BOROPHANE POLYMORPHS AND SYNTHESIS METHODS OF SAME
20240059572 ยท 2024-02-22
Inventors
Cpc classification
C01B35/026
CHEMISTRY; METALLURGY
International classification
Abstract
One aspect of this invention relates to synthesis of borophane polymorphs by hydrogenating borophene with atomic hydrogen in ultrahigh vacuum, including growing borophene on a substrate in an ultrahigh vacuum chamber; and performing hydrogenation of the borophene in situ to obtain borophane having a diverse set of borophane polymorphs. The borophane polymorphs are metallic with modified local work functions that can be reversibly returned to pristine borophene via thermal desorption of hydrogen. Hydrogenation also provides chemical passivation such that the borophane polymorphs have negligible oxidation for multiple days following ambient exposure.
Claims
1. A method of synthesizing borophane polymorphs, comprising: growing borophene on a substrate in an ultrahigh vacuum (UHV) chamber; and performing hydrogenation of the borophene in situ to obtain borophane having a diverse set of borophane polymorphs.
2. The method of claim 1, wherein the UHV chamber has a base pressure of about 1.010.sup.10 mbar during the borophene growth.
3. The method of claim 1, wherein the substrate comprises a substrate having a metal film formed of Ag, Au, Cu, Al, or Ir.
4. The method of claim 3, wherein the substrate comprises an atomically clean Ag(111) substrate having about 480-720 nm thick Ag(111) on a mica substrate.
5. The method of claim 4, wherein the substrate is obtained by cleaning the mica substrate via repeated cycles of Ar.sup.+ sputtering followed by annealing at about 450-550 C.
6. The method of claim 1, wherein said growing the borophene on the substrate comprises depositing boron on the substrate at a substrate temperature.
7. The method of claim 6, wherein said depositing the boron is performed by electron-beam evaporation of a solid boron rod, or high temperature effusion of the solid boron rod in a high temperature effusion cell.
8. The method of claim 7, wherein the solid boron rod has a purity of about 99.999-99.99999% boron.
9. The method of claim 6, wherein the substrate temperature is at about 320-660 C. during boron deposition.
10. The method of claim 6, wherein the borophene grown on the substrate has a dominant borophene polymorph determined by the substrate temperature.
11. The method of claim 1, wherein said hydrogenation is performed in situ by exposing the borophene to atomic hydrogen.
12. The method of claim 11, wherein the atomic hydrogen is generated by dissociation of molecular hydrogen with a tungsten filament, a platinum filament, an iridium filament, or platinum/iridium filament, or by a hydrogen atom beam source that thermally crack molecular hydrogen into atomic hydrogen.
13. The method of claim 12, wherein during hydrogenation, the borophene is maintained at room temperature and directly faced the tungsten filament with a distance of about 8-12 cm.
14. The method of claim 11, wherein the chamber pressure during hydrogenation is maintained at about 1.010.sup.7-5.010.sup.6 mbar for about 1-20 min.
15. The method of claim 1, wherein the diverse set of borophane polymorphs comprises at least eight borophane polymorphs.
16. The method of claim 15, wherein the diverse set of borophane polymorphs comprises: v.sub.1/5 borophane with square H and honeycomb H patterns; v.sub.1/5-30 borophane with staggered rectangular H and zigzag H patterns; v.sub.1/6 borophane with hexagonal H and disordered rectangular H patterns; and v.sub.1/6-30 borophane with hexagonal H and rectangular H patterns, wherein H represents hydrogen atoms.
17. The method of claim 16, wherein the v.sub.1/6-30 borophane with the rectangular H pattern (rect-v.sub.1/6-30 borophane) comprises two-center-two-electron (2c2e) boron-hydrogen (BH) bonds and three-center-two-electron (3c2e) boron-hydrogen-boron (BHB) bonds.
18. The method of claim 17, wherein the rect-v.sub.1/6-30 borophane has a lower work function than v.sub.1/6-30 borophene.
19. The method of claim 1, wherein the borophane polymorphs have tunable stoichiometric ratios of boron and hydrogen.
20. The method of claim 1, wherein the borophane polymorphs have negligible oxidation for multiple days following ambient exposure.
21. The method of claim 1, wherein the borophane polymorphs are metallic with modified local work functions compared to pristine borophene.
22. The method of claim 1, wherein the borophane polymorphs are reversibly returnable to pristine borophene via thermal desorption of hydrogen.
23. A method of synthesizing borophane polymorphs, comprising: hydrogenating borophene with atomic hydrogen in ultrahigh vacuum (UHV).
24. The method of claim 23, wherein the borophene is grown on a substrate in the UHV by elemental boron evaporation.
25. The method of claim 24, wherein the substrate comprises a substrate having a metal film formed of Ag, Au, Cu, Al, or Ir.
26. The method of claim 23, wherein the borophene grown on the substrate has a dominant borophene polymorph determined by a substrate temperature of the substrate.
27. The method of claim 26, wherein the substrate temperature is at about 320-660 C. during boron deposition.
28. The method of claim 23, wherein said hydrogenating the borophene is performed by exposing borophene to atomic hydrogen.
29. The method of claim 28, wherein the atomic hydrogen is generated by dissociation of molecular hydrogen with a tungsten filament, a platinum filament, an iridium filament, or platinum/iridium filament, or by a hydrogen atom beam source that thermally crack molecular hydrogen into atomic hydrogen.
30. The borophane polymorphs, being synthesized according to the method of claim 1.
31. Borophane, comprising: hydrogenated borophene having a diverse set of borophane polymorphs.
32. The borophane of claim 31, wherein the diverse set of borophane polymorphs comprises: v.sub.1/5 borophane with square H and honeycomb H patterns; v.sub.1/5-30 borophane with staggered rectangular H and zigzag H patterns; v.sub.1/6 borophane with hexagonal H and disordered rectangular H patterns; and v.sub.1/6-30 borophane with hexagonal H and rectangular H patterns, wherein H represents hydrogen atoms.
33. The borophane of claim 32, wherein the v.sub.1/6-30 borophane with the rectangular H pattern (rect-v.sub.1/6-30 borophane) comprises two-center-two-electron (2c2e) boron-hydrogen (BH) bonds and three-center-two-electron (3c2e) boron-hydrogen-boron (BHB) bonds.
34. The borophane of claim 33, wherein the rect-v.sub.1/6-30 borophane has a lower work function than v.sub.1/6-30 borophene.
35. The borophane of claim 31, wherein the borophane polymorphs have tunable stoichiometric ratios of boron and hydrogen.
36. The borophane of claim 31, wherein the borophane polymorphs have negligible oxidation for multiple days following ambient exposure.
37. The borophane of claim 31, being metallic with modified local work functions compared to pristine borophene.
38. The borophane of claim 31, being reversibly returnable to pristine borophene via thermal desorption of hydrogen.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0040] The accompanying drawings illustrate one or more embodiments of the invention and together with the written description, serve to explain the principles of the invention. Wherever possible, the same reference numbers are used throughout the drawings to refer to the same or like elements of an embodiment.
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DETAILED DESCRIPTION OF THE INVENTION
[0065] The invention will now be described more fully hereinafter with reference to the accompanying drawings, in which exemplary embodiments of the invention are shown. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this specification will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. Like reference numerals refer to like elements throughout.
[0066] The terms used in this specification generally have their ordinary meanings in the art, within the context of the invention, and in the specific context where each term is used. Certain terms that are used to describe the invention are discussed below, or elsewhere in the specification, to provide additional guidance to the practitioner regarding the description of the invention. For convenience, certain terms may be highlighted, for example using italics and/or quotation marks. The use of highlighting has no influence on the scope and meaning of a term; the scope and meaning of a term are the same, in the same context, whether or not it is highlighted. It will be appreciated that same thing can be said in more than one way. Consequently, alternative language and synonyms may be used for any one or more of the terms discussed herein, nor is any special significance to be placed upon whether or not a term is elaborated or discussed herein. Synonyms for certain terms are provided. A recital of one or more synonyms does not exclude the use of other synonyms. The use of examples anywhere in this specification including examples of any terms discussed herein is illustrative only, and in no way limits the scope and meaning of the invention or of any exemplified term. Likewise, the invention is not limited to various embodiments given in this specification.
[0067] It will be understood that, as used in the description herein and throughout the claims that follow, the meaning of a, an, and the includes plural reference unless the context clearly dictates otherwise. Also, it will be understood that when an element is referred to as being on another element, it can be directly on the other element or intervening elements may be present therebetween. In contrast, when an element is referred to as being directly on another element, there are no intervening elements present. As used herein, the term and/or includes any and all combinations of one or more of the associated listed items.
[0068] It will be understood that, although the terms first, second, third, etc. may be used herein to describe various elements, components, regions, layers and/or sections, these elements, components, regions, layers and/or sections should not be limited by these terms. These terms are only used to distinguish one element, component, region, layer or section from another element, component, region, layer or section. Thus, a first element, component, region, layer or section discussed below could be termed a second element, component, region, layer or section without departing from the teachings of the invention.
[0069] Furthermore, relative terms, such as lower or bottom and upper or top, may be used herein to describe one element's relationship to another element as illustrated in the figures. It will be understood that relative terms are intended to encompass different orientations of the device in addition to the orientation depicted in the figures. For example, if the device in one of the figures. is turned over, elements described as being on the lower side of other elements would then be oriented on upper sides of the other elements. The exemplary term lower, can, therefore, encompasses both an orientation of lower and upper, depending on the particular orientation of the figure. Similarly, if the device in one of the figures is turned over, elements described as below or beneath other elements would then be oriented above the other elements. The exemplary terms below or beneath can, therefore, encompass both an orientation of above and below.
[0070] It will be further understood that the terms comprises and/or comprising, or includes and/or including or has and/or having, or carry and/or carrying, or contain and/or containing, or involve and/or involving, and the like are to be open-ended, i.e., to mean including but not limited to. When used in this specification, they specify the presence of stated features, regions, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, regions, integers, steps, operations, elements, components, and/or groups thereof.
[0071] Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. It will be further understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the relevant art and this specification, and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.
[0072] As used in this specification, around, about, approximately or substantially shall generally mean within 20 percent, preferably within 10 percent, and more preferably within 5 percent of a given value or range. Numerical quantities given herein are approximate, meaning that the term around, about, approximately or substantially can be inferred if not expressly stated.
[0073] As used in this specification, the phrase at least one of A, B, and C should be construed to mean a logical (A or B or C), using a non-exclusive logical OR. As used herein, the term and/or includes any and all combinations of one or more of the associated listed items.
[0074] The description below is merely illustrative in nature and is in no way intended to limit the invention, its application, or uses. The broad teachings of the invention can be implemented in a variety of forms. Therefore, while this invention includes particular examples, the true scope of the invention should not be so limited since other modifications will become apparent upon a study of the drawings, the specification, and the following claims. For purposes of clarity, the same reference numbers will be used in the drawings to identify similar elements. It should be understood that one or more steps within a method may be executed in a different order (or concurrently) without altering the principles of the invention.
[0075] Borophene refers to the family of synthetic two-dimensional (2D) polymorphs of boron, which has attracted significant attention due to anisotropic metallicity, correlated electron phenomena, and diverse superlattice structures. However, borophene rapidly oxidizes when exposed to air, which has confined experimental characterization to ultrahigh vacuum (UHV) conditions, thus motivating chemical passivation approaches. Towards this end, this invention achieves covalent hydrogenation of borophene (i.e., borophane) through exposure to atomic hydrogen in UHV, resulting in a diverse set of borophane polymorphs. Borophane polymorphs are metallic with modified local work functions compared to pristine borophene, with the most prevalent borophane polymorph found to include two-center-two-electron (2c2e) boron-hydrogen (BH) bonds and three-center-two-electron (3c2e) boron-hydrogen-boron (BHB) bonds. Hydrogenation acts as a robust passivation scheme for borophene with multiple borophane polymorphs suppressing measurable oxidation for several days following ambient exposure. Since this hydrogenation can be reversibly removed through thermal annealing, borophane can be returned to pristine borophene following ambient processing, thus presenting significant flexibility in borophene sample preparation. Overall, this invention reveals the richness of borophane chemistry, which is likely to inspire and motivate further exploration of covalently modified borophene polymorphs.
[0076] In one aspect, the invention relates to a method of synthesizing borophane polymorphs. The method in one embodiment comprises growing borophene on a substrate in an ultrahigh vacuum (UHV) chamber; and performing hydrogenation of the borophene in situ to obtain a diverse set of borophane polymorphs. Hydrogenation of borophene results in the synthesis of borophane polymorphs, which possess modified local work functions and improved chemical passivation characteristics in ambient conditions.
[0077] In some embodiments, the UHV chamber has a base pressure of about 1.010.sup.10 mbar during the borophene growth.
[0078] In some embodiments, the substrate comprises a substrate having a metal film formed of Ag, Au, Cu, Al, or Ir.
[0079] In some embodiments, the substrate comprises an atomically clean Ag(111) substrate having about 480-720 nm thick Ag(111) on a mica substrate.
[0080] In some embodiments, the substrate is obtained by cleaning the mica substrate via repeated cycles of Ar.sup.+ sputtering followed by annealing at about 450-550 C.
[0081] In some embodiments, said growing the borophene on the substrate comprises depositing boron on the substrate at a substrate temperature.
[0082] In some embodiments, said depositing the boron is performed by electron-beam evaporation of a solid boron rod, or high temperature effusion of the solid boron rod in a high temperature effusion cell.
[0083] In some embodiments, the solid boron rod has a purity of about 99.999-99.99999% boron.
[0084] In some embodiments, the borophene grown on the substrate has a dominant borophene polymorph determined by a substrate temperature.
[0085] In some embodiments, the substrate temperature is at about 320-660 C. during boron deposition.
[0086] In some embodiments, said hydrogenation is performed in situ by exposing the borophene to atomic hydrogen.
[0087] In some embodiments, the atomic hydrogen is generated by dissociation of the molecular hydrogen with a tungsten filament, or a platinum filament, or an iridium filament, or platinum/iridium filament, or by a hydrogen atom beam source that thermally crack molecular hydrogen into atomic hydrogen.
[0088] In some embodiments, during hydrogenation, the borophene is maintained at room temperature and directly faced the tungsten filament with a distance of about 8-12 cm.
[0089] In some embodiments, the chamber pressure during hydrogenation is maintained at about 1.010.sup.7-5.010.sup.6 mbar for about 1-20 min.
[0090] In another aspect, the invention relates to borophane polymorphs being synthesized according to the above disclosed method.
[0091] In some embodiments, the borophane polymorphs are metallic with modified local work functions compared to pristine borophene.
[0092] In some embodiments, the borophane polymorphs can be reversibly returned to pristine borophene via thermal desorption of hydrogen.
[0093] In some embodiments, the borophane polymorphs comprises at least eight borophane polymorphs.
[0094] In some embodiments, the borophane polymorphs comprises v.sub.1/5 borophane with square H and honeycomb H patterns, v.sub.1/5-30 borophane with staggered rectangular H and zigzag H patterns, v.sub.1/6 borophane with hexagonal H and disordered rectangular H patterns, and v.sub.1/6-30 borophane with hexagonal H and rectangular H patterns, wherein H represents hydrogen atoms.
[0095] In some embodiments, the v.sub.1/6-30 borophane with the rectangular H pattern (rect-v.sub.1/6-30 borophane) includes two-center-two-electron (2c2e) boron-hydrogen (BH) bonds and three-center-two-electron (3c2e) boron-hydrogen-boron (BHB) bonds.
[0096] In some embodiments, the rect-v.sub.1/6-30 borophane has a lower work function than v.sub.1/6-30 borophene.
[0097] In some embodiments, the borophane polymorphs have tunable stoichiometric ratios of boron and hydrogen.
[0098] In some embodiments, the borophane polymorphs have negligible oxidation for multiple days following ambient exposure.
[0099] In some embodiments, the borophane polymorphs are metallic with modified local work functions compared to pristine borophene.
[0100] In some embodiments, the borophane polymorphs can be reversibly returned to pristine borophene via thermal desorption of hydrogen.
[0101] Borophene has been intensely explored due to its unique properties including 2D anisotropic metallicity, high mechanical strength and flexibility, and phonon-mediated superconductivity. However, borophene rapidly oxidizes when exposed to air, which poses significant challenges for its practical implementation. The hydrogen passivation scheme demonstrated in this invention offers an opportunity to integrate borophene into practical devices that are relevant to the fields of electronics, optoelectronics, sensing, energy-harvesting, quantum information, and related technologies. The invention may have widespread applications in the fields including, but are not limited to, optoelectronics, high frequency logic, sensing, medical imaging, energy conversion and storage, and quantum information technologies.
[0102] This invention discloses the covalent chemical functionalization and passivation of borophene for the first time. Among other things, the invention provides a number of advantages. [0103] Borophane is a hydrogenated analogue of borophene, which is a new synthetic 2D material with diverse bonding geometry and anisotropic features. [0104] Existing synthetic methods for hydrogen boride nanosheets are based on chemical reactions involving inorganic salts. However, atomically well-defined synthesis and characterization of borophane polymorphs have not yet been achieved. [0105] The invention offers a straightforward and effective hydrogenation scheme through precisely controlled dosing of atomic hydrogen in UHV, which results in ordered borophane polymorphs with tunable stoichiometric ratio of boron and hydrogen. [0106] Unlike pristine borophene that oxidizes almost instantaneously in ambient conditions, the borophane shows negligible oxidation according to X-ray photoelectron spectroscopy (XPS) even after 1 week of ambient exposure.
[0107] The hydrogenation of borophene can be viewed as a reversible passivation scheme in which the hydrogenation can be removed to regain pristine borophene once ambient processing is complete and/or robust encapsulation layers are applied.
[0108] These and other aspects of the invention are further described below. Without intent to limit the scope of the invention, exemplary instruments, apparatus, methods, and their related results according to the embodiments of the invention are given below. Note that titles or subtitles may be used in the examples for convenience of a reader, which in no way should limit the scope of the invention. Moreover, certain theories are proposed and disclosed herein; however, in no way they, whether they are right or wrong, should limit the scope of the invention so long as the invention is practiced according to the invention without regard for any particular theory or scheme of action.
EXAMPLE
Synthesis of Borophane Polymorphs Via Hydrogenation of Borophene
[0109] Borophene refers to the family of synthetic two-dimensional polymorphs of boron, which has attracted significant attention due to anisotropic metallicity, correlated electron phenomena, and diverse superlattice structures. While borophene heterostructures have recently been realized, ordered chemical modification of borophene has not yet been reported. In this exemplary study, borophane polymorphs were synthesized by hydrogenating borophene with atomic hydrogen in ultrahigh vacuum. Through atomic-scale imaging, spectroscopy, and first principles calculations, the most prevalent borophane polymorph is shown to possess a combination of two-center-two-electron (2c2e) boron-hydrogen (BH) and three-center-two-electron (3c2e) boron-hydrogen-boron (BHB) bonds. Borophane polymorphs are metallic with modified local work functions that can be reversibly returned to pristine borophene via thermal desorption of hydrogen. Hydrogenation also provides chemical passivation as borophane is shown to suppress measurable oxidation for multiple days following ambient exposure.
[0110] In this exemplary example, hydrogenation of borophene is achieved by exposing borophene to atomic hydrogen in ultrahigh vacuum. Similar to the high degree of polymorphism in borophene, eight different borophane polymorphs are observed. Since it can achieve high surface coverage and possesses a highly ordered structure, rectangular v.sub.1/6-30 borophane (abbreviated as rect-v.sub.1/6-30) is explored thoroughly to reveal its bonding structure and properties. In particular, by combining scanning tunneling microscopy/spectroscopy (STM/STS), inelastic electron tunneling spectroscopy (JETS), and density functional theory (DFT), the bonding in rect-v.sub.1/6-30 borophane is found to include two-center-two-electron (2c2e) BH bonds and three-center-two-electron (3c2e) BHB bonds. In situ local work function measurements support theoretical predictions that rect-v.sub.1/6-30 borophane has a lower work function than v.sub.1/6-30 borophene. In addition, unlike pristine borophene that oxidizes almost instantaneously in ambient conditions, borophane shows negligible oxidation according to X-ray photoelectron spectroscopy (XPS) even after 1 week of ambient exposure.
Borophane Polymorphs
[0111] Borophene was grown on atomically clean Ag(111) substrates in UHV by elemental boron evaporation with the dominant borophene polymorph determined by the substrate temperature. Subsequent hydrogenation was performed in situ by exposing the borophene sample to atomic hydrogen that was generated by cracking molecular hydrogen with a hot tungsten filament. Following this procedure, STM revealed bright protrusions on the borophene surface, which were attributed to hydrogen adatoms, as shown in
[0112] Additional borophane structures are observed following the hydrogenation of v.sub.1/6 borophene. In this case, v.sub.1/6 borophane is characterized with both hexagonal and rectangular H patterns. The hexagonal H pattern is most prevalent for v.sub.1/6 borophane with a unit cell of 0.340.02 nm by 0.350.02 nm, as shown in panel H of
Structural Characterization of Rect-v.SUB.1/6.-30 Borophane
[0113] High-resolution CO-STM images of rect-v.sub.1/6-30 borophane acquired at different scanning conditions are shown in panels A-B of
TABLE-US-00001 TABLE 1 DFT calculated total energies (eV), adsorption energies (eV/atom) with PBE functional and opt-b88-vdw functional, and work functions (eV) of .sub.1/6 30 borophene, rect-1H.sub.bridge, rect-1H.sub.top, and rect-2H structures in addition to translated structures: t-rect-1H.sub.bridge, t-rect-1H.sub.top, and t-rect-2H. Total energy Adsorption energy Work (eV) (eV/atom) function PBE opt-b88 vdw PBE opt-b88 vdw (eV) .sub.1/6 30 68.644 21.491 4.62 borophene Rect-1H.sub.bridge 71.646 24.458 1.89 2.07 3.68 Rect-1H.sub.top 72.105 25.032 2.34 2.64 5.27 Rect-2H 75.737 28.641 2.43 2.67 4.42 t-Rect-1H.sub.bridge 71.873 24.676 2.13 2.30 3.58 t-Rect-1H.sub.top 72.127 25.051 2.38 2.67 5.29 t-Rect-2H 76.101 29.005 2.62 2.86 4.51
[0114] The simulated STM images from rect-1H.sub.top (panel I of
[0115] STS was also performed on rect-v.sub.1/6-30 borophane to provide additional experimental evidence in support of the rect-2H structure. In particular, the differential tunneling conductance spectrum taken on rect-v.sub.1/6-30 borophane shows a distinct peak at 1.2 V (panel L of
[0116] The bonding geometry of rect-v.sub.1/6-30 borophane was further investigated by LETS measurements. Due to the sensitivity of vibrational spectra to isotopic identity, hydrogenated and deuterated rect-v.sub.1/6-30 borophane samples were prepared for LETS characterization. The LETS spectra of rect-v.sub.1/6-30 borophane with hydrogen (red) and deuterium (orange) in addition to pristine v.sub.1/6-30 borophene (purple) are shown in panel N of
Local Work Function Measurements
[0117] The local work function (LWF) of rect-v.sub.1/6-30 borophane was probed with STM by measuring field-emission resonances (FERs), also known as Gundlach oscillations, which arise in the Fowler-Nordheim regime through standing-wave states in the tip-sample gap. Panel A of
[0118] To better understand the surface potential for rect-v.sub.1/6-30 borophane, DFT calculations with dipole correction were performed to simulate electrostatic potential profiles. Panel B of
[0119] The LWFs for Ag(111), v.sub.1/6-30 borophene, and rect-v.sub.1/6-30 borophane were extracted from the FER spectra as 4.340.11 eV, 4.580.12 eV, and 4.360.09 eV, respectively (
Ambient Stability of Borophane
[0120] The ambient stability of borophane was evaluated using XPS and atomic force microscopy (AFM) measurements following different periods of ambient exposure. Unencapsulated borophene sheets chemically degrade in ambient conditions. We confirmed this result by performing XPS on unencapsulated mixed-phase v.sub.1/5/v.sub.1/6-30 borophene following 1 hour of ambient exposure at 20 C., relative humidity between 20%-50% (panel A of
[0121] In contrast, the borophane sample exhibits markedly improved chemical and morphological stability in ambient conditions. It should be noted that this sample contains multiple borophane polymorphs (e.g., rect-v.sub.1/6-30 borophane, hex-v.sub.1/6-30 borophane, square-borophane, and honeycomb-v.sub.1/5 borophane), thus showing that diverse hydrogen bonding motifs on borophene impart ambient stability. As revealed in panel C of
[0122] Moreover, similar to the case of hydrogenated graphene, the hydrogenation of borophene is reversible upon thermal annealing. Specifically, borophane samples can be recovered to pristine borophene without apparent degradation after annealing the sample to 300 C. (
Materials and Methods
[0123] Synthesis of Borophane Polymorphs:
[0124] The synthesis of borophane polymorphs was achieved by a two-step procedure of boron deposition and subsequent hydrogenation in an ultrahigh vacuum (UHV) chamber (base pressure 1.010.sup.10 mbar). Boron deposition was conducted by electron-beam evaporation (Focus EFM 3) of a solid boron rod (ESPI metals, 99.9999% purity). Borophene was grown on about 600 nm thick Ag(111) on mica substrates (Princeton Scientific Corp.), which were cleaned via repeated cycles of Ar.sup.+ sputtering followed by annealing at 550 C. The substrates were held at 400-550 C. during boron deposition, and a flux of 10-15 nA was maintained for 20-30 min for growth of sub-monolayer borophene. Subsequent hydrogenation was conducted by exposing the as-grown borophene sample to atomic hydrogen. The atomic hydrogen was generated by dissociation of molecular hydrogen with a hot tungsten filament held at 1600 C. During hydrogenation, the sample was maintained at room temperature and directly faced the tungsten filament with a distance of 10 cm. The chamber pressure during hydrogenation was maintained at 1.0-5.010.sup.6 mbar for 1-20 min.
[0125] Scanning Tunneling Microscopy and Spectroscopy:
[0126] Scanning tunneling microscopy and spectroscopy (STM/STS) were performed in a Scienta Omicron LT system (base pressure 5.010.sup.11 mbar) at 4 K using electrochemically etched Pt/Ir tips. Tip functionalization with CO molecules was obtained by backfilling the STM chamber with 2.010.sup.7 mbar of CO for 30 s, with the STM shroud open to allow adsorption of CO onto the cryogenic sample surface. The adsorbed CO molecules were picked up by the STM tip at low sample bias <10 mV. STS measurements were performed using a lock-in amplifier (Signal Recovery 7270) with an amplitude of 3 mV.sub.RMS and a modulation frequency of 822 Hz. For field emission resonance (FER) spectroscopy, dI/dV spectra were recorded in constant current mode, which enables a relatively wide voltage window, resulting in the tip continuously retracting from the sample surface during the measurements. For inelastic electron tunneling spectroscopy (LETS), d.sup.2I/dV.sup.2 spectra were taken with an amplitude of 7 mV.sub.RMS and a modulation frequency of 522 Hz. The |dlnI/dz| measurements were performed with a lock-in amplifier (SRS SR850), where an AC output (863 Hz) voltage was added to the z scanner piezo driving signal, causing a 0.3 .sub.RMS tip position oscillation. Gwyddion software was used for image processing.
[0127] Ex Situ Characterization:
[0128] X-ray photoelectron spectroscopy (XPS) measurements were acquired with a Thermo Scientific ESCALAB 250Xi system with a monochromated Al K X-ray source. The energy resolution was 0.1 eV with a pass energy of 50 eV. All boron spectra were recorded with an average of 100 scans with a 50 ms dwell time. Avantage (Thermo Scientific) software was used for the calibration and fitting of the XPS spectra. Atomic force microscopy (AFM) was performed in ambient conditions with an Asylum Cypher AFM by Oxford Instruments. The AFM images were obtained in tapping mode (NCHR tips, 320 kHz, Nanoworld). The relative humidity was between 20% and 50% throughout the study.
[0129] Density Functional Theory Calculations:
[0130] Density functional theory (DFT) calculations were performed using the plane-wave code Vienna Ab-initio Simulation Package (VASP) with the projector augmented wave (PAW) method. The Perdew-Burke-Ernzerhof (PBE) generalized gradient approximation was used for the exchange-correlation functional. To study the effect of interlayer dispersion forces in the stability of the calculated structures, the dispersion-corrected vdW-optB88 exchange-correlation functional was applied. A cutoff energy of 500 eV and an auto-generated Gamma-centered k-point mesh with 50 k-points per .sup.1 were used. The total energy was converged to less than 1 meV with respect to the energy cutoff and k-point sampling. To account for the odd number of valence electrons in the simulation cell, the calculations were performed using spin polarization. The numbers of valence electrons in the pseudopotentials for silver, boron, and hydrogen are 11, 3, and 1, respectively. A minimum vacuum spacing of 18 was used for all calculations between the periodic images of the slabs.
[0131] The simulated STM images were calculated using the python package Ingrained, which performs computer-vision-based image similarity to match the simulated and experimental STM images. The projected density of states (pDOS) of all structures were calculated using the tetrahedron method with Blchl corrections. The finite-difference approach was used to calculate the vibrational modes of the proposed rect-v.sub.1/6-30 borophane structures, which were initially relaxed with an energy convergence criterion of 10.sup.8 eV. The dynamical matrix for vibrational modes was calculated by allowing four ionic displacements with a step size of 0.01 in each direction for every boron and hydrogen atom in the cell. Local work functions for all structures were calculated from the planar-averaged electrostatic potential profiles, with dipole corrections to account for the dipole moments between the top and bottom surfaces of the slabs.
[0132] The silver substrate included seven atomic layers for structure relaxation, pDOS, and work function calculations, and five layers for simulated STM, vibrational modes, and Bader charge analysis. The bottom four layers of the silver substrate were frozen to resemble the bulk silver lattice for all calculations.
[0133] Selective Adsorption of Hydrogen on Borophene:
[0134] During the initial hydrogenation of borophene (i.e., low dosing condition with 1.010.sup.7 mbar chamber pressure), a preference for H adsorption on certain borophene phases is found.
[0135] STM Imaging Hex-v.sub.1/6 and Rect-v.sub.1/6-30 Borophane Structures with Bare and Functionalized Probes:
[0136] Hex-v.sub.1/6 borophane was characterized as a disordered structure with a bare STM tip, as confirmed by the fast Fourier transform (FFT) pattern (panels A-B of
[0137] Rect-v.sub.1/6-30 borophane was imaged as a parallel striped pattern with 0.500.02 nm intervals with a bare STM tip, as shown in panel A of
[0138] Predominant Rect-v.sub.1/6-30 Borophane Phase:
[0139] Although coexisting with some hexagonal H patterns, the rectangular H pattern is the predominant phase with the highest coverage on v.sub.1/6-30 borophane as observed in
[0140] Hydrogen Adsorption Energy Landscapes on v.sub.1/6-30 Borophene:
[0141] Adsorption energies of H atoms on v.sub.1/6-30 borophene were calculated by systematically placing H atoms over an 116 grid on the surface of the 5 3 unit cell while only allowing H atoms to relax in the z-direction. Panel A of
[0142] Stable Alignment of Rect-v.sub.1/6-30 Borophane on Ag(111):
[0143] The stable alignment of v.sub.1/6-30 borophene on the Ag(111) substrate was determined by calculating the total energy when sliding the 2D borophene layer on a 64 grid on the Ag(111) surface used for the H adsorption calculations. Panels A-C of
[0144] To further compare the translated structures with the experimental results, the simulated STM images of t-rect-1H.sub.top, t-rect-1H.sub.bridge, and t-rect-2H are shown in
[0145] The projected density of states (pDOS) of the translated borophane structure (
[0146] Local Work Function of Rect-v.sub.1/6-30 Borophane:
[0147] When the Fermi level of the tip exceeds the sample vacuum level, new current channels associated with field emission resonances (FERs) begin to appear, as schematically shown in panel A of
[0149] Following equation (1), the LWF can be estimated by plotting eV.sub.nn.sup.2/3 (n3) (panel B of
[0150] The apparent barrier height (.sub.ap) can be extracted from the exponential dependence of the tunneling current (I) on the tip-sample separation (z):
[0151] From equation (2), .sub.ap is directly related to |d ln I/dz|. To better visualize the variations in the LWF between borophane polymorphs, |d ln I/dz| maps were acquired simultaneously with constant-current STM imaging (
[0152] Local Potential Distribution of the Rect-1H.sub.top Structure:
[0153] The side view of the local potential distribution of the rect-1H.sub.top structure along the plane of H atoms is shown in
[0154] Bader Analysis of Rect-v.sub.1/6-30 Borophane:
[0155] Bader analysis was performed on rect-v.sub.1/6-30 borophane structures to investigate the charge transfer between the species.
[0156] Thermal Stability of Borophane:
[0157] In order to test thermal stability, borophane samples were annealed in UHV. After annealing at 200 C. for 1 hour, hydrogen desorption was observed from borophane, as shown in panels C-D of
CONCLUSION
[0158] In summary, a diverse set of borophane polymorphs have been synthesized by exposing borophene to atomic hydrogen in UHV. Among these borophane polymorphs, rect-v.sub.1/6-30 borophane showed the most highly ordered domains, thus facilitating further interrogation of its atomic and electronic structure. Through atomically resolved STM, STS, LETS, and DFT calculations, rect-v.sub.1/6-30 borophane is found to possess the rect-2H structure, which includes a combination of 2c2e BH and 3c2e BHB bonds. Furthermore, FER spectroscopy, apparent barrier height imaging, and DFT revealed that hydrogenation lowers the LWF of v.sub.1/6-30 borophene. FER spectroscopy also showed a splitting of the first FER peak of rect-v.sub.1/6-30 borophane, which is consistent with the surface potential corrugation resulting from the combination of 2c2e BH and 3c2e BHB bonds. Chemically, hydrogenation acts as a robust passivation scheme for borophene with multiple borophane polymorphs suppressing oxidation in ambient conditions for timescales on the order of days. Since this hydrogenation can be reversibly removed through thermal annealing, borophane can be returned to pristine borophene following ambient processing, thus presenting significant flexibility in borophene sample preparation. Overall, this work reveals the richness of borophane chemistry, which is likely to inspire and motivate future exploration of covalently modified borophene polymorphs.
[0159] The foregoing description of the exemplary embodiments of the invention has been presented only for the purposes of illustration and description and is not intended to be exhaustive or to limit the invention to the precise forms disclosed. Many modifications and variations are possible in light of the above teaching.
[0160] The embodiments were chosen and described in order to explain the principles of the invention and their practical application so as to enable others skilled in the art to utilize the invention and various embodiments and with various modifications as are suited to the particular use contemplated. Alternative embodiments will become apparent to those skilled in the art to which the invention pertains without departing from its spirit and scope. Accordingly, the scope of the invention is defined by the appended claims rather than the foregoing description and the exemplary embodiments described therein.
[0161] Some references, which may include patents, patent applications, and various publications, are cited and discussed in the description of this invention. The citation and/or discussion of such references is provided merely to clarify the description of the invention and is not an admission that any such reference is prior art to the invention described herein. All references cited and discussed in this specification are incorporated herein by reference in their entireties and to the same extent as if each reference was individually incorporated by reference.
LIST OF REFERENCES
[0162] [1]. A. J. Mannix et al., Synthesis of borophenes: Anisotropic, two-dimensional boron polymorphs. Science 350, 1513-1516 (2015). [0163] [2]. A. J. Mannix et al., Borophene as a prototype for synthetic 2D materials development. Nat. Nanotechnol. 13, 444-450 (2018). [0164] [3]. E. S. Penev et al., Can two-dimensional boron superconduct? Nano Lett. 16, 2522-2526 (2016). [0165] [4]. B. Feng et al., Experimental realization of two-dimensional boron sheets. Nat. Chem. 8, 563-568 (2016). [0166] [5]. J. A. Dagata et al., Modification of hydrogen-passivated silicon by a scanning tunneling microscope operating in air. Appl. Phys. Lett. 56, 2001-2003 (1990). [0167] [6]. J. W. Lyding et al., Nanoscale patterning and oxidation of H-passivated Si(100)-21 surfaces with an ultrahigh vacuum scanning tunneling microscope. Appl. Phys. Lett. 64, 2010-2012 (1994). [0168] [7]. C. R. Ryder et al., Covalent functionalization and passivation of exfoliated black phosphorus via aryl diazonium chemistry. Nat. Chem. 8, 597-602 (2016). [0169] [8]. L.-C. Xu, et al., Hydrogenated borophene as a stable two-dimensional Dirac material with an ultrahigh Fermi velocity. Phys. Chem. Chem. Phys. 18, 27284-27289 (2016). [0170] [9]. M. Pumera, C. H. A. Wong, Graphane and hydrogenated graphene. Chem. Soc. Rev. 42, 5987-5995 (2013). [0171] [10]. R. Balog et al., Bandgap opening in graphene induced by patterned hydrogen adsorption. Nat. Mater. 9, 315-319 (2010). [0172] [11]. A. A. Kistanov et al., Exploring the charge localization and band gap opening of borophene: a first-principles study. Nanoscale 10, 1403-1410 (2018). [0173] [12]. Z.-Q. Wang et al., Band gap opening in 8-Pmmn borophene by hydrogenation. ACS Appl. Electron. Mater. 1, 667-674 (2019). [0174] [13]. D. Li et al., Stretch-driven increase in ultrahigh thermal conductance of hydrogenated borophene and dimensionality crossover in phonon transmission. Adv. Funct. Mater. 28, 1801685 (2018). [0175] [14]. H. Nishino et al., Formation and characterization of hydrogen boride sheets derived from MgB.sub.2 by cation exchange. J. Am. Chem. Soc. 139, 13761-13769 (2017). [0176] [15]. C. Hou et al., Ultrastable crystalline semiconducting hydrogenated borophene. Angew. Chem. Int. Ed. 59, 10819-10825 (2020). [0177] [16]. X. Liu et al., Geometric imaging of borophene polymorphs with functionalized probes. Nat. Commun. 10, 1642 (2019). [0178] [17]. R. Balog et al., Atomic hydrogen adsorbate structures on graphene. J. Am. Chem. Soc. 131, 8744-8745 (2009). [0179] [18]. X. Liu et al., Intermixing and periodic self-assembly of borophene line defects. Nat. Mater. 17, 783-788 (2018). [0180] [19]. Z. Zhang et al., Substrate-induced nanoscale undulations of borophene on silver. Nano Lett. 16, 6622-6627 (2016). [0181] [20]. P. Laszlo, A diborane story. Angew. Chem. Int. Ed. 39, 2071-2072 (2000). [0182] [21]. W. N. Lipscomb, The boranes and their relatives. Science 196, 1047-1055 (1977). [0183] [22]. G. Binnig et al., Tunneling spectroscopy and inverse photoemission: Image and field states. Phys. Rev. Lett. 55, 991-994 (1985). [0184] [23]. R. S. Becker et al., Electron interferometry at crystal surfaces. Phys. Rev. Lett. 55, 987-990 (1985). [0185] [24]. J. Martinez-Blanco, S. Folsch, Light emission from Ag(111) driven by inelastic tunneling in the field emission regime. J. Phys. Condens. Matter. 27, 255008 (2015). [0186] [25]. J. Martnez-Blanco et al., Energy splitting of image states induced by the surface potential corrugation of InAs(111) A. Phys. Rev. B 92, 115444 (2015). [0187] [26]. C. W. Ong et al., X-ray photoemission spectroscopy of nonmetallic materials: Electronic structures of boron and B.sub.xO.sub.y. J. Appl. Phys. 95, 3527-3534 (2004). [0188] [27]. D. C. Elias et al., Control of graphene's properties by reversible hydrogenation: evidence for graphane. Science 323, 610-613 (2009). [0189] [28]. G. Kresse, J. Furthmller, Efficiency of ab-initio total energy calculations for metals and semiconductors using a plane-wave basis set. Comput. Mater. Sci. 6, 15-50 (1996). [0190] [29]. G. Kresse, J. Furthmller, Efficient iterative schemes for ab initio total-energy calculations using a plane-wave basis set. Phys. Rev. B 54, 11169-11186 (1996). [0191] [30]. P. E. Blchl, Projector augmented-wave method. Phys. Rev. B 50, 17953-17979 (1994). [0192] [31]. G. Kresse, D. Joubert, From ultrasoft pseudopotentials to the projector augmented-wave method. Phys. Rev. B 59, 1758-1775 (1999). [0193] [32]. J. P. Perdew, K. Burke, M. Ernzerhof, Generalized gradient approximation made simple. Phys. Rev. Lett. 77, 3865-3868 (1996). [0194] [33]. M. Dion et al., Van der Waals density functional for general geometries. Phys. Rev. Lett. 92, 246401 (2004). [0195] [34]. P. E. Blch et al., Improved tetrahedron method for Brillouin-zone integrations. Phys. Rev. B 49, 16223-16233 (1994). [0196] [35]. O. Y. Kolesnychenko et al., Field-emission resonance measurements with mechanically controlled break junctions. Physica B Condens. Matter 291, 246-255 (2000). [0197] [36]. Y. Hasegawa et al., Elemental contrast of local work function studied by scanning tunneling microscopy. Surf Sci. 386, 328-334 (1997). [0198] [37]. W. Tang, E. Sanville, G. Henkelman, A grid-based Bader analysis algorithm without lattice bias. J. Phys. Condens. Matter. 21, 084204 (2009). [0199] [38]. J. W. Lyding and K. Hess, Deuterium-treated semiconductor devices (1999), U.S. Pat. No. 5,872,387. [0200] [39]. J. W. Lyding et al., Deuterium treatment of semiconductor device (2004), U.S. Pat. No. 6,833,306. [0201] [40]. G. B. Basim et al., Hydrogen passivation of integrated circuits (2015), U.S. Pat. No. 9,218,981. [0202] [41]. R. Kawamura et al., Nat. Commun. 10, 4880 (2019). [0203] [42]. B. Feng et al., Phys. Rev. B 94, 041408 (2016).