2-isobutyl-2-methyl-1,3-dioxolane-4-methanol) based on the total weight of the blend. Alternatively, the blend can comprise from 20 to 80% by weight, preferably from 40 to 60% by weight of Augeo ACT (2,2-dimethyl-1,3-dioxolane-4-acetate) based on the total weight of the blend.

(15) In a particular embodiment of the present invention, the blend is a mixture of 2 or 3 glycerol ketal derivatives of formula I, preferably a mixture of 2 glycerol ketal derivatives of formula I, and advantageously selected in the group consisting of: 2,2-dimethyl-1,3-dioxolane-4-methanol, 2,2-diisobutyl-1,3-dioxolane-4-methanol, 2-isobutyl-2-methyl-1,3-dioxolane-4-methanol, 2-isopropyl-1,3-dioxolane-4-methanol, 2-butyl-2-ethyl-1,3-dioxolane-4-methanol, 2-phenyl-1,3-dioxolane-4-methanol and 2-methyl-2-phenyl-1,3-dioxolane-4-methanol, 2,2-dimethyl-1,3-dioxolane-4-acetate, (2-(heptan-3-yl)-1,3-dioxolan-4-yl)methanol and mixtures thereof.

(16) The preferred blends according to the invention are the following: A blend of Augeo Clean Multi (2,2-dimethyl-1,3-dioxolane-4-methanol) and Augeo Clean Plus (2-isobutyl-2-methyl-1,3-dioxolane-4-methanol), preferably comprising from 15 to 95% of Augeo Clean Multi (2,2-dimethyl-1,3-dioxolane-4-methanol) and from 5 to 85% of Augeo Clean Plus (2-isobutyl-2-methyl-1,3-dioxolane-4-methanol), and even more preferably a blend comprising from 40 to 85% of Augeo Clean Multi (2,2-dimethyl-1,3-dioxolane-4-methanol) and from 15 to 60% of Augeo Clean Plus (2-isobutyl-2-methyl-1,3-dioxolane-4-methanol). A blend of Augeo Clean Multi (2,2-dimethyl-1,3-dioxolane-4-methanol) and Augeo ACT (2,2-dimethyl-1,3-dioxolane-4-acetate), preferably comprising from 20 to 80% of Augeo Clean Multi (2,2-dimethyl-1,3-dioxolane-4-methanol) and from 20 to 80% of Augeo ACT (2,2-dimethyl-1,3-dioxolane-4-acetate), and even more preferably a blend comprising from 40 to 60% of Augeo Clean Multi (2,2-dimethyl-1,3-dioxolane-4-methanol) and from 40 to 60% of Augeo ACT (2,2-dimethyl-1,3-dioxolane-4-acetate).

(17) The above % are in % by weight based on the total weight of the blend.

(18) According to a particular embodiment, the blend consists in Augeo Clean Multi (2,2-dimethyl-1,3-dioxolane-4-methanol) and Augeo Clean Plus (2-isobutyl-2-methyl-1,3-dioxolane-4-methanol). In other words, Augeo Clean Multi (2,2-dimethyl-1,3-dioxolane-4-methanol) and Augeo Clean Plus (2-isobutyl-2-methyl-1,3-dioxolane-4-methanol) are the sole components of the blend.

(19) The use according to the invention allows promoting the polish removing performances of polish remover formulations, notably when compared to a polish remover formulation containing a single glycerol ketal of formula I instead of at least two glycerol ketal.

(20) The present invention also concerns a polish remover formulation comprising the above described blend comprising at least two glycerol ketal derivatives of formula I. All the preferred embodiments detailed before, taken alone or in combination are also applicable to the polish remover composition.

(21) The polish remover composition according to the invention advantageously comprises from 0.5 to 50% by weight of the blend, preferably from 10 to 40% by weight based on the total weight of the polish remover formulation.

(22) The polish remover formulation of the invention generally further comprises at least one of the following components:

(23) a. a surfactant,

(24) b. a basifying agent,

(25) c. a co-solvent,

(26) d. a fragrance,

(27) e. water.

(28) In a preferred embodiment of the invention, the polish remover formulation comprises at least 50%, preferably at least 75% and even more preferably at least 90% by weight of water based on the total weight of the polish removing formulation.

(29) In any case, the amount of water is the amount that is necessary to achieve 100% of the weight of the formulations of the present invention.

(30) The surfactant is generally selected in the group consisting of anionic, cationic, non-ionic, hydrotope and amphoteric surfactants. In particular, it can be chosen among the following components: alkylamine oxides, alkylphenol ethoxylates, linear and branched alcohol ethoxylates, alkylbetaines, primary amine salts, diamine salts, quaternary ammonium salts, carboxylic acid salts, alkylbenzene sulfonates, alkylbenzenesulfonic acid, olefin sulfonates, alkyl sulfates and others. It is generally present in an amount varying from 0.5 to 20% by weight of the polish remover formulation.

(31) The basifying agent is generally selected in the group consisting of amines or hydroxides, notably sodium hydroxide or potassium hydroxide. It is generally present in an amount varying from 2 to 15% by weight of the polish remover formulation.

(32) The co-solvent is generally selected in the group consisting of alcohols, notably ethanol, isopropanol or butanol. It is generally present in an amount varying from 5 to 20% by weight of the polish remover formulation.

(33) The fragrance is generally present in an amount varying from 0.25 to 2% by weight of the polish remover formulation.

(34) Further additives can be added to the formulation like chelating agents, anti-corrosion agents, fungicides, thickeners, anti-foam agents and others. The total amount of further additives generally remains below 15% by weight of the polish remover formulation.

(35) Specific language is used in the description so as to facilitate the understanding of the principle of the invention. It should, however, be understood that no limitation of the scope of the invention is envisaged by the use of this specific language. Modifications, improvements and perfections may especially be envisaged by a person skilled in the technical field concerned, on the basis of his own general knowledge.

(36) The term and/or includes the meanings and, or and also all the other possible combinations of elements connected to this term.

(37) Other details or advantages of the invention will emerge more clearly in the light of the examples given below, purely for indicative purposes.

EXPERIMENTAL SECTION

(38) 1. Preparation of the Blends

(39) Blends of Augeo Clean Multi (2,2-dimethyl-1,3-dioxolane-4-methanol) and Augeo Clean Plus (2-isobutyl-2-methyl-1,3-dioxolane-4-methanol) are prepared by simple mixing the components in a recipient. Both Augeo Clean Multi (2,2-dimethyl-1,3-dioxolane-4-methanol) and Augeo Clean Plus (2-isobutyl-2-methyl-1,3-dioxolane-4-methanol) are commercially available, sold by Rhodia Poliamida E Especialidades Ltda.

(40) 2. Preparation of the Polish Remover Formulations

(41) The polish remover formulations were prepared by mixing each of the components listed above in table 1:

(42) TABLE-US-00001 TABLE 1 Polish re- Polish Re- Polish Re- Components mover A mover B mover C NaOH 50% 7.20 7.20 7.20 Renex 95 1.00 1.00 1.00 EDTA 40% 0.23 0.23 0.23 Augeo Clean Plus 30.00 Augeo Clean Multi 30.00 Blend 80% Augeo Clean 30.00 Multi + 20% Augeo Clean Plus Sodium Toluene Sulfonate 6.00 6.00 6.00 Water 55.57 55.57 55.57 TOTAL 100.00 100.00 100.00

(43) The polish remover A with Augeo Clean Plus, due to its water solubility, turns into a cloudy solution, that is not adequate and stable enough to be tested at the application.

(44) The solvent used at Polish Remover C is the mixture of 80% Augeo Clean Multi and 20% Augeo Clean Plus prepared by mixing as explained above.

(45) 3. Polish Removing Methodology

(46) 3.1. Substrate

(47) The substrate used was black paviflex (vinyl flooring) with dimensions of 15 cm15 cm.

(48) 3.2. Polish Application

(49) It was applied to the paviflex two layers of professional sealing and other five layers of polish, with at least 1 hr of difference between each application, so there was time enough to film formation. The material used to apply those layers was cotton, applied first in cycles than in vertical lines, so the polish could be uniformly distributed at the paviflex.

(50) For each layer applied, the gloss was measured using gloss meter equipment, according with ASTM-1455.

(51) 3.3. Polish Removing

(52) To reproduce the floor polisher that is normally used to remove polishes from the floor, it was used a Gardner equipment and a Scoth Brite (3M) sponge with dimensions 4.2 cm7.4 cm. One cycle correspond to two times that the sponge has passed through the paviflex. For this evaluation it was applied 5 mL of the polish remover at the sponge and it was stipulated 150 cycles to evaluate its performance.

(53) At one side of the paviflex it was applied Polish Remover B, and on the other side the Polish Remover C, so it was possible to compare both performances.

(54) 3.4. Performance Evaluation

(55) The performance was evaluated by the gloss measurement after removing the polish. The lower the gloss, the better the hability of the product on removing polish, so the better the performance. Table 2 below shows the gloss results after 150 cycles for four different paviflex where the polish removers mentioned above where applied.

(56) TABLE-US-00002 TABLE 2 Components Polish Remover B Polish Remover C Paviflex 1 - 20 14.7 11.9 60 43.5 37.7 80 38.2 38.2 Paviflex 2 - 20 7.7 4.0 60 33.4 19.7 80 40.5 25.7 Paviflex 3 - 20 7.3 6.8 60 33.6 30.8 80 33.9 33.5 Paviflex 4 - 20 9.9 7.9 60 36.8 29.4 80 37.5 34.0

(57) As the table above shows, the paviflex gloss after removing the polish with Polish Remover C is lower than with Polish Remover B, which means that the blend of solvents removes the polish better than Augeo Clean Multi alone.