METHOD AND "IDEPS" COMPOSITION FOR DESTROYING MICROORGANISMS IN A SESSILE STATE

Abstract

The invention relates to the field of microflora destruction technologies (bacteria, protozoan fungi, etc.), namely microorganisms in sessile state (hereinafterbiofilm), and can be used in medicine, industry, agriculture and various fields of technology for the destruction of biological films which are highly organized communities of bacteria in the extracellular polymeric substance (hereinafter referred to as the exopolymer matrix) formed on surfaces of different origin (biological, industrial, etc.). Pre-prepare the composition for the destruction of microorganisms in sessile state, for which dissolve the oxidizing agent and the substance that blocks the OH-group, in a solvent. An aqueous solution of sodium peroxodisulfate at a concentration of 10.00 wt. % And sodium hydroxide at a concentration of 15.00 wt. % Is used as components from which the composition is prepared for the destruction of microorganisms in the sessile state. Since the pH of the composition is greater than 10.50, no protective reagent is added. After preparation of the composition for the destruction of microorganisms in sessile state, it is introduced into the object, the surface of which contains a biofilm. As a result of the introduction of the claimed composition for the destruction of microorganisms in the sessile state and its exposure for 10 minutes, the quantitative indicator of the enzyme urease of the material from the root canal was 0.00 kat/l, which indicates that a complete destruction (dissolution) of the exopolymeric biofilm matrix occurred and bacteria that have passed into the plankton form are completely destroyed by the bactericidal action of the claimed composition.

Claims

1. A method of destroying microorganisms in a sessile state, comprising: contacting a biofilm exopolymer matrix with an active substance, wherein microorganisms are preliminarily transferred to a plankton state by dissolving the biofilm matrix, wherein an oxidizer solution and an OH blocker substance are used as the active substance.

2. A composition for destroying microorganisms in a sessile state, comprising: an active substance and a solvent, wherein a solution of an oxidizing agent and a substance that blocks OH-groups are the active substance.

3. The composition according to claim 2, wherein sodium peroxydisulfate is used as the oxidizing agent, sodium hydroxide is used as the substance blocking OH groups, and water is used as a solvent, at the content of components, wt. %: sodium peroxydisulfate not less than 0.50 sodium hydroxide not less than 0.50 water is the rest.

4. The composition according to claim 2, wherein potassium nitrite is used as the oxidizing agent, benzyltrimethylammonium hydroxide is used as the substance blocking OH groups, and water is used as a solvent, with a content of components, wt. %: potassium nitrite at least 0.50 benzyltrimethylammonium hydroxide not less than 0.50 water is the rest.

5. The composition according to claim 2, wherein N-methylmorpholine N-oxide is used as the oxidizing agent, potassium tert-butoxide is used as the substance blocking OH groups, and dimethyl sulfoxide is used as a solvent, wt. %: N-oxide N-methylmorpholine not less than 0.50 potassium tert-butylate not less than 0.50 dimethyl sulfoxidethe rest.

6. The composition according to claim 2, wherein potassium hexacyanoferrate is used as the oxidizing agent, potassium hydroxide is used as the substance blocking OH groups, and water is used as a solvent, with a component content, wt. %: potassium hexacyanoferrate not less than 0.50 potassium hydroxide not less than 0.50 water is the rest.

7. The composition according to claim 2, wherein ammonium-cerium (IV) nitrate is used as the oxidizing agent; formic acid is used as the substance blocking OH-groups, and water is used as a solvent, with a content of components, wt. %: ammonium cerium (IV) nitrate not less than 0.50 formic acid not less than 0.50 water is the rest.

8. The composition according to claim 2, wherein sodium bromate is used as the oxidizing agent, sodium hydroxide is used as the substance blocking OH groups, and sodium hydroxide is used as a solvent, with a content of components, wt. %: sodium bromate at least 0.50 sodium hydroxide not less than 0.50 water is the rest.

9. The composition according to claim 2, wherein sodium dichromate is used as the oxidizing agent, acetic acid is used as the substance blocking OH groups, and dimethyl sulfoxide is used as a solvent, with the content of components, wt. %: sodium dichromate not less than 0.50 acetic acid not less than 0.50 dimethyl sulfoxide is the rest.

10. The composition according to claim 2 wherein tetraalkylammonium chloride is used as the oxidizing agent, methylsulfonic acid is used as the substance blocking OH groups, and dimethyl sulfoxide is used as a solvent, in wt. %: tetraalkylammonium chloride not less than 1.00 methylsulfonic acid at least 0.50 dimethyl sulfoxide is the rest.

10. The composition according to claim 2, wherein as the oxidizing agent, dinitrogen tetraoxide is used, citric acid is used as the substance blocking OH groups, and dimethyl sulfoxide is used as a solvent, with a component content, wt. %: dinitrogen tetraoxide not less than 0.50 citric acid not less than 0.50 dimethyl sulfoxide is the rest.

11. The composition according to claim 2, wherein diethylamine is used as the oxidizing agent, sulfur dioxide is used as the substance blocking OH groups, and dimethyl sulfoxide is used as a solvent, with a content of components, wt. %: diethylamine not less than 4.50 sulfur dioxide not less than 1.50 dimethyl sulfoxide is the rest.

12. The composition according to claim 2, further comprising a corrosion inhibitor.

13. The composition according to claim 2, further comprising a reagent that protects the OH-groups of polysaccharides of an exopolymeric matrix.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

[0036] FIG. 1 is a photographic image of a biofilm prior to use of the composition of the invention (magnification 300 times);

[0037] FIG. 2photographic image of a biofilm in 5 minutes. after using the composition of the invention (an increase of 300 times);

[0038] FIG. 3photographic image of a biofilm in 10 minutes. after using the composition of the invention (an increase of 300 times);

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT

[0039] The proposed method and composition for the destruction of microorganisms in sessile state is as follows.

[0040] Pre-prepare the composition for the destruction of microorganisms in sessile state, for which dissolve the oxidizing agent and the substance that blocks the OH-group in a solvent which is chosen depending on the chemical nature of the dissolved components of the composition. As an oxidizing agent, any inorganic or organic substance or compound exhibiting oxidative properties is used, and as a substance that blocks OH groups, any inorganic or organic substance or compound is used that enhances the oxidative reactivity (oxidative) ability, which blocks the chemical reactions of the used oxidant with hydroxyl groups of polysaccharides exopolymer matrix, while maintaining the pH level of the composition. The components from which the composition is prepared for the destruction of microorganisms in sessile state, can be used, for example: an aqueous solution of sodium peroxydisulfate in the amount of 0.50-35.70 wt. %. and sodium hydroxide in the amount of 0.50-40.00 wt. %; an aqueous solution of potassium nitrite in the amount of 0.50-75.70 wt. % and benzyltrimethylammonium hydroxide in the amount of 0.50-40.00 wt. %; N-methylmorpholine N-oxide in the amount of 0.50-50.00 wt. % and potassium tert-butoxide in the amount of 0.50-35.00 wt. % In dimethyl sulfoxide; an aqueous solution of potassium hexacyanoferrate in the amount of 0.50-31.65 wt. % and potassium hydroxide in the amount of 0.50-54.10 wt. %; ammonium cerium (IV) nitrate aqueous solution in the amount of 0.50-58.50 wt. % and formic acid in the amount of 0.50-85.00 wt. %; an aqueous solution of sodium bromate in the amount of 0.50-28.50 wt. % and sodium hydroxide in the amount of 0.50-40.00 wt. %; a solution of sodium dichromate in the amount of 0.50-30.00 wt. % and acetic acid in the amount of 0.50-80.00 wt. % in dimethyl sulfoxide; a solution of tetraalkylammonium chloride in the amount of 1.0-70.00 wt. % and methylsulfonic acid in the amount of 0.50-75.00 wt. % in dimethyl sulfoxide; a solution of dinitrogen tetraoxide in the amount of 0.50-35.00 wt. % and citric acid in the amount of 0.50-80.00 wt. % in dimethyl sulfoxide; a solution of diethylamine in the amount of 4.50-45.00 wt. % and sulfur dioxide in the amount of 1.50-25.00 wt. % in dimethyl sulfoxide, as well as other similar systems containing organic and inorganic oxidizers and substances that block OH group.

[0041] The choice of the quantitative content of the components is due to the following:

[0042] The minimum proportion of the components ensure the achievement of the technical resultthe destruction of the biofilm matrix and the transfer of microorganisms from the sessile to the plankton form. If the amount is less than the lower value, the destruction of the exopolymer matrix does not occur, i.e. the technical result is not achieved, and the destruction of microorganisms occurs inside the exopolymer matrix, which increases the duration of the process and increases the consumption of the composition. The upper values of the components are due to their solubility limit in the solvent.

[0043] In the case when the composition for the destruction of microorganisms in the sessile state has a pH value of <10.50, then a protective reagent is added to ita compound to protect the hydroxyl groups of the polysaccharides of the exopolymeric matrix, which can be any of the compounds used for these purposes: iodomethane, benzyl chloride, allyl bromide, triethylsilane, dimethyl sulfate, benzyl bromide, trichloroacetyl chloride, etc. in an amount of 0.01-5.00 wt. %.

[0044] If the composition for the destruction of microorganisms is also aggressive for the material of the object on which the biofilm is located, for example, metal surfaces, then a corrosion inhibitor is added to the composition, which can be any of the substances used for these purposes, for example: sodium N, N-diethyldithiocarbamic acid, dextrin, 3-methoxy-4-propargyloxy-benzoic aldehyde, sodium sulfur, methyl ethyl ketone, diisopropylammonium nitrite, etc. in an amount of 0.05-5.00 wt. %.

[0045] After preparation of the composition for the destruction of microorganisms in sessile state, it is deposited on the object, the surface of which contains a biofilm.

[0046] As such an object, a plastic tray is used, on which biofilm was previously grown in the period from January 2016 to September 2016 by continuously supplying water taken from a natural reservoir. During this period, a well-visible layer of an adhesion biofilm formed by bacteria previously found in water is formed on the surface of the tray in contact with the running water: Escherichia coli, Enterococcus faecalis, Enterobacter cloacae.

[0047] The composition for the destruction of microorganisms in sessile state poured into the tray. When using the composition with the content of components corresponding to the lower value of the range, the complete destruction of the exopolymeric matrix of the biofilm occurs within no more than 3 hours, while simultaneously destroying the bacteria, which, as a result of the destruction of the matrix, change from sessile form to planktonic, where the effectiveness of the biocidal properties of the proposed composition is significantly better. The test show that the bacteria Escherichia coli, Enterococcus faecalis, Enterobacter cloacae did not give positive results, indicating their complete destruction.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT

[0048] The proposed method and composition for the destruction of microorganisms in sessile state is as follows.

[0049] Pre-prepare the composition for the destruction of microorganisms in sessile state, for which dissolve the oxidizing agent and the substance that blocks the OH-group, in a solvent. An aqueous solution of sodium peroxydisulfate at a concentration of 10.00 wt. % and sodium hydroxide at a concentration of 15.00 wt. % is used as components from which the composition is prepared for the destruction of microorganisms in the sessile state. Since the pH of the composition is greater than 10.50, no protective reagent is added.

[0050] After preparation of the composition for the destruction of microorganisms in sessile state, it is deposited onto the object, the surface of which contains a biofilm.

[0051] As a treatment object containing a biofilm, the root canal of the 31st tooth was used in the treatment of chronic periodontitis with a biofilm, which was formed naturally by microorganisms characteristic of dental root canals, such as: Enterococcus faecalis, Candida albicans, Streptococcus oralis, Streptococcus mitis, Escherichia coli.

[0052] As a result of the introduction of the claimed composition for the destruction of microorganisms in the sessile state and its exposure for 10 minutes, the quantitative indicator of the enzyme urease of the material from the root canal was 0.00 kat/l, which indicates that a complete destruction (dissolution) of the exopolymeric biofilm matrix occurred and bacteria that have passed into the plankton form are completely destroyed by the bactericidal action of the claimed composition.

INDUSTRIAL APPLICABILITY

[0053] The invention can be implemented in conditions of industrial production and used for domestic, industrial and medical purposes.