FILM-FORMING METAL SOLUTION AND METHOD OF FORMING METAL COATING
20190368062 ยท 2019-12-05
Assignee
Inventors
Cpc classification
C25D3/32
CHEMISTRY; METALLURGY
International classification
Abstract
The present disclosure relates to a film-forming metal solution for use in a method in which a solid electrolyte membrane having sulfonic acid groups is disposed between an anode and a substrate serving as a cathode, the solid electrolyte membrane is brought into contact with the substrate, and a voltage is applied between the anode and the substrate to deposit a metal onto a surface of the substrate from metal ions supplied into the solid electrolyte membrane and thereby form a metal coating on the surface of the substrate, the film-forming metal solution being adapted to supply metal ions into the solid electrolyte membrane, wherein the film-forming metal solution comprises an aqueous metal solution, a solvent, and a nonionic surfactant, and the nonionic surfactant has a linear hydrophilic group having ethylene oxide units and a hydrophobic group having a cyclic structure and a maximum length of 40 or less.
Claims
1. A film-forming metal solution for use in a method in which a solid electrolyte membrane having sulfonic acid groups is disposed between an anode and a substrate serving as a cathode, the solid electrolyte membrane is brought into contact with the substrate, and a voltage is applied between the anode and the substrate to deposit a metal onto a surface of the substrate from metal ions supplied into the solid electrolyte membrane and thereby form a metal coating on the surface of the substrate, the film-forming metal solution being adapted to supply metal ions into the solid electrolyte membrane, wherein the film-forming metal solution comprises an aqueous metal solution, a solvent, and a nonionic surfactant, and the nonionic surfactant has a linear hydrophilic group having ethylene oxide units and a hydrophobic group having a cyclic structure and a maximum length of 40 or less.
2. The film-forming metal solution according to claim 1, wherein the hydrophobic group has a minimum length of 10 or less.
3. The film-forming metal solution according to claim 1, wherein the hydrophilic group has 9 to 15 mol of the ethylene oxide units.
4. The film-forming metal solution according to claim 1, wherein the nonionic surfactant has a hydrophilic-lipophilic balance of 13 to 15.
5. The film-forming metal solution according to claim 1, wherein the nonionic surfactant is a cumylphenol ethylene oxide adduct.
6. The film-forming metal solution according to claim 1, wherein the aqueous metal solution is an aqueous tin sulfate solution.
7. A method of forming a metal coating, the method comprising: disposing a solid electrolyte membrane having sulfonic acid groups between an anode and a substrate serving as a cathode; bringing the film-forming metal solution according to claim 1 into contact with the solid electrolyte membrane to supply metal ions into the solid electrolyte membrane; and, in conjunction with the supply of the metal ions, applying a voltage between the anode and the substrate while keeping the solid electrolyte membrane in contact with the substrate to deposit a metal onto a surface of the substrate from the supplied metal ions.
Description
BRIEF DESCRIPTION OF THE DRAWINGS
[0021]
[0022]
[0023]
DETAILED DESCRIPTION
[0024] Hereinafter, exemplary embodiments will be described in detail.
[0025] A film-forming metal solution according to exemplary embodiments comprises an aqueous metal solution, a solvent, and a nonionic surfactant. The nonionic surfactant is characterized by having a linear hydrophilic group having ethylene oxide units and a hydrophobic group having a cyclic structure and a maximum length of 40 or less. Such a film-forming metal solution is for use in solid electrolyte deposition (SED) in which a solid electrolyte membrane having sulfonic acid groups is disposed between an anode and a substrate serving as a cathode, the solid electrolyte membrane is brought into contact with the substrate, and a voltage is applied between the anode and the substrate to deposit a metal onto a surface of the substrate from metal ions supplied into the solid electrolyte membrane. The film-forming metal solution is used to supply metal ions into the solid electrolyte membrane.
[0026] The aqueous metal solution can be selected as appropriate depending on the type of the metal to be formed into a film. Since solid electrolyte deposition uses a solid electrolyte membrane having sulfonic acid groups, an acidic metal solution is used as the aqueous metal solution in some embodiments. Specific examples of the acidic metal solution include a sulfuric acid solution, a methanesulfonic acid solution, and a fluoroborate solution. In particular embodiments, an aqueous tin sulfate solution is used to form a tin coating. The concentration of tin sulfate in the film-forming metal solution can be set as appropriate depending on the film formation conditions and may be in the range of 30 to 50 g/l in some embodiments. The pH of the aqueous tin sulfate solution is in the range of 0.1 to 0.4 in some embodiments in order to form a tin coating, but the pH of the aqueous tin sulfate solution is not limited to this range.
[0027] Any solvent can be used as long as the solvent dissolves both polar substances and non-polar substances and has no adverse effect on the solid electrolyte membrane. Examples of the solvent include isopropyl alcohol and 1-propanol. In typical embodiments, isopropyl alcohol is used. One of these solvents may be used alone, or two or more thereof may be used in combination. The amount of the solvent varies depending on the amounts of the other components, and may be, for example, in the range of 5 to 15 g/l in the film-forming metal solution.
[0028] A nonionic surfactant adsorbs to the crystal growth point of a metal such as tin and inhibits the crystal growth, thus providing a crystal size reduction leading to formation of a dense, smooth coating (see Mekki Gijutsu Gaido [Guidebook of Plating Technology], Nippon Tokin Zairyo Kyodokumiai [Japan Plating Material Cooperative Association]). The nonionic surfactant in exemplary embodiments has a linear hydrophilic group having ethylene oxide units and a hydrophobic group having a cyclic structure and a maximum length of 40 or less. The behavior of such a nonionic surfactant in a solid electrolyte membrane will be described hereinafter.
[0029] The solid electrolyte membrane used in exemplary embodiments has sulfonic acid groups. Specifically, in some embodiments, a perfluorosulfonic acid-based ion-exchange membrane is used (e.g., Nafion (trade name) manufactured by E.I. du Pont de Nemours and Company, Flemion (trade name) manufactured by Asahi Glass Co., Ltd., Aciplex (trade name) manufactured by Asahi Kasei Corporation, or Gore-Select (trade name) manufactured by W.L. Gore & Associates, Inc.). In typical embodiments, Nafion is used. The molecular structure of such a perfluorosulfonic acid-based solid electrolyte membrane has a main chain in the form of PTFE skeleton and a side chain containing an ether bond and a sulfonic acid group, and the main chain is hydrophobic while the side chain is hydrophilic. Thus, the main chain in the form of PTFE skeleton and the sulfonic acid group-containing side chain are phase-separated. A perfluorosulfonic acid-based polymer electrolyte membrane is a linear polymer material and holds a structure in which the hydrophobic moiety of the fluorinated carbon skeleton is crystalized (the degree of crystallization is estimated to be 25%) even without cross-linkage. The remaining side chain moiety having sulfonic acid groups is phase-separated as a hydrophilic moiety and forms an ion channel structure enclosing hydrated water (water cluster).
[0030] In order for a nonionic surfactant to efficiently enter a solid electrolyte membrane in solid electrolyte deposition, it is important that the nonionic surfactant be allowed to enter ion channels with little friction and be introduced into water clusters with little interaction (i.e., the nonionic surfactant be adhered and trapped on the inner walls of the ion channels of the solid electrolyte membrane). In exemplary embodiments, in order for the nonionic surfactant to enter ion channels with little friction, the hydrophilic group of the nonionic surfactant is linear ethylene oxide capable of being hydrogen-bonded to water clusters, and the hydrophobic group of the nonionic surfactant has a cyclic structure and a maximum length of 40 or less, which is smaller than the water cluster diameter. In some embodiments, the minimum length of the hydrophobic group of the nonionic surfactant is 10 or less.
[0031] The benzene ring, which is the cyclic structure, is a n-conjugated system, and thus can be smaller than the hydrophilic group composed of ethylene oxide and provide a reduction in the friction experienced by the nonionic surfactant entering ion channels. The maximum length of the hydrophobic group needs to be 40 or less in order for the nonionic surfactant to enter ion channels. In order for the nonionic surfactant to smoothly pass through a neck portion 1a of the ion channel structure 1 of
[0032] The degree to which a nonionic surfactant is dissolved in water, i.e., the level of hydrophilicity of the surfactant (a measure of whether the hydrophilicity of a hydrophilic group is high or low relative to the hydrophobicity of a hydrophobic group) is defined by Griffin as a hydrophilic-lipophilic balance (HLB) specified below, and a correlation is found between the HLB and the nature of nonionic surfactants.
HLB of nonionic surfactant=(Molecular weight of hydrophilic group moiety)/(Molecular weight of nonionic surfactant)100/5
=Hydrophilic group weight/(Hydrophobic group weight+hydrophilic group weight)100/5
=Hydrophilic group concentration in % by weight
[0033] The hydrophilic-lipophilic balance (HLB) of the nonionic surfactant according to the present disclosure is in the range of 13 to 15 in some embodiments. When the HLB is in this range, a nonionic surfactant having osmotic effect, cleaning effect, and emulsifying effect (O/W type) is obtained. This nonionic surfactant easily penetrates a solid electrolyte membrane, and interaction between water clusters and the hydrophobic group of the nonionic surfactant is weak.
[0034] Particular examples of the nonionic surfactant as described above include ethylene oxide adducts of phenol derivatives such as cumylphenol, bisphenol, nonylphenol, and octylphenol and ethylene oxide adducts of naphthol derivatives such as -naphthol and -naphthol, and the phenol or naphthol derivative portion forms the hydrophobic group. Among these examples, a cumylphenol ethylene oxide adduct represented by the following formula is used in particular embodiments, since this adduct, which has carbon between two cyclic structures, can readily change its steric structure and easily enter ion channels.
##STR00001##
[0035] In solid electrolyte deposition, a potential is applied to electrophorese metal ions such as tin ions in the direction from the anode to the cathode through the solid electrolyte membrane. The nonionic surfactant has a hydrophilic group composed of linear ethylene oxide, and this ethylene oxide has an ether bond. The ether bond attracts the metal ions, and thus the nonionic surfactant accompanies the metal ions being electrophoresed. The entry of the nonionic surfactant into the solid electrolyte membrane during this process can be explained by polymer molecular dynamics simulation.
[0036] The polymer molecular dynamics simulation has become widely used since around 1990, and coarse-grained molecular dynamics (bead-spring model) aiming at reproducing the atomic-scale shape, excluded volume, and flexibility as accurately as possible has been applied (see K. Kremer and G. S. Greet, J. Chem. Phys., 92 (8), 5057 (1990) and Y. Cho, H. Watanabe and S. Granick, J. Chem. Phys., 110 (19), 9688 (1999)). The bead-spring model is applicable to the nonionic surfactant in exemplary embodiments because the linear ethylene oxide has a helical structure.
[0037] In the case of applying the bead-spring model to a nonionic surfactant, as shown in
[0038] In view of the above, the number of ethylene oxide units of the nonionic surfactant according to the present disclosure is 9 to 15 mol in some embodiments. In other embodiments, the number of ethylene oxide units may be 11 to 13 mol. When the number of ethylene oxide units is in such a range, the size of the nonionic surfactant is substantially equal to the diameter of the water cluster, and the ethylene oxide chain has high flexibility, so that the nonionic surfactant is efficiently introduced into the neck portions of the ion channels of the solid electrolyte membrane. Additionally, since the ether bond contained in the hydrophilic group of the nonionic surfactant has a lone electron pair to which a metal ion can be coordinated and presents a negative electronegativity, the nonionic surfactant can come close to the metal ions such as tin ions and transfer the metal ions efficiently. This allows tin to be deposited preferentially over hydrogen gas generated by decomposition of the tin solution, thus reducing the surface roughness of the resulting metal coating and enabling the metal coating to be uniform and have gloss.
[0039] An excessively low concentration of the nonionic surfactant in the film-forming metal solution leads to a decrease in the amount of the nonionic surfactant present on the film formation surface and hence to a reduced efficiency of transfer of the metal ions, while an excessively high concentration of the nonionic surfactant leads to an increase in the amount of the nonionic surfactant in the vicinity of the ion channels and hence to an excluded volume effect which makes it difficult for the metal ions to pass through the ion channels. In view of the balance in this trade-off, the concentration of the nonionic surfactant is set as appropriate. Specifically, the concentration of the nonionic surfactant in the film-forming metal solution is in the range of 0.01 to 0.05 M in some embodiments.
[0040] In addition, the film-forming metal solution according to exemplary embodiments can, if necessary, contain an additive such as 2-mercaptobenzothiazole, gelatin, or polyethylene glycol nonylphenyl ether in order to improve solder spreadability. The concentrations of these additives are not particularly limited. In some embodiments, the concentration of 2-mercaptobenzothiazole is in the range of 3 to 8 ml/l, the concentration of gelatin is in the range of 1 to 3 g/l, and the concentration of polyethylene glycol nonylphenyl ether is in the range of 15 to 25 g/l.
[0041] A metal coating can be formed by solid electrolyte deposition using the film-forming metal solution described above. That is, the formation of a metal coating can be accomplished by: disposing a solid electrolyte membrane having sulfonic acid groups between an anode and a substrate serving as a cathode; bringing the film-forming metal solution into contact with the solid electrolyte membrane to supply metal ions into the solid electrolyte membrane; and, in conjunction with the supply of the metal ions, applying a voltage between the anode and the substrate while keeping the solid electrolyte membrane in contact with the substrate to deposit a metal onto the surface of the substrate from the supplied metal ions.
[0042] Metal ions present in the solid electrolyte membrane are deposited during film formation and, in addition, metal ions are supplied to the solid electrolyte membrane from the aqueous solution present on the anode side. Thus, by supplying the aqueous solution as needed, metal coatings of desired thickness can be successively formed on the surfaces of a plurality of substrates without replacement of the anode.
[0043] In the method of forming a metal coating according to some embodiments of the present disclosure, the formation of a metal coating may be carried out by pressurizing the metal ion-containing aqueous solution, with the solid electrolyte membrane being in contact with the substrate, and thereby applying a pressure to the substrate by means of the liquid pressure of the aqueous solution via the solid electrolyte membrane. In this case, according to the Pascal's law, the solid electrolyte membrane can apply a pressure uniformly over the surface of the substrate by means of the liquid pressure of the pressurized aqueous solution. Application of a voltage between the anode and the cathode in this pressurized state allows a metal coating of uniform thickness to be formed on the surface of the substrate.
[0044] The various conditions of the film formation, such as the voltage to be applied, can be set as appropriate depending on, for example, the film formation area, the type of the metal coating, and the intended thickness of the coating.
EXAMPLES
[0045] Hereinafter, exemplary embodiments will be described in more detail by means of Examples and Comparative Examples. The present disclosure is not limited to Examples given below.
[0046] (Method for Synthesis of Nonionic Surfactant)
[0047] For use as a nonionic surfactant in Examples, cumylphenol ethylene oxide adducts having 4 to 60 mol of ethylene oxide units were synthesized by addition reaction of ethylene oxides of different chain lengths with cumylphenol. The size of the cumylphenol moiety serving as a hydrophobic group was such that the maximum length was about 10 and the minimum length was about 3 .
[0048] Cresol sulfonic acid (ethylene oxide units: 0 mol) was used as a nonionic surfactant in Comparative Example 1. The size of the cresol moiety serving as a hydrophobic group was such that the maximum length was about 5 and the minimum length was about 3 .
[0049] (Experimental Method)
[0050] A nickel SED film (thickness: 4 m, substrate: copper-sputtered substrate, current density: 100 mA/cm.sup.2, electrolyte solution: 1 M aqueous nickel chloride solution+acetic acid (pH=4.0), temperature: 80 C. pressure: 0.5 MPa, size: 1010 mm) was used as a substrate for surface morphology observation, which was used as a cathode. A solution containing a 0.19 M aqueous tin sulfate solution, a 0.014 M nonionic surfactant, and isopropyl alcohol (solvent) was prepared as a film-forming metal solution. In the solution, the concentration of tin sulfate was 40 g/l, the concentration of sulfuric acid was 100 g/l, and the concentration of IPA was 17 g/l. Using an ion-exchange membrane (N117, manufactured by E.I. du Pont de Nemours and Company) as a solid electrolyte membrane and a tin foil (SN-443261, manufactured by The Nilaco Corporation) as an anode, solid electrolyte deposition targeting a tin film thickness of 4 m was performed at a substrate temperature of 40 C., a pressure of 0.50 MPa, a tin film formation area of 1010 mm, and a voltage of 0.2 V to form a tin coating on the substrate. The film formation region was prepared by attaching a polyimide tape (Kapton Adhesive Tape: 650R#25, manufactured by Teraoka Seisakusho Co., Ltd.) on the substrate and forming a 10-mm-square opening in the polyimide tape. For the tin coating thus obtained, the surface roughness (ten-point average height, Rz.J94 (m)) was measured. The measurement of the surface roughness was conducted using a probe-type surface roughness tester (SV-624, manufactured by Mitutoyo Corporation) according to JIS B 0601. The measurement results are shown in Table 1. The relationship between the number of ethylene oxide units in the nonionic surfactant and the surface roughness of the metal coating is shown in
TABLE-US-00001 TABLE 1 EO Rz.J94 (mol) HLB (m) Gloss Uniformity Example 1 4 9.1 3.73 Semi-glossy Average Example 2 6 11.1 3.33 Semi-glossy Average Example 3 9 13.0 2.52 Glossy Good Example 4 11 13.9 2.12 Glossy Good Example 5 13 14.6 2.18 Glossy Good Example 6 15 15.0 2.24 Glossy Good Example 7 20 16.1 2.35 Semi-glossy Average Example 8 40 17.8 2.38 Semi-glossy Average Example 9 60 18.5 2.70 Semi-glossy Average Comparative 0 0.0 4.28 Non-glossy Poor Example 1
[0051] Before formation of the tin film, the nickel layer alone had a Rz.J94 of 1.25 m. As seen from Table 1, the formation of the tin coating on the nickel layer caused an increase in surface roughness in all of Examples and Comparative Example. A larger surface roughness of the tin coating deteriorates the solder wettability, and thus a smaller surface roughness of the tin coating is better. As shown in Table 1, all of the tin coatings of Examples 1 to 9, each of which used a nonionic surfactant having a linear hydrophilic group having ethylene oxide units and a hydrophobic group having a cyclic structure, a maximum length of 40 or less, and a minimum length of 10 or less, had a certain level of gloss and a relatively small surface roughness. In Comparative Example 1, in which the nonionic surfactant used had no linear hydrophilic group having ethylene oxide units, the obtained tin coating in which tin particles had a defined surface and a large particle size and which was not uniform. Moreover, this tin coating lacked gloss (non-glossy) and had a large surface roughness. A possible reason for the result of Comparative Example 1 is that generation of hydrogen occurred preferentially over deposition of tin, and hydrogen gathered at the interface between the solid electrolyte membrane and the nickel substrate to locally inhibit the contact between the solid electrolyte membrane and the nickel substrate, thus causing insufficient pressure application and hence uneven film formation.
[0052] When the number of ethylene oxide (EO) units was less than 9 mol, the EO length was smaller than 40 corresponding to the cluster diameter in the ion channel structure of the solid electrolyte membrane, and the tin coating was uneven and semi-glossy. When the number of EO units was more than 15 mol, the EO length was larger than the cluster diameter, and accordingly the efficiency of entry of the nonionic surfactant changed. Consequently, tin grew in the form of islands on the nickel film, and the resulting coating was semi-glossy. By contrast, as seen from Table 1 and
Comparative Example 2
[0053] A film-forming metal solution was prepared and a tin coating was formed on a nickel layer by solid electrolyte deposition, in the same manner as in Examples, except that a laurylamine ethylene oxide adduct having a hydrophobic group having no cyclic structure was used as a nonionic surfactant instead of the cumylphenol ethylene oxide adduct.
[0054] The laurylamine ethylene oxide adduct was synthesized as follows: 1 g of sodium hydroxide as a catalyst was added to 1 mol of laurylamine (C0684, Tokyo Chemical Industry Co., Ltd.) to give a solution, and this solution was heated to 165 C. and was allowed to absorb a necessary amount of ethylene oxide liquidized by pressurization and undergo addition reaction, the completion of which was followed by neutralization of sodium hydroxide with dilute sulfuric acid.
[0055] The tin coatings obtained using laurylamine ethylene oxide adducts having 7 mol, 14 mol, and 21 mol of EO units all had a portion devoid of deposited tin and were semi-glossy, irrespective of the number of moles of EO units.
Comparative Examples 3 and 4
[0056] A film-forming metal solution was prepared and an attempt was made to form a tin coating on a nickel layer by solid electrolyte deposition, in the same manner as in Examples, except that polyoxyethylene distyrenated phenyl ether having a hydrophobic group having a maximum length of about 150 and a minimum length of more than 10 (Comparative Example 3, EMULGEN A-60 manufactured by Kao Corporation, minimum length of hydrophobic group: about 15 ) or polyoxyethylene tribenzyl phenyl ether having a hydrophobic group having a maximum length of about 150 and a minimum length of more than 10 (Comparative Example 4, EMULGEN B-66 manufactured by Kao Corporation, minimum length of hydrophobic group: about 15 ) was used as a nonionic surfactant instead of the cumylphenol ethylene oxide adduct.
[0057] The result was that no tin coating was obtained. The reason for this result is presumably that failure of the nonionic surfactant to enter the ion channels of the solid electrolyte membrane caused insufficient tin ion transfer, which made formation of a tin coating difficult.
Comparative Example 5
[0058] A film-forming metal solution was prepared and an attempt was made to form a tin coating on a nickel layer by solid electrolyte deposition, in the same manner as in Examples, except that a cumylphenol propylene oxide/ethylene oxide adduct having a hydrophilic group moiety composed of propylene oxide/ethylene oxide copolymer (PO chain: 57%, EO chain: 43%) was used as a nonionic surfactant instead of the cumylphenol ethylene oxide adduct.
[0059] The result was that the current efficiency (the ratio of the weight of the deposited plating to the theoretical amount of deposited plating calculated according to the Faraday's law), as compared to that in the case of using the cumylphenol ethylene oxide adduct, decreased from 85% to 55% and a uniform tin coating was not obtained. This is presumably because the hydrophilic group of the nonionic surfactant was not linear, and the propylene oxide chain had a higher steric hindrance than the ethylene oxide chain, so that the nonionic surfactant had difficulty in entering the ion channels.
Examples 10 to 15
[0060] Film-forming metal solutions according to Examples 10 to 15 were prepared using a cumylphenol ethylene oxide adduct (EO units: 10 mol) as a nonionic surfactant with varying concentrations of the nonionic surfactant. Each of the film-forming metal solutions was used to form a tin coating on a nickel SED film by solid electrolyte deposition in the same manner as in Example 1. The current efficiency (%) calculated from the weight of the deposited plating is shown in Table 2.
TABLE-US-00002 TABLE 2 Concentration (M) of cumylphenol Current ethylene oxide adduct efficiency having 10 mol of EO (%) Example 10 0.01 70 Example 11 0.02 81 Example 12 0.04 85 Example 13 0.06 85.8 Example 14 0.08 82 Example 15 0.1 65
[0061] In all of Examples 10 to 15, a uniform tin coating having a small surface roughness was obtained. In particular, in Examples 11 to 14 where the concentration of the cumylphenol ethylene oxide adduct was in the range of 0.02 to 0.08, a high current efficiency was achieved. By contrast, in Example 10 where the concentration of the cumylphenol ethylene oxide adduct was low and in Example 15 where the concentration of the cumylphenol ethylene oxide adduct was high, the current efficiency decreased to 70% or less. The reason for this result is presumably that the low concentration of the cumylphenol ethylene oxide adduct led to a decrease in the amount of the cumylphenol ethylene oxide adduct present on the film formation surface and hence to a reduced efficiency of transfer of the tin ions, while the high concentration of the cumylphenol ethylene oxide adduct led to an increase in the amount of the cumylphenol ethylene oxide adduct in the vicinity of the ion channels and hence to an excluded volume effect which made it difficult for the tin ions to pass through the ion channels.
DESCRIPTION OF SYMBOLS
[0062] 1 Ion channel structure [0063] 1a Neck portion [0064] 10 Nonionic surfactant [0065] 11 Hydrophobic group [0066] 12 Hydrophilic group [0067] 20 Metal ion [0068] 30 Water cluster