LASER SENSOR AND METHOD OF MANUFACTURING A LASER SENSOR
20240063607 ยท 2024-02-22
Assignee
Inventors
- Laurent NEVOU (WADENSWIL, CH)
- Jean Francois SEURIN (West Windsor, NJ, US)
- Svenja Mauthe (Altendorf, CH)
- Jens Geiger (Thalwil, CH)
Cpc classification
H01S5/18358
ELECTRICITY
International classification
H01S5/183
ELECTRICITY
G01S7/481
PHYSICS
Abstract
A self-mixing interferometric, SMI, laser sensor comprises a vertical cavity surface emitting laser, VCSEL, configured to emit laser radiation, the VCSEL comprising a first distributed Bragg reflector, DBR, a second DBR and a cavity region including an active light generation region, wherein the cavity region is arranged in a layer structure between a front side of the first DBR and a back side of the second DBR. Therein at least one of the first and second DBR comprises a first contrast region and a second contrast region, the first contrast region having a first refractive index contrast n.sub.1 regarding an emission wavelength of the VCSEL and the second contrast region having a second refractive index contrast n.sub.2/n larger than the first refractive index contrast n.sub.1/n.
Claims
1. A self-mixing interferometric, SMI, laser sensor, comprising a vertical cavity surface emitting laser, VCSEL, configured to emit laser radiation, the VCSEL comprising a first distributed Bragg reflector, DBR, a second DBR and a cavity region including an active light generation region, wherein the cavity region is arranged in a layer structure between a front side of the first DBR and a back side of the second DBR; and an evaluation unit configured to monitor the laser radiation of the VCSEL; wherein at least one of the first and second DBR comprises a first contrast region and a second contrast region, the first contrast region being formed from a plurality of layers of alternating first materials having a first refractive index contrast n.sub.1/n regarding an emission wavelength of the VCSEL and the second contrast region being formed from a plurality of layers of alternating second materials having a second refractive index contrast n.sub.2/n larger than the first refractive index contrast n.sub.1/n.
2. The SMI laser sensor according to claim 1, wherein the first contrast region is arranged between the second contrast region and the cavity region.
3. The SMI laser sensor according to claim 1, wherein the cavity region further comprises a cavity extension region arranged between the active light generation region and the first or second DBR.
4. The SMI laser sensor according to claim 1, wherein the first refractive index contrast n.sub.1/n is smaller than 10%, in particular smaller than 6%.
5. The SMI laser sensor according to claim 1, wherein the second refractive index contrast n.sub.2/n is larger than 10%, in particular larger than 16%.
6. The SMI laser sensor according to claim 1, wherein each of the first and the second DBRs comprises a respective first contrast region and second contrast region.
7. The SMI laser sensor according to claim 1, wherein the first contrast region is formed from alternating layers of GaAs and AlGaAs, GaAs and InGaAs, or AlGaAs and InGaAs, in particular from alternating layers of GaAs and Al.sub.xGa.sub.1-xAs with x0.5.
8. The SMI laser sensor according to claim 1, wherein the second contrast region is formed from alternating layers of AlAs and one of: GaAs, AlGaAs, and InGaAs.
9. The SMI laser sensor according to claim 1, wherein the emission wavelength of the VCSEL is in the infrared domain, in particular in the NIR domain comprising 940 nm.
10. The SMI laser sensor according to claim 1, wherein the VCSEL is characterized by single mode operation for a diode current up to 3 mA, in particular up to 5 mA.
11. The SMI laser sensor according to claim 1, further comprising a photodetector coupled to the evaluation unit and configured to detect changes in properties of the emitted laser radiation, in particular in the emitted light intensity, due to self-mixing interference.
12. The SMI laser sensor according to claim 11, wherein the VCSEL is characterized by two-sided emission and the photodetector is arranged on a back side of the first DBR.
13. The SMI laser sensor according to claim 1, wherein the evaluation unit is configured to detect changes in a junction voltage of the VCSEL due to self-mixing interference.
14. An electronic device comprising a SMI laser sensor according to claim 1, wherein the SMI laser sensor is configured to measure an absolute distance, a relative distance, and or a velocity of an object distant from the electronic device in the field-of-view of the SMI laser sensor.
15. A method of manufacturing a SMI laser sensor, the method comprising: providing a vertical cavity surface emitting laser, VCSEL, configured to emit laser radiation, wherein providing the VCSEL comprises: providing a first distributed Bragg reflector, DBR; arranging a cavity region on a front side of the first DBR, the cavity region including an active light generation region; and arranging a second DBR on a front side of the cavity region; and providing an evaluation unit configured to monitor the laser radiation of the VCSEL; wherein providing at least one of the first and second DBR comprises forming a first contrast region and a second contrast region, the first contrast region being formed from a plurality of layers of alternating materials having a first refractive index contrast n.sub.1/n regarding an emission wavelength of the VCSEL and the second contrast region being formed from a plurality of layers of alternating materials having a second refractive index contrast n.sub.2/n larger than the first refractive index contrast n.sub.1/n.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0030] The following description of figures may further illustrate and explain aspects of the SMI laser sensor and the method of manufacturing an SMI laser sensor. Components and parts of the SMI laser sensor that are functionally identical or have an identical effect are denoted by identical reference symbols. Identical or effectively identical components and parts might be described only with respect to the figures where they occur first. Their description is not necessarily repeated in successive figures.
[0031] In the figures:
[0032]
[0033]
[0034]
[0035]
[0036]
[0037]
[0038]
DETAILED DESCRIPTION
[0039]
[0040] The first contrast region 14 is arranged in between the second contrast region 15 and the cavity region 13 and is characterized by a refractive index contrast n.sub.1/n that is smaller than the refractive index contrast n.sub.2/n of the second contrast region 15. Therein, the refractive index contrast n/n is defined as a difference in refractive indices regarding the alternating material layers forming said contrast region divided by their mean value. For example, the second contrast region 15 is formed from alternating layers of a first material with a refractive index at 940 nm of about 3.0, e.g. AlAs, and a second material with a refractive index at 940 nm of about 3.6, e.g. GaAs, leading to a refractive index contrast n.sub.2/n of about 18%. As a result, about 20 pairs are required to achieve a reflectivity of 99.5%. A number of 45 pairs would lead to a reflectivity of 99.95%.
[0041] In contrast, the first contrast region 14 is formed from alternating layers of a first material with a refractive index at 940 nm of about 3.6, e.g. GaAs, and a second material with a refractive index at 940 nm of about 3.3, e.g. Al.sub.0.5Ga.sub.0.5As, leading to a refractive index contrast n.sub.1/n of about 8.7%. Even smaller contrasts can be achieved by reducing the composition of Al.sub.xGa.sub.1-xAs with x<0.5. Basically, the refractive index of Al.sub.xGa.sub.1-xAs can be approximated by n=0.6x+3.6. Alternative material choices for the first and second contrast regions 14, 15 include AlGaAs and InGaAs in various compositions. Typical thicknesses of the individual layers forming the first and second contrast regions 14, 15 are in the order of the optical emission wavelength of the VCSEL 10 divided by 4 times the respective refractive index. Both the first and second contrast region are formed from a plurality of alternating layers, typically between 20 and 50 pairs of alternating material layers.
[0042] Thus, the first contrast region 14 can be regarded as a low contrast DBR that is arranged on a front surface of a high contrast DBR facing the cavity region 13. The high contrast DBR formed from the second contrast region 15 is characterized by a high reflectivity, while the first contrast region 14 is characterized by a lower reflectivity in comparison, but also by a lower bandwidth regarding the emission wavelength of the VCSEL 10. Effectively, the low contrast region acts as a cavity extension, increasing the length of the laser cavity and therefore the coherence length, leading to a larger distance the SMI laser sensor can operate at. Additionally, the low contrast first region 14 due to the cavity extension allows for an increased stability without additional longitudinal modes starting to lase. This is due to the fact that additional modes have higher losses due to the small bandwidth of the first contrast region 14 having a low contrast. Thus, the VCSEL 10 compared to conventional devices can be operated at higher currents while maintaining single mode operation, an essential requirement for efficient SMI detection.
[0043] The operating current for current injection into the gain medium 13a is provided by a current source unit 22 that is coupled to the VCSEL. The laser sensor further comprises a control unit 21 that is coupled to the current source 22 for applying a modulation to the operating current, wherein the modulation of the operating current leads to a frequency modulation of the emitted light. The working principle of an SMI laser sensor for determining absolute or relative distances is a well-established concept and is not further detailed throughout this disclosure. However, it is noted that the performance of an SMI laser sensor is determined by its maximum operating current (and thus a maximum range of current modulation) while maintaining single mode operation, and by the coherence length of the emitted light indicating a maximum range of the laser sensor.
[0044] The laser sensor 1 further comprises an evaluation unit 20 that monitors the output intensity of the VCSEL, e.g. via monitoring the junction voltage of the VCSEL 10 that is modulated alongside the output power, indicating a degree of self-mixing interference. Therein, the back-scattered or reflected radiation 3 from the target object influences the wavelength of the emitted radiation 2, which translates to an influence of the output power and in turn of the junction voltage of the VCSEL 10. For monitoring the junction voltage, the evaluation unit 20 for communication purposes is coupled to the control unit 21 and is configured to determine a distance (relative or absolute) and/or a velocity to an object or scene the emitted radiation 2 is reflected or backscattered from. A comparison between conventional VCSELs employed in SMI laser sensors and a VCSEL according to the improved concept is detailed in
[0045] The laser sensor 1 can further comprise an aperture layer 17, e.g. an oxide aperture layer, for defining an emission window of the VCSEL 10 and/or for limiting light above a cut-off angle from reentering the cavity. Moreover, the VCSEL 10 can comprise a metallization layer 18 for defining electrical contacts and terminals of the VCSEL 10, for instance. The VCSEL 10 can be arranged on a substrate body 19. Since this proposed VCSEL structure allows the efficient suppression of higher order modes, the oxide aperture of the VCSEL can be increased in order to reduce a serial resistance Rs and reduce the noise level in the SMI voltage readout. Moreover, the proposed VCSEL structure also allows for a narrower beam divergence, which can be beneficial in some applications.
[0046]
[0047] For enabling two-sided emission, the second contrast region 15 of the first DBR 11 is characterized by a slightly lower reflectivity such that a portion of the light can leave the cavity through the first DBR 11 on a backside of the VCSEL 10. Alternatively to the depicted setup, a pickup element in the beam path of the emitted light 2 can divert some of the emitted light 2 to a photodetector 23 in cases, in which the VCSEL is characterized by single-sided emission.
[0048]
[0049]
[0050]
[0051]
[0052]
[0053]
[0054]
[0055]
[0056]
[0057] The embodiments of the SMI laser sensor 1, the electronic device 100 and the method of manufacturing an SMI laser sensor 1 disclosed herein have been discussed for the purpose of familiarizing the reader with novel aspects of the idea. Although preferred embodiments have been shown and described, changes, modifications, equivalents and substitutions of the disclosed concepts may be made by one having skill in the art without unnecessarily departing from the scope of the claims.
[0058] It will be appreciated that the disclosure is not limited to the disclosed embodiments and to what has been particularly shown and described hereinabove. Rather, features recited in separate dependent claims or in the description may advantageously be combined. Furthermore, the scope of the disclosure includes those variations and modifications, which will be apparent to those skilled in the art and fall within the scope of the appended claims.
[0059] The term comprising, insofar it was used in the claims or in the description, does not exclude other elements or steps of a corresponding feature or procedure. In case that the terms a or an were used in conjunction with features, they do not exclude a plurality of such features. Moreover, any reference signs in the claims should not be construed as limiting the scope.
REFERENCES
[0060] 1 laser sensor [0061] 2 emitted radiation [0062] 3 reflected or scattered radiation [0063] 4 emitted radiation [0064] 10 vertical cavity surface emitting laser [0065] 11, 12 distributed Bragg reflector [0066] 13 cavity region [0067] 13a active light generation region [0068] 13b cavity extension region [0069] 14, 15 contrast region [0070] 16 spacer [0071] 17 aperture layer [0072] 18 metallization layer [0073] 19 substrate body [0074] 20 evaluation unit [0075] 21 control unit [0076] 22 current source unit [0077] 23 photodetector