METHOD AND DEVICE FOR SIMULTANEOUS INDEPENDENT MOTION MEASUREMENT OF MULTIPLE PROBES IN ATOMIC FORCE MICROSCOPE

Abstract

A device capable of simultaneous independent motion measurement of multiple probes in an atomic force microscope includes at least two cantilever arms arranged in parallel. The end of each cantilever arm is provided with a needle tip. The surface of each cantilever arm is provided with a grating structure with a periodic distribution rule for reflecting laser irradiated on the grating structure and receiving the laser through reflected light detectors. The discrimination and motion measurement includes the steps of irradiating the measurement laser of different wavelengths on the back surfaces of multiple probes through the same light path at the same time, adopting the grating structures of different feature sizes as physical labels of the multiple probes and reflecting high-order reflected light of the laser of different wavelengths by the grating structures at different angles to separate the light path.

Claims

1. A device for simultaneous independent motion measurement of multiple probes in an atomic force microscope, characterized by comprising at least two cantilever arms arranged in parallel on probe bases, wherein the end of each cantilever arm is provided with a needle tip; the surface of each cantilever arm is provided with a grating structure with a periodic distribution rule for reflecting laser irradiated on the grating structure and receiving the laser through reflected light detectors.

2. The device for simultaneous independent motion measurement of multiple probes in the atomic force microscope according to claim 1, characterized in that the surfaces of the at least two cantilever arms are located in the same plane, and the distance between the two adjacent cantilever arms is less than 10 microns.

3. The device for simultaneous independent motion measurement of multiple probes in the atomic force microscope according to claim 1, characterized in that in the same cantilever arm, the grating structure has the same feature sizes, i.e., grating width is equal and the distance between gratings is equal.

4. The device for simultaneous independent motion measurement of multiple probes in the atomic force microscope according to claim 1, characterized in that the feature sizes of the grating structures in different cantilever arms are different.

5. The device for simultaneous independent motion measurement of multiple probes in the atomic force microscope according to claim 1, characterized by further comprising at least two reflected light detectors; the reflected light detectors are arranged on a reflected light path through which the laser is irradiated on the surface of a cantilever arm; and each reflected light detector corresponds to one cantilever arm.

6. The device for simultaneous independent motion measurement of multiple probes in the atomic force microscope according to claim 1, characterized in that light filters are arranged in front of the reflected light detectors; and the central wavelengths of the light filters arranged in front of different reflected light detectors are different to filter the interference of other reflected light sources of the cantilever beams.

7. The device for simultaneous independent motion measurement of multiple probes in the atomic force microscope according to claim 1, characterized in that the reflected light detectors are position sensitive detectors.

8. The device for simultaneous independent motion measurement of multiple probes in the atomic force microscope according to claim 1, characterized in that the wavelengths of the laser correspond to the feature sizes of the grating structures on the surfaces of the cantilever beams, i.e., after the laser of the wavelength is reflected by the grating structure with the corresponding feature size, first-order reflection is generated, and a reflection angle corresponds to a preset light path angle.

9. The device for simultaneous independent motion measurement of multiple probes in the atomic force microscope according to claim 1, characterized in that the first-order reflection of different grating structures has different reflection angles.

10. A method for simultaneous independent motion measurement of multiple probes in an atomic force microscope, characterized by comprising the following steps: irradiating the laser of different wavelengths on at least two cantilever beams through the same light path, and forming reflected light of different reflection angles through the grating structures on the surfaces of the cantilever beams; for each reflected light detector, filtering the interference of reflected light sources of other cantilever beams by the corresponding light filter, so that a plurality of reflected light detectors receive the laser of different wavelengths respectively to detect the motion of the cantilever beams and realize the measurement of simultaneous motion or independent motion of a plurality of cantilever beams.

Description

DESCRIPTION OF DRAWINGS

[0025] FIG. 1 is a schematic diagram of a multi-probe structure which uses grating structures of different feature sizes as physical labels in the present invention;

[0026] FIG. 2 is a top view of FIG. 1;

[0027] wherein 100 represents multiple probes that use grating structures of different feature sizes as physical labels; 1 and 2 are two cantilever beams respectively; 3 and 4 are needle tips of free ends of the cantilever beams 1 and 2 respectively; 5 and 6 are grating lines on the back surfaces of the cantilever beams 1 and 2 respectively; the grating lines 5 and 6 have periodic distribution rule; the distance of the lines 5 is a1; the distance of the lines 6 is a2; 7 is a laser spot irradiated on the back surfaces of the cantilever beams; and laser is mixed laser of different wavelengths;

[0028] FIG. 3 shows a schematic diagram of a measuring light path when multiple probes are stationary;

[0029] wherein 8 is an incident light path of mixed laser of different wavelengths; the wavelengths of the laser correspond to the feature sizes of grating structures on the back surface of a plurality of cantilever beams; 9 is a zero-order reflected light path after incident mixed laser is irradiated on the plurality of cantilever beams with different grating structures; 10 is a first-order reflected laser light path corresponding to the grating structure 5 on the back surface of the cantilever beam 1; 11 is the first-order reflected light path of laser corresponding to the cantilever beam 2 but after irradiated on the grating structure 5 on the back surface of the cantilever beam 1; 12 is the first-order reflected light path of laser corresponding to the cantilever beam 1 but after irradiated on the grating structure 6 on the back surface of the cantilever beam 2; 13 is the first-order reflected laser light path corresponding to the grating structure 6 on the back surface of the cantilever beam 2; 14 is a position sensitive detector of the laser corresponding to the cantilever beam 1; 15 is a light filter used for filtering corresponding laser of the cantilever beam 2 but can pass through the corresponding laser of the cantilever beam 1; 16 is a position sensitive detector of the laser corresponding to the cantilever beam 2; 17 is a light filter used for filtering corresponding laser of the cantilever beam 1 but can pass through the corresponding laser of the cantilever beam 2; and 18 is a normal line perpendicular to the cantilever beams 1 and 2;

[0030] FIG. 4 is a schematic diagram 1 of a method for simultaneous independent motion measurement of multiple probes: and

[0031] FIG. 5 is a schematic diagram 2 of a method for simultaneous independent motion measurement of multiple probes.

[0032] Wherein 19 is a normal line perpendicular to the cantilever beam 2 after the cantilever beam 2 moves downward; 20 is a zero-order reflected light path of laser irradiated on the grating structure on the back surface of the cantilever beam 2; 21 and 22 are reflected light paths of light paths 12 and 13 after moving on the cantilever beam 2; and 23 is a laser spot on the position sensitive detector 16.

DETAILED DESCRIPTION

[0033] The present invention will be further described in detail below in combination with the drawings and the embodiments.

[0034] The present invention relates to a method and device for simultaneous independent motion measurement of multiple probes in an atomic force microscope by taking grating structures as physical labels. The grating structures of different feature sizes on the back surfaces of a plurality of cantilever beams of multiple probes are taken as the physical labels of different probes. An optical lever measurement method is used for simultaneous independent motion measurement of the multiple probes. The laser of different wavelengths is irradiated on multiple cantilever beams through the same light path, and high-order reflected light of different reflection angles is formed through the grating structures on the back surfaces of the cantilever beams; light filters are arranged in front of position sensitive detectors and can filter the interference of reflected light sources of other cantilever beams and finally irradiate the light onto the corresponding position sensitive detector (PSD) to realize simultaneous independent motion measurement of multiple probes. Independent motion control of multiple probes, assisted by a multi-probe measurement method, can realize simultaneous measurement and imaging, and collaborative control and measurement at multiple points.

[0035] The multi-probe detection technology based on atomic force microscope technology in the present invention includes at least a probe 1 and a probe 2; the probe 1 and the probe 2 measure reflection gratings 1 and 2 with different characteristic parameters on light reflecting surfaces; the first-order reflection of the grating 1 and the grating 2 has different reflection angle 1 and reflection angle 2; reflected light detectors 1 and 2 corresponding to the probe 1 and the probe 2 are in different spatial positions; and the probe 1 and the probe 2 can realize simultaneous measurement and individual control.

[0036] As shown in FIG. 1, multiple probes 100 of the present invention are composed of cantilever beams 1 and 2, needle tips 3 and 4 of the free ends of the cantilever beams, and grids 5 and 6 on the back surfaces of the cantilever beams. The cantilever beams 1 and 2 are parallel and in the same plane in a stationary state, and have a distance within 10 microns. The back surfaces of the cantilever beams 1 and 2 have grids 5 and 6 respectively which have feature sizes (distances) a1 and a2 as physical labels of the cantilever beams. The cantilever beams 1 and 2 can have different sizes and mechanical properties, and the needle tips 3 and 4 can also have different sizes and material properties.

[0037] As shown in FIG. 2, the laser of different wavelengths is irradiated on the cantilever beams 1 and 2 at the same time through the same light path, to form overlapping laser spots 7.

[0038] FIG. 3 to FIG. 5 show embodiments of a method for independent motion measurement of multiple probes in the present invention. As shown in FIG. 3, two incident laser beams have wavelengths of 532 nm and 670 nm respectively, and are irradiated on the cantilever beams 1 and 2 through the same light path 8. The grids on the back surfaces of the cantilever beams 1 and 2 have feature sizes (distances) of 2 microns and 1 micron. The cantilever beams 1 and 2 are in a stationary state, and the surfaces of the two cantilever beams are in the same plane. The angle between the laser light path 8 and a cantilever beam normal line 18 is 10 degrees. The formula of the reflection angle of a diffraction grating is β=arcsin(sin α−mλ/a) where α=10° is an angle between the incident laser light path 8 and the normal line 18, λ is the wavelength of incident laser, m is the order of reflected laser, a is the grating feature size (distance), and β is an angle of an m-order reflected laser light path and the normal line 18. In the present embodiment, the feature sizes of the grids on the cantilever beams 1 and 2 are a1=2000 nm and a2=1000 nm respectively, and the measured laser wavelengths corresponding to the cantilever beams 1 and 2 are λ1=532 nm and λ2=670 nm respectively. The first-order (m=−1) reflected light paths on opposite sides of the incident light path 8 are 10, 11, 12 and 13. The reflected light paths 10 and 11 correspond to the first-order reflection of the laser with wavelengths of λ1 and λ2 on the cantilever beam 1 (with grid feature size of a1=2000 nm) respectively, and the reflected light paths 12 and 13 correspond to the first-order reflection of the laser with wavelengths of λ1 and λ2 on the cantilever beam 2 (with grid feature size of a1=1000 nm) respectively. The angles between the reflected light paths 10, 11, 12 and 13 and the normal line 18 are β10=26.08°, β11=30.57°, β12=44.88° and β13=57.53° respectively; the light path 10 and the light path 11 are in one group, and the light path 12 and the light path 13 are in one group; and the angle difference between the two groups of laser light paths can reach more than 20°, which can be distinguished by the spatial positions of the PSDs 15 and 16. That is, the light paths 10 and 11 are irradiated on the PSD 15, and the light paths 12 and 13 are irradiated on the PSD 16 without mutual interference. The light filter 15 filters the laser with the wavelength of λ2=670 nm and passes through the laser with the wavelength of λ1=532 nm, and only the laser 10 with the wavelength of λ1=532 nm reflected through the cantilever beam 1 is irradiated on the PSD 15. The light filter 17 filters the laser with the wavelength of λ1=532 nm and passes through the laser with the wavelength of λ2=670 nm, and only the laser 13 with the wavelength of λ2=670 nm reflected through the cantilever beam 2 is irradiated on the PSD 16. That is, the laser light path 10 detected by the PSD 14 is only related to the cantilever beam 1, and the laser light path 13 detected by the PSD 16 is only related to the cantilever beam 2. As shown in FIG. 4, when the cantilever beam 1 is stationary and the cantilever beam 2 moves downward, a deflection angle is generated between the cantilever beam 2 and the horizontal direction. In the present embodiment, the cantilever beam 2 deflects downward by 2° so that the normal line 19 of the cantilever beam 2 differs from the normal line 18 of the cantilever beam 1 by 2°. The first-order reflected light path of the laser irradiated on the cantilever beam 2 is changed accordingly, and the light paths 12 and 13 in the stationary state of the cantilever beam 2 are changed into the light paths 21 and 22 respectively. According to the formula of the reflection angle of the diffraction grating, the deflection angles of the light paths 21 and 22 relative to the normal line 18 can be calculated as β21=49.72° and β22=63.39°.

[0039] As shown in FIG. 5, 23 is the laser spot formed when the light path 13 is irradiated on the PSD 16, and the PSD can detect the position change of the spot 23 on four-quadrant PSD 16 in real time. When the cantilever beam 2 moves, the light path 13 becomes the light path 22, and the spot 23 on the PSD 16 is also changed, so as to detect the motion of the cantilever beam 2. By using the method of the patent invention, the motion of up-down bending and left-right twisting of the cantilever beams can be detected. Therefore, the motion of the cantilever beam 2 can be detected according to the position change of the laser light path 13 on the PSD 16. Similarly, the motion of the cantilever beam 1 can be detected according to the position change of the laser light path 10 on the PSD 14. Moreover, the detection results of the PSDs 14 and 16 are independent without mutual interference, thereby realizing simultaneous independent motion measurement of the multiple probes.