LIQUID-CRYSTAL MEDIUM

Abstract

A liquid-crystalline medium containing one or more compounds of formula IA,

##STR00001##

and the use thereof in an active-matrix display, in particular in a VA, IPS, U-IPS, FFS, UB-FFS, SA-VA, SA-FFS, PS-VA, PS-OCB, PS-IPS, PS-FFS, PS-UB-FFS, PS-posi-VA, PS-TN, polymer stabilised SA-VA or polymer stabilised SA-FFS display.

Claims

1. A liquid-crystalline medium, comprising one or more compounds of formula IA ##STR00463## in which R.sup.11, R.sup.12 identically or differently, denote H, an alkyl or alkoxy radical having 1 to 15 C atoms, in which one or more CH.sub.2 groups are optionally each replaced, independently of one another, by CC, CF.sub.2O, OCF.sub.2, CHCH, ##STR00464## or OCO in such a way that O atoms are not linked directly to one another, and in which one or more H atoms are optionally replaced by halogen.

2. The medium according to claim 1, wherein R.sup.11 and R.sup.12, identically or differently, denote alkyl, alkenyl or alkoxy having 1 to 7 C atoms.

3. The medium according to claim 1, wherein R.sup.12 denotes alkoxy having 1 to 7 C atoms.

4. The medium according to claim 1, wherein the total concentration of the one or more compounds of formula IA is 1% to 25% by weight.

5. The medium according to claim 1, further comprising one or more compounds selected from the group of compounds of formulae IIA, IIB, IIC and IID, ##STR00465## in which R.sup.2A, R.sup.2B, R.sup.2C and R.sup.2D each, independently of one another, denote H, an alkyl or alkenyl radical having up to 15 C atoms, which is unsubstituted, monosubstituted by CN or CF.sub.3 or at least monosubstituted by halogen, in which one or more CH.sub.2 groups are optionally replaced by O, S, ##STR00466## CC, CF.sub.2O, OCF.sub.2, OCO or OCO in such a way that O atoms are not linked directly to one another, L.sup.1 to L.sup.4 each, independently of one another, denote F or Cl, Z.sup.2, Z.sup.2B, and Z.sup.2D each, independently of one another, denote a single bond, CH.sub.2CH.sub.2, CHCH, CF.sub.2O, OCF.sub.2, CH.sub.2O, OCH.sub.2, COO, OCO, C.sub.2F.sub.4, CFCF, or CHCHCH.sub.2O, (O) denotes O or a single bond, p denotes 0, 1 or 2, q denotes 0 or 1, and v denotes 1 to 6.

6. The medium according to claim 1, further comprising one or more compounds of formula IC ##STR00467## in which R.sup.11 and R.sup.12 each, independently of one another, denote H, an alkyl or alkoxy radical having 1 to 15 C atoms, in which one or more CH.sub.2 groups are optionally each replaced, independently of one another, by CC, CF.sub.2O, OCF.sub.2, CHCH, ##STR00468## O, COO or OCO in such a way that O atoms are not linked directly to one another, and in which one or more H atoms are optionally replaced by halogen, X.sup.1 denotes S or O, and L.sup.11 and L.sup.12 each, independently of one another, denote F, Cl, CF.sub.3 or CHF.sub.2.

7. The medium according to claim 6, wherein in formula IC X.sup.1 denotes S, R.sup.11 and R.sup.12 each, independently of one another, denote an alkyl, alkenyl or alkoxy radical having up to 15 C atoms, and L.sup.11 and L.sup.12 both denote F.

8. The liquid-crystalline medium according to claim 1, further comprising one or more compounds selected from the group of compounds of formulae O-1 to O-18, ##STR00469## ##STR00470## in which R.sup.1 and R.sup.2 each, independently of one another, denote H, an alkyl or alkenyl radical having up to 15 C atoms, which is unsubstituted, monosubstituted by CN or CF.sub.3 or at least monosubstituted by halogen, in which one or more CH.sub.2 groups are optionally replaced by O, S, ##STR00471## CC, CF.sub.2O, OCF.sub.2, OCO or OCO in such a way that O atoms are not linked directly to one another.

9. The liquid-crystalline medium according to claim 1, further comprising one or more compounds selected from the group of compounds of formulae T-1 to T-21, ##STR00472## ##STR00473## ##STR00474## in which R denotes a straight-chain alkyl or alkoxy radical having 1 to 6 C atoms, (O) denotes O or a single bond, m is 0, 1, 2, 3, 4, 5 or 6, and n is 0, 1, 2, 3 or 4.

10. The liquid-crystalline medium according to claim 1, further comprising one or more polymerizable compounds of formula P
P-Sp-A.sup.1-(Z.sup.1-A.sup.2).sub.z-RP in which P denotes a polymerisable group, Sp denotes a spacer group or a single bond, A.sup.1, A.sup.2 each, independently, denotes an aromatic, heteroaromatic, alicyclic or heteroaliphatic group, which may contain fused rings, and which is unsubstituted, or mono- or polysubstituted by L, Z.sup.1 denotes O, S, CO, COO, OCO, OCOO, OCH.sub.2, CH.sub.2O, SCH.sub.2, CH.sub.2S, CF.sub.2O, OCF.sub.2, CF.sub.2S, SCF.sub.2, (CH.sub.2).sub.n1, CF.sub.2CH.sub.2, CH.sub.2CF.sub.2, (CF.sub.2).sub.n1, CHCH, CFCF, CHCF, CFCH, CC, CHCHCOO, OCOCHCH, CH.sub.2CH.sub.2COO, OCOCH.sub.2CH.sub.2, CR.sup.0R.sup.0, or a single bond, R.sup.0, R.sup.00 identically or differently, denote H or alkyl having 1 to 12 C atoms, R denotes H, L, or P-Sp-, L denotes F, Cl, CN, P-Sp- or straight chain, branched or cyclic alkyl having 1 to 25 C atoms, in which one or more non-adjacent CH.sub.2-groups are optionally replaced by O, S, CO, COO, OCO, or OCOO in such a manner that O- and/or S-atoms are not directly connected with each other, and in which one or more H atoms are each optionally replaced by P-Sp-, F or Cl, z is 0, 1, 2 or 3, n1 is 1, 2, 3 or 4.

11. The liquid-crystalline medium according to claim 10, wherein the polymerisable compounds of formula P are polymerised.

12. The liquid-crystalline medium according to claim 10, wherein a compound of formula IA is a compound of one of formulae IA-1 to IA-10: ##STR00475## in which R.sup.12 denotes alkyl having 1 to 7 C-atoms.

13. A process of preparing an LC medium according to claim 1, comprising mixing one or more compounds of formula IA with one or more mesogenic or liquid-crystalline compounds and optionally with a polymerisable compound, and optionally with one or more additives.

14. A liquid-crystalline display comprising a medium according to claim 1.

15. The display according to claim 13, which is a PSA display.

16. The display according to claim 14, which is a PS-VA, PS-OCB, PS-IPS, PS-FFS, PS-UB-FFS, PS-posi-VA, PS-TN, polymer stabilised SA-VA or polymer stabilised SA-FFS display.

17. The display according to claim 13, which is a VA, IPS, U-IPS, FFS, UB-FFS, SA-FFS or SA-VA display.

Description

WORKING EXAMPLES

[0344] The following examples are intended to explain the invention without limiting it. In the examples, m.p. denotes the melting point and C denotes the clearing point of a liquid-crystalline substance in degrees Celsius; boiling temperatures are denoted by m.p. Furthermore: C denotes crystalline solid state, S denotes smectic phase (the index denotes the phase type), N denotes nematic state, Ch denotes cholesteric phase, I denotes isotropic phase, T.sub.g denotes glass-transition temperature. The number between two symbols indicates the conversion temperature in degrees Celsius an.

[0345] The host mixture used for determination of the optical anisotropy n of the compounds of the formula IB is the commercial mixture ZLI-4792 (Merck KGaA). The dielectric anisotropy is determined using commercial mixture ZLI-2857. The physical data of the compound to be investigated are obtained from the change in the dielectric constants of the host mixture after addition of the compound to be investigated and extrapolation to 100% of the compound employed. In general, 10% of the compound to be investigated are dissolved in the host mixture, depending on the solubility.

[0346] Unless indicated otherwise, parts or percent data denote parts by weight or percent by weight.

Above and Below:

[0347] V.sub.0 denotes threshold voltage, capacitive [V] at 20 C., [0348] n.sub.e denotes extraordinary refractive index at 20 C. and 589 nm, [0349] n.sub.o denotes ordinary refractive index at 20 C. and 589 nm, [0350] n denotes optical anisotropy at 20 C. and 589 nm, [0351] .sub. denotes dielectric permittivity perpendicular to the director at 20 C. and 1 kHz, [0352] .sub. denotes dielectric permittivity parallel to the director at 20 C. and 1 kHz, [0353] denotes dielectric anisotropy at 20 C. and 1 kHz, [0354] cl.p., T(N,I) denotes clearing point [ C.], [0355] .sub.1 denotes rotational viscosity measured at 20 C. [mPa.Math.s], determined by the rotation method in a magnetic field, [0356] K.sub.1 denotes elastic constant, splay deformation at 20 C. [pN], [0357] K.sub.2 denotes elastic constant, twist deformation at 20 C. [pN], [0358] K.sub.3 denotes elastic constant, bend deformation at 20 C. [pN], and [0359] LTS denotes low-temperature stability (nematic phase), determined in test cells or in the bulk, as specified.

[0360] Unless explicitly noted otherwise, all values indicated in the present application for temperatures, such as, for example, the melting point T(C,N), the transition from the smectic (S) to the nematic (N) phase T(S,N) and the clearing point T(N,I) or cl.p., are indicated in degrees Celsius ( C.). M.p. denotes melting point. Furthermore, Tg=glass state, C=crystalline state, N=nematic phase, S=smectic phase and I=isotropic phase. The numbers between these symbols represent the transition temperatures.

[0361] The term threshold voltage for the present invention relates to the capacitive threshold (V.sub.0), also called the Freedericksz threshold, unless explicitly indicated otherwise. In the examples, as is generally usual, the optical threshold can also be indicated for 10% relative contrast (V.sub.10).

[0362] The display used for measurement of the capacitive threshold voltage consists of two plane-parallel glass outer plates at a separation of 20 m, which each have on the insides an electrode layer and an unrubbed polyimide alignment layer on top, which cause a homeotropic edge alignment of the liquid-crystal molecules.

[0363] The display or test cell used for measurement of the tilt angle consists of two plane-parallel glass outer plates at a separation of 4 m, which each have on the insides an electrode layer and a polyimide alignment layer on top, where the two polyimide layers are rubbed antiparallel to one another and cause a homeotropic edge alignment of the liquid-crystal molecules.

[0364] Unless indicated otherwise, the VHR is determined at 20 C. (VHR.sub.20) and after 5 minutes in an oven at 100 C. (VHR.sub.100) in a commercially available instrument Model 6254 from TOYO Corporation, Japan. The voltage used has a frequency of in a range from 1 Hz to 60 Hz, unless indicated more precisely.

[0365] The accuracy of the VHR measurement values depends on the respective value of the VHR. The accuracy decreases with decreasing values. The deviations generally observed in the case of values in the various magnitude ranges are compiled in their order of magnitude in the following table.

TABLE-US-00008 VHR range Deviation (relative) VHR values .sub.GVHR/VHR/% from to Approx. 99.6% 100% +/0.1 99.0% 99.6% +/0.2 98% 99% +/0.3 95% 98% +/0.5 90% 95% +/1 80% 90% +/2 60% 80% +/4 40% 60% +/8 20% 40% +/10 10% 20% +/20

[0366] The stability to UV irradiation is investigated in a Suntest CPS, a commercial instrument from Heraeus, Germany. The sealed test cells are irradiated for between 30 min and 2.0 hours, unless explicitly indicated, without additional heating. The irradiation power in the wavelength range from 300 nm to 800 nm is 765 W/m.sup.2 V. A UV cut-off filter having an edge wavelength of 310 nm is used in order to simulate the so-called window glass mode. In each series of experiments, at least four test cells are investigated for each condition, and the respective results are indicated as averages of the corresponding individual measurements.

[0367] The decrease in the voltage holding ratio (VHR) usually caused by the exposure, for example by UV irradiation or by LCD backlighting, is determined in accordance with the following equation (1):

VHR(t)=VHR(t)VHR(t=0)(1).

[0368] In order to investigate the low-temperature stability (LTS), i.e. the stability of the LC mixture in the bulk against spontaneous crystallisation of individual components at low temperatures or the occurrence of smectic phases, several sealed bottles, each containing about 1 g of the material, are stored at one or more given temperatures, typically of 10 C., 20 C., 30 C. and/or 40 C. and it is inspected at regular intervals visually, whether a phase transition is observed or not. As soon as the first one of the samples at a given temperature shows a change time is noted. The time until the last inspection, at which no change has been observed, is noted as the respective LTS.

[0369] The ion density from which the resistivity is calculated is measured using the commercially available LC Material Characteristics Measurement System Model 6254 from Toyo Corporation, Japan, using VHR test cells with AL16301 Polyimide (JSR Corp., Japan) having a 3.2 m cell gap. The measurement is performed after 5 min of storage in an oven at 60 C. or 100 C.

[0370] The so-called HTP denotes the helical twisting power of an optically active or chiral substance in an LC medium (in m). Unless indicated otherwise, the HTP is measured in the commercially available nematic LC host mixture MLD-6260 (Merck KGaA) at a temperature of 20 C.

[0371] Unless explicitly noted otherwise, all concentrations in the present application are indicated in percent by weight and relate to the corresponding mixture as a whole, comprising all solid or liquid-crystalline components, without solvents. All physical properties are determined in accordance with Merck Liquid Crystals, Physical Properties of Liquid Crystals, Status November 1997, Merck KGaA, Germany, and apply for a temperature of 20 C., unless explicitly indicated otherwise.

[0372] The following mixture examples having negative dielectric anisotropy are suitable, in particular, for liquid-crystal displays which have at least one planar alignment layer, such as, for example, IPS and FFS displays, in particular UB-FFS(=ultra-bright FFS), and for VA displays.

Mixture Examples and Comparative Examples

[0373] Comparative Mixture C.sub.1 is prepared as follows:

TABLE-US-00009 CY-3-O4 20.0% Clearing point/ C.: 86.5 CCY-3-O2 8.0% n (589 nm, 20 C.): 0.1089 CCY-3-O3 6.0% n.sub.e (589 nm, 20 C.): 1.5917 CCY-4-O2 8.0% (1 kHz, 20 C.): 4.3 CLY-3-O2 5.0% .sub. (1 kHz, 20 C.): 8.0 CLY-3-O3 5.0% K.sub.1 (pN, 20 C.): 14.6 CLY-2-O4 6.0% K.sub.3 (pN, 20 C.): 15.1 PYP-2-3 10.0% V.sub.0 (20 C.)/V: 1.99 CC-3-V 26.0% .sub.1 (20 C.)/mPa .Math. s: 151 PGIY-2-O4 6.0% LTS.sub.bulk (20 C.)/h: 336 100.0% LTS.sub.bulk (30 C.)/h: 144

[0374] Mixture M1 is prepared as follows:

TABLE-US-00010 CY-3-O4 14.0% Clearing point/ C.: 86.5 CCY-3-O2 4.5% n (589 nm, 20 C.): 0.1101 CCY-3-O3 3.0% n.sub.e (589 nm, 20 C.): 1.5956 CCY-4-O2 4.0% (1 kHz, 20 C.): 4.1 CLY-3-O2 5.0% .sub. (1 kHz, 20 C.): 7.7 CLY-3-O3 5.0% K.sub.1 (pN, 20 C.): 14.8 CLY-2-O4 5.5% K.sub.3 (pN, 20 C.): 14.7 PYP-2-3 7.5% V.sub.0 (20 C.)/V: 2.00 PGIY-2-O4 7.0% .sub.1 (20 C.)/mPa .Math. s: 127 CC-3-V 35.5% COB(S)-4-O4 3.0% COB(S)-2-O2 3.0% COB(S)-2-O4 3.0% 100.0%
Mixture M2 is prepared as follows:

TABLE-US-00011 CY-3-O4 16.5% Clearing point/ C.: 86.5 CCY-3-O2 5.0% n (589 nm, 20 C.): 0.1094 CCY-3-O3 3.5% n.sub.e (589 nm, 20 C.): 1.5939 CCY-4-O2 4.0% (1 kHz, 20 C.): 4.2 CLY-3-O2 6.5% .sub. (1 kHz, 20 C.): 7.8 CLY-3-O3 6.5% K.sub.1 (pN, 20 C.): 14.8 CLY-2-O4 6.5% K.sub.3 (pN, 20 C.): 14.9 PYP-2-3 8.0% V.sub.0 (20 C.)/V: 2.00 PGIY-2-O4 7.0% .sub.1 (20 C.)/mPa .Math. s: 138 CC-3-V 31.5% COB(S)-4-O4 4.0% 100.0%

[0375] Mixture M3 is prepared as follows:

TABLE-US-00012 CY-3-O4 15.0% Clearing point 1 C.: 87.0 CCY-3-O2 4.0% n (589 nm, 20 C.): 0.1108 CCY-3-O3 4.0% n.sub.e (589 nm, 20 C.): 1.5962 CCY-4-O2 4.5% (1 kHz, 20 C.): 4.2 CLY-3-O2 5.0% .sub. (1 kHz, 20 C.): 7.8 CLY-3-O3 6.0% K.sub.1 (pN, 20 C.): 14.9 CLY-2-O4 6.0% K.sub.3 (pN, 20 C.): 14.5 PYP-2-3 8.5% V.sub.0 (20 C.)/V: 1.96 PGIY-2-O4 6.0% .sub.1 (20 C.)/mPa .Math. s: 133 CC-3-V 33.0% COB(S)-2-O4 8.0% 100.0%

[0376] Mixture M4 is prepared as follows:

TABLE-US-00013 CY-3-O4 13.5% Clearing point/ C.: 87.0 CCY-3-O2 4.0% n (589 nm, 20 C.): 0.1109 CCY-3-O3 3.0% n.sub.e (589 nm, 20 C.): 1.5969 CCY-4-O2 5.0% (1 kHz, 20 C.): 4.1 CLY-3-O2 4.0% .sub. (1 kHz, 20 C.): 7.7 CLY-3-O3 5.0% K.sub.1 (pN, 20 C.): 14.9 CLY-2-O4 6.0% K.sub.3 (pN, 20 C.): 14.5 PYP-2-3 8.5% V.sub.0 (20 C.)/V: 1.97 PGIY-2-O4 6.0% .sub.1 (20 C.)/mPa .Math. s: 129 CC-3-V 35.0% COB(S)-2-O4 10.0% 100.0%

[0377] Mixture M5 is prepared as follows:

TABLE-US-00014 CC-3-V 39.0% Clearing point/ C.: 81.0 COB(S)-2-O2 7.0% n (589 nm, 20 C.): 0.1072 CLY-2-O4 5.5% n.sub.e (589 nm, 20 C.): 1.5925 CLY-3-O2 5.0% (1 kHz, 20 C.): 3.7 CLY-3-O3 5.0% .sub. (1 kHz, 20 C.): 7.2 CY-3-O4 13.0% K.sub.1 (pN, 20 C.): 13.9 CY-5-O4 2.0% K.sub.3 (pN, 20 C.): 14.5 CPY-2-O2 9.0% V.sub.0 (20 C.)/V: 2.10 CPY-3-O2 8.0% .sub.1 (20 C.)/mPa .Math. s: 106 PYP-2-3 6.5% 100.0%

[0378] Mixture M6 is prepared as follows:

TABLE-US-00015 CC-3-V 37.5% Clearing point/ C.: 81.0 COB(S)-4-O4 7.0% n (589 nm, 20 C.): 0.1082 CLY-2-O4 5.0% n.sub.e (589 nm, 20 C.): 1.5937 CLY-3-O2 5.0% (1 kHz, 20 C.): 3.7 CLY-3-O3 5.0% .sub. (1 kHz, 20 C.): 7.2 CY-3-O4 14.5% K.sub.1 (pN, 20 C.): 13.8 CY-5-O4 1.5% K.sub.3 (pN, 20 C.): 14.3 CPY-2-O2 9.0% V.sub.0 (20 C.)/V: 2.09 CPY-3-O2 8.0% .sub.1 (20 C.)/mPa .Math. s: 113 PYP-2-3 7.5% 100.0%

[0379] Mixture M7 is prepared as follows:

TABLE-US-00016 CC-3-V 38.0% Clearing point/ C.: 81.0 COB(S)-4-O4 8.0% n (589 nm, 20 C.): 0.1071 CLY-2-O4 5.5% n.sub.e (589 nm, 20 C.): 1.5926 CLY-3-O2 5.0% (1 kHz, 20 C.): 3.8 CLY-3-O3 5.0% .sub. (1 kHz, 20 C.): 7.3 CY-3-O4 14.0% K.sub.1 (pN, 20 C.): 13.9 CY-5-O4 1.5% K.sub.3 (pN, 20 C.): 14.2 CPY-2-O2 8.5% V.sub.0 (20 C.)/V: 2.05 CPY-3-O2 8.0% .sub.1 (20 C.)/mPa .Math. s: 105 PYP-2-3 6.5% 100.0%

[0380] The VHR of the mixtures C.sub.1 and M1 to M6 has been measured (VHR test cells with a UV-PI for planar orientation, cell gap of 4.0 m at 1 V, 1 Hz, 60 C.) as shown in the following table. The values were measured immediately after filling of the test cells.

TABLE-US-00017 Mixture C1 M1 M2 M3 M4 M5 M6 M7 VHR [%] 95.5 96.2 95.9 96.3 95.8 95.9 96.5 96.5

[0381] Surprisingly, use of a compound of formula IA in a medium according to the invention results in liquid-crystal mixtures with at least the same high VHR as the reference mixture C1. At the same time, compared to C1 the media according to the invention show a lower rotational viscosity. Hence it is possible to achieve media with improved response time without negatively influencing the reliability.

[0382] Mixture M8 is prepared as follows:

TABLE-US-00018 B(S)-2O-O4 2.0% Clearing point/ C.: 85.1 B(S)-2O-O5 4.0% n (589 nm, 20 C.): 0.0941 CC-3-V 37.0% (1 kHz, 20 C.): 3.2 CC-3-V1 2.0% .sub. (1 kHz, 20 C.): 6.6 CCP-V-1 18.5% K.sub.1 (pN, 20 C.): 14.5 CCY-3-O2 10.0% K.sub.3 (pN, 20 C.): 16.3 CCY-5-O2 2.0% V.sub.0 (20 C.)/V: 2.38 COB(S)-2-O4 10.0% .sub.1 (20 C.)/mPa .Math. s: 89 CY-3-O2 14.5% 100.0%

[0383] The medium M8 is distinguished by a particularly low rotational viscosity which enables LC displays with surprisingly short switching times.

[0384] Mixture M9

TABLE-US-00019 CY-3-O2 2.0% CCY-3-O2 4.0% CPY-2-O2 37.0% CPY-3-O2 2.0% PYP-2-3 18.5% PYP-2-4 10.0% CC-3-V 2.0% COB(S)-2-O4 14.5% 100.0%

[0385] Mixture M10

[0386] Mixture M10 consists of 99.96% of Mixture M9 and 0.04% of the compound ST-3a-1 shown above.

[0387] Mixture M11

TABLE-US-00020 B(S)-2O-O4 2.0% Clearing point/ C.: 97.1 B(S)-2O-O5 4.0% n (589 nm, 20 C.): 0.1153 CC-3-V1 11.0% (1 kHz, 20 C.): 4.1 CC-2-3 18.0% .sub. (1 kHz, 20 C.): 7.5 CC-3-4 2.0% K.sub.1 (pN, 20 C.): 20.0 CCP-3-1 5.0% K.sub.3 (pN, 20 C.): 16.9 CCP-3-3 5.0% V.sub.0 (20 C.)/V: 2.15 CCP-V-1 2.0% .sub.1 (20 C.)/mPa .Math. s: 162 CCY-2-1 5.0% CCY-3-1 5.0% CLY-3-O2 6.0% COB(S)-2-O4 12.0% CPY-2-O2 1.5% CPY-3-O2 2.0% CY-5-O2 10.5% PGIY-2-O4 6.0% PYP-2-3 3.0% 100.0%

[0388] Mixture M12

[0389] Mixture M12 consists of 99.965% of Mixture M11 and 0.035% of the compound ST-3a-1 shown above.

[0390] Mixture M13

TABLE-US-00021 B(S)-2O-O4 2.0% Clearing point/ C.: 97.5 B(S)-2O-O5 4.0% n (589 nm, 20 C.): 0.1154 CC-3-V1 11.0% (1 kHz, 20 C.): 3.6 CC-2-3 18.0% .sub. (1 kHz, 20 C.): 6.9 CC-3-4 2.0% K.sub.1 (pN, 20 C.): 19.1 CCP-3-1 5.0% K.sub.3 (pN, 20 C.): 17.2 CCP-3-3 5.0% V.sub.0 (20 C.)/V: 2.33 CCP-V-1 6.0% .sub.1 (20 C.)/mPa .Math. s: 150 CCY-2-1 5.0% CCY-3-1 5.0% CLY-3-O2 3.0% COB(S)-2-O4 11.0% CPY-3-O2 3.5% CY-5-O2 9.5% PGIY-2-O4 5.0% PYP-2-3 5.0% 100.0%

[0391] Mixture M14

[0392] Mixture M14 consists of 99.965% of Mixture M13 and 0.035% of the compound ST-3a-1 shown above.

[0393] Mixture M15

TABLE-US-00022 B(S)-2O-O5 1.0% Clearing point/ C.: 104.6 CC-3-V 5.0% n (589 nm, 20 C.): 0.1148 CC-3-V1 11.0% (1 kHz, 20 C.): 3.4 CC-2-3 18.0% .sub. (1 kHz, 20 C.): 6.7 CC-3-4 2.5% K.sub.1 (pN, 20 C.): 19.1 CCP-V-1 11.5% K.sub.3 (pN, 20 C.): 17.2 CCY-3-O2 4.5% V.sub.0 (20 C.)/V: 2.33 CLY-3-O2 6.0% .sub.1 (20 C.)/mPa .Math. s: 150 COB(S)-2-O4 12.0% CPY-2-O2 10.0% CPY-3-O2 7.0% CY-5-O2 3.5% CP-3-O2 2.0% PGIY-2-O4 6.0% 100.0%

[0394] Mixture M16

[0395] Mixture M16 consists of 99.965% of Mixture M15 and 0.035% of the compound ST-3a-1 shown above.

[0396] Mixture M17

TABLE-US-00023 CCP-V-1 15.0 Clearing Point [ C.]: 98 CLY-3-O2 6.0 n [589 nm, 20 C.]: 0.0958 CLY-3-O3 6.0 n.sub.e [589 nm, 20 C.]: 1.5817 CLY-4-O2 6.0 n.sub.o [589 nm, 20 C.]: 1.4859 CLY-5-O2 4.5 [1 kHz, 20 C.]: 3.0 CPY-3-O2 1.5 .sub.|| [1 kHz, 20 C.]: 3.2 CC-3-V 40.5 .sub. [1 kHz, 20 C.]: 6.2 CY-3-O2 8.5 .sub.1 [mPa s, 20 C.]: 106 COB(S)-2-O4 12.0 K.sub.1 [pN, 20 C.]: 16.6 100.0 K.sub.3 [pN, 20 C.]: 17.8 LTS bulk [h, 20 C.]: 1000

[0397] Mixture M18

TABLE-US-00024 CC-3-V1 8.0 Clearing Point [ C.]: 74 CC-4-V1 19.5 n [589 nm, 20 C.]: 0.1023 CCH-301 15.0 n.sub.e [589 nm, 20 C.]: 1.5851 CY-3-O2 15.0 n.sub.o [589 nm, 20 C.]: 1.4828 CY-3-O4 2.5 [1 kHz, 20 C.]: 3.2 PP-1-2V1 7.5 .sub.|| [1 kHz, 20 C.]: 3.5 CCY-3-O2 8.5 .sub. [1 kHz, 20 C.]: 6.7 CLY-3-O2 1.0 .sub.1 [mPa s, 20 C.]: CPY-2-O2 6.0 K.sub.1 [pN, 20 C.]: 14.3 CPY-3-O2 12.0 K.sub.3 [pN, 20 C.]: 15.9 COB(S)-2-O4 5.0 LTS bulk [h, 20 C.]: 1000 100.0

[0398] Mixture M19

TABLE-US-00025 CCP-3-1 5.0 Clearing Point [ C.]: 98 CCP-V-1 11.0 n [589 nm, 20 C.]: 0.1025 CCP-V2-1 3.0 n.sub.e [589 nm, 20 C.]: 1.5875 CCY-3-O2 5.0 n.sub.o [589 nm, 20 C.]: 1.4850 CLY-3-O2 6.0 [1 kHz, 20 C.]: 3.9 CLY-4-O2 5.0 .sub.|| [1 kHz, 20 C.]: 3.6 CLY-5-O2 4.0 .sub. [1 kHz, 20 C.]: 7.5 PGIY-2-O4 4.0 .sub.1 [mPa s, 20 C.]: 137 COB(S)-V-O2 12.0 K.sub.1 [pN, 20 C.]: 18.1 CC-3-V1 8.7 K.sub.3 [pN, 20 C.]: 17.8 CC-2-3 16.5 LTS bulk [h, 20 C.]: CC-3-4 5.0 CY-3-O2 10.0 Y-4O-O4 4.5 CCQU-3-F 0.3 100.0

[0399] Mixture M20

TABLE-US-00026 CC-3-V 47.5 Clearing Point [ C.]: 77 CLY-2-O4 4.0 n [589 nm, 20 C.]: 0.1018 CLY-3-O2 5.0 n.sub.e [589 nm, 20 C.]: 1.5869 CLY-3-O3 5.0 n.sub.o [589 nm, 20 C.]: 1.4851 CLY-4-O2 4.0 [1 kHz, 20 C.]: 3.5 CLY-5-O2 4.0 .sub.|| [1 kHz, 20 C.]: 3.5 PY-3-O2 9.0 .sub. [1 kHz, 20 C.]: 7.0 PY-1-O2 3.0 .sub.1 [mPa s, 20 C.]: CY-3-O2 2.5 K.sub.1 [pN, 20 C.]: 14.2 COB(S)-2-O4 13.0 K.sub.3 [pN, 20 C.]: 14.0 PYP-2-3 3.0 LTS bulk [h, 20 C.]: 144 100.0

[0400] Mixture M21

TABLE-US-00027 CC-3-V1 8.0 Clearing Point [ C.]: 73 CC-4-V1 14.5 n [589 nm, 20 C.]: 0.1025 CCH-301 17.0 n.sub.e [589 nm, 20 C.]: 1.5876 CY-3-O2 15.0 n.sub.o [589 nm, 20 C.]: 1.4851 CP-3-O2 7.5 [1 kHz, 20 C.]: 3.1 PP-1-2V1 4.0 .sub.|| [1 kHz, 20 C.]: 3.5 CCP-V2-1 5.5 .sub. [1 kHz, 20 C.]: 6.6 CLY-3-O2 1.0 .sub.1 [mPa s, 20 C.]: CPY-2-O2 5.5 K.sub.1 [pN, 20 C.]: 13.8 CPY-3-O2 12.0 K.sub.3 [pN, 20 C.]: 15.1 COB(S)-2-O4 10.0 LTS bulk [h, 20 C.]: 360 100.0

[0401] Mixture M22

TABLE-US-00028 CC-3-V1 8.0 Clearing Point [ C.]: 73.5 CC-4-V1 18.0 n [589 nm, 20 C.]: 0.1019 CCH-301 10.0 n.sub.e [589 nm, 20 C.]: 1.5865 CY-3-O2 15.0 n.sub.o [589 nm, 20 C.]: 1.4846 CP-3-O2 17.0 [1 kHz, 20 C.]: 3.1 CPP-3-2 2.5 .sub.|| [1 kHz, 20 C.]: 3.4 CCP-3-1 1.5 .sub. [1 kHz, 20 C.]: 6.5 CLY-3-O2 1.0 .sub.1 [mPa s, 20 C.]: CPY-2-O2 5.0 K.sub.1 [pN, 20 C.]: 13.7 CPY-3-O2 12.0 K.sub.3 [pN, 20 C.]: 15.3 COB(S)-2-O4 10.0 LTS bulk [h, 20 C.]: 192 100.0

[0402] Mixture M23

TABLE-US-00029 CCP-V-1 2.0 Clearing Point [ C.]: 74.5 CLY-3-O2 4.5 n [589 nm, 20 C.]: 0.0939 CLY-3-O3 1.0 n.sub.e [589 nm, 20 C.]: 1.5772 CPY-3-O2 15.0 n.sub.o [589 nm, 20 C.]: 1.4833 CC-3-V 52.0 [1 kHz, 20 C.]: 2.7 CY-3-O2 11.0 .sub.|| [1 kHz, 20 C.]: 3.3 PP-1-3 2.5 .sub. [1 kHz, 20 C.]: 6.0 COB(S)-2-O4 6.0 .sub.1 [mPa s, 20 C.]: 71 COB(S)-2-O5 6.0 K.sub.1 [pN, 20 C.]: 13.2 100.0 K.sub.3 [pN, 20 C.]: 14.5 LTS bulk [h, 20 C.]: 240

[0403] Mixture M24

TABLE-US-00030 CCP-V-1 2.0 Clearing Point [ C.]: 75 CLY-3-O2 4.5 n [589 nm, 20 C.]: 0.0942 CLY-3-O3 1.0 n.sub.e [589 nm, 20 C.]: 1.5773 CPY-3-O2 15.0 n.sub.o [589 nm, 20 C.]: 1.4831 CC-3-V 52.0 [1 kHz, 20 C.]: 2.7 CY-3-O2 11.0 .sub.|| [1 kHz, 20 C.]: 3.3 PP-1-3 2.5 .sub. [1 kHz, 20 C.]: 6.0 COB(S)-2-O5 12.0 .sub.1 [mPa s, 20 C.]: 73 100.0 K.sub.1 [pN, 20 C.]: 13.0 K.sub.3 [pN, 20 C.]: 14.6 LTS bulk [h, 20 C.]: 0

[0404] Mixture M25

TABLE-US-00031 CCP-V-1 15.0 Clearing Point [ C.]: 94 CCY-3-O2 5.0 n [589 nm, 20 C.]: 0.0960 CLY-2-O4 5.0 n.sub.e [589 nm, 20 C.]: 1.5819 CLY-3-O2 4.0 n.sub.o [589 nm, 20 C.]: 1.4859 CLY-3-O3 5.0 [1 kHz, 20 C.]: 3.3 CLY-4-O2 4.0 .sub.|| [1 kHz, 20 C.]: 3.4 CPY-3-O2 1.5 .sub. [1 kHz, 20 C.]: 6.7 CC-3-V 40.5 .sub.1 [mPa s, 20 C.]: 98 CY-3-O2 1.5 K.sub.1 [pN, 20 C.]: 16.2 COB(S)-2-O4 12.0 K.sub.3 [pN, 20 C.]: 16.3 B(S)-2O-O5 2.5 LTS bulk [h, 20 C.]: 1000 Y-4O-O4 4.0 100.0

[0405] Mixture M26

TABLE-US-00032 CCP-3-1 5.0 Clearing Point [ C.]: 93.5 CCP-V-1 8.0 n [589 nm, 20 C.]: 0.1009 CCP-V2-1 3.0 n.sub.e [589 nm, 20 C.]: 1.5848 CCY-3-O2 5.0 n.sub.o [589 nm, 20 C.]: 1.4839 CLY-2-O4 6.0 [1 kHz, 20 C.]: 3.8 CLY-4-O2 5.0 .sub.|| [1 kHz, 20 C.]: 3.6 CLY-5-O2 4.0 .sub. [1 kHz, 20 C.]: 7.4 PGIY-2-O4 2.5 .sub.1 [mPa s, 20 C.]: 128 COB(S)-2-O4 12.0 K.sub.1 [pN, 20 C.]: 17.7 CC-2V-V2 15.2 K.sub.3 [pN, 20 C.]: 15.9 CC-3-V1 9.0 LTS bulk [h, 20 C.]: CC-2-3 9.0 CY-3-O2 10.5 Y-4O-O4 5.5 CCQU-3-F 0.3 100.0

[0406] Mixture M27

TABLE-US-00033 CCP-3-1 5.0 Clearing Point [ C.]: 94.5 CCP-V-1 8.0 n [589 nm, 20 C.]: 0.1021 CCP-V2-1 3.0 n.sub.e [589 nm, 20 C.]: 1.5863 CCY-3-O2 5.0 n.sub.o [589 nm, 20 C.]: 1.4842 CLY-2-O4 6.0 [1 kHz, 20 C.]: 3.9 CLY-4-O2 5.0 .sub.|| [1 kHz, 20 C.]: 3.6 CLY-5-O2 4.0 .sub. [1 kHz, 20 C.]: 7.5 PGIY-2-O4 2.5 .sub.1 [mPa s, 20 C.]: 126 COB(S)-V-O4 12.0 K.sub.1 [pN, 20 C.]: 17.7 CC-2V-V2 15.2 K.sub.3 [pN, 20 C.]: 16.2 CC-3-V1 9.0 LTS bulk [h, 20 C.]: CC-2-3 9.0 CY-3-O2 10.5 Y-4O-O4 5.5 CCQU-3-F 0.3 100.0

[0407] Mixture M28

TABLE-US-00034 CCP-3-1 5.0 Clearing Point [ C.]: 97 CCP-V-1 11.0 n [589 nm, 20 C.]: 0.1018 CCP-V2-1 3.0 n.sub.e [589 nm, 20 C.]: 1.5870 CCY-3-O2 5.0 n.sub.o [589 nm, 20 C.]: 1.4852 CLY-3-O2 6.0 [1 kHz, 20 C.]: 3.8 CLY-4-O2 5.0 .sub.|| [1 kHz, 20 C.]: 3.5 CLY-5-O2 4.0 .sub. [1 kHz, 20 C.]: 7.3 PGIY-2-O4 4.0 .sub.1 [mPa s, 20 C.]: 140 COB(S)-2-O3 12.0 K.sub.1 [pN, 20 C.]: 18.3 CC-3-V1 8.7 K.sub.3 [pN, 20 C.]: 17.4 CC-2-3 16.5 LTS bulk [h, 20 C.]: CC-3-4 5.0 CY-3-O2 10.0 Y-4O-O4 4.5 CCQU-3-F 0.3 100.0

[0408] Mixture M29

[0409] Mixture M29 consists of 99.975% of mixture M28 and 0.025% of compound ST-3a-1 shown above.

[0410] Mixture M30

TABLE-US-00035 CCP-V-1 10.0 Clearing Point [ C.]: 73 CLY-3-O2 2.0 n [589 nm, 20 C.]: 0.0938 CPY-3-O2 5.5 n.sub.e [589 nm, 20 C.]: 1.5797 CC-3-V 48.0 n.sub.o [589 nm, 20 C.]: 1.4859 CY-3-O2 12.5 [1 kHz, 20 C.]: 2.7 PP-1-3 2.5 .sub.|| [1 kHz, 20 C.]: 3.4 COB(S)-2-O4 9.0 .sub. [1 kHz, 20 C.]: 6.1 COB(S)-2-O5 9.0 .sub.1 [mPa s, 20 C.]: 69 PY-3-O2 1.5 K.sub.1 [pN, 20 C.]: 12.7 100.0 K.sub.3 [pN, 20 C.]: 13.6 LTS bulk [h, 20 C.]: 1000

[0411] Mixture M31

TABLE-US-00036 CCP-3-1 4.0 Clearing Point [ C.]: 93.5 CCP-V-1 10.0 n [589 nm, 20 C.]: 0.1026 CCP-V2-1 3.0 n.sub.e [589 nm, 20 C.]: 1.5872 CCY-3-O2 4.5 n.sub.o [589 nm, 20 C.]: 1.4846 CLY-3-O2 5.0 [1 kHz, 20 C.]: 3.9 CLY-4-O2 5.0 .sub.|| [1 kHz, 20 C.]: 3.5 CLY-5-O2 4.0 .sub. [1 kHz, 20 C.]: 7.4 PGIY-2-O4 6.0 .sub.1 [mPa s, 20 C.]: COB(S)-2-O4 12.0 K.sub.1 [pN, 20 C.]: 17.6 CC-3-V1 9.2 K.sub.3 [pN, 20 C.]: 16.5 CC-2-3 16.5 LTS bulk [h, 20 C.]: 1000 CC-3-4 6.0 CY-3-O2 9.5 Y-4O-O4 5.0 CCQU-3-F 0.3 100.0

[0412] Mixture M32

TABLE-US-00037 CC-3-V 47.5 Clearing Point [ C.]: 77.5 CLY-2-O4 4.0 n [589 nm, 20 C.]: 0.1014 CLY-3-O2 6.0 n.sub.e [589 nm, 20 C.]: 1.5865 CLY-3-O3 5.0 n.sub.o [589 nm, 20 C.]: 1.4851 CLY-4-O2 4.0 [1 kHz, 20 C.]: 3.4 CLY-5-O2 4.0 .sub.|| [1 kHz, 20 C.]: 3.5 PY-3-O2 9.0 .sub. [1 kHz, 20 C.]: 6.9 PY-1-O2 3.5 .sub.1 [mPa s, 20 C.]: CY-3-O2 2.0 K.sub.1 [pN, 20 C.]: 14.3 COB(S)-2-O4 12.0 K.sub.3 [pN, 20 C.]: 14.1 PYP-2-3 3.0 LTS bulk [h, 20 C.]: 288 100.0

[0413] Mixture M33

TABLE-US-00038 CCP-3-1 4.0 Clearing Point [ C.]: 94.5 CCP-V-1 12.0 n [589 nm, 20 C.]: 0.1010 CLY-2-O4 4.0 n.sub.e [589 nm, 20 C.]: 1.5854 CLY-3-O2 4.0 n.sub.o [589 nm, 20 C.]: 1.4844 CLY-3-O3 5.0 [1 kHz, 20 C.]: 3.9 CLY-4-O2 4.0 .sub.|| [1 kHz, 20 C.]: 3.7 CLY-5-O2 3.0 .sub. [1 kHz, 20 C.]: 7.6 CPY-3-O2 7.0 .sub.1 [mPa s, 20 C.]: 128 COB(S)-2-O4 12.0 K.sub.1 [pN, 20 C.]: 18.5 CC-3-V1 7.0 K.sub.3 [pN, 20 C.]: 16.1 CC-4-V1 18.0 LTS bulk [h, 20 C.]: 1000 CC-2-3 8.7 Y-4O-O4 11.0 CCQU-3-F 0.3 100.0

[0414] Mixture M34

TABLE-US-00039 CCP-V-1 5.0 Clearing Point [ C.]: 93 CLY-2-O4 3.0 n [589 nm, 20 C.]: 0.1018 CLY-3-O2 3.0 n.sub.e [589 nm, 20 C.]: 1.5846 CLY-3-O3 3.0 n.sub.o [589 nm, 20 C.]: 1.4828 CLY-4-O2 4.0 [1 kHz, 20 C.]: 3.8 CLY-5-O2 3.0 .sub.|| [1 kHz, 20 C.]: 3.4 CPY-3-O2 7.0 .sub. [1 kHz, 20 C.]: 7.2 PGIY-2-O4 3.0 .sub.1 [mPa s, 20 C.]: 133 COB(S)-2-O4 12.0 K.sub.1 [pN, 20 C.]: 17.4 CC-3-V1 9.0 K.sub.3 [pN, 20 C.]: 16.5 CC-4-V1 19.0 LTS bulk [h, 20 C.]: 1000 CC-2-3 13.2 CY-3-O2 15.5 CCQU-3-F 0.3 100.0

[0415] Mixture M35

TABLE-US-00040 CCP-V-1 2.0 Clearing Point [ C.]: 74.5 CLY-3-O2 6.5 n [589 nm, 20 C.]: 0.0939 CLY-3-O3 4.0 n.sub.e [589 nm, 20 C.]: 1.5775 CPY-3-O2 12.0 n.sub.o [589 nm, 20 C.]: 1.4836 CC-3-V 50.5 [1 kHz, 20 C.]: 2.8 CY-3-O2 8.0 .sub.|| [1 kHz, 20 C.]: 3.4 COB(S)-2-O4 12.0 .sub. [1 kHz, 20 C.]: 6.2 PY-3-2 5.0 .sub.1 [mPa s, 20 C.]: 73 100.0 K.sub.1 [pN, 20 C.]: 13.1 K.sub.3 [pN, 20 C.]: 14.0 LTS bulk [h, 20 C.]: 672

[0416] Mixture M36

TABLE-US-00041 CCP-V-1 12.5 Clearing Point [ C.]: 83 CLY-3-O2 6.0 n [589 nm, 20 C.]: 0.0934 CLY-3-O3 2.0 n.sub.e [589 nm, 20 C.]: 1.5771 CPY-3-O2 9.0 n.sub.o [589 nm, 20 C.]: 1.4837 CC-3-V 25.0 [1 kHz, 20 C.]: 3.0 CY-3-O2 15.0 .sub.|| [1 kHz, 20 C.]: 3.3 COB(S)-2-O4 12.0 .sub. [1 kHz, 20 C.]: 6.3 CC-2-3 13.5 .sub.1 [mPa s, 20 C.]: 89 CC-3-V1 5.0 K.sub.1 [pN, 20 C.]: 14.7 100.0 K.sub.3 [pN, 20 C.]: 15.8 LTS bulk [h, 20 C.]: 120

[0417] Mixture M37

TABLE-US-00042 CCP-V-1 15.0 Clearing Point [ C.]: 83 CLY-3-O2 2.5 n [589 nm, 20 C.]: 0.0947 CLY-3-O3 6.0 n.sub.e [589 nm, 20 C.]: 1.5796 CPY-3-O2 8.0 n.sub.o [589 nm, 20 C.]: 1.4849 CC-3-V 25.0 [1 kHz, 20 C.]: 3.1 CY-3-O2 15.0 .sub.|| [1 kHz, 20 C.]: 3.4 COB(S)-2-O4 12.0 .sub. [1 kHz, 20 C.]: 6.5 CC-2-3 15.0 .sub.1 [mPa s, 20 C.]: 93 B(S)-2O-O5 1.5 K.sub.1 [pN, 20 C.]: 14.3 100.0 K.sub.3 [pN, 20 C.]: 15.1 LTS bulk [h, 20 C.]: 1000

[0418] Mixture M38

TABLE-US-00043 CCP-V-1 8.0 Clearing Point [ C.]: 82 CLY-3-O2 6.0 n [589 nm, 20 C.]: 0.0951 CLY-3-O3 6.0 n.sub.e [589 nm, 20 C.]: 1.5798 CCY-3-O2 6.0 n.sub.o [589 nm, 20 C.]: 1.4847 CPY-3-O2 5.0 [1 kHz, 20 C.]: 3.0 CC-3-V 43.5 .sub.|| [1 kHz, 20 C.]: 3.4 CY-3-O2 8.5 .sub. [1 kHz, 20 C.]: 6.4 COB(S)-2-O4 12.0 .sub.1 [mPa s, 20 C.]: 85 PY-3-2 5.0 K.sub.1 [pN, 20 C.]: 13.9 100.0 K.sub.3 [pN, 20 C.]: 15.2 LTS bulk [h, 20 C.]: 1

[0419] Mixture M39

TABLE-US-00044 CCP-3-1 5.5 Clearing Point [ C.]: 93.5 CCP-V-1 8.0 n [589 nm, 20 C.]: 0.1036 CLY-2-O4 2.5 n.sub.e [589 nm, 20 C.]: 1.5871 CLY-3-O2 4.0 n.sub.o [589 nm, 20 C.]: 1.4836 CLY-3-O3 3.0 [1 kHz, 20 C.]: 3.9 CLY-4-O2 3.0 .sub.|| [1 kHz, 20 C.]: 3.6 CLY-5-O2 3.0 .sub. [1 kHz, 20 C.]: 7.5 CPY-3-O2 4.0 .sub.1 [mPa s, 20 C.]: 122 PGIY-2-O4 3.5 K.sub.1 [pN, 20 C.]: 18.4 COB(S)-V-O4 12.0 K.sub.3 [pN, 20 C.]: 16.3 CC-3-V1 10.0 LTS bulk [h, 20 C.]: 1000 CC-4-V1 19.0 CC-3-4 7.7 CY-3-O2 6.0 Y-4O-O4 8.5 CCQU-3-F 0.3 100.0

[0420] Mixture M40

TABLE-US-00045 CCP-V-1 1.0 Clearing Point [ C.]: 73.5 CLY-3-O2 6.0 n [589 nm, 20 C.]: 0.0949 CLY-3-O3 3.5 n.sub.e [589 nm, 20 C.]: 1.5784 CPY-3-O2 12.0 n.sub.o [589 nm, 20 C.]: 1.4835 CC-3-V 50.0 [1 kHz, 20 C.]: 2.8 CY-3-O2 11.5 .sub.|| [1 kHz, 20 C.]: 3.4 PP-1-4 4.0 .sub. [1 kHz, 20 C.]: 6.2 COB(S)-2-O4 12.0 .sub.1 [mPa s, 20 C.]: 72 100.0 K.sub.1 [pN, 20 C.]: 13.1 K.sub.3 [pN, 20 C.]: 14.1 LTS bulk [h, 20 C.]: 1000

[0421] Mixture M41

TABLE-US-00046 CCP-V-1 3.5 Clearing Point [ C.]: 75 CLY-3-O2 3.5 n [589 nm, 20 C.]: 0.0942 CLY-3-O3 4.0 n.sub.e [589 nm, 20 C.]: 1.5777 CPY-3-O2 12.0 n.sub.o [589 nm, 20 C.]: 1.4835 CC-3-V 52.0 [1 kHz, 20 C.]: 2.8 CY-3-O2 8.0 .sub.|| [1 kHz, 20 C.]: 3.4 COB(S)-2-O4 12.0 .sub. [1 kHz, 20 C.]: 6.2 PY-2-O2 5.0 .sub.1 [mPa s, 20 C.]: 70 100.0 K.sub.1 [pN, 20 C.]: 13.1 K.sub.3 [pN, 20 C.]: 14.3 LTS bulk [h, 20 C.]: 1000

[0422] Mixture M42

TABLE-US-00047 CCP-3-1 3.0 Clearing Point [ C.]: 93 CCP-V-1 11.0 n [589 nm, 20 C.]: 0.1021 CLY-2-O4 2.0 n.sub.e [589 nm, 20 C.]: 1.5853 CLY-3-O2 4.0 n.sub.o [589 nm, 20 C.]: 1.4832 CLY-3-O3 3.5 [1 kHz, 20 C.]: 3.8 CLY-4-O2 3.0 .sub.|| [1 kHz, 20 C.]: 3.6 CLY-5-O2 4.5 .sub. [1 kHz, 20 C.]: 7.4 CPY-3-O2 4.0 .sub.1 [mPa s, 20 C.]: 125 PGIY-2-O4 3.5 K.sub.1 [pN, 20 C.]: 18.1 COB(S)-2-O4 11.0 K.sub.3 [pN, 20 C.]: 16.4 CC-3-V1 12.0 LTS bulk [h, 20 C.]: CC-4-V1 16.5 CC-3-4 7.7 CY-3-O2 5.0 Y-4O-O4 9.0 CCQU-3-F 0.3 100.0

[0423] Mixture M43

TABLE-US-00048 COB(S)-2-O4 12.0 Clearing Point [ C.]: 87 CC-3-V 30.5 n [589 nm, 20 C.]: 0.1087 CC-3-V1 9.0 n.sub.e [589 nm, 20 C.]: 1.5967 CCP-V-1 11.0 n.sub.o [589 nm, 20 C.]: 1.4880 CLY-3-O2 5.0 [1 kHz, 20 C.]: 3.0 CLY-4-O2 4.0 .sub.|| [1 kHz, 20 C.]: 3.4 CLY-5-O2 4.0 .sub. [1 kHz, 20 C.]: 6.4 CPY-3-O2 5.0 .sub.1 [mPa s, 20 C.]: 101 CY-3-O2 6.0 K.sub.1 [pN, 20 C.]: 15.3 PGIY-2-O4 6.5 K.sub.3 [pN, 20 C.]: 15.6 PY-3-2 7.0 LTS bulk [h, 20 C.]: 1000 100.0

[0424] Mixture M44

TABLE-US-00049 CCP-3-1 2.0 Clearing Point [ C.]: 93.5 CLY-2-O4 4.0 n [589 nm, 20 C.]: 0.1020 CLY-3-O2 4.0 n.sub.e [589 nm, 20 C.]: 1.5840 CLY-3-O3 3.0 n.sub.o [589 nm, 20 C.]: 1.4820 CLY-4-O2 4.0 [1 kHz, 20 C.]: 3.8 CLY-5-O2 4.0 .sub.|| [1 kHz, 20 C.]: 3.4 CPY-3-O2 4.0 .sub. [1 kHz, 20 C.]: 7.2 PGIY-2-O4 4.0 .sub.1 [mPa s, 20 C.]: 131 COB(S)-2-O4 12.0 K.sub.1 [pN, 20 C.]: 17.8 CC-3-V1 10.0 K.sub.3 [pN, 20 C.]: 16.9 CC-4-V1 18.5 LTS bulk [h, 20 C.]: CC-3-V 15.2 CY-3-O2 10.0 CY-5-O2 5.0 CCQU-3-F 0.3 100.0

[0425] Mixture M45

TABLE-US-00050 CC-3-V 27.0 Clearing Point [ C.]: 84 CC-3-V1 12.0 n [589 nm, 20 C.]: 0.0946 CCP-V-1 15.0 n.sub.e [589 nm, 20 C.]: 1.5785 CLY-3-O2 3.5 n.sub.o [589 nm, 20 C.]: 1.4839 CLY-4-O2 1.0 [1 kHz, 20 C.]: 3.3 CLY-5-O2 5.0 .sub.|| [1 kHz, 20 C.]: 3.4 CY-3-O2 6.5 .sub. [1 kHz, 20 C.]: 6.7 CY-3-O4 7.0 .sub.1 [mPa s, 20 C.]: 101 CY-5-O2 7.0 K.sub.1 [pN, 20 C.]: 15.0 COB(S)-2-O4 8.0 K.sub.3 [pN, 20 C.]: 16.1 COB(S)-2-O5 8.0 LTS bulk [h, 20 C.]: 960 100.0

[0426] Mixture M46

TABLE-US-00051 CCP-V-1 5.0 Clearing Point [ C.]: 76 CLY-3-O2 4.0 n [589 nm, 20 C.]: 0.0945 CPY-3-O2 9.0 n.sub.e [589 nm, 20 C.]: 1.5792 CC-3-V 52.0 n.sub.o [589 nm, 20 C.]: 1.4847 CY-3-O2 9.5 [1 kHz, 20 C.]: 2.7 PP-1-3 2.5 .sub.|| [1 kHz, 20 C.]: 3.3 COB(S)-2-O4 9.0 .sub. [1 kHz, 20 C.]: 6.0 COB(S)-2-O5 9.0 .sub.1 [mPa s, 20 C.]: 72 100.0 K.sub.1 [pN, 20 C.]: 13.6 K.sub.3 [pN, 20 C.]: 14.2 LTS bulk [h, 20 C.]: 1000

[0427] Mixture M47

TABLE-US-00052 CCP-V-1 2.0 Clearing Point [ C.]: 75.5 CLY-3-O2 4.5 n [589 nm, 20 C.]: 0.0957 CLY-3-O3 1.0 n.sub.e [589 nm, 20 C.]: 1.5795 CPY-3-O2 15.0 n.sub.o [589 nm, 20 C.]: 1.4838 CC-3-V 52.0 [1 kHz, 20 C.]: 2.7 CY-3-O2 11.0 .sub.|| [1 kHz, 20 C.]: 3.4 PP-1-3 2.5 .sub. [1 kHz, 20 C.]: 6.1 COB(S)-V-O4 12.0 .sub.1 [mPa s, 20 C.]: 70 100.0 K.sub.1 [pN, 20 C.]: 13.4 K.sub.3 [pN, 20 C.]: 14.8 LTS bulk [h, 20 C.]: 0

[0428] Mixture M48

TABLE-US-00053 COB(S)-2-O4 12.0 Clearing Point [ C.]: 87.5 CC-3-V 33.5 n [589 nm, 20 C.]: 0.1093 CC-3-V1 9.0 n.sub.e [589 nm, 20 C.]: 1.5965 CCP-V-1 11.0 n.sub.o [589 nm, 20 C.]: 1.4872 CLY-3-O2 3.0 [1 kHz, 20 C.]: 3.1 CLY-4-O2 4.0 .sub.|| [1 kHz, 20 C.]: 3.4 CLY-5-O2 3.0 .sub. [1 kHz, 20 C.]: 6.5 CPY-3-O2 5.5 .sub.1 [mPa s, 20 C.]: 99 CY-3-O2 5.0 K.sub.1 [pN, 20 C.]: 15.6 PGIY-2-O4 6.0 K.sub.3 [pN, 20 C.]: 16.3 PY-3-O2 8.0 LTS bulk [h, 20 C.]: 720 100.0

[0429] Mixture M49

TABLE-US-00054 PP-1-2V1 10.0 Clearing Point [ C.]: 76 CC-3-V1 3.5 n [589 nm, 20 C.]: 0.1014 CCH-301 20.0 n.sub.e [589 nm, 20 C.]: 1.5893 PCH-53 20.0 n.sub.o [589 nm, 20 C.]: 1.4879 COB(S)-2-O4 10.0 [1 kHz, 20 C.]: 3.1 CCY-3-O1 6.5 .sub.|| [1 kHz, 20 C.]: 3.4 CCY-3-O2 11.0 .sub. [1 kHz, 20 C.]: 6.5 CCY-3-O3 10.0 .sub.1 [mPa s, 20 C.]: CLY-3-O2 9.0 K.sub.1 [pN, 20 C.]: 15.2 100.0 K.sub.3 [pN, 20 C.]: 15.7 LTS bulk [h, 20 C.]:

[0430] Mixture M50

TABLE-US-00055 CC-3-V 27.5 Clearing Point [ C.]: 83 CC-3-V1 12.5 n [589 nm, 20 C.]: 0.0935 CCP-V-1 15.5 n.sub.e [589 nm, 20 C.]: 1.5777 CLY-3-O2 4.0 n.sub.o [589 nm, 20 C.]: 1.4842 CLY-4-O2 1.0 [1 kHz, 20 C.]: 3.2 CLY-5-O2 3.0 .sub.|| [1 kHz, 20 C.]: 3.4 CY-3-O2 6.5 .sub. [1 kHz, 20 C.]: 6.6 CY-3-O4 7.0 .sub.1 [mPa s, 20 C.]: 98 CY-5-O2 7.0 K.sub.1 [pN, 20 C.]: 14.7 COB(S)-2-O4 8.0 K.sub.3 [pN, 20 C.]: 15.9 COB(S)-2-O5 8.0 LTS bulk [h, 20 C.]: 1000 100.0

[0431] Mixture M51

TABLE-US-00056 B(S)-2O-O4 2.0 Clearing Point [ C.]: 104.5 B(S)-2O-O5 2.0 n [589 nm, 20 C.]: 0.1067 CC-3-V 32.0 n.sub.e [589 nm, 20 C.]: 1.5928 CC-3-V1 8.0 n.sub.o [589 nm, 20 C.]: 1.4861 CCP-3-1 7.0 [1 kHz, 20 C.]: 3.9 CCY-3-O2 5.5 .sub.|| [1 kHz, 20 C.]: 3.3 CLY-2-O4 4.0 .sub. [1 kHz, 20 C.]: 7.2 CLY-3-O2 6.0 .sub.1 [mPa s, 20 C.]: 141 CLY-3-O3 5.0 K.sub.1 [pN, 20 C.]: 19.7 CLY-4-O2 4.0 K.sub.3 [pN, 20 C.]: 18.8 CLY-5-O2 4.0 LTS bulk [h, 20 C.]: 1000 COB(S)-2-O4 10.0 CY-5-O2 5.0 PGIY-2-O4 5.5 100.0

[0432] Mixture M52

TABLE-US-00057 CC-3-V 28.0 Clearing Point [ C.]: 85.5 CC-3-V1 12.0 n [589 nm, 20 C.]: 0.0942 CCP-V-1 15.0 n.sub.e [589 nm, 20 C.]: 1.5786 CLY-3-O2 3.5 n.sub.o [589 nm, 20 C.]: 1.4844 CLY-4-O2 1.0 [1 kHz, 20 C.]: 3.2 CLY-5-O2 5.5 .sub.|| [1 kHz, 20 C.]: 3.3 CY-3-O2 5.0 .sub. [1 kHz, 20 C.]: 6.5 CY-3-O4 7.0 .sub.1 [mPa s, 20 C.]: 103 CY-5-O2 7.0 K.sub.1 [pN, 20 C.]: 15.2 COB(S)-2-O4 8.0 K.sub.3 [pN, 20 C.]: 16.3 COB(S)-2-O5 8.0 LTS bulk [h, 20 C.]: 1000 100.0

[0433] Mixture M53

TABLE-US-00058 CCP-V-1 2.0 Clearing Point [ C.]: 74.5 CLY-3-O2 4.5 n [589 nm, 20 C.]: 0.0947 CLY-3-O3 1.0 n.sub.e [589 nm, 20 C.]: 1.5788 CPY-2-O2 5.0 n.sub.o [589 nm, 20 C.]: 1.4841 CPY-3-O2 10.0 [1 kHz, 20 C.]: 2.7 CC-3-V 52.0 .sub.|| [1 kHz, 20 C.]: 3.4 CY-3-O2 11.0 .sub. [1 kHz, 20 C.]: 6.1 PP-1-3 2.5 .sub.1 [mPa s, 20 C.]: 68 COB(S)-V-O4 12.0 K.sub.1 [pN, 20 C.]: 13.0 100.0 K.sub.3 [pN, 20 C.]: 14.2 LTS bulk [h, 20 C.]: 24

[0434] Mixture M54

TABLE-US-00059 CCP-V-1 2.0 Clearing Point [ C.]: 74 CLY-3-O2 4.5 n [589 nm, 20 C.]: 0.0943 CLY-3-O3 1.0 n.sub.e [589 nm, 20 C.]: 1.5790 CPY-2-O2 5.0 n.sub.o [589 nm, 20 C.]: 1.4847 CPY-3-O2 10.0 [1 kHz, 20 C.]: 2.7 CC-3-V 52.0 .sub.|| [1 kHz, 20 C.]: 3.4 CY-3-O2 11.0 .sub. [1 kHz, 20 C.]: 6.1 PP-1-3 2.5 .sub.1 [mPa s, 20 C.]: 68 COB(S)-V-O4 8.0 K.sub.1 [pN, 20 C.]: 12.9 COB(S)-2-O4 4.0 K.sub.3 [pN, 20 C.]: 14.2 100.0 LTS bulk [h, 20 C.]: 192

[0435] Mixture M55

TABLE-US-00060 CC-3-V 28.0 Clearing Point [ C.]: 84 CC-3-V1 12.0 n [589 nm, 20 C.]: 0.0957 CCP-V-1 16.0 n.sub.e [589 nm, 20 C.]: 1.5817 CLY-3-O2 1.0 n.sub.o [589 nm, 20 C.]: 1.4860 CLY-4-O2 2.0 [1 kHz, 20 C.]: 3.3 CLY-5-O2 2.0 .sub.|| [1 kHz, 20 C.]: 3.4 CY-3-O2 5.0 .sub. [1 kHz, 20 C.]: 6.7 CY-3-O4 7.0 .sub.1 [mPa s, 20 C.]: 101 CY-5-O2 7.0 K.sub.1 [pN, 20 C.]: 14.9 COB(S)-2-O4 10.0 K.sub.3 [pN, 20 C.]: 15.6 COB(S)-2-O5 10.0 LTS bulk [h, 20 C.]: 384 100.0

[0436] Mixture M56

TABLE-US-00061 CC-3-V 28.0 Clearing Point [ C.]: 84.5 CC-3-V1 12.0 n [589 nm, 20 C.]: 0.0961 CCP-V-1 16.0 n.sub.e [589 nm, 20 C.]: 1.5823 CLY-3-O2 1.0 n.sub.o [589 nm, 20 C.]: 1.4862 CLY-4-O2 2.0 [1 kHz, 20 C.]: 3.4 CLY-5-O2 2.0 .sub.|| [1 kHz, 20 C.]: 3.4 CY-3-O2 5.0 .sub. [1 kHz, 20 C.]: 6.8 CY-3-O4 7.0 .sub.1 [mPa s, 20 C.]: 100 CY-5-O2 7.0 K.sub.1 [pN, 20 C.]: 15.0 COB(S)-2-O4 8.0 K.sub.3 [pN, 20 C.]: 15.6 COB(S)-2-O5 8.0 LTS bulk [h, 20 C.]: 1000 COB(S)-V-O4 4.0 100.0

[0437] Mixture M57

TABLE-US-00062 B(S)-2O-O4 2.0 Clearing Point [ C.]: 77 B(S)-2O-O5 2.0 n [589 nm, 20 C.]: 0.1005 CC-3-V 50.0 n.sub.e [589 nm, 20 C.]: 1.5862 CLY-2-O4 4.5 n.sub.o [589 nm, 20 C.]: 1.4857 CLY-3-O2 5.5 [1 kHz, 20 C.]: 3.5 CLY-3-O3 5.0 .sub.|| [1 kHz, 20 C.]: 3.6 CLY-4-O2 3.5 .sub. [1 kHz, 20 C.]: 7.1 CLY-5-O2 4.0 .sub.1 [mPa s, 20 C.]: 81 COB(S)-2-O4 10.0 K.sub.1 [pN, 20 C.]: 15.4 PGIY-2-O4 2.0 K.sub.3 [pN, 20 C.]: 14.2 PY-1-O2 5.5 LTS bulk [h, 20 C.]: 1000 PY-3-O2 6.0 100.0

[0438] Mixture M58

TABLE-US-00063 CC-3-V 51.0 Clearing Point [ C.]: 76.5 CLY-2-O4 4.0 n [589 nm, 20 C.]: 0.1016 CLY-3-O2 6.0 n.sub.e [589 nm, 20 C.]: 1.5875 CLY-3-O3 5.0 n.sub.o [589 nm, 20 C.]: 1.4859 CLY-4-O2 3.0 [1 kHz, 20 C.]: 3.5 CLY-5-O2 3.0 .sub.|| [1 kHz, 20 C.]: 3.5 CPY-3-O2 1.5 .sub. [1 kHz, 20 C.]: 7.0 PY-1-O2 10.0 .sub.1 [mPa s, 20 C.]: 78 PGIY-2-O4 3.0 K.sub.1 [pN, 20 C.]: 14.6 COB(S)-2-O4 7.5 K.sub.3 [pN, 20 C.]: 14.3 B(S)-2O-O4 3.0 LTS bulk [h, 20 C.]: 1000 B(S)-2O-O5 3.0 100.0

[0439] Mixture M59

TABLE-US-00064 CC-3-V 38.5 Clearing Point [ C.]: 87 CC-3-V1 2.0 n [589 nm, 20 C.]: 0.0925 CCP-V-1 16.0 n.sub.e [589 nm, 20 C.]: 1.5778 CCY-3-O2 10.0 n.sub.o [589 nm, 20 C.]: 1.4853 CCY-5-O2 2.0 [1 kHz, 20 C.]: 3.2 COB(S)-2-O4 10.0 .sub.|| [1 kHz, 20 C.]: 3.4 CY-3-O2 15.5 .sub. [1 kHz, 20 C.]: 6.6 COB(S)-V-O4 6.0 .sub.1 [mPa s, 20 C.]: 93 100.0 K.sub.1 [pN, 20 C.]: 14.5 K.sub.3 [pN, 20 C.]: 16.5 LTS bulk [h, 20 C.]: 48

[0440] Mixture M60

TABLE-US-00065 CCP-3-1 5.5 Clearing Point [ C.]: 93 CCP-V-1 8.0 n [589 nm, 20 C.]: 0.1022 CLY-2-O4 2.5 n.sub.e [589 nm, 20 C.]: 1.5863 CLY-3-O2 4.0 n.sub.o [589 nm, 20 C.]: 1.4841 CLY-3-O3 3.0 [1 kHz, 20 C.]: 3.8 CLY-4-O2 3.0 .sub.|| [1 kHz, 20 C.]: 3.6 CLY-5-O2 3.0 .sub. [1 kHz, 20 C.]: 7.5 CPY-3-O2 4.0 .sub.1 [mPa s, 20 C.]: 125 PGIY-2-O4 3.5 K.sub.1 [pN, 20 C.]: 18.4 COB(S)-2-O4 12.0 K.sub.3 [pN, 20 C.]: 16.2 CC-3-V1 10.0 LTS bulk [h, 20 C.]: 1000 CC-4-V1 19.0 CC-3-4 7.7 CY-3-O2 6.0 Y-4O-O4 8.5 CCQU-3-F 0.3 100.0

[0441] Mixture M61

TABLE-US-00066 CC-3-V 27.0 Clearing Point [ C.]: 85 CC-3-V1 12.0 n [589 nm, 20 C.]: 0.0955 CCP-V-1 15.0 n.sub.e [589 nm, 20 C.]: 1.5808 CLY-3-O2 3.5 n.sub.o [589 nm, 20 C.]: 1.4853 CLY-4-O2 1.0 [1 kHz, 20 C.]: 3.4 CLY-5-O2 5.0 .sub.|| [1 kHz, 20 C.]: 3.4 CY-3-O2 6.5 .sub. [1 kHz, 20 C.]: 6.8 CY-3-O4 7.0 .sub.1 [mPa s, 20 C.]: 101 CY-5-O2 7.0 K.sub.1 [pN, 20 C.]: 15.1 COB(S)-2-O4 8.0 K.sub.3 [pN, 20 C.]: 16.4 COB(S)-V-O4 8.0 LTS bulk [h, 20 C.]: 48 100.0

[0442] Mixture M62

TABLE-US-00067 CCP-3-1 9.5 Clearing Point [ C.]: 79 CCY-2-1 1.5 n [589 nm, 20 C.]: 0.1018 CCY-3-O2 8.5 n.sub.e [589 nm, 20 C.]: 1.5858 CCY-4-O2 4.5 n.sub.o [589 nm, 20 C.]: 1.4840 CPY-3-O2 5.5 [1 kHz, 20 C.]: 3.6 PYP-2-3 10.0 .sub.|| [1 kHz, 20 C.]: 3.7 COB(S)-2-O4 10.0 .sub. [1 kHz, 20 C.]: 7.2 CC-3-V1 6.0 .sub.1 [mPa s, 20 C.]: 110 CC-4-V1 7.5 K.sub.1 [pN, 20 C.]: 15.2 CC-2-3 18.0 K.sub.3 [pN, 20 C.]: 14.2 CC-3-5 4.0 LTS bulk [h, 20 C.]: 1000 CY-3-O2 5.5 Y-4O-O4 9.5 100.0

[0443] Mixture M63

TABLE-US-00068 CCP-V-1 5.0 Clearing Point [ C.]: 93 CCP-3-1 5.0 n [589 nm, 20 C.]: 0.1016 CLY-2-O4 4.0 n.sub.e [589 nm, 20 C.]: 1.5866 CLY-3-O2 3.0 n.sub.o [589 nm, 20 C.]: 1.4850 CLY-3-O3 4.0 [1 kHz, 20 C.]: 3.9 PGIY-2-O4 3.0 .sub.|| [1 kHz, 20 C.]: 3.4 COB(S)-2-O4 12.0 .sub. [1 kHz, 20 C.]: 7.3 COB(S)-V-O4 7.0 .sub.1 [mPa s, 20 C.]: 132 CC-3-V1 9.0 K.sub.1 [pN, 20 C.]: 17.9 CC-4-V1 19.0 K.sub.3 [pN, 20 C.]: 15.9 CC-2-3 13.2 LTS bulk [h, 20 C.]: 0 CY-3-O2 15.5 CCQU-3-F 0.3 100.0

[0444] Mixture M64

TABLE-US-00069 CCP-3-1 12.0 Clearing Point [ C.]: 92 CCP-V-1 8.0 n [589 nm, 20 C.]: 0.1010 CLY-2-O4 3.7 n.sub.e [589 nm, 20 C.]: 1.5860 CLY-3-O2 3.0 n.sub.o [589 nm, 20 C.]: 1.4850 PGIY-2-O4 1.5 [1 kHz, 20 C.]: 3.9 COB(S)-2-O4 12.0 .sub.|| [1 kHz, 20 C.]: 3.6 COB(S)-V-O4 7.5 .sub. [1 kHz, 20 C.]: 7.5 CC-3-V1 10.0 .sub.1 [mPa s, 20 C.]: 118 CC-4-V1 19.0 K.sub.1 [pN, 20 C.]: 18.8 CC-3-4 7.5 K.sub.3 [pN, 20 C.]: 15.8 CY-3-O2 7.0 LTS bulk [h, 20 C.]: 0 Y-4O-O4 8.5 CCQU-3-F 0.3 100.0

[0445] Mixture M65

TABLE-US-00070 CC-3-V 49.0 Clearing Point [ C.]: 76.5 CLY-2-O4 4.0 n [589 nm, 20 C.]: 0.1012 CLY-3-O2 6.0 n.sub.e [589 nm, 20 C.]: 1.5870 CLY-3-O3 5.0 n.sub.o [589 nm, 20 C.]: 1.4858 CLY-4-O2 4.0 [1 kHz, 20 C.]: 3.5 CLY-5-O2 4.0 .sub.|| [1 kHz, 20 C.]: 3.5 PY-1-O2 9.0 .sub. [1 kHz, 20 C.]: 7.1 CY-3-O2 2.5 .sub.1 [mPa s, 20 C.]: 79 PYP-2-3 3.0 K.sub.1 [pN, 20 C.]: 14.3 COB(S)-2-O4 7.5 K.sub.3 [pN, 20 C.]: 14.2 B(S)-2O-O4 3.0 LTS bulk [h, 20 C.]: 1000 B(S)-2O-O5 3.0 100.0

[0446] Mixture M66

TABLE-US-00071 CCP-V-1 8.0 Clearing Point [ C.]: 90 CLY-3-O2 6.0 n [589 nm, 20 C.]: 0.0926 CLY-3-O3 6.0 n.sub.e [589 nm, 20 C.]: 1.5773 CLY-4-O2 5.0 n.sub.o [589 nm, 20 C.]: 1.4847 CC-3-V 44.5 [1 kHz, 20 C.]: 3.3 CY-3-O2 11.0 .sub.|| [1 kHz, 20 C.]: 3.3 COB(S)-2-O4 12.0 .sub. [1 kHz, 20 C.]: 6.7 COB(S)-2-O5 2.5 .sub.1 [mPa s, 20 C.]: 98 CLY-5-O2 5.0 K.sub.1 [pN, 20 C.]: 15.5 100.0 K.sub.3 [pN, 20 C.]: 16.3 LTS bulk [h, 20 C.]: 528

[0447] Mixture M67

TABLE-US-00072 CCP-3-1 12.0 Clearing Point [ C.]: 90.5 CCP-V-1 8.0 n [589 nm, 20 C.]: 0.1031 CLY-2-O4 3.0 n.sub.e [589 nm, 20 C.]: 1.5887 CLY-3-O2 3.0 n.sub.o [589 nm, 20 C.]: 1.4856 CLY-3-O3 2.2 [1 kHz, 20 C.]: 3.8 PGIY-2-O4 4.5 .sub.|| [1 kHz, 20 C.]: 3.6 COB(S)-2-O4 16.0 .sub. [1 kHz, 20 C.]: 7.4 CC-3-V1 10.0 .sub.1 [mPa s, 20 C.]: 121 CC-4-V1 19.0 K.sub.1 [pN, 20 C.]: 18.1 CC-3-4 5.5 K.sub.3 [pN, 20 C.]: 15.6 CY-3-O2 8.0 LTS bulk [h, 20 C.]: 144 Y-4O-O4 8.5 CCQU-3-F 0.3 100.0

[0448] Mixture M68

TABLE-US-00073 CCP-3-1 11.5 Clearing Point [ C.]: 92 CCP-V-1 8.0 n [589 nm, 20 C.]: 0.1024 CLY-2-O4 3.0 n.sub.e [589 nm, 20 C.]: 1.5879 CLY-3-O2 3.0 n.sub.o [589 nm, 20 C.]: 1.4855 CLY-3-O3 2.5 [1 kHz, 20 C.]: 3.9 PGIY-2-O4 3.2 .sub.|| [1 kHz, 20 C.]: 3.6 COB(S)-2-O4 10.0 .sub. [1 kHz, 20 C.]: 7.5 COB(S)-V-O4 7.5 .sub.1 [mPa s, 20 C.]: 121 CC-3-V1 9.0 K.sub.1 [pN, 20 C.]: 18.6 CC-4-V1 19.0 K.sub.3 [pN, 20 C.]: 15.8 CC-3-4 7.5 LTS bulk [h, 20 C.]: 0 CY-3-O2 7.0 Y-4O-O4 8.5 CCQU-3-F 0.3 100.0

[0449] Mixture M6

TABLE-US-00074 CC-3-V 44.0 Clearing Point [ C.]: 84 CC-3-V1 0.5 n [589 nm, 20 C.]: 0.0931 CCP-V-1 11.0 n.sub.e [589 nm, 20 C.]: 1.5778 CCY-3-O2 3.0 n.sub.o [589 nm, 20 C.]: 1.4847 CLY-3-O2 9.0 [1 kHz, 20 C.]: 3.2 CPY-3-O2 2.5 .sub.|| [1 kHz, 20 C.]: 3.4 CY-3-O2 10.0 .sub. [1 kHz, 20 C.]: 6.6 CY-3-O4 4.0 .sub.1 [mPa s, 20 C.]: 88 COB(S)-2-O4 12.0 K.sub.1 [pN, 20 C.]: 14.5 COB(S)-V-O4 4.0 K.sub.3 [pN, 20 C.]: 15.8 100.0 LTS bulk [h, 20 C.]: 72

[0450] Mixture M70

TABLE-US-00075 CC-3-V 38.0 Clearing Point [ C.]: 83.5 CC-3-V1 4.0 n [589 nm, 20 C.]: 0.0930 CCP-V-1 13.0 n.sub.e [589 nm, 20 C.]: 1.5774 CLY-3-O2 9.0 n.sub.o [589 nm, 20 C.]: 1.4844 CLY-4-O2 3.0 [1 kHz, 20 C.]: 3.3 CY-3-O2 11.0 .sub.|| [1 kHz, 20 C.]: 3.4 CY-5-O2 6.0 .sub. [1 kHz, 20 C.]: 6.6 COB(S)-2-O4 8.0 .sub.1 [mPa s, 20 C.]: 93 COB(S)-2-O5 8.0 K.sub.1 [pN, 20 C.]: 14.6 100.0 K.sub.3 [pN, 20 C.]: 15.8 LTS bulk [h, 20 C.]: 96

[0451] Mixture M71

TABLE-US-00076 CCP-V-1 2.0 Clearing Point [ C.]: 74 CLY-3-O2 4.5 n [589 nm, 20 C.]: 0.0942 CLY-3-O3 1.0 n.sub.e [589 nm, 20 C.]: 1.5770 CPY-3-O2 15.0 n.sub.o [589 nm, 20 C.]: 1.4828 CC-3-V 50.0 [1 kHz, 20 C.]: 3.0 CY-3-O2 14.0 .sub.|| [1 kHz, 20 C.]: 3.4 PP-1-3 1.5 .sub. [1 kHz, 20 C.]: 6.4 COB(S)-2-O4 12.0 .sub.1 [mPa s, 20 C.]: 73 100.0 K.sub.1 [pN, 20 C.]: 13.1 K.sub.3 [pN, 20 C.]: 14.6 LTS bulk [h, 20 C.]: 72

[0452] Mixture M72

TABLE-US-00077 CCP-V-1 1.0 Clearing Point [ C.]: 74 CLY-3-O2 5.5 n [589 nm, 20 C.]: 0.0947 CLY-3-O3 1.0 n.sub.e [589 nm, 20 C.]: 1.5768 CPY-3-O2 15.0 n.sub.o [589 nm, 20 C.]: 1.4821 CC-3-V 49.0 [1 kHz, 20 C.]: 3.3 CY-3-O2 15.5 .sub.|| [1 kHz, 20 C.]: 3.5 PP-1-3 1.0 .sub. [1 kHz, 20 C.]: 6.7 COB(S)-2-O4 12.0 .sub.1 [mPa s, 20 C.]: 76 100.0 K.sub.1 [pN, 20 C.]: 13.0 K.sub.3 [pN, 20 C.]: 14.6 LTS bulk [h, 20 C.]: 0

[0453] Mixture M73

TABLE-US-00078 CCP-V-1 1.0 Clearing Point [ C.]: 73.5 CLY-3-O2 6.0 n [589 nm, 20 C.]: 0.0951 CLY-3-O3 3.5 n.sub.e [589 nm, 20 C.]: 1.5789 CPY-3-O2 12.0 n.sub.o [589 nm, 20 C.]: 1.4838 CC-3-V 50.0 [1 kHz, 20 C.]: 2.8 CY-3-O2 11.5 .sub.|| [1 kHz, 20 C.]: 3.4 PP-1-3 4.0 .sub. [1 kHz, 20 C.]: 6.2 COB(S)-2-O4 12.0 .sub.1 [mPa s, 20 C.]: 72 100.0 K.sub.1 [pN, 20 C.]: 13.3 K.sub.3 [pN, 20 C.]: 14.3 LTS bulk [h, 20 C.]: 120

[0454] Mixture M74

TABLE-US-00079 CCY-2-1 6.5 Clearing Point [ C.]: 81 CCY-3-O2 2.5 n [589 nm, 20 C.]: 0.1020 CLY-2-O4 5.0 n.sub.e [589 nm, 20 C.]: 1.5860 CLY-3-O2 5.0 n.sub.o [589 nm, 20 C.]: 1.4840 CLY-3-O3 5.0 [1 kHz, 20 C.]: 3.6 PYP-2-3 10.0 .sub.|| [1 kHz, 20 C.]: 3.4 COB(S)-2-O4 10.0 .sub. [1 kHz, 20 C.]: 7.0 CC-3-V1 6.0 .sub.1 [mPa s, 20 C.]: 119 CC-4-V1 15.0 K.sub.1 [pN, 20 C.]: 15.1 CC-2-3 18.0 K.sub.3 [pN, 20 C.]: 14.1 CY-3-O2 15.0 LTS bulk [h, 20 C.]: 1 CY-3-O4 2.0 100.0

[0455] Mixture M75

TABLE-US-00080 CPP-3-2 2.5 Clearing Point [ C.]: 81.5 CC-3-V1 8.0 n [589 nm, 20 C.]: 0.0914 CC-4-V1 20.0 n.sub.e [589 nm, 20 C.]: 1.5718 CC-2-3 18.0 n.sub.o [589 nm, 20 C.]: 1.4804 CCH-301 3.0 [1 kHz, 20 C.]: 3.3 CLY-3-O2 9.0 .sub.|| [1 kHz, 20 C.]: 3.2 CLY-3-O3 6.0 .sub. [1 kHz, 20 C.]: 6.6 CLY-4-O2 4.0 .sub.1 [mPa s, 20 C.]: 102 COB(S)-2-O4 12.0 K.sub.1 [pN, 20 C.]: 15.8 CY-3-O2 14.5 K.sub.3 [pN, 20 C.]: 14.5 PY-3-O2 3.0 LTS bulk [h, 20 C.]: 96 100.0

[0456] Mixture M76

TABLE-US-00081 CCP-V-1 8.0 Clearing Point [ C.]: 90 CLY-3-O2 6.0 n [589 nm, 20 C.]: 0.0938 CLY-3-O3 6.0 n.sub.e [589 nm, 20 C.]: 1.5777 CLY-4-O2 5.0 n.sub.o [589 nm, 20 C.]: 1.4839 CLY-5-O2 6.0 [1 kHz, 20 C.]: 3.4 CPY-3-O2 2.0 .sub.|| [1 kHz, 20 C.]: 3.3 CC-3-V 43.0 .sub. [1 kHz, 20 C.]: 6.7 CY-3-O2 12.0 .sub.1 [mPa s, 20 C.]: 100 COB(S)-2-O4 12.0 K.sub.1 [pN, 20 C.]: 15.5 100.0 K.sub.3 [pN, 20 C.]: 16.7 LTS bulk [h, 20 C.]: 1000

[0457] Mixture M77

TABLE-US-00082 CCP-V-1 8.0 Clearing Point [ C.]: 86 CLY-3-O2 5.0 n [589 nm, 20 C.]: 0.0936 CLY-3-O3 6.0 n.sub.e [589 nm, 20 C.]: 1.5772 CLY-4-O2 6.0 n.sub.o [589 nm, 20 C.]: 1.4836 CLY-5-O2 5.5 [1 kHz, 20 C.]: 3.4 CC-3-V 43.0 .sub.|| [1 kHz, 20 C.]: 3.4 CY-3-O2 12.0 .sub. [1 kHz, 20 C.]: 6.7 PY-3-O2 2.5 .sub.1 [mPa s, 20 C.]: 95 COB(S)-2-O4 12.0 K.sub.1 [pN, 20 C.]: 14.9 100.0 K.sub.3 [pN, 20 C.]: 15.9 LTS bulk [h, 20 C.]: 240

[0458] Mixture M78

TABLE-US-00083 CCP-V-1 8.0 Clearing Point [ C.]: 87.5 CLY-3-O2 5.0 n [589 nm, 20 C.]: 0.0943 CLY-3-O3 6.0 n.sub.e [589 nm, 20 C.]: 1.5787 CLY-4-O2 6.0 n.sub.o [589 nm, 20 C.]: 1.4844 CLY-5-O2 5.5 [1 kHz, 20 C.]: 3.4 CC-3-V 43.0 .sub.|| [1 kHz, 20 C.]: 3.4 CY-3-O2 12.0 .sub. [1 kHz, 20 C.]: 6.8 PY-3-O2 2.5 .sub.1 [mPa s, 20 C.]: 92 COB(S)-V-O4 12.0 K.sub.1 [pN, 20 C.]: 14.9 100.0 K.sub.3 [pN, 20 C.]: 16.1 LTS bulk [h, 20 C.]: 48

[0459] Mixture M79

TABLE-US-00084 CC-3-V1 8.0 Clearing Point [ C.]: 73 CC-4-V1 20.0 n [589 nm, 20 C.]: 0.1029 CCH-301 10.5 n.sub.e [589 nm, 20 C.]: 1.5861 CCH-303 2.0 n.sub.o [589 nm, 20 C.]: 1.4832 CC-3-4 0.5 [1 kHz, 20 C.]: 3.1 CCY-3-O2 11.0 .sub.|| [1 kHz, 20 C.]: 3.6 COB(S)-2-O4 7.5 .sub. [1 kHz, 20 C.]: 6.7 CLP-3-T 1.0 .sub.1 [mPa s, 20 C.]: 106 CPY-3-O2 10.5 K.sub.1 [pN, 20 C.]: 15.8 CY-3-O2 15.5 K.sub.3 [pN, 20 C.]: 16.3 CY-3-O4 3.5 LTS bulk [h, 20 C.]: 1000 PP-1-2V1 10.0 100.0

[0460] Mixture M80

TABLE-US-00085 CC-3-V1 8.0 Clearing Point [ C.]: 73 CC-4-V1 20.0 n [589 nm, 20 C.]: 0.1031 CCH-301 11.5 n.sub.e [589 nm, 20 C.]: 1.5871 CCH-303 2.0 n.sub.o [589 nm, 20 C.]: 1.4840 CC-3-4 3.0 [1 kHz, 20 C.]: 3.0 CCY-3-O2 7.0 .sub.|| [1 kHz, 20 C.]: 3.4 COB(S)-2-O4 7.5 .sub. [1 kHz, 20 C.]: 6.5 CPY-2-O2 8.0 .sub.1 [mPa s, 20 C.]: 101 CPY-3-O2 8.0 K.sub.1 [pN, 20 C.]: 14.6 CY-3-O2 16.0 K.sub.3 [pN, 20 C.]: 15.2 PP-1-2V1 9.0 LTS bulk [h, 20 C.]: 1000 100.0

[0461] Mixture M81

TABLE-US-00086 CCP-V-1 7.0 Clearing Point [ C.]: 86 CLY-3-O2 6.0 n [589 nm, 20 C.]: 0.0932 CLY-3-O3 6.0 n.sub.e [589 nm, 20 C.]: 1.5767 CLY-4-O2 6.0 n.sub.o [589 nm, 20 C.]: 1.4835 CLY-5-O2 6.0 [1 kHz, 20 C.]: 3.3 CC-3-V 43.0 .sub.|| [1 kHz, 20 C.]: 3.4 CY-3-O2 12.0 .sub. [1 kHz, 20 C.]: 6.7 PY-3-O2 2.5 .sub.1 [mPa s, 20 C.]: 95 COB(S)-2-O4 10.0 K.sub.1 [pN, 20 C.]: 15.1 CPY-3-O2 1.5 K.sub.3 [pN, 20 C.]: 16.1 100.0 LTS bulk [h, 20 C.]: 1000

[0462] Mixture M82

TABLE-US-00087 B(S)-2O-O4 2.0 Clearing Point [ C.]: 85.5 B(S)-2O-O5 4.0 n [589 nm, 20 C.]: 0.0937 CC-3-V 37.0 n.sub.e [589 nm, 20 C.]: 1.5783 CC-3-V1 3.0 n.sub.o [589 nm, 20 C.]: 1.4846 CCP-V-1 14.5 [1 kHz, 20 C.]: 3.3 CCY-3-O2 11.5 .sub.|| [1 kHz, 20 C.]: 3.5 CCY-5-O2 3.0 .sub. [1 kHz, 20 C.]: 6.8 COB(S)-2-O4 10.0 .sub.1 [mPa s, 20 C.]: 94 CY-3-O2 14.0 K.sub.1 [pN, 20 C.]: 14.9 CLP-3-T 1.0 K.sub.3 [pN, 20 C.]: 16.6 100.0 LTS bulk [h, 20 C.]: 1

[0463] Mixture M83

TABLE-US-00088 CCP-V-1 10.0 Clearing Point [ C.]: 84 CLY-3-O2 6.0 n [589 nm, 20 C.]: 0.0938 CLY-3-O3 6.0 n.sub.e [589 nm, 20 C.]: 1.5783 CLY-4-O2 6.0 n.sub.o [589 nm, 20 C.]: 1.4845 CC-3-V 43.0 [1 kHz, 20 C.]: 3.2 CY-3-O2 10.0 .sub.|| [1 kHz, 20 C.]: 3.4 PY-3-O2 4.0 .sub. [1 kHz, 20 C.]: 6.6 COB(S)-2-O4 12.0 .sub.1 [mPa s, 20 C.]: 91 CCY-3-O2 3.0 K.sub.1 [pN, 20 C.]: 14.9 100.0 K.sub.3 [pN, 20 C.]: 15.9 LTS bulk [h, 20 C.]: 168

[0464] Mixture M84

TABLE-US-00089 CCP-V-1 2.5 Clearing Point [ C.]: 83.5 CCY-3-O1 8.0 n [589 nm, 20 C.]: 0.0936 CLY-3-O3 6.0 n.sub.e [589 nm, 20 C.]: 1.5773 CPY-2-O2 12.0 n.sub.o [589 nm, 20 C.]: 1.4837 CPY-3-O2 2.0 [1 kHz, 20 C.]: 3.1 CC-3-V 49.5 .sub.|| [1 kHz, 20 C.]: 3.4 CY-3-O2 8.0 .sub. [1 kHz, 20 C.]: 6.5 COB(S)-2-O4 12.0 .sub.1 [mPa s, 20 C.]: 86 100.0 K.sub.1 [pN, 20 C.]: 14.0 K.sub.3 [pN, 20 C.]: 14.9 LTS bulk [h, 20 C.]: 168

[0465] The preceding examples can be repeated with similar success by substituting the generically or specifically described reactants and/or operating conditions of this invention for those used in the preceding examples.

[0466] Without further elaboration, it is believed that one skilled in the art can, using the preceding description, utilize the present invention to its fullest extent. The preceding preferred specific embodiments are, therefore, to be construed as merely illustrative, and not limitative of the remainder of the disclosure in any way whatsoever. From the description, one skilled in the art can easily ascertain the essential characteristics of this invention and, without departing from the spirit and scope thereof, can make various changes and modifications of the invention to adapt it to various usages and conditions.

[0467] The entire disclosures of all applications, patents and publications, cited herein and of corresponding European application No. EP 18197231.6, filed Sep. 27, 2018, are incorporated by reference herein.