Electronic component
10600769 ยท 2020-03-24
Assignee
Inventors
Cpc classification
H01L25/18
ELECTRICITY
H01L2924/00014
ELECTRICITY
H01L2224/131
ELECTRICITY
H01L2225/06568
ELECTRICITY
H01L2225/06513
ELECTRICITY
H01L2924/00014
ELECTRICITY
H01L2224/32225
ELECTRICITY
H01L23/5384
ELECTRICITY
H01L2224/131
ELECTRICITY
H01L2224/2919
ELECTRICITY
H01L2224/32225
ELECTRICITY
H01L2225/0651
ELECTRICITY
H01L2224/2919
ELECTRICITY
H01L2924/00
ELECTRICITY
H01L24/73
ELECTRICITY
H01L2924/00
ELECTRICITY
H01L23/49827
ELECTRICITY
International classification
H01L25/065
ELECTRICITY
Abstract
An electronic component is provided. The electronic component includes a substrate, an III-V die and a silicon die. The III-V die is disposed on the substrate. The silicon die is stacked to the III-V and electrically connected to the III-V die.
Claims
1. An electronic component, comprising: a substrate comprising a metal layer and at least one via connecting with the metal layer; an III-V die disposed on the metal layer; and a silicon die stacked to the III-V die, the silicon die comprises a plurality of conductive contacts on an active surface of the silicon die, and the silicon die is coupled to the III-V die in a face-down orientation and electrically connected to the III-V die via the conductive contacts, wherein the active surface of the silicon die faces toward the substrate.
2. The electronic component according to claim 1, further comprising: a plurality of bonding wires connecting the III-V die to the substrate.
3. The electronic component according to claim 1, further comprising: an adhesive layer disposed between the III-V die and the metal layer.
4. The electronic component according to claim 3, wherein the III-V die is disposed on the metal layer through the adhesive layer.
5. The electronic component according to claim 1, wherein the electronic component is a power amplifier (PA) device or a Front End Module (FEM).
6. The electronic component according to claim 1, wherein the silicon die is made by a Complementary Metal-Oxide-Semiconductor (CMOS) process, a Silicon On Insulator (SOI) process or a Silicon Germanium (SiGe) process.
7. The electronic component according to claim 1, wherein the III-V die is a power amplifier.
8. The electronic component according to claim 1, wherein the silicon die is a controller for controlling the III-V die.
9. The electronic component according to claim 1, wherein the silicon die comprises a controller and an amplifier driver stage, and the III-V die is an amplifier power stage.
10. The electronic component according to claim 1, further comprises: a switch electrically connected to the III-V die.
11. The electronic component according to claim 10, wherein the switch is stacked to the III-V die.
12. The electronic component according to claim 1, wherein the silicon die is a controller and switch integrated die and stacked to the III-V die.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
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DETAILED DESCRIPTION
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(6) The electronic component 100 at least includes a substrate 110, an III-V die 120, a silicon die 130, an adhesive layer 140 and at least one bonding wire 150.
(7) The III-V die 120 is stacked to the substrate 110. The III-V die 120 is, for example, a power amplifier (PA), made of III-V compound semiconductor composed of the element from column III and the element from column V of the periodic table of the elements. In an embodiment, the III-V die 120 can be made of compound semiconductor composed of GaAs, GaN, HEMT, BiHEMT, etc., for example.
(8) Due to the property of III-V compound semiconductor, the III-V die 120 can operate at a high frequency (for example, radio frequency (RF)) and provide large power.
(9) The substrate 110 includes a metal layer 111 disposed on an upper surface 110u of the substrate 110. The III-V die 120 is disposed on the metal layer 111 through the adhesive layer 140, such that the heat generated by the III-V die 120 can be dissipated through the metal layer 111. In addition, the metal layer 111 can serve as grounding pad. The adhesive layer 140 is a die attach epoxy, or a die attach film (DAF). The adhesive layer 140 has electric conductivity and heat conductivity.
(10) The substrate 110 further includes at least one via 112 connecting with the metal layer 111, such that the heat generated by the III-V die 120 can be dissipated outside the electronic component 100 through the metal layer 111 and the via 112.
(11) The silicon die 130 is stacked to the III-V die 120 by flip chip technology. There are conductive contacts 131 as interconnection between the silicon die 130 and the III-V die 120. In the present embodiment, the silicon die 130 may be coupled to the III-V die 120 in a face-down orientation and electrically connected to the III-V die 120 via a plurality of conductive contacts 131. This configuration is referred to as flip-chip. In addition, the silicon die 130 may be made by, for example, a CMOS (Complementary Metal-Oxide-Semiconductor) process, a SOI (Silicon on Insulator) process, a SiGe (Silicon Germanium) process, etc. In addition, the conductive contacts 131 may be, for example, solder balls, conductive pillars, conductive bumps, etc.
(12) The III-V die 120 may be electrically connected to the substrate 110 through the bonding wire 150. Since the silicon die 130 is flip-chip to the III-V die 120, the inter-connection between the silicon die 130 and the III-V die 120 can be directly coupled each other by the conductive contacts. This configuration eliminates the use of inter-connect bonding wire between the silicon die 130 and the III-V die 120, and also reduces the size of the electronic component 100 due to there is no extra bonding space required for the inter-connection between the silicon die 130 and the III-V die 120. This configuration also can minimize the inter-connection inductance between the silicon die 130 and the III-V die 120.
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(16) It will be apparent to those skilled in the art that various modifications and variations can be made to the disclosed embodiments. It is intended that the specification and examples be considered as exemplary only, with a true scope of the disclosure being indicated by the following claims and their equivalents.