METHOD AND SYSTEM FOR DETERMINING AND CONTROLLING THE SEPARATION DISTANCE BETWEEN A WORKING HEAD OF A LASER PROCESSING MACHINE AND THE SURFACE OF AN OBJECT BEING PROCESSED BY MEANS OF LOW COHERENCE OPTICAL INTERFEROMETRY TECHNIQUES

Abstract

A method for determining a separation distance between a working head in a machine for laser processing a material and a surface of the material includes generating a measurement beam of low coherence optical radiation, leading the measurement beam towards the material and a reflected or diffused measurement beam towards an optical interferometric sensor arrangement in a first direction of incidence, generating a reference beam of low coherence optical radiation, leading the reference beam towards the optical interferometric sensor arrangement in a second direction of incidence superimposing the measurement and reference beams on a common region of incidence, detecting a position of a pattern of interference fringes between the measurement and reference beams on the common region of incidence, and determining a difference in optical length between the measurement and reference optical paths based on the position of the pattern of interference fringes along an illumination axis.

Claims

1. A method for determining a separation distance between a working head in a machine for laser processing of a material, operating by a high power processing laser beam emitted by said working head and led along a working trajectory on the material comprising a succession of working areas, and a surface of the material at said working areas, the method comprising: generating a measurement beam of low coherence optical radiation, leading said measurement beam towards a working area through said working head, and leading the measurement beam reflected or diffused from the surface of the material in said working area through said working head and towards an optical interferometric sensor arrangement along a first direction of incidence, in which the measurement beam travels a measurement optical path from a respective source to said optical interferometric sensor arrangement including a first section comprised between said respective source and the working head and a second section comprised between said working head and the interferometric sensor arrangement having a respective predetermined and invariant geometric length; generating a reference beam of said low coherence optical radiation, and leading said reference beam towards said optical interferometric sensor arrangement along a second direction of incidence, at a predetermined angle of incidence with respect to the first direction of incidence of said measurement beam, wherein the reference beam travels a reference optical path whose optical length is equivalent to the optical length of the measurement optical path in a nominal operating condition in which a distance between the working head and the surface of the material corresponds to a predetermined nominal separation distance; superimposing the measurement beam and the reference beam on a common region of incidence of said optical interferometric sensor arrangement, along a predetermined illumination axis; detecting a position of a pattern of interference fringes between the measurement beam and the reference beam along said predetermined illumination axis on said common region of incidence, wherein an extension of said pattern of interference fringes along the predetermined illumination axis corresponds to a coherence length of said low coherence optical radiation; and determining a difference in optical length between the measurement optical path and the reference optical path, indicative of a difference between (a) a current separation distance between the working head and the surface of the material at the working area and (b) a predetermined nominal separation distance, as a function of the position of said pattern of interference fringes along said predetermined illumination axis on said common region of incidence.

2. The method of claim 1, wherein the position of the pattern of interference fringes along the predetermined illumination axis is an intrinsic position of an intensity envelope of optical radiation of said pattern of interference fringes.

3. The method of claim 2, wherein the intrinsic position of the intensity envelope of optical radiation of said pattern of interference fringes is the position of peak or maximum of intensity envelope of said optical radiation.

4. The method of claim 1, wherein said optical interferometric sensor arrangement comprises an arrangement of photodetectors along said predetermined illumination axis, and the predetermined angle of incidence is controlled so that a spatial frequency of said pattern of interference fringes is greater than a spatial frequency of the photodetectors of said arrangement of photodetectors.

5. The method of claim 4, wherein the spatial frequency of said pattern of interference fringes is different from multiples of the spatial frequency of the photodetectors of said arrangement of photodetectors and preferably close to a half-integer multiple of said spatial frequency of the photodetectors.

6. The method of claim 1, wherein said optical interferometric sensor arrangement comprises an arrangement of photodetectors along said predetermined illumination axis and said arrangement of photodetectors is a linear arrangement of photodetectors or a two-dimensional arrangement of photodetectors.

7. (canceled)

8. The method of claim 1, carried out in a machine for laser cutting, drilling or welding of a material or for additive manufacturing of three-dimensional structures by laser, wherein said machine comprises a working head having a nozzle for dispensing a flow of an assist gas, arranged proximate to said material, and the measurement beam is led through said nozzle and directed towards a measuring region of the material which is coaxial to said working area or adjacent to said working area, preferably in front of it along the working trajectory, or carried out-in a machine for laser welding of a material or additive manufacturing of three-dimensional structures by laser, wherein said machine comprises a working head having an output of the high power processing laser beam arranged in proximity of said material, and the measurement beam is led through said output of the high power processing beam and directed towards a measuring region of the coaxial to said working area or adjacent to said working area, preferably behind it along the working trajectory.

9. (canceled)

10. The method of claim 8, wherein the measurement beam is directed towards said measuring region of the material by an optical scanning system whose inclination is controlled according to absolute value and direction of rate of advancement of the working head along the working trajectory.

11. The method of claim 1, wherein said predetermined illumination axis on the common region of incidence is determined by an intersection between a plane defined by said predetermined angle of incidence and a sensing surface of said optical interferometric sensor arrangement.

12. The method of claim 1, wherein the measurement optical path and the reference optical path include corresponding optical elements, the reference optical path including a reflective return element corresponding to the surface of the material interposed in the measurement optical path, and optical attenuator means configured to balance an intensity of reference optical radiation reflected by said reflective return element with respect to the intensity of measurement optical radiation reflected by the material being processed.

13. The method according to of claim 12, wherein said measurement optical path and said reference optical path originate from a common source, are separated by beam splitters, led separately to the surface of the material being processed and to said reflective return element, respectively, and gathered in a detection optical path, in the detection optical path the measurement beam being separated from the reference beam, said measurement and reference beams being directed with controllable orientation towards said common region of incidence of the optical interferometric sensor arrangement, the controllable orientation determining the angle of incidence between the measurement beam and the reference beam.

14. The method of claim 1, wherein in a machine for laser cutting, drilling or welding of a material, or for additive manufacturing of three-dimensional structures by laser comprising a working head having a nozzle for dispensing a flow of an assist gas in which the measurement beam is led through said nozzle, the determination of the difference in optical length between the measurement optical path and the reference optical path is based on a normalized optical length of the measurement optical path which is calculated starting from a geometric length and from a normalized refractive index of a portion of said measurement optical path which passes through an assist gas chamber of the nozzle, which is calculated as a function of a pressure of the assist gas in said assist gas chamber, according to a predetermined nominal relationship of dependence of a refractive index of the assist gas upon the pressure of the assist gas.

15. The method of claim 1, wherein the determination of the difference in optical length between the measurement optical path and the reference optical path is based on a normalized optical length of the measurement optical path which is calculated from a geometric length and from a normalized refractive index of a transmission medium of a portion of said measurement optical path, which is calculated as a function of temperature, pressure or other physical parameter of said portion of the measurement optical path according to a predetermined nominal relationship of dependence of a refractive index upon the temperature, pressure or other physical parameter of the transmission medium of the measurement beam.

16. The method of claim 1, wherein the determination of the difference in optical length between the measurement optical path and the reference optical path is based on a normalized optical length of the measurement optical path which is calculated starting from a normalized geometric length and from a refractive index of a material transmission medium of a portion of said measurement optical path, in which the normalized geometric length is calculated as a function of a mechanical deformation of said material transmission medium according to a predetermined nominal relationship of dependence of geometric length upon the mechanical deformation of the material transmission medium of the measurement beam.

17. The method of claim 1, comprising determining a perturbation of a current optical length of at least a portion of the measurement optical path with respect to the current optical length of a corresponding portion of the reference optical path, and correcting value of the determined separation distance between the working head and the surface of the material on the basis of said perturbation, wherein the measurement beam incident on said optical interferometric sensor arrangement comprises at least one calibration measurement beam which results from travel of a calibration measurement optical path, wherein said measurement beam is reflected or diffused by at least one retro-reflective surface of a static optical element interposed along the measurement optical path, and wherein the reference beam incident on said optical interferometric sensor arrangement comprises a respective calibration reference beam which results from travel of a calibration reference optical path having an optical length equivalent to the optical length of the calibration measurement optical path in a nominal operating condition of calibration in which a geometric length and a refractive index of a transmission medium of the calibration measurement optical path are equal to the geometric length and the refractive index of the transmission medium of the calibration reference optical path within a predetermined tolerance range, and wherein determining the perturbation of the current optical length of at least a portion of the measurement optical path includes: superimposing the calibration measurement beam and the calibration reference beam on the common region of incidence of said optical interferometric sensor arrangement, along the predetermined illumination axis; detecting a position of a pattern of interference fringes between the calibration measurement beam and the calibration reference beam along said predetermined illumination axis on said common region of incidence; and determining a difference in optical length between the calibration measurement optical path and the calibration reference optical path, indicative of a difference between (a) the geometric length of the calibration measurement optical path and the geometric length of the calibration reference optical path, and/or (b) the refractive index of the calibration measurement optical path and the refractive index of the calibration reference optical path, respectively depending on the position of said pattern of interference fringes along said predetermined illumination axis of said common region of incidence, said difference in optical length between the calibration measurement optical path and the calibration reference optical path being indicative of the perturbation of the current optical length of at least portion of the measurement optical path.

18. The method of claim 14, wherein the pressure of the assist gas in the assist gas chamber of the nozzle is detected directly by pressure sensors facing said assist gas chamber.

19. The method of claim 14, wherein the pressure of the assist gas in the assist gas chamber of the nozzle is derived indirectly from a measurement of a variation a local position of a surface of an optical element of protection or delimitation of the assist gas chamber along an axis of the measurement beam according to a predetermined nominal relationship between the position of the surface of said optical element of protection or delimitation of the assist gas chamber with respect to a respective predetermined nominal position and the pressure of the assist gas, the measurement of the variation of the local position of said surface of the optical element of protection or delimitation of the assist gas chamber being determined as a function of a difference in length between an additional measurement optical path for measuring said optical element of protection or delimitation including at least one among (i) a first section between a source of the measurement beam and the optical element of protection or delimitation on a first surface of which said measurement beam impinges with a partial back-reflection and (ii) a second section between the surface of the material being processed and the optical element of protection or delimitation on a second surface of which said measurement beam impinges with partial back-reflection, and a respective additional reference optical path having an optical length equal to the optical length of the additional measurement optical path of said optical element of protection or delimitation in a nominal operating condition including the partial back-reflection of the measurement beam to said first or second surface of said optical element of protection or delimitation when it is at said predetermined nominal position along the axis of the high power processing laser beam for a predetermined reference pressure value of the assist gas in the assist gas chamber of the nozzle.

20. The method of claim 1, wherein the measurement beam incident on said optical interferometric sensor arrangement comprises a main measurement beam which results from travel of a main measurement optical path with reflection from the surface of the material in the working area and with transmission through at least one optical element interposed along an optical path of the high-power processing laser beam, and at least one additional multiplexed measurement beam which results from travel of an additional measurement optical path, with reflection from the surface of the material being processed and having a geometric length greater than the geometric length of said main measurement optical path, which includes at least a partial back-reflection at the surface of the at least one optical element interposed along the optical path of the high power processing laser beam, the method comprising: detecting, on said common region of incidence, the position of an additional pattern of interference fringes having (i) a peak or maximum of intensity of optical radiation different from the peak or maximum of intensity of optical radiation of a main pattern of interference fringes between the main measurement beam and the reference beam, or (ii) an intrinsic position of an intensity envelope of optical radiation offset from the intrinsic position of the intensity envelope of optical radiation of the main pattern of interference fringes; and determining a difference in optical length between the additional measurement optical path and the reference optical path, indicative of a difference between (i) the current separation distance between the working head and the surface of the material at the working area and (ii) the predetermined nominal separation distance, as a function of the position of said additional pattern of interference fringes along said predetermined illumination axis of said common region of incidence.

21. The method claim 1, wherein the reference beam incident on said optical interferometric sensor arrangement comprises a main reference beam which results from travel of a main reference optical path and at least one additional multiplexed reference beam which results from travel of an additional reference optical path having a geometric length different from the geometric length of said main reference optical path, the method comprising: detecting on said common region of incidence the position of an additional pattern of interference fringes having (i) a peak or maximum of intensity of optical radiation different from the peak or maximum of intensity of optical radiation of a main pattern of interference fringes between the measuring beam and the main reference beam, or (ii) an intrinsic position of an intensity envelope of optical radiation offset from the intrinsic position of the intensity envelope of optical radiation of the main pattern of interference fringes; and determining a difference in optical length between the measurement optical path and the additional reference optical path—indicative of a difference between (i) the current separation distance between the working head and the surface of the material at the working area and (ii) the predetermined nominal separation distance, as a function of the position of said additional pattern of interference fringes along said predetermined illumination axis of said common region of incidence.

22. A method for controlling a relative position between a working head of a machine for laser processing of a material, operating by a high power processing laser beam emitted by said working head and led along a working trajectory on the material comprising a succession of working areas, and the material at said working areas, the method comprising carrying out a method for determining a separation distance between a working head in a machine for laser processing of a material, operating by a high power processing laser beam emitted by said working head and led along a working trajectory on the material comprising a succession of working areas and a surface of the material at said working areas, comprising generating a measurement beam of low coherence optical radiation, leading said measurement beam towards a working area through said working head, and leading the measurement beam reflected or diffused from the surface of the material in said working area through said working head and towards an optical interferometric sensor arrangement along a first direction of incidence, in which the measurement beam travels a measurement optical path from a respective source to said optical interferometric sensor arrangement including a first section comprised between said respective source and the working head and a second section comprised between said working head and the interferometric sensor arrangement having a respective predetermined and invariant geometric length, generating a reference beam of said low coherence optical radiation, and leading said reference beam towards said optical interferometric sensor arrangement along a second direction of incidence, at a predetermined angle of incidence with respect to the first direction of incidence of said measurement beam, wherein the reference beam travels a reference optical path whose optical length is equivalent to the optical length of the measurement optical path in a nominal operating condition in which a distance between the working head and the surface of the material corresponds to a predetermined nominal separation distance; superimposing the measurement beam and the reference beam on a common region of incidence of said optical interferometric sensor arrangement, along a predetermined illumination axis; detecting a position of a pattern of interference fringes between the measurement beam and the reference beam along said predetermined illumination axis on said common region of incidence, wherein an extension of said pattern of interference fringes along the predetermined illumination axis corresponds to a coherence length of said low coherence optical radiation; and determining a difference in optical length between the measurement optical path and the reference optical path, indicative of a difference between (a) a current separation distance between the working head and the surface of the material at the working area and (b) a predetermined nominal separation distance, as a function of the position of said pattern of interference fringes along said predetermined illumination axis on said common region of incidence, and moving the working head towards or away from the material or in translation or inclination relative to the surface as a function of a predetermined working design and the determined separation distance between the working head and the surface of the material.

23. A system for determining a separation distance between a working head in a machine for laser processing of a material, operating by a high power processing laser beam emitted by said working head and led along a working trajectory on the material comprising a succession of working areas, and a surface of the material at said working areas, the system comprising: means for generating a measurement beam of low coherence optical radiation; means for propagating said measurement beam, configured to lead said measurement beam towards a working area through said working head, and for leading the measurement beam reflected or diffused by the surface of the material in said working area through said working head towards an optical interferometric sensor arrangement along a first direction of incidence, in which the measurement beam travels a measurement optical path from a respective source to said optical interferometric sensor arrangement including a first section between said source and the working head and a second section between said working head and the interferometric sensor arrangement, having a respective predetermined and invariant geometric length; means for generating a reference beam of said low coherence optical radiation; means for propagating said reference beam, configured to lead said reference beam towards said optical interferometric sensor arrangement along a second direction of incidence, at a predetermined angle of incidence with respect to the first direction incidence of said measurement beam, wherein the reference beam travels a reference optical path of optical length equivalent to the optical length of the measurement optical path in a nominal operating condition in which a distance between the working head and the surface of the material corresponds to a predetermined nominal separation distance; wherein the means for propagating the measurement beam and the means for propagating the reference beam are arranged to superimpose the measurement beam and the reference beam on a common region of incidence of said optical interferometric sensor arrangement, along a predetermined illumination axis; means for detecting a position of a pattern of interference fringes between the measurement beam and the reference beam along said predetermined illumination axis on said common region of incidence, wherein an extension of said pattern of interference fringes along the predetermined illumination axis corresponds to a coherence length of said low coherence optical radiation; and processing means configured to determine a difference in optical length between the measurement optical path and the reference optical path, indicative of a difference between (a) a current separation distance between the working head and the surface of the material at the working area and (b) a predetermined nominal separation distance, as a function of the position of said pattern of interference fringes along said predetermined illumination axis on said common region of incidence.

24. A machine for laser processing of a material, operating by a high-power processing laser beam emitted by a working head and led along a working trajectory on the material comprising a succession of working areas, and including means for controlling a relative position between said working head and said material, wherein the machine comprises a system for determining a separation distance between said working head and the surface of the material at said working areas, and is configured to carry out a method for determining a separation distance between a working head in a machine for laser processing of a material, operating by a high power processing laser beam emitted by said working head and led along a working trajectory on the material comprising a succession of working areas and a surface of the material at said working areas, comprising generating a measurement beam of low coherence optical radiation, leading said measurement beam towards a working area through said working head, and leading the measurement beam reflected or diffused from the surface of the material in said working area through said working head and towards an optical interferometric sensor arrangement along a first direction of incidence, in which the measurement beam travels a measurement optical path from a respective source to said optical interferometric sensor arrangement including a first section comprised between said respective source and the working head and a second section comprised between said working head and the interferometric sensor arrangement having a respective predetermined and invariant geometric length, generating a reference beam of said low coherence optical radiation, and leading said reference beam towards said optical interferometric sensor arrangement along a second direction of incidence, at a predetermined angle of incidence with respect to the first direction of incidence of said measurement beam, wherein the reference beam travels a reference optical path whose optical length is equivalent to the optical length of the measurement optical path in a nominal operating condition in which a distance between the working head and the surface of the material corresponds to a predetermined nominal separation distance; superimposing the measurement beam and the reference beam on a common region of incidence of said optical interferometric sensor arrangement, along a predetermined illumination axis; detecting a position of a pattern of interference fringes between the measurement beam and the reference beam along said predetermined illumination axis on said common region of incidence, wherein an extension of said pattern of interference fringes along the predetermined illumination axis corresponds to a coherence length of said low coherence optical radiation; and determining a difference in optical length between the measurement optical path and the reference optical path, indicative of a difference between (a) a current separation distance between the working head and the surface of the material at the working area and (b) a predetermined nominal separation distance, as a function of the position of said pattern of interference fringes along said predetermined illumination axis on said common region of incidence, said means for controlling the relative position between said working head and said material acting according to a predetermined working design and the determined separation distance between the working head and the surface of the material.

Description

[0048] Additional features and advantages of the invention will be presented in more detail in the following detailed description of one embodiment thereof, given by way of non-limiting example, with reference to the attached drawings, in which:

[0049] FIGS. 1 and 2 are examples of laser processing machines according to the prior art FIG. 2c

[0050] FIG. 3 shows schematic example of a working head of a laser machine near to a material being processed and related control means, according to the prior art;

[0051] FIG. 4 is a schematic view of the configuration of a linear low coherence interferometric system with spatial detection;

[0052] FIG. 4b is a schematic view of the variation in the lengths of the measurement and reference optical paths with respect to the relative point of incidence, on an illumination axis of a sensor arrangement, of the pattern of interference fringes;

[0053] FIG. 4c is a schematic view (top graph) of the variation in the difference between the lengths of the measurement and reference optical paths with respect to the relative point of incidence, on an illumination axis of a sensor arrangement, of the pattern of interference fringes, and the identification of a pattern of interference fringes on the illumination axis of the sensor arrangement in a condition in which the optical lengths of the measurement and reference paths are equal (bottom graph);

[0054] FIG. 5 is a simplified diagram of a system for determining the separation distance between a working head of a machine for laser processing a material and the surface of the material, which is the subject matter of the invention;

[0055] FIG. 6 schematically shows the path of the processing laser beam and of the low coherence measurement optical beam in a working head according to a simplified embodiment of the working head;

[0056] FIG. 7 is a detail of the relative position of the processing laser beam and of the measurement low coherence optical beam at the output of the working head, in a cutting or drilling region of the material;

[0057] FIG. 8 is a graph showing the trend of the contrast or visibility value for the simulated pattern of interference fringes as a function of the ratio between the spatial frequency of said pattern of interference fringes and the spatial frequency of the photodetectors in a linear arrangement of photodetectors along the illumination axis of the sensor arrangement of the pattern of interference fringes;

[0058] FIG. 9a is a graph showing a dependency relationship between the result of the interferometry reading, expressed in terms of difference in optical length between the measurement optical path and the reference optical path, and the pressure of an assist gas, used, for example, in a laser cutting process, which forms along a portion of the measurement optical path, for a predetermined separation distance between the working head and the surface of the material;

[0059] FIG. 9b is a graph showing a dependency relationship between the result of the interferometry reading, expressed in terms of the change in the local position of a surface of an optical element for protecting or delimiting the chamber of the assist gas along the measurement beam, and the trend (increasing, decreasing) of the pressure of the assist gas;

[0060] FIG. 10a is a diagram showing a main signal indicative of the identification of the pattern of interference fringes along the illumination axis of the sensor arrangement as a function of the separation distance between the working head and the material, and corresponding additional multiplexed signals indicative of the identification of respective additional patterns of interference fringes along the illumination axis of the sensor arrangement, which result from an additional measurement or reference optical path being traveled along, having a geometric length that differs from the geometric length of the main measurement or reference optical path, which includes at least one partial back-reflection at the surface of an optical element interposed along the optical path of the processing laser beam;

[0061] FIG. 10b is an exemplary calibration curve that represents the trend of the peak of the signal indicative of a main pattern of interference fringes as a function of the separation distance between the working head and the material; and

[0062] FIG. 10c shows a series of graphs representing a measurement conducted during a cutting process.

[0063] FIGS. 1 to 3 have been described previously with reference to the prior art and the contents thereof are referred to here as long as they are common to the controlled production of a processing machine in order to carry out a method according to the teaching of this invention.

[0064] FIG. 4a is a schematic view of the configuration of a low coherence interferometric system with linear spatial detection. A measurement collimated beam of optical radiation, indicated by M, and a reference collimated beam of the same optical radiation, indicated by R, impinge so as to be superimposed on a common region of incidence C of a sensor arrangement S, at a predetermined angle of incidence α, where they form a pattern of interference fringes F, the extension of which on the common region of incidence is of the order of the coherence length of the optical radiation. The width of the measurement collimated beam of optical radiation and the width of the reference collimated beam of optical radiation are preferably of such a size so as to substantially illuminate the entire sensor arrangement. In order to increase the intensity and the contrast of the signal detected, the beams may be concentrated on the sensor in the direction that is perpendicular to the illumination axis, for example by means of a cylindrical focusing lens.

[0065] The sensor arrangement S comprises, for example, an arrangement of photodetectors along at least one illumination axis of the region of incidence (x axis in the figure). The arrangement of photodetectors is a linear or bidimensional arrangement of photodetectors, preferably a linear arrangement. The illumination axis of the region of incidence is determined by the intersection between the plane defined by the angle of incidence of the measurement beam M and of the reference beam R and the sensor surface of said sensor arrangement.

[0066] In FIG. 4b, the graph schematically shows the variation in the lengths p of the measurement and reference optical paths, referring to the initial incident wavefront of the respective measurement and reference beams on the common region of incidence of the sensor arrangement S, in the typical configuration in which the two incident beams are symmetrical on the sensor arrangement. The x-axis indicates the position or x coordinate along the illumination axis of the photodetector arrangement. Reference numeral p1 indicates the additional length of a first optical path, for example the measurement optical path of the measurement optical radiation beam M, with respect to the initial point of incidence of the wavefront of the measurement beam M at a first end of the common region of incidence C, x.sub.1, which is the origin of the measurement axis. Reference numeral p2 indicates the additional length of a second optical path, for example the reference optical path of the reference optical radiation beam R, with respect to the initial point of incidence of the wavefront of the reference beam R at a second end of the common region of incidence, x.sub.2, which is opposite the first. Reference numeral Δp indicates the difference between the additional lengths of the two paths, p1−p2, which is zero at the middle coordinate of the sensor arrangement, and varies from a value Δp.sub.x1 at the end x.sub.1 of the common region of incidence to a value Δp.sub.x2 at the end x.sub.2 of the common region of incidence.

[0067] In FIG. 4c, the top graph shows the curve Δp that corresponds to the graph in FIG. 2b, and the bottom graph shows the identification of a pattern of interference fringes F on the illumination axis (x) of the sensor arrangement S that occurs when the optical lengths of the measurement and reference paths are equal. The envelope of the pattern of interference fringes F is indicated with hatching, and the particular difference Δp.sub.p between the additional lengths of the paths of the measurement and reference optical beams is associated with the coordinate of the envelope peak, x.sub.p, by means of the upper graph.

[0068] P.sub.M and P.sub.R indicate the measurement and reference paths, the overall lengths of which may be expressed as P.sub.M=P1+p1 and P.sub.R=P2+p2, where P1 is the optical length of the measurement optical path from the low coherence optical radiation source to the first wavefront incident on the sensor arrangement, and P2 is the optical length of the reference optical path from the same low coherence optical radiation source to the first wavefront incident on the sensor arrangement, and is preferably constant. It is possible to consider P1 to be composed of P.sub.head+D.sub.standoff, where P.sub.head is the length of the optical path upstream and inside the working head, including a first portion between the low coherence optical radiation source and the end of the working head that is proximal to the material WP being processed (for example, the laser beam output 32) and a second portion between the above-mentioned proximal end of the working head (for example, the laser beam output 32) and the sensor arrangement S, which portions have a particular predetermined and invariant geometric length, and D.sub.standoff is the separation distance in open air between the end of the working head that is proximal to the material WP being processed and the surface of said material. P2 is the optical length of the reference optical path, which is equivalent to the optical length of the measurement optical path in a nominal operating condition, indicated in the following as P1.sub.nom, wherein the distance between the proximal end of the working head (for example, the laser beam output 32) and the surface of the material WP corresponds to a predetermined nominal separation distance D.sub.standoff_nom.

[0069] The difference in optical length between the measurement optical path and the reference optical path is represented mathematically as:

P.sub.M−P.sub.R

and the interference fringes appear in the condition in which this is zero, that is:

P.sub.M−P.sub.R=0

a relationship that may be broken down as:

P1+p1−(P2+p2)=0

which may be written again as:

P.sub.head+D.sub.standoff+p1−P2−p2=0

from which the following is deduced:

P.sub.head+D.sub.standoff−P2+Δp=0

P.sub.head+D.sub.standoff−P1.sub.nom+Δp=0

P.sub.head+D.sub.standoff−P.sub.head−D.sub.standoff_nom+Δp=0

Δp=D.sub.standoff_nom−D.sub.standoff

that is the difference between (a) the current separation distance between the working head and the surface of the p material in the processing region, D.sub.standoff, and (b) the nominal separation distance, D.sub.standoff_nom, is equal to the difference between the additional lengths of the measurement optical path and of the reference optical path.

[0070] Therefore, a current separation distance between the working head 14 and the surface of the material WP that is different from the nominal separation distance, determined by a difference in optical length between the measurement optical path and the reference optical path, is attributable to a difference between the additional lengths of the measurement optical path and of the reference optical path, therefore to a movement of the pattern of interference fringes along the illumination axis x of the sensor arrangement S with respect to a nominal position, for example the median plane of said sensor arrangement S.

[0071] It is noted that, in a laser cutting or drilling application involving a flow of assist gas, the end of the working head that is proximal to the material being processed is generally the end portion of the assist gas nozzle, while in a welding or additive manufacturing application in which gas is not supplied, the end of the working head that is proximal to the material being processed is generally the processing laser beam output.

[0072] In the application that forms the subject matter of the invention, the length of the reference optical path is set so as to correspond to the length of the measurement optical path at a preset nominal separation distance between the working head and the surface of the material in the processing region, and the difference between (a) the current separation distance between the working head and the surface of the material in the processing region and (b) the predetermined nominal separation distance results from the difference in length between the measurement optical path and the reference optical path, which may be identified on the basis of the position of the pattern of interference fringes along the illumination axis of the region of incidence of the sensor arrangement S. Advantageously, a middle position of the pattern of interference fringes along the illumination axis corresponds to said preset nominal separation distance. Alternatively, an end position of the pattern of interference fringes along the illumination axis may correspond to a null nominal separation distance between a nozzle and the material being processed, which is equivalent to the contact between the nozzle that constitutes the proximal end of the head and the material, thereby allowing the separation distance therebetween to only increase, and therefore the pattern of interference fringes exclusively moves towards the opposite end of the illumination axis.

[0073] With reference to the bottom graph in FIG. 4c, the position x.sub.p of the pattern of interference fringes along the illumination axis is the intrinsic position of the envelope of the intensity of the optical radiation of said pattern of interference fringes, and this intrinsic position of the envelope of the intensity of the optical radiation of said pattern of interference fringes is—for example—the position of the peak or maximum intensity of the envelope of the optical radiation, or the middle position of the photodetectors weighted with the optical intensity of the fringe envelope.

[0074] The detection of the fringe envelope may be carried out by means of optical intensity profile demodulation techniques, for example by applying a band-pass spatial filter, or high-pass and low-pass filters in a sequence, so as to reveal the only signal components corresponding to the spatial frequency of the interference fringes. For example, in a first step of processing the optical intensity data, the optical intensity detected by a matrix of sensors is integrated in the direction that is perpendicular to the development direction of the interference fringe, for example for columns of a matrix of sensors oriented so as to receive a pattern of vertically aligned interference fringes (this operation is not required if the sensor arrangement is a linear arrangement of photodetectors on which the beams are focused by means of a cylindrical lens). Subsequently, the signal generated by the photodetectors is normalized with respect to a background signal, for example extracted from an image devoid of interference fringes. Therefore, a high-pass spatial filter is applied, for example to ⅕ of the photodetector spatial frequency in order to remove the baseline and to maintain the pattern of interference fringes. Since, in this way, a signal is obtained that oscillates around zero, the absolute value of the signal is extracted and therefore a low-pass spatial filter is applied, for example to 1/25 of the photodetector spatial frequency in order to extract the envelope of the pattern of interference fringes. The position of the pattern of the interference fringes is lastly obtained by detecting the position of the envelope of the fringe pattern by seeking the maximum thereof or by comparing the envelope with a predetermined model function (for example a Gaussian function) and extracting the peak of the model function.

[0075] FIG. 5 shows an example diagram of a system for determining the separation distance between a working head 14 of a machine for laser processing a material WP and the surface of said material, which forms the subject matter of the invention, in accordance with an embodiment that is currently preferred.

[0076] In the figure, 100 indicates a low coherence optical radiation source suitably having linear polarization, such as an LED or a super luminescent diode, for example which operates in the visible or near-infrared wavelength range. The optical radiation emitted by the source 100, downstream of a suitable optical isolator 120, is injected into an optical waveguide, for example an optical fiber 140, and carried to a beam splitter 160 that is adapted to generating a measurement optical radiation beam M, which is routed on a measurement optical path P.sub.M, and a reference optical radiation beam R that is routed on a reference optical path P.sub.R.

[0077] The measurement optical path P.sub.M and the reference optical path P.sub.R are guided paths and include optical guides (for example optical fibers) that are adapted to maintain the same polarization of the beam along the entire path.

[0078] The measurement optical path P.sub.M is led to the working head 14 of a machine for laser processing a material as described above, and emerges from there towards the material WP being processed, on which it impinges. The region where the measurement beam M is output corresponds to the region of the measurement head, it being intended for the distance of said measurement head from the above-mentioned material to be measured, for example the opening in the nozzle for supplying the flow of assist gas or the laser beam output.

[0079] The reference optical path P.sub.R is instead led to a reflective return element 180, preferably by interposing an optical density filter 200, an optical dispersion compensation element 220, a λ/4 plate 240 and a focusing lens 260. The optical reflective element 180 is arranged along the reference optical path such that the optical length of this path from the beam splitter 160 to the optical reflective element 180 corresponds to the optical length of the measurement optical path from the beam splitter 160 to the (reflective) surface of the material WP being processed in an operating state in which said surface is at the preset nominal separation distance D.sub.standoff_nom from the working head, that is from the end of the working head that is proximal to the material, such as the opening in the nozzle for the assist gas or the beam output.

[0080] The measurement and reference optical paths P.sub.M, P.sub.R are formed such that the optical radiation travels along these paths in both directions, heading back to the beam splitter 160 after being reflected at the surface of the material WP being processed and at the reflective optical element 180, respectively. In the reference optical path P.sub.R, the double passage of the reference beam R through the λ/4 plate 240 brings about a 90° rotation of the linear polarization of the beam, which thereby assumes a linear polarization that is orthogonal to the linear polarization of the measurement beam M. The beam splitter 160 therefore performs a recombination of the measurement optical beam and of the reference optical beam and directs them, superimposed, along a detection optical path P.sub.D (common to a portion of the measurement optical path and to a portion of the reference optical path) towards the sensor arrangement S.

[0081] Both the measurement and reference optical beams are led through a cylindrical focusing lens 280, which is adapted to focus the collimated beam in just one direction, in particular the direction orthogonal to the illumination axis of the sensor arrangement, with the aim of concentrating the signal along this axis, thereby optimizing the illumination of the photodetectors, and arrive at a polarizing beam splitter 300 that performs the separation of the measurement optical beam M from the reference optical beam R on the basis of their polarization, directing the first thereof towards a first reflective element M1 and the second thereof towards a second reflective element M2; in this last case, by interposing a λ/2 plate 320 that is adapted to restore the original polarization. On account of this configuration, the first and the second reflective element M1, M2 direct the measurement optical beam and the reference optical beam towards the sensor arrangement S, respectively, and more precisely towards the common region of incidence of the sensor arrangement, at an angle of incidence α. The angle of incidence α may advantageously be controlled within a preset range of values when the system is formed such that the reflective elements M1 and M2 are respectively moveable in translation along the axis of propagation of the relative optical beam and in rotation about an axis that is normal with respect to the incidence plane (dashed position in the figure).

[0082] As described above, the sensor arrangement S comprises a plurality of photodetector devices, each of which is adapted to emit a particular signal representative of the optical intensity incident thereon, and these signals are transmitted, as a whole, to processing means 350 configured for identifying a pattern of interference fringes F that forms on the common region of incidence C of the sensor arrangement by acquiring the overall incident optical power of the superimposed measurement optical beam and reference optical beam.

[0083] Preferably, the measurement optical path and the reference optical path comprise corresponding optical elements, and in particular the reference optical path comprises a reflective return element, the reflective and optical diffusion properties of which correspond to the reflective and optical diffusion properties of the surface of the material interposed in the measurement optical path as much as possible. Optical attenuator means and/or optical dispersion means may be provided if need be, which are adapted to balance out the intensity and the chromatic dispersion of the reference optical radiation reflected by said reflective return element with regard to the intensity of the measurement optical radiation reflected by the material being processed.

[0084] By means of the system in FIG. 5 or equivalent systems, a method is carried out for determining the separation distance between the working head 14 of a machine for laser processing a material and the surface of the material WP in the processing regions defined along a predetermined working trajectory T followed by the processing laser beam emitted by the head.

[0085] The method comprises generating a measurement beam of low coherence optical radiation M that is led towards a processing region through the working head 14, and—reflected or diffused by the surface of the material WP in the processing region—is led through the working head 14 towards the sensor arrangement S in a first direction of incidence.

[0086] When processing metal materials, it is possible to assume that the measurement optical beam is reflected or diffused at the first surface of the material. In certain cases, for example welding or additive manufacturing processes, instead of the surface of the solid to be welded (or of the substrate), it is necessary to measure the distance from the surface of the molten pool, which represents the first surface of the molten metal. The internal sub-surface layers of the material generate signals in non-metal and semi-transparent materials (ceramics, plastics, biological tissues, etc.), or in painted metals.

[0087] The measurement optical radiation beam M in particular travels along a measurement optical path from the source 100 to the sensor arrangement S, which includes two portions having a particular predetermined and invariant geometric length, respectively a first portion between the source 100 and the end of the working head 14 that is proximal to the material WP, and a second portion between the end of the working head 14 that is proximal to the material WP and the sensor arrangement S.

[0088] A reference beam R of said low coherence optical radiation is generated by the same source 100, which beam is led towards the sensor arrangement S in a second direction of incidence, at a predetermined angle of incidence with respect to the first direction of incidence of the measurement beam M. The reference beam R travels along a reference optical path P.sub.R having an optical length that is equivalent to the optical length of the measurement optical path P.sub.M in the nominal operating state, in which the distance between the working head 14 and the material WP corresponds to the predetermined nominal separation distance D.sub.standoff_nom.

[0089] The measurement beam M and the reference beam R are superimposed on the common region of incidence C of the sensor arrangement S along a preset illumination axis. The position of a pattern of interference fringes F between the measurement beam M and the reference beam R along the illumination axis on the common region of incidence C is detected by the processing means 350 and makes it possible, as described above, to determine the difference in optical length between the measurement optical path P.sub.M and the reference optical path P.sub.R, which is indicative of the difference between (a) the current separation distance between the working head 14 and the surface of the material WP in the processing region, and (b) the preset nominal separation distance.

[0090] The method may be carried out in real time during a process in order to determine the separation distance between the working head and the current processing regions on the material, but also before or after the process, for example to qualify a piece to be processed or a process that has been carried out.

[0091] With reference to FIGS. 6 and 7, an exemplary embodiment of the path of the processing laser beam B and of the measurement optical beam M inside the working head and the relative position of the processing laser beam B and of the measurement optical beam M in a cutting or drilling portion of the material WP.

[0092] FIG. 6 shows a reflective element that deflects the laser beam, such as a dichroic mirror, indicated by DM, which deflects the optical axis of propagation of the processing laser beam B from a head-entering direction to a direction of incidence on the material WP being processed. This is a configuration that is adopted in one embodiment of the working head comprising a lateral laser beam input. In this embodiment, the measurement optical radiation beam M is directed towards the measurement region of the material—passing through the dichroic mirror DM without substantial deflection—by means of a reflective optical scanning system SM, or folding mirror, the inclination of which is controlled, for example piezoelectrically, on the basis of the absolute value and of the direction of the rate of advancement of the working head along the working trajectory in order to control the position in which the measurement point intercepts the surface. Downstream of the reflective optical scanning system SM there is arranged a focusing lens FL, and therefore it is possible to control the position H in which the measurement point intercepts the surface of the material. As may be seen in the figure, the propagation direction of the measurement beam may be controlled by the inclination of the reflective optical scanning system SM so as not to be coaxially superimposed on the processing laser beam B, but to be different therefrom. A person skilled in the art will understand that a “dual” or “opposite” configuration is also possible, in which a dichroic mirror is provided, which is transparent to the processing laser beam but reflects the measurement beam coming from a lateral input.

[0093] Advantageously, in a machine for laser cutting, drilling or welding a material or for the additive manufacture of three-dimensional structures by means of a laser, in which the machine comprises a working head containing a nozzle for supplying a flow of an assist gas arranged near the material, the measurement optical radiation beam is led through the nozzle and directed towards a measurement region of the material that is coaxial with the current processing region or is in the vicinity of the current processing region, preferably in front thereof in accordance with the working trajectory.

[0094] Advantageously, in a machine for laser welding a material or for the additive manufacture of three-dimensional structures by means of a laser, in which the machine comprises a working head containing an output for the high-power processing laser beam, downstream of an optical system for focusing the laser beam, which system is arranged near to the material, the measurement optical radiation beam is led through the above-mentioned beam output and directed towards a measurement region of the material that is coaxial with the current processing region or is in the vicinity of said current processing region, preferably behind it in accordance with the working trajectory.

[0095] The incidence of the measurement beam M coaxially with the processing laser beam B is suitably used, for example, to assess the drilling depth, the welding height and/or depth and the height of the structured material during additive manufacture. The incidence of the measurement beam M in a set-back position with respect to the processing region is used to verify the welding quality or additive depositions. The incidence of the measurement beam M in a forward position with respect to the processing region is used for the early measurement of the separation distance of the head from the material during cutting and welding, or to identify the morphology of the surface of the material after the spatial scan, for example in order to track the welding joint along the working trajectory. The latter configuration is shown by way of example in FIG. 7, where N indicates the nozzle for supplying the assist gas, B indicates the processing laser beam incident in a current processing region of the material WP where a cutting operation is in progress according to a trajectory indicated by the arrow, which forms a groove G, and M indicates the measurement beam. In a cutting operation, the arrangement of the measurement beam M coaxially with the processing beam B would render the measurement extremely uncertain, since it would be taken at the cutting edge, where the wall of the groove in the material has a profile that may not be controlled, which depends on numerous processing parameters.

[0096] Improvements to the invention will be described in the present description that follows.

[0097] Advantageously, in the configuration in which the measurement and reference beams impinge on the common region of incidence of the sensor arrangement S, the angle of incidence α is controlled and extends to such an extent that the spatial frequency of the pattern of interference fringes is greater than the spatial frequency of the photodetectors in order to increase the range of measurable distances.

[0098] It is known in the art that, assuming that the measurement and reference beams propagate as plane waves, the total light intensity as a function of the x coordinate along the illumination axis of the sensor arrangement S, that is in the plane of the angle of incidence, may be approximated as:

I.sub.tot(x)≅I.sub.1+I.sub.2+2√{square root over (I.sub.1I.sub.2)}|γ(x)|cos(k.sub.fx),

[0099] where I.sub.1 and I.sub.2 are the intensities of the respective beams and k.sub.f is the wavenumber or spatial frequency of the pattern of interference fringes. With the angles of incidence of the measurement beam and of the reference beam with respect to the normal to the sensor arrangement indicated as α1 and α2, the spacing between the interference fringes is given by

[00001] $\frac{2 π}{k_{f}} = \frac{λ_{0}}{\sin (α_{1}) + \sin (α_{2})}$

[0100] and therefore a greater angle of inclination brings about a greater frequency of the pattern of interference fringes, and therefore a greater interference fringe density on the sensor arrangement.

[0101] According to the prior art, in order to respect the Nyquist sampling criterion and to avoid the phenomenon of aliasing or sub-sampling, the spatial frequency of the photodetectors, corresponding to the sampling pixel spatial frequency on the sensor arrangement, indicated by k.sub.p, has to be at least two times greater than the frequency of the pattern of interference fringes k.sub.f, that is the k.sub.f/k.sub.p ratio would have to be smaller than 0.5.

[0102] The information relating to the difference in optical paths may be directly extracted from the position of the envelope of the pattern of interference fringes in the intensity profile of the optical radiation incident on the sensor arrangement. N.sub.p indicates the number of photodetector devices of the sensor arrangement that are illuminated by both the superimposed measurement beam and reference beam; the maximum path difference that may be measured is therefore

[00002] $Δ d_{\max} = N_{p} \frac{λ_{0}}{2} \frac{k_{f}}{k_{p}} .$

[0103] whereby the measurement range is directly proportional to the number of illuminated photodetectors of the superimposed beams, which is a consequence of the resolution of the sensor arrangement and of the dimensions of the beams. The increase in the range of differences between the measurable paths is therefore obtainable by increasing the number of photodetector devices, which could introduce greater costs when forming the sensor arrangement and greater expenses when processing the signals originating therefrom. The above-mentioned range of measurable differences is also directly proportional to the k.sub.f/k.sub.p ratio between the frequency of the pattern of interference fringes and the spatial frequency of the photodetectors. The k.sub.f/k.sub.p ratio is dependent on the angle of incidence between the measurement and reference beams and on the spatial dimensions of the photodetectors; it is therefore necessary to achieve a balance between the inclination of the beams and the number of illuminated photodetectors.

[0104] The inventors have noted that, depending on the wavelength and the coherence length of the low coherence optical radiation used, several tens of interference fringes are typically visible in a pattern of interference fringes that forms in the common region of incidence of the sensor arrangement. Acquiring a high number of interference fringes across a wide measurement range while respecting the Nyquist criterion requires a large number of photodetectors, which brings about an excessive acquisition of information, since only the position of the envelope of the pattern of interference fringes is relevant for determining the difference between the measurement and reference paths. As a result, the inventors have explored the possibility of demodulating the patterns of interference fringes at smaller and smaller spatial frequencies, which are obtainable with greater and greater incidence angles between the measurement beam and the reference beam, such that the frequency of the pattern of interference fringes becomes greater than the spatial frequency of the photodetectors—a condition that brings about the occurrence of the aliasing phenomenon.

[0105] Taking into consideration a constant number of photodetectors, this approach makes it possible to increase the measurement range without losing information, simply at the cost of a reduced contrast of the interference fringes since a plurality of fringes are detected by a single photodetector.

[0106] It may be proven from the prior art that the contrast v of the interference fringes is dependent on the aliasing factor k.sub.f/k.sub.p according to the relationship:

custom-character ≅|sin c(k.sub.f/k.sub.p)|

[0107] and is zero at integer multiples of the spatial frequency of the photodetectors k.sub.p, as shown in FIG. 8.

[0108] Advantageously, in order to have a locally maximum contrast, the spatial frequency of the pattern of interference fringes has to be greater than the spatial frequency of the photodetectors and different from the multiples of the spatial frequency of the photodetectors, preferably close to a half-integer multiple of said spatial frequency of the photodetectors.

[0109] In fact, as is clear from the graph in FIG. 8, which shows the trend, as a continuous line, of the contrast v between interference fringes, which trend is calculated as a function of the k.sub.f/k.sub.p ratio, the local maxima are close to the half-integer multiples of the spatial frequency of the photodetectors, but with a rapid decline in the maximum contrast (qualitatively indicated in the figure by the non-continuous line).

[0110] Advantageously, it is possible to select angles of incidence between the measurement beam and the reference beam so as to obtain a k.sub.f/k.sub.p ratio that is equal to approximately 1.5 (or approximately 2.5, approximately 3.5, etc.).

[0111] The invention described above may also be improved as described in the following.

[0112] In general, the propagation characteristics of the measurement optical radiation beam are influenced by the physical parameters (temperature, pressure, mechanical deformation) of the transmission means in which said beam propagates, essentially since the refractive index of the transmission means may vary depending on these parameters.

[0113] In a machine for laser cutting, drilling or welding a material or for the additive manufacture of three-dimensional structures by means of a laser, comprising a working head bearing a nozzle for supplying a flow of assist gas, which wants to determine the distance between the nozzle and the material being processed, the measurement optical radiation beam is made to propagate through the nozzle. Therefore, the propagation characteristics of the measurement beam are influenced by the pressure of the assist gas.

[0114] FIG. 9a shows a dependency relationship between the result of the interferometry reading, expressed in terms of difference in optical length between the measurement optical path P.sub.M and the reference optical path P.sub.R, and the pressure of an assist gas, which forms along a portion of the measurement optical path (typically in the chamber of the nozzle for supplying the assist gas), for a predetermined separation distance between (the nozzle of) the working head and the surface of the material of 1 mm. As can be seen from the experimental values conducted in two measurements and from the interpolation curve that is discontinuous in portions, the dependency is virtually linear.

[0115] In order to improve the accuracy of the method of the invention, the determination of the difference in optical length between the measurement optical path and the reference optical path may therefore preferably be based on a normalized optical length of the measurement optical path, which length is calculated from the geometric length and from a normalized refractive index of the portion of said measurement optical path that passes through the chamber of the assist gas, or the nozzle. The normalized refractive index is calculated as a function of the pressure of the assist gas in said chamber, according to a predetermined nominal dependency relationship between the refractive index of the assist gas and the pressure of said gas.

[0116] For these reasons, the pressure of the assist gas in the assist gas chamber of the nozzle may be directly detected by pressure sensors facing said chamber, or this may be derived indirectly from a measurement of the change in the local position of a surface of an optical element for protecting or delimiting the chamber of the assist gas along the axis of the measurement beam, according to a predetermined nominal relationship between the position of the surface of said optical element relative to a particular predetermined nominal position and the pressure of the assist gas.

[0117] The measurement of the change in the local position of said surface of the optical element is determined, for example, as a function of the difference in length between (a) a supplementary measurement optical path referring to said optical element, including at least one of (i) a first portion between the source of the measurement beam and the optical element on a first surface on which said measurement beam impinges with partial back-reflection and (ii) a second portion between the surface of the material being processed and the optical element on a second surface on which said measurement beam impinges with partial back-reflection, and (b) a particular supplementary reference optical path having an optical length that is equal to the optical length of the supplementary measurement optical path of said optical element in a nominal operating state that includes partial back-reflection of the measurement beam at said first or second surface of said optical element when this is in a predetermined nominal position along the axis of the processing laser beam, for a predetermined reference pressure value for the assist gas in the assist gas chamber of the nozzle.

[0118] FIG. 9b shows a dependency relationship between the result of the interferometric reading, expressed in terms of change in the local position of a surface of an optical element for protecting or delimiting the chamber of the assist gas along the axis of the measurement beam, and the trend (increasing, decreasing) for the pressure of the assist gas in the above-mentioned chamber. The curve A represents the change in the local position of a surface of the optical element for protecting or delimiting the chamber of the assist gas as the pressure inside the chamber increases. The curve B represents the change in the local position of a surface of the optical element for protecting or delimiting the chamber of the assist gas as the pressure inside the chamber decreases.

[0119] In more general terms, the determination of the difference in optical length between the measurement optical path and the reference optical path may be based on a normalized optical length of the measurement optical path, which is calculated from the geometric length and from a normalized refractive index of the transmission means of said measurement optical path, or of a transmission means of a portion of said measurement optical path, which refractive index is calculated on the basis of the temperature of said portion of the optical path according to a predetermined nominal relationship.

[0120] Alternatively or in combination with the above, the determination of the difference in optical length between the measurement optical path and the reference optical path may be based on a normalized optical length of the measurement optical path which is calculated from the normalized geometric length and from a refractive index of a material transmission means of a portion of said measurement optical path, in which the normalized geometric length is calculated on the basis of the mechanical deformation of said material transmission means according to a predetermined nominal relationship.

[0121] Even more advantageously, the technique that forms the subject matter of the invention makes it possible to determine a disturbance in the current optical length of at least one portion of the measurement optical path with respect to the current optical length of a corresponding portion of the reference optical path, and to correct the value determined for the separation distance between the working head and the surface of the material on the basis of said disturbance, for example by subtracting the disturbance measurement from the measurement of the processing distance (possibly after applying a correction factor). The disturbance forms, for example, as a result of the change in at least one physical parameter of the transmission means within which the measurement optical path extends.

[0122] For these reasons, the measurement beam that impinges on the sensor arrangement S comprises at least one measurement calibration beam that results from a measurement calibration optical path being traveled along, in which the measurement beam is reflected or diffused by at least one back-reflecting surface of a static optical element interposed along the measurement optical path, and in which the reference beam that impinges on the sensor arrangement S comprises a particular reference calibration beam that results from a reference calibration optical path being traveled along, which has an optical length that is equivalent to the optical length of the measurement calibration optical path in a nominal calibration operating state in which the geometric length and the refractive index of the transmission means of the measurement calibration optical path are equal to the geometric length and to the refractive index of the transmission means of the reference calibration optical path within a predetermined tolerance range. The static optical element may, for example, be the optical focusing system 16 of the laser beam.

[0123] The determination of the disturbance in the current optical length of at least one portion of the measurement optical path includes the following steps: [0124] Superimposing the measurement calibration beam and the reference calibration beam on a common region of incidence of the sensor arrangement S along the illumination axis; [0125] Detecting the position of a pattern of interference fringes between the measurement calibration beam and the reference calibration beam along the illumination axis in the common region of incidence; and [0126] Determining a difference in optical length between the measurement calibration optical path and the reference calibration optical path—indicative of a difference between (a) the geometric length of the measurement calibration optical path and the geometric length of the reference calibration optical path, and/or (b) the refractive index of the measurement calibration optical path and the refractive index of the reference calibration optical path—respectively on the basis of the position of the pattern of interference fringes along the axis of illumination of the region of incidence. The difference in optical length between the measurement calibration optical path and the reference calibration optical path is indicative of the above-mentioned disturbance in the current optical length of at least one portion of the measurement optical length.

[0127] In the event that the position of the pattern of interference fringes is detected, a predetermined reference position of the pattern of interference fringes—corresponding to the condition in which the optical length of the measurement and reference calibration optical paths are equal—may, purely by way of non-limiting example, be a middle position or an end position along the illumination axis of the photodetectors.

[0128] Another solution for increasing the measurable difference range between the lengths of the measurement and reference paths by means of the technique that forms the subject matter of the invention is to make use of partial back-reflections at the surfaces of at least one optical element interposed along the optical path of the processing laser beam and of the measurement optical radiation beam, or to make use of reference optical paths having predetermined lengths that differ from the length of the main reference optical path.

[0129] In one embodiment, the measurement beam that impinges on the sensor arrangement S comprises a main measurement beam that results from a main measurement optical path being traveled along, with reflection from the surface of the material in the processing region, and transmission through each optical element interposed along the optical path of the high-power processing laser beam, and at least one additional multiplexed measurement beam that results from an additional measurement optical path being traveled along, with reflection from the surface of the material being processed and which has a greater geometric length than the geometric length of the main measurement optical path, for example since it includes at least one partial back-reflection at the surface of an optical element interposed along the optical path of the high-power processing laser beam and of the measurement optical radiation beam.

[0130] In this embodiment, the method of the invention is based on the detection of the position of an additional pattern of interference fringes on the common region of incidence C of the sensor arrangement S, determined by the interference between the additional measurement beam and the reference beam. The additional pattern of interference fringes comprises, for example, a peak or maximum intensity of the envelope of the optical radiation that is different from, for example lower than, the peak or maximum intensity of the envelope of the optical radiation of the main pattern of interference fringes between the main measurement beam and the reference beam, or (ii) an intrinsic position of the intensity envelope of the optical radiation that is different from the intrinsic position of the intensity envelope of the optical radiation of the main pattern of interference fringes, in the case in which it appears at the same time as the main pattern of interference fringes.

[0131] FIG. 10a is a graph showing the signals emitted by the photodetectors along the illumination axis of the sensor arrangement S (vertical axis), which signals are indicative of the intensity of the envelope of the pattern of interference fringes that forms on the common region of incidence. In particular, the figure shows the interferometric signals and therefore the spatial position of the pattern of interference fringes along the illumination axis (vertical axis) as a function of the separation distance between the working head and the material facing it (horizontal axis). For example, such a graph may be generated in a calibration step by providing a fixed length of the reference optical path and continuously varying the relative position between the working head and the surface of the material—that is the separation distance of the working head from the surface of the material—along the z axis, and by acquiring interferometric signal readings as a function of predetermined discrete values for the separation distance.

[0132] The figure shows the acquisition of a strong interferometric signal in the aliasing state and the translation of the envelope of the pattern of interference fringes over a range of approximately 2 mm (corresponding to approximately 1500 pixels) according to an approximately linear trend of the peak of the signal indicative of the pattern of interference fringes, shown in FIG. 10b. The sensitivity may be defined as the separation distance corresponding to the dimensions of a photodetector or pixel of the region of incidence, in this case 1.5 um/pixel. The translation of the envelope of the pattern of interference fringes over the entire illumination axis of the sensor arrangement makes it possible to determine a separation distance between the working head and the surface of the material of from approximately 0.25 mm to approximately 2 mm.

[0133] In the circled regions, corresponding additional multiplexed signals are marked that are indicative of the identification of respective additional patterns of interference fringes along the illumination axis of the sensor arrangement, which result from an additional measurement or reference optical path being traveled along, which has a geometric length that is greater than the geometric length of the main measurement or reference optical path, which includes at least one partial back-reflection at the surface of an optical element interposed along the optical path of the processing laser beam.

[0134] In the case in which several separate operating ranges are not facing or superimposed on the sensor arrangement but are separated to a sufficient degree in order to alternatively show the respective interference fringes, the selection of the pattern of interference fringes is automatic, as a result of reaching a separation distance between the working head and the material in which only one of the main measurement beam and the additional measurement beam interferes with the reference beam so as to produce a pattern of interference fringes that falls on the surface of the sensor arrangement S.

[0135] In the previous condition, a difference in optical length is therefore determined between the additional measurement optical path and the reference optical path, which is indicative of a difference between (i) the current separation distance between the working head and the surface of the material in the processing region, and (ii) the predetermined nominal separation distance as a function of the position of the additional pattern of interference fringes along the illumination axis of the region of incidence.

[0136] In a different embodiment, the reference beam that impinges on the sensor arrangement S comprises a main reference beam that results from a main reference optical path being traveled along and at least one additional multiplexed reference beam that results from an additional reference optical path being traveled along, which has a different geometric length to the geometric length of the main reference optical path.

[0137] In this embodiment, the method of the invention is based on the detection of the position of an additional pattern of interference fringes on the common region of incidence of the sensor arrangement S, determined from the interference between the measurement beam and the additional reference beam.

[0138] In this case, too, the additional pattern of interference fringes comprises, for example, a peak or maximum intensity of the envelope of the optical radiation that is different from, for example lower than, the peak or maximum intensity of the envelope of the optical radiation of the main pattern of interference fringes between the main measurement beam and reference beam, or (ii) an intrinsic position of the intensity envelope of the optical radiation that is different from the intrinsic position of the intensity envelope of the optical radiation of the main pattern of interference fringes, in the event that it appears at the same time as the main pattern of interference fringes.

[0139] In the event that several separate operating ranges are not facing or superimposed on the sensor arrangement, but are separated to a sufficient degree in order to alternatively show the respective interference fringes, the pattern of interference fringes is selected in order to select the additional reference path.

[0140] In the above condition, a difference in optical length is therefore determined between the measurement optical path and the additional reference optical path, which is indicative of a difference between (i) the current separation distance between the working head and the surface of the material in the processing region, and (ii) the predetermined nominal separation distance as a function of the position of the additional pattern of interference fringes along the illumination axis of the region of incidence.

[0141] As can be understood from FIG. 10a, a sensor arrangement S having an illumination axis having a smaller extension, for example half the extension adopted for the measurements in question, would, however, permit the detection of the separation distance between the working head and the surface of the material in the same range of values, 0.25-2 mm, relying on the signal reading that is indicative of the main pattern of interference fringes in a first range and on the signal reading that is indicative of the additional pattern of interference fringes in a second range.

[0142] FIG. 10c shows a series of graphs representing a measurement carried out during a cutting process, in the example a process of cutting a square incision having a width of 40 mm in a flat plate made of mild steel having a thickness of 3 mm, operating with the working head at a nominal distance from the plate that may vary between 1.3 and 1.2 mm during the process.

[0143] The top graph shows the trend over time of a series of process parameters. In particular, the curves indicated as V.sub.x and V.sub.y represent the translational speed of the cutting head in the orthogonal directions x and y on the cutting plane, the curve indicated as P.sub.L represents the optical intensity of the processing laser beam and the curve Pr represents the pressure of the assist gas. The middle graph shows the trend measured for the real separation distance between the working head and the piece. The bottom graph shows the trend over time of the interference fringes obtained by means of the detection technique in the space domain.

[0144] The accurate determination of the separation distance between the working head and the surface of the material in a processing region, be it a current processing region or a calibration processing region, suitably allows the unit ECU for controlling the process of the laser processing machine to also use feedback for the correction or the control of the processing distance or other processing parameters, for example acting on the movement actuator means 40 in order to control the movement of the working head, for example along the Z axis towards or away from the material, as a function of the result of the interferometric measurement, for example for keeping the distance between the working head and the material around a predetermined value as a function of a predetermined processing project. This is particularly useful for improving the efficiency of a cutting process, for example. Alternatively or in addition, the determination of the separation distance between the working head and the surface of the material allows the unit ECU for controlling the process to use feedback to control the movement of the working head along the axes alternative to the Z axis by acting on the movement actuator means 40, after spatial scanning, for example in order to maintain the trajectory of the working head along a predetermined path adapted to the morphology of the surface being processed, therefore also with movement in translation or an inclination with respect to the surface. This is particularly useful for optimizing a welding process, for example as a result of tracking a welding joint.

[0145] It is noted that the design proposed in the above discussion for this invention is of a purely exemplary nature and does not limit this invention. An expert in the field will be able to easily implement this invention in various embodiments, which do not depart from the principles set out here and therefore fall under the present patent.

[0146] This is particularly applicable with regard to the possibility of using different low coherence optical radiation wavelengths to those cited, or measurement and reference optical paths having interposed optical elements that are different from those illustrated in FIG. 5 purely by way of non-limiting example.

[0147] Of course, without prejudice to the principle of the invention, the embodiments and the implementation details may be modified greatly with respect to what has been described and illustrated purely by way of non-limiting example, without thereby departing from the scope of protection of the invention defined by the attached claims.

METHOD AND SYSTEM FOR DETERMINING AND CONTROLLING THE SEPARATION DISTANCE BETWEEN A WORKING HEAD OF A LASER PROCESSING MACHINE AND THE SURFACE OF AN OBJECT BEING PROCESSED BY MEANS OF LOW COHERENCE OPTICAL INTERFEROMETRY TECHNIQUES

Inventors

Cpc classification

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G01B9/0209

PHYSICS

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G01B9/02072

PHYSICS

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B23K26/048

PERFORMING OPERATIONS; TRANSPORTING

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Y02P10/25

GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS

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B23K26/032

PERFORMING OPERATIONS; TRANSPORTING

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G01B9/02032

PHYSICS

International classification

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G01B9/02055

PHYSICS

Classification Explorer

B23K26/03

PERFORMING OPERATIONS; TRANSPORTING

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B23K26/04

PERFORMING OPERATIONS; TRANSPORTING

Classification Explorer

G01B9/0209

PHYSICS

Abstract

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Description