Abstract
A target assembly for an x-ray emission apparatus, the apparatus assembly including: a vacuum chamber having at least one conductive wall; an insulating element projecting through the conductive wall; a conductive high voltage element extending along the insulating element from outside the chamber to an end portion of the insulating element furthest from the conductive wall; an x-ray-generating target arranged at the end portion of the insulating element and electrically connected to the high voltage element; and a suppressive electrode arranged at the end portion of the insulating element and configured to suppress acceleration toward the outer surface of the insulating element of electrons which are emitted from a junction between the outer surface of the insulating element and an inner surface of the conductive wall.
Claims
1. A target assembly for an x-ray emission apparatus, the assembly comprising: a vacuum chamber having at least one conductive wall; an insulating element projecting through the conductive wall; a conductive high voltage element extending along the insulating element from outside the chamber to an end portion of the insulating element furthest from the conductive wall; an x-ray-generating target arranged at the end portion of the insulating element and electrically connected to the high voltage element; and a suppressive electrode arranged at the end portion of the insulating element and configured to suppress acceleration toward the outer surface of the insulating element of electrons which are emitted from a junction between the outer surface of the insulating element and an inner surface of the conductive wall.
2. The target assembly of claim 1, wherein the suppressive electrode is electrically connected to the high voltage element.
3. The target assembly of claim 1, wherein the suppressive electrode extends from the end portion of the insulating element towards the conductive wall.
4. The target assembly of claim 1, wherein the suppressive electrode surrounds at least a part of the length of the insulating element.
5. The target assembly of claim 1, wherein the suppressive electrode has a tapered portion which is tapered outwardly from the end portion of the insulating element.
6. The target assembly of claim 1, wherein the suppressive electrode has a parallel portion nearest the conductive wall which is substantially parallel to the outer surface of the electrode.
7. The target assembly of claim 1, wherein the suppressive electrode is formed of a sheet.
8. The target assembly of claim 1, wherein the suppressive electrode is formed of metal.
9. The target assembly of claim 1, wherein the high voltage element is a conductor.
10. The target assembly of claim 1, wherein the suppressive electrode has a thickened region at an end nearest the conductive wall.
11. The target assembly of claim 1, wherein an edge of the suppressive electrode which faces the conductive wall is rounded.
12. The target assembly of claim 1, wherein the x-ray-generating target is supported in a target housing.
13. The target assembly of claim 12, wherein the suppressive electrode extends from the target housing.
14. The target assembly of claim 1, wherein the vacuum chamber has an aperture for accepting an electron beam.
15. The target assembly of claim 12, wherein the vacuum chamber has an aperture for passing x-rays generated from the x-ray-generating target.
16. The target assembly of claim 1, wherein the conductive wall has a flat inner surface.
17. The target assembly of claim 1, wherein the high voltage element is arranged to provide a potential of at least +100 kV relative to the conductive wall.
18. The target assembly of claim 1, wherein the high voltage element is arranged to provide a potential of at least +150 kV relative to the conductive wall.
19. The target assembly of claim 1, wherein the high voltage element is arranged to provide a potential of at least +200 kV relative to the conductive wall.
20. The target assembly of claim 1, wherein the conductive wall is arranged to be earthed.
21. An x-ray emission apparatus comprising: the target assembly claim 1, and an electron beam apparatus arranged to accelerate a beam of electrons toward the x-ray-generating target, thereby to generate x-ray radiation.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1) For a better understanding of the present invention, and to show how the same may be carried into effect, reference will be made, by way of example only, to the accompanying drawings, in which:
(2) FIG. 1 shows an example of an x-ray-emission target assembly in cross-section which is relatively more susceptible to HV (high voltage) breakdown;
(3) FIG. 2 shows an embodiment of an x-ray-emission target assembly in cross-section which is relatively less susceptible to HV breakdown.
(4) FIG. 3a is a equipotential diagram relating to the assembly of FIG. 1; and
(5) FIG. 3b is an equipotential diagram relating to the assembly of FIG. 2.
DETAILED DESCRIPTION
(6) One embodiment of the present disclosure is shown in FIG. 2 in cross-section. FIG. 2 shows a target assembly for an x-ray emission apparatus of similar construction to the configuration shown in FIG. 1. Elements having reference numerals of the form 9x in FIG. 1 are given reference numerals of the form 1x in FIG. 2 and may be assumed to be of substantially identical construction. For an understanding of the construction and operation of these aspects of the embodiment of FIG. 2, reference is made to the disclosure with regard to FIG. 1 above.
(7) Unlike the configuration shown in FIG. 1, the embodiment shown in FIG. 2 is further provided with a suppressive electrode 19. The suppressive electrode 19 is arranged at the end portion 13a of insulating element 13 and extends toward conductive wall 12. The suppressive electrode may be referred to as a flowerpot by those skilled in the art, due to its resemblance in shape to the common garden container as shown in FIG. 2. However, such a designation is considered to be non-limiting as, as explained below, variation in the shape and geometry of suppressive electrode 19 is possible which retaining at least some of the advantages of the same.
(8) In the present embodiment, therefore, suppressive electrode 19 is formed of four principal sections. A first section is approximately cylindrical, and surrounds target assembly 15, thereby to provide a good structural and electrical connection thereto. This portion is indicated as cylindrical support portion 191 in FIG. 2.
(9) Extending away from cylindrical support portion 191 toward conductive wall 12 is conical tapered portion 192. Tapered portion 192 is tapered or flared outwardly as it extends away from housing 15 toward conductive wall 12. Therefore, the suppressive electrode 19 is progressively spaced further from the outer surface of insulating element 13 as suppressive electrode 19 approaches conductive wall 12.
(10) Extending from tapered portion 192 is cylindrical parallel portion 193.
(11) Extending from parallel portion 193 towards wall 12 is thickened region 194, which is thickened and rounded at the edge at which suppressive electrode 19 approaches conductive wall 12. Thickened region 194 can be formed, for example, as a thickened solid region by thickening and/or rounding the material from which suppressive electrode 19 is made, or alternatively, for example, by folding the material, from which suppressive electrode 19 is made, back on itself to form a rounded end.
(12) The configuration of suppressive electrode 19 shown in FIG. 2 has been found to be especially effective in suppressing the acceleration, toward the outer surface of insulating element 13, of electrons which are emitted from the triple junction T between the outer surface of the insulating element 13, the inner surface 12a of conductive wall 12, and the vacuum enclosed by vacuum chamber 11.
(13) However, variation in the geometry, shape and construction of suppressive electrode 19 is possible, as those skilled in the art will appreciate.
(14) In the configuration of FIG. 2, the suppressive electrode 19 is electrically connected to the high voltage conductor 14. This provides particularly effective suppression of the acceleration of electrons from the triple junction T. However, it is possible for the electrode to be at a different potential, as required, for example due to the presence of a resistive element between high voltage conductor 14 and suppressive electrode 19, which may act as a voltage divider.
(15) In FIG. 2, the suppressive electrode 19 extends from the end portion of the insulating element 13 toward the conductive wall. A gap exists between the thickened edge region 194 of suppressive electrode 19 and conductive wall 12. In other configurations, this gap may be increased or decreased as required.
(16) In the configuration of FIG. 2, the suppressive electrode 19 surrounds part, but not all, of the length of insulating element 13, such that a gap exists between thickened region 194 and conductive wall 12. However, the proportion of the length of the insulating element, as well as the absolute size of the gap between the conductive wall 12 and the thickened region 194, may be varied in accordance with the overall design of the apparatus.
(17) In the configuration of FIG. 2, tapered portion 192 is provided which tapers outwardly from the end portion 13a of insulating element 13. A taper angle of tapered portion 192 is around 12 degrees in the present embodiment, although variation of the taper angle may be adopted by for example 10 degrees, without limitation. In some situations, a tapered portion may not be provided, and the suppressive electrode may, for example, be of cylindrical form. In other configurations, the tapered portion may be tapered inwardly.
(18) In the configuration of FIG. 2, the suppressive electrode has a parallel portion 193 extending from tapered portion 192 towards conductive wall 12. In variant embodiments, this portion may be extended, or may be absent. Where present, it need not be strictly parallel, but may for example also be tapered inwardly or tapered outwardly.
(19) In the configuration shown in FIG. 2, the suppressive electrode 19 is formed from a sheet of metal, specifically aluminium. For example, suppressive electrode 19 may be formed from machined or spun aluminium. Other conductive materials, such as copper foil, could also be contemplated. Such a configuration provides good structural properties as well as good electrical conductivity. However, in other configurations, the electrode may be formed of a sheet of metal mesh, for example, which may reduce material usage and weight, and may be easier to form.
(20) In the configuration shown in FIG. 2, suppressive electrode 19 has a thickened region 194 nearest to conductive wall 12. Such a thickened region may avoid concentrating the electric field and thus may reduce the possibility of vacuum breakdown between the electrode 19 and wall 12. However, in other configurations, this thickened portion may be absent. In the configuration of FIG. 2, the thickened portion has a rounded end, although again this rounded end may be absent as it may not be required in certain configurations of vacuum chamber.
(21) In the configuration of FIG. 2, the x-ray-generating target 16 is arranged in a target housing 15, and is offset relative to the central axis 14 defined by conductor 14. However, this configuration is exemplary, and the location of target 16 may differ. The position of target 16 shown in FIG. 2 is in some cases advantageous for easy accessibility of target 16 to the incident electron beam entering through aperture 18.
(22) In the configuration shown in FIG. 2, the suppressive electrode 19 extends from target housing 15. However, suppressive electrode 19 may in certain circumstances extend directly from insulating element 13, or may be provided on a separate support structure around insulating element 13 other than target housing 15.
(23) In the configuration of FIG. 2, the suppressive electrode 19 is symmetric about the axis of conductor 14. However, such symmetry may not be required, and suppressive electrode may, for example, exhibit an oval, rather than rounded, cross-section looking along the axis of conductor 14, or may exhibit another cross section looking in this direction, for example to take account of possible variations in the geometry of chamber 11.
(24) In the configuration shown in FIG. 2, the vacuum chamber 11 has an aperture 18 for accepting an electron beam into the vacuum chamber to impinge upon target 16 in a so-called two-arm arrangement. However, in other configurations, the vacuum chamber may also enclose an electron beam emission source, together with one or more appropriate electron-optical lenses (including, for example, magnetic lenses and electrostatic lenses), beam shapers and the like so as to form a complete system within one chamber 11. Accordingly, the configuration of FIG. 2 is modular and can be retrofitted to an existing electron beam generation apparatus, but the principles can equivalently be applied to a non-modular system wherein all elements are contained within the one unitary vacuum enclosure.
(25) In the configuration shown in FIG. 2, the vacuum chamber has an x-ray emission window 17 for passing x-rays to a sample or other object under investigation. The presence of a solid window across aperture 17 allows the sample to be external to the chamber 11, such that the sample may be held in an atmosphere, rather than in a vacuum. However, in other configurations, it is acceptable to arrange the entire x-ray system, including a sample mount and a detector for the x-ray radiation having passed through the sample, within a unitary vacuum chamber 11.
(26) In the configuration shown in FIG. 2, the inner surface 12a of conductive wall 12 is flat, and extends perpendicular to outer surface 13a of insulating element 13. Such configuration is advantageous in avoiding high potential gradients within the vacuum chamber 11. However, other configurations are possible in which wall 12a is, for example, curved inwardly or outwardly.
(27) In the configuration shown in FIG. 2, the high voltage conductor 14 is arranged to provide a positive potential of, for example, at least +100 kV relative to the conductive wall. However, with increasing voltage, the advantage of target potential elevation in terms of achieving higher electron beam energies is increased, but so too is the risk of vacuum breakdown and instability. Accordingly, the presence of suppressive electrode 19 becomes even more advantageous at more elevated potentials, such as +150 kV, +200 kV, or even higher, of the high voltage conductor 14 relative to conductive wall 12.
(28) In the configuration shown in FIG. 2, the conductive wall 12 is arranged to be earthed, although in some circumstances it may be desirable to adjust the potential of the conductive wall 12 relative to earth to obtain a favourable balance between the potential on high voltage conductor 14 and the potential on conductive wall 12, as well as the potential of any components of the electron beam generation side of the electron beam apparatus, such as an electron-emitting cathode. In other embodiments, a favourable balance may be obtained by adjusting the share of the total accelerating voltage borne by target 16 relative to earth and that borne by an emitting cathode, for example.
(29) In the configuration shown in FIG. 2, a high voltage conductor 14 provides the high positive potential to target 16. Accordingly, a high voltage must be provided to high voltage conductor 14 outside chamber 11, which is sustained long its full length. However, in an alternative configuration, an alternative high voltage element, such as a voltage multiplier, for example a Cockroft-Walton voltage multiplier, may be used to at least partially develop the high voltage progressively along the length of insulating element 13 on the basis of a lower drive voltage applied from outside the chamber. Even though such a situation may result in a reduced field at the triple junction T as compared with the situation of a high voltage conductor, the provision of a suppressive electrode as herein disclosed may be beneficial in suppressing any electron emission from the triple junction which may result.
(30) The embodiment of FIG. 2 is shown accepting an electron beam through aperture 18. However, an embodiment of the apparatus includes an embodiment wherein an electron beam apparatus is coupled to electron acceptance aperture 18 to provide a complete x-ray emission apparatus.
(31) Many variations are possible within the scope of the embodiment disclosed in connection with FIG. 2, without deviating from the essential principles of the invention herein disclosed. Such variants may be made using only routine workshop trial and error for the optimum configuration for any given geometry of vacuum chamber 11, insulating element 13 and conductor 14.
(32) Now, an explanation will be made of at least one advantage which may be achieved with a suppressive electrode as herein disclosed and exemplified by the embodiment of FIG. 2, or variants thereof, with reference to the equipotential lines achieved in the absence of and presence of, respectively, suppressive electrode 192.
(33) In FIG. 3a, the configuration of FIG. 2 is shown in cross-section, suppressive electrode 19 having been removed. The configuration is thus similar to FIG. 1. Equipotential lines arising from a +220 kV potential on high voltage conductor 14 are also shown, at 10 kV intervals.
(34) As can be seen in FIG. 3a, along almost the entire length of insulating element 13, there is a very significant component of the electric field (which crosses the equipotential lines at right angles) into the outer surface of the insulating element 13. Accordingly, any electrons emitted from triple junction T, regardless of their angle of emission, will be captured by the positive potential and will be accelerated toward the surface of the insulating element, potentially giving rise to instability and discharge.
(35) In contrast, when a suppressive electrode is used as shown in FIG. 3b, corresponding to the configuration of FIG. 2, the component of the electric field directed toward the insulating element 13, at least for the first part of the insulating element extending from wall 12, is much reduced. Therefore, the tendency is for electrons to be accelerated along, rather than into, insulating element 13.
(36) Further, within the opening defined by thickened portion 194 of suppressive electrode 19, the electric field direction gradually changes from a slight inclination toward insulating element 13 to a significant inclination away from insulating element 13, toward suppressive electrode 19.
(37) Thus, suppressive electrode 19 is not only able to divert the emitted electrons away from the surface of insulating element 13, but is also able to capture the diverted electrons.
(38) Yet further, within the opening defined by thickened portion 194 of suppressive electrode 19, the equipotential lines become relatively greater in spacing one from another, indicating a reduction in electric field strength along the length of the surface of insulating element 13, at least, in this region.
(39) Thus, suppressive electrode 19 is also able to reduce the accelerating field experienced by the emitted electrons in this region.
(40) Again, it can be appreciated from FIG. 3b that variations in the shape and geometry of suppressive electrode 19 will allow the same effect to be maintained, and may in some circumstances be advantageous for accommodating different geometries of enclosure, target housing and other elements of the system. However, such variations can easily be adopted by the skilled person using basic electron optical principles, once the importance of suppressive electrode 19 as a concept is recognised.
(41) Accordingly, the configuration in FIG. 2 and its variants hereby described and claimed provides at least a solution to the technical problem of avoiding high voltage breakdown in bipolar x-ray systems having a negative-potential emission source and a positive-potential target. Such configuration can thus achieve higher working electron voltages, and thus x-ray beam energies, leading to improved x-ray penetration, and hence improved contrast and resolution especially in microfocus x-ray imaging systems.
