Apparatus and Method for Measuring an Optical Property of an Optical System
20240102885 ยท 2024-03-28
Inventors
Cpc classification
International classification
Abstract
An apparatus for measuring the MTF or another optical property of an optical system includes an object to be imaged, which has a plurality of structures arranged in a plane and separated from one another, a two-dimensional image sensor, and collecting optics having a focal length f. The image sensor has a distance a from the collecting optics with 0.94.Math.f?a?1.1.Math.f. A holder for the optical system is arranged such that the optical system is located in a beam path between the object and the collecting optics. The image sensor and the collecting optics are configured such that all structures can be imaged by the optical system and the collecting optics onto the image sensor simultaneously.
Claims
1-12. (canceled)
13. An apparatus for measuring an optical property of an optical system, the apparatus comprising: an object to be imaged having a plurality of structures arranged in a plane and separated from each other; collecting optics having a focal length f; a holder configured to hold the optical system, wherein the holder is arranged such that the optical system is located in a beam path between the object and the collecting optics; and a two-dimensional image sensor having a distance a from the collecting optics with 0.9.Math.f?a?1.1.Math.f, wherein the image sensor and the collecting optics are configured such that all structures can be imaged by the optical system and the collecting optics onto the image sensor simultaneously.
14. The apparatus of claim 13, wherein the object is an illuminated reticle.
15. The apparatus of claim 13, wherein the structures are crosshairs.
16. The apparatus of claim 13, wherein the holder is arranged in a diverging beam path.
17. The apparatus of claim 13, wherein a collimator is arranged in a light path between the object and the holder.
18. The apparatus of claim 17, wherein the collimator is a conoscopic lens.
19. The apparatus of claim 17, wherein the object is movable along an optical axis of the apparatus to vary a distance between the collimator and the object.
20. The apparatus of claim 13, wherein the image sensor is movable along an optical axis of the apparatus.
21. A method of measuring at least one optical property of an optical system, the method comprising the following steps: providing an object, a two-dimensional image sensor, and collecting optics having a focal length f, wherein the image sensor has a distance a from the collecting optics with 0.9.Math.f?a?1.1.Math.f; inserting the optical system into a beam path between the object and the collecting optics; simultaneously imaging the object within a field of view of the optical system and the collecting optics onto the image sensor using the optical system and the collecting optics; and determining the at least one optical property by evaluating an image of the object formed on the image sensor.
22. The method of claim 21, wherein the optical system has a variable focal length, and wherein the optical properties of the optical system are measured for at least two different focal lengths.
23. The method of claim 21, wherein the optical system is afocal, and wherein a collimator is disposed in the light path between the object and the optical system.
24. The method of claim 21, wherein at least one optical property is selected from a group consisting of: distortion, image field curvature, field of view, and edge light falloff.
25. An apparatus for measuring an optical property of an optical system, the apparatus comprising: an object to be imaged having a plurality of structures; collecting optics; a holder configured to hold the optical system, wherein the holder is arranged such that the optical system is located in a beam path between the object and the collecting optics; and a two-dimensional image sensor that is movable along an optical axis of the apparatus, wherein the image sensor and the collecting optics are configured such that all structures can be imaged by the optical system and the collecting optics onto the image sensor simultaneously.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0028] In the following, embodiments of the present disclosure are explained in more detail with reference to the drawings. In these show:
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DESCRIPTION OF EMBODIMENTS
1. Prior Art
[0038] In order to explain the operation of the measuring apparatus according to the disclosure, reference is first made to
[0039] The measuring apparatus 10 is intended to measure the modulation transfer function (MTF) of an optical system, hereinafter referred to as specimen 12. The specimen 12 is indicated here only as a single lens; often it will be an optical system with several refractive and/or reflective optical elements. The specimen 12 is held by a holder 13. The holder 13 can comprise an adjustment device with which the specimen 12 can be positioned axially centered and untilted in the beam path of the device 10.
[0040] The modulation transfer function is an important tool for quantitatively evaluating the imaging quality of optical systems and describes the resolving power of an optical system by the ratio of the relative image contrast to the relative object contrast. When an object is imaged by an optical system, there is inevitably a reduction in quality in the image plane due to aberrations and diffraction phenomena. Manufacturing deviations as well as assembly and alignment errors also weaken the imaging performance of the specimen 12.
[0041] For measuring the modulation transfer function, the specimen 12 images an object; the modulation transfer function of the specimen 12 can be inferred from the image of the object. The object imaged by the specimen 12 is formed by a light pattern generated by a 10 light pattern generating device 14. The light pattern generating device 14 has a reticle 16 which is uniformly illuminated by a light source 20 represented as a bulb using a condenser 22.
[0042] A reticle is a glass sheet that carries a structured coating on one side. The structuring can be produced, for example, by a photolithographically defined etching process. In
[0043] The specimen 12 is arranged in the measuring apparatus 10 so that its optical axis is aligned with a reference axis 24 of the measuring apparatus 10. The reference axis 24 of the apparatus 10 thereby coincides with the optical axis of the condenser 22. In addition, the holder 13 is used to axially position the specimen 12 such that the reticle 16 is arranged in the focal plane 26 of the specimen 12. As a result, the light pattern defined by the structures 18 is imaged to infinity by the specimen 12.
[0044] Two identically constructed cameras 28a, 28b are arranged on a side of the specimen 12 opposite the light pattern generation device 14. The cameras 28a, 28b each contain a lens 30 and a spatially resolving image sensor 32, which is located in a focal plane of the lens 30. A cutout of the light pattern generated by the light pattern generating device 14 is thereby formed on the image sensor 32 in each case. The cutout is thereby determined, among other things, by the arrangement of the cameras 28a, 28b with respect to the reference axis 24 and by the field of view of the cameras. The camera 28a, whose optical axis 34a is aligned with the reference axis 24, captures an image of a structure 18 in the center of the reticle 16. The optical axis 34b of the other camera 28b is inclined to the reference axis 24. As a result, the camera 28b captures an image of one of the outer structures 18.
[0045] Other cameras are usually arranged around the central camera 28, which are not shown in
[0046] The conventional setup shown in
[0047] With the known measuring apparatus 10 shown in
2. First Embodiment
[0048]
[0049] Components marked with unstroked reference numerals X correspond to components X in
[0050] The plurality of cameras 28a, 28b are replaced in the apparatus 10 according to the disclosure by a single camera 28, which also has collecting optics 30. In the illustrated embodiment, the distance a between a sensor plane 33 and the collecting optics 30 (or, more precisely, its image-side main plane H) is equal to the focal length f of the collecting optics 30. Measuring light that is incident onto the collecting optics 30 as collimated beam is therefore focused on the image sensor 32.
[0051] The dimensions of the image sensor 32 and the collecting optics 30 may be selected such that the entire field of view of the specimen 12 is captured by the image sensor 32. This means that all structures 18 on the reticle 16, which is shown in a top view in
[0052] In
[0053] In
[0054] The apparatus 10 is characterized by the fact that the entire reticle 16 lying in the field of view FOV or image space is simultaneously imaged onto the image sensor 32. The collecting optics 30 and the image sensor 32 are thus designed so that all field points that can be imaged by the specimen 12 are actually imaged on the image sensor 32. In this way, distortion of the specimen 12, for example, can be measured very easily and with a high degree of accuracy, since, unlike conventional apparatuses of this type, no individual images are produced, but the entire field of view/image field is captured. Typically, a reticle 16 whose structures 18 form a regular grid is used to measure the distortion.
[0055] It is also very easy to measure the size of the field of view FOV, since the image sensor 32 is normally larger than the field of view. Furthermore, any edge light fall-off can be easily detected with the apparatus 10.
[0056] Indicated by 38 in
[0057]
3. Second Embodiment
[0058]
[0059] In the apparatus 210, a collimator 42 is arranged between the reticle 16 and the holder 13 for the specimen 212, in whose focal plane 226 the reticle 16 is located. The collimator 42 images the reticle 16 to infinity so that the specimen 212 is located in the collimated beam path. Otherwise, the apparatus 210 does not differ from the apparatus 10 of the first embodiment.
[0060] The collimator 42 can be designed as a conoscopic lens. This allows a virtual aperture to be optically created in the plane of the specimen without having to introduce a physical aperture into the beam path near the specimen.
4. Third Embodiment
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[0062] If the collimator additionally has a variable focal length, which is indicated in
5. Fourth Embodiment
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[0065] The apparatus 410 can also be used to measure image field curvature in a simple manner. For this purpose, for example, several images of the reticle 16 can be taken in different axial displacement positions of the image sensor 32 and the image contrast can be measured as a function of the distance a.