TRANSMISSION CHARGED PARTICLE MICROSCOPE WITH ADJUSTABLE BEAM ENERGY SPREAD

Abstract

A method of using a Transmission Charged Particle Microscope comprising: A specimen holder, for holding a specimen; A source, for producing a beam of charged particles; An illuminator, for directing said beam along an optical axis so as to irradiate the specimen, the illuminator comprising: a monochromator, which is configured to produce an output beam with a given energy spread ?E0; and a condenser lens assembly; An imaging system, for receiving a flux of charged particles transmitted through the specimen and directing it onto a sensing device; A controller, for controlling at least some operational aspects of the microscope, comprising the following steps: In a first use session, selecting at least one of: (a) an excitation of a first lens of said condenser lens assembly; (b) a width of a condenser aperture downstream of said first lens, so as to produce a first width W1and associated first energy spread ?E1of an emerging beam exiting said aperture; In a second use session, selecting at least one of said parameters (a) and (b) so as to produce a second, different width W2and associated second, different energy spread ?E2of said emerging beam.

Claims

1. A method of using a Transmission Charged Particle Microscope comprising: a source, for producing a beam of charged particles; an illuminator, for directing said beam along an optical axis so as to irradiate a specimen, the illuminator comprising: a monochromator having a monochromator slit and which is configured to produce an output beam with a given energy spread ?E0; and a condenser lens assembly downstream of said monochromator; an imaging system, for receiving a flux of charged particles transmitted through the specimen and directing it onto a sensing device; a controller, for controlling at least some operational aspects of the microscope, wherein the controller is configure to perform a method including: in a first use session, selecting at least one of: (a) an excitation of a first lens of said condenser lens assembly; (b) a width of a condenser aperture downstream of said first lens, so as to produce a first width W1 and associated first energy spread ?E1 of an emerging beam exiting said aperture; in a second use session, selecting at least one of said parameters (a) and (b) so as to produce a second, different width W2 and associated second, different energy spread ?E2 of said emerging beam.

2. A method according to claim 1, wherein adjustment of at least one of parameters (a) and (b) causes a virtual image of said condenser aperture, formed at a location of said monochromator, to vary in width.

3. A method according to claim 1, wherein a second lens of said condenser lens assembly is disposed between said first lens and said condenser aperture.

4. A method according to claim 1, wherein at least one of ?E1 and ?E2 is less than 0.05 eV, preferably less than 0.03 eV.

5. A method according to claim 4, wherein ?E0?0.1 eV.

6. A method according to claim 1, wherein said sensing device is comprised in an Electron Energy Loss Spectroscopy (EELS) module.

7. A Transmission Charged Particle Microscope, comprising: a source, for producing a beam of charged particles; an illuminator, for directing said beam along an optical axis so as to irradiate a specimen, the illuminator comprising a monochromator having a monochromator slit that is configured to produce an output beam with a given energy spread ?E0 and a condenser lens assembly downstream of said monochromator; an imaging system, for receiving a flux of charged particles transmitted through the specimen and directing it onto a sensing device; a controller, for controlling at least some operational aspects of the microscope, wherein said controller is configured to: in a first use session, select at least one of: (a) an excitation of a first lens of said condenser lens assembly; (b) a width of a condenser aperture downstream of said first lens, so as to produce a first width W1 and associated first energy spread ?E1 of an emerging beam exiting said aperture; and in a second use session, select at least one of said parameters (a) and (b) so as to produce a second, different width W2 and associated second, different energy spread ?E2 of said emerging beam.

8. The Transmission Charged Particle Microscope of claim 7, wherein adjustment of at least one of parameters (a) and (b) causes a virtual image of said condenser aperture, formed at a location of said monochromator, to vary in width.

9. The Transmission Charged Particle Microscope of claim 7, wherein a second lens of said condenser lens assembly is disposed between said first lens and said condenser aperture.

10. The Transmission Charged Particle Microscope of claim 7, wherein at least one of ?E1 and ?E2 is less than 0.05 eV, preferably less than 0.03 eV.

11. The Transmission Charged Particle Microscope of claim 10, wherein ?E0 0.1 eV.

12. The Transmission Charged Particle Microscope of claim 7, wherein said sensing device is comprised in an Electron Energy Loss Spectroscopy (EELS) module.

13. A method of operating a transmission charged particle microscope (TCPM), the method comprising: in a first operating mode, configuring a condenser assembly of the TCPM to provide a charged particle beam having first energy spread and a first beam width; and in a second operating mode, configuring the condenser assembly to provide the charged particle beam having a second energy spread and a second beam width, the second energy spread less than the first energy spread and the second beam width smaller than the first beam width.

14. The method of claim 13, wherein the first beam energy and the first beam width are determined in response to either a first excitation of a first condenser lens of the condenser assembly and/or a first width of a condenser aperture of the condenser assembly.

15. The method of claim 14, wherein the condenser lens is disposed between an exit aperture of a monochromator slit and the condenser aperture.

16. The method of claim 14, wherein the first excitation causes the condenser lens to mildly expand the charged particle beam, and wherein the first width of the condenser aperture allows most or all of the charged particle beam to pass.

17. The method of claim 13, wherein the second beam energy and the second beam width are determined in response to either a second excitation of a first condenser lens of the condenser assembly and/or a second width of a condenser aperture of the condenser assembly.

18. The method of claim 17, wherein the second excitation causes the condenser lens to strongly expand the charged particle beam, and wherein the second width of the condenser aperture allows a small, central portion of the charged particle beam to pass.

Description

[0043] The invention will now be elucidated in more detail on the basis of exemplary embodiments and the accompanying schematic drawings, in which:

[0044] FIG. 1 renders a longitudinal cross-sectional elevation view of an embodiment of a TCPM in which the present invention is implemented.

[0045] FIG. 2 shows an enlarged and more detailed view of part of FIG. 1, more particularly an EELS module.

[0046] FIG. 3A renders a magnified view of an upper portion of FIG. 1, depicting operation according to a first embodiment of the present invention.

[0047] FIG. 3B corresponds largely to FIG. 3A, but depicts operation according to a second embodiment of the current invention.

[0048] In the Figures, where pertinent, corresponding parts are indicated using corresponding reference symbols.

EMBODIMENT 1

[0049] FIG. 1 (not to scale) is a highly schematic depiction of an embodiment of a TCPM M in which the present invention is implemented; more specifically, it shows an embodiment of a TEM/STEM. In the Figure, within a vacuum enclosure 2, an electron source 4 produces a beam B of electrons that propagates along an electron-optical axis B and traverses an electron-optical illuminator (charged particle beam column) 6, serving to direct/focus the electrons onto a chosen part of a specimen S (which may, for example, be (locally) thinned/planarized). Also depicted is a deflector 10, which (inter alia) can be used to effect scanning motion of the beam B.

[0050] The specimen S is held on a specimen holder H that can be positioned in multiple degrees of freedom by a positioning device/stage A, which moves a cradle A into which holder H is (removably) affixed; for example, the specimen holder H may comprise a finger that can be moved (inter alia) in the XY plane (see the depicted Cartesian coordinate system; typically, motion parallel to Z and tilt about X/Y will also be possible). Such movement allows different parts of the specimen S to be illuminated/imaged/inspected by the electron beam B traveling along axis B (in the Z direction), and/or allows scanning motion to be performed as an alternative to beam scanning. If desired, an optional cooling device (not depicted) can be brought into intimate thermal contact with the specimen holder H, so as to maintain it (and the specimen S thereupon) at cryogenic temperatures, for example.

[0051] The electron beam B will interact with the specimen S in such a manner as to cause various types of stimulated radiation to emanate from the specimen S, including (for example) secondary electrons, backscattered electrons, X-rays and optical radiation (cathodoluminescence). If desired, one or more of these radiation types can be detected with the aid of analysis device 22, which might be a combined scintillator/photomultiplier or EDX (Energy-Dispersive X-Ray Spectroscopy) module, for instance; in such a case, an image could be constructed using basically the same principle as in a SEM. However, alternatively or supplementally, one can study electrons that traverse (pass through) the specimen S, exit/emanate from it and continue to propagate (substantially, though generally with some deflection/scattering) along axis B. Such a transmitted electron flux enters an imaging system (projection lens) 24, which will generally comprise a variety of electrostatic/magnetic lenses, deflectors, correctors (such as stigmators), etc. In normal (non-scanning) TEM mode, this imaging system 24 can focus the transmitted electron flux onto a fluorescent screen (sensing device) 26, which, if desired, can be retracted/withdrawn (as schematically indicated by arrows 26) so as to get it out of the way of axis B. An image or diffractogram of (part of) the specimen S will be formed by imaging system 24 on screen 26, and this may be viewed through viewing port 28 located in a suitable part of a wall of enclosure 2. The retraction mechanism for screen 26 may, for example, be mechanical and/or electrical in nature, and is not depicted here.

[0052] As an alternative to viewing an image/diffractogram on screen 26, one can instead make use of the fact that the depth of focus of the electron flux leaving imaging system 24 is generally quite large (e.g. of the order of 1 meter). Consequently, various other types of sensing device can be used downstream of screen 26, such as: [0053] TEM camera 30. At camera 30, electron flux B can form a static image or diffractogram that can be processed by controller/processor 20 and displayed on a display device (not depicted), such as a flat panel display, for example. When not required, camera 30 can be retracted/withdrawn (as schematically indicated by arrows 30) so as to get it out of the way of axis B. [0054] STEM camera 32. An output from camera 32 can be recorded as a function of (X,Y) scanning position of the beam B on the specimen S, and an image can be constructed that is a map of output from camera 32 as a function of X,Y. Camera 32 can comprise a single pixel with a diameter of e.g. 20 mm, as opposed to the matrix of pixels characteristically present in camera 30. Moreover, camera 32 will generally have a much higher acquisition rate (e.g. 10.sup.6 points per second) than camera 30 (e.g. 10.sup.2 images per second). Once again, when not required, camera 32 can be retracted/withdrawn (as schematically indicated by arrows 32) so as to get it out of the way of axis B (although such retraction would not be a necessity in the case of a donut-shaped annular dark field camera 32, for example; in such a camera, a central hole would allow flux passage when the camera was not in use). [0055] As an alternative to imaging using cameras 30 or 32, one can also invoke spectroscopic apparatus 34, which, in the current example, is an EELS module.
It should be noted that the order/location of items 30, 32 and 34 is not strict, and many possible variations are conceivable. For example, spectroscopic apparatus 34 can also be integrated into the imaging system 24.

[0056] Note that the controller (computer processor) 20 is connected to various illustrated components via control lines (buses) 20. This controller 20 can provide a variety of functions, such as synchronizing actions, providing setpoints, processing signals, performing calculations, and displaying messages/information on a display device (not depicted). Needless to say, the (schematically depicted) controller 20 may be (partially) inside or outside the enclosure 2, and may have a unitary or composite structure, as desired.

[0057] The skilled artisan will understand that the interior of the enclosure 2 does not have to be kept at a strict vacuum; for example, in a so-called Environmental TEM/STEM, a background atmosphere of a given gas is deliberately introduced/maintained within the enclosure 2. The skilled artisan will also understand that, in practice, it may be advantageous to confine the volume of enclosure 2 so that, where possible, it essentially hugs the axis B, taking the form of a small tube (e.g. of the order of 1 cm in diameter) through which the employed electron beam passes, but widening out to accommodate structures such as the source 4, specimen holder H, screen 26, camera 30, camera 32, spectroscopic apparatus 34, etc.

[0058] Turning now to FIG. 2, this shows an enlarged and more detailed view of the spectroscopic apparatus 34 in FIG. 1. In the Figure, flux B of electrons (which has passed through specimen S and imaging system 24) is shown propagating along electron-optical axis B. The flux B enters a dispersing device 3 (electron prism), where it is dispersed (fanned out) into an energy-resolved/energy-differentiated (continuous) array 5 of spectral sub-beams (schematically indicated in FIG. 2 using broken lines), which are distributed along dispersion direction X; for illustration purposes, three of these sub-beams are labelled 5a, 5b and 5c in the Figure. Note in this regard that, conventionally, propagation is considered to occur along the Z direction, and the depicted Cartesian coordinate system thus co-deflects with the flux B within the dispersing device 3.

[0059] Downstream of item 3, the array 5 of sub-beams encounters an adjustable/retractable slit (letterbox) 7, which can, for example, be used in EFTEM-mode to select/admit a given portion of the array 5 and to discard/occlude other portions thereof; to this end, the slit 7 is connected to an actuation device 7a that can be invoked to open/close/move the (opening in the) slit 7 as desired. In EELS mode, this slit 7 is usually (fully) open/retracted. The skilled artisan will understand that the slit 7 is advantageously disposed at a location at or proximal to a dispersion plane of the spectroscopic apparatus 34; similarly, the detector 11 is also advantageously located at or proximal to such a plane. If required, it is possible to aim/shift the array 5 of spectral sub-beams falling upon the slit 7 by appropriately adjusting, for example, (an electrical signal to) the dispersing device 3 and/or a drift tube/deflector (not depicted) provided between the dispersing device 3 and slit 7, for instance.

[0060] After having traversed slit 7, the (selected portion of the) array 5 passes through post-dispersion electron optics 9, where it is magnified/focused, for example, and ultimately directed/projected onto detector 11, with sub-beams 5a, 5b and 5c respectively impinging upon detector portions 11a, 11b and 11c.

[0061] Two particular components of illuminator 6 are of specific importance as regards the present invention, namely monochromator 8 and condenser lens assembly 12 (see FIG. 1), and the contribution of these components will now be described in detail. FIGS. 3A and 3B render a magnified view of an upper portion of FIG. 1. In both Figures, the source 4 radiates rays (charged particle paths) in a variety of directions, and these are captured and accelerated by a series of anode electrodes 4. Each ray passes into disperser/particle prism 8a, where dispersion occurs, i.e. a differential deflection that depends on the exact energy of the particle passing along a given nominal path/ray, which causes a spectral spread in the various rays. A monochromator slit 8b is used to select a relatively narrow sub-section of this spectral spread, thus passing only a selected energy range ?E0. In the particular set-up shown in FIGS. 3A and 3B, this monochromator slit 8b is positioned at ground potential after the accelerator anodes 4, which facilitates the construction of the slit; however, in an alternative set-up, the monochromator slit 8b can, for example, be positioned in or proximal to the dispersive element of the monochromator.

[0062] A beam with said energy spread ?E0 next enters condenser assembly 12, which comprises various condenser lenses C1, C2a, C2b, C3 and a condenser aperture CA, and is (ultimately) directed onto specimen S. However, there are significant differences between FIGS. 3A and 3B, and these can be set forth as follows: [0063] In FIG. 3A, the beam B emerging from monochromator slit 8b is relatively mildly expanded by condenser lens C1, so that all (or a very large central portion thereof) passes through condenser aperture CA. If desired, aperture CA can be used to clean up the beam, by blocking a small peripheral/annular region thereof, but this has only a relatively small effect on the total percentage of the beam footprint that is passed by the aperture CA. [0064] In FIG. 3B, the beam B emerging from monochromator slit 8b is more strongly expanded by condenser lens C1 (and/or a relatively small condenser aperture CA is selected), so that only a relatively small central portion of the beam passes through aperture CA. This has a significant effect on the total percentage of the beam footprint that is passed by the aperture CA, with an attendant reduction in beam energy spread.