Inorganic multilayer stack and methods and compositions relating thereto
10522695 ยท 2019-12-31
Assignee
Inventors
Cpc classification
Y02P20/133
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
H01L31/0203
ELECTRICITY
Y02E10/541
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
H01L2924/0002
ELECTRICITY
Y10T428/31678
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
G02F1/0107
PHYSICS
Y10T428/31504
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
Y10T428/265
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
H01L2924/00
ELECTRICITY
H01L2924/0002
ELECTRICITY
H01L23/564
ELECTRICITY
H10K50/8445
ELECTRICITY
Y02E10/542
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
H01L2924/00
ELECTRICITY
Y02E10/549
GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
International classification
H01L31/0203
ELECTRICITY
G02F1/01
PHYSICS
H01L31/0392
ELECTRICITY
C23C14/56
CHEMISTRY; METALLURGY
Abstract
A multilayer stack is described. The multilayer stack includes: (i) one or more inorganic barrier layers for reducing transport of gas or vapor molecules therethrough; (ii) an inorganic reactive layer disposed adjacent to one or more of the inorganic barrier layers, and the reactive layer capable of reacting with the gas or the vapor molecules; and (iii) wherein, in an operational state of the multilayer stack, the vapor or the gas molecules that diffuse through one or more of the inorganic barrier layers react with the inorganic reactive layer, and thereby allow said multilayer stack to be substantially impervious to the gas or the vapor molecules.
Claims
1. A multilayer stack, comprising: one or more inorganic barrier layers for reducing transport of gas or vapor molecules therethrough; an inorganic reactive layer disposed adjacent to said one or more inorganic barrier layers, said inorganic reactive layer capable of reacting with gas or vapor molecules, said inorganic reactive layer is doped with one or more non-oxide chemical components; and wherein said one or more inorganic barrier layer is completely coextensive with said inorganic reactive layer such that each portion of said reactive layer has disposed thereon said one or more inorganic barrier layer, and in an operational state of said multilayer stack, vapor or gas molecules that diffuse through said one or more inorganic barrier layers react with said inorganic reactive layer, and thereby allow said multilayer stack to be substantially impervious to gas or vapor molecules.
2. The multilayer stack of claim 1, wherein vapor or gas molecules includes at least one member selected from a group consisting of moisture, oxygen, nitrogen, hydrogen, carbon dioxide, argon and hydrogen sulfide.
3. The multilayer stack of claim 1, wherein said inorganic barrier layer includes at least one member selected from a group consisting of a metal, a metal oxide, a metal nitride, a metal oxy-nitride, a metal carbo-nitride, and a metal oxy-carbide.
4. The multilayer stack of claim 1, wherein said inorganic barrier layer includes at least one member selected from a group consisting of aluminum, silver, silicon, zinc, tin, titanium, tantalum, niobium, ruthenium, gallium, platinum, vanadium and indium.
5. The multilayer stack of claim 1, wherein said inorganic reactive layer includes at least one member selected from a group consisting of alkali metal oxide, zinc oxide, titanium oxide, metal-doped zinc oxide and silicon oxide.
6. The multilayer stack of claim 5, wherein said inorganic reactive layer includes an inorganic matrix.
7. The multilayer stack of claim 1, wherein the thickness of said inorganic barrier layer is between about 10 nm and about 1 micron.
8. The multilayer stack of claim 1, wherein the thickness of said inorganic reactive layer is between about 10 nm and about 1 micron.
9. The multilayer stack of claim 1, wherein said one or more barrier layers includes two barrier layers, and said reactive layer is sandwiched between said two barrier layers.
10. The multilayer stack of claim 1, wherein said reactive layer includes columnar structures.
11. The multilayer stack of claim 1, wherein each of said one or more barrier layers are made from one or more amorphous materials.
12. The multilayer stack of claim 1, wherein said inorganic barrier layer is substantially transparent.
13. A composition of a multilayer barrier stack, comprising: an inorganic barrier layer for reducing transport of gas or vapor molecules therethrough, and said inorganic barrier layer including at least one member selected from a group consisting of a metal, a metal oxide, a metal nitride, a metal oxy-nitride, a metal carbo-nitride, and a metal oxy-carbide-nitride; an inorganic reactive layer including an effective amount of a reactive material to react with gases or vapor molecules that have diffused through said inorganic barrier layer, and said reactive material includes at least one material selected from a group consisting of alkali metal oxide, zinc oxide, titanium oxide, metal-doped zinc oxide and silicon oxide; and wherein said inorganic reactive layer is doped with one or more non-oxide chemical components, and wherein said inorganic barrier layer is completely coextensive with said inorganic reactive layer such that each portion of said reactive layer has disposed thereon said inorganic barrier layer.
14. The composition of claim 13, wherein said at least one member in said inorganic barrier layer has a concentration that is between about 1% (by weight) and about 100% (by weight).
15. The composition of claim 13, wherein said at least one reactive material has a concentration that is between about 1% (by weight) and about 100% (by weight).
Description
BRIEF DESCRIPTION OF THE DRAWINGS
(1)
(2)
(3)
(4)
(5)
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS
(6) In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. It will be apparent, however, to one skilled in the art that the present invention may be practiced without limitation to some or all of these specific details. In other instances, well-known process steps have not been described in detail in order to not unnecessarily obscure the invention.
(7)
(8) In multilayer stack 200, barrier layer 202 serves as a barrier to moisture and undesired gases, such as oxygen, nitrogen, hydrogen, carbon dioxide, argon and hydrogen sulfide. Barrier layer 202 includes at least one material selected from a group consisting of a metal, metal oxide, a metal nitride, a metal oxy-nitride, a metal carbo-nitride and a metal oxy-carbide. Furthermore, barrier layer 202 preferably includes carbon or oxygen, in their elemental form or as part of chemical compounds. Examples of barrier layer 202 include silicon oxide, aluminum oxide, aluminum nitride, aluminum oxy-nitride, tantalum oxide, niobium oxide, silicon nitride, silicon oxy-nitride, silicon oxy-carbide and silicon carbo-nitride.
(9) Barrier layer 202 may be made from one or more layers of an inorganic material. In preferred embodiments of the present invention, barrier layer 202 includes an amorphous material. When more than one inorganic layer is used, the different layers are preferably stacked adjacent each other. It is not necessary that the type of inorganic material used in each layer is the same, and may be different in certain embodiments of the present invention. Although barrier layer 202 may be made from any inorganic material that serves as a barrier to the above-mentioned ambient gases, in preferred embodiments of the present invention, barrier layer 202 includes a metal composition, present in its elemental form or as a compound (as described above), that includes at least one member selected from a group consisting of aluminum, silver, silicon, zinc, tin, titanium, tantalum, niobium, ruthenium, gallium, platinum, vanadium, and indium. By way of example, a metal oxide includes Al.sub.xO.sub.y or SiO.sub.x. In barrier layer 202, the presence of effective amount of metals or metal oxides reduces transport of undesired gas or vapor molecules through the barrier layer. In preferred embodiments of the present invention, in barrier layer 202, metals or metal oxides have a concentration that is between about 1% (by weight) and about 100% (by weight), and preferably between about 1% (by weight) and about 50% (by weight).
(10) Barrier layer 202 has a thickness that is between about 10 nm and about 1 micron, and preferably between about 20 nm and about 300 nm.
(11) Barrier layer 202 is designed to reduce transport of gas or vapor molecules therethrough, but is not completely impervious to moisture and certain molecules of undesired gases. To this end, the present invention employs a reactive layer 204, which is designed to react with moisture and molecules of undesired gases, e.g., oxygen, nitrogen, hydrogen, carbon dioxide, argon and hydrogen sulfide, that diffuse through barrier layer 202. According to conventional wisdom, the reactive nature of reactive layer 204 is undesirable in solar cell and other applications, because it absorbs moisture and undesirable ambient gases, causing product performance degradation and eventually leading to product failure. The present invention, however, innovatively uses the reactive nature of reactive layer 204 in a manner that is useful for barrier stack applications. Specifically, moisture and ambient or undesired gases that diffuse through barrier layer 202 react with reactive layer 204, allowing multilayer stack 200 to be substantially impervious to the diffused gas or vapor molecules.
(12) Reactive layer 204 may be made from any inorganic material and is preferably chemically homogenous. In preferred embodiments of the present invention, however, reactive layer 204 include at least one reactive material selected from a group consisting of alkali metal oxide, zinc oxide, titanium oxide, metal-doped zinc oxide and silicon oxide. In certain embodiments of the present invention, reactive layer 204 is doped with one or more non-oxide chemical components. Representative examples of such non-oxide dopant materials include alkali metals, such as calcium, sodium and lithium.
(13) Each of one or more reactive layers may be made from the same material or from different materials. Like barrier layer 202, reactive layer 204 may include one or more reactive layers that are disposed adjacent to each other. Reactive layer 204 includes an effective amount of a reactive material to react with the moisture and undesired or ambient gases that have diffused through an adjacent barrier layer. In preferred embodiments of the present invention, in reactive layer 204, reactive material has a concentration that is between about 1% (by weight) and about 100% (by weight). In more preferred embodiments of the present invention, however, reactive material in reactive layer 204 has a concentration that is between about 90% (by weight) and about 100% (by weight).
(14) Reactive layer 204 may have a total thickness that is between about 10 nm and about 1 micron and that is preferably between about 20 nm and about 500 nm. In certain applications where multilayer stack 200 is fabricated on a plastic substrate and used as an encapsulant, there is a risk that during shipping, handling and storage of the encapsulated product, moisture and undesired ambient gases diffuse through the plastic substrate and react with reactive layer 204. As a result, the required reactive property of reactive layer 204 is depleted, rendering the multilayer stack 200 ineffective. To this end, certain preferred embodiments of the present invention provide an extra barrier layer which is disposed between the plastic substrate and the reactive layer.
(15) If reactive layer 204 is compositionally similar to barrier layer 202, then it is preferable to have the reactive layer sufficiently different from the barrier layer in structure, degree of doping, degree of crystallinity (including a scenario where one layer is amorphous, while the other is not), or reactivity to bind with moisture or undesired ambient gases.
(16)
(17) In the configuration of the multilayer stack shown in
(18) Regardless of whether multilayer stack 200 of
(19) Although inventive barrier and reactive layers of
(20) Furthermore, according to the above-described preferred embodiments, each of inventive barrier and reactive layers are made from one or more different types of inorganic materials. However, in other embodiments of the present invention, the inventive barrier and reactive layers are not so limited. In certain embodiments of the present invention, each of barrier and reactive layers are made from one or more different types of organic materials.
(21) In preferred embodiments of the present invention, multilayer stack 200 of
(22) According to conventional wisdom, when one layer is fabricated adjacent to another layer to form a multilayer stack, a defect present in one layer undesirably propagates to the adjacent layer. The defect propagation problem exacerbates as the number of layers in the multilayer stack increases. In sharp contrast, the present invention has surprisingly and unexpectedly found that an inorganic layer covers defects found in and smoothens the adjacent layer. As a result, inventive multilayer stacks are particularly advantageous for moisture and vapor barrier applications because they prevent or significantly reduce the propagation of defects or undesired structure from one layer to another.
(23) Although inventive multilayer stacks can be made using any technique well known to those skilled in the art, using a roll-to-roll technique, which provides a relatively high throughput, represents a preferred embodiment of the present invention.
(24) A coating process, according to one embodiment of the present invention, begins when a flexible substrate 514 is loaded onto unwind roller 502. Flexible substrate 514 is preferably wrapped around a spool that is loaded onto unwind roller 502. Typically a portion of the wrapped flexible substrate is pulled from the spool and guided around idle rollers 504 and deposition drum 508, which is capable of rotating, so that it connects to takeup roller 506. In the operating state of coating machine 500, unwind roller 502, takeup roller 506 and deposition drum 508 rotate, causing flexible substrate 514 to displace along various locations around cooled deposition drum 508.
(25) Once flexible substrate 514 is loaded inside coating machine 500, the coating process includes striking a plasma inside deposition zone 510. Shutters in the coating zones direct charged particles in the plasma field to collide with and eject the target material so that it is deposited on the flexible substrate. During the coating process, a temperature of flexible substrate 514 is controlled using deposition drum 508 preferably to values such that no damage is done to the substrate. In those embodiments of the present invention where flexible substrate 514 includes a polymeric material, deposition drum 508 is cooled such that the temperature of the deposition drum is preferably near or below a glass transition temperature of the polymeric material. Such cooling action prevents melting of the polymer-based substrate during the deposition process, and thereby avoids degradation of the polymer-based substrate that might occur in the absence of deposition drum 508.
(26) As can be seen from
(27) It is noteworthy that instead of displacing the substrate from one position to another to facilitate deposition of multiple layers, the inventive features of the present invention can be realized by holding the substrate stationary and displacing at least a portion of the coating machine or by displacing both the substrate and the coating machine.
(28) Regardless of the specific process implemented for deposition, it will be appreciated that the roll-to-roll technique of the present invention allows for very rapid deposition of different types and thicknesses of layers on a substrate to form the inventive multilayer stacks. The inventive roll-to-roll fabrication process realizes a very high throughput, which translates into increased revenue. Against the current backdrop where the solar cell industry is being challenged to become a commercially viable alternate energy solution, the inventive multilayer stacks and processes represent a marked improvement over the conventional designs and processes.
(29) As explained above, barrier and reactive layers in multilayer stack 300 of
(30) Although illustrative embodiments of this invention have been shown and described, other modifications, changes, and substitutions are intended. By way of example, the present invention discloses barriers of simple gases and water vapor; however, it is also possible to reduce the transport of organic material using the systems, processes, and compositions of the present invention. Accordingly, it is appropriate that the appended claims be construed broadly and in a manner consistent with the scope of the disclosure, as set forth in the following claims.