Method for manufacturing semiconductor chips

10607962 ยท 2020-03-31

Assignee

Inventors

Cpc classification

International classification

Abstract

A method for manufacturing semiconductor chips (2, 3) having arranged thereon metallic shaped bodies (6), having the following steps: arranging a plurality of metallic shaped bodies (6) on a processed semiconductor wafer while forming a layer arranged between the semiconductor wafer and the metallic shaped bodies (6), exhibiting a first connection material (4) and a second connection material (5), and processing the first connection material (4) for connecting the metallic shaped bodies (6) to the semiconductor wafer without processing the second connecting material (5), wherein the semiconductor chips (2, 3) are separated either prior to arranging the metallic shaped bodies (6) on the semiconductor wafer or after processing the first connection material (4).

Claims

1. A method for manufacturing semiconductor chips having arranged thereon metallic shaped bodies, having the following steps: arranging a plurality of metallic shaped bodies on a processed semiconductor wafer while forming a layer arranged between the semiconductor wafer and the metallic shaped body, exhibiting a first connection material and a second connection material, and processing the first connection material for connecting the metallic shaped bodies to the semiconductor wafer without processing the second connecting material, wherein the semiconductor chips are separated either prior to arranging the metallic shaped bodies on the semiconductor wafer or after processing the first connection material.

2. The method according to claim 1, wherein the first connection material is an adhesive and the second connection material is a solder material or a sintering material or the first connection material is a solder material and the second connection material is a sintering material.

3. The method according to claim 2, wherein separating the semiconductor chips takes place prior to arranging the metallic shaped bodies on the processed semiconductor wafer using a wet cutting method.

4. The method according to claim 2, wherein separating the semiconductor chips takes place after processing the first connection material using a dry cutting method.

5. A method for manufacturing a semiconductor module exhibiting a substrate and a semiconductor chip having arranged thereon a metallic shaped body, having the following steps: manufacturing a semiconductor chip having arranged thereon a metallic shaped body according to claim 2, arranging the semiconductor chip on the substrate while forming a layer of a third connection material arranged between the semiconductor chip and the substrate, and processing the layer arranged between the semiconductor chip on the substrate and the layer arranged between the metallic shaped body and the semiconductor chip in one step.

6. The method according to claim 1, wherein separating the semiconductor chips takes place prior to arranging the metallic shaped bodies on the processed semiconductor wafer using a wet cutting method.

7. A method for manufacturing a semiconductor module exhibiting a substrate and a semiconductor chip having arranged thereon a metallic shaped body , having the following steps: manufacturing a semiconductor chip having arranged thereon a metallic shaped body according to claim 6, arranging the semiconductor chip on the substrate while forming a layer of a third connection material arranged between the semiconductor chip and the substrate, and processing the layer arranged between the semiconductor chip on the substrate and the layer arranged between the metallic shaped body and the semiconductor chip in one step.

8. The method according to claim 1, wherein separating the semiconductor chips takes place after processing the first connection material using a dry cutting method.

9. A method for manufacturing a semiconductor module exhibiting a substrate and a semiconductor chip having arranged thereon a metallic shaped body , having the following steps: manufacturing a semiconductor chip having arranged thereon a metallic shaped body according to claim 8, arranging the semiconductor chip on the substrate while forming a layer of a third connection material arranged between the semiconductor chip and the substrate, and processing the layer arranged between the semiconductor chip on the substrate and the layer arranged between the metallic shaped body and the semiconductor chip in one step.

10. A method for manufacturing a semiconductor module exhibiting a substrate and a semiconductor chip having arranged thereon a metallic shaped body, having the following steps: manufacturing a semiconductor chip having arranged thereon a metallic shaped body according to claim 1, arranging the semiconductor chip on the substrate while forming a layer of a third connection material arranged between the semiconductor chip and the substrate, and processing the layer arranged between the semiconductor chip and the substrate and the layer arranged between the metallic shaped body and the semiconductor chip in one step.

11. The method according to claim 10, wherein the second connection material and the third connection material are identical.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

(1) The invention is explained in more detail below using an exemplary embodiment illustrated in the attached drawings and having a particularly preferred configuration. In the drawings:

(2) FIG. 1 shows a sectional view through a wafer having separate chips during the population process using metal shaped bodies;

(3) FIG. 2 shows a sectional view through the wafer from FIG. 1 with separate chips and metal shaped bodies fastened thereon; and

(4) FIG. 3 shows a sectional view of the wafer from FIG. 2 during the population process of the chips on a substrate.

(5) FIG. 4 shows a sectional view of the wafer from FIG. 2 during the population process of the chips on a substrate utilising a further embodiment.

(6) FIG. 5 shows a flow diagram of the inventive method, and

(7) FIG. 6 shows a flow diagram of an extension of the inventive method.

DETAILED DESCRIPTION

(8) FIG. 1 shows a sectional view through a wafer 12 having separate chips during the population process using metal shaped bodies. The wafer 12 exhibits a carrier film 1 (wafer film) that carries a plurality of semiconductor chips 2, 3 formed from a semiconductor component 2 and electrical contacts 3 formed on the semiconductor component 2.

(9) During the population procedure 7 of the wafer 12 or of its chips 2, 3 with metallic shaped bodies 6, a layer, exhibiting a first connection material 4 and a second connection material 5, for example an adhesive 4 and a sintering material 5, is arranged between the metallic shaped body 6 and the surface of the chip 2, 3. This layer can be applied prior to positioning on the chips 2, 3 preferably on the lower side of the metallic shaped bodies 6.

(10) So as to reduce the thermal-mechanical forces after the population on the wafer, according to a particularly preferred configuration the metallic shaped bodies 6 are also provided with a sintering layer (unsintered) 5 and an adhesive (polymer material) 4.

(11) In the example shown, the chips 2, 3 are already sawn on the wafer and preferably tested electrically.

(12) FIG. 2 shows a population process, finished on a wafer, for the metal shaped bodies 6, where the metallic shaped bodies 6 have been immobilized on the chip surface under the influence of pressure with or without an applied temperature and/or light. This leads to the situation that as a result of the preferably used elastic polymer layer 4 adhering is made possible while maintaining an almost complete mechanical relaxation between the metallic shaped body 6 and the wafer, this again leading to less bending-through of the wafer composite (metallic shaped body with semiconductor layer). This again has the advantage that handling is markedly simplified and also wafers having lower thicknesses (below 150 m) remain processable.

(13) Here the individual metallic shaped bodies 6 are placed serially or also as a composite (by means of a carrier film) on the respective semiconductor. Since after sawing, the precision on the wafer level still exists, it is possible to securely place the carrier film 1 with the populated metallic shaped bodies 6.

(14) FIG. 3 shows the population process of a chip 2, 3 carrying a metal shaped body 6, on a substrate 9, 10 (such as a DBCdirect bonded copper substrate) formed from ceramic 10 and copper 9. The entire chip 2, 3 including shaped body 6 can be lifted by the shaped body 6 on account of the auxiliary fastening to the chip 2, 3 and positioned on the substrate 9, 10.

(15) In a step (not shown) taking place thereafter, the connection of chip 2, 3 and substrate 9, 10 can take place, wherein simultaneously also the final connection of metallic shaped body 6 and chip 2, 3 takes place.

(16) FIG. 4 shows the population process of a chip 2, 3 carrying a metal shaped body 6, on a substrate 9, 10 (such as a DBCdirect bonded copper substrate) formed from ceramic 10 and copper 9. The entire chip 2, 3 including shaped body 6 can be lifted by the shaped body 6 on account of the auxiliary fastening to the chip 2, 3 and positioned on the substrate 9, 10. Here, a layer of a third connection material 11 is arranged between the semiconductor chip 2, 3 and the substrate 9, 10.

(17) In a step (not shown) taking place thereafter, the connection of chip 2, 3 and substrate 9, 10 can take place, wherein simultaneously also the final connection of metallic shaped body 6 and chip 2, 3 takes place. The second connection material 5 and the third connection material 11 are preferably identical. As an alternative, the second connection material 5 and the third connection material 11 can also be different chemically or physicallyin each case it is important for their processing that the second connection material 5 and the third connection material 11 exhibit similar parameters, so that the second connection material 5 and the third connection material 11 can be jointly processed in one step.

(18) FIG. 5 shows a flow diagram of the inventive method, where the method 100 comprises the following steps: arrange 102 metallic shaped bodies on a wafer with a layer exhibiting a first connection material and a second connection material process 103 the first connection material separate 104, 105 the semiconductor chips
wherein the final step can optionally occur before 103 the arrangement of the metallic shaped bodies or after 104 the processing of the first connection material.

(19) FIG. 6 shows a flow diagram of a further extension of the inventive method, where the method 110 comprises the following steps in addition to those described above: arrange 105 a semiconductor chip on a substrate while forming a layer of a third connection material between the semiconductor chip and the substrate, process 106 the layer arranged between the semiconductor chip and the substrate and the layer arranged between the metallic shaped body and the semiconductor chip in one step.

(20) While the present disclosure has been illustrated and described with respect to a particular embodiment thereof, it should be appreciated by those of ordinary skill in the art that various modifications to this disclosure may be made without departing from the spirit and scope of the present disclosure.