SYSTEM AND METHOD FOR OPERATING A PLASMA JET CONFIGURATION
20240050760 · 2024-02-15
Assignee
Inventors
- Rayk KOHLS (Dersekow, DE)
- Klaus-Dieter Weltmann (Ostseebad Binz, DE)
- Philipp TURSKI (Greifswald, DE)
- Norbert Lembke (Greifswald, DE)
- Torsten Gerling (Greifswald, DE)
- Laura VILARDELL SCHOLTEN (Greifswald, DE)
- Stefan Horn (Loissin, DE)
Cpc classification
H05H2245/34
ELECTRICITY
International classification
Abstract
The invention relates to a system (1) for generating and controlling a non-thermal atmospheric pressure plasma, comprising: a discharge space (10) into which a working gas can be introduced via a first opening (12), wherein a plasma (5) can be generated in the discharge space (10), wherein the discharge space (10) has a second opening (14), so that the plasma (5, 6) can exit from the discharge space (10) through this second opening (14) and at least one high-voltage electrode (20) for generating an electromagnetic field for generating a plasma (5) in the discharge space (10). The plasma (5, 6) exiting through the second opening (14) is controlled by a throughflow controller (40) of the system (1), which throughflow controller (40) is designed to adjust a volume flow (60) of the working gas through the first opening (12) from a working gas source (50) into the discharge space (10). In this case, the throughflow controller (40) is further designed to assume at least a first state and a second state, wherein in the first state no working gas is supplied from the working gas source (50) to the discharge space (10), so that no plasma (5) exits from the second opening (14) even when there is a generated electromagnetic field in the discharge space (10), and wherein in the second state the working gas is supplied from the working gas source (50) to the discharge space (10), a plasma (5) is generated in the discharge space (10) and the plasma (5, 6) exits from the second opening (14).
Claims
1.-23. (canceled)
24. System (1) for generating and controlling a non-thermal atmospheric pressure plasma, wherein the system (1) has a plurality of discharge spaces (10, 10a, 10b, 10c), wherein each discharge space (10, 10a, 10b, 10e) has a respective first opening (12, 12a, 12b, 12c) through which a working gas is introducable into the respective discharge space (10, 10a, 10b, 10c), wherein each discharge space (10, 10a, 10b, 10c) has an assigned second opening (14, 14a, 14b, 14c) through which the plasma can exit the respective discharge space (10, 10a, 10b, 10c), wherein furthermore each discharge space (10, 10a, 10b, 10c) at least one high-voltage electrode (20, 20a, 20b, 20c) for generating an electromagnetic field for generating a plasma (5) in the respective discharge space (10, 10a, 10b, 10e) is assigned to, so that in each discharge space (10, 10a, 10b, 10c), independently of the other discharge spaces (10, 10a, 10b, 10c), a plasma (5) is generatable, wherein the plasma (5, 6) exiting through the assigned second opening (14, 14a, 14b, 14c) is controlled by a flow controller (40, 40a, 40b, 40c) of the system (1) assigned to the respective discharge space (10, 10a, 10b, 10c), wherein each flow controller (40, 40a, 40b, 40c) is formed to set a volume flow (60) of the working gas through the respective first opening (12, 12a, 12b, 12c) of the respective discharge space (10, 10a, 10b, 10c) from a working gas source (50, 50a, 50b) into the respective discharge space (10, 10a, 10b, 10c), wherein the respective flow controller (40, 40a, 40b, 40c) is further formed to adopt at least a first state and a second state, wherein in the first state no working gas from the working gas source (50, 50a, 50b) is supplied to the respective discharge space (10, 10a, 10b, 10c), so that in the respective discharge space (10, 10a, 10b, 10c), even with generated electromagnetic field in the respective discharge space (10, 10a, 10b, 10c), no plasma (5) exits from assigned second opening (14, 14a, 14b, 14c), and wherein in the second state the working gas from the working gas source (50, 50a, 50b) is supplied to the respective discharge space (10, 10a, 10b, 10c) and a plasma (5) is generated there, and the plasma (5, 6) exits from the assigned second opening (14, 14a, 14b, 14c), characterized in that the system (1) is configured to generate a capacitively-coupled, an inductively-coupled and/or a microwave-induced plasma in the working gas supplied through the first opening.
25. The system (1) according to claim 24, characterized in that at least one ground electrode (22, 22a, 22b, 22c) is assigned to each discharge space (10, 10a, 10b, 10c), wherein the at least one high-voltage electrode (20, 20a, 20b, 20c) and the at least one ground electrode (22, 22a, 22b, 22c) for generating an electromagnetic field for generating a plasma (5) are configured in the respective discharge space (10, 10a, 10b, 10c).
26. The system (1) according to claim 24, characterized in that the system (1) comprises an automatic control system (72) formed to independently control the plurality of flow controllers (40, 40a, 40b, 40c) of the system (1) such that the flow controllers (40, 40a, 40b, 40c) can independently adopt at least the first state or the second state such that plasma (5) is generated only in a selected discharge space (10, 10a, 10b, 10e) and exits only from the second opening (14, 14a, 14b, 14c) of the selected discharge space (10, 10a, 10b, 10c).
27. The system (1) according to claim 26, characterized in that the automatic control system (72) is formed to control the flow controllers (40, 40a, 40b, 40c) of the plurality of flow controllers (40, 40a, 40b, 40c) of the system (1) independently of each other so that one flow controller (40, 40a, 40b, 40c) of the plurality of flow controllers (40, 40a, 40b, 40c) adopts the second state for a first time period and all other flow controllers (40, 40a, 40b, 40c) of the plurality of flow controllers (40, 40a, 40b, 40c) adopt the first state, and after the first time period, the flow controller (40, 40a, 40b, 40c) of the plurality of flow controllers (40, 40a, 40b, 40c) adopts the first state, wherein another flow controller (40, 40a, 40b, 40c) of the plurality of flow controllers (40, 40a, 40b, 40c) adopts the second state for a second time period, wherein the first and second time periods are consecutive or temporarily overlap.
28. The system (1) according to claim 24, characterized in that the system (1) is formed such that each discharge space (10, 10a, 10b, 10c) of the plurality of discharge spaces (10, 10a, 10b, 10c) is connectable or connected to a common working gas source (50), or wherein the system (1) is formed such that at least one discharge space (10, 10a, 10b, 10c) of the plurality of discharge spaces (10, 10a, 10b, 10c) is connectable or connected to its own working gas source (50a, 50b).
29. The system (1) according to claim 24, characterized in that the second openings (14, 14a, 14b, 14c) of the plurality of discharge spaces (10, 10a, 10b, 10c) face in the same direction (R), or that the second openings (14, 14a, 14b, 14c) of the plurality of discharge spaces (10, 10a, 10b, 10e) are positioned or positionable to face a central region (Z).
30. The system (1) according to claim 24, characterized in that the at least one flow controller (40, 40a, 40b, 40c) is continuously controllable so that the volume flow (60) through each discharge space (10, 10a, 10b, 10c) is continuously and individually settable.
31. The system (1) according to claim 24, characterized in that the at least one flow controller (40, 40a, 40b, 40c) is a proportional valve.
32. The system (1) according to claim 24, characterized in that the system (1) is configured to modulate the volume flow (60) of the working gas in each discharge space (10, 10a, 10b, 10c) by means of the flow controller (40, 40a, 40b, 40c), wherein the modulation of the volume flow (60) comprises more than two modulation states, in particular wherein the modulation of the volume flow (60) is continuously settable.
33. The system (1) according to claim 24, characterized in that each flow controller (40, 40a, 40b, 40c) is configured to have a control time between 0.1 ms and 1 s so that the volume flow (60) can be modulated with a respective time resolution.
34. The system (1) according to claim 24, characterized in that the system (1) has for each discharge space (10, 10a, 10b, 10c) at least one assigned sensor which detects a plasma parameter and which is configured to output a sensor signal indicative of the plasma parameter, wherein the system is configured to control the at least one flow controller (40, 40a, 40b, 40c) on the basis of the sensor signal in such a way that a plasma parameter to be achieved for the respectively assigned discharge space (10, 10a, 10b, 10c) is set.
35. The system (1) according to claim 24, characterized in that the system (1) has exactly one high-voltage electrode per discharge space (10, 10a, 10b, 10c) and no more than two ground electrodes.
36. The system according to claim 24, characterized in that each discharge space has exactly two openingsthe first opening and the second opening.
37. A method for generating and controlling a non-thermal atmospheric pressure plasma utilizing a system (1) according to claim 1, comprising the steps: generating an electromagnetic field in each discharge space (10, 10a, 10b, 10c) of the plurality of discharge spaces (10, 10a, 10b, 10c), setting each flow controller (40, 40a, 40b, 40c) of the plurality of flow controller (40, 40a, 40b, 40c) to a first state or a second state, wherein in the first state no working gas from the working gas source (50, 50a, 50b) is supplied to the respective discharge space (10, 10a, 10b, 10c) of the plurality of discharge spaces (10, 10a, 10b, 10c), so that in the respective discharge space (10, 10a, 10b, 10c) of the plurality of discharge spaces (10, 10a, 10b, 10c), even with generated electromagnetic field in the respective discharge space (10, 10a, 10b, 10c) of the plurality of discharge spaces (10, 10a, 10b, 10c), no plasma exits from the respective discharge space (10, 10a, 10b, 10c), and wherein, in the second state, the working gas from the working gas source (50, 50a, 50b) is supplied to the respective discharge space (10, 10a, 10b, 10e) of the plurality of discharge spaces (10, 10a, 10b, 10c), a plasma (5) is generated in the respective discharge space (10, 10a, 10b, 10c) of the plurality of discharge spaces (10, 10a, 10b, 10c), and the plasma (5, 6) exits from the assigned second opening (14, 14a, 14b, 14c).
Description
[0147] In the following, embodiments as well as features and advantages of the invention are explained with reference to the figures. Showing:
[0148]
[0149]
[0150]
[0151]
[0152]
[0153]
[0154]
[0155]
[0156]
[0157]
[0158]
[0159]
[0160]
[0161]
[0162]
DESCRIPTION OF FIGURES
[0163]
[0164] The discharge space 10 has a first opening 12 and a second opening 14. In an embodiment according to the invention, the discharge space 10 is delimited by a dielectric 30 (
[0165] The discharge space 10 extends along a longitudinal axis A. In the embodiment shown, the first opening 12 is located opposite the second opening 14.
[0166] The system 1 shown has a high voltage electrode 20 arranged within the discharge space 10 (
[0167] In an embodiment, the high voltage electrode 20 and the ground electrode 22 are arranged outside the discharge space 10 at the dielectric 30 (
[0168] The system 1 may have a microwave generator 202 and a microwave resonator 200 (
[0169] The discharge space 10 may be connected to a working gas source 50 by means of a conduit element 52, in particular by means of a gas conduit element. The conduit element 52 can on the one hand be fluidically connected to the discharge space 10 and on the other hand to the working gas source 50 (
[0170] The flow controller 40 can be used to control the working gas volume flow 60 in the discharge space 10. In the first state, the flow controller 40 is arranged so that no working gas enters the discharge space 10 through the first opening 12 (
[0171] A system 1 shown in
[0172] When an electromagnetic field is generated in the discharge space 10, a plasma 5 is generated in the discharge space 10 and ejected from the discharge space 10 through the working gas volume flow 60 in the form of a plasma jet 6 through the second opening 14 (
[0173] In an embodiment according to the invention, the flow controller 40 is controlled with the aid of an automatic control unit 70 (
[0174]
[0175] In
[0176]
[0177] The four second openings 14a, 14b, 14c, 14d are arranged in a common plane. They point in a common direction R. The individual recesses 132 and the second openings 14a, 14b, 14c, 14d may be arranged relative to one another in such a way that a respective plasma jet of the respective second opening 14a, 14b, 14c, 14d can exit through the respective recess 132.
[0178]
[0179] The longitudinal axes Aa, Ab, Ac of the respective discharge spaces 10a, 10b, 10c may be arranged parallel to each other (illustrated in
[0180] The second openings 14a, 14b, 14c of the respective exemplary systems 1 shown (
[0181]
[0182] The system 1 shown in
[0183]
[0184]
[0185]
[0186]
[0187]
[0188] In addition to a working gas source 50 connected to both discharge spaces 10a, 10b, the system 1 illustrated in
[0189] The further gas source 51 can be connected to the mixing arrangement 54b. With the aid of the mixing arrangement 54b, the working gas from the working gas source 50 is mixed with a further gas from the further gas source 51. This gas mixture is supplied to the discharge space 10b (by controlling the flow controller 40b).
[0190]
[0191]
[0192] The second openings 14 are oriented toward the cuboid. In an embodiment, the discharge spaces 10 are arranged at four faces of the cuboid (
[0193]