SYSTEMS AND METHODS OF JOINING SUBSTRATES USING NANO-PARTICLES
20240085635 ยท 2024-03-14
Inventors
Cpc classification
G02B6/3684
PHYSICS
B32B3/30
PERFORMING OPERATIONS; TRANSPORTING
B32B7/12
PERFORMING OPERATIONS; TRANSPORTING
G02B6/4267
PHYSICS
B32B17/06
PERFORMING OPERATIONS; TRANSPORTING
International classification
B32B37/06
PERFORMING OPERATIONS; TRANSPORTING
B32B17/06
PERFORMING OPERATIONS; TRANSPORTING
B32B7/12
PERFORMING OPERATIONS; TRANSPORTING
B32B3/30
PERFORMING OPERATIONS; TRANSPORTING
Abstract
Methods and systems for joining photonic components. A method includes suspending nano-particles in a medium, wherein the nano-particles include metal nano-particles. The method further includes applying a layer of the nano-particle medium to a first substrate, and exposing the layer of nano-particle medium to a thermal process to remove at least a portion of the medium and expose the nano-particles. A second substrate is placed on the nano-particles in alignment with the first substrate, and a heat is applied to the nano-particles to cause connection of contact points between adjacent nano-particles to cause a secure alignment of the first and second substrates. The heat applied to the layer of nano-particles is less than 300 C.
Claims
1. A method for joining photonic components, the method comprising: suspending nano-particles in a medium, wherein the nano-particles include metal nano-particles; applying a layer of the medium with the suspended nano-particles to a first substrate; exposing the layer of the medium to a thermal process to remove at least a portion of the medium and expose the nano-particles; placing a second substrate on the nano-particles in alignment with the first substrate; and causing application of heat to the nano-particles to cause connection of contact points between adjacent nano-particles to secure alignment of the first substrate and the second substrate, wherein the heat applied to the nano-particles is less than 300 C.
2. The method of claim 1, wherein at least one of the first substrate and the second substrate is one of a glass substrate, a silicon substrate, or a ceramic substrate.
3. The method of claim 1, wherein at least one of the first substrate and the second substrate is one of a precision flat fusion glass or a precision V-groove substrate.
4. The method of claim 1, wherein the heat applied to the nano-particles is less than 250 C.
5. The method of claim 1, wherein the heat applied to the nano-particles is for less than 2 seconds.
6. The method of claim 1, wherein the heat is applied to the nano-particles until partial sintering occurs.
7. The method of claim 1, wherein the causing application of heat to the nano-particles causes contact points between adjacent nano-particles to engage in particle necking.
8. The method of claim 1, wherein the heat is applied until particle necking occurs and is ceased before material coalescence occurs.
9. The method of claim 1, wherein the thermal process is one of oven heating, laser heating, microwave heating, RF heating, infrared heating, visible light heating, ultraviolet heating, or Joule heating.
10. The method of claim 1, wherein the nano-particles comprise at least one of nano-copper, nano-silver, or nano-gold.
11. The method of claim 1, wherein the application of heat to the nano-particles is via either oven heating, laser heating, microwave heating, RF heating, infrared heating, visible light heating, ultraviolet heating, or Joule heating.
12. The method claim 1, wherein the medium comprises a solvent-based slurry, a paste, an ink, or a liquid solvent.
13. The method of claim 1, wherein the layer of the medium with the suspended nano-particles is applied to the first substrate by screen printing, three-dimensional printing, transfer printing, aerosol spraying, or doctor blade application.
14. The method of claim 1, wherein the medium comprises one or more filler particles that each have a maximum height smaller than a desired gap thickness between the first substrate and the second substrate, wherein the one or more filler particles can each be a nano-particle or other material formed with a specific diameter.
15. The method of claim 1, wherein the heated nano-particles form partially sintered nano-particles, and wherein the method further comprises: disposing an adhesive about the partially sintered nano-particles between the first substrate and the second substrate.
16. The method of claim 1, further comprising: aligning the second substrate relative to the first substrate with a third substrate.
17. The method of claim 1, further comprising: applying a second layer of the medium with the suspended nano-particles to a third substrate; exposing the second layer of the medium to a second thermal process to remove at least a portion of the medium and expose second nano-particles from the second layer of the medium; placing the third substrate on the second substrate; and causing application of heat to the second nano-particles to cause connection of contact points between adjacent second nano-particles to secure alignment of the second substrate and the third substrate, wherein the heat applied to the second nano-particles is less than 300 C.
18. The method of claim 17, further comprising: applying a third layer of the medium with the suspended nano-particles to a fourth substrate; exposing the third layer of the medium to a third thermal process to remove at least a portion of the medium and expose third nano-particles from the third layer of the nano-particle medium; and placing the fourth substrate between the first substrate and the third substrate such that a core of the second substrate and a planar waveguide of the third substrate are aligned.
19. The method of claim 1, wherein the layer of nano-particles is discontinuous, and wherein placing the second substrate on the layer of discontinuous nano-particles comprises: aligning a first ion exchange waveguide of the first substrate with a second ion exchange waveguide of the second substrate such that the layer of nano-particles is discontinuous where the first ion exchange waveguide and the second ion exchange waveguide are aligned.
20. An assembly comprising: a first substrate; a second substrate; and a layer of partially sintered nano-particles joining the first substrate to the second substrate, wherein the layer of partially sintered nano-particles is formed via application of heat to cause connection of contact points between adjacent nano-particles, wherein the heat applied to the nano-particles is less than 300 C.
Description
BRIEF DESCRIPTION OF THE SEVERAL VIEWS OF THE DRAWING(S)
[0045] Having thus described the invention in general terms, reference will now be made to the accompanying drawings, which are not necessarily drawn to scale, and wherein:
[0046]
[0047]
[0048]
[0049]
[0050]
[0051]
[0052]
[0053]
[0054]
[0055]
[0056]
[0057]
[0058]
[0059]
[0060]
[0061]
[0062]
[0063]
[0064]
[0065]
[0066]
DETAILED DESCRIPTION
[0067] Some example embodiments will now be described more fully hereinafter with reference to the accompanying drawings, in which some, but not all example embodiments are shown. Indeed, the examples described and pictured herein should not be construed as being limiting as to the scope, applicability or configuration of the present disclosure. Rather, these example embodiments are provided so that this disclosure will satisfy applicable legal requirements. Like reference numerals refer to like elements throughout.
[0068] The term nano-particle as used herein may refer to a material which is small in size (e.g., between 1 and 100 nm in diameter (or height)). Such a nano-particle may be, for example, a metal nano-particle, which may, for example, include nano-copper, nano-gold, or nano-silver particles.
[0069] The term medium as used herein may refer to a liquid solvent, such as to be mixed with nano-particles to form a substance to apply to the components to be bonded. Such a liquid solvent may be, for example, a paste, a solvent-based slurries, an ink, or any solvent which suspends the nano-particles for application.
[0070] The term necking as used herein may refer to the joint or bond formed between connection points of adjacent nano-particles.
[0071] The term heating as used herein may refer to an application of energy, such as heat. Example application may occur, for example, with a laser, through an oven, via radio frequency, infrared, visible, or ultraviolet light, or microwave heating.
[0072] The term fused as used herein may refer to a various levels of joinder between two or more nano-particles. For example, the nano-particles may be fused through partial sintering, full sintering, etc.
[0073] The term substrate as used herein may refer to a material which provides a surface for a material to be deposited thereon.
[0074] The term precision as used herein may have the meaning less than 0.5 vim deviation from a desired surface contour, preferably less than 0.2 vim or more preferably less than 0.1 vim.
[0075] As noted herein, glass, metal, metal-coated, and other material substrates, may be joined together using fused nano-particles, such as nano-silver and nano-copper powders in accordance with embodiments of the present invention.
[0076] Embodiments of the present invention provide for low-shift bonding of substrates involving nano-particles, such as metal nano-particles partially sintered to create a mechanical bond. Example metal nano-particles may include nano-copper, nano-copper oxide, nano-silver, and nano-gold particles, although other metal nano-particles are considered. The substrates may be made of glass, silicon, ceramics, metal, plastic, or a combination thereof, and may be in any shape including a flat surface, cylindrical surface, and may include raised features. In various embodiments, the substrates are photonic components, and the present invention affords precision alignment and attachment of the photonic components.
[0077] Some embodiments of the present invention utilize low shift sintering of nano-materials, enabling active alignment and attachment of optical components without concern for drift of an adhesive curing or metal solidification. Therefore, there are extremely thin bond lines yielding predictable gap distances between the photonic components. In some embodiments, the thin bond lines may be less than 1 um, less than 0.5 um, or less than 0.2 um thick.
[0078] Various embodiments of the present invention utilize low temperature heat for short periods of time to partially sinter nano-particlesthereby providing a low shift non-organic joining technique. Some embodiments of the present invention heat the nano-particle layer to about 200 C. for about 2 seconds to partially sinter the nano-particles. The low temperature and short time period provides enough heat for surface diffusion of atoms to begin to join the nano-particles at contact positions without causing the nano-particles to denature in shape and form.
[0079] Some embodiments of the present invention create a mechanical bond between nano-particles utilize partial sintering. Notably, such embodiments may employ lower heat and reduced heating time because there is no need to form a low resistance electrical bond. In this regard, electrical bonds would require full sintering of the nano-particles to reduce, collapse and close the internal voids between the nano-particles to increase the conductivity of the bond. Full sintering, however, is conducted at high temperatures for a longer time, in comparison to partial sintering. Since electrical conductivity is unnecessary for a mechanical bond, partial sintering to fuse the nano-particles at contact points allows for a high precision bond without some negative side effects caused by heating at higher temperatures and for longer periods of time.
[0080] In some embodiments, the nano-particles may be sintered in an inert atmosphere, or in a reactive reducing atmosphere. Reducing chemical agents may also be incorporated into the medium to promote nano-particle contact during heating. In some embodiments, the nano-particles (e.g., silver or copper nano-particles) may be sintered in air. Unlike in electrical applications where removal of Copper (II) Oxide (CuO) is necessary to reduce electrical resistance, the inert environment is not a requirement for precision mechanical bondingsuch as contemplated with various embodiments of the present invention.
[0081] A mechanical bond may be formed by fusing of nano-particles disposed between two substrates.
[0082] With the nano-particles exposed, such as shown in
[0083] Nano-particles, due to the extremely small diameter, have different properties than bulk metals. For example, the melting point of nano-particles is much lower (e.g., 150 C.-300 C.) than the melting point of the bulk metals (e.g., 1084 C. for copper and 961 C. for silver). The low melting point arises from surface energy difference associated with extremely small diameter metal particles (e.g., 30-70 nm diameter), where surface atoms are more weakly bound to the crystal lattice, enabling them to migrate on the surface. When the nano-particles are heated to these temperatures, atoms on the surface of the nano-particles become mobile and start to rearrange in a way that minimizes the total surface energy of the nano-particle. The surface atoms gather at the contact points between two adjacent nano-particles (i.e., the neck region), while the interior atoms do not shift such that the diameter of the nano-particle does not change significantly. As a result, particle necking occurs when the nano-particles are heated to a relatively low temperature (e.g., 200 C.).
[0084] Particle necking may be achieved through partial sintering. Partial sintering involves heating the nano-particles to low temperatures (e.g., 200 C.) so that adjacent nano-particles bond at contact points, while retaining their shape. Full sintering, in comparison, involves heating the nano-particles until the nano-particles deform, and fuse together at more than the initial contact points. Notably, full sintering reduces the resistivity of the nano-particles to achieve a conductive bond.
[0085] As heat is applied to nano-particles, the shape of the nano-particles begin to change. Notably, as higher temperatures and/or more exposure time occurs, the particles denature more.
[0086] Laser heating in electrical interconnections, as discussed and illustrated above, requires the nano-particles to be heated to the point that internal voids close and collapse, or nearly collapse, to minimize the electrical resistance (e.g., 139c of
[0087] In some embodiments, the magnitude of joint shrinkage is correlated to the initial nano-particle layer thickness. For example, if a 1.0 um thick nano-particle layer is deposited on a surface, it may shrink by 10-20 nm on initial laser heating, and up to 100 nm on full sintering. Therefore, full sintering may be desirable to maximize bond strength, but may lead to an unacceptable component shift. In some embodiments, the component shift may be avoided by displacing the nano-particle layer during assembly (e.g., applying pressure to the nano-particle layer, such as when the first and second substrate are brought together). In such an embodiment, as the nano-particles are able to flow under the application of pressure, a thin layer of nano-particles may be formed between the two substrates. In some such embodiments, the thin layer of nano-particles may be fully sintered for maximum shear strength, since the component shift will be negligible.
[0088] As the shape of the nano-particles change to fill the internal voids, the resistivity of the bond decreases (e.g., conductivity increases).
[0089] As discussed above, the overall shape of nano-particles does not change after initial heating, however, as heating continues the shape of the nano-particles begins to change until full sintering occurs.
[0090] In this regard, a thin layer of nano-particles may be used for kinematic alignment and the precision external geometry of the optical components is used to establish alignment. In some embodiments, a nano-particle layer may be deposited on components in extremely thin layers, for example, 0.1 um, such that the nano-particle presence between optical components does not introduce mechanical misalignment of components. In some embodiments, the extremely thin layer may be less than 1 um, less than 0.5 um, or less than 0.2 um thick.
[0091] Similarly, thick layers of nano-particles may be suitable for applications where active alignment of optical components is required. A thick layer of nano-particles may be greater than 10 um, greater than 20 um, greater than 50 um, or greater than 100 um in thickness. A thick nano-particle layer may span a gap between two optical components, and then deform to accommodate the relative motion of one optical component to another during active alignment. Once the two optical components are properly aligned, initial laser heating (or other suitable sintering method) joins the nano-particles without introducing significant shrinkage. The nano-particles may serve as a temporary or permanent bond to hold the optical components in alignment. Although optical components are discussed with reference to alignment, other substrates are considered.
[0092] Nano-particles such as nano-silver, and nano-copper are suitable for bonding to glass substrates, metal, and metalized substrates and components. In some embodiments, optical fibers and glass substrates may be metalized (e.g., by traditional metal evaporation or sputtering processes) to enhance joining and increase joint shear strength as compared to nano-particle joints directly on glass substrates.
[0093] In some embodiments, during subsequent optical components assembly, a layer of nano-particles may be applied on one or more optical components that have been previously metalized using either traditional metallization or sintered nano-particle coatings. The second layer of nano-particles may provide a bond between the optical components, and enhance joining to the metallization layer.
[0094] Various techniques may be used to prepare and deposit a layer of nano-particles onto a substrate. In some embodiments, the nano-particles are suspended in a medium (e.g., a paste) and applied to selected regions of the substrate through stencil openings in a screen printing screen, enabling thin (e.g., the thickness of the screen) or thick (e.g., 5-100 um) layers.
[0095] In some embodiments, the nano-particles may be suspended in solvent-based slurries. The slurries may then be printed onto the substrate via ink jet printing, enabling thin films (e.g., 0.1-5 um) over localized regions with small dimensions (e.g., 20-50 um). Ink jet printing may allow the layer of nano-particles to be printed precisely at any location on the substrate (e.g., the region where the optical fiber will be placed in contact with the substrate). In some embodiments, prior to sintering, the solvent may be evaporated by exposure to vacuum and/or moderate oven temperatures (e.g., 60-90 C.).
[0096] In some embodiments, the nano-particles may be suspended in a slurry or ink, and applied through transfer printing to selected locations of a drum or print pad, wherein the drum or print pad is subsequently applied to the surface of the substrate to transfer the ink or slurry.
[0097] In some embodiments, the nano-particles may be suspended in a liquid solvent and sprayed over a substrate surface using an aerosol sprayer or air brush. In some embodiments, the spray may be masked to only apply nano-particles to select surfaces of the substrate.
[0098] In some embodiments, the nano-particles may be suspended in a slurry, and the slurry may be applied over a substrate using doctor blade deposition techniques. Although application methods have been discussed herein, other application methods are contemplated.
[0099] In some embodiments, the medium may include filler material. The filler material may be a low-expansion filler material to reduce the coefficient of thermal expansion (CTE) mismatch between the nano-particles and the substrate (e.g., glass, silicon). Once the medium is partially removed via a thermal process, the filler material remains. The CTE of exposed nano-particles and filler material layer may be heavily influenced by the CTE of the filler material, thereby reducing the CTE mismatch between the layer (e.g., exposed nano-particles and filler material combination) and the substrates. The nano-particles may be bonded to materials with differing CTE's as the nano-particles are able to distort within a range defined by the size of interstitial voids of the filler material, as the nano-particles are sintered. The distortion of the nano-particles allows the difference between the CTE of the nano-particles and the CTE of the substrate to differ by more than 1 ppm/K, more than 2 ppm/K, more than 5 ppm/K, more than 10 ppm/K, or more than 20 ppm/K.
[0100] Filler materials, having a much larger diameter than nano-particles, may make up a large portion of mechanical bond between substrates.
[0101] The filler material may be selected so that the diameter of the filler material is smaller than the target thickness of the nano-particle layer. In some embodiments, the target thickness may be 4 times as thick as the filler material diameter.
[0102] Filler material may also be chosen with a precisely fabricated diameter to closely ensure the thickness of the mechanical bond between substrates.
[0103] In some embodiments, the amount of nano-particles used may be reduced by coating filler material with nano-particles. With reference to the cross-sectional view 100 illustrated in
[0104] As discussed herein, heating nano-particles may be accomplished through different mechanisms. Some mechanical bonds only need to be heated in specific locations. Laser heating may be used to sinter nano-particles at localized locations. For example, a focused laser beam may sinter nano-particles located directly under an optical fiber, while not heating a neighboring nano-particle joint that has already been laser sintered. Laser heating may provide precise control over heating temperature by adjusting laser power, and pulse duration. The focal spot of the laser and time/power profile of the laser may be adjusted to minimize thermal gradients in glass components, minimizing built in stresses that may lead to long term failures.
[0105] In some embodiments, there may be nano-particles in multiple locations to be heated simultaneously. Radio Frequency (RF) and microwave heating may be used to join multiple optical components at multiple locations at the same time. For example, fibers in a fiber array may be simultaneously bonded to a common glass substrate in a single operation.
[0106] In some embodiments, Joule heating may be used for localized heating of nano-particles, such as illustrated in the cross-sectional view 100of
[0107] In some embodiments, a heater electrode may also be provided on the top substrate. As having heaters on both surfaces may improve heating and potentially speed the sintering process. As the mediums are generally poor conductors, it may be hard to run a current through the nano-particle medium from a top electrode to a bottom electrode to enable Joule heating of the nano-particle layer. Therefore, in some embodiments, the nano-particle layer may be printed so that it spans the gap between two adjacent traces or pads on the same substrate.
[0108] In some embodiments, a reflow oven may be used to heat the nano-particle layer. A commercial reflow oven may be used to sinter nano-particle layers. When using a reflow oven, the substrates (e.g., the optical fibers) may be held in position, such as via clamping fixtures, clips or similar means.
[0109] The methods of heating discussed above may allow the nano-particles to fuse together at contact points of adjacent nano-particles. Heating the nano-particles until partial sintering occurs provides low shrinkage and a lower strength bond compared to fully sintering which provides moderate shrinkage and a high strength bond.
[0110] Although partial sintering, as discussed herein, provides a low shrinkage bond, the bond does not have as high of shear strength as a fully sintered bond. In some embodiments, an adhesive may be added after the nano-particles are partially sintered to provide a low shrinkage and high strength bond.
[0111]
[0112] Once the nano-particles are prepared, the second substrate 220 (e.g., a fiber including a core 225) may be added. The prepared nano-particles (e.g., nano-particles suspended in a medium which is exposed to a thermal process) may provide a rigid layer for the second substrate 220 to be aligned on, such that the rigid layer of nano-particles is not displaced during application.
[0113] After application of the second substrate 220, pressure may be used to keep it in place while the nano-parties are heated.
[0114] After partial sintering, the first substrate 210 and the second substrate 220 are mechanically joined by the fused nano-particles.
[0115] In some embodiments, after the first substrate 210 and second substrate 220 are joined by the nano-particle layer, the substrates may remain precisely aligned after solder reflow, or environmental testing. In some embodiments, the alignment of the first and second substrate may change less than 0.5 um, less than 0.2 um, less than 0.1 um, or less than 0.05 um upon introducing the assembly 200 to a solder reflow oven.
[0116] In some embodiments, fibers may be attached to a V-grooved substrate to create a V-grooved fiber array unit (FAU).
[0117] Once the fibers are aligned in the V-grooves, pressure may be applied to ensure that when the fibers are fused, they are aligned with the precise pitch.
[0118] A lid or cover may be added to the V-groove FAU to provide protection for the fibers.
[0119]
[0120] After the FAU is manufactured, an adhesive may be added to increase the strength of the bonds. In some embodiments, the cavities between the lid 360 and the V-groove substrate 310 may be filled with an adhesive. The adhesive may be UV curable, an organic adhesive, or an inorganic adhesive. The adhesive is preferably selected to have a lower elastic modulus, to limit the upward force on the fiber array during heating, or a low-expansion filler material may be added to reduce the CTE of the joint to better align with the CTE of the surrounding glass V-grove materials. The adhesive may have a low viscosity (e.g., 1 cP) to allow the adhesive to flow into small cavities within the FAU via capillary force.
[0121] Although the materials herein have been described as being a glass substrate, a fiber array, and a glass lid, it should be understood that any appropriate substrates may be used. For example, the substrates may be silicon based, metallic, or ceramic materials.
[0122] Nano-particle joining may be used to attach a fiber to a flat substrate such that the fibers are spaced apart from one another (e.g., in a desired alignment). In some embodiments where a substrate with a circular cross-section (e.g., a fiber) is attached to a flat surface, the substrates may be aligned using an alignment substrate, to facilitate precision attachment.
[0123] The alignment structure may also provide a downward force to facilitate contact between the substrates before sintering the nano-particles. Referring to
[0124] An adhesive may be applied about the sintered nano-particle to increase the strength of the bond.
[0125] Nano-particle joining may be used to attach a fiber to a flat substrate such that the fibers are abutting one another.
[0126]
[0127] The nano-particle joining process as described herein may also be applied to attach two flat substrates.
[0128] The FAU's as described above may be coupled with a PLC substrate including a planar waveguide to provide a strong mechanical connection, with a low profile.
[0129] An FAU may be made according to the methods as discussed above with reference to
[0130] The ends of the fibers attached to the substrate may not be the same length. In order to create precision alignment, the fibers may be cut to all be the same length. Accordingly, in some embodiments, the V-groove substrate may include notches where the ends were cut.
[0131] Once the fibers are all the same length, the FAU is oriented for application to a waveguide.
[0132] After the FAU and PLC substrate are aligned, the nano-particles may be bonded.
[0133] In some embodiments, lateral alignment of the V-grooved based FAU 800 and the PLC substrate 860 planar waveguide 880 may use passive alignment features on the PLC substrate 860. For example, raised lateral stops may be photolithographically patterned into the PLC substrate at a precise distance away from the planar waveguide. Lateral alignment may also be accomplished using a vision system, wherein Vernier marks or groups of parallel lines made on slightly different pitches on the PLC substrate surface and the V-groove FAU surface may be used to precisely align the two components prior to nano-particle joining, for example, by laser heating or sintering.
[0134] In another example embodiment, a FAU configured on a flat substrate (e.g., the assembly 400 of
[0135] A FAU on a flat substrate may be made, for example, in accordance with the assembly of
[0136] After assembly of the FAU, the FAU is orientated for joining with a PLC.
[0137] After alignment of the FAU and PLC the nano-particles may be joined.
[0138] In some embodiments, as illustrated in
[0139] In addition to or in the alternative of a thick layer of nano-particles, a spacer substrate with precision thickness may be used. For example, as illustrated in
[0140] In some embodiments, the precision thickness spacer 995 may be formed using a glass fusion process, a precision redraw process, or a similar process for glass substrates. In some embodiments, the spacer substrate 995 may be pre-attached to the PLC substrate 960 with a layer of partially sintered nano-particles 930. The joining interface may survive solder reflow conditions, without distortion or creep. In this case, the final nano-particle layer may be sintered, for example, via laser heating, from the top side.
[0141] In some embodiments, the spacer substrate 995 may be a fiber array raft, or other similar appropriate passive alignment mechanisms.
[0142] Although, as described herein, partially sintered nano-particle layers are used to join photonic components, other applications which join materials which nano-particles may bond to, including glass, ceramics, metals, and polymers, alone or in combination, are contemplated. For example, joining of optical lenses and support components, joining of dielectric filters to glass support substrates in micro-optic WDM (Wavelength Division Multiplexing) assemblies, joining glass FAUs to PLC's where nano-particle materials are applied to one or both interfacing surfaces, and assembly of optical components that require arbitrary displacement and rotation, are contemplated.
[0143] Although the above examples describe use of a layer of nano-particles, as is consistent with description herein, such examples may utilize the various different forms of a layer of nano-particles (e.g., with filler material, where the layer of nano-particles is applied to filler material, etc.).
Example Systems
[0144] Joining of substrates using nano-particles, as discussed above, may be accomplished through a joining system.
[0145] The mixture on the first substrate 1010 is then exposed to a thermal process, such as by a heater 1025. In some embodiments, the thermal process may include use of an over or a laser, although other thermal processes are contemplated. The thermal process may remove at least a portion of the medium, yielding a layer of nano-particles in contact with other nano-particles and in contact with the first substrate 1010.
[0146] A second substrate 1020 is aligned, and placed on the layer of nano-particles, such as with an alignment mechanism 1055. In some embodiments, the alignment mechanism 1055 may be within the same component as the applicator 1015, and in other embodiments, the alignment mechanism 1055 and the applicator 1015 may be separate. At 1065, the heater 1025 (e.g., the same heater or a separate heater) may apply heat to the substrates and nano-particle assembly, such as at no more than 300 C. so that the nano-particles fuse at the contact points of adjacent nano-particle to cause secure alignment of the assemblyshown at 1075. In some embodiments, the heater 1025 may be two heaters, such that a first heater applies a thermal process, and the second heater applies a second thermal process, wherein the thermal process may be the same or different. The thermal processes may be oven heating, RF heating, IR heating, Laser heating, or other suitable types of heating.
[0147] In some embodiments, the system may include additional assemblies wherein a third and/or fourth substrate may be included in the system.
Example Flowchart(s)
[0148]
CONCLUSION
[0149] It will therefore be readily understood by those persons skilled in the art that the present invention is susceptible of broad utility and application. Many embodiments and adaptations of the present invention other than those herein described, as well as many variations, modifications and equivalent arrangements, will be apparent from or reasonably suggested by the present invention and the foregoing description thereof, without departing from the substance or scope of the present invention. Accordingly, while the present invention has been described herein in detail in relation to its preferred embodiment, it is to be understood that this disclosure is only illustrative and exemplary of the present invention and is made merely for purposes of providing a full and enabling disclosure of the invention. The foregoing disclosure is not intended or to be construed to limit the present invention or otherwise to exclude any such other embodiments, adaptations, variations, modifications and equivalent arrangements.